WO2007053335A3 - Systeme laser - Google Patents
Systeme laser Download PDFInfo
- Publication number
- WO2007053335A3 WO2007053335A3 PCT/US2006/041107 US2006041107W WO2007053335A3 WO 2007053335 A3 WO2007053335 A3 WO 2007053335A3 US 2006041107 W US2006041107 W US 2006041107W WO 2007053335 A3 WO2007053335 A3 WO 2007053335A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- laser
- output
- oscillator
- gas discharge
- amplification stage
- Prior art date
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10084—Frequency control by seeding
- H01S3/10092—Coherent seed, e.g. injection locking
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
- H01S3/2251—ArF, i.e. argon fluoride is comprised for lasing around 193 nm
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/005—Optical devices external to the laser cavity, specially adapted for lasers, e.g. for homogenisation of the beam or for manipulating laser pulses, e.g. pulse shaping
- H01S3/0057—Temporal shaping, e.g. pulse compression, frequency chirping
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08018—Mode suppression
- H01S3/08022—Longitudinal modes
- H01S3/08031—Single-mode emission
- H01S3/08036—Single-mode emission using intracavity dispersive, polarising or birefringent elements
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
- H01S3/08—Construction or shape of optical resonators or components thereof
- H01S3/08059—Constructional details of the reflector, e.g. shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/23—Arrangements of two or more lasers not provided for in groups H01S3/02 - H01S3/22, e.g. tandem arrangements of separate active media
- H01S3/2308—Amplifier arrangements, e.g. MOPA
- H01S3/2325—Multi-pass amplifiers, e.g. regenerative amplifiers
- H01S3/2333—Double-pass amplifiers
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
Un procédé et un système de l'invention peuvent comprendre un système laser à décharge gazeuse d'excimères pulsés ou de fluor moléculaire à raie rétrécie et qui peut comporter un oscillateur laser amorce produisant en sortie un faisceau lumineux d'impulsions de valeurs de sortie laser pouvant comprendre un première chambre laser à décharge gazeuse d'excimères ou de fluor moléculaire; ledit système peut également comprendre un module à raie rétrécie situé à l'intérieur d'une première cavité de l'oscillateur, un étage d'amplification laser refermant un milieu de gain amplificateur situé dans une deuxième chambre laser à décharge gazeuse d'excimères ou de fluor moléculaire recevant la valeur de sortie de l'oscillateur laser amorce et amplifiant la valeur de sortie de l'oscillateur laser amorce, de manière à constituer une valeur de sortie du système laser comprenant un faisceau lumineux d'impulsions de valeurs de sortie laser, qui peuvent comprendre un étage d'amplification de puissance en anneau dans lequel la valeur de sortie de l'oscillateur laser amorce traverse le milieu de gain amplificateur de l'étage d'amplification de puissance en anneau au moins deux fois par boucle.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP06836437.1A EP1952493A4 (fr) | 2005-11-01 | 2006-10-20 | Systeme laser |
KR1020117014864A KR101238739B1 (ko) | 2005-11-01 | 2006-10-20 | 레이저 시스템 |
KR1020087013076A KR101194231B1 (ko) | 2005-11-01 | 2006-10-20 | 레이저 시스템 |
JP2008538912A JP5506194B2 (ja) | 2005-11-01 | 2006-10-20 | レーザシステム |
Applications Claiming Priority (24)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73268805P | 2005-11-01 | 2005-11-01 | |
US60/732,688 | 2005-11-01 | ||
US81429306P | 2006-06-16 | 2006-06-16 | |
US81442406P | 2006-06-16 | 2006-06-16 | |
US60/814,424 | 2006-06-16 | ||
US60/814,293 | 2006-06-16 | ||
US52183406A | 2006-09-14 | 2006-09-14 | |
US52205206A | 2006-09-14 | 2006-09-14 | |
US52190606A | 2006-09-14 | 2006-09-14 | |
US52190506A | 2006-09-14 | 2006-09-14 | |
US52185806A | 2006-09-14 | 2006-09-14 | |
US52183506A | 2006-09-14 | 2006-09-14 | |
US52190406A | 2006-09-14 | 2006-09-14 | |
US52186006A | 2006-09-14 | 2006-09-14 | |
US52183306A | 2006-09-14 | 2006-09-14 | |
US11/521,834 | 2006-09-14 | ||
US11/521,860 | 2006-09-14 | ||
US11/521,904 | 2006-09-14 | ||
US11/521,833 | 2006-09-14 | ||
US11/521,858 | 2006-09-14 | ||
US11/521,906 | 2006-09-14 | ||
US11/521,905 | 2006-09-14 | ||
US11/522,052 | 2006-09-14 | ||
US11/521,835 | 2006-09-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2007053335A2 WO2007053335A2 (fr) | 2007-05-10 |
WO2007053335A3 true WO2007053335A3 (fr) | 2008-04-24 |
Family
ID=38006377
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2006/041107 WO2007053335A2 (fr) | 2005-11-01 | 2006-10-20 | Systeme laser |
Country Status (5)
Country | Link |
---|---|
US (1) | US7822092B2 (fr) |
EP (1) | EP1952493A4 (fr) |
JP (2) | JP5506194B2 (fr) |
KR (2) | KR101194231B1 (fr) |
WO (1) | WO2007053335A2 (fr) |
Families Citing this family (51)
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JP5162139B2 (ja) * | 2007-02-07 | 2013-03-13 | 株式会社小松製作所 | 露光装置用狭帯域レーザ装置 |
JP5096035B2 (ja) * | 2007-05-01 | 2012-12-12 | ギガフォトン株式会社 | 光学的パルスストレッチ装置及び露光用放電励起レーザ装置 |
US7714986B2 (en) * | 2007-05-24 | 2010-05-11 | Asml Netherlands B.V. | Laser beam conditioning system comprising multiple optical paths allowing for dose control |
US8164739B2 (en) * | 2007-09-28 | 2012-04-24 | Asml Holding N.V. | Controlling fluctuations in pointing, positioning, size or divergence errors of a beam of light for optical apparatus |
JP2010087388A (ja) * | 2008-10-02 | 2010-04-15 | Ushio Inc | 露光装置 |
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US8014432B2 (en) * | 2009-03-27 | 2011-09-06 | Cymer, Inc. | Regenerative ring resonator |
USRE45957E1 (en) | 2009-03-27 | 2016-03-29 | Cymer, Llc | Regenerative ring resonator |
WO2011066440A1 (fr) * | 2009-11-24 | 2011-06-03 | Applied Energetics Inc. | Amplificateurs multipassage à éloignement axial et désaxé |
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WO2014045889A1 (fr) * | 2012-09-18 | 2014-03-27 | ギガフォトン株式会社 | Amplificateur de type plaque, dispositif de laser le comportant, et dispositif de génération de lumière ultraviolette extrême |
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US8929406B2 (en) | 2013-01-24 | 2015-01-06 | Kla-Tencor Corporation | 193NM laser and inspection system |
WO2014121844A1 (fr) | 2013-02-08 | 2014-08-14 | Carl Zeiss Laser Optics Gmbh | Module d'inversion de faisceau et amplificateur de puissance optique comportant ce module d'inversion de faisceau |
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Also Published As
Publication number | Publication date |
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JP2009514246A (ja) | 2009-04-02 |
JP5624937B2 (ja) | 2014-11-12 |
KR20110091788A (ko) | 2011-08-12 |
US7822092B2 (en) | 2010-10-26 |
JP2011176358A (ja) | 2011-09-08 |
EP1952493A4 (fr) | 2017-05-10 |
WO2007053335A2 (fr) | 2007-05-10 |
KR101238739B1 (ko) | 2013-03-04 |
KR101194231B1 (ko) | 2012-10-29 |
KR20080066974A (ko) | 2008-07-17 |
EP1952493A2 (fr) | 2008-08-06 |
US20080144671A1 (en) | 2008-06-19 |
JP5506194B2 (ja) | 2014-05-28 |
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