Classifications

• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02041—Cleaning
  • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
  • H01L21/02052—Wet cleaning only
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
  • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
  • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
  • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/16—Organic compounds
  • C11D3/20—Organic compounds containing oxygen
  • C11D3/2003—Alcohols; Phenols
  • C11D3/2006—Monohydric alcohols
  • C11D3/2017—Monohydric alcohols branched
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/16—Organic compounds
  • C11D3/20—Organic compounds containing oxygen
  • C11D3/2093—Esters; Carbonates
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
  • C11D3/43—Solvents
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/22—Organic compounds
  • C11D7/26—Organic compounds containing oxygen
  • C11D7/261—Alcohols; Phenols
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/50—Solvents
  • C11D7/5004—Organic solvents
  • C11D7/5022—Organic solvents containing oxygen
• • H—ELECTRICITY
  • H01—ELECTRIC ELEMENTS
  • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
  • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
  • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
  • H01L21/02041—Cleaning
  • H01L21/02057—Cleaning during device manufacture
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
  • C11D2111/10—Objects to be cleaned
  • C11D2111/14—Hard surfaces
  • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
• • C—CHEMISTRY; METALLURGY
  • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
  • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
  • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
  • C11D7/22—Organic compounds
  • C11D7/26—Organic compounds containing oxygen
  • C11D7/266—Esters or carbonates
• • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
  • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
  • Y10S134/00—Cleaning and liquid contact with solids
  • Y10S134/902—Semiconductor wafer

Definitions

• the present invention relates to the use of select solvents and/or solvent blends for semiconductor wafer cleaning and drying.
• drying techniques include spin drying, IPA (isopropyl alcohol) drying and Marangoni drying. It has been found the wafer cleaning by immersion or soaking of the wafer in deionized water (DI water); followed by drying of the wafer using IPA is effective in removing both particles and surface electrostatic charges from the wafer. See U.S. Patent No. 6,926,590 Bl. All of the drying techniques utilize some form of a moving liquid/gas interface on a wafer surface, which, if properly maintained, results in drying of a wafer surface without the formation of droplets. Unfortunately, if the moving liquid/gas interface breaks down, as often happens with all of the drying methods, droplets form and evaporation occurs resulting in contaminants being left on the wafer surface. See U.S. Patent No. 6,616,772 B2.
• a typical wafer cleaning process consists of a DI water spray followed by a spin dry and nitrogen gas blow dry step.
• the solvent drying technology utilizes the use of isopropyl alcohol (IPA).
• IPA isopropyl alcohol
• the IPA vapor drying process is normally controlled by three major elements, i.e. the purity and water content of IPA; the flow rate and flow speed of the IPA vapor; and the cleanliness of the IPA vapor.
• the improved solvent drying technique in the past few years is Marangoni drying.
• the drying principal is based on the different surface tension of IPA and DI water.
• the different surface tension causes the reduction of water molecules at the wafer surface.
• the Marangoni drying process is carried out by slowly withdrawing the wafer from a DI water tank.
• IPA vapor carried by N 2 carrier gas is directed into the water chamber where IPA interacts at the water surface and diffuses into the water such that IPA is saturated on the exposed wafer surface above the water level. Since the concentration of IPA on the surface of the exposed wafer is larger than the concentration of DI water, the surface tension of IPA is reduced as compared to the surface tension of water in the water tank.
• the present invention focuses on the novel use of non-traditional semiconductor solvents to remove residual ionic, moisture, and particle contamination through the use of screening tests conducted with laboratory models.
• a first embodiment of the present invention concerns a method of solvent cleaning a semiconductor wafer using solvents comprising one or more esters selected from structures I, II, or III:
• R-CO 2 Ri (I), R 2 -CO 2 C 2 H 4 OC 2 H 4 -OR 3 (II), R 4 OCO 2 R 5 (III); wherein R 5 R 15 R 25 R 35 R 4 , and R 5 are independently selected from C 1 - C 8 - alkyl groups; optionally one or more cosolvents selected from water or compounds of structures IV 5 V, VI and VII:
• Another embodiment of the invention concerns a method of solvent cleaning a semiconductor wafer uses a specific ester of structure I as described above, wherein R and Ri are independently selected from Cj - C 2 alkyl groups; optionally one or more cosolvents selected from water or compounds of structures IV 5 V, VI and VII as defined previously.
• Another embodiment of the invention concerns a method of solvent cleaning a semiconductor wafer uses an ester or solvent blend of ester: cosolvent, wherein the ester portion comprises 0-100 weight percent of methyl acetate and the cosolvent portion comprises 0-100 weight percent and the cosolvent is selected from structures IV, V, VI and VII, wherein some ester portion is present.
• the ester portion comprises about 10, 20, 30, 40, 50, 60, 70, 80, or 90 weight percent of methyl acetate and the cosolvent portion comprises about 10, 20, 30, 40, 50, 60, 70, 80, or 90 weight percent.
• the ester portion can comprise about 75 weight percent or greater while the cosolvent portion comprises about 25 weight percent or less.
• Yet another embodiment of the invention concerns a method of solvent cleaning a semiconductor wafer uses an ester or solvent blend of ester: cosolvent, wherein the ester portion comprises 75-100 weight percent of methyl acetate and the cosolvent portion comprises 0-25 weight percent and the cosolvent is selected from structures IV, V, VI and VII.
• Still a further embodiment of the invention concerns a method of solvent cleaning a semiconductor wafer uses solvents comprising one or more esters selected from structures I, II, or III:
• R 5 R 15 R 25 R 35 R 4 , and R 5 are independently selected from Ci - C 8 - alkyl groups; optionally one or more cosolvents selected from water or compounds of structures
• Another embodiment concerns a method for using solvent blends according to the embodiments described above for cleaning semiconductor wafers in typical immersion tool (wet bench) or other devices designed for cleaning and drying of semiconductor wafers.
• This invention relates to the use of select solvents and/or solvent blends for semiconductor wafer cleaning and drying to more efficiently remove contaminants from wafer surfaces while offering economic and performance advantages by simplifying the manufacturing process and improving productivity.
• Contamination prevention has been explored with solvents such as isopropanol (IPA) as a means to model the effectiveness of drying and elimination of water spots [J. Marra and J. Huethorst, Langmuir, Vol. 7, p. 2748-2763 (1991)].
• Wafer cleaning and drying has been observed to be enhanced by a surface-tension gradient at the interface through IPA vapor absorption. Solvent drying processes also prevent the formation of static electricity on the wafer, and thus, prevent the adherence of small charged particles to the wafer.
• the invention focuses on the novel use of non-traditional semiconductor solvents and their physical properties to remove residual ionic, moisture, and particle contamination through the use of screening tests conducted with laboratory models.
• the invention introduces the use of esters such as methyl acetate and blends with cosolvents such as IPA, and additives to be used as an alternative to the use of IPA for cleaning, rinse and drying applications.
• Methyl acetate exhibits different physical properties to that of IPA which may contribute to these measured benefits.
• the laboratory models are based upon immersion conditions, the benefits identified should produce similar trends in a batch or single wafer spray condition, commonly practiced in a wafer cleaning tool used in semiconductor manufacturing.
• C 1 - C 2 -alkyl is used to describe hydrocarbon groups containing one or two carbon atoms.
• Ci - C 6 -alkyl is used to describe hydrocarbon groups containing one to six carbon atoms, straight or branched chain, optionally substituted with aryl.
• Ci - C 8 -alkyl is used to describe hydrocarbon groups containing one to eight carbon atoms, straight or branched chain, optionally substituted with C 1 - C 8 - alkoxy, Ci - Cg -alkanoyloxy, or hydroxyl.
• C 1 - C 20 -alkyl is used to describe hydrocarbon groups containing one to twenty carbon atoms, straight or branched chain, optionally substituted with C 1
• C 3 -C 8 -cycloalkyl is used to describe cycloaliphatic hydrocarbon radical containing three to eight carbon atoms.
• aryl is used to describe a phenyl or naphthyl radical optionally substituted with one or more Ci - C 20 -alkyl groups.
• C 1 - C 8 -alkoxy is used to describe a Ri 6 - O - group, wherein the C 1
• Ci - C 8 -alkanoyloxy is used to describe the group Ri 6 - CO 2 -, wherein Ri 6 represents a Ci - C 8 -alkyl as previously defined.
• Ci - C 20 -alkoxy and Ci to C 20 alkanoyloxy represent structures Ri 7
• Rj 7 is a Ci - C 20 -alkyl group as previously defined.
• nonionic surfactant is used to describe any surface tension modifying compounds, particularly including neutral ethoxylated organic compounds substituted with fluorine.
• An embodiment of the present invention concerns a method for cleaning a semiconductor wafer.
• the method includes contacting the wafer with at least one solvent having, one or more esters selected from the group consisting of structures (I) R-CO 2 Ri, (H) R 2 -CO 2 C 2 H 4 OC 2 H 4 -OR 3 , and (III) R 4 OCO 2 R 5 , wherein R 5 Ri 5 R 25 R 35 R 4 , and R 5 are independently selected from Ci - C 8 - alkyl groups, and optionally one or more cosolvent(s) selected from water and the group consisting of structure (IV) R 6 OH 5 (V) R 7 OC 2 H 4 OC 2 H 4 OH 5 (VI) R 8 OC 2 H 4 OH, and (VII) R 9 COR 10 ; wherein R 6 , R 7 , R 8 , R 9 , and Rio are independently selected from Ci - Cg - alkyl groups.
• the solvent can include (I) R-CO 2 Ri 5 wherein R and Ri are independently selected from Ci - C 2 alkyl groups, and optionally one or more of said cosolvents. In one example, R and Ri are both methyl.
• Another embodiment includes contacting the wafer with an ester or a solvent blend of an ester and cosolvent, wherein the ester portion comprises about 0-100 weight percent of methyl acetate and the cosolvent portion includes about 0-100 weight percent and the cosolvent is selected from water and the group consisting of structure (IV) R 6 OH, (V) R 7 OC 2 H 4 OC 2 H 4 OH, (VI) R 8 OC 2 H 4 OH, and (VII) R 9 CORi 0 ; wherein R 6 , R 7 , R 8 , R 9 , and Ri 0 are independently selected from C 1 - Cg - alkyl groups, wherein some ester portion is present.
• the ester portion is methyl acetate and can be about 10, 20, 30, 40, 50, 60, 70, 80, or 90 weight percent and the cosolvent portion can include about 10, 20, 30, 40, 50, 60, 70, 80, or 90 weight percent. Also, the ester portion is about 75 weight percent or greater while the cosolvent portion is about 25 weight percent or less.
• Yet another embodiment includes contacting the wafer with an ester or a solvent blend of and ester and cosolvent, wherein the ester portion includes 75-100 weight percent of methyl acetate and the cosolvent portion includes 0-25 weight percent and the cosolvent is selected from water and the group consisting of structure (IV) R 6 OH, (V) R 7 OC 2 H 4 OC 2 H 4 OH, (VI) R 8 OC 2 H 4 OH, and (VII) R 9 COR 10 ; wherein R 6 , R 7 , R 8 , R 9 , and Ri 0 are independently selected from Ci - C 8 - alkyl groups.
• Another embodiment includes contacting the wafer with at least one solvent including one or more esters selected from the group consisting of structures (I) R- CO 2 R 1 , (II) R 2 -CO 2 C 2 H 4 OC 2 H 4 -OR 3 , and (III) R 4 OCO 2 R 5 ; wherein R 5 Rj 5 R 25 R 35 R 4 , and R 5 are independently selected from Ci - C 8 - alkyl groups; and optionally one or more cosolvent(s) selected from water and the group consisting of structure (IV) R 6 OH, (V) R 7 OC 2 H 4 OC 2 H 4 OH 5 (VI) R 8 OC 2 H 4 OH 5 and (VII) R 9 CORi 0 ; wherein R 6 , R 7 , R 8 , R 9 , and R 10 are independently selected from C 1 - C 8 - alkyl groups; and one or more additional compound(s) selected from the group consisting of (1) a sulfonic acid compound having structure Ri 1 SO
• the additional compound is present in an amount of 0.001 to 1.0 weight percent.
• a non-exhaustive list of solvents useful in the present invention includes methyl acetate, ethyl acetate, methyl propionate, iso-propyl acetate, n-propyl acetate, iso-butyl acetate, n-butyl acetate, ethyl propionate, n-butyl propionate, methyl iso- butyrate, n-butyrate, isobutyl isobutyrate, 2-ethylhexyl acetate, ethylene glycol butyl ether acetate, diethylene glycol ether acetate, diethylene glycol butyl acetate, propylene glycol methyl ether acetate, ethylene glycol propyl ether, ethylene glycol butyl ether, ethylene glycol 2 ethylhexyl ether, diethylene glycol methyl ether, diethylene glycol
• a non-exhaustive list of co-solvents useful in the presently described method includes methyl acetate, ethyl acetate, methyl propionate, iso-propyl acetate, n-propyl acetate, iso-butyl acetate, n-butyl acetate, ethyl propionate, n-butyl propionate, methyl iso-butyrate, n-butyrate, isobutyl isobutyrate, 2-ethylhexyl acetate, ethylene glycol butyl ether acetate, diethylene glycol ether acetate, diethylene glycol butyl acetate, propylene glycol methyl ether acetate, ethylene glycol propyl ether, ethylene glycol butyl ether, ethylene glycol 2 ethylhexyl ether, diethylene glycol methyl ether, diethylene glycol ethyl ether, diethylene glycol propyl
• the presently described method can be used in known semiconductor cleaning system such as immersion tool (wet bath) systems and other devices used for cleaning and drying semiconductor wafers.
• Porous substrates for moisture testing are inert micro- or nano-porous ceramic substrates composed of SiO 2 , Al 2 O 3 , ZrO, and related materials stable to 1000 0 C. Two substrates are chosen having a pore size distribution of 300-800nm (0.3-0.8um) and 5-lOum, P/N PS500 & PS5u, HP Technical Ceramics, Sheffield, United Kingdom (www.tech-ceramics.co.uk).
• the particles used are silica-based derived from two sources, namely, 1) SPHEROTMsilica particles, 0.4-0.6um and 3.0- 3.9um sizing, P/N SIP-05-10 & SIP-30-10, Spherotech, Inc., Libertyville,IL, and 2) Silica particles, 5um, cat.# 9005, Duke Scientific, Inc., Fremont, CA.
• Stock solutions of each are dispersions of the said particles in a solvent matrix of methyl acetate/isopropyl alcohol between 1:1 to 1 :3, depending upon the spin-coating program used.
• the solvents used included isopropyl alcohol (IPA), acetone, methyl n-amyl ketone (MAK, CAS# 110-43-0), ethylene glycol monopropyl ether (EP, CAS# 2807- 30-9), 2-(2-ethoxyethoxy) ethyl acetate (DEA, CAS# 112-15-2), and 2-(2- butoxyethoxy) ethanol (DB, CAS# 112-34-5), available from Eastman Chemical Company.
• Three (3) additives are used to include 1) an organic sulfonic acid as dodecylbenzenesulfonic acid (DDBSA, CAS# 68484-22-5), Aldrich Chemical
• Ionics as K are analyzed by a Plasma Quad 3 (PQ3) ICP-MS. Particle dispersions are achieved using standard stir-bar mixing or enhanced with an ultrasonic @ 40 kHz transducer. Silicon 100mm wafers are coated with KCl or particulate stock solution by spin-coating using a Brewer Science CB-100 coating system. Moisture is measured as % water using a standard Metrohm autotitrator that conducts a Karl Fischer (KF) iodimetric reaction monitored with a specialized electrode. Moisture is driven from the sample using a custom outgas cell designed for a wide temperature range with a nitrogen carrier gas. Units of ppm moisture are reported based upon an initial weight of the sample.
• PQ3 ICP-MS Plasma Quad 3
• Particle measurement is conducted in-situ on the wash liquid with a laser scattering equipment manufactured by Particle Measuring Systems (www.pmeasuring.com). Units of particles per ml are reported in distributive and cumulative formats based upon the size exclusion of the particle distribution taken down to 0.05 ⁇ m.
• Methodology Standard Ionic and particle specimens are coated individually onto wafers using a low rpm (revolution per minute) program to enhance volatility and maintain the total delivered amount on the wafer without edge loss.
• rpm repetition per minute
• the amount is delivered puddle and the CBlOO program run at OOOrpm for 60sec followed by a ramp to 500rpm and completion at lOOOrpm.
• the wafer is immersed into 100ml of the test fluid (solvent) contained in a custom designed wafer wash vessel (WWV), then mildly agitated for 60sec. This agitation, described as simple X-Y movement, is performed on every wafer in the entire experiment.
• the wafer is removed, drained of free-flowing liquid, and immediately sent into another WWV with 100ml of the final wash with deionized water (DI), immersed for 60sec using the identical agitation as was given in the prior test fluid, and removed to be set aside for wafer recycle.
• DI deionized water
• the final wash is collected, diluted to a specific volume (100ml for ionics, 500ml for particles). Particle analysis occurs within 48hrs to minimize errors due to settling or bacteria formation.
• Moisture testing occurs with the porous substrates. Although the porosity may be similar, each substrate is a different size. The weight of each substrate is known based upon earlier measurements when immediately removed from an oven. The substrates are allowed to become saturated by immersion into DI water for >2hrs at room temperature.
• Results for the moisture removal of pure solvent are listed in Table 2.
• the moisture removal was determined by testing the wash residue on the porous substrates for residual moisture (ppm).
• ppm residual moisture
• acetone and methyl acetate suggest mild improvements for removal capacity as compared to IPA under identical conditions.
• the use of DEA and DB appears to give improved results compared to IPA.
• methyl acetate suggests improvement over IPA in removing ionics and moisture by a measured benefit of nearly 30% and 20% respectively. This may be applied to surface cleaning applications such as those used in Marangoni style cleans.
• Methyl acetate exhibits different physical properties to that of IPA which may contribute to measured benefits. Being a surface sensitive practice, agents with low contact angle are expected to perform best.
• Literature suggests similar contact angle values for IPA and methyl acetate; however methyl acetate exhibits significantly greater density over IPA. Increase in density is believed to manifest itself as exhibiting enhanced momentum in a liquid as it streams across a semiconductor wafer surface. The use of methyl acetate during a highly active spray clean operation in a wafer cleaning tool would translate to a density-based momentum increase and provide improved results.
• Table 3 shows ionic removal of methyl acetate/isopropyl alcohol blends measured as ppb. Again, the ionic removal was determined by testing the wash residue for potassium as previously described. Three compositions were evaluated, MA/IP A, 25/75 weight %, MA/IP A, 50/50 weight %, and a MA/IPA, 75/25 weight %. Data suggest improved ionic removal at the 50% and 75% methyl acetate composition levels.
• results for the moisture removal of methyl acetate/isopropyl alcohol blends are listed in Table 4.
• the moisture removal was determined by testing the wash residue on the porous substrates for residual moisture (ppm). Again, three compositions were evaluated, MA/IPA, 25/75 weight %, MA/IPA, 50/50 weight %, and a MA/IPA, 75/25 weight %. Data suggest improved moisture removal as the level of methyl acetate increased in the composition.
• the MA/IPA, 75/25 blend disclosed improvement over pure isopropyl alcohol and methyl acetate.
• Table 5 discloses ionic removal of pure solvents with an additive, measured as ppb. Again, the ionic removal was determined by testing the wash residue for potassium as previously described. Methyl acetate and isopropyl alcohol were individually evaluated with an acid, surfactant and quaternary ammonium salt. The additives were included at 100 and lOOOppm levels. Methyl acetate with a surfactant and acid shows greater than 50% improvement over pure isopropyl alcohol. This improvement is consistent with our previous statement about increased energy transfer by density based momentum in methyl acetate over IPA.
• Table 6 discloses moisture removal of pure solvents with an additive. Again, the moisture removal was determined by testing the wash residue on the porous substrates for residual moisture (ppm). Methyl acetate and isopropyl alcohol were individually evaluated with an acid, surfactant and quaternary ammonium salt. The additives were included at 100 and lOOOppm levels. Consistent with previous statements on moisture capture being governed by solubility, we find no benefit in trace additives to the pure solvent.
• methyl acetate exhibits dissimilar physical properties when compared to IPA. For example, the higher density of methyl acetate and its polar/non-polar properties over IPA penetrate and interact with the van der Waals attraction between particles, and allow material to be released from the substrate and mix with the bulk chemistry. These interactions appear to be demonstrated with 100% methyl acetate, a MA/IP A 75/25 blend, and 75/25 MA/IPA blend with an acid and surfactant.
• Table 7 shows particle data results for these chemistries, measured as particle distribution in the cumulative mode. Sample results reveal a minimum of 40% and greater than 80% benefit in particle removal vs. IPA. Similar to ionic contamination, removal of particles is also believed to be governed by phenomenon described in our previous statement involving increased energy transfer by density based momentum increase.
• methyl acetate or methyl acetate-blends and additives discussed here are applied to Marangoni type cleans
• the chemistry's reduced water solubility (approximately 20%) and limited water concentration in an azeotrope (i.e. 5%) may force a quasi-emulsion to occur at the liquid-wafer surface.
• This emulsion would be expected to simulate the bulk solvent properties and revert to the low contact angle and surface tension of the pure solvent. Therefore, it is postulated that for low concentrations of methyl acetate or blends noted in this paper may concentrate at the surface of the DI wash fluid and force a heighted surface interaction to remove ionics, moisture, and particles, therefore providing a much cleaner wafer surface.

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