TW200702940A - Exposure apparatus - Google Patents

Exposure apparatus

Info

Publication number
TW200702940A
TW200702940A TW095115059A TW95115059A TW200702940A TW 200702940 A TW200702940 A TW 200702940A TW 095115059 A TW095115059 A TW 095115059A TW 95115059 A TW95115059 A TW 95115059A TW 200702940 A TW200702940 A TW 200702940A
Authority
TW
Taiwan
Prior art keywords
scanning direction
air
cooling air
chamber
along
Prior art date
Application number
TW095115059A
Other languages
English (en)
Chinese (zh)
Inventor
Akihiro Hashiguchi
Hiroyuki Kohda
Takashi Fukui
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2005133409A external-priority patent/JP2006308996A/ja
Priority claimed from JP2005150976A external-priority patent/JP2006330167A/ja
Priority claimed from JP2005150974A external-priority patent/JP2006330165A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200702940A publication Critical patent/TW200702940A/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Epidemiology (AREA)
  • Environmental & Geological Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Manufacturing & Machinery (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
TW095115059A 2005-04-28 2006-04-27 Exposure apparatus TW200702940A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005133409A JP2006308996A (ja) 2005-04-28 2005-04-28 露光装置
JP2005150976A JP2006330167A (ja) 2005-05-24 2005-05-24 露光装置
JP2005150974A JP2006330165A (ja) 2005-05-24 2005-05-24 露光装置

Publications (1)

Publication Number Publication Date
TW200702940A true TW200702940A (en) 2007-01-16

Family

ID=37308119

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095115059A TW200702940A (en) 2005-04-28 2006-04-27 Exposure apparatus

Country Status (3)

Country Link
KR (1) KR20080005382A (ko)
TW (1) TW200702940A (ko)
WO (1) WO2006118343A1 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113204175A (zh) * 2021-04-25 2021-08-03 华虹半导体(无锡)有限公司 浸润式光刻机曝光方法
TWI823472B (zh) * 2021-08-26 2023-11-21 日商斯庫林集團股份有限公司 描繪裝置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4950101B2 (ja) 2008-03-05 2012-06-13 富士フイルム株式会社 フォトレジスト層を有するワークの加工方法
US9372407B2 (en) * 2013-04-18 2016-06-21 E I Du Pont De Nemours And Company Exposure apparatus and a method for exposing a photosensitive element and a method for preparing a printing form from the photosensitive element
JP7045890B2 (ja) * 2018-03-20 2022-04-01 株式会社Ｓｃｒｅｅｎホールディングス パターン描画装置およびパターン描画方法
CN112612180B (zh) * 2020-12-07 2022-10-25 华虹半导体(无锡)有限公司 光刻曝光方法
CN112925175A (zh) * 2021-01-29 2021-06-08 深圳市大族数控科技股份有限公司 一种曝光机

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0580526A (ja) * 1991-09-25 1993-04-02 Dainippon Screen Mfg Co Ltd 感光板の移載装置
JP3372782B2 (ja) * 1996-10-04 2003-02-04 キヤノン株式会社 走査ステージ装置および走査型露光装置
JP2001092145A (ja) * 1999-09-17 2001-04-06 Fuji Photo Film Co Ltd 印刷版の塵除去装置
JP2002202570A (ja) * 2000-12-28 2002-07-19 Fuji Photo Film Co Ltd 画像露光記録装置および方法
JP2004085664A (ja) * 2002-08-23 2004-03-18 Pentax Corp 描画システム

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113204175A (zh) * 2021-04-25 2021-08-03 华虹半导体(无锡)有限公司 浸润式光刻机曝光方法
CN113204175B (zh) * 2021-04-25 2022-10-28 华虹半导体(无锡)有限公司 浸润式光刻机曝光方法
TWI823472B (zh) * 2021-08-26 2023-11-21 日商斯庫林集團股份有限公司 描繪裝置

Also Published As

Publication number Publication date
KR20080005382A (ko) 2008-01-11
WO2006118343A1 (en) 2006-11-09

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