WO2006118343A1 - Exposure apparatus - Google Patents

Exposure apparatus Download PDF

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Publication number
WO2006118343A1
WO2006118343A1 PCT/JP2006/309351 JP2006309351W WO2006118343A1 WO 2006118343 A1 WO2006118343 A1 WO 2006118343A1 JP 2006309351 W JP2006309351 W JP 2006309351W WO 2006118343 A1 WO2006118343 A1 WO 2006118343A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
unit
temperature
air
photosensitive material
Prior art date
Application number
PCT/JP2006/309351
Other languages
English (en)
French (fr)
Inventor
Akihiro Hashiguchi
Hiroyuki Kohda
Takashi Fukui
Original Assignee
Fujifilm Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005133409A external-priority patent/JP2006308996A/ja
Priority claimed from JP2005150974A external-priority patent/JP2006330165A/ja
Priority claimed from JP2005150976A external-priority patent/JP2006330167A/ja
Application filed by Fujifilm Corporation filed Critical Fujifilm Corporation
Publication of WO2006118343A1 publication Critical patent/WO2006118343A1/en

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10—Measuring as part of the manufacturing process
    • H01L22/12—Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Definitions

  • the present invention relates to an exposure apparatus, and more particularly relates to an exposure apparatus which is equipped with an air conditioning function which, on the basis of a measured temperature of an accommodation chamber at which an apparatus main body is accommodated, supplies temperature-regulated air from an air conditioner to the accommodation chamber for air conditioning.
  • the present invention relates to an exposure apparatus which can judge and display an exposure performance level by measuring temperatures of principle components in the apparatus main body.
  • the present invention relates to an exposure apparatus which, in response to changes in installation environment temperature, enables re-specification of a stable temperature which assures image exposure quality.
  • a laser rendering apparatus main-scans laser light while illuminating the laser light onto a photosensitive material such as a photosensitive film or the like, which is being conveyed in a sub-scanning direction, to render a predetermined pattern (see, for example, Japanese Patent Application Laid-Open (JP-A) No. 2002-82446).
  • An image exposure apparatus utilizes a spatial light modulator (SLM) such as a digital micromirror device (DMD) or the like to perform image exposure by illuminating a light beam which is modulated in accordance with image data onto a photosensitive material which is being conveyed in a scanning direction.
  • SLM spatial light modulator
  • DMD digital micromirror device
  • a scanning exposure apparatus such as the laser rendering apparatus or the like, or an image exposure apparatus
  • numerous heat-generating components are disposed in an exposure chamber (an accommodation chamber), such as an exposure head for illuminating a light beam, a driving motor for driving a photosensitive material conveyance mechanism, such as a rotating drum, a stage or the like, a control board for controlling respective portions of the apparatus, and so forth.
  • a temperature of the exposure chamber is changed by the heat that these heat-generating components generate.
  • air conditioning control is performed so as to supply temperature-regulated air (cool air) from an air conditioner to the exposure chamber in accordance with measured temperatures of the exposure chamber, and keep the chamber temperature in a predetermined range.
  • the driving motor, exposure head and suchlike which are particularly prone to high temperatures, are arranged along the scanning direction. Consequently, the chamber temperature is uneven along the scanning direction, and temperature divergences are likely to be formed along the scanning direction. Moreover, such temperature divergences are not constant; the chamber temperature changes slightly at positions along the scanning direction, due to changes in states of flow of air within the exposure chamber in accordance with stage movements during exposure operations and due to movements of the driving motor (a heat-generating component), and temperature changes occur at apparatus portions which experience these slight chamber temperature changes.
  • this stable temperature is specified at a time of shipping adjustment. That is, the stable temperature is determined by the temperature of an installation environment at the time of shipping adjustment. Therefore, if the environmental temperature in a location of delivery and installation is greatly different from the temperature of the installation environment at the time of shipping adjustment, there is a problem in that credibility of the stable temperature is lower. In such a case, re-acquisition (re-specification) of the stable temperature in the environmental temperature of the location of installation after shipping is required.
  • a first object of the present invention is to provide an exposure apparatus which, by implementing air conditioning which inhibits temperature divergences and temperature changes that occur along a scanning direction, is capable of realizing high-accuracy exposure.
  • a first aspect of the present invention includes: an exposure unit which illuminates a light beam and scanningly exposes a photosensitive material; a conveyance mechanism which relatively moves with respect to the exposure unit and conveys the photosensitive material along a scanning direction, the photosensitive material being deployed and retained at a deployment surface; an accommodation chamber at which the exposure unit is accommodated and the conveyance mechanism is movably accommodated; an air conditioning unit which supplies temperature-regulated air to the accommodation chamber for air conditioning; and a ventilation unit which is disposed at the accommodation chamber and blows air from the air conditioning unit in a direction along the scanning direction.
  • a second aspect of the present invention includes: an exposure unit which illuminates a light beam and scanningly exposes a photosensitive material; a conveyance mechanism which relatively moves with respect to the exposure unit and conveys the photosensitive material along a scanning direction, the photosensitive material being deployed and retained at a deployment surface; an accommodation chamber at which the exposure unit is accommodated and the conveyance mechanism is movably accommodated; an air conditioning unit which supplies temperature-regulated air to the accommodation chamber for air conditioning; a chamber temperature measurement instrument, which measures a temperature of the accommodation chamber; a control device (a controller) which controls the air conditioning unit in accordance with the temperature measured by the chamber temperature measurement instrument and alters a regulation temperature of the air; and a ventilation unit which is disposed at the accommodation chamber and blows air from the air conditioning unit in a direction along the scanning direction.
  • the accommodation chamber at which the exposure unit which illuminates the light beam and scanningly exposes the photosensitive material and the conveyance mechanism which relatively moves with respect to the exposure unit and conveys the photosensitive material along the scanning direction are movably accommodated, is supplied with temperature-regulated air from the air conditioning unit, and air conditioned.
  • the accommodation chamber at which the exposure unit and the conveyance mechanism are movably accommodated is supplied with temperature-regulated air from the air conditioning unit, and air conditioned.
  • the deployment surface for the photosensitive material at the conveyance mechanism and the photosensitive material deployed on the deployment surface are swept by the air blown in the direction along the scanning direction, and a clean state is maintained without dust and the like accumulating.
  • lifting, mispositioning and the like of photosensitive materials deployed on the deployment surface of the conveyance mechanism, and accumulations of dust and the like on the photosensitive materials are suppressed, and losses of exposure accuracy due to such causes can be prevented.
  • control device may control the air conditioning unit to alter an air conditioning airflow amount in accordance with movement of the conveyance mechanism.
  • an air conditioning airflow amount from the air conditioning unit changes in accordance with movements of the conveyance mechanism such that, for example, when the conveyance mechanism is distant from an outflow port through which air from the air conditioning unit is blown out into the accommodation chamber, the air conditioning airflow amount is made larger, and when the conveyance mechanism is closer, the air conditioning airflow amount is made smaller.
  • the air conditioning airflow amount is changed in proportion to the distance between the conveyance mechanism and the outflow port, continuously (non- stepwise) or stepwise, or the like.
  • the ventilation unit may include: a duct which blows out air from the air conditioning unit to the accommodation chamber; and an airflow direction-altering member which alters an airflow direction of air that has been blown out from the duct to the direction along the scanning direction.
  • an airflow direction of air that has been blown out from the air conditioning unit and through the duct into the air conditioning chamber is altered to the direction along the scanning direction by the airflow direction-altering member.
  • the airflow direction-altering member has a movable form, it will be possible to finely adjust the airflow direction.
  • the ventilation unit may include a duct which blows out air from the air conditioning unit in the direction along the scanning direction.
  • the air that is blown out from the air conditioning unit and through the duct into the accommodation chamber is blown directly from the duct in the direction along the scanning direction. Therefore, the air from the air conditioning unit can be reliably blown in the direction along the scanning direction by a simple structure.
  • a linear-form portion which is formed in a linear form of at least a predetermined length to an outflow port from which the air is blown out, may be provided at the duct.
  • a flow (blowing direction) of the air subsequent to the outflow port is stable, and can be reliably blown in a required direction (the direction along the scanning direction) or to an air supply position.
  • the conveyance mechanism may include an airflow-guiding member which, relative to the deployment surface, is disposed at an upstream side of a flow direction of air that is blown in the direction along the scanning direction, and guides the air that is blown in the direction along the scanning direction over the deployment surface.
  • the air that is blown in the direction along the scanning direction is guided more densely over the deployment surface by the airflow-guiding member provided at the conveyance mechanism. Consequently, temperature changes of the deployment surface and the photosensitive material deployed at the deployment surface are even less likely to occur, and temperature stability is raised. Moreover, because airflow amounts over the deployment surface are increased, sweeping of the deployment surface by the airflow is improved.
  • the conveyance mechanism may be moved in a range which does not substantially .change (is set so as to substantially not change) a form of a space formed between the exposure unit and the conveyance mechanism.
  • An exposure apparatus of either of the first and second aspects described above may further include: a mounting member disposed over a movement path of the conveyance mechanism; and a reading unit which is mounted at the mounting member and reads reference marks representing exposure position references, which are provided at the photosensitive material, for correcting exposure positions relative to the photosensitive material, wherein the mounting member includes a form which does not substantially alter a flow of air that is blown in the direction along the scanning direction when the conveyance mechanism moves.
  • the reading unit which reads the reference marks representing exposure position references, which are provided at the photosensitive material, for correcting exposure positions relative to the photosensitive material, is mounted at the mounting member which is provided on the movement path of the conveyance mechanism, and the reading unit is disposed at the movement path.of the conveyance mechanism.
  • a flow (state of flow) of the air that is blown in the direction along the scanning direction is substantially constant rather than being altered by the mounting member, and an air-cooling state of the mounting member and the reading unit is stable.
  • temperature changes of the mounting member and the reading unit are suppressed and the temperature is kept constant.
  • the mounting member may further include a baffle member which flow-adjusts air that is blown in the direction along the scanning direction.
  • An exposure apparatus of either of the first and second aspects described above may further include: a reading unit which is disposed in juxtaposition with the exposure unit in the direction along the scanning direction, and reads reference marks representing exposure position references, which are provided at the photosensitive material, for correcting exposure positions relative to the photosensitive material; and a transparent partition member in a planar form along the scanning direction, which is disposed between the conveyance mechanism and the exposure unit and reading unit.
  • the transparent partition member which is capable of transmitting the light beam illuminated from the exposure unit and allows the reading unit to read the reference marks representing exposure position references which are provided at the photosensitive material, is provided in the planar form along the scanning direction between the conveyance mechanism and the exposure unit and reading unit. Consequently, when the conveyance mechanism moves, the form of a space around the exposure unit and the reading unit does not change, a state of flow of air that is blown into this space is substantially constant, and air-cooling states of the exposure unit and the reading unit are stable. As a result, temperature changes of the exposure unit are suppressed and the temperature is kept constant, and a reduction in accuracy of exposure positions (light beam illumination positions), due to temperature deformation of the exposure unit as a result of such temperature changes, is suppressed.
  • temperature changes of the reading unit are suppressed and the temperature thereof is kept stable, and a positional shift of the reading unit as a result of such temperature changes, that is, a reduction in accuracy of reference mark reading positions, is suppressed.
  • an air-cooling state of the photosensitive material which is conveyed by the conveyance mechanism and relatively conveyed with respect to the exposure unit and the reading unit is also stable, and thermal deformation thereof is suppressed.
  • gases are evaporated from the photosensitive material that is illuminated by the light beam during exposure, and optical members such as lenses and the like that are provided at the exposure unit and the reading unit may be soiled by these gases.
  • optical members such as lenses and the like that are provided at the exposure unit and the reading unit may be soiled by these gases.
  • the exposure unit and the reading unit are protected from these volatile gases by the partition member, soiling of the optical members is prevented.
  • a driving unit which drives the conveyance mechanism may be mounted at the conveyance mechanism via an insulating member.
  • a driving unit which drives the conveyance mechanism may be exposed and mounted at a surface of the conveyance mechanism
  • the driving unit even if the driving unit is at a high temperature due to, for example, continuously moving the conveyance mechanism, the driving unit which is exposed and mounted at the surface of the conveyance mechanism is efficiently cooled by the air being blown in the direction along the scanning direction. As a result, a temperature rise (temperature change) of the driving unit and the conveyance mechanism is suppressed, and thermal deformation of the photosensitive material due to conduction of heat thereto through the conveyance mechanism is suppressed.
  • the conveyance mechanism may include a movable portion which is capable of raising and lowering the deployment surface and which includes the deployment surface
  • the driving unit may be controlled for driving by the control device and include a stepper motor which generates driving force for driving the movable portion, with the control device implementing current-reduction control at times of standby of the stepper motor.
  • the conveyance mechanism includes the movable portion, which is structured such that the deployment surface at which the photosensitive material is deployed can be raised and lowered, or the like.
  • the deployment surface is raised/lowered, it is possible for exposure and the like to correspond with photosensitive materials of a plurality of varieties with, for example, different thicknesses.
  • the stepper motor which generates driving force for driving the movable portion is controlled for driving by the control device, and a motor driving current which is supplied during standby is lowered by a predetermined amount for current-reduction.
  • heat generation by the stepper motor during standby is suppressed, and a temperature rise (temperature change) of the conveyance mechanism due to conduction of heat thereto from the stepper motor is suppressed.
  • a radiator fin which extends along the scanning direction, may be provided at a surface of the driving unit.
  • radiator fin(s) provided at the surface. Further, because this radiator fin extends in the scanning direction, a flow of air that is blown in the direction along the scanning direction will not be disturbed, and radiation efficiency is raised by this stably flowing air.
  • an exposure apparatus of the structure described above may include a flow change-governing structure, which governs such that a state of flow, at surroundings of the driving unit, of air that is blown in the direction along the scanning direction does not substantially change when the conveyance mechanism moves.
  • the conveyance mechanism when the conveyance mechanism moves, the state of flow at surroundings of the driving unit of the air that is blown in the direction along the scanning direction is governed by the flow change-governing structure so as to be substantially unchanged. As a result, an air-cooling state of the driving unit is stable, and a temperature rise (temperature change) of the conveyance mechanism due to conduction of heat thereto from the driving unit is suppressed. Further still, the conveyance mechanism may include an air cooling unit which blows air at the driving unit for air cooling.
  • the air cooling unit is provided at the conveyance mechanism and blows air at the driving unit for cooling.
  • an effect of cooling of the driving unit is enhanced, and an effect of inhibiting a temperature rise (temperature change) of the conveyance mechanism is enhanced.
  • the conveyance mechanism may be provided with a radiator fin which extends along the scanning direction at at least a portion of an outer peripheral face, excluding the deployment surface.
  • the surface area of the conveyance mechanism is enlarged and heat-release is promoted by the radiator fin(s) provided at at least a portion of the outer peripheral surface of the conveyance mechanism, excluding the deployment surface at which the photosensitive material is deployed. Further, because the radiator fin extends in the scanning direction, a flow of air which is blown in the direction along the scanning direction will not be disturbed, and heat-release efficiency is raised by this stably flowing air.
  • a heatshield member may be provided at the conveyance mechanism, at at least a portion of an outer peripheral face, excluding the deployment surface.
  • the heatshield member is provided at at least a portion of the outer peripheral face of the conveyance mechanism, excluding the deployment surface at which the photosensitive material is deployed, a temperature rise due to, for example, thermal conduction from the driving unit which is mounted via the heatshield member, a temperature rise due to. radiant heat from a heat-generating member disposed in the vicinity of the conveyance member, or the like is suppressed.
  • the air conditioning unit may include a cleaning unit which cleans external air that is taken in, and supplies the air cleaned by the cleaning unit to the accommodation chamber.
  • the external air that the air conditioning unit takes in is cleaned by the cleaning unit, and the air that has been cleaned is supplied to the accommodation chamber. Consequently, a degree of cleanliness of air of the accommodation chamber is improved, and adverse effects on exposure due to dust and the like floating in the accommodation chamber can be prevented. Further, because this cleaned air is blown in the direction along the scanning direction, soiling with dust or the like at, for example, the photosensitive material deployment surface of the conveyance mechanism, the movement path of the conveyance mechanism or the like is reliably prevented.
  • the chamber temperature measurement instrument may be disposed at a vicinity of the conveyance mechanism.
  • the temperature of the conveyance mechanism vicinity is measured by the chamber temperature measurement instrument, temperature regulation of the air is implemented by the air conditioning unit in accordance with the measured temperature, and the accommodation chamber is air conditioned.
  • temperature control of the accommodation chamber in accordance with a temperature of the photosensitive material deployed at the deployment surface of the conveyance mechanism (a temperature of the environment in which the apparatus is installed) is possible from outside the apparatus, and it is possible to, for example, bring the temperature of the accommodation chamber (chamber temperature) closer to the temperature of the photosensitive material.
  • thermal deformation amounts of the photosensitive material which are caused by a temperature difference between the apparatus installation environment and the chamber temperature subsequent to deployment at the conveyance mechanism are suppressed.
  • the air conditioning unit may be provided with an external air temperature measurement instrument which measures, at an intake port which takes in external air, a temperature of the external air, and the control device controls the air conditioning unit in accordance with the temperature measured by the external air temperature measurement instrument and the temperature measured by the chamber temperature measurement instrument, for changing the regulation temperature of the air.
  • the control device controls the air conditioning unit on the basis of the measured temperature of external air and the measured temperature of the accommodation chamber, and a regulation temperature of the air supplied to the accommodation chamber is changed.
  • temperature control of the accommodation chamber in accordance with the temperature of the photosensitive material deployed at the conveyance mechanism (the temperature of the apparatus installation environment) from outside the apparatus is possible.
  • An exposure apparatus of either of the first and second aspects described above may further include a component accommodation chamber which is provided separately from the accommodation chamber, a heat-generating component, which generates heat at a time of apparatus operation, being accommodated in the component accommodation chamber.
  • the heat-generating component which generates heat during operations of the apparatus such as a control board, a power supply unit or the like
  • the component accommodation chamber which is provided separately from the accommodation chamber
  • a number of heat-generating components (heat sources) that are disposed in the accommodation chamber can be made smaller.
  • temperature changes of the accommodation chamber are suppressed and air conditioning control is easier, and temperature divergences and temperature changes which occur along the scanning direction are more easily inhibited.
  • An exposure apparatus of the structure described above may further include a cover body, inside which the accommodation chamber is provided and an apparatus main body is accommodated, the component accommodation chamber being formed along a wall face of the cover body.
  • the component accommodation chamber for accommodating heat-generating components such as a. control board, a power supply unit and the like
  • the control board, power supply unit and the like can be disposed close to control subjects, a power supply section and the like of the apparatus main body.
  • paths of wiring which electrically connects therebetween are shortened, and it is possible to simplify wiring processes and improve noise resistance of the wiring.
  • air conditioning is performed to inhibit temperature divergences, temperature changes and the like which arise along a scanning direction, and high-accuracy exposure can be realized.
  • a second object of the present invention is to provide an exposure apparatus which can realize exposure processing in accordance with user judgments and achieve an improvement in productivity.
  • an exposure apparatus relating to a third aspect of the present invention includes: an exposure unit which illuminates a light beam and scanningly exposes a photosensitive material; a conveyance mechanism which relatively moves with respect to the exposure unit and conveys the photosensitive material along a scanning direction; an accommodation chamber at which the exposure unit is accommodated and the conveyance mechanism is movably accommodated; chamber temperature measurement instruments, which are provided at a plurality of locations of the accommodation chamber and measure temperatures of the plurality of locations; a control device which judges a degree of temperature stability of each of the plurality of locations from results of measurement by the chamber temperature measurement instruments; and a display unit which displays an exposure performance level, which is derived from the judgment results of the control device.
  • an exposure apparatus of the third aspect described above may include an input unit, for implementing an exposure commencement instruction in accordance with the exposure performance level displayed at the display unit.
  • an exposure performance level is identified to a user by the display unit. Further, when the input unit is included, the user can instruct exposure commencement in accordance with the exposure performance level identified by the user. Accordingly, it is possible to implement exposure processing even when the temperatures of the respective locations are not stable, and therefore it is possible to achieve an improvement in productivity.
  • the exposure performance level may include a duration until exposure is possible.
  • the duration until exposure is possible is judged and, according to that duration, a user can determine whether to start exposure after waiting until the temperature is stable or to start exposure without waiting until the temperature is stable.
  • an exposure apparatus of the third aspect described above may be structured such that, depending on the exposure performance level, a further reconfirmation (of exposure commencement) is implemented after an exposure commencement instruction.
  • an exposure apparatus of the third aspect described above may be structured such that, depending on the exposure performance level, after an exposure commencement instruction, exposure processing is automatically commenced after waiting until the temperatures of all of the plurality of locations are stable. In such a case, even if the exposure commencement instruction is given in a state in which the temperatures are not stable, the exposure apparatus does not commence exposure processing until the temperatures are stable. Thus, erroneous operations can be prevented, and exposure processing whose quality is assured is realized.
  • exposure processing can be implemented in accordance with user judgments, and an exposure apparatus which enables an improvement in productivity can be provided.
  • a third object of the present invention is to provide an exposure apparatus which enables re-specification of a stable temperature that will assure image exposure quality in response to a change in an installation environment temperature.
  • an exposure apparatus of a fourth aspect of the present invention includes: an exposure unit which illuminates a light beam and scanningly exposes a photosensitive material; a conveyance mechanism which relatively moves with respect to the exposure unit and conveys the photosensitive material along a scanning direction; an accommodation chamber at which the exposure unit is accommodated and the conveyance mechanism is movably accommodated; chamber temperature measurement instruments, which are provided at a plurality of locations of the accommodation chamber and measure temperatures of the plurality of locations; a control device which judges a degree of temperature stability of each of the plurality of locations from results of measurement by the chamber temperature measurement instruments, compares temperatures that are judged to be stable with a pre-specified stable temperature for each of the plurality of locations, and judges a state of stability of each of the plurality of locations; and overwriting means for overwriting the stable temperature in accordance with judgment results of the control device.
  • the stable temperature can be overwritten (re-specified) by the overwriting means. Therefore, even if an installation environment temperature at a time of shipping adjustment and an actual installation environment temperature greatly differ, it is possible to respond appropriately. That is, with this exposure apparatus, it is possible to specify an optimum stable temperature in accordance with an installation environment temperature, and thus a range of adaptability to variations in installation environment temperature is widened.
  • an exposure apparatus of the fourth aspect of the invention may include a display unit which displays that overwriting of the stable temperature is required.
  • an exposure apparatus of the fourth aspect of the invention may include changing means for changing an apparatus-particular parameter in accordance with overwriting of the stable temperature.
  • the apparatus-particular parameters to be mentioned are a light amount distribution at the exposure unit, exposure amounts, an inclination, image-joins, a magnification ratio and so forth.
  • the exposure apparatus may include a display unit which displays that a change of the parameter is required.
  • an exposure apparatus can be provided which enables re-specification of a stable temperature that assures image exposure quality in response to a change in an installation environment temperature.
  • Figure 1 is a perspective view showing an exposure apparatus relating to a first embodiment of the present invention.
  • Figure 2 is a side view showing the exposure apparatus relating to the first embodiment of the present invention in a state in which an apparatus main body is accommodated in a cover body.
  • Figure 3 is a side view showing the apparatus main body in the state of having been accommodated in the cover body, relating to the first embodiment of the present invention.
  • Figure 4 is a plan view showing the apparatus main body relating to the first embodiment of the present invention.
  • Figure 5 is a rear view showing the apparatus main body in the state of having been accommodated in the cover body, relating to the first embodiment of the present invention.
  • Figure 6 is a perspective view showing a stage which is provided at the apparatus main body relating to the first embodiment of the present invention.
  • Figure 7 A is a plan view showing the stage relating to the first embodiment of the present invention.
  • Figure 7B is a front view showing the stage relating to the first embodiment of the present invention.
  • Figure 7C is an enlarged front view showing the stage relating to the first embodiment of the present invention, in which a coil portion vicinity of Figure 7B is enlarged.
  • Figure 8 A is a plan, view showing an exposure pattern which is exposed by .an exposure unit relating to the first embodiment of the present invention.
  • Figure 8B is a plan view showing a pattern of arrangement of a plurality of array heads which are provided at the exposure unit.
  • Figure 9 is a perspective view showing an alignment unit relating to the first embodiment of the present invention.
  • Figure 10 is a side view showing a state in which the stage of the apparatus main body of Figure 3 is disposed at a downstreammost position in a direction of outward movement.
  • Figure 11 is a side view showing an apparatus main body in a state of having been accommodated in a cover body, relating to a second embodiment of the present invention.
  • Figure 12 is a side view showing a state in which a stage of the apparatus main body of Figure 11 is disposed at a downstreammost position in a direction of outward movement.
  • Figure 13 is a side view showing an apparatus main body in a state of having been accommodated in a cover body, relating to a third embodiment of the present invention.
  • Figure 14 is a side view showing an apparatus main body in a state of having been accommodated in a cover body, relating to a fourth embodiment of the present invention.
  • Figure 15 is a side view showing a state in which a stage of the apparatus main body of Figure 14 is disposed at a downstreammost position in a direction of outward movement.
  • Figure 16A is a rear view showing an apparatus main body relating to a fifth embodiment of the present invention.
  • Figure 16B is a side view showing principal elements of the apparatus main body relating to a fifth embodiment of the present invention.
  • Figure 17 is a perspective view showing a stage which is provided at an apparatus main body relating to a sixth embodiment of the present invention.
  • Figure 18A is a side view showing a stage relating to a seventh embodiment of the present invention.
  • Figure 18B is a plan view showing the stage relating to the seventh embodiment of the present invention.
  • Figure 19 is a front view showing a stage relating to an eighth embodiment of the present invention.
  • Figure 20 is a front view showing a stage relating to a ninth embodiment of the present invention.
  • Figure 21 is a flowchart describing operations relating to a tenth embodiment of the present invention.
  • Figure 22 is a flowchart describing operations relating to an eleventh embodiment of the present invention.
  • FIG. 1 An exposure apparatus relating to a first embodiment of the present invention is shown in Figures 1 to 5.
  • Figures 6 and 7 show a stage for photosensitive material conveyance which is provided at the exposure apparatus relating to the present embodiment.
  • an exposure apparatus 10 has a structure in which an apparatus main body 20 is accommodated in a large cover body 12.
  • the exposure apparatus 10 is disposed in an air-conditioned environment, such as a clean room or the like, in which temperature and humidity in the room are managed, and dust, microscopic particles and the like floating in the air in the room are removed to maintain a high degree of air cleanliness.
  • the cover body 12 has a structure in which a plurality of panels 16, which isolate the interior from the exterior, are mounted at a frame body which is formed by assembling rod-like angular pipes 14 into the form of a frame (see Figure 5).
  • a lower face portion of the cover body 12 is left open and an accommodation chamber 13 is formed, which accommodates the apparatus main body 20 thereinside.
  • the angular pipes 14 at a lower portion are disposed on a floor surface, and are joined to and supported at a pair of frame stands 24.
  • the cover body 12 is structured by a substantially cubic cover main body portion 12 A and a setting portion 12B.
  • the cover main body portion 12A is provided thereinside with an exposure chamber (chamber) 15 which structures a portion of the accommodation chamber 13, and accommodates principal components of the apparatus main body 20.
  • the setting portion 12B is provided protruding from one side face of the cover main body portion 12A, accommodates a stage 28 and the like of the apparatus main body 20, and is for loading and unloading a photosensitive material 40, such as a circuit board or the like, at the stage 28.
  • the panels 16 provided at the cover main body portion 12A are structured with interior panels 16A and exterior panels 16B.
  • the interior panels 16A structure inner wall faces of the cover main body portion 12A and form the exposure chamber 15.
  • the exterior panels 16B are disposed at outer sides of the interior panels 16 A, with predetermined spacings therefrom, and structure outer apparatus faces of the cover main body portion 12 A.
  • wall faces of the cover body 12 have two-layer structures.
  • a component accommodation chamber 17 is provided between the interior panels 16Aand the exterior panels 16B.. This component accommodation chamber 17 is a laminar cavity which is substantially sealed, and is formed along wall faces of the cover body 12.
  • an upper face of the setting portion 12B is set lower than that of the cover main body portion 12A, and is specified so as to be substantially at waist height for an operator standing in front of the setting portion 12B.
  • a rectangular aperture 18 is formed in the upper face of the setting portion 12B, at a position corresponding with the stage 28, and an opening/closing panel 19, for opening and closing the aperture 18, is also provided at the upper face of the setting portion 12B.
  • An edge portion at the cover main body portion 12A side of the opening/closing panel 19 is mounted to the setting portion 12B via an unillustrated hinge.
  • the opening/closing panel 19 opens and closes the aperture 18 by being turned about the hinge by manual operation by an operator.
  • a temperature sensor 72 which measures a temperature of the accommodation chamber 13, is mounted at a rear face of the opening/closing panel 19.
  • a photosensitive material deployment surface 28A which is an upper face of the stage 28, is exposed through the aperture 18.
  • the stage 28 is concealed and the temperature sensor 72 is disposed in an upward vicinity of the stage 28, and there is a state in which only the lower face portion of the setting portion 12B is open.
  • the temperature sensor 72 disposed in the vicinity of the stage 28 may be replaced with a non-contact type infrared temperature sensor, which measures temperature of the photosensitive material 40 just after the photosensitive material 40 has been deployed on the stage 28.
  • the level table 22 is supported at the frame stands 24 to which the angular pipes 14 structuring the cover body 12 are joined. As shown in the drawings, the level table 22 is disposed to extend from inside the setting portion 12B to inside the cover main body portion 12A (the exposure chamber 15).
  • a pair of guide rails 26 are laid at an upper face of the level table 22.
  • the guide rails 26 extend in straight lines along a length direction of the level table 22 (the direction of arrow Y) and are arranged in parallel with one another.
  • a linear stage movement path is formed on the level table 22 by this pair of guide rails 26.
  • the aforementioned stage 28, which is formed in a rectangular pedestal form, a platform 30, a raising/lowering mechanism 32 and a measurement unit 70 are formed as a unit with the stage 28 and disposed on the pair of guide rails 26.
  • the platform 30 movably supports the stage 28.
  • the raising/lowering mechanism 32 raises and lowers the stage 28.
  • This measurement unit 70 is provided with a light amount measurement instrument, a beam position detector, and a reference plate for camera calibration, which are described in more detail later.
  • the platform 30 has a rectangular flat board form.
  • Four leg portions 34 which are slidably engaged with the guide rails 26, are mounted at vicinities of the four corners of a lower face of the platform 30.
  • the stage 28 is disposed in parallel with the platform 30, with a predetermined spacing, at an upper face of the platform 30, and the raising/lowering mechanism 32 is provided at the upper face of the platform 30.
  • the raising/lowering mechanism 32 moves the platform 30 in vertical directions (the direction of arrow Z).
  • a stepper motor 36 which generates driving force for raising and lowering operations, protrudes (is exposed) from the side face portion and is mounted thereat.
  • a length direction of the stage 28 is oriented along the direction of extension of the guide rails 26, the stage 28 is disposed on the level table 22, and the leg portions 34 of the platform 30 which are engaged with the pair of guide rails 26 can slide against the guide rails 26.
  • a stage movement path which is guided by the guide rails 26 and is provided in a straight-line form on the level table 22, enables reciprocating movement of the stage 28 in the direction of arrow Y
  • a linear movement-type linear servo motor 38 is provided at the upper face of the level table 22, between the pair of guide rails 26, to serve as a drive source for stage movement. Moreover, a linear encoder 37 is additionally provided at the linear servo motor 38.
  • the linear servo motor 38 is structured by a circular rod ⁇ form stator portion (magnet portion) 38A and a tubular coil portion 38B (see Figures 3 and 5).
  • the stator portion 38A extends in parallel with the guide rails 26 along the length direction of the level table 22 (the direction of arrow Y).
  • the coil portion 38B is mounted at the lower face of the platform 30, and the stator portion 38A is inserted through the coil portion 38B.
  • a plurality of radiator fins 38C are integrally provided at a lower face and two side faces of the coil portion 38B. These radiator fins 38C extend (protrude) along an axial direction of the coil portion 38B (the direction of arrow Y).
  • the coil portion 38B disposed at the lower face of the platform 30 is mounted in a state in which an upper face of the coil portion 38B does not directly contact the lower face of the platform 30 but, as shown in Figures 7Ato 7C, a gap is formed between the coil portion 38B and the lower face of the platform 30 by an interposed plurality of insulating bushes 39 which are formed in ring shapes, and the coil portion 38B protrudes (is exposed) from the lower face of the platform 30.
  • the insulating bushes 39 are formed of a low thermal conductivity-low thermal expansivity material such as, for example, glass, ceramic or the like.
  • a force driving the stator portion 38A in the axial direction of the coil portion 38B is generated by magnetic action between a magnetic field which is formed by conduction of electricity through the coil portion 38B and a magnetic field of the stator portion 38 A.
  • the stage 28 is guided along the pair of guide rails 26, and reciprocatingly moves in the direction of arrow Y along the stage movement path on the level table 22 (see Figure 10).
  • an outward movement direction (an alignment measurement direction) of the stage 28 is shown by the arrow YA in the drawings, and a return movement direction (an exposure direction/a scanning direction) is shown by arrow YB.
  • the linear encoder 37 outputs pulse signals, with predetermined polarities corresponding to the directions of reciprocating movement, with numbers of pulses which are proportional to movement amounts, to a pulse counter. Control of movements of the stage 28, such as constant speed movement, reverse movement, stopping and the like, is implemented in accordance with the pulse signals from this linear encoder 37.
  • the photosensitive material 40 is an exposure subject which is to be image-exposed by the exposure apparatus 10 of the present embodiment, and is, for example, a printed circuit board at which a pattern is to be image-exposed for formation of a wiring pattern or suchlike, or the like.
  • the photosensitive material deployment surface 28 A provided at the upper face of the above-described stage 28 the photosensitive material 40 is set in a state of being positioned at a predetermined deployment position by an unillustrated positioning portion.
  • alignment marks M representing exposure position references are plurally provided at vicinities of corner portions of the photosensitive material 40 (in the present embodiment, four positions at vicinities of the respective corner portions). These alignment marks M are formed by, for example, circular through-holes or the like. Further, an unillustrated plurality of groove portions are formed in the photosensitive material deployment surface 28Aof the stage 28. The photosensitive material 40 is adhered by suction and retained on the stage 28 by negative pressure from negative pressure supplies in these groove portions.
  • a pair of support pillars 42 are provided standing at two end portions in a width direction of the upper face of the level table 22 (the direction of arrow X), at a substantially central position of the stage movement path that is provided on the level table 22.
  • An exposure unit 44 is mounted at upper portions at one side (the setting portion 12B side) of this pair of support pillars 42.
  • the exposure unit 44 is provided with a plurality of exposure heads 46, which irradiate light beams from above to scanningly expose the photosensitive material 40 which is being conveyed in the scanning direction by return movement of the stage 28 (the direction of arrow YB).
  • An alignment unit 60 is mounted at upper portions of the other side of the pair of support pillars 42.
  • the alignment unit 60 is provided with a plurality of cameras 62, which are disposed to correspond with positions of the alignment marks M, relative to the photosensitive material 40 being conveyed in the alignment measurement direction by outward movement of the stage 28 (the direction of arrow YA), and photograph the alignment marks M from above.
  • the exposure unit 44, the alignment unit 60 and the pair of support pillars 42 supporting the respective end portions of these units are structured in a gate form, which straddles the stage movement path as shown in Figure 1 and allows passage of the stage 28, and are disposed in the exposure chamber 15.
  • the exposure unit 44 is provided with a unit base 48 bridging between the pair of support pillars 42, and the plurality (for example, eight) of exposure heads 46 are mounted at this unit base 48.
  • the plurality of exposure heads 46 are arranged in a substantial matrix pattern of m columns by n rows (for example, two columns by four rows), along the movement direction of the stage 28 (the direction of arrow Y) and an intersecting direction (the direction of arrow X).
  • a component accommodation chamber 49 is provided at another side portion of the cover main body portion 12 A.
  • the component accommodation chamber 49 is structured to be partitioned from the exposure chamber 15.
  • a ventilation fan 78 is mounted at a side face (the exterior panels 16B) of the cover main body portion 12 A. This ventilation fan 78 exhausts air in the component accommodation chamber 49 (high-temperature air) to the exterior and suppresses a temperature rise in the component accommodation chamber 49.
  • a plurality of laser light sources are incorporated in the light source unit 50. Laser lights emitted from the laser light sources are guided through unillustrated optical fibers to the exposure heads 46 of the exposure unit 44.
  • Each exposure head 46 is equipped with an (unillustrated) digital micromirror device (DMD), which serves as a spatial light modulator which modulates the laser light emitted from the light source unit 50 at each of pixels in accordance with image data.
  • DMD digital micromirror device
  • the incident light (laser light) from the light source unit 50 is modulated in pixel units by this DMD and emitted as an exposure beam (a laser beam).
  • the exposure unit 44 illuminates the respective light beams from the exposure heads 46 onto the surface of the photosensitive material 40 on the stage 28 with predetermined timings, and exposes an image pattern (image exposure).
  • respective exposure areas 52 that are exposed by the light beams illuminated from the respective exposure heads 46 have rectangular forms with short sides along the scanning direction, and are inclined at a predetermined angle with respect to the scanning direction.
  • a strip-form exposed region 54 is formed at the photosensitive material 40 by each exposure head 46.
  • the alignment unit 60 is provided with a unit base 64 which is mounted at the pair of support pillars 42. As shown in Figure 3, this unit base 64 is formed in a T-shape in cross-section.
  • a pair of guide rails 66 are provided extending along the direction intersecting the movement direction (the direction of arrow Y) of the stage 28 (i.e., the direction of arrow X).
  • Each camera 62 is slidably guided by this pair of guide rails 66, is driven by a respectively separately provided ball-screw mechanism 68 and an unillustrated driving source which drives the ball-screw mechanism 68, such as a stepper motor or the like, and each camera 62 moves independently in the direction intersecting the movement direction of the stage 28.
  • each camera 62 is disposed at an attitude in which a lens portion 62B provided at a distal end of a camera main body 62A is oriented downward and a lens optical axis is substantially vertical.
  • a ring-form flash light source (an LED flash light source) 62C is mounted at a distal end portion of the lens portion 62B.
  • each camera 62 is moved in the direction of arrow X by the above-mentioned drive, source and ball-screw mechanism 68, and disposed at a. respective predetermined photography position. That is, the lens optical axis is disposed so as to match a position at which an alignment mark M of the photosensitive material 40 being conveyed by the stage 28 will pass through.
  • the flash light source 62C emits light and, of the flash light illuminated at the photosensitive material 40, light that is reflected from the upper face of the photosensitive material 40 is incident at the camera main body 62 A via the lens portion 62B.
  • the alignment marks M are photographed.
  • the laser light incident from the light source unit 50 is modulated by the DMD, the light beam is illuminated to the photosensitive material 40, and image exposure is performed. Because of interference which occurs during this operation, variations over time and suchlike, a light amount distribution of the light beams that are reflected from the DMDs and emitted may become non-uniform with respect to the direction intersecting the scanning direction, and exposure amounts of portions of the photosensitive material 40 which are to be exposed with exposure amounts of predetermined values may vary from the predetermined exposure amount values.
  • a light amount measurement instrument (light amount-measuring means) for measuring a light amount distribution and exposure amounts of the light beams that are emitted from the DMDs.
  • a reference plate for beam position detection and light detectors are provided for detecting exposure positions of the light beams.
  • an attitude change of each camera 62 of the alignment unit 60 may be caused by rolling, pitching and/or yawing during movement, and an optical axis center of the lens portion 62B may be shifted from the proper position in the state in which the camera 62 is disposed at the photography position. Consequently, as a result of such effects, when the alignment function is used to correct exposure positions and image exposure is performed, the exposure positions may be mispositioned from the correct positions and beyond a range of tolerance. Accordingly, in this exposure apparatus 10, in order to calibrate the alignment function whose accuracy is affected by optical axis shifts due to attitude changes of the cameras 62, a reference plate for camera calibration is provided.
  • the camera calibration reference plate is plurally provided with calibration marks to be photographed by the cameras 62.
  • the light amount measurement instrument, the beam position detector and the camera calibration reference plate are structured to be integrally provided at the measurement unit 70, which is mounted at a front side portion of the stage 28.
  • a light amount measurement operation, for shading adjustment and exposure amount adjustment, and an exposure position detection operation of the light beams, for correcting joins of the images formed by the light beams which are emitted from the exposure heads 46, are executed at predetermined times among exposure operations (for example, after a predetermined number of exposure operations on photosensitive materials).
  • Calibration of the alignment function is executed at a time of manufacture, a time of maintenance and the like, and/or a predetermined time among exposure operations.
  • the exposure apparatus 10 is provided with an air conditioner 80, which air conditions the accommodation chamber 13 inside the cover body 12, at which the apparatus main body 20 is accommodated.
  • the air conditioner 80 is connected with the exposure chamber 15 in the cover body 12 by a circular tube-form duct 82.
  • the air conditioner 80 gathers dust, microparticles and the like by passing air (external air) of the installation environment, which has been taken in through an intake port 84, through a built-in HEPA filter (high-efficiency particulate air filter) 88 to clean the air, adjusts the air to a predetermined temperature and humidity, and exhausts the air to the duct 82.
  • a temperature sensor 86 is mounted at the intake port 84. The temperature sensor 86 measures a temperature of the external air which is sucked in to the air conditioner 80.
  • a distal end portion 82 A of the duct 82 is mounted at an inner wall face 15 A of the exposure chamber 15 interior which opposes an inner wall face near which the exposure unit 44 is disposed.
  • This distal end portion 82A is disposed at an upper portion location of the inner wall face 15 A and, as shown in Figure 4, substantially centrally in a width direction of the exposure chamber 15 (the direction of arrow X).
  • An outflow port 82B of the duct 82 is formed as a circular opening, and is oriented downward so as to blow cooling air from the air conditioner 80 substantially straight down.
  • the distal end portion 82 A of the duct 82 is formed with a linear form. A length of this linear-form portion (a length L to the outflow port 82B) is set to a predetermined dimension.
  • a flow rate, flow amount and the like of the cooling air that is blown out from the outflow port 82B of the duct 82 is adjustable.
  • a flow rate at the outflow port 82B is set to 9.4 m/s and a flow amount (volume flow amount) is set to 10 m 3 /min.
  • the length (L) of the distal end portion 82 A (the linear-form portion) is set to at least 30 cm, and a diameter (D) of the outflow port 82B is set to 15 cm.
  • An airflow direction-altering plate 90 which is formed in a rectangular plate shape, is provided downward of the outflow port 82B of the duct 82.
  • the airflow direction-altering plate 90 has a width dimension substantially the same as the stage 28, and is disposed substantially centrally in the width direction of the exposure chamber 15 such that a central portion of the airflow direction-altering plate 90 is located substantially directly below the outflow port 82B of the duct 82.
  • one long edge portion (a base end portion) of the airflow direction-altering plate 90 is mounted to the inner wall face 15A of the exposure chamber 15 by a hinge 92, and can be turned about the hinge 92.
  • a distal end side of the airflow direction-altering plate 90 is supported by an angle adjustment mechanism 94, and an inclination angle can be adjusted by manual operation of this angle adjustment mechanism 94.
  • the inclination angle of this airflow direction-altering plate 90 is adjusted so as to be angled downward by a predetermined angle (for example, about 45°) from the base end side toward the distal end side, in a direction toward the interior of the exposure chamber 15.
  • a predetermined angle for example, about 45°
  • the distal end portion is disposed at a height which will not impede movement of the stage 28.
  • a blowing direction of the cooling air that has been blown downward from the outflow port 82B of the duct 82 and supplied into the exposure chamber 15 is changed to a substantially horizontal direction by the airflow direction-altering plate 90, and blows in a direction along the scanning direction (the direction of arrow YB).
  • a baffle plate 96 is provided at a side of the stage 28.
  • the baffle plate 96 is fabricated of sheet metal or the like in a rectangular plate form, with a long direction being acutely inflected.
  • One of portions of the baffle plate 96 that are set apart by an angled portion serves as a baffle plate main body portion 96 A, and the other portion serves as a mounting plate portion 96B.
  • a distal end portion (rear end portion) of the mounting plate portion 96B is mounted at a front end portion of the platform 30 and the baffle plate 96 is disposed forward of the stage 28.
  • the baffle plate 96 has a width dimension of around half of a width dimension of the stage 28, and is substantially centrally disposed in the width direction with respect to the stage 28 (the platform 30). Furthermore, as shown in Figure 3, the mounting plate portion 96B, which protrudes forward from the platform 30, is arranged substantially horizontally, and the baffle plate main body portion 96A, which is disposed upward of the mounting plate portion 96B, is disposed to be inclined upward by a predetermined angle (for example, about 45°) from a base end side (the angled portion side) toward a distal end portion, in a direction toward the stage 28.
  • a predetermined angle for example, about 45°
  • the baffle plate 96 When the stage 28 is disposed at the origin position shown in Figures 3 and 4, the baffle plate 96 is disposed substantially directly below the cameras 62 provided at the alignment unit 60. As shown in Figure 10, when the stage 28 moves into the exposure chamber 15, the baffle plate 96 advances together with the measurement unit 70 into an escape cavity 15B, which is recessed into a lower portion of the inner wall face 15A structuring the exposure chamber 15.
  • a static removal device (an ionizer) 98 is provided above a front portion of the stage 28 that is disposed at the origin position, spanning the width direction of the stage 28.
  • the static removal device 98 is structured by a hollow pipe-form outflow portion 98A and an ion generation portion 98B, which supplies ionized air to the outflow portion 98A.
  • ions are generated by corona discharges occurring between an earth electrode and a discharge electrode. These ions are supplied to the outflow portion 98A by a ventilation source, and the ionized air is blown out from the outflow portion 98A toward the photosensitive material deployment surface 28A of the stage 28.
  • the exposure apparatus 10 is provided with a controller 100 (a control device), which controls the apparatus main body 20, the air conditioner 80 and so forth.
  • This controller 100 is connected with the above-described stepper motor 36, linear encoder 37 and linear servo motor 38 provided at the apparatus main body 20, the exposure heads 46 of the exposure unit 44, the cameras 62 and driving sources for camera movement of the alignment unit 60, the measurement unit 70, the negative pressure supplies, the temperature sensor 72 provided in the accommodation chamber 13, the static removal device 98, the light source unit 50, power supply unit 74 and control unit 76 provided in the component accommodation chamber 49, the air conditioner 80, the temperature sensor 86 and so forth. These are controlled for respective operations by the controller 100.
  • control circuit boards 102 are accommodated in the aforementioned component accommodation chamber 17 of the cover body 12.
  • These control circuit boards 102 are fixed to respective bases 104 and mounted at outer side faces of the interior panels 16 A, and are connected with the controller 100.
  • These control circuit boards 102 include circuit boards which control the exposure unit 44, the cameras 62, the static removal device 98 and the like of the apparatus main body 20 in conjunction with the controller 100. These circuit boards are disposed adjacent to their respective control subjects.
  • a ventilation fan 106 is mounted at the exterior panels 16B provided at an upper portion of the cover body 12. The ventilation fan 106 exhausts air in the component accommodation chamber 17 (high-temperature air) to the exterior, and suppresses temperature rises in the component accommodation chamber 17.
  • the stage 28 provided at the apparatus main body 20 is disposed at the origin position shown in Figures 1 to 4.
  • the controller 100 when an operator operates the controller 100 and turns on the power supply of the exposure apparatus 10, electricity is conducted through power supply portions of the apparatus main body 20 and heat is generated, and air in the accommodation chamber 13 is warmed and the temperature gradually rises.
  • the stepper motor 36 for raising/lowering the stage, the coil portion 38B of the linear servo motor 38 for moving the stage, the exposure unit 44 and the alignment unit 60 which are particularly prone to high temperatures during exposure operations, are arranged along the scanning direction, the chamber temperature becomes non-uniform along the scanning direction, and. temperature divergences are likely to be formed along the scanning direction.
  • Air Conditioning Operation Air Conditioning Operation
  • the air conditioner 80 After the power supply is turned on, when an operator operates for commencement of air conditioning operations from the controller 100, or by manual operation, the air conditioner 80 operates.
  • the air conditioner 80 passes external air, which has been taken in through the intake port 84, through the built-in HEPA filter 88 to clean the air, adjusts the air to a predetermined temperature and humidity to produce cooling air (cool air) for air conditioning, and exhausts the cooling air to the duct 82.
  • This cooling air is blown substantially straight down (arrows ARl in Figure 3) from the outflow port 82B of the duct 82, with a flow rate and flow amount which have been specified beforehand via the controller 100, and is supplied to the exposure chamber 15.
  • the blowing direction of the cooling air that has been blown straight down from the duct 82 is changed to a substantially horizontal direction by the airflow direction-altering plate 90, and the cooling air is blown in a direction along the scanning direction (arrows AR2 of Figure 3).
  • peripheral air which has stagnated at an upper portion of the exposure chamber 15 interior also flows in the direction along the scanning direction (arrows AR3 and AR4 of Figure 3).
  • cooling air which is blown in the direction along the scanning direction and flows toward the stage 28
  • an airflow which flows along the middle of the stage movement path flows up along the baffle plate 96 and is guided beneath the exposure unit 44 (arrows AR5 and AR6 of Figure 3).
  • the cooling air is blown further along the scanning direction, passes beneath the alignment unit 60 and the exposure unit 44 (arrow AR7 of Figure 3), passes over the photosensitive material deployment surface 28Aof the stage 28 (arrow AR8 of Figure 3) and, upon reaching a rear end portion of the stage 28, the blowing direction thereof is changed to downward along an inner wall face of the setting portion 12B (arrow AR9 of Figure 3).
  • the controller 100 acquires a temperature of the accommodation chamber 13 from a temperature measured by the temperature sensor 72 that is disposed in the accommodation chamber 13 at a vicinity upward of the stage 28 and, from a temperature of external air that is measured by the temperature sensor 86 provided at the intake port 84 of the air conditioner 80, acquires a temperature of an apparatus installation environment, such as a clean room or the like, in which the exposure apparatus 10 is installed and the photosensitive material 40 is placed prior to exposure. On the basis of these measured temperatures, the controller 100 performs temperature regulation (air conditioning control) of the air that is supplied to the accommodation chamber 13 (the exposure chamber 15).
  • temperature regulation air conditioning control
  • the air conditioner 80 is controlled and the temperature of the cooling air that the air conditioner 80 produces is regulated such that the temperature of the accommodation chamber 13 (the temperature of the stage vicinity) is substantially the same as the temperature of the apparatus installation environment or within a predetermined temperature difference therefrom (for example, ⁇ 0.2°C).
  • a chamber temperature of the accommodation chamber 13, particularly the vicinity upward of the stage 28, is constantly kept substantially the same as or within the predetermined temperature difference of the temperature of the apparatus installation environment.
  • the cooling air supplied to the exposure chamber 15 is blown in the direction along the scanning direction in the accommodation chamber 13 that includes the exposure chamber 15, a temperature distribution of the accommodation chamber 13 along the scanning direction is substantially uniform, and temperature changes along the scanning direction are less likely to occur. Furthermore, in the exposure chamber 15, the air in the chamber is circulated by the blowing of the cooling air, and temperature rises in the entire chamber are suppressed. Thus, heat-generating portions of the apparatus main body 20 are air-cooled and temperature rises are suppressed. Moreover, dust floating in the air inside the accommodation chamber 13 is exhausted to outside the chamber, and a high degree of cleanliness of the air in the chamber is maintained.
  • the light source unit 50, the power supply unit 74 and the control unit 76 conduct electricity and generate heat, air in the chamber is warmed, and the temperature rises.
  • the ventilation fan 78 operates and exhausts high-temperature air in the chamber to the exterior, and temperature rises of the chamber temperature and the heat-generating components are suppressed.
  • the control circuit boards 102 conduct electricity and generate heat, air in the chamber is warmed.and the temperature rises, but the ventilation fan 106 operates and exhausts high-temperature air in the chamber to the exterior, and temperature rises of the chamber temperature and the heat-generating components are suppressed.
  • An exposure operation of the exposure apparatus 10 is performed in a state in which the above-described air conditioning operation is being performed.
  • image data corresponding to an image pattern for the photosensitive material 40 is inputted to the controller 100, and the controller 100 temporarily stores the image data at a built-in memory.
  • This image data is data representing two density values (recording or non-recording of a dot) for each of pixels constituting the image.
  • an operator opens up the opening/closing panel 19 of the setting portion 12B and deploys that photosensitive material 40 on the stage 28 of the apparatus main body 20.
  • the photosensitive material 40 on which image exposure is to be performed by the exposure apparatus 10 of the present embodiment a material in which a photoresist such as a photosensitive epoxy resin or the like has been coated onto a surface of a circuit board, a glass plate or the like, which is a material at which a pattern such as a printed wiring board, liquid crystal display elements or the like is to be formed (image-exposed), a material which is laminated for a dry film case, and the like can be mentioned.
  • This photosensitive material 40 may be introduced into the apparatus installation environment in a state in which dust and the like that has adhered in fabrication processes has not been completely removed but is adhered in small amounts. In such a case, the dust is likely to fall from the photosensitive material 40 and enter into the accommodation chamber 13 when an operator's hand touches the photosensitive material 40 during the task of setting the photosensitive material 40 on the stage 28 or when a vibration is applied to the photosensitive material 40.
  • the photosensitive material deployment surface 28A of the stage 28 is raised and lowered (in the direction of arrow Z in Figure 1) when the raising/lowering mechanism 32 operates, by driving force of the stepper motor 36, which is controlled for driving by the controller 100.
  • the controller 100 performs current-reduction control, which lowers a motor driving current that is supplied during a break in pulse signals, which is a standby state, by a predetermined amount (for example, about 50%). As a result, heat generation of the stepper motor 36 during standby is suppressed.
  • the operator After the operator has completed specification of a height of the stage 28 in accordance with the photosensitive material 40 that is to be exposed, by input operations through the controller 100, the operator sets the photosensitive material 40 on the photosensitive material deployment surface 28A of the stage 28 that is stopped at the origin position, closes the opening/closing panel 19, and performs control for commencement of the exposure operation through the controller 100. Accordingly, the negative pressure supplies are controlled by the controller 100 to operate, and the photosensitive material 40 is adhered by suction and retained on the stage 28.
  • the linear servo motor 38 is controlled for driving by the controller 100, and the stage 28 at which the photosensitive material 40 is retained starts to move along the guide rails 26 at a constant speed in the alignment measurement direction (the direction of arrow YA, which is the outward movement direction).
  • the static removal device 98 is controlled by the controller 100 to operate, dust that has been adhered to the photosensitive material 40 by static electricity is removed by air-blowing from the static removal device 98, and an exposure surface is swept.
  • the dust that has been cleaned from the photosensitive material 40 by this air-blowing sweeping is then blown out to rearward of the stage by the cooling air that is blown along the scanning direction over the stage 28, and is exhausted to outside the chamber.
  • the stage 28 moves on and, when the photosensitive material 40 is passing below the alignment unit 60, the cameras 62 are controlled by the controller 100. With the cameras 62, the alignment marks M of the photosensitive material 40 are photographed and an alignment measurement is carried out.
  • the alignment marks M passing directly below the cameras 62 are respectively photographed by the cameras 62 at predetermined timings.
  • the photographed image data which is to say, image data including reference position data in which exposure position references are represented by the alignment marks M, is outputted to the controller 100.
  • the controller 100 By calculation processing from: mark positions, inter-mark pitches and the like in an image which is established from the inputted image data of the alignment marks M (the reference position data); positions of the stage 28 when the alignment marks M are photographed, which are established from the pulse signals from the linear encoder 37; and the positions of the cameras 62, the controller 100 acquires: an error in the deployment position of the photosensitive material 40 on the stage 28; an error in an inclination of the photosensitive material 40 with respect to the movement direction; an error in dimensional accuracy of the photosensitive material 40; and the like, and the controller 100 calculates appropriate exposure positions on the exposure surface of the photosensitive material 40.
  • correction (alignment) of the exposure position offset is executed for image exposure of control signals, which are generated on the basis of the image data of the exposure pattern stored at the memory, to fit with the appropriate exposure positions.
  • the controller 100 controls the linear servo motor 38 to drive in the opposite direction.
  • the stage 28 that has reached the downstreammost position in the outward movement direction is moved in reverse by driving of the linear servo motor 38 in the opposite direction, and starts to move at a constant speed along the guide rails 26 in the scanning direction (the direction of arrow YB, which is the return movement direction).
  • the exposure heads 46 of the exposure unit 44 which are controlled by the controller 100, illuminate exposure beams and start image exposure on the exposure surface of the photosensitive material 40.
  • the controller 100 reads the image data stored at the memory in a sequence of sets corresponding to pluralities of lines, and generates control signals for the exposure heads 46 on the basis of this image data.
  • the aforementioned shading adjustment to make the light amount distribution of the exposure beams uniform and adjustments of exposure amounts, and corrections of the exposure position shifts relative to the photosensitive material 40 that have been obtained by the alignment measurement, are applied to these driving signals.
  • the DMDs of the exposure heads 46 are controlled in accordance with these generated and corrected control signals.
  • the light source unit 50 is controlled by the controller 100 to emit laser light.
  • this laser light is illuminated to the DMD of each exposure head 46, an exposure beam which is modulated at each pixel of the DMD is illuminated from the exposure head 46 to the photosensitive material 40, and the exposure surface of the photosensitive material 40 is exposed in a unit (exposure area) of pixels which are substantially equal in number to a number of pixels of the DMD that are employed.
  • the photosensitive material 40 which is moving at the constant speed together with the stage 28 is scanningly exposed by the exposure unit 44, and the strip-form exposed region 54 (see Figure 8) is formed by each exposure head 46.
  • the stage 28 When the photosensitive material 40 has passed under the exposure unit 44 and image exposure has finished, the stage 28 continues to be moved to a downstream side of the scanning direction by driving force of the linear servo motor 38. Hence, the stage 28 returns to the origin position at a downstreammost position in the return movement direction and stops, the supply of negative pressure from the negative pressure supplies to the top of the stage 28 is turned off, and the operation of exposure onto the photosensitive material 40 ends.
  • the operator opens the opening/closing panel 19 of the setting portion 12B and removes the exposed photosensitive material 40 from the stage 28.
  • the operator deploys the new (unexposed) photosensitive material 40 on the stage 28 and closes the opening/closing panel 19, and performs control to start the exposure operation from the controller 100 again.
  • a plurality of sheets of the photosensitive material 40 can be continuously exposed by the exposure apparatus 10, and thus the exposed photosensitive material 40 is continuously produced.
  • the cooling air that is supplied through the duct 82 from the air conditioner 80 to the accommodation chamber 13 (the exposure chamber 15) by the air conditioning operation is blown in the direction along the scanning direction by the airflow direction-altering plate 90. Therefore, a temperature distribution of the accommodation chamber 13 along the scanning direction is uniform, and temperature changes along the scanning direction are less likely to occur. As a result, thermal deformation of the photosensitive material 40 that is reciprocatingly conveyed in directions along the scanning direction by the stage 28, due to temperature divergences and temperature changes along the scanning direction, and a consequent reduction in accuracy, such as shifts in exposure positions or the like, are suppressed. Accordingly, high-accuracy exposure can be realized.
  • the photosensitive material deployment surface 28 A of the stage 28 and the photosensitive material 40 which is deployed at the photosensitive material deployment surface 28 A are swept by the cooling air which is blown in the direction along the scanning direction, and a clean state in which dust and the like does not accumulate is maintained.
  • lifting, mispositioning and the like of the photosensitive materials 40 that are deployed at the photosensitive material deployment surface 28 A and accumulations of dust and the like on the photosensitive material 40 are suppressed, and losses of exposure accuracy due to such causes can be prevented.
  • a degree of cleanliness of air in the accommodation chamber 13 is improved, and adverse effects on exposure from dust and the like floating in the accommodation chamber 13 can be prevented.
  • the blowing direction of the cooling air that is blown downward from the duct 82 is altered to the direction along the scanning direction by the airflow direction-altering plate 90. Therefore, even if, for example, an installation position, blowing direction and the like of the duct 82 are limited by relationships with structural portions of the apparatus which are disposed in the accommodation chamber 13, the air that is blown out from the duct 82 can be easily altered to blow in the direction along the scanning direction by the earlier-described airflow direction-altering plate 90. Furthermore, if the airflow direction-altering plate 90 has a movable-type structure whose inclination angle can be adjusted, as in the present embodiment, it is possible to finely adjust the blowing direction.
  • the cooling air from the air conditioner 80 passes through the distal end portion 82 A (linear-form portion) of the duct 82 and is blown out from the outflow port 82B, the flow (blowing direction) of the air subsequent to the outflow port 82B is stable, and it is possible to accurately blow in a required direction (toward the airflow direction-altering plate 90).
  • the previously mentioned flow rate (9.4 m/s) and flow amount (10 n ⁇ Vmin) the above-described effect can be obtained by setting the length of the linear-form portion of the duct 82 to 30 cm or more as in the present embodiment.
  • the length (L) of the distal end portion 82 A of the duct 82 that is formed in the straight-line form will be longer.
  • the baffle plate 96 is provided at the front side of the stage 28, that is, at an upstream side relative to the photosensitive material deployment surface 28A of the direction of flow of the cooling air being blown in the direction along the scanning direction, more of this cooling air will be guided over the deployment surface. Therefore, temperature changes of the photosensitive material deployment surface 28A and the photosensitive material 40 deployed at the photosensitive material deployment surface 28A will be even less likely to occur, and temperature stability will be raised. Moreover, sweeping of the photosensitive material deployment surface 28 A by the blowing is improved by increasing the amount of airflow over the photosensitive material deployment surface 28A.
  • the form of a space between the stage 28 (the measurement unit 70) and the exposure unit 44 is larger than during movement of the stage 28.
  • the form of the space between the stage 28 and the exposure unit 44 varies in this manner, an amount of air being blown in this space and a state of flow are changed, and a state of air cooling of the exposure unit 44 is likely to change.
  • the stage 28 is disposed at the origin position, more of the cooling air being blown along the scanning direction toward the stage 28 is guided beneath the exposure unit 44 by the above-mentioned baffle plate 96. Therefore, an amount and a state of flow of air being blown beneath the exposure unit 44 are substantially the same as during movement of the stage 28.
  • the plurality of cameras 62 which read the alignment marks M provided at the photosensitive material 40 for correcting positions of exposure on the photosensitive material 40, are mounted at the unit base 64 and disposed over the stage movement path.
  • This unit base 64 has a 'T 1 shape in cross-section, is flat apart from an upper portion and, in particular, has a form in which protrusions and the like are not present at a lower portion side.
  • the.unit base 64 is given a form that will not substantially alter the flow of the air being blown in the direction along the scanning direction even when the stage 28 moves, temperature changes of the unit base 64 and the cameras 62 are suppressed, temperatures thereof are kept constant, and a positional shift of the cameras 62 due to such temperature changes, that is, a reduction in accuracy of reading positions of the alignment marks M, is suppressed. Moreover, the state of air cooling of the photosensitive material 40 which is conveyed by the stage 28 and relatively moved with respect to the unit base 64 and the cameras 62 is stable, and thermal deformation thereof is suppressed.
  • this unit base 64 are supported by the pair of support pillars 42, and the unit base 64 is disposed to, together with this pair of support pillars 42, constitute a gate-like structure over the stage movement direction.
  • the pair of support pillars 42 which are disposed in opposition under the unit base 64, function as a baffle portion (a baffle member) which flow-adjusts the cooling air that is blown in the direction along the scanning direction. That is, as shown in Figure 6, the cooling air that is blown in the direction along the scanning direction through the vicinity of the unit base 64 (arrows AR14) passes between the opposing pair of support pillars 42.
  • the coil portion 38B of the linear servo motor 38 which drives the stage 28 is mounted at the platform 30 which supports the stage 28 via the insulating bushes 39 (see Figure 7). Therefore, even in a case in which, for example, the coil portion 38B is continuously in a high temperature state because the stage 28 is being continuously driven, amounts of heat which are conducted from the coil portion 38B to the stage 28 through the platform 30 and the raising/lowering mechanism 32 are reduced because of the insulating bushes 39. As a result, a temperature rise (temperature change) of the stage 28 is suppressed, and thermal deformation of the photosensitive material 40 due to conduction of heat from the stage 28 is suppressed.
  • this coil portion 38B is mounted to be exposed at the lower face of the platform 30, even in a case in which the temperature is rising because the stage 28 is being continuously driven, naturally, as shown in Figure 7A, the coil portion 38B is efficiently cooled by the cooling air being blown in the direction along the scanning direction at the lower face side of the platform 30 (arrows AR15). Therefore, a temperature rise (temperature change) of the coil portion 38B and the stage 28 is suppressed, and thermal deformation of the photosensitive material 40 due to conduction of heat through the stage 28 is suppressed
  • a surface area of the coil portion 38B is enlarged and heat-release is promoted by the radiator fins 38C provided at the lower face and the two side faces of the coil portion 38B. Further still, because these radiator fins 38C extend in the scanning direction, the flow of cooling air being blown in the direction along the scanning direction will not be disturbed, and an efficiency of heat-release by this stably flowing air is raised. Moreover, because a gap is formed between the upper face of the coil portion 38B (a mounting face) and the lower face of the platform 30 by the aforementioned insulating bushes 39 being interposed, the cooling air also passes through at the upper face side of the coil portion 38B. Thus, a surface area of the coil portion 38B from which heat-release (cooling) is possible is further increased, and heat-release efficiency is raised further.
  • stepper motor 36 which raises and lowers the stage 28
  • the stepper motor 36 is mounted to be exposed at a side face portion of the raising/lowering mechanism 32, as shown in Figure 6, the stepper motor 36 is efficiently cooled by the cooling air being blown, in the direction along the scanning direction, alongside the side face of the raising/lowering mechanism 32 (arrows ARl 6).
  • a temperature rise (temperature change) of the stepper motor 36 and the stage 28 is suppressed, and thermal deformation of the photosensitive material 40 due to conduction of heat through the stage 28 is suppressed.
  • this stepper motor 36 is controlled for driving by the controller 100 to lower current at times of standby, heat generation during standby is suppressed. As a result, a temperature rise (temperature change) of the stage 28 due to conduction of heat from the stepper motor 36 is suppressed.
  • a temperature of the stage 28 vicinity is measured by the temperature sensor 72, and temperature regulation of the cooling air that the air conditioner 80, which is controlled by the controller 100, supplies to the accommodation chamber 13 (the exposure chamber 15) is performed in accordance with this measured temperature.
  • temperature regulation in response to the temperature of the photosensitive material 40 that has been set at the stage 28 i.e., the temperature of the apparatus installation environment
  • a thermal deformation amount of the photosensitive material 40 that is caused after deployment at the stage 28 by a temperature difference between the apparatus installation environment and the chamber temperature is suppressed.
  • a temperature of the apparatus installation environment in which the photosensitive material 40 is placed prior to exposure is acquired by measurement of a temperature of external air by the temperature sensor 86 disposed at the intake port 84 of the air conditioner 80, and the regulation temperature of the air that the air conditioner 80 controlled by the controller 100 supplies to the accommodation chamber 13 (the exposure chamber 15) is altered in accordance with this measured temperature of the external air and the measured temperature of the accommodation chamber 13.
  • the temperature of the accommodation chamber 13 in response to the temperature of the photosensitive material 40 that has been deployed to the stage 28 from the apparatus exterior (the temperature of the apparatus installation environment) by utilizing the temperature of the apparatus installation environment for air conditioning of the accommodation chamber 13, and when air conditioning is performed so as to bring the temperature of the accommodation chamber 13 (the chamber temperature) closer to the temperature of the apparatus installation environment as in the present embodiment, a thermal deformation amount of the photosensitive material 40 deployed at the stage 28 due to a temperature difference between the apparatus installation environment and the chamber temperature is suppressed.
  • the temperature of the apparatus installation environment that is, the temperature of the photosensitive material 40
  • the temperature sensor 72 disposed in the vicinity of the stage 28 the above-described temperature control of the accommodation chamber 13 can be implemented rapidly.
  • the light source unit 50, power supply unit 74 and control unit 76, which generate heat during apparatus operations, are accommodated in the component accommodation chamber 49 which is provided separately from the accommodation chamber 13, and the control circuit boards 102, which generate heat during apparatus operations, are accommodated in the component accommodation chamber 17 which is formed along a wall face of the cover body 12 separately from the accommodation chamher 13.
  • a number of heat-generating components (heat sources) disposed in the accommodation chamber 13 can be made smaller.
  • temperature changes in the accommodation chamber 13 are suppressed and air conditioning control is simpler, and temperature divergences and temperature changes that occur along the scanning direction of the photosensitive material 40 are easier to inhibit.
  • the component accommodation chamber 17 for accommodating the control circuit boards 102 is formed along the wall face of the cover body 12 which accommodates the apparatus main body 20 and inside which the accommodation chamber 13 is provided, it is possible to dispose the control circuit boards 102 closer to controlled portions, power supply portions and the like of the apparatus main body 20. As a result, paths of wiring electrically connecting therebetween are shorter, and it is possible to simplify wiring processes and improve noise resistance of the wiring.
  • a second embodiment features, in the exposure apparatus 10 relating to the first embodiment, the inclusion of an air conditioning airflow amount control technology, which controls the air conditioner 80 and alters air conditioning airflow amounts in accordance with movement of the stage 28 in the exposure operation.
  • an air conditioning operation air conditioning airflow amount control operation of the exposure apparatus 10 relating to the second embodiment will be described.
  • the controller 100 controls the air conditioner 80 and alters air conditioning airflow amounts in accordance with movements of the stage 28 in the exposure operation.
  • an airflow amount of the cooling air that the air conditioner 80 blows out to the duct 82 that is, a flow amount of the cooling air that is blown out from the outflow port 82B of the duct 82 into the exposure chamber 15, is made larger (arrow AR21).
  • the stage 28 is disposed in the vicinity of the downstreammost position in the outward movement direction, which is close to the outflow port 82B of the duct 82, the above-mentioned air conditioning airflow amount is made smaller (arrows AR22).
  • the air conditioning airflow amount is set to a maximum value at the origin position, set the air conditioning airflow amount to a minimum value at the downstreammost position and, during the reciprocating movement of the stage 28 between the origin position and the downstreammost position, reduce the air conditioning airflow amount from the maximum value toward the minimum value in accordance with movement of the stage 28 away from the origin position in the outward movement and increase the air conditioning airflow amount from the minimum value toward the maximum value in accordance with movement of the stage 28 away from the downstreammost position in the return movement.
  • a test or the like may be performed beforehand — disposing the stage 28 at a plurality of points on the movement path, measuring temperature changes and performance changes of various parts of the device and thermal deformation amounts of the photosensitive material 40 on the stage 28 when airflow amounts are altered at each point, and finding optimum air conditioning airflow amount control conditions for minimizing such change amounts — and air conditioning airflow amounts altered in accordance with such conditions, or the like. Further, when air conditioning airflow amount control conditions found by such a test or the like are converted to data and preparatorily stored in memory of the controller 100, airflow amount control of the air conditioner 80 by the controller 100 using this data is possible.
  • an airflow amount (flow amount) of the cooling air that is blown out from the outflow port 82B of the duct 82 and blown along the scanning direction in the accommodation chamber 13 is made larger and air pressure is strengthened, and when the stage 28 is disposed at the downstreammost position side, the airflow amount of the cooling air is made smaller and the air pressure is weakened.
  • a thermal equilibrium state of the principal components of the apparatus which are arranged along the scanning direction in the accommodation chamber 13 can be maintained, thermal alterations of the photosensitive material 40 are suppressed, and higher accuracy exposure can be carried out.
  • a third embodiment features, in the exposure apparatus 10 relating to the first embodiment, an alteration in structure of the duct for supplying the cooling air from the air conditioner 80 to the exposure chamber 15.
  • structure of an exposure apparatus relating to the third embodiment will be described.
  • the airflow direction-altering plate 90 described for the first embodiment is not present in the exposure chamber 15, but a distal end portion HOA of a duct 110, which guides the cooling air from the air conditioner 80 into the exposure chamber 15, is disposed at a back wall face 15C of the escape cavity 15B.
  • the distal end portion HOA of the duct 110 of the present embodiment is formed in a straight-line form and disposed substantially horizontally, and the duct 110 protrudes slightly inward through the back wall face 15C of the escape cavity 15B. Further, an outflow port HOB is oriented toward the baffle plate 96, and is structured to blow out the cooling air in a substantially horizontal direction. At this duct 110 too, similarly, to the first embodiment, a length (a length L to the outflow port HOB) of the distal end portion HOA (a linear-form portion) is set to a predetermined dimension (for example, 30 cm or more).
  • the cooling air that is blown out through the duct 110 into the exposure chamber 15 from the air conditioner 80, by the air conditioning operation described for the first embodiment, is directly blown in the direction along the scanning direction from the outflow port HOB of the duct 110.
  • the temperature distribution along the scanning direction in the accommodation chamber 13 is uniform, and temperature changes along the scanning direction are less likely to occur. Therefore, thermal deformation of the photosensitive material 40 that is reciprocatingly conveyed in the direction along the scanning direction by the stage 28, due to such temperature divergences and temperature changes along the scanning direction, and a consequent reduction in accuracy, such as a shift in exposure positions or the like, are suppressed.
  • similar effects to the first embodiment such as enabling the realization of high-accuracy exposure and the like are obtained.
  • the cooling air that is supplied to the exposure chamber 15 passes through the distal end portion IIOA (linear-form portion) of the duct 110, which has been set to a predetermined length dimension, and is blown out through the outflow port HOB, the flow (blowing direction) of the air subsequent to the outflow port HOB is stable, and can be accurately blown in a required direction (the direction along the scanning direction).
  • a fourth embodiment features, in an exposure apparatus with a structure substantially the same as with the first embodiment, structure such that a state of air-cooling of the exposure unit 44 is not altered by movement of the stage in the exposure operation.
  • structure of the exposure apparatus relating to the fourth embodiment and operations of the stage will be described.
  • a stage 120 which is formed in a rectangular pedestal form for conveying the photosensitive material 40, is made longer in a length direction along the movement direction (the direction of arrow Y) than the stage 28 of the first embodiment.
  • a front end portion of a photosensitive material deployment surface 120A extends over (overlaps with) the exposure unit 44 in a plan view direction.
  • a rear end portion of the photosensitive material deployment surface 120A extends over (overlaps with) the exposure unit 44 in the plan view direction.
  • the form of a gap C that is formed between the exposure unit 44 and the stage 120 does not substantially change.
  • a state of flow of the cooling air that is blown at this gap C is substantially constant and a state of air-cooling of the exposure unit 44 is stable.
  • a fifth embodiment is structured such that states of air-cooling of the exposure unit 44 do not change in accordance with movements of the stage in the exposure operation, with a structure which differs from the fourth embodiment.
  • an exposure apparatus relating to the fifth embodiment will be described.
  • a partition plate 130 made of transparent glass is disposed along the scanning direction (the movement direction of the stage 28) between the exposure unit 44 and the cameras 62 of the alignment unit 60 on one side and the stage 28 (and the measurement unit 70) on the other side, which are arranged side by side.
  • Two outer side end portions of this partition plate 130 are mounted at and supported by a pair of support plates 132, which are disposed at outer sides of the pair of guide rails 26, and the partition plate 130 is arranged substantially horizontally.
  • the partition plate 130 has a horizontal form along the scanning direction.
  • the exposure beams illuminated from the exposure heads 46 of the exposure unit 44 can pass through this transparent partition plate 130, and the cameras 62 can capture the alignment marks M of the photosensitive material 40 through this transparent partition plate 130.
  • the transparent partition plate 130 is provided in a horizontal form along the scanning direction between the exposure unit 44 and alignment unit 60 cameras 62 and the stage 28, a structure is formed in which the forms of spaces at peripheral edges of the exposure unit 44 and the alignment unit 60 do not change when the stage 28 moves, while a state is maintained in which the exposure of the photosensitive material 40 by the exposure beams illuminated from the exposure heads 46 of the exposure unit 44 is not hindered and in which the reading of the alignment marks M of the photosensitive material 40 by the cameras 62 is not hindered.
  • a state of flow of cooling air that is blown at these gaps is substantially constant, and states of air-cooling of the exposure unit 44 and the alignment unit 60 are stable.
  • temperature changes of the exposure unit 44 are suppressed and the temperature is kept constant, and reductions in accuracy of exposure positions due to thermal deformation of the exposure unit 44 as a result of such temperature changes is suppressed.
  • temperature changes of the alignment unit 60 are suppressed and the temperature is kept constant, and a positional shift of the alignment unit 60, that is, a reduction in accuracy of reading positions of the alignment marks M, as a result of such temperature changes is suppressed.
  • a state of air-cooling of the photosensitive material 40 which is being relatively conveyed by the stage 28 with respect to the exposure unit 44 and the alignment unit 60 is stable, and thermal deformation is suppressed.
  • a sixth embodiment is provided with a flow change-governing structure at the apparatus main body 20 of the exposure apparatus 10 relating to the first embodiment.
  • the flow change-governing structure governs such that a state of flow of the cooling air at surroundings of a stage driving source does not substantially change when the stage 28 moves.
  • structure of an exposure apparatus relating to the sixth embodiment will be described.
  • a pair of closure plates 140 are arranged in parallel with the length direction of the platform 30 (the scanning direction) and mounted at two side portions of a lower face of the platform 30 which is formed as a unit with the stage 28.
  • the pair of closure plates 140 close off openings formed between the respective leg portions 34.
  • a pair of screen plates 142 are arranged in parallel with the direction of extension of the guide rails 26 (the movement direction of the stage 28) and provided standing at the stage movement path, frontward (at the downstream side in the outward movement direction) of the stage 28 that is disposed at the origin position and at the two sides (outer sides) of the stage 28 that is moving on the pair of guide rails 26.
  • a state of flow of the cooling air that is blown in the direction along the scanning direction through surroundings of the coil portion 38B mounted at the lower face of the platform 30, which is the stage driving source, is governed by the pair of screen plates 142 and the pair of closure plates 140 so as to substantially not change when the stage 28 moves on the guide rails 26.
  • a state of air-cooling of the coil portion 38B is stable and a temperature change thereof is suppressed, and a rise in temperature (temperature change) of the stage 28 due to conduction of heat from the coil portion 38B is suppressed. Accordingly, thermal deformation of the photosensitive material 40 due to conduction of heat from the stage 28 is suppressed, and high-accuracy exposure can be carried out.
  • a seventh embodiment is provided with an air cooling unit at the stage 28 relating to the first embodiment, which blows cooling air at and cools the stage driving source.
  • an air cooling unit at the stage 28 relating to the first embodiment, which blows cooling air at and cools the stage driving source.
  • two ventilation fans 150 are mounted at the lower face of the platform 30 which is formed as a unit with the stage 28.
  • the ventilation fans 150 are disposed at a front side relative to the coil portion 38B (an upstream side of the flow direction of the cooling air).
  • the two ventilation fans 150 blow to increase a flow rate in the flow direction, that is, at the coil portion 38B, of the cooling air that is flowing along the scanning direction.
  • the coil portion 38B is cooled by the cooling air that is blown from the two ventilation fans 150, an effect of cooling of the coil portion 38B is enhanced, and an effect of inhibiting a temperature rise (temperature change) of the stage 28 is enhanced.
  • An eighth embodiment is provided with radiator fins at the stage 28 (the platform 30) relating to the first embodiment.
  • structure of a stage relating to the eighth embodiment will be described.
  • radiator fins 30A are integrally provided at the lower face of the platform 30 which is formed as a unit with the stage 28. These radiator fins 30A extend in the length direction of the platform 30 (the scanning direction).
  • a surface area of the platform 30 is enlarged and heat-release is promoted by the radiator fins 3OA which are plurally provided at the lower face of the platform 30. Further, because the radiator fins 3OA extend in the scanning direction, the flow of cooling air being blown in the direction along the scanning direction will not be disturbed, and heat-release efficiency is raised by this stably flowing air. Therefore, an effect of cooling of the platform 30, which rises in temperature because of conduction of heat from the coil portion 38B, is enhanced, and an effect of inhibiting a temperature rise (temperature change) of the stage 28 is enhanced.
  • a ninth embodiment is provided with a heatshield member at the stage 28 (the platform 30) relating to the first embodiment.
  • the stage 28 the platform 30
  • structure of a stage relating to the ninth embodiment will be described.
  • a heatshield plate 160 formed of a stainless steel metal plate is mounted at the lower face of the platform 30 which is formed as a unit with the stage 28.
  • the coil portion 38B is mounted to the lower face of the platform 30 via this heatshield plate 160.
  • the air conditioning operation (chamber temperature regulation operation) in which the chamber temperature of the accommodation chamber 13 and the temperature of the apparatus installation environment are measured and the air conditioner 80 is controlled to regulate the temperature of the cooling air on the basis of these measured temperatures.
  • the air conditioning operation is not limited thus, and it is also possible to supply cooling air which is regulated to a predetermined temperature from the air conditioner 80 to the accommodation chamber 13.
  • the scanning direction a case has been described in which the stage which serves as a conveyance mechanism for conveying the photosensitive material is conveyed in a horizontal direction, and thus the scanning direction is the horizontal direction.
  • the scanning direction is not limited thus, and a vertical direction may serve as the scanning direction by the conveyance mechanism being moved in the vertical direction, or the like.
  • the conveyance direction of the photosensitive material the stage movement direction
  • one-way conveyance in which the photosensitive material is conveyed in only one direction with the alignment measurement and exposure being performed successively, is also possible.
  • the photosensitive material 40 performs scanning exposure while the stage 28 is moved.
  • the exposure operation is not limited to this kind of scanning exposure.
  • the photosensitive material 40 may be moved to an initial exposure position, stopped, and exposed only at a predetermined exposure region, and after that exposure, the photosensitive material.40 may be moved to a next exposure position, stopped again, and exposed only at a next predetermined exposure region.
  • movement of the photosensitive material 40 > stopping at an exposure position > image exposure > movement > etc. is possible.
  • an airflow direction-altering member for changing the blowing direction of the cooling air that is blown out from the duct to the direction along the scanning direction is not limited to mechanical means, such as the airflow direction-altering plate 90 as described for the first embodiment or the like.
  • the airflow direction-altering member can be formed as electrical means, such as a blowing fan or the like, or can be a structure in which mechanical means and electrical means are combined.
  • a cross-sectional form of the unit base 64 of the alignment unit 60 at which the cameras 62 for alignment measurement are mounted has a 'T' shape, as described for the first embodiment, in order to have a form which will not substantially change a flow of cooling air that is blowing in the direction along the scanning direction when the stage 28 moves, while increasing a sectional modulus and assuring strength (rigidity).
  • the cross-sectional form of the unit base 64 is not limited thus. If it is possible to assure strength by, for example, increasing thickness or the like, an T shape (a flat shape) or the like is also possible.
  • the temperature sensor 72 which measures the temperature of the accommodation chamber 13 is disposed at the rear face of the opening/closing panel 19 and disposed in the vicinity of the stage 28 as described for the first embodiment.
  • an installation position of a temperature sensor is not limited thus.
  • the temperature sensor may be mounted on the platform 30 and disposed in a vicinity of a front side of the stage 28.
  • a chamber temperature of the stage 28 and the vicinity of the exposure unit 44 and alignment unit 60 according to the temperature sensor 73 is the measured temperature, and temperature control of the accommodation chamber 13 is implemented using information of this measured temperature.
  • a temperature measurement location of the accommodation chamber 13 is not limited to a single location; a plurality of locations is also possible. Hence, it is possible to carry out temperature control of the accommodation chamber 13 in accordance with measured temperature information of such a plurality of locations.
  • the coil portion 38B of the linear servo motor 38 which is the drive source for stage movement, is mounted at the stage 28 (the platform 30) via the insulating bushes 39.
  • the stepper motor 36 which is the drive source for stage raising/lowering, can similarly be mounted at the stage 28 (the raising/lowering mechanism 32) via insulating bushes or the like.
  • the stage 28 that structures the photosensitive material deployment surface 28A is made to be capable of ascending and descending, and the stage 28 (the photosensitive material deployment surface 28A) serves as a movable portion.
  • the stepper motor 36 generates driving force for moving this movable portion, and current is reduced at times of standby. If, for example, another movable portion is provided at the stage and a stepper motor is used at a drive source thereof, current-reduction control may be similarly applied to this stepper motor and heat generation accordingly suppressed.
  • transmission-type spatial light modulation elements such as LCDs
  • MEMS microelectro-mechanical systems
  • PZT elements optical elements which modulate transmitted light by electro-optical effects
  • LCD liquid crystal shutter arrays
  • FLC liquid crystal shutters
  • MEMS is a general term for microsystems in which micro-size sensors, actuators and control circuits are integrated by micro-machining technology on the basis of IC fabrication processes.
  • MEMS type spatial light modulation elements means spatial light modulators which are driven by electro-mechanical operations utilizing electrostatic forces.
  • a spatial light modulation element which is structured to be two-dimensional by lining up a plurality of grating light valves (GLV) may be utilized.
  • GLV grating light valves
  • a fiber array light source equipped with a plurality of multiplex laser light sources a fiber array light source in which fiber light sources which are each equipped with a single optical fiber, which emits laser light inputted from a single semiconductor laser having one light emission point, are arrayed, a light source in which a plurality of light emission points are arranged in two dimensions (for example, a laser diode array, an organic electroluminescent array or the like) or the like can be employed.
  • any of photon-mode photosensitive materials, which are directly recorded with information by exposure, and heat-mode photosensitive materials, in which heat is generated by exposure and information is recorded by the heat may be employed.
  • a photon-mode photosensitive material GaN-based semiconductor lasers, wavelength-conversion solid state lasers or the like are employed at a laser apparatus
  • a heat-mode photosensitive material AlGaAs-based semiconductor lasers (infrared lasers) or solid state lasers are employed at the laser apparatus.
  • the present invention is not limited to the above-described image exposure apparatus which utilizes spatial light modulators and illuminates light beams modulated in accordance with image data at a photosensitive material that is being conveyed in a scanning direction to perform image exposure.
  • a scanning exposure apparatus which conveys a photosensitive material in a sub-scanning direction while illuminating and main-scanning a laser light to render a predetermined pattern, or the like.
  • a tenth embodiment relates to a third aspect of the present invention.
  • structure of an exposure apparatus relating to the present embodiment will be described.
  • temperature sensors 58 which serve as temperature measurement instruments are mounted at peripheral edges of a plurality of principal components.
  • principal components means the exposure heads 46, the cameras 62, the stage 28, the linear encoder 37 and the measurement unit 70.
  • the temperature sensors 58 are mounted at a plurality of locations, including at least one of the stage 28 and the exposure heads 46, such as, for example, as shown in Figures 3 and 4, an upper face of the unit base 48, a lower face of the unit base 64, a lower face of the stage 28, an end portion of the camera calibration reference plate and the like (in the present embodiment, the temperature sensors 58 are mounted at all of the above-mentioned principal components).
  • the temperature sensors 58 are connected to the controller 100.
  • a degree of temperature stability of each principal component that is, whether or not the temperature measured at the respective principal component constitutes a stable temperature, is judged by the controller 100 (a control device).
  • the stable temperature referred to here means a temperature with which image exposure quality in the exposure apparatus 10 is assured. By image exposure being carried out when all the principal components have reached the stable temperature(s), high precision images will be accurately exposed.
  • This stable temperature is a temperature with a range of tolerance ( ⁇ A°C) with respect to a predetermined central value ( ⁇ °C).
  • the controller 100 is provided with a display panel 108 which serves as a display unit and a keyboard 101 which serves as an input unit.
  • An exposure performance level (a degree to which exposure quality is assured), which is derived from judgment results of the controller 100 (the control device) is displayed at the display panel 108 by numbers, text, symbols, colors or the like.
  • the keyboard 101 is a structure at which instruction details (an exposure commencement instruction and suchlike) determined by a user in accordance with the displayed exposure performance levels can be inputted.
  • the exposure performance level that is displayed includes at least a waiting duration until exposure is possible.
  • An exposure commencement timing can be estimated in accordance with a length of this waiting duration. That is, it can be judged whether to wait until the stable temperature which assures image exposure quality is reached to perform exposure, or to perform exposure without waiting until the stable temperature is reached, in order to raise productivity.
  • the display unit which displays the exposure performance level is not limited to the display panel 108, and could, for example, display the exposure performance level by sequentially illuminating an unillustrated plurality of LEDs or express the exposure performance level by sounds or the like.
  • a temperature of each principal component in the accommodation chamber 13 is measured by the temperature sensors 58. That is, giving a description on the basis of the flowchart in Figure 21, first, in step Sl, temperatures of vicinities of the exposure heads 46, the cameras 62, the stage 28, the linear encoder 37 and the measurement unit 70 (the camera calibration reference plate) are measured by the temperature sensors 58.
  • step S2 it is judged by the controller 100, serving as judgment means, whether the measured temperatures are at the stable temperature or not (not whether the temperature in the accommodation chamber 13 is stable or not).
  • step S3 an assured exposure performance level based thereon is displayed at the display panel 108.
  • the display panel 108 displays exposure performance levels from which, for example, the following meanings or the like can be understood: 'All the principal components are at the stable temperature, so image exposure in a state in which image quality is assured is possible 1 or suchlike; 'Of the principal components, the exposure heads 46, the cameras 62 and the stage 28 are at the stable temperature, so while image quality is not assured, exposure is possible in this state' or suchlike; or 'This is a preparatory stage for possible exposure, and a waiting duration until, of the principal components, at least the exposure heads 46, the cameras 62 and the stage 28 are at the stable temperature is ?? minutes'.
  • the stable temperature is a temperature with which- image exposure quality in the exposure apparatus 10 is assured. Therefore, it is always desirable to perform image exposure when the principal components have reached the stable temperature. However, if exposure is performed in a state in which the installation environment of the exposure apparatus 10 has changed, then when driving and exposure are first performed on such a day, or when driving and exposure have been performed over a long period or the like, it may take time until all the principal components are at the stable temperature.
  • step S4 If exposure processing is commenced in a state in which some of the principal components are not at the stable temperature, slight positional shifts may occur in the image that is exposed, with the result that image exposure quality is not assured. However, if a state (duration) of waiting until the principal components are at the stable temperature is added to a series of processing steps, a reduction in productivity may result. Accordingly, in step S4, an exposure commencement instruction is enabled. In step S5, subsequent processing is selected in accordance with the details displayed at the display panel 108 (the exposure performance level).
  • step S6 exposure processing is commenced in accordance with the exposure commencement instruction of step S4.
  • step S7 one of three modes is selected and implemented.
  • the mode to be implemented may be selected by prior input from the keyboard 101 by a user, after the exposure performance level has been displayed in step S3 and before the exposure commencement instruction of step S4.
  • (1) to (3) exposure processing is (forcibly) commenced in accordance with the exposure commencement instruction of step S4.
  • exposure processing is automatically commenced after the stable temperature has been reached (an exposure performance-assured state).
  • exposure processing may be commenced by the user while the fact of not being in a stable state is displayed, or a re-confirmation display is shown and exposure processing is commenced when the user repeats the exposure commencement instruction.
  • temperatures of peripheral edges of the principal components are measured, and an exposure performance level is determined from those temperatures (differences from the stable temperature) and displayed. Accordingly, a user can judge whether or not to commence exposure processing in accordance with the displayed exposure performance level. That is, even if the stable temperature has not been reached (when image exposure quality is not assured), it is possible to forcibly commence exposure processing. Therefore, in cases in which particular accuracy is not required and the like, productivity can be prioritized, and an improvement thereof is enabled.
  • An eleventh embodiment relates to a fourth aspect of the present invention.
  • structure of an exposure apparatus relating to the present embodiment will be described.
  • explanations that are duplicative with the tenth embodiment, relating to the temperature sensors 58 which serve as temperature measurement instruments, will be omitted.
  • the controller 100 is provided with the display panel 108 which serves as a display unit and the keyboard 101, which serves as overwriting means.
  • Results of judgments by the controller 100 are displayed at the display panel 108, and this structure enables users to easily identify those judgment results.
  • the judgment results that are displayed include at least a difference between the stable temperature and an actual measured temperature.
  • the keyboard 101 is a structure which enables overwriting control, for re-specification of the stable temperature and the like, in accordance with the judgment results that are displayed.
  • This stable temperature is a temperature which is pre-adjusted in an installation environment temperature prior to shipping.
  • the exposure apparatus 10 will be installed in an indoor environment which is provided with air conditioning equipment, such as a clean room or the like. Therefore, the principal components can be operated (in a state in which image exposure quality is assured) at the stable temperature that was adjusted before shipping.
  • the stable temperature simply may not be reached.
  • this exposure apparatus 10 is structured such that, as mentioned above, re-specification (overwriting) of the stable temperature is possible.
  • overwriting of the stable temperature is not limited to overwriting by input from the keyboard 101; structures are possible in which the stable temperature is automatically overwritten by the controller 100.
  • apparatus-particular parameters of the exposure apparatus 10 may also be changed.
  • the apparatus-particular parameters to be mentioned here are a light amount distribution and exposure amounts, the inclination of the exposure heads 46 and joins of the images (the exposure areas 52), a magnification ratio and so forth.
  • Such particular parameters are also judged by the controller 100 and, if changes are required, displayed at the display panel 108. Hence, suitable changes are carried out from the keyboard 101, which also functions as changing means.
  • a temperature of each principal component in the accommodation chamber 13 is measured by the temperature sensors 58. That is, giving a description on the basis of the flowchart in Figure 22, first, in step Sl, temperatures of vicinities of the exposure heads 46, the cameras 62, the stage 28, the linear encoder 37 and the measurement unit 70 (the camera calibration reference plate) are measured by the temperature sensors 58. Then, in step S2, it is judged by the controller 100, serving as judgment means, whether the measured temperatures are at the stable temperature or not (not whether the temperature in the accommodation chamber 13 is stable or not).
  • step S3 if the measured temperatures of the principal components are at the initially specified stable temperature (are within the range ⁇ °C), re-specification (overwriting) is not performed. However, if even one of the principal components has not reached the stable temperature after numerous measurements (a difference from the stable temperature does not disappear), then it is judged that the installation environment temperature prior to shipping (at a time of shipping adjustment) was different from the actual installation environment temperature of the exposure apparatus 10 and, in step S4, the display panel 108 shows that re-specification (overwriting) of the stable temperature is required.
  • step S5 When the fact that re-specification (overwriting) of the stable temperature is required has been displayed at the display panel 108, in step S5, the keyboard 101 serving as overwriting means is operated, and re-acquisition and re-specification (overwriting) of the stable temperature are performed. Specifically, pluralities of temperatures separated by predetermined amounts of time are measured, and a new stable temperature is calculated from these measured temperatures and thus acquired. Hence, the newly acquired stable temperature is inputted through the keyboard 101, and is re-specified as the stable temperature for the actual installation environment temperature.
  • the apparatus-particular parameters may be changed accordingly. For example, variations in light amounts are measured by the light amount measurement instrument and re-adjustments (changes) in shading and exposure amounts are implemented, and beam exposure positions and joins of images (the exposure areas 52), the inclination of the exposure heads 46, the magnification ratio and the like are corrected (changed) in accordance with the beam position detection reference plate and the light detectors. Such changes in particular parameters are also implemented by input from the keyboard 101.
  • temperatures of peripheral edges of principal components are measured, and if a difference between a measured temperature and the stable temperature persistently does not disappear, it is judged that the installation environment temperature at the time of shipping adjustment and the actual installation environment temperature greatly differ, and it is possible to re-specify (overwrite) the stable temperature. That is, a range of applicability to installation environment temperatures of this exposure apparatus 10 is broadened. Therefore, exposure processing can always be realized (in states in which image exposure quality is assured) at suitable stable temperatures in accordance with actual installation environment temperatures.
  • the present invention can be applied to an exposure apparatus which is equipped with an air conditioning function, which supplies temperature-regulated air from an air conditioner to an accommodation chamber at which an exposure apparatus main body is accommodated, and can make a temperature distribution along a scanning direction in the accommodation chamber uniform and inhibit temperature changes in the scanning direction.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
PCT/JP2006/309351 2005-04-28 2006-04-28 Exposure apparatus WO2006118343A1 (en)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP2005-133409 2005-04-28
JP2005133409A JP2006308996A (ja) 2005-04-28 2005-04-28 露光装置
JP2005150974A JP2006330165A (ja) 2005-05-24 2005-05-24 露光装置
JP2005-150976 2005-05-24
JP2005150976A JP2006330167A (ja) 2005-05-24 2005-05-24 露光装置
JP2005-150974 2005-05-24

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8309296B2 (en) 2008-03-05 2012-11-13 Fujifilm Corporation Method for processing workpiece with photoresist layer
WO2014172402A1 (en) * 2013-04-18 2014-10-23 E. I. Du Pont De Nemours And Company An exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
TWI700550B (zh) * 2018-03-20 2020-08-01 日商斯庫林集團股份有限公司 圖案描繪裝置以及圖案描繪方法
CN112612180A (zh) * 2020-12-07 2021-04-06 华虹半导体(无锡)有限公司 光刻曝光方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113204175B (zh) * 2021-04-25 2022-10-28 华虹半导体(无锡)有限公司 浸润式光刻机曝光方法
JP2023032011A (ja) * 2021-08-26 2023-03-09 株式会社Ｓｃｒｅｅｎホールディングス 描画装置

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Publication number Priority date Publication date Assignee Title
JPH0580526A (ja) * 1991-09-25 1993-04-02 Dainippon Screen Mfg Co Ltd 感光板の移載装置
JPH10112430A (ja) * 1996-10-04 1998-04-28 Canon Inc 走査ステージ装置および走査型露光装置
JP2001092145A (ja) * 1999-09-17 2001-04-06 Fuji Photo Film Co Ltd 印刷版の塵除去装置
JP2002202570A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 画像露光記録装置および方法
JP2004085664A (ja) * 2002-08-23 2004-03-18 Pentax Corp 描画システム

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Publication number Priority date Publication date Assignee Title
JPH0580526A (ja) * 1991-09-25 1993-04-02 Dainippon Screen Mfg Co Ltd 感光板の移載装置
JPH10112430A (ja) * 1996-10-04 1998-04-28 Canon Inc 走査ステージ装置および走査型露光装置
JP2001092145A (ja) * 1999-09-17 2001-04-06 Fuji Photo Film Co Ltd 印刷版の塵除去装置
JP2002202570A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 画像露光記録装置および方法
JP2004085664A (ja) * 2002-08-23 2004-03-18 Pentax Corp 描画システム

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8309296B2 (en) 2008-03-05 2012-11-13 Fujifilm Corporation Method for processing workpiece with photoresist layer
WO2014172402A1 (en) * 2013-04-18 2014-10-23 E. I. Du Pont De Nemours And Company An exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
US20140315132A1 (en) * 2013-04-18 2014-10-23 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
US9372407B2 (en) 2013-04-18 2016-06-21 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
US9529263B2 (en) 2013-04-18 2016-12-27 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
TWI700550B (zh) * 2018-03-20 2020-08-01 日商斯庫林集團股份有限公司 圖案描繪裝置以及圖案描繪方法
CN112612180A (zh) * 2020-12-07 2021-04-06 华虹半导体(无锡)有限公司 光刻曝光方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

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TW200702940A (en) 2007-01-16

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