WO2008062593A1 - Matériau pour former une paroi de séparation pour des panneaux d'affichage à plasma et composition de verre du matériau pour former la paroi de séparation - Google Patents

Matériau pour former une paroi de séparation pour des panneaux d'affichage à plasma et composition de verre du matériau pour former la paroi de séparation Download PDF

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Publication number
WO2008062593A1
WO2008062593A1 PCT/JP2007/066724 JP2007066724W WO2008062593A1 WO 2008062593 A1 WO2008062593 A1 WO 2008062593A1 JP 2007066724 W JP2007066724 W JP 2007066724W WO 2008062593 A1 WO2008062593 A1 WO 2008062593A1
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WO
WIPO (PCT)
Prior art keywords
glass
partition wall
forming material
wall forming
powder
Prior art date
Application number
PCT/JP2007/066724
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English (en)
Japanese (ja)
Inventor
Takayuki Mito
Yoshiro Kitamura
Hiroyuki Oshita
Original Assignee
Nippon Electric Glass Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007198649A external-priority patent/JP2008150272A/ja
Application filed by Nippon Electric Glass Co., Ltd. filed Critical Nippon Electric Glass Co., Ltd.
Publication of WO2008062593A1 publication Critical patent/WO2008062593A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J11/00—Gas-filled discharge tubes with alternating current induction of the discharge, e.g. alternating current plasma display panels [AC-PDP]; Gas-filled discharge tubes without any main electrode inside the vessel; Gas-filled discharge tubes with at least one main electrode outside the vessel
    • H01J11/20—Constructional details
    • H01J11/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J11/36—Spacers, barriers, ribs, partitions or the like
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/24—Fusion seal compositions being frit compositions having non-frit additions, i.e. for use as seals between dissimilar materials, e.g. glass and metal; Glass solders
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20—Constructional details
    • H01J2211/22—Electrodes
    • H01J2211/32—Disposition of the electrodes
    • H01J2211/326—Disposition of electrodes with respect to cell parameters, e.g. electrodes within the ribs

Definitions

  • the present invention relates to a partition wall forming material for a plasma display panel and a glass composition for a partition wall forming material.
  • a plasma display panel is a self-luminous flat display, has excellent characteristics such as thinness and high viewing angle, and can have a large screen. It is attracting attention as one of!
  • a plasma display panel is provided with a front glass substrate and a rear glass substrate facing each other, and a large number of partitions (also called barrier ribs) for separating gas discharge portions are provided between the substrates. ) Is formed.
  • a sand blast method is generally used. After a partition layer is formed on a glass substrate, a dry film resist film is formed thereon, and after exposure and development, the sand blast method is used. Then, unnecessary portions can be removed, and then the remaining dry film resist film is peeled off and baked to form partition walls.
  • a material for forming the partition wall a mixed material of glass powder and ceramic powder is widely used.
  • partition wall forming material needs to be able to be fired at 600 ° C. or less in order to prevent the deformation of the glass substrate. Therefore, the glass powder has a low softening point PbO— BO SiO glass is used.
  • partition wall forming materials using ZnO-BO SiO-based lead-free glass powder with alkali metal oxide added as shown in Patent Document 2. V has been proposed.
  • Patent Document 1 JP-A-11 60273
  • Patent Document 2 JP 2002-326839 Koyuki
  • the glass disclosed in Patent Document 2 reduces the softening point of the glass. Because alkali metal oxide is included for the purpose, glass is low in alkali resistance. Glass is eroded by the alkaline solution used in the development process and peeling process of the dry film resist film, and immediately baked into the partition walls. When this is done, discoloration or foaming makes it difficult to form partition walls by the sandblast method!
  • the object of the present invention is to sinter at a temperature equivalent to that of a conventional partition wall-forming material without containing PbO, and to reduce the alkali resistance even if it contains strength and alkali metal oxide. It is intended to provide a barrier rib forming material for a plasma display panel and a glass composition that can be formed by a sand plast method.
  • the partition wall forming material for a plasma display panel of the present invention is a partition wall forming material for a plasma display panel containing glass powder and ceramic powder! /, And the glass powder force s is substantially PbO. Containing no moles, ZnO 20—55%, BO 10—30%
  • the glass composition for a partition wall forming material of the present invention contains substantially no PbO and has a molar percentage of ZnO 20-55%, BO 10-30%, SiO 15-30%, Al 2 O 3 0-13
  • the partition wall forming material for a plasma display panel of the present invention can be fired at a temperature of 600 ° C. or lower where the softening point is low. Force, even alkali resistance is good,
  • the partition walls can be formed by the last method. Therefore, it is suitable as a material for forming a partition for a plasma display panel.
  • the partition wall forming material for a plasma display according to the present invention has a low melting point ZnO—B 2 O Si
  • O-type glass powder is included as the main component. Since the ZnO, BO and SiO 3 components alone have a higher glass softening point than PbO glass, the total amount of LiO, Na 0 and KO alkali metal oxides in the ZnO—BO SiO glass is 4 Add more than mol% to lower the softening point of glass so that it can be fired at the same temperature as the partition material using PbO glass. In addition, the addition of alkali metal oxides reduces the alkali resistance of the glass, and the glass is eroded immediately by the alkaline solution used in the development process and peeling process of the dry film resist film, and immediately fired into the partition walls. The strength of the alkali metal oxide is suppressed to 20% or less, and the strength (SiO + A1 O) tends to be discolored or foamed easily. ) / BO ratio in molar ratio 0
  • ZnO is a component that lowers the softening point and lowers the coefficient of thermal expansion, and its content is 20-55%. As the ZnO content decreases, the coefficient of thermal expansion tends to increase, making it difficult to match the coefficient of thermal expansion of the glass substrate. On the other hand, when the content increases, crystals precipitate in the glass and it becomes difficult to obtain a dense sintered body.
  • a preferable range of ZnO is 20 to 50%, a more preferable range is 2;! To 45%, and a further preferable range is 25 to 45%.
  • BO is a component constituting the skeleton of the glass, and its content is 10 to 30%. Vitrification becomes difficult when the BO content decreases. On the other hand, when the content increases, the softening point tends to be too high, and it becomes difficult to fire at a temperature of 600 ° C or lower. In addition, the alkali resistance of the glass tends to decrease, making it difficult to form partition walls by sandblasting. In other words, when the alkali resistance is lowered, the glass is eroded by the alkaline solution used in the development process or the peeling process of the dry film resist film, and when it is baked to form a partition wall, it is discolored or foamed. .
  • the preferred range of BO is 15-30%, more preferred range. The range is 15-25%, more preferred! /, The range is 18-24%.
  • SiO is a component that forms a skeleton of the glass and a component that enhances the alkali resistance of the glass. Its content is 15-30%. When the SiO content decreases, the glass tends to become unstable. In addition, the alkali resistance of the glass tends to decrease, making it difficult to form partition walls by the sand blast method. On the other hand, when the content increases, the softening point tends to be too high, and it becomes difficult to fire at a temperature of 600 ° C or lower. A preferred range for SiO is 15 to 28%, a more preferred range is 17 to 25%, and a further preferred range is 18 to 25%.
  • Al 2 O is a component that increases the alkali resistance of glass, and its content is 0 to 13%.
  • a preferred range for Al 2 O is 0 to; 11%, and a more preferred range is 0 to 8
  • MgO, CaO, SrO, and BaO are all components that increase the chemical durability of the glass and are components that are added to adjust the thermal expansion coefficient.
  • the content of these components is 0 to 20%, respectively. When the content of these components increases, the thermal expansion coefficient tends to increase and it becomes difficult to match the thermal expansion coefficient of the glass substrate.
  • the preferred ranges of these components are each 0 to 18%, and the more preferred ranges are 0 to 15%, respectively.
  • a more preferable range of CaO is 0 to 10%, and a more preferable range of BaO is 0 to 13%.
  • MgO, CaO, SrO, and BaO must be 3 to 20% in total.
  • the thermal expansion coefficient tends to be low, and it becomes difficult to match the thermal expansion coefficient of the glass substrate.
  • the chemical durability of glass it exists in the tendency for the chemical durability of glass to fall.
  • the thermal expansion coefficient tends to increase, and it becomes difficult to match the thermal expansion coefficient of the glass substrate.
  • the preferred range of the total amount of these components is 3 to 18%, the more preferred range is 5 to 15%, and even more preferred! /, The range is 6 to 13%.
  • Li 2 O is a component that lowers the softening point of glass and increases the coefficient of thermal expansion, and its content is 0 to 14%.
  • the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method.
  • the coefficient of thermal expansion is high It becomes difficult to match with the thermal expansion coefficient of the glass substrate.
  • a preferable range of Li 2 0 is 0 to 13%, a more preferable range is 0 to 12%, and it is particularly preferable to contain 2% or more of Li 2 O.
  • Na 2 O is a component that lowers the softening point of glass and increases the thermal expansion coefficient, and its content is 0 to 14%.
  • the content of Na 2 O increases, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method.
  • the thermal expansion coefficient tends to be high, and it becomes difficult to match the thermal expansion coefficient of the glass substrate.
  • a preferable range of Na 2 O is 0 to 13%, a more preferable range is 0 to 12%, and a further preferable range is 0 to 11%.
  • K 2 O is a component that lowers the softening point of glass and increases the coefficient of thermal expansion, and its content is 0 to 10%.
  • the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method.
  • the coefficient of thermal expansion tends to be extremely high, making it difficult to match the coefficient of thermal expansion of the glass substrate.
  • a preferable range of ⁇ o is 0 to 8%, a more preferable range is 0 to 5%, and a further preferable range is 0 to 1%.
  • the total amount of LiO, Na0, and KO alkali metal oxides needs to be 4 to 20%.
  • the total amount of the alkali metal oxide is small, the softening point of the glass is not sufficiently lowered, and it becomes difficult to fire at a temperature of 600 ° C or lower.
  • the thermal expansion coefficient tends to be low, and it becomes difficult to match the thermal expansion coefficient of the glass substrate.
  • the total amount of the alkali metal oxide is increased, the alkali resistance of the glass tends to be lowered, and it becomes difficult to form partition walls by the sandblast method.
  • the coefficient of thermal expansion tends to be high, making it difficult to match the coefficient of thermal expansion of the glass substrate.
  • a preferable range of the total amount of the alkali metal oxide is 4 to 15%, a more preferable range is 5 to 14%, and a further preferable range is 6.4 to 14%.
  • the ratio should be in the range of 0.8 to 1.65. When this ratio decreases, the alkali resistance of the glass tends to decrease, and it becomes difficult to form partition walls by the sandblast method. On the other hand, when this ratio increases, the softening point of the glass tends to increase. It becomes difficult to fire. In addition, the thermal expansion coefficient tends to be low, and it becomes difficult to match the thermal expansion coefficient of the glass substrate.
  • a preferred range of (SiO + A1 O) / BO is 1 ⁇ 0 to ⁇ ⁇ 6, and a more preferred range is 1.0 to 1.5; It should be noted that SiO and Al 2 O have a total amount of 15 to 43%, preferably S, more preferably 15 to 39%, more preferably S, and more preferably 17 to 33% 20 to 32%. It is particularly preferred that
  • CuO may be added in addition to the above components.
  • the CuO content is 0.01 to 5%.
  • the above effect is difficult to obtain.
  • the content increases, it becomes difficult to vitrify, or even when vitrified, crystals precipitate in the glass and it becomes difficult to obtain a dense sintered body.
  • a preferable range of CuO is 0.01 to 3%, and a more preferable range is 0.01 to 2%.
  • the effect of the present invention is not impaired!
  • up to 10% Bi O a component that lowers the softening point of glass without reducing the alkali resistance of glass
  • YO, LaO, Ta components that improve the chemical durability of glass.
  • SnO, ZrO, TiO, NbO may be added up to 8% each
  • PO which is a component that stabilizes glass, may be added up to 8%.
  • PbO is a force-environmental load substance that is a component that lowers the melting point of glass. Therefore, substantial introduction into glass should be avoided.
  • substantially introduction into glass refers to a level that is not actively used as a raw material but mixed as an impurity, and specifically, the content is 0.1% or less. Means that.
  • the plasma display panel partition wall forming material of the present invention it is preferable to use glass having a softening point of 600 ° C or lower in order to allow firing at 600 ° C or lower.
  • the softening point is increased, it becomes difficult to obtain a dense fired film at a temperature of 600 ° C or lower.
  • the softening point of glass is preferably 540 ° C or higher.
  • a more preferable range of the softening point is 540 to 590 ° C.
  • the glass powder in the partition wall forming material for a plasma display panel of the present invention is 1 ⁇ 5 to 4 ⁇ 5 111 and the maximum particle size D is 0 to 35 m.
  • the elution amount of the alkali metal oxide component increases, the photosensitivity of the dry film resist film is hindered, and the peelability of the dry film resist film tends to be lowered.
  • the above glass powder is suitable for a partition wall forming material, but it can be used for other purposes such as a dielectric material.
  • the partition wall forming material for a plasma display panel of the present invention contains a ceramic powder in addition to the glass powder for the purpose of maintaining the shape.
  • the mixing ratio is desirably 50 to 95% by weight of glass powder, 5 to 50% by weight of ceramic powder, particularly 60 to 90% by weight of glass powder, and 10 to 40% by weight of ceramic powder. If the ceramic powder is more than 50%, the sinterability becomes insufficient and it becomes difficult to form a dense partition, and if it is less than 5%, the shape maintaining effect is reduced.
  • the ceramic powder for example, alumina, zirconia, zircon, titania, cordierite, mullite, silica, willemite, tin oxide, zinc oxide and the like can be used alone or in combination.
  • the ceramic powder has an average particle size of 5. ⁇ ⁇ m or less and a maximum particle size of 20,1 m or less in order to prevent a decrease in the sinterability of the material and make it easy to obtain a dense fired film. I want to use something!
  • the material of the present invention can be used in the form of, for example, a paste or a green sheet.
  • thermoplastic resin When used in the form of a paste, a thermoplastic resin, a plasticizer, a solvent and the like are used together with the glass powder described above and, if necessary, a ceramic powder.
  • the content of glass powder and ceramic powder in the paste is generally about 30 to 90% by mass.
  • the thermoplastic resin is a component that increases the film strength after drying and imparts flexibility, and its content is generally about 0.;! To 20% by mass.
  • the thermoplastic resin it is possible to use polybutylene methacrylate, polybutyral, polymethyl metaacrylate, polyethyl methacrylate, ethyl cellulose, etc., and these may be used alone or in combination.
  • the plasticizer is a component that controls the drying rate and imparts flexibility to the dried film, and the content thereof is generally about 0 to 10% by mass.
  • butyl benzylenophthalate, dioctyl phthalate, diisooctyl phthalate, dicapryl phthalate, dibutyl phthalate and the like can be used, and these are used alone or in combination.
  • the solvent is a material for pasting the material, and its content is generally about 10 to 30% by mass.
  • the solvent for example, tervineol, diethylene glycol monobutyl ether acetate, 2,2,4-trimethyl-1,3-pentadiol monoisobutyrate or the like can be used alone or in combination.
  • the paste can be prepared by preparing glass powder, ceramic powder, thermoplastic resin, plasticizer, solvent and the like and kneading them at a predetermined ratio.
  • thermoplastic resin a plasticizer, and the like are used together with the glass powder and the ceramic powder.
  • the content of the glass powder and ceramic in the filler of the green sheet is about 60 to 80 weight 0/0 is common.
  • thermoplastic resin and the plasticizer the same thermoplastic resin and plasticizer as those used in the preparation of the paste can be used.
  • the mixing ratio of the thermoplastic resin is generally about 5 to 30% by mass, and the mixing ratio of the plasticizer is generally 0 to about 10% by mass.
  • the above glass powder, ceramic powder, thermoplastic resin, plasticizer and the like are prepared, and a main solvent such as toluene and an auxiliary solvent such as isopropylinol alcohol are prepared therein. Is added to form a slurry, and this slurry is formed into a sheet on a film of polyethylene terephthalate (PET) or the like by the doctor blade method. Sheet After molding, the solvent and solvent can be removed by drying to make a green sheet.
  • PET polyethylene terephthalate
  • a glass layer can be formed by thermocompression bonding of the green sheet obtained as described above to a portion where a glass layer is to be formed, and then firing.
  • thermocompression bonding of the green sheet obtained as described above to a portion where a glass layer is to be formed, and then firing.
  • it is processed into a predetermined partition shape in the same manner as in the case of the paste described above.
  • the method for forming the barrier ribs is described by taking the sand blast method using paste or green sheets as an example! /,
  • the force S, and the barrier rib forming material for the plasma display panel of the present invention is It is not limited to the method.
  • other forming methods such as a printing lamination method, a lift-off method, a photosensitive paste method, a photosensitive green sheet method, and a press molding method can be applied.
  • Tables 1 to 6 show examples of the present invention (sample No .;! To 24) and comparative examples (sample Nos. 25 to 27).
  • Sample No. 27 represents a conventional product made of lead-based glass.
  • the raw materials were prepared so as to have the glass composition shown in the table in mol%, and mixed uniformly. Next, it was placed in a platinum crucible and melted at 1250 ° C for 2 hours, and then the molten glass was formed into a thin plate. Subsequently, this is pulverized with an alumina ball mill and classified to obtain an average particle diameter D force of .5 to
  • a glass powder of 4.5 H m and a maximum particle size D force of 0 to 35 ⁇ m was obtained. Obtained in this way The softening point and thermal expansion coefficient of the glass powder were measured.
  • the obtained glass powder sample and various ceramic powders were mixed in the proportions shown in the table to obtain a partition wall forming material.
  • the obtained sample was evaluated for sinterability and alkali resistance.
  • Examples Nos .;! To 24 which are examples, have a glass softening point of 550 to 587 ° C and can be sufficiently fired at a temperature of 600 ° C or lower. It was.
  • the thermal expansion coefficient is 72 ⁇ 8-88. 4 X 10- 7 / ° C, were those consistent with the glass substrate.
  • foaming was not observed in the glass film immersed in alkaline solution and baked, and no discoloration was observed or slight discoloration, and the alkali resistance was good.
  • Sample Nos.! To 23 had a small AL value of 25 or less and excellent sinterability.
  • Sample No. 24 has a low CuO content of 5.1%, so the sinterability is inferior to other samples (No .;! To 23) with a large AL value of 26. It was.
  • Sample No. 25 which is a comparative example, was soaked in an alkali solution and baked, and the glass film was foamed and significantly discolored, resulting in low alkali resistance. It was.
  • the softening point of the glass was as high as 627 ° C. Also, in the evaluation of sinterability, it was as large as A L value S72, and could not be fired at temperatures below 600 ° C.
  • the softening point of the glass was measured using a macro differential thermal analyzer, and the value of the fourth inflection point was taken as the softening point.
  • the degree of foaming and discoloration was evaluated as follows.
  • a partition wall was prepared by sandblasting. Furthermore, each sample was immersed in a 5% NaOH aqueous solution (40 ° C) for 7 minutes to remove the dry film resist film, and then baked in an electric furnace at 570 ° C for 10 minutes to obtain a glass film. The cross section of the obtained glass film was observed with a microscope, ⁇ ⁇ '' indicates that no foaming was observed, ⁇ ⁇ '' indicates that foaming was slightly observed, and foaming was markedly porous! /, Those shown as "X" in the table.

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Glass Compositions (AREA)

Abstract

L'invention concerne un matériau pour former une paroi de séparation pour des panneaux d'affichage à plasma qui peut être cuit à une température équivalente à celle des matériaux pour former des parois de séparation classiques, malgré le fait que ledit matériau est exempt de PbO, et présente une résistance en milieu alcalin peu diminuée malgré le fait que ledit matériau contient des oxydes de métaux alcalins, et permet de former une paroi de séparation par sablage. L'invention concerne également une composition de verre. Le matériau pour former une paroi de séparation pour des panneaux d'affichage à plasma qui comporte une poudre de verre et une poudre de céramique, est caractérisé par le fait que la poudre de verre est sensiblement exempte de PbO et a une composition qui consiste en, en moles, 20-55 % de ZnO ; 10-30 % de B2O3 ; 15-30 % de SiO2 ; 0-13 % d'Al2O3 ; 0-20 % de MgO, 0-20 % de CaO, 0-20 % de SrO et 0-20 % de BaO, la somme MgO+CaO+SrO+BaO étant de 3 à 20 % ; 0-14 % de Li2O, 0-14 % de Na2O, 0-10 % de K2O, la somme Li2O+Na2O+K2O étant de 4 à 20 % et satisfait la relation : (SiO2+Al2O3)/B2O3 = 0,8 à 1,65.
PCT/JP2007/066724 2006-11-21 2007-08-29 Matériau pour former une paroi de séparation pour des panneaux d'affichage à plasma et composition de verre du matériau pour former la paroi de séparation WO2008062593A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2006-313842 2006-11-21
JP2006313842 2006-11-21
JP2007-198649 2007-07-31
JP2007198649A JP2008150272A (ja) 2006-11-21 2007-07-31 プラズマディスプレイパネル用隔壁形成材料及び隔壁形成材料用ガラス組成物

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WO2008062593A1 true WO2008062593A1 (fr) 2008-05-29

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011230965A (ja) * 2010-04-28 2011-11-17 Asahi Glass Co Ltd ガラスセラミックス組成物および素子搭載用基板

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002012442A (ja) * 2000-06-23 2002-01-15 Asahi Glass Co Ltd 低融点ガラス
JP2003048750A (ja) * 2001-08-03 2003-02-21 Okuno Chem Ind Co Ltd プラズマディスプレイパネルの隔壁形成用ガラス組成物
JP2005325011A (ja) * 2004-03-23 2005-11-24 Nippon Electric Glass Co Ltd プラズマディスプレイ用隔壁形成材料
JP2006143479A (ja) * 2003-11-06 2006-06-08 Asahi Glass Co Ltd 隔壁形成用ガラスおよびプラズマディスプレイパネル

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002012442A (ja) * 2000-06-23 2002-01-15 Asahi Glass Co Ltd 低融点ガラス
JP2003048750A (ja) * 2001-08-03 2003-02-21 Okuno Chem Ind Co Ltd プラズマディスプレイパネルの隔壁形成用ガラス組成物
JP2006143479A (ja) * 2003-11-06 2006-06-08 Asahi Glass Co Ltd 隔壁形成用ガラスおよびプラズマディスプレイパネル
JP2005325011A (ja) * 2004-03-23 2005-11-24 Nippon Electric Glass Co Ltd プラズマディスプレイ用隔壁形成材料

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011230965A (ja) * 2010-04-28 2011-11-17 Asahi Glass Co Ltd ガラスセラミックス組成物および素子搭載用基板

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