WO2006070426A2 - Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy - Google Patents

Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy Download PDF

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Publication number
WO2006070426A2
WO2006070426A2 PCT/IT2005/000744 IT2005000744W WO2006070426A2 WO 2006070426 A2 WO2006070426 A2 WO 2006070426A2 IT 2005000744 W IT2005000744 W IT 2005000744W WO 2006070426 A2 WO2006070426 A2 WO 2006070426A2
Authority
WO
WIPO (PCT)
Prior art keywords
ribbon
process according
alloy
low
active material
Prior art date
Application number
PCT/IT2005/000744
Other languages
English (en)
French (fr)
Other versions
WO2006070426A3 (en
WO2006070426A8 (en
Inventor
Daniele Martelli
Alessio Corazza
Giovanni Salvago
Luciano Pisoni
Original Assignee
Saes Getters S.P.A.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to CA002590987A priority Critical patent/CA2590987A1/en
Application filed by Saes Getters S.P.A. filed Critical Saes Getters S.P.A.
Priority to US11/721,046 priority patent/US8071172B2/en
Priority to BRPI0519499-7A priority patent/BRPI0519499A2/pt
Priority to MX2007007875A priority patent/MX2007007875A/es
Priority to AT05823860T priority patent/ATE508213T1/de
Priority to EP05823860A priority patent/EP1834006B1/en
Priority to DE602005027902T priority patent/DE602005027902D1/de
Priority to JP2007547800A priority patent/JP4988594B2/ja
Priority to CN2005800450854A priority patent/CN101090989B/zh
Publication of WO2006070426A2 publication Critical patent/WO2006070426A2/en
Publication of WO2006070426A3 publication Critical patent/WO2006070426A3/en
Priority to IL183866A priority patent/IL183866A0/en
Publication of WO2006070426A8 publication Critical patent/WO2006070426A8/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C12/00—Alloys based on antimony or bismuth
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0035—Means for continuously moving substrate through, into or out of the bath
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/006—Pattern or selective deposits
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C23C2/024—Pretreatment of the material to be coated, e.g. for coating on selected surface areas by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/34—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/20—Means for producing, introducing, or replenishing gas or vapour during operation of the tube or lamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/38—Control of maintenance of pressure in the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel

Definitions

  • the present invention relates to a process for manufacturing devices that carry an active material, particularly on a lateral edge thereof, based on the deposition of a low-melting alloy.
  • the devices described in these patents are generally manufactured by introducing the active material in a container or by applying it on the surface of a support, and then by fixing said container or support to an adequate prop, which is then mounted in a pre-determined position in the lamp.
  • the object of the present invention is to provide a process for manufacturing devices carrying an active material, which is free of the above listed problems of the prior art. Said object is obtained according to the present invention with a process that comprises the steps of preparing a ribbon of a metallic material and depositing along a lateral edge of said ribbon at least one strip of active material in the form of a low-melting alloy in the melted state, characterized in that said ribbon is formed of a metal net or a perforated metal band, pre-treated to eliminate passivated surface layers.
  • the single devices can then be obtained by cutting adequate sections of said ribbon, which can be beforehand prepared for cutting by a preliminary punching step through the introduction of parallel transversal weakening lines.
  • Fig. 1 shows a schematic view, in a top plan view, of an example of carrying out the process according to the invention.
  • Fig. 2 shows a view, also schematic, of a segment of the ribbon used in the process according to the invention, after the deposition of the layer of active material, according to one of the equivalent methods exemplified in Fig. 1, from which some devices are formed by cutting (in the drawing three pieces are shown).
  • the ribbon may be a simple metal net or, alternatively, a so-called "stretched micro-perforated sheet metal"; this latter product (simply referred to as stretched sheet metal in the following) is obtained by practicing micro-holes in a metal band, preferably ordered in an ordered pattern on the band, and then stretching the band so as to cause a widening of the holes.
  • stretched sheet metal in the following
  • the material in question in the form of a low-melting alloy in its melted state, ensures its perfect adhesion to the perforated substrate owing to the dimensional characteristics of the holes and to the morphology of the areas of the metallic ribbon between the holes, which as a result of the perforation step have a non-planar surface but slightly drawn between adjacent holes, thus resulting to form a preferential path along which the melted material rises due to a phenomenon similar to capillarity, thereby wetting the whole surface onto which the active product must be applied.
  • Both the metal nets and the stretched sheet metal bands used in the process according to the invention are commercially available and are sold, e.g., by the company Fratelli Mariani S.p.A. of Milan, Italy. It is essential for the purpose of the present invention, that the nets or stretched sheet metal bands forming the substrate for the devices to be produced, are previously treated in a such way to remove the passivated surface layers, mainly of oxide but also of greasy substances, normally present on the metal in order to allow a good adhesion of the deposited alloy on the ribbon itself.
  • deoxidizing or pickling liquids or powders are known, capable of attacking the thin films of oxide and possibly of grease present on the metal surface.
  • the substrate has optimal dimensional characteristics to capture in its perforated structure a certain amount of melted alloy in a precise and reproducible way.
  • the size of the holes must be sufficiently small in order to keep the liquid alloy from the formation of drops or percolation. It has been found that the preferred geometric characteristics, particularly to exploit the phenomena of capillarity to fill holes and channels with the alloy, are related to the thickness of the substrate, the dimensions of the holes and the centre distance between a row and/or a column of holes and the adjacent one.
  • the first value, relative to the thickness, is between 0.20 and 0.50 mm;
  • the second dimensional value, relative to the holes of the ribbon of sheet metal which forms the substrate is such that a circle inscribed therein has a diameter that is smaller than 0.45 mm, while the above-mentioned centre distances will be between 0.55 and 1.10 mm, with a ratio between the holed area and the solid material of the overall surface between 12 and 25%.
  • the process according to the present invention is schematically represented by showing the ribbon of stretched metal sheet 1 coming from the perforation being continuously unrolled from a coil 10 that rotates in the sense of the arrow F moving forward in a vertical plane, perpendicular to that of the drawing.
  • Ribbon 1 first encounters a station for surface treatment 2 to eliminate the passivated surface layers by mechanical or chemical deoxidation action, as previously mentioned, necessary to allow the following deposition of the liquid alloy which occurs downstream along the path of ribbon 1, in the station schematically indicated by the block 3, from which ribbon I' comes out with the active product deposited along the lower edge, opposite to that visible in Fig.
  • the ribbon is better shown, in front view, in Fig. 2, where the edge 13, covered with active material made of a low-melting alloy, applied in the melted state in correspondence with the operative block 3 of Fig. 1, is distinguished from the substrate 12, perforated and possibly subjected to a surface pre-treatment.
  • Low-melting alloys suitable for the purpose are e.g. indium-based alloys with a high content of that element, such as binary indium-silver or indium-tin alloys or ternary indium-silver-copper or indium-silver-nickel alloys containing in any case at least 80% by weight of indium.
  • Other materials with suitable characteristics are bismuth-based alloys, for example bismuth-indium alloys, bismuth-tin alloys or ternary alloys such as bismuth-tin-lead alloys, containing in any case at least 50% by weight of bismuth. Still with reference to Fig.
  • ribbon 1 ' is subsequently cut in the direction orthogonal to its longitudinal extension so as to obtain the desired single devices 21, 21'.
  • ribbon 1 can be prepared, before or after the surface treatment 2, with adequate weakening or punching lines, along which the feet 22, 22' of each device can be obtained, apart from some easily eliminable off-cuts, each foot being narrower than the head zone 13, 13', ...., carrying the active material.
  • the deposition step of the low-melting alloy in the liquid state can be performed in various ways, among which the following can be mentioned: a) by partial immersion into a laminar standing wave, as known in technique for example in certain welding applications; b) by partial immersion into a liquid jet or gush kept at constant level; c) by spraying of small drops from a suitable nozzle; and d) by liquid dispensation from a suitable dispenser.
  • the ribbon itself can undergo a new process as in Fig. 1, by letting it pass through the surface treatment station 2 and the deposition of liquid alloy 3 with inversely positioned edges, i.e. with the already deposited strip 13 turned upwards (as in Fig. 2) so that the edge opposite to that of the strip 13 can undergo the surface treatment (if not already done in view of the first deposition), to obtain thereon a symmetric strip of an active product according to one of the previously-mentioned methods, in the operative block 3 of Fig. 1.
  • Example 1 A ribbon of stretched sheet metal of nickel-plated iron, having a thickness of
  • Example 2 a square mesh perforation with a diameter of the circle inscribed in each hole of 0.28 mm and the centre distances between the rows of holes equal to 0.71 mm and between the columns of holes equal to 0.85 mm, in which the thickness of the nickel layer is of about 1 ⁇ m, is subjected to a surface deoxidation treatment and then immersed in a bath of an alloy in the liquid state having weight percentage composition In 94% - Ag 6%, thereby succeeding to capture an amount of material equal to 110.8 ⁇ 6.0 mg/cm 2 .
  • Example 2 Example 2
  • test of example 1 is repeated, with the only difference that the ribbon is wetted with the liquid alloy, rather than by simple immersion of the edge into the bath, by passage thereof in vertical position through a laminar wave of the liquid alloy, thus obtaining the capture of 110.2 ⁇ 3.3 mg/cm 2 of alloy, namely with a smaller margin of uncertainty.
  • Example 3 The test of example 1 is repeated using a ribbon of stretched sheet metal of nickel-plated iron having a thickness of 0.40 mm, a square mesh perforation with a diameter of the circle inscribed in each hole of 0.26 mm and the centre distances between rows of holes equal to 0.84 mm and between the columns of holes equal to 0.95 mm, in which the thickness of the nickel layer is of about 1 ⁇ m; the amount of In-Ag alloy captured is equal to 112.8 ⁇ 5.4 mg/cm 2 .
  • Example 4
  • the test of example 3 is repeated, adopting however in this case the wetting method of example 2 (passing the metal band through a laminar wave of the liquid alloy). Also in this case a higher reproducibility is obtained, with a loaded amount of 110.8 + 3.5 mg/cm 2 .
  • the examples show that the process of the invention is capable of producing metal nets or micro-perforated bands with deposits of desired materials without any formation of drops or abnormal material deposits, characterized by highly reproducible amounts of deposited material, in particular when the wetting method employed is by passing the net or band through a laminar wave of the liquid material.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Coating With Molten Metal (AREA)
  • Photovoltaic Devices (AREA)
PCT/IT2005/000744 2004-12-27 2005-12-20 Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy WO2006070426A2 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
EP05823860A EP1834006B1 (en) 2004-12-27 2005-12-20 Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy
US11/721,046 US8071172B2 (en) 2004-12-27 2005-12-20 Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy
BRPI0519499-7A BRPI0519499A2 (pt) 2004-12-27 2005-12-20 processo para produÇço em massa de dispositivos que levam pelo menos um material ativo
MX2007007875A MX2007007875A (es) 2004-12-27 2005-12-20 Proceso para manufacturar dispositivos que incluyen por lo menos un material activo por la deposicion de una aleacion de baja fusion.
AT05823860T ATE508213T1 (de) 2004-12-27 2005-12-20 Verfahren zur anfertigung von vorrichtungen, die mindestens ein aktives material tragen, durch abscheidung einer niedrigschmelzenden legierung
CA002590987A CA2590987A1 (en) 2004-12-27 2005-12-20 Process for manufacturing devices carrying at least one active material by dep0sition of a low-melting alloy
DE602005027902T DE602005027902D1 (de) 2004-12-27 2005-12-20 Verfahren zur anfertigung von vorrichtungen, die mindestens ein aktives material tragen, durch abscheidung einer niedrigschmelzenden legierung
JP2007547800A JP4988594B2 (ja) 2004-12-27 2005-12-20 低融点合金の堆積により少なくとも一つの活性物質を担持する装置を製造するための方法
CN2005800450854A CN101090989B (zh) 2004-12-27 2005-12-20 通过沉积低熔点合金制造承载至少一种活性材料的装置的方法
IL183866A IL183866A0 (en) 2004-12-27 2007-06-12 Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
ITMI2004A002516 2004-12-27
IT002516A ITMI20042516A1 (it) 2004-12-27 2004-12-27 Processo per produrre mediante deposizione di lega bassofondente dispositivi portanti almeno un materiale attivo

Publications (3)

Publication Number Publication Date
WO2006070426A2 true WO2006070426A2 (en) 2006-07-06
WO2006070426A3 WO2006070426A3 (en) 2007-06-07
WO2006070426A8 WO2006070426A8 (en) 2007-08-02

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ID=36579646

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IT2005/000744 WO2006070426A2 (en) 2004-12-27 2005-12-20 Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy

Country Status (17)

Country Link
US (1) US8071172B2 (zh)
EP (1) EP1834006B1 (zh)
JP (1) JP4988594B2 (zh)
KR (1) KR20070100767A (zh)
CN (1) CN101090989B (zh)
AR (1) AR051868A1 (zh)
AT (1) ATE508213T1 (zh)
BR (1) BRPI0519499A2 (zh)
CA (1) CA2590987A1 (zh)
DE (1) DE602005027902D1 (zh)
IL (1) IL183866A0 (zh)
IT (1) ITMI20042516A1 (zh)
MX (1) MX2007007875A (zh)
MY (1) MY139734A (zh)
RU (1) RU2395617C2 (zh)
TW (1) TW200639272A (zh)
WO (1) WO2006070426A2 (zh)

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WO2011092349A1 (en) 2010-04-21 2011-08-04 Saes Getters S.P.A. Improved discharge lamp

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RU2521187C2 (ru) * 2012-10-25 2014-06-27 ООО "Биметалл Плюс" Устройство для диффузионной металлизации в среде легкоплавких жидкометаллических растворов
US10356478B2 (en) * 2015-01-08 2019-07-16 The Directv Group, Inc. Systems and methods for spotted advertising and control of corresponding user interfaces and transactions via user receiving devices and mobile devices

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EP1834006B1 (en) 2011-05-04
CN101090989A (zh) 2007-12-19
RU2395617C2 (ru) 2010-07-27
WO2006070426A3 (en) 2007-06-07
CA2590987A1 (en) 2006-07-06
AR051868A1 (es) 2007-02-14
US8071172B2 (en) 2011-12-06
TW200639272A (en) 2006-11-16
KR20070100767A (ko) 2007-10-11
ATE508213T1 (de) 2011-05-15
BRPI0519499A2 (pt) 2009-02-03
EP1834006A2 (en) 2007-09-19
RU2007128769A (ru) 2009-02-10
WO2006070426A8 (en) 2007-08-02
MX2007007875A (es) 2007-07-13
IL183866A0 (en) 2007-10-31
JP4988594B2 (ja) 2012-08-01
US20090022892A1 (en) 2009-01-22
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JP2008527163A (ja) 2008-07-24
ITMI20042516A1 (it) 2005-03-27
MY139734A (en) 2009-10-30

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