ATE535055T1 - Piezoelektrischer dünnfilmresonator - Google Patents

Piezoelektrischer dünnfilmresonator

Info

Publication number
ATE535055T1
ATE535055T1 AT06702677T AT06702677T ATE535055T1 AT E535055 T1 ATE535055 T1 AT E535055T1 AT 06702677 T AT06702677 T AT 06702677T AT 06702677 T AT06702677 T AT 06702677T AT E535055 T1 ATE535055 T1 AT E535055T1
Authority
AT
Austria
Prior art keywords
piezoelectric thin
thin film
substrate
film resonator
film
Prior art date
Application number
AT06702677T
Other languages
English (en)
Inventor
Hidetoshi Fujii
Original Assignee
Murata Manufacturing Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co filed Critical Murata Manufacturing Co
Application granted granted Critical
Publication of ATE535055T1 publication Critical patent/ATE535055T1/de

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
    • H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
    • H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
    • H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/173—Air-gaps
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02007—Details of bulk acoustic wave devices
    • H03H9/02086—Means for compensation or elimination of undesirable effects
    • H03H9/02133—Means for compensation or elimination of undesirable effects of stress

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Piezo-Electric Transducers For Audible Bands (AREA)
AT06702677T 2005-02-21 2006-01-12 Piezoelektrischer dünnfilmresonator ATE535055T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005043591 2005-02-21
PCT/JP2006/300309 WO2006087878A1 (ja) 2005-02-21 2006-01-12 圧電薄膜共振子

Publications (1)

Publication Number Publication Date
ATE535055T1 true ATE535055T1 (de) 2011-12-15

Family

ID=36916289

Family Applications (1)

Application Number Title Priority Date Filing Date
AT06702677T ATE535055T1 (de) 2005-02-21 2006-01-12 Piezoelektrischer dünnfilmresonator

Country Status (5)

Country Link
US (1) US7642695B2 (de)
EP (1) EP1852974B1 (de)
JP (1) JP4442689B2 (de)
AT (1) ATE535055T1 (de)
WO (1) WO2006087878A1 (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2895986B1 (fr) * 2006-01-06 2008-09-05 Centre Nat Rech Scient Preparation de microcomposants multicouches par la methode de la couche epaisse sacrificielle
JP5018788B2 (ja) * 2007-01-24 2012-09-05 株式会社村田製作所 圧電共振子及び圧電フィルタ
US20090194157A1 (en) * 2008-02-01 2009-08-06 Guardian Industries Corp. Front electrode having etched surface for use in photovoltaic device and method of making same
JP2011018723A (ja) * 2009-07-08 2011-01-27 Seiko Epson Corp 圧電素子およびその製造方法、圧電アクチュエーター、液体噴射ヘッド、並びに、液体噴射装置
US7911113B1 (en) * 2009-09-02 2011-03-22 Ngk Insulators, Ltd. Piezoelectric/electrostrictive element and method of manufacturing piezoelectric/electrostrictive element
JP5478180B2 (ja) * 2009-09-30 2014-04-23 太陽誘電株式会社 フィルタ
KR101928359B1 (ko) 2012-09-11 2018-12-12 삼성전자주식회사 전도성 물질을 이용하여 전기적 손실을 처리하는 공진 장치 및 그 제조 방법
JP6260858B2 (ja) * 2013-12-17 2018-01-17 株式会社リコー 電気機械変換素子の製造方法、電気機械変換素子、液滴吐出ヘッド及び画像形成装置
US10396755B2 (en) * 2016-02-17 2019-08-27 Samsung Electro-Mechanics Co., Ltd. Resonator having frame and method of manufacturing the same
US10062845B1 (en) * 2016-05-13 2018-08-28 Crossbar, Inc. Flatness of memory cell surfaces
US10522754B2 (en) 2016-06-15 2019-12-31 Crossbar, Inc. Liner layer for dielectric block layer
US10749110B1 (en) 2016-07-15 2020-08-18 Crossbar, Inc. Memory stack liner comprising dielectric block layer material
JP6556113B2 (ja) * 2016-12-21 2019-08-07 太陽誘電株式会社 圧電薄膜共振器、フィルタおよびマルチプレクサ
JP6923365B2 (ja) * 2017-06-08 2021-08-18 太陽誘電株式会社 弾性波デバイス
CN114583044B (zh) * 2020-11-18 2025-05-13 京东方科技集团股份有限公司 一种压电元件、压电振动器及其制作方法、电子设备
WO2025243718A1 (ja) * 2024-05-23 2025-11-27 株式会社村田製作所 弾性波装置
WO2025241033A1 (en) * 2024-05-24 2025-11-27 Ecole De Technologie Superieure High-performance microelectromechanical systems resonators for timing and frequency reference applications

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Publication number Priority date Publication date Assignee Title
JPS60189307A (ja) 1984-03-09 1985-09-26 Toshiba Corp 圧電薄膜共振器およびその製造方法
JPS61218214A (ja) 1985-03-25 1986-09-27 Toshiba Corp 圧電薄膜共振子
JPH0640611B2 (ja) 1985-03-25 1994-05-25 株式会社東芝 圧電薄膜共振子
JPS6367910A (ja) 1986-09-10 1988-03-26 Fujitsu Ltd 圧電薄膜共振子
JPH05343943A (ja) * 1992-06-11 1993-12-24 Tdk Corp 圧電部品及びその製造方法
JPH08148968A (ja) 1994-11-24 1996-06-07 Mitsubishi Electric Corp 薄膜圧電素子
JPH08186467A (ja) 1994-12-29 1996-07-16 Murata Mfg Co Ltd 拡がり振動型圧電振動子およびその製造方法
JPH09130199A (ja) 1995-10-27 1997-05-16 Mitsubishi Electric Corp 圧電薄膜素子およびその製法
WO1998052280A1 (en) 1997-05-13 1998-11-19 Mitsubishi Denki Kabushiki Kaisha Piezoelectric thin film device
US5910756A (en) * 1997-05-21 1999-06-08 Nokia Mobile Phones Limited Filters and duplexers utilizing thin film stacked crystal filter structures and thin film bulk acoustic wave resonators
FI107660B (fi) 1999-07-19 2001-09-14 Nokia Mobile Phones Ltd Resonaattorirakenne
US6441539B1 (en) 1999-11-11 2002-08-27 Murata Manufacturing Co., Ltd. Piezoelectric resonator
JP3514222B2 (ja) * 1999-11-17 2004-03-31 株式会社村田製作所 圧電共振子、電子部品及び電子機器
JP3611198B2 (ja) 2000-02-16 2005-01-19 松下電器産業株式会社 アクチュエータとこれを用いた情報記録再生装置
JP3636301B2 (ja) 2000-12-13 2005-04-06 セイコーエプソン株式会社 インクジェット式記録ヘッド
US6869170B2 (en) 2000-10-16 2005-03-22 Seiko Epson Corporation Ink-jet recording head having a vibration plate prevented from being damaged and ink-jet recording apparatus for using the same
JP3491688B2 (ja) 2000-10-16 2004-01-26 セイコーエプソン株式会社 インクジェット式記録ヘッド
US6424237B1 (en) * 2000-12-21 2002-07-23 Agilent Technologies, Inc. Bulk acoustic resonator perimeter reflection system
JP3949990B2 (ja) * 2002-03-29 2007-07-25 株式会社東芝 電圧制御発振器
KR100541895B1 (ko) * 2001-09-21 2006-01-16 가부시끼가이샤 도시바 고주파 필터
JP2003163566A (ja) * 2001-11-22 2003-06-06 Toshiba Corp 薄膜圧電共振器及びその製造方法
JP3854212B2 (ja) * 2002-03-29 2006-12-06 株式会社東芝 高周波フィルタ

Also Published As

Publication number Publication date
WO2006087878A1 (ja) 2006-08-24
EP1852974A1 (de) 2007-11-07
EP1852974B1 (de) 2011-11-23
JPWO2006087878A1 (ja) 2008-07-03
EP1852974A4 (de) 2010-01-20
US7642695B2 (en) 2010-01-05
JP4442689B2 (ja) 2010-03-31
US20070278899A1 (en) 2007-12-06

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