WO2008066129A1 - Appareil d'analyse, procédé d'analyse, système d'analyse de prise d'image, procédé de fabrication d'un filtre coloré, et programme d'analyse - Google Patents

Appareil d'analyse, procédé d'analyse, système d'analyse de prise d'image, procédé de fabrication d'un filtre coloré, et programme d'analyse Download PDF

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Publication number
WO2008066129A1
WO2008066129A1 PCT/JP2007/073093 JP2007073093W WO2008066129A1 WO 2008066129 A1 WO2008066129 A1 WO 2008066129A1 JP 2007073093 W JP2007073093 W JP 2007073093W WO 2008066129 A1 WO2008066129 A1 WO 2008066129A1
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WIPO (PCT)
Prior art keywords
color filter
inspection
processing
dimensional projection
distribution information
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PCT/JP2007/073093
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English (en)
Japanese (ja)
Inventor
Takeshi Murakami
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Sharp Kabushiki Kaisha
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Publication of WO2008066129A1 publication Critical patent/WO2008066129A1/fr

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/30—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces
    • G01B11/306—Measuring arrangements characterised by the use of optical techniques for measuring roughness or irregularity of surfaces for measuring evenness
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/958—Inspecting transparent materials or objects, e.g. windscreens

Definitions

  • Inspection device Inspection device, inspection method, imaging inspection system, color filter manufacturing method, inspection program
  • the present invention relates to an inspection apparatus for inspecting display members such as color filters.
  • a color filter for color display is one of the important components that affect display quality. For this reason, the quality required for color filters has become higher.
  • the ink is formed by ejecting R (red), G (green) and ⁇ (blue) ink from the nozzles of the inkjet head to each picture element.
  • the characteristics of the ink jet method are that the number of processes is reduced and the waste of ink is reduced, so that the process can be shortened and the cost can be reduced.
  • Patent Document 1 Japanese Published Patent Publication “Japanese Unexamined Patent Publication No. 2006-184125 (Publication Date: July 13, 2006)”
  • the color filter inspection apparatus disclosed in Patent Document 1 can detect stripes on the color finerator but cannot detect the periodicity of the stripes. For this reason, the cause of the occurrence of streak cannot be identified, and when manufacturing a color filter, the cause of the occurrence of streak cannot be fed back, so it is difficult to improve quality.
  • the present invention has been made in view of the above problems, and an object of the present invention is the presence or absence of periodicity of unevenness (straight lines) generated on the surface of a display member such as a color filter that is an object to be inspected. This is to realize an inspection device that can make this determination.
  • an inspection apparatus performs inspection of a display member based on captured image data obtained by imaging an inspection symmetry plane irradiated with light on the display member.
  • a one-dimensional projection processing unit that performs one-dimensional projection processing with respect to the light distribution information included in the captured image data, with an arbitrary direction as a projection direction, and the one-dimensional projection processing unit. It comprises a periodic analysis processing means for performing periodic analysis of the processed light distribution information.
  • the inspection method according to the present invention is based on captured image data obtained by imaging the inspection symmetry plane irradiated with light of the display member.
  • a first step of performing one-dimensional projection processing with an arbitrary direction as a projection direction on the light distribution information included in the captured image data and the first And a second step of performing periodic analysis of the light distribution information after the one-dimensional projection processing obtained by the step!
  • the one-dimensional projection processing means performs one-dimensional projection processing on the two-dimensional light distribution information in the captured image data, thereby obtaining light distribution information in the projection direction in the captured image. be able to. Then, by performing periodic analysis of the light distribution information in the projection direction in the captured image by the periodic analysis processing means, the period of the light distribution in the projection direction in the captured image can be determined from the periodic analysis result.
  • the display member is a color filter
  • a high-quality color filter can be obtained by changing the manufacturing process so as to eliminate the uneven stripes.
  • the period analysis processing means may perform a Fourier transform on the light distribution information.
  • the periodic analysis processing unit obtains a periodic function of the light distribution information by performing Fourier transform on the light distribution information subjected to the one-dimensional projection processing by the one-dimensional projection processing unit. be able to.
  • the operator can easily determine the presence or absence of periodic irregularities on the surface of the display member visually.
  • the periodic function is obtained by using Fourier transform, the periodic function force, the smoothing period, and the like can be obtained.
  • the inspection apparatus having the above-described configuration further includes a finoletering processing unit that performs filtering processing on the light distribution information subjected to the one-dimensional projection processing by the one-dimensional projection processing unit using a filter of an arbitrary size.
  • the period analysis processing means is connected to the filtering processing means. Therefore, periodic analysis of the filtered light distribution information may be performed.
  • the light distribution information after the one-dimensional projection processing obtained by the first step is further obtained between the first step and the second step.
  • a filtering process step for performing a filtering process with a filter of an arbitrary size is provided, and the second step performs a periodic analysis of the light distribution information after the filtering process obtained by the filtering process step. Good.
  • the light distribution information subjected to the one-dimensional projection processing by the filtering processing means is subjected to filtering processing by a filter of an arbitrary size, so that the analysis means in the subsequent stage can perform filtering from the filter size. Therefore, it is possible to suppress the period of stripes with a large width, and to extract the period of stripes with a width smaller than the filter size.
  • the filtering processing in the filtering processing circuit is preferably a morphology processing.
  • the filtering processing in the filtering processing circuit is preferably smoothing processing.
  • the filtering processing circuit includes a smoothing processing circuit that performs smoothing processing on the light distribution information that has been subjected to the one-dimensional projection processing by the one-dimensional projection processing means, and smoothing by the smoothing processing circuit.
  • a morphology processing circuit that performs a morphology process on the processed light distribution information may be provided, and the light distribution information subjected to the morphology process by the morphology processing circuit may be output to the period analysis processing means.
  • the filtering processing circuit includes a morphology processing circuit that performs morphology processing on the light distribution information that has been one-dimensionally projected by the one-dimensional projection processing means, and light that has undergone the morphology processing by the morphology processing circuit.
  • a smoothing processing circuit that performs a smoothing process on the distribution information may be provided, and the light distribution information smoothed by the smoothing processing circuit may be output to the periodic analysis processing means.
  • the light component subjected to the one-dimensional projection processing by the one-dimensional projection processing means By applying two types of filtering processing, which are different in smoothing processing and morphology processing, to the fabric information, even if it is a period of stripes with a width that could not be filtered or emphasized, it can be compensated on the other side. it can. As a result, it is possible to easily determine the presence or absence of stripe irregularity and to specify the stripe unevenness period.
  • the inspection apparatus can be applied to an imaging inspection system as described below.
  • the illumination device that irradiates light on the front surface or the back surface of the display member, and the display member is irradiated with the light in a state irradiated with light! /
  • an inspection apparatus having the above-described configuration for inspecting the display member based on captured image data imaged by the imaging apparatus.
  • the color filter manufacturing method of the present invention is a color filter manufacturing method for manufacturing a color filter by a color filter manufacturing apparatus in order to solve the above-described problems, and the period according to the inspection method described above. Only color filters determined to be non-defective as a result of the analysis are used in the manufacturing process after the inspection process in the color filter manufacturing apparatus.
  • the color filter determined as a non-defective product as a result of the periodic analysis (determined that the stripes have no periodicity). Since only the color filter) is used in the color filter manufacturing process after the inspection process, the color filter having a stripe irregularity does not go through the process after the inspection process. Therefore, since the defective color filter is not produced in vain, the yield S of the color filter can be improved and the manufacturing cost of the color filter can be reduced.
  • a color filter manufacturing method of the present invention is a color filter manufacturing method for manufacturing a color filter by a color filter manufacturing apparatus in order to solve the above-described problems, and is a result of periodic analysis by the above-described inspection method.
  • a color filter determined to be a defective product is generated, information indicating that the defective product is generated is transmitted to the color filter manufacturing apparatus.
  • FIG. 1, showing an embodiment of the present invention is a block diagram showing a main configuration of an image analysis apparatus.
  • FIG. 2 is a diagram showing an outline of an imaging inspection apparatus using the image analysis apparatus shown in FIG.
  • FIG. 3 is a diagram showing a manufacturing process of a color filter as an object to be inspected.
  • FIG. 4 is a diagram showing an image obtained by imaging a color filter by the imaging apparatus of the imaging inspection apparatus shown in FIG. 2.
  • FIG.5 One-dimensional projection processing is performed from the two-dimensional luminance distribution information obtained from the image shown in Fig.4.
  • FIG. 6 is a graph showing the result of performing Fourier transform on the data of the graph shown in FIG.
  • FIG. 7 is a flowchart showing a process flow of a manufacturing process of a color filter substrate.
  • FIG. 8, showing another embodiment of the present invention is a block diagram showing a main configuration of an image analysis apparatus.
  • FIG. 9 (a) is a graph showing the state of morphology processing by the morphology processing circuit of the image analysis apparatus shown in FIG.
  • FIG. 9 (b) is a graph showing the state of morphology processing by the morphology processing circuit of the image analysis device shown in Fig. 8.
  • FIG. 10 is a flowchart showing a flow of an inspection method using the image analysis apparatus shown in FIG.
  • FIG. 11 is a graph showing the result of the morphology processing with the filter size set to fl pixels with respect to the result of the one-dimensional projection processing in the image analysis apparatus shown in FIG.
  • FIG. 12 is a graph showing the result of performing Fourier transform on the data in the graph of FIG.
  • FIG. 13 is a graph showing the result of the morphology processing with the filter size set to f2 pixels with respect to the result of the one-dimensional projection processing in the image analysis apparatus shown in FIG.
  • FIG. 14 is a graph showing the result of performing Fourier transform on the data of the graph of FIG.
  • FIG. 15, showing still another embodiment of the present invention is a block diagram showing a main configuration of an image analyzing apparatus.
  • FIG. 16 is a graph showing the result of smoothing processing with the finalizer size set to f3 pixels with respect to the result of the one-dimensional projection processing in the image analysis apparatus shown in FIG.
  • FIG. 17 is a graph showing the result of performing a Fourier transform on the data in the graph of FIG.
  • FIG. 18 shows still another embodiment of the present invention, and is a block diagram showing a main configuration of an image analysis apparatus.
  • FIG. 19 is a graph showing the result of morphological processing on the data of the graph of FIG. 16 with a filter size of f2 pixels.
  • FIG. 20 is a graph showing the result of performing Fourier transform on the data in the graph of FIG.
  • the display member refers to a member that is used in an image display device and transmits or reflects light or both.
  • a color filter formed by an inkjet method is described as an example of the display member.
  • a color filter refers to a filter that causes a display device to perform color display by passing light of a specific wavelength.
  • the color filter is formed by ejecting a liquid material by an ink jet method onto a glass substrate on which black matrix is formed.
  • black matrix and color filter are formed
  • the glass substrate in this state is called a color filter substrate.
  • FIG. 2 shows an outline of an imaging inspection system 300 that is an inspection apparatus of the present invention.
  • the imaging inspection system 300 inspects the color filter substrate 330 that is an object to be inspected, and irradiates the surface (color filter forming surface) of the color filter substrate 330 with light.
  • the camera (detection means) 320 includes an output means for outputting a captured image to the image analysis apparatus (inspection apparatus) 100.
  • the information output from the camera 320 is captured image information including luminance distribution information on the surface of the color filter substrate 330.
  • the luminance distribution information is information indicating a distribution state of luminance values in a predetermined area unit of the color filter substrate 330, for example, a pixel unit.
  • the information analyzed by the image analysis device 100 is output to the result output device 400 as unevenness period information described later. Details of the image analysis apparatus 100 will be described later.
  • the result output device 400 outputs data that can be confirmed by the operator based on the input unevenness period information, for example, graphed data, as result data.
  • the output result will be described later.
  • the color filter substrate 330 is formed as follows.
  • FIG. 3 is a diagram showing a part of the manufacturing process (manufacturing method) of the color filter substrate 330 and the discharging process of the liquid material of the color filter by the inkjet method.
  • the head unit 230 moves in the scanning direction (backward or frontward in the drawing) with respect to the glass substrate 220 on which the black matrix 210 is formed, and the ink jet nozzle 240 is liquid on the glass substrate 220 between the black matrix 210.
  • the material is sequentially discharged in the scanning direction.
  • the head unit 230 moves a predetermined distance in the direction orthogonal to the scanning direction (left and right in the drawing), and then again in the scanning direction (front or back in the drawing). ),
  • the inkjet nozzle 240 sequentially discharges the liquid material in the scanning direction.
  • stripes occur in the color filter at intervals of the head unit 230. Specifically, stripes occur in the scanning direction in units of the number of head units 230 arranged in the direction orthogonal to the scanning direction of nozzles 240, for example, in FIG.
  • FIG. 4 is a diagram showing an example of an image obtained by imaging the color filter substrate 330 with the camera 320 in a planar (two-dimensional) manner.
  • the stripe unevenness generated when the head unit 230 is used is shown.
  • the direction parallel to the stripe uneven direction is defined as the Y direction
  • the direction perpendicular to the stripe uneven direction is defined as the X direction.
  • the uneven stripe means unevenness recognized as a plurality of stripe-like unevenness on the color filter forming surface of the color filter substrate 330 due to the difference in film thickness. Therefore, the non-uniform direction refers to the longitudinal direction of the formed stripe.
  • the image analysis device 100 that is an inspection device uses the color from the two-dimensional luminance distribution information (light distribution information) extracted from the planar captured image of the color filter substrate 330 that is the object to be inspected. Information for determining the periodicity of stripes occurring in the color filter formed on the surface of the filter substrate 330 is provided.
  • FIG. 1 shows a schematic block diagram of an image analysis apparatus 100 that is an inspection apparatus according to the present embodiment.
  • the image analysis apparatus 100 captures image information obtained by the imaging inspection system 300. And a function for outputting to the result output device 400 as uneven period information.
  • the image analysis apparatus 100 includes a one-dimensional projection processing circuit (one-dimensional projection processing means) 110 that converts input two-dimensional luminance distribution information into one-dimensional luminance distribution information, and a primary Periodic analysis processing circuit (periodic analysis processing means) 120 that performs periodic analysis of the one-dimensional luminance distribution information converted by the original projection processing circuit 110, and for sending control signals including various commands to these processing circuits With CPU150.
  • a one-dimensional projection processing circuit one-dimensional projection processing means
  • periodic analysis processing means 120 that performs periodic analysis of the one-dimensional luminance distribution information converted by the original projection processing circuit 110, and for sending control signals including various commands to these processing circuits With CPU150.
  • the one-dimensional projection processing circuit 110 acquires captured image information from the imaging inspection system 300 in accordance with an instruction from the CPU 150.
  • the one-dimensional projection processing circuit 110 converts the two-dimensional luminance distribution information included in the acquired captured image information into one-dimensional luminance distribution information. Details of the one-dimensional projection processing by the one-dimensional projection processing circuit 110 will be described later. Further, according to the instruction of the CPU 150, the one-dimensional projection processing circuit 110 outputs the one-dimensional projection processing result to the periodic analysis processing circuit 120 at the subsequent stage.
  • the period analysis processing circuit 120 performs Fourier transform on the input one-dimensional luminance distribution information, and analyzes the periodicity of the one-dimensional luminance distribution information. Details of the period analysis processing by the period analysis processing circuit 120 will be described later. Further, in accordance with an instruction from the CPU 150, the cycle analysis processing circuit 120 outputs the Fourier analysis processing result to the subsequent result output device 400 as uneven cycle information.
  • the result output device 400 outputs the inputted unevenness period information in a form that is easy for a human to recognize, for example, a graph.
  • the operator looks at the output result and determines whether or not the stripes having periodicity are present in the color filter formed on the surface of the color filter substrate 330. Therefore, the result output from the result output device 400 may be in any form as long as it can be determined by the operator.
  • the reflected light from the imaging inspection system 300 is the thickness of the picture element of the color filter substrate 330 where the amount of reflected light is larger in the portion where the thickness of the picture element of the color filter substrate 330 is relatively larger than other regions. However, the amount of reflected light is smaller in a portion where is relatively smaller than other regions. This difference in the amount of reflected light is recognized as unevenness.
  • the difference in film thickness by the ink jet method is generally the head unit.
  • the head unit When a large difference in film thickness occurs in one line in the scanning direction of the image 230, stripes are observed in the image data picked up by the camera (detection means) 320.
  • FIG. 4 is a diagram illustrating an example of an image captured by the camera 320 serving as an imaging unit.
  • the one-dimensional projection processing circuit 110 performs one-dimensional projection processing with respect to the light distribution information included in the image data captured by the camera 320 (for example, FIG. 4) with an arbitrary direction as the projection direction. It has become.
  • the projection direction is a direction in which the luminance value is added along the above-described streak direction (direction in which one-dimensional projection processing is performed).
  • the Y direction parallel to the non-straight direction is taken in the captured image.
  • the arbitrary value is set as the Y direction, and the luminance value is averaged in the Y direction with respect to the image shown in FIG. One-dimensional distribution information.
  • the luminance distribution information of the captured image is represented as p. x
  • xy and y are the coordinate values in the X and Y directions, respectively. Using this, the luminance distribution information that is made one-dimensional can be obtained by calculating equation (1).
  • N is the number of data in the Y direction.
  • FIG. 5 is a graph showing the one-dimensional luminance distribution information obtained by the equation (1).
  • the vertical axis is the luminance value
  • the horizontal axis is the position of the X coordinate.
  • the unit of horizontal axis is pixel (pix).
  • the one-dimensional luminance distribution information obtained in this way is Fourier transformed by the period analysis processing circuit 120 at the subsequent stage.
  • the one-dimensional projection process a method of taking the average value of the luminance values is used.
  • the one-dimensional projection process may be any one that can convert two-dimensional data into one dimension. It is not restricted to this in particular. For example, it may be a method of integrating the luminance value in the Y direction! /, Or a method of adding the weight in the Y direction.
  • the Fourier transform performed in the period analysis processing circuit 120 is performed using Expression (2).
  • a frequency distribution can be obtained by performing Fourier transform using the above equation (2). Furthermore, if the inverse of the frequency is taken, the result can be a function of the period.
  • FIG. 6 is a graph showing the result of Fourier transform of the data one-dimensionally projected by the one-dimensional projection processing circuit 110 (the graph shown in FIG. 5) as it is.
  • the vertical axis shows the intensity of the spectrum.
  • the horizontal axis takes the reciprocal of the frequency, converts it to a period, and displays the logarithm.
  • the unit of the period is a pixel (pix).
  • the irregularity period information is output in the form of a graph or the like that can be recognized by the operator in the result output device 400, so that the operator can determine whether or not the irregularity of the stripes is semi-IJ. ! / Speak.
  • the determination of the presence or absence of periodic irregularities may be automatically performed based on the relationship between the spectrum and the period included in the unevenness period information that is not obtained by visual judgment by the operator.
  • the determination criterion information for example, the moving average of FIG. 6 is taken, and the vicinity of the moving average value (for example, a value obtained by multiplying the moving average value by 1.2 is set as the upper limit value and the moving average value is set).
  • the range (with a value multiplied by 8 as the lower limit) is used as the criterion information, and the presence or absence of spectral values that are out of this range! / There is a way to judge.
  • the presence or absence of the periodicity of stripes may be determined by various other methods.
  • a neighborhood value range including a cycle of stripe unevenness associated with the cause of occurrence of stripe unevenness and a range in the vicinity thereof is used as information to be registered in the determination criterion database. Then, the periodic force included in the unevenness period information is checked in order with respect to the registered period to determine whether it is included in the neighborhood value range of the period registered in the above criteria database. It is determined by whether or not it is included in the neighborhood value range. At this time, if it is determined that the period of the stripe unevenness included in the detected uneven period information is included in the neighborhood value range of the registered period, it is possible to identify the cause of the occurrence of the stripe unevenness of the period. it can.
  • the period is set to be expanded to the neighborhood value range because an error may occur due to the positional deviation of the head unit or other causes, and the range is set in consideration of the error.
  • the neighborhood value range is determined from the dimension error value of the mechanism such as the head, the nozzle, and the scanning stage, the operation error value, and the experience value.
  • the width of the stripe Information about this may be added to the determination reference database for determination.
  • the determination result may include information for specifying the cause of the occurrence of the uneven stripes in addition to the information indicating the presence or absence of the uneven stripe periodicity.
  • step S1 the step of executing the above-described color filter inspection method
  • step S3 the step of executing the above-described color filter inspection method
  • step S1 which is the preceding process, includes a black matrix manufacturing process and a color filter manufacturing process.
  • a negative acrylic photosensitive resin liquid in which carbon fine particles are dispersed is applied onto a glass substrate by spin coating, followed by drying! / ⁇ A black photosensitive resin layer is formed. Form. Subsequently, after the black photosensitive resin layer is exposed through a photomask, development is performed to form a black matrix (BM). For example, as shown in FIG. 3, a black matrix 210 is formed on a glass substrate 220. At this time, the opening for use in the color filter manufacturing process, which is the next process, that is, the opening for receiving the ink ejected from each nozzle 240 of the head unit 230 (the color of each color). The black matrix 210 is formed so as to form a filter.
  • the head unit 230 moves in the scanning direction (backward or frontward in the drawing) with respect to the glass substrate 220 on which the black matrix 210 is formed.
  • Inkjet nozzles 240 sequentially eject liquid materials on the glass substrate 220 between the black matrixes 210 in the scanning direction to form color filters on the glass substrate 220.
  • the black matrix 210 may be formed by ink jet or roller transfer. Moreover, you may perform a surface processing process as needed.
  • step S2 a color filter inspection process is executed (step S2).
  • this color filter inspection process uneven period information of the color filter is detected, and a non-defective product of the color filter is determined from the detection result.
  • the uneven cycle information includes the stripe irregularity periodicity information. It is assumed that at least the spectrum in the period is included.
  • the unevenness period information sent from the image analysis apparatus 100 which is the above-described inspection apparatus, includes the fact that the periodicity of stripes exists. If this is the case, the information contained in the irregularity period information is compared with the inspection reference information created and stored in advance, and the color filter processing (processing after the inspection process) is performed according to the comparison result. Change).
  • the inspection standard information may be registered in the above-described determination standard database, or may be registered in another database. If necessary, it can be registered in any database that can be read by the color filter manufacturing apparatus. /!
  • Changing the processing of the color filter means for example, a color value formed with a color finisher determined to be equal to or greater than the first predetermined value included in the spectral power included in the unevenness period information and the inspection standard information.
  • the filter substrate is discarded based on the inspected object processing change information created and stored in advance, and the color filter on which the color filter determined to be less than the first predetermined value and greater than or equal to the second predetermined value is formed. It is conveying a filter board
  • the color filter substrate on which the color filter determined to be less than the spectral value S included in the unevenness period information and the second predetermined value is determined to be a non-defective product, and the inspection process is performed. Then, it is conveyed to the next manufacturing process to be executed.
  • the color filter transported to the above-mentioned rework process is a color filter that is determined to be in a repairable state, and is reworked together with rework information including location information of abnormal points obtained in the color filter inspection process. After being transported to the process and repaired in this rework process, it is transported again to the inspection process and inspected.
  • the reworking process is included in the black matrix manufacturing process and the color filter manufacturing process in step S1 of the power filter substrate manufacturing process. In the rework process, there are cases of local repair that repairs only abnormal parts and full repair of the color filter substrate, repair of only the color filter, and repair of the black matrix and color filter. There are cases.
  • the color filter manufacturing process changes the manufacturing conditions in the color filter manufacturing process (for example, adjustment of ink ejection amount, head Change the moving speed of the unit, etc.) and manufacture the color filter. Furthermore, if it is determined in the color filter inspection process in step S2 that unevenness due to the inappropriate width of the black matrix has occurred, the black matrix manufacturing process is compared with the black matrix manufacturing process. Instruct the condition change (adjustment of photomask formation position to form black matrix, etc.).
  • the manufacturing conditions are changed according to the instructed contents, and the black matrix is manufactured.
  • the decision to change the manufacturing conditions based on the spectrum value and the judgment reference database may be made on the pre-manufacturing process side, or on the color filter inspection process side, and an instruction to change the manufacturing conditions is sent to the pre-manufacturing process. May be sent.
  • step S3 The color filter substrate on which the color filter determined to be non-defective after the inspection is completed as described above is transported to the next step (step S3). Even if it is determined that the product is non-defective, if it is close to the limit value of the non-defective product, the manufacturing conditions are set so that the next process is executed under the manufacturing conditions that consider the color filter inspection results. Change instructions Good.
  • a counter electrode made of a transparent electrode such as ITO is formed by sputtering, and then a columnar spacer (not shown) for defining the cell gap of the liquid crystal panel, for example, is an acrylic photosensitive resin. It is formed by applying a resin solution and exposing, developing and curing with a photomask.
  • the color filter substrate 330 is formed as described above.
  • the color filter after the inspection can be processed according to the inspection result based on the unevenness period information that is the inspection result obtained in the color filter inspection process, it is finally obtained.
  • the yield of good color filters can be improved.
  • the processing change of the color filter that is the work to be inspected may be made for a single color filter, for all the color filters of the lot to which it belongs, or for a power color filter of the same model number. You may go to all.
  • a marking or the like may be provided at a predetermined predetermined position of the color filter substrate or an abnormality occurrence region of the color filter.
  • the color filter determined to be a defective product is not discarded in the manufacturing process and is used by the operator to identify the cause of the defective product.
  • inspection values obtained in the inspection process of a plurality of color filters are stored in an inspection value database (for example, installed in an inspection apparatus).
  • the manufacturing process and the manufacturing process conditions described may be changed when the conditions applicable to the conditions described in the inspection standard information registered in the judgment standard database are met.
  • the number of consecutive color filters whose frequency value is greater than or equal to a certain reference value (the first predetermined value or the second predetermined value described above) or the frequency of occurrence is counted. If the specified frequency is exceeded, the manufacturing process is changed based on the inspection result. Based on the manufacturing process change information, the manufacturing method is changed by feeding back to the manufacturing process before the process causing the failure. .
  • Examples of changes in the manufacturing method include changing the manufacturing conditions of the manufacturing apparatus, starting a check inspection for the necessity of maintenance of the manufacturing apparatus, stopping the manufacturing apparatus, It is conceivable to perform cleaning or replacement of the parts.
  • the manufacturing method may be changed by transmitting the inspection value to a manufacturing process after the inspection process.
  • the manufacturing condition of the next manufacturing process is reduced, and the high inspection value is relaxed
  • the manufacturing condition change information so that the final luminance value falls within the range of the final inspection standard.
  • the force periodic analysis process using the Fourier transform for the periodic analysis process is particularly suitable if it can check the presence of periodicity. Not limited! /.
  • the surface of the display member is irradiated with light and the analysis is performed based on the reflected light distribution.
  • the analysis may be performed based on the transmitted light distribution.
  • the image processing procedure is the same as the image processing procedure using the reflected light distribution.
  • the periodic analysis described above may be performed based on the transmitted light distribution obtained by irradiating the back surface of the display member (color filter) with light and transmitting the light to the front surface that is the color filter formation surface. Conceivable.
  • the lighting device is arranged on the color filter non-formation side (the back side of the display member), and the camera is Is placed on the color filter forming side (front side of the display member). It is desirable to set the camera arrangement angle to an angle at which unevenness appears easily on the color filter forming surface. For example, as in the case of reflection, it is desirable that the irradiation angle with respect to the back surface of the substrate and the emission angle of the transmitted light with respect to the substrate are different from those of the straight transmitted light.
  • the illumination device is arranged in the normal direction of the substrate and the camera is arranged at an angle inclined from the normal line of the substrate, or the illumination device is arranged at an angle inclined from the normal line of the substrate. It is conceivable to arrange them at an angle inclined from the normal direction of the substrate and the direction of the straight transmitted light.
  • filtering processing may be performed on the data subjected to the one-dimensional projection processing before performing force cycle analysis processing in which cycle analysis processing is performed as it is.
  • the filtering process in this specification refers to a process of extracting or suppressing irregularities having a certain periodic width with respect to information obtained by one-dimensional projection of light distribution information (luminance distribution information).
  • Embodiment 2 the case where the morphology process is used as an example of the filtering process will be described.
  • Embodiment 3 the case where the smoothing process is used as an example of the filtering process will be described. Further, in the fourth embodiment, a case where both morphology processing and smoothing processing are used will be described.
  • FIG. 8 shows a schematic block diagram of the image analysis apparatus 102 that is effective in the present embodiment.
  • the difference from the image analysis apparatus 100 shown in FIG. 1 of the first embodiment is that a morphology processing circuit 130 is provided after the one-dimensional projection processing circuit 110.
  • the one-dimensional projection processing circuit 110 performs one-dimensional projection processing on the one-dimensional luminance distribution information
  • the morphology processing circuit 130 performs filtering
  • the periodic analysis processing circuit 120 performs the filtering process. Periodic analysis processing is performed.
  • the morphology processing circuit 130 is also controlled by a control signal from the CPU 150 in the same manner as other processing circuits.
  • the morphology processing in the morphology processing circuit 130 will be described.
  • FIGS. 9A and 9B are schematic diagrams for explaining the morphology processing used in the present embodiment.
  • morphology processing There are two types of morphology processing in the present embodiment: black morphology processing and white morphology processing.
  • Black morphology processing is processing that suppresses recesses that are larger than a certain width (filter size) (straightness that is lower than the surrounding luminance), and white morphology processing is a certain width (filter size). ) This is a process that suppresses convex parts with a larger width (higher brightness values than the surrounding brightness! /, Uneven stripes).
  • Black morphology processing is performed to maximize the luminance value in the filtering area while scanning in the X direction for the one-dimensional data (shown by the solid line in Fig. 9 (a)). Processing is performed to obtain a maximum value distribution (indicated by a broken line in Fig. 9 (a)), and the minimum value for obtaining the minimum value of the luminance value in the filtering region while scanning the maximum value distribution in the X direction. After processing, the minimum value distribution (shown in bold in Fig. 9 (a)) is obtained, the difference between the one-dimensional data and the minimum value distribution is obtained, and the morphology distribution (shown in solid line in Fig. 9 (b)). This is the process for obtaining
  • f is a constant input to determine the filter size
  • 2f + 1 is the filter size
  • Min [] and Max [] in Equation (3) are operators represented by the following Equations (4) and (5).
  • Minf [] is an operator that selects the minimum value of the sequence in []
  • Maxf [] is an operator that selects the maximum value of the sequence in [].
  • the white morphology processing is the reverse of the black morphology processing and is expressed by the following equation (6). in this case
  • FIG. 10 is a flowchart showing the flow of processing of the inspection method in the present embodiment.
  • the processing in the one-dimensional projection processing circuit 110 is omitted, and the processing flow in the morphology processing circuit 130 and the period analysis processing circuit 120 is shown.
  • the following procedures are performed for white morphology processing and black morphology processing, respectively.
  • N l is set (step S l).
  • N is a specific integer.
  • step S2 it is determined whether 2f + 1 is smaller than MAX (step S2).
  • MAX is a specific integer such as 128, 256, 512, or 1024.
  • step S2 if 2f + l is smaller than MAX, the filter size is set to 2f + 1, and the morphology processing is performed on the luminance distribution information subjected to the one-dimensional projection processing (step S3
  • step S4 Fourier transformation is performed on the result of the morphology processing.
  • step S5 the result obtained by the Fourier transform is output to the result output device 400 (step S5).
  • N N + 1 is set, and the process returns to step S2 (step S6).
  • Steps S3 to S6 are repeated until it is determined that 2f + l indicating the filter size is greater than or equal to MAX. That is, when it is determined that 2f + 1 is greater than or equal to MAX, the process of the flowchart shown in FIG. 10 ends.
  • the result when the filter size in the white morphology processing is f pixels, and f
  • Figure 11 shows the result of morphology processing with the filter size set to fl pixels. It is rough. Note that the vertical axis is contrast, the horizontal axis is the X coordinate position as in the graph of the one-dimensional projection processing result, and the unit is pixel (pix).
  • FIG. 12 is a graph showing a result when Fourier transform is further performed from the result of performing the morphology processing shown in FIG.
  • the vertical axis indicates the intensity of the spectrum.
  • the horizontal axis takes the reciprocal of the frequency, converts it to a period, and displays the logarithm.
  • the unit of period is pixel (pix).
  • the spectrum is also observed around pixel B having a period smaller than the T pixel. This is due to the width of the T pixel as a result of the Fourier transform. A harmonic of period T appears, indicating that it contributes to the accuracy of determining the existence of the spectrum of the fundamental period! /.
  • Figure 13 shows the results of morphology processing with the filter size set to f pixels.
  • FIG. 14 shows the result when Fourier transform is performed as in FIG.
  • the period analysis is performed on the data subjected to the one-dimensional projection processing as it is. However, as shown in Fig. 6, when a large number of stripes with different periods are mixed. If one-dimensional projection data is Fourier-analyzed as it is, it is observed in a state where a plurality of spectra are mixed due to a plurality of stripe irregularities having different periods.
  • FIG. 15 shows a schematic block diagram of the image analysis apparatus 103 that is effective in the present embodiment.
  • the difference from the image analysis apparatus 100 shown in FIG. 1 of the first embodiment is that a smoothing processing circuit 140 is provided after the one-dimensional projection processing circuit 110.
  • the one-dimensional projection distribution circuit 110 performs one-dimensional projection processing on the one-dimensional luminance distribution information filtered by the smoothing processing circuit 140, and then performed by the periodic analysis processing circuit 120. Periodic analysis processing is performed.
  • smoothing processing circuit 140 is also controlled by a control signal from the CPU 150, as in the case of other processing circuits.
  • the smoothing process is a process of obtaining an average value distribution by performing an averaging process for obtaining an average value in a predetermined region while scanning in the X direction with respect to the one-dimensional data.
  • AV [] is expressed by the following equation (8).
  • AV [] selects the average value of the sequence in [] Operator.
  • f is a constant input to determine the filter size
  • 2f + l is the filter size
  • the smoothing process suppresses uneven stripes having a width equal to or smaller than the filter size (2f + l), so that the period of uneven stripes can be easily obtained.
  • Figure 16 shows the filter size force pixel plane for the one-dimensional projection result shown in Figure 5.
  • the vertical axis is the luminance value
  • the horizontal axis is the position of the X coordinate as in the one-dimensional projection processing result graph
  • the unit is pixel (pix).
  • FIG. 17 shows the result of Fourier transform performed on the smoothing processing result by the period analysis processing circuit 120.
  • the vertical axis indicates the intensity of the spectrum.
  • the horizontal axis takes the reciprocal of the frequency, converts it to a period, and displays the logarithm.
  • the unit of period is pixel (pix).
  • Fig. 17 suppresses the spattering due to the uneven stripe having a period of T1 pixel that was observed in Fig. 6.
  • the smoothing process and the Fourier transform are repeated by changing the smoothing process filter size, and according to the smoothing process filter size, Various periods can be extracted, making it easier to examine the spectrum of stripes with a specific period.
  • smoothing process a method of simply obtaining an average value is used.
  • this is particularly applicable to a process that suppresses uneven stripes having a width smaller than a certain width. It is not limited.
  • smoothing may be performed using local weights, or a method of drawing an approximate curve using a polynomial.
  • FIG. 18 shows a schematic block diagram of the image analysis device 104 that is effective in the present embodiment.
  • the difference from the image analysis apparatus 100 shown in FIG. 1 of the first embodiment is that a morphology processing circuit 130 and a smoothing processing circuit 140 are provided after the one-dimensional projection processing circuit 110. It is a point.
  • the one-dimensional luminance distribution information subjected to the one-dimensional projection processing by the one-dimensional projection processing circuit 110 is filtered by the morphology processing circuit 130 and the smoothing processing circuit 140, and then subjected to periodic analysis.
  • a period analysis process is performed by the processing circuit 120.
  • morphology processing circuit 130 and the smoothing processing circuit 140 are also controlled by a control signal from the CPU 150 in the same manner as other processing circuits.
  • FIG. 19 shows the result of the morphology processing shown in the second embodiment on the data that has been subjected to the smoothing processing described above (the data shown in the graph of FIG. 16 in the third embodiment). It is a thing. Note that the vertical axis is contrast, the horizontal axis is the position of the X coordinate as in the graph of the one-dimensional projection processing result, and the unit is pixel (pix).
  • FIG. 20 shows the result of the Fourier transform performed by the period analysis processing circuit 120 on the morphology processing result.
  • the vertical axis indicates the intensity of the spectrum.
  • the horizontal axis is the frequency
  • the reciprocal is taken, converted into a period, and displayed logarithmically.
  • the unit of period is pixel (pix).
  • the graph shown in FIG. 20 emphasizes the spectrum due to the stripe unevenness near the T2 pixel. This is thought to be due to the fact that the smoothing process suppressed the spectrum due to stripes that were smaller than the filter size! This is a peculiar effect by combining smoothing processing and morphology processing, and this makes it possible to obtain the stripe unevenness period more accurately.
  • the smoothing process, the morphology process, and the Fourier transform are performed by changing the filter sizes of the smoothing process and the morphology process. By repeating, it is possible to extract various periods according to the filter size, and it becomes easy to inspect the spectrum of stripes having a specific period.
  • the filtering process As described above, in the first to fourth embodiments, as an example of the filtering process, the information on the one-dimensional projection of the intensity distribution information using the morphology process and the smoothing process is used.
  • the process is not particularly limited as long as it is a process for extracting or suppressing irregularities having a certain period width.
  • force using a color filter created by an inkjet method as an object to be inspected is not limited to this, and color filters created by other production methods In this case, the present invention can be implemented.
  • a pixel with a defective color may become uneven, or the surface of the color filter may be scratched for some reason.
  • the present invention can be implemented.
  • the unevenness that appears on the one-dimensional projection data is the force S that has been detected with respect to the unevenness in the color filter, the unevenness is not necessarily a streak-like unevenness.
  • the present invention can be implemented.
  • a color filter is used as an object to be inspected.
  • the display member is used in an image display device and transmits or reflects light or both.
  • a surface glass or a rear glass used for a display may be used as an object to be inspected, and a diffusion plate in a knock light unit may be used as an object to be inspected. It can also be applied to inspection of reflectors and screens that project images.
  • each block of the image analysis devices 100 to 103 in particular, the one-dimensional projection processing circuit 110, the periodic analysis processing circuit 120, the morphology processing circuit 130, and the smoothing processing circuit 140 are configured by hardware logic. Alternatively, it may be realized by software using a CPU as follows.
  • the image analysis apparatus 100 includes a CPU (central processing unit) that executes instructions of a control program that implements each function, a ROM (read only memory) that stores the program, and a RAM ( random access memory), and a storage device (recording medium) such as a memory for storing the above program and various data.
  • An object of the present invention is a recording medium in which a program code (execution format program, intermediate code program, source program) of a control program of the image analysis apparatus 100, which is software that realizes the above-described functions, is recorded so as to be readable by a computer. This can also be achieved by supplying the above to the image analysis apparatus 100, and the computer or CPU or MPU) reads out and executes the program code recorded on the recording medium.
  • Examples of the recording medium include a tape system such as a magnetic tape and a cassette tape, a magnetic disk such as a floppy (registered trademark) disk / hard disk, and a CD-ROM / MO / MD / DVD / CD-R.
  • Disc system including optical disc, IC card (including memory card) /) Card systems such as optical cards, or semiconductor memory systems such as mask ROM / EPROM / EEPROM / flash ROM can be used.
  • the image analysis apparatus 100 may be configured to be connectable to a communication network, and the program code may be supplied via the communication network.
  • the communication network is not particularly limited.
  • the Internet intranet, extranet, LAN, ISDN, VAN, CATV communication network, virtual private network, telephone line network, mobile communication network, satellite communication A net or the like is available.
  • the transmission medium constituting the communication network is not particularly limited.
  • IEEE1394, USB, power line carrier, cable TV line, telephone line, ADSL line, etc. ooth (registered trademark), 802.11 wireless, HDR, mobile phone network, satellite line, terrestrial digital network, etc. can also be used.
  • the present invention can also be realized in the form of a computer data signal embedded in a carrier wave, in which the program code is embodied by electronic transmission.
  • the present invention can be applied to any member as long as the periodicity of unevenness generated on a surface that can transmit or reflect light is a problem. Is possible.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Liquid Crystal (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Optical Filters (AREA)

Abstract

L'appareil d'analyse d'image (100), qui représente l'un des appareils d'analyse selon l'invention, teste un substrat de filtre coloré (330) sur la base de données d'images saisies obtenues par imagerie d'une surface à tester irradiée par de la lumière appartenant au substrat de filtre coloré (330). L'appareil d'analyse d'image (100) comprend un circuit de traitement de projection unidimensionnelle (110) qui effectue un traitement de projection unidimensionnelle des informations de distribution de lumière incluses dans les données d'images saisies avec une direction arbitraire utilisée en tant que direction de projection ; et un circuit de traitement d'analyse de période (120) qui effectue une analyse de période des informations de distribution de lumière qui ont été soumises au traitement de projection unidimensionnelle par le circuit de traitement de projection unidimensionnelle (110). De cette façon, la période de la distribution de lumière dans l'image saisie dans la direction de projection peut être déterminée à partir d'un résultat d'analyse de période, rendant ainsi possible la détermination de l'existence d'une quelconque périodicité d'une irrégularité (irrégularité de bandes) se produisant sur l'élément d'affichage du substrat de filtre coloré (330) ou sur un élément similaire qui représente un objet testé.
PCT/JP2007/073093 2006-11-29 2007-11-29 Appareil d'analyse, procédé d'analyse, système d'analyse de prise d'image, procédé de fabrication d'un filtre coloré, et programme d'analyse WO2008066129A1 (fr)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011024945A1 (fr) * 2009-08-31 2011-03-03 コニカミノルタオプト株式会社 Procédé de fabrication de lentille mince

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101427127A (zh) 2006-04-26 2009-05-06 夏普株式会社 滤色器检测方法、滤色器制造方法和滤色器检测装置
JP4902456B2 (ja) * 2007-07-31 2012-03-21 シャープ株式会社 スジムラ評価装置、スジムラ評価方法、スジムラ評価プログラム、記録媒体及びカラーフィルタの製造方法
JP5866912B2 (ja) * 2011-09-16 2016-02-24 凸版印刷株式会社 パターンの描画条件導出方法及びパターン描画装置
JP6035794B2 (ja) * 2012-03-14 2016-11-30 大日本印刷株式会社 ムラ情報生成装置、ムラ情報生成プログラム及びムラ情報生成方法

Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0972824A (ja) * 1995-09-08 1997-03-18 Sefuto Kenkyusho:Kk フィルタ検査装置
JPH09126891A (ja) * 1995-10-31 1997-05-16 Hitachi Ltd 液晶表示素子の製造方法並びに配向特性検査方法及びその装置
JPH10121368A (ja) * 1996-10-15 1998-05-12 Toyobo Co Ltd 織布の検反装置
JPH11189970A (ja) * 1997-12-24 1999-07-13 Toyobo Co Ltd 織布検反装置
JPH11194096A (ja) * 1997-10-29 1999-07-21 Toyota Motor Corp 塗装面の評価方法および塗装面の検査装置
JP2002543421A (ja) * 1999-05-04 2002-12-17 スピードライン・テクノロジーズ・インコーポレーテッド 基板上の半田ペースト堆積を検査する方法および装置
JP2003168114A (ja) * 2001-12-04 2003-06-13 Olympus Optical Co Ltd 欠陥分類装置
JP2004063504A (ja) * 2002-07-24 2004-02-26 Sharp Corp 結晶膜の検査方法および検査装置
JP2004086539A (ja) * 2002-08-27 2004-03-18 Fuji Photo Film Co Ltd 画像分割方法および装置並びにプログラム
JP2005249633A (ja) * 2004-03-05 2005-09-15 Toppan Printing Co Ltd 周期性パターンにおけるスジ状ムラの検査方法
JP2006145484A (ja) * 2004-11-24 2006-06-08 Sharp Corp 外観検査装置、外観検査方法およびコンピュータを外観検査装置として機能させるためのプログラム

Patent Citations (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0972824A (ja) * 1995-09-08 1997-03-18 Sefuto Kenkyusho:Kk フィルタ検査装置
JPH09126891A (ja) * 1995-10-31 1997-05-16 Hitachi Ltd 液晶表示素子の製造方法並びに配向特性検査方法及びその装置
JPH10121368A (ja) * 1996-10-15 1998-05-12 Toyobo Co Ltd 織布の検反装置
JPH11194096A (ja) * 1997-10-29 1999-07-21 Toyota Motor Corp 塗装面の評価方法および塗装面の検査装置
JPH11189970A (ja) * 1997-12-24 1999-07-13 Toyobo Co Ltd 織布検反装置
JP2002543421A (ja) * 1999-05-04 2002-12-17 スピードライン・テクノロジーズ・インコーポレーテッド 基板上の半田ペースト堆積を検査する方法および装置
JP2003168114A (ja) * 2001-12-04 2003-06-13 Olympus Optical Co Ltd 欠陥分類装置
JP2004063504A (ja) * 2002-07-24 2004-02-26 Sharp Corp 結晶膜の検査方法および検査装置
JP2004086539A (ja) * 2002-08-27 2004-03-18 Fuji Photo Film Co Ltd 画像分割方法および装置並びにプログラム
JP2005249633A (ja) * 2004-03-05 2005-09-15 Toppan Printing Co Ltd 周期性パターンにおけるスジ状ムラの検査方法
JP2006145484A (ja) * 2004-11-24 2006-06-08 Sharp Corp 外観検査装置、外観検査方法およびコンピュータを外観検査装置として機能させるためのプログラム

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2011024945A1 (fr) * 2009-08-31 2011-03-03 コニカミノルタオプト株式会社 Procédé de fabrication de lentille mince

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