WO2008090651A1 - 圧電共振子及び圧電フィルタ - Google Patents
圧電共振子及び圧電フィルタ Download PDFInfo
- Publication number
- WO2008090651A1 WO2008090651A1 PCT/JP2007/070662 JP2007070662W WO2008090651A1 WO 2008090651 A1 WO2008090651 A1 WO 2008090651A1 JP 2007070662 W JP2007070662 W JP 2007070662W WO 2008090651 A1 WO2008090651 A1 WO 2008090651A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- thin film
- piezoelectric
- section
- film
- substrate
- Prior art date
Links
- 239000010409 thin film Substances 0.000 abstract 8
- 239000010408 film Substances 0.000 abstract 6
- 239000000758 substrate Substances 0.000 abstract 3
- 230000017525 heat dissipation Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/173—Air-gaps
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02007—Details of bulk acoustic wave devices
- H03H9/02086—Means for compensation or elimination of undesirable effects
- H03H9/02102—Means for compensation or elimination of undesirable effects of temperature influence
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/175—Acoustic mirrors
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/564—Monolithic crystal filters implemented with thin-film techniques
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/46—Filters
- H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
- H03H9/56—Monolithic crystal filters
- H03H9/566—Electric coupling means therefor
- H03H9/568—Electric coupling means therefor consisting of a ladder configuration
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Abstract
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008554962A JP5018788B2 (ja) | 2007-01-24 | 2007-10-23 | 圧電共振子及び圧電フィルタ |
DE112007002969.2T DE112007002969B4 (de) | 2007-01-24 | 2007-10-23 | Piezoelektrischer Resonator und piezoelektrisches Filter |
US12/495,889 US7924120B2 (en) | 2007-01-24 | 2009-07-01 | Piezoelectric resonator and piezoelectric filter having a heat-radiating film |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007013846 | 2007-01-24 | ||
JP2007-013846 | 2007-05-25 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US12/495,889 Continuation US7924120B2 (en) | 2007-01-24 | 2009-07-01 | Piezoelectric resonator and piezoelectric filter having a heat-radiating film |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2008090651A1 true WO2008090651A1 (ja) | 2008-07-31 |
Family
ID=39644229
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2007/070662 WO2008090651A1 (ja) | 2007-01-24 | 2007-10-23 | 圧電共振子及び圧電フィルタ |
Country Status (4)
Country | Link |
---|---|
US (1) | US7924120B2 (ja) |
JP (1) | JP5018788B2 (ja) |
DE (1) | DE112007002969B4 (ja) |
WO (1) | WO2008090651A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110298564A1 (en) * | 2009-02-20 | 2011-12-08 | Kazuki Iwashita | Thin-Film Piezoelectric Resonator and Thin-Film Piezoelectric Filter Using the Same |
JP2014209728A (ja) * | 2013-03-29 | 2014-11-06 | セイコーエプソン株式会社 | 超音波トランスデューサー装置およびプローブ並びに電子機器および超音波画像装置 |
WO2017051681A1 (ja) * | 2015-09-24 | 2017-03-30 | ミツミ電機株式会社 | 圧電素子及びその製造方法、圧電アクチュエータ |
JP2017536049A (ja) * | 2014-11-25 | 2017-11-30 | スナップトラック・インコーポレーテッド | 自己発熱が低減されたbaw共振器、共振器を備える高周波フィルタ、高周波フィルタを備えるデュプレクサ、及びその製造方法 |
JP2018037906A (ja) * | 2016-08-31 | 2018-03-08 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびマルチプレクサ。 |
Families Citing this family (15)
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---|---|---|---|---|
US8291559B2 (en) * | 2009-02-24 | 2012-10-23 | Epcos Ag | Process for adapting resonance frequency of a BAW resonator |
US8283999B2 (en) * | 2010-02-23 | 2012-10-09 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic resonator structures comprising a single material acoustic coupling layer comprising inhomogeneous acoustic property |
US8830012B2 (en) * | 2010-09-07 | 2014-09-09 | Wei Pang | Composite bulk acoustic wave resonator |
US9911836B2 (en) | 2011-02-25 | 2018-03-06 | Qorvo Us, Inc. | Vertical ballast technology for power HBT device |
US9897512B2 (en) * | 2011-04-15 | 2018-02-20 | Qorvo Us, Inc. | Laminate variables measured electrically |
JP5394451B2 (ja) * | 2011-07-26 | 2014-01-22 | 株式会社アドバンテスト | アクチュエータの製造方法、スイッチ装置、伝送路切替装置、および試験装置 |
KR101959204B1 (ko) * | 2013-01-09 | 2019-07-04 | 삼성전자주식회사 | 무선 주파수 필터 및 무선 주파수 필터의 제조방법 |
DE102015120341A1 (de) * | 2015-11-24 | 2017-05-24 | Snaptrack, Inc. | Bauelement mit Wärmeableitung |
US10778180B2 (en) * | 2015-12-10 | 2020-09-15 | Qorvo Us, Inc. | Bulk acoustic wave resonator with a modified outside stack portion |
US10396755B2 (en) * | 2016-02-17 | 2019-08-27 | Samsung Electro-Mechanics Co., Ltd. | Resonator having frame and method of manufacturing the same |
DE102017129160B3 (de) * | 2017-12-07 | 2019-01-31 | RF360 Europe GmbH | Elektroakustisches Resonatorbauelement und Verfahren zu dessen Herstellung |
CN111193490A (zh) * | 2018-11-14 | 2020-05-22 | 天津大学 | 散热结构、带散热结构的体声波谐振器、滤波器和电子设备 |
CN111342797A (zh) * | 2018-12-18 | 2020-06-26 | 天津大学 | 压电滤波器及具有其的电子设备 |
KR20200143027A (ko) | 2019-06-14 | 2020-12-23 | 삼성전기주식회사 | 체적 음향 공진기 |
CN111342792B (zh) * | 2020-02-19 | 2021-05-25 | 见闻录(浙江)半导体有限公司 | 一种具有电磁屏蔽结构的固态装配谐振器及制作工艺 |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07260660A (ja) * | 1994-03-26 | 1995-10-13 | Kinseki Ltd | センサ用圧電振動子の周波数調整方法 |
JP2001502136A (ja) * | 1996-10-10 | 2001-02-13 | ノキア モービル フォーンズ リミテッド | 薄膜バルク音波共振子(fbar)をウェーハ上で同調させる方法 |
JP2002237738A (ja) * | 2000-12-06 | 2002-08-23 | Murata Mfg Co Ltd | 圧電共振子、圧電フィルタおよびデュプレクサ |
JP2003204239A (ja) * | 2001-10-26 | 2003-07-18 | Fujitsu Ltd | 圧電薄膜共振子、フィルタ、および圧電薄膜共振子の製造方法 |
JP2004221622A (ja) * | 2002-01-08 | 2004-08-05 | Murata Mfg Co Ltd | 圧電共振子、圧電フィルタ、デュプレクサ、通信装置および圧電共振子の製造方法 |
WO2006027873A1 (ja) * | 2004-09-10 | 2006-03-16 | Murata Manufacturing Co., Ltd. | 圧電薄膜共振子 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA2283887C (en) * | 1998-01-16 | 2003-11-25 | Mitsubishi Denki Kabushiki Kaisha | Film bulk acoustic wave device |
EP1170862B1 (en) * | 2000-06-23 | 2012-10-10 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator and piezoelectric filter using the same |
JP2003168953A (ja) * | 2001-09-20 | 2003-06-13 | Murata Mfg Co Ltd | 圧電共振子、これを用いた圧電フィルタ、デュプレクサ、通信装置 |
US6906451B2 (en) * | 2002-01-08 | 2005-06-14 | Murata Manufacturing Co., Ltd. | Piezoelectric resonator, piezoelectric filter, duplexer, communication apparatus, and method for manufacturing piezoelectric resonator |
JP3879643B2 (ja) * | 2002-09-25 | 2007-02-14 | 株式会社村田製作所 | 圧電共振子、圧電フィルタ、通信装置 |
JP2006510296A (ja) * | 2002-12-13 | 2006-03-23 | コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ | 電気音響共振器 |
US7164222B2 (en) * | 2003-06-26 | 2007-01-16 | Intel Corporation | Film bulk acoustic resonator (FBAR) with high thermal conductivity |
EP1673860B1 (en) * | 2003-10-06 | 2009-11-18 | Nxp B.V. | Ladder-type thin-film bulk acoustic wave filter |
EP1852974B1 (en) * | 2005-02-21 | 2011-11-23 | Murata Manufacturing Co., Ltd. | Piezoelectric thin film resonator |
JP4849445B2 (ja) * | 2006-03-06 | 2012-01-11 | 学校法人同志社 | 薄膜共振器 |
-
2007
- 2007-10-23 JP JP2008554962A patent/JP5018788B2/ja active Active
- 2007-10-23 WO PCT/JP2007/070662 patent/WO2008090651A1/ja active Application Filing
- 2007-10-23 DE DE112007002969.2T patent/DE112007002969B4/de active Active
-
2009
- 2009-07-01 US US12/495,889 patent/US7924120B2/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07260660A (ja) * | 1994-03-26 | 1995-10-13 | Kinseki Ltd | センサ用圧電振動子の周波数調整方法 |
JP2001502136A (ja) * | 1996-10-10 | 2001-02-13 | ノキア モービル フォーンズ リミテッド | 薄膜バルク音波共振子(fbar)をウェーハ上で同調させる方法 |
JP2002237738A (ja) * | 2000-12-06 | 2002-08-23 | Murata Mfg Co Ltd | 圧電共振子、圧電フィルタおよびデュプレクサ |
JP2003204239A (ja) * | 2001-10-26 | 2003-07-18 | Fujitsu Ltd | 圧電薄膜共振子、フィルタ、および圧電薄膜共振子の製造方法 |
JP2004221622A (ja) * | 2002-01-08 | 2004-08-05 | Murata Mfg Co Ltd | 圧電共振子、圧電フィルタ、デュプレクサ、通信装置および圧電共振子の製造方法 |
WO2006027873A1 (ja) * | 2004-09-10 | 2006-03-16 | Murata Manufacturing Co., Ltd. | 圧電薄膜共振子 |
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20110298564A1 (en) * | 2009-02-20 | 2011-12-08 | Kazuki Iwashita | Thin-Film Piezoelectric Resonator and Thin-Film Piezoelectric Filter Using the Same |
US8854156B2 (en) * | 2009-02-20 | 2014-10-07 | Ube Industries, Ltd. | Thin-film piezoelectric resonator and thin-film piezoelectric filter using the same |
JP2014209728A (ja) * | 2013-03-29 | 2014-11-06 | セイコーエプソン株式会社 | 超音波トランスデューサー装置およびプローブ並びに電子機器および超音波画像装置 |
JP2017536049A (ja) * | 2014-11-25 | 2017-11-30 | スナップトラック・インコーポレーテッド | 自己発熱が低減されたbaw共振器、共振器を備える高周波フィルタ、高周波フィルタを備えるデュプレクサ、及びその製造方法 |
WO2017051681A1 (ja) * | 2015-09-24 | 2017-03-30 | ミツミ電機株式会社 | 圧電素子及びその製造方法、圧電アクチュエータ |
EP3340325A4 (en) * | 2015-09-24 | 2018-10-10 | Mitsumi Electric Co., Ltd. | Piezoelectric element, method for producing same and piezoelectric actuator |
JP2018037906A (ja) * | 2016-08-31 | 2018-03-08 | 太陽誘電株式会社 | 圧電薄膜共振器、フィルタおよびマルチプレクサ。 |
Also Published As
Publication number | Publication date |
---|---|
US20090261922A1 (en) | 2009-10-22 |
DE112007002969T5 (de) | 2009-09-24 |
US7924120B2 (en) | 2011-04-12 |
DE112007002969B4 (de) | 2017-12-21 |
JP5018788B2 (ja) | 2012-09-05 |
JPWO2008090651A1 (ja) | 2010-05-13 |
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