WO2006105911A3 - Belichtungsvorrichtung für druckplatten - Google Patents

Belichtungsvorrichtung für druckplatten Download PDF

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Publication number
WO2006105911A3
WO2006105911A3 PCT/EP2006/002962 EP2006002962W WO2006105911A3 WO 2006105911 A3 WO2006105911 A3 WO 2006105911A3 EP 2006002962 W EP2006002962 W EP 2006002962W WO 2006105911 A3 WO2006105911 A3 WO 2006105911A3
Authority
WO
WIPO (PCT)
Prior art keywords
exposure device
press plates
light source
light
optimise
Prior art date
Application number
PCT/EP2006/002962
Other languages
English (en)
French (fr)
Other versions
WO2006105911B1 (de
WO2006105911A2 (de
Inventor
Sascha Neber
John Hedde
Original Assignee
Punch Graphix Prepress Germany
Sascha Neber
John Hedde
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE200510015192 external-priority patent/DE102005015192A1/de
Priority claimed from DE200510015193 external-priority patent/DE102005015193A1/de
Application filed by Punch Graphix Prepress Germany, Sascha Neber, John Hedde filed Critical Punch Graphix Prepress Germany
Priority to CA002603170A priority Critical patent/CA2603170A1/en
Priority to EP06723922A priority patent/EP1872174A2/de
Priority to JP2008503435A priority patent/JP2008535007A/ja
Priority to US11/887,598 priority patent/US20090101845A1/en
Priority to CN200680015628.2A priority patent/CN101171548B/zh
Priority to BRPI0609507-0A priority patent/BRPI0609507A2/pt
Publication of WO2006105911A2 publication Critical patent/WO2006105911A2/de
Publication of WO2006105911A3 publication Critical patent/WO2006105911A3/de
Publication of WO2006105911B1 publication Critical patent/WO2006105911B1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
    • G03F7/2055—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser for the production of printing plates; Exposure of liquid photohardening compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

Um eine Belichtungsvorrichtung (1) mit einer Lichtquelle (2), einem Lichtmodulator (4) sowie einer Lichteinkoppelungseinheit (3) anzugeben, bei der die Bestrahlungsstärke in dem Spektralbereich, welcher für die Belichtung des zu belichtenden Materials (6) benötigt wird, auf besonders einfache und kostengünstige Art und Weise optimiert wird, wird vorgeschlagen, daß die Lichtquelle (2) mindestens eine Laserdiode (7) umfasst.
PCT/EP2006/002962 2005-04-02 2006-03-31 Belichtungsvorrichtung für druckplatten WO2006105911A2 (de)

Priority Applications (6)

Application Number Priority Date Filing Date Title
CA002603170A CA2603170A1 (en) 2005-04-02 2006-03-31 Exposure device for press plates
EP06723922A EP1872174A2 (de) 2005-04-02 2006-03-31 Belichtungsvorrichtung für druckplatten
JP2008503435A JP2008535007A (ja) 2005-04-02 2006-03-31 印刷版の露光装置
US11/887,598 US20090101845A1 (en) 2005-04-02 2006-03-31 Exposure Device for Printing Plates
CN200680015628.2A CN101171548B (zh) 2005-04-02 2006-03-31 用于印版的曝光装置
BRPI0609507-0A BRPI0609507A2 (pt) 2005-04-02 2006-03-31 dispositivo de exposição

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE200510015192 DE102005015192A1 (de) 2005-04-02 2005-04-02 Belichtungsvorrichtung für Druckplatten
DE102005015192.2 2005-04-02
DE102005015193.0 2005-04-02
DE200510015193 DE102005015193A1 (de) 2005-04-02 2005-04-02 Belichtungsvorrichtung und Verfahren für die Belichtung von Druckplatten

Publications (3)

Publication Number Publication Date
WO2006105911A2 WO2006105911A2 (de) 2006-10-12
WO2006105911A3 true WO2006105911A3 (de) 2007-04-05
WO2006105911B1 WO2006105911B1 (de) 2007-05-18

Family

ID=36678612

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2006/002962 WO2006105911A2 (de) 2005-04-02 2006-03-31 Belichtungsvorrichtung für druckplatten

Country Status (6)

Country Link
US (1) US20090101845A1 (de)
EP (1) EP1872174A2 (de)
JP (1) JP2008535007A (de)
BR (1) BRPI0609507A2 (de)
CA (1) CA2603170A1 (de)
WO (1) WO2006105911A2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006049169A1 (de) * 2006-10-18 2008-04-30 Punch Graphix Prepress Germany Gmbh Beleuchtungsanordnung
DE102008052829A1 (de) * 2008-10-16 2010-04-22 Carl Zeiss Surgical Gmbh Beleuchtungsvorrichtung für ein optisches Beobachtungsgerät
TWI666526B (zh) * 2017-10-31 2019-07-21 旭東機械工業股份有限公司 無光罩雷射直寫曝光機
DE20213034T1 (de) 2017-07-20 2021-06-24 Esko-Graphics Imaging Gmbh System und verfahren zur direkten härtung von photopolymerdruckplatten

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EP0687992A1 (de) * 1994-06-16 1995-12-20 Eastman Kodak Company Lichtmodulator mit einem Laser oder mit einer Laseranordnung zum Darstellen von Bilddaten
US6121996A (en) * 1998-05-04 2000-09-19 Creo Srl Laser recording method
EP1212198B1 (de) * 1999-09-17 2003-05-14 Basys Print GmbH Systeme für die Druckindustrie Vorrichtung und verfahren zur kompensation von inhomogenitäten bei abbildungssystemen
US20040244620A1 (en) * 1999-12-03 2004-12-09 Fuji Photo Film Co., Ltd. Plate-making method, plate-making apparatus used in such plate-making method, and image recording material
DE10010619A1 (de) * 2000-03-03 2001-09-13 Krause Biagosch Gmbh Laser-Belichtungsvorrichtung für lichtempfindliche Medien, insbesondere für Druckplatten
US20030214571A1 (en) * 2002-04-10 2003-11-20 Fuji Photo Film Co., Ltd. Exposure head, exposure apparatus, and application thereof

Non-Patent Citations (1)

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Title
See also references of EP1872174A2 *

Also Published As

Publication number Publication date
CA2603170A1 (en) 2006-10-12
JP2008535007A (ja) 2008-08-28
WO2006105911B1 (de) 2007-05-18
WO2006105911A2 (de) 2006-10-12
US20090101845A1 (en) 2009-04-23
EP1872174A2 (de) 2008-01-02
BRPI0609507A2 (pt) 2011-05-24

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