WO2009008324A1 - 磁気記録媒体の製造方法および製造装置 - Google Patents

磁気記録媒体の製造方法および製造装置 Download PDF

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Publication number
WO2009008324A1
WO2009008324A1 PCT/JP2008/062058 JP2008062058W WO2009008324A1 WO 2009008324 A1 WO2009008324 A1 WO 2009008324A1 JP 2008062058 W JP2008062058 W JP 2008062058W WO 2009008324 A1 WO2009008324 A1 WO 2009008324A1
Authority
WO
WIPO (PCT)
Prior art keywords
recording medium
magnetic recording
film
carrier
manufacturing magnetic
Prior art date
Application number
PCT/JP2008/062058
Other languages
English (en)
French (fr)
Inventor
Gohei Kurokawa
Original Assignee
Showa Denko K.K.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Denko K.K. filed Critical Showa Denko K.K.
Priority to US12/668,390 priority Critical patent/US9129636B2/en
Publication of WO2009008324A1 publication Critical patent/WO2009008324A1/ja

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/568—Transferring the substrates through a series of coating stations
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82—Disk carriers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

　本発明は、成膜用基板をキャリアに装着して、接続された複数のチャンバ内に順次搬送し、前記チャンバ内で、前記成膜用基板上に、少なくとも磁性膜とカーボン保護膜とを成膜することによって、磁気記録媒体を製造する方法であって、前記キャリアから成膜後の磁気記録媒体を取り外す工程の後、キャリアに成膜用基板を装着する工程の前に、キャリア表面に堆積付着したカーボン保護膜をアッシング除去する工程を有することを特徴とする磁気記録媒体の製造方法を提供する。
PCT/JP2008/062058 2007-07-11 2008-07-03 磁気記録媒体の製造方法および製造装置 WO2009008324A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/668,390 US9129636B2 (en) 2007-07-11 2008-07-03 Method and apparatus for manufacturing magnetic recording medium

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007182528A JP4820783B2 (ja) 2007-07-11 2007-07-11 磁気記録媒体の製造方法および製造装置
JP2007-182528 2007-07-11

Publications (1)

Publication Number Publication Date
WO2009008324A1 true WO2009008324A1 (ja) 2009-01-15

Family

ID=40228503

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/062058 WO2009008324A1 (ja) 2007-07-11 2008-07-03 磁気記録媒体の製造方法および製造装置

Country Status (3)

Country Link
US (1) US9129636B2 (ja)
JP (1) JP4820783B2 (ja)
WO (1) WO2009008324A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012054528A (ja) * 2010-08-04 2012-03-15 Nuflare Technology Inc 半導体製造装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180351084A1 (en) 2015-11-27 2018-12-06 Tdk Corporation Spin current magnetization reversal-type magnetoresistive effect element and method for producing spin current magnetization reversal-type magnetoresistive effect element

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208071A (ja) * 1983-05-13 1984-11-26 Hitachi Ltd 成膜方法および装置
JPH11229150A (ja) * 1998-02-16 1999-08-24 Anelva Corp 情報記録ディスク用成膜装置
JP2002332570A (ja) * 2001-05-08 2002-11-22 Anelva Corp 基板処理装置
JP2008130100A (ja) * 2006-11-16 2008-06-05 Hitachi Global Storage Technologies Netherlands Bv 垂直磁気記録媒体の製造方法及び製膜装置

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JP2948842B2 (ja) * 1989-11-24 1999-09-13 日本真空技術株式会社 インライン型ｃｖｄ装置
US5252194A (en) 1990-01-26 1993-10-12 Varian Associates, Inc. Rotating sputtering apparatus for selected erosion
US5352194A (en) * 1992-06-29 1994-10-04 University Of Pittsburgh Automated device for liposuction
JP3362432B2 (ja) * 1992-10-31 2003-01-07 ソニー株式会社 プラズマ処理方法及びプラズマ処理装置
US5391229A (en) 1993-07-26 1995-02-21 General Electric Company Apparatus for chemical vapor deposition of diamond including graphite substrate holders
FR2760089B1 (fr) * 1997-02-26 1999-04-30 Org Europeene De Rech Agencement et procede pour ameliorer le vide dans un systeme a vide tres pousse
US6176932B1 (en) 1998-02-16 2001-01-23 Anelva Corporation Thin film deposition apparatus
US6284052B2 (en) * 1998-08-19 2001-09-04 Sharp Laboratories Of America, Inc. In-situ method of cleaning a metal-organic chemical vapor deposition chamber
JP2001216689A (ja) * 2000-01-31 2001-08-10 Anelva Corp 基板支持機構及び基板支持回転装置
US6919001B2 (en) 2000-05-01 2005-07-19 Intevac, Inc. Disk coating system
JP4502159B2 (ja) 2000-07-12 2010-07-14 キヤノンアネルバ株式会社 情報記録ディスク用成膜装置
US20040255862A1 (en) * 2001-02-26 2004-12-23 Lee Chung J. Reactor for producing reactive intermediates for low dielectric constant polymer thin films
US6656535B2 (en) * 2001-12-21 2003-12-02 Applied Materials, Inc Method of fabricating a coated process chamber component
US6589398B1 (en) 2002-03-28 2003-07-08 Novellus Systems, Inc. Pasting method for eliminating flaking during nitride sputtering
US6902628B2 (en) * 2002-11-25 2005-06-07 Applied Materials, Inc. Method of cleaning a coated process chamber component
ITMI20031178A1 (it) * 2003-06-11 2004-12-12 Getters Spa Depositi multistrato getter non evaporabili ottenuti per
JP2006173343A (ja) 2004-12-15 2006-06-29 Sharp Corp プラズマｃｖｄ装置及びｃｖｄ装置用電極

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59208071A (ja) * 1983-05-13 1984-11-26 Hitachi Ltd 成膜方法および装置
JPH11229150A (ja) * 1998-02-16 1999-08-24 Anelva Corp 情報記録ディスク用成膜装置
JP2002332570A (ja) * 2001-05-08 2002-11-22 Anelva Corp 基板処理装置
JP2008130100A (ja) * 2006-11-16 2008-06-05 Hitachi Global Storage Technologies Netherlands Bv 垂直磁気記録媒体の製造方法及び製膜装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012054528A (ja) * 2010-08-04 2012-03-15 Nuflare Technology Inc 半導体製造装置

Also Published As

Publication number Publication date
US20100227050A1 (en) 2010-09-09
JP2009020950A (ja) 2009-01-29
JP4820783B2 (ja) 2011-11-24
US9129636B2 (en) 2015-09-08

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