WO2009008442A1 - 磁気記録媒体の製造方法および製造装置 - Google Patents

磁気記録媒体の製造方法および製造装置 Download PDF

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Publication number
WO2009008442A1
WO2009008442A1 PCT/JP2008/062388 JP2008062388W WO2009008442A1 WO 2009008442 A1 WO2009008442 A1 WO 2009008442A1 JP 2008062388 W JP2008062388 W JP 2008062388W WO 2009008442 A1 WO2009008442 A1 WO 2009008442A1
Authority
WO
WIPO (PCT)
Prior art keywords
film
recording medium
magnetic recording
carrier
forming
Prior art date
Application number
PCT/JP2008/062388
Other languages
English (en)
French (fr)
Inventor
Gohei Kurokawa
Original Assignee
Showa Denko K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko K.K. filed Critical Showa Denko K.K.
Priority to US12/668,366 priority Critical patent/US20100206717A1/en
Publication of WO2009008442A1 publication Critical patent/WO2009008442A1/ja

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82—Disk carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

　本発明は、成膜用基板をキャリアに装着して、接続された複数のチャンバ内に順次搬送し、前記チャンバ内で、前記成膜用基板上に、少なくとも磁性膜とカーボン保護膜とを成膜することによって、磁気記録媒体を製造する方法であって、前記キャリアから成膜後の磁気記録媒体を取り外す工程の後、キャリアに成膜用基板を装着する工程の前に、キャリア表面に金属膜を成膜する工程を有することを特徴とする磁気記録媒体の製造方法を提供する。
PCT/JP2008/062388 2007-07-11 2008-07-09 磁気記録媒体の製造方法および製造装置 WO2009008442A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/668,366 US20100206717A1 (en) 2007-07-11 2008-07-09 Method and apparatus for manufacturing magnetic recording medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007182529A JP4794514B2 (ja) 2007-07-11 2007-07-11 磁気記録媒体の製造方法および製造装置
JP2007-182529 2007-07-11

Publications (1)

Publication Number Publication Date
WO2009008442A1 true WO2009008442A1 (ja) 2009-01-15

Family

ID=40228613

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062388 WO2009008442A1 (ja) 2007-07-11 2008-07-09 磁気記録媒体の製造方法および製造装置

Country Status (4)

Country Link
US (1) US20100206717A1 (ja)
JP (1) JP4794514B2 (ja)
MY (1) MY155112A (ja)
WO (1) WO2009008442A1 (ja)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008171505A (ja) * 2007-01-12 2008-07-24 Showa Denko Kk 炭素保護膜の形成方法及び磁気記録媒体の製造方法、磁気記録媒体並びに磁気記録再生装置
JP2009277275A (ja) * 2008-05-13 2009-11-26 Showa Denko Kk 磁気記録媒体の製造方法および製造装置
JP2010287300A (ja) * 2009-06-15 2010-12-24 Wd Media Singapore Pte Ltd 磁気記録媒体の製造方法
JP5427572B2 (ja) * 2009-12-01 2014-02-26 昭和電工株式会社 マグネトロンスパッタ装置、インライン式成膜装置、磁気記録媒体の製造方法
JP5666248B2 (ja) * 2010-11-02 2015-02-12 キヤノンアネルバ株式会社 磁気記録媒体の製造装置
JP5681879B2 (ja) * 2012-05-09 2015-03-11 Tdk株式会社 垂直磁気記録媒体の製造方法及び製造装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208071A (ja) * 1983-05-13 1984-11-26 Hitachi Ltd 成膜方法および装置
JPH11229150A (ja) * 1998-02-16 1999-08-24 Anelva Corp 情報記録ディスク用成膜装置

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5252194A (en) * 1990-01-26 1993-10-12 Varian Associates, Inc. Rotating sputtering apparatus for selected erosion
JP3362432B2 (ja) * 1992-10-31 2003-01-07 ソニー株式会社 プラズマ処理方法及びプラズマ処理装置
US5391229A (en) * 1993-07-26 1995-02-21 General Electric Company Apparatus for chemical vapor deposition of diamond including graphite substrate holders
FR2760089B1 (fr) * 1997-02-26 1999-04-30 Org Europeene De Rech Agencement et procede pour ameliorer le vide dans un systeme a vide tres pousse
US6284052B2 (en) * 1998-08-19 2001-09-04 Sharp Laboratories Of America, Inc. In-situ method of cleaning a metal-organic chemical vapor deposition chamber
US6919001B2 (en) * 2000-05-01 2005-07-19 Intevac, Inc. Disk coating system
US6656535B2 (en) * 2001-12-21 2003-12-02 Applied Materials, Inc Method of fabricating a coated process chamber component
US6589398B1 (en) * 2002-03-28 2003-07-08 Novellus Systems, Inc. Pasting method for eliminating flaking during nitride sputtering

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208071A (ja) * 1983-05-13 1984-11-26 Hitachi Ltd 成膜方法および装置
JPH11229150A (ja) * 1998-02-16 1999-08-24 Anelva Corp 情報記録ディスク用成膜装置

Also Published As

Publication number Publication date
US20100206717A1 (en) 2010-08-19
JP2009020951A (ja) 2009-01-29
JP4794514B2 (ja) 2011-10-19
MY155112A (en) 2015-09-15

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