BRPI0519499A2 - processo para produÇço em massa de dispositivos que levam pelo menos um material ativo - Google Patents

processo para produÇço em massa de dispositivos que levam pelo menos um material ativo

Info

Publication number
BRPI0519499A2
BRPI0519499A2 BRPI0519499-7A BRPI0519499A BRPI0519499A2 BR PI0519499 A2 BRPI0519499 A2 BR PI0519499A2 BR PI0519499 A BRPI0519499 A BR PI0519499A BR PI0519499 A2 BRPI0519499 A2 BR PI0519499A2
Authority
BR
Brazil
Prior art keywords
active material
devices
mass production
devices carrying
deposition
Prior art date
Application number
BRPI0519499-7A
Other languages
English (en)
Inventor
Daniele Martelli
Alessio Corazza
Giovanni Salvago
Luciano Pisoni
Original Assignee
Getters Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Getters Spa filed Critical Getters Spa
Publication of BRPI0519499A2 publication Critical patent/BRPI0519499A2/pt

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00—Layered products comprising a layer of metal
    • B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
    • B32B15/013—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium
    • B32B15/015—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of an iron alloy or steel, another layer being formed of a metal other than iron or aluminium the said other metal being copper or nickel or an alloy thereof
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C12/00—Alloys based on antimony or bismuth
    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C28/00—Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0035—Means for continuously moving substrate through, into or out of the bath
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/003—Apparatus
    • C23C2/0038—Apparatus characterised by the pre-treatment chambers located immediately upstream of the bath or occurring locally before the dipping process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/006—Pattern or selective deposits
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/02—Pretreatment of the material to be coated, e.g. for coating on selected surface areas
    • C23C2/024—Pretreatment of the material to be coated, e.g. for coating on selected surface areas by cleaning or etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/04—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the coating material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C2/00—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor
    • C23C2/34—Hot-dipping or immersion processes for applying the coating material in the molten state without affecting the shape; Apparatus therefor characterised by the shape of the material to be treated
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/20—Means for producing, introducing, or replenishing gas or vapour during operation of the tube or lamp
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/38—Control of maintenance of pressure in the vessel
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/24—Means for obtaining or maintaining the desired pressure within the vessel

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Battery Electrode And Active Subsutance (AREA)
  • Cell Electrode Carriers And Collectors (AREA)
  • Coating With Molten Metal (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Photovoltaic Devices (AREA)

Abstract

PROCESSO PARA PRODUÇçO EM MASSA DE DISPOSITIVOS QUE LEVAM PELO MENOS UM MATERIAL ATIVO. É descrito um processo para fabricar dispositivos (21, 21') que levam um material ativo, baseado na deposição contínua de uma tira de liga de baixo ponto de fusão no estado líquido em uma fita (1') de uma rede de metal ou uma folha de metal microperfurada ou estirada, cuja superficie foi previamente tratada (2), por exemplo, por meio de desoxidação, e preferivelmente preparada para o corte sucessivo em componentes simples ou particularmente dispositivos com material ativo. A deposição (3) pode ocorrer pela imersão em água laminar em um jato constante, por jateamento de pequenas gotas ou por dispensação de liquido.
BRPI0519499-7A 2004-12-27 2005-12-20 processo para produÇço em massa de dispositivos que levam pelo menos um material ativo BRPI0519499A2 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
IT002516A ITMI20042516A1 (it) 2004-12-27 2004-12-27 Processo per produrre mediante deposizione di lega bassofondente dispositivi portanti almeno un materiale attivo
PCT/IT2005/000744 WO2006070426A2 (en) 2004-12-27 2005-12-20 Process for manufacturing devices carrying at least one active material by deposition of a low-melting alloy

Publications (1)

Publication Number Publication Date
BRPI0519499A2 true BRPI0519499A2 (pt) 2009-02-03

Family

ID=36579646

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0519499-7A BRPI0519499A2 (pt) 2004-12-27 2005-12-20 processo para produÇço em massa de dispositivos que levam pelo menos um material ativo

Country Status (17)

Country Link
US (1) US8071172B2 (pt)
EP (1) EP1834006B1 (pt)
JP (1) JP4988594B2 (pt)
KR (1) KR20070100767A (pt)
CN (1) CN101090989B (pt)
AR (1) AR051868A1 (pt)
AT (1) ATE508213T1 (pt)
BR (1) BRPI0519499A2 (pt)
CA (1) CA2590987A1 (pt)
DE (1) DE602005027902D1 (pt)
IL (1) IL183866A0 (pt)
IT (1) ITMI20042516A1 (pt)
MX (1) MX2007007875A (pt)
MY (1) MY139734A (pt)
RU (1) RU2395617C2 (pt)
TW (1) TW200639272A (pt)
WO (1) WO2006070426A2 (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1399507B1 (it) 2010-04-21 2013-04-19 Getters Spa Lampada a scarica migliorata
RU2521187C2 (ru) * 2012-10-25 2014-06-27 ООО "Биметалл Плюс" Устройство для диффузионной металлизации в среде легкоплавких жидкометаллических растворов
US10356478B2 (en) * 2015-01-08 2019-07-16 The Directv Group, Inc. Systems and methods for spotted advertising and control of corresponding user interfaces and transactions via user receiving devices and mobile devices

Family Cites Families (38)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3519864A (en) 1966-12-29 1970-07-07 Sylvania Electric Prod High pressure electric discharge device with barium peroxide getter and getter mounting structure
US3525009A (en) 1968-02-05 1970-08-18 Tokyo Shibaura Electric Co Low pressure mercury vapour discharge lamp including an alloy type getter coating
NL162244C (nl) 1970-12-25 1980-04-15 Philips Nv Lagedrukkwikdampontladingslamp.
NL158652B (nl) 1969-06-27 1978-11-15 Philips Nv Werkwijze voor de vervaardiging van een lagedrukkwikdampontladingslamp.
US3657589A (en) * 1969-10-20 1972-04-18 Getters Spa Mercury generation
JPS5530066B2 (pt) * 1973-11-14 1980-08-08
US4056750A (en) 1976-12-17 1977-11-01 Gte Sylvania Incorporated Mercury dispenser for discharge lamps
GB1575890A (en) 1978-03-31 1980-10-01 Thorn Electrical Ind Ltd Heating of dosing capsule
US4182971A (en) 1978-07-10 1980-01-08 Gte Sylvania Incorporated Mercury-containing glass-capsule dispenser for discharge lamps
CH648601A5 (fr) 1979-07-31 1985-03-29 Battelle Memorial Institute Procede de revetement en continu d'un substrat metallique sur une partie au moins de sa surface par un autre metal et dispositif pour la mise en oeuvre de ce procede.
US4282455A (en) 1979-11-07 1981-08-04 Gte Products Corporation Mercury dispenser for arc discharge lamps
IE52552B1 (en) 1980-10-22 1987-12-09 Sale Tilney Technology Plc Mercury dispenser for electric discharge lamps
US4461981A (en) 1981-12-26 1984-07-24 Mitsubishi Denki Kabushiki Kaisha Low pressure inert gas discharge device
US4855643A (en) 1983-03-10 1989-08-08 Gte Products Corporation Unsaturated vapor pressure type high pressure sodium lamp
JPS60193253A (ja) 1984-03-14 1985-10-01 Toshiba Corp 低圧水銀蒸気放電灯
US4754193A (en) 1985-11-08 1988-06-28 Gte Products Corporation Mercury dispenser for arc discharge lamps
FR2607967B1 (fr) * 1986-12-04 1989-02-03 Accumulateurs Fixes Procede de fabrication d'electrodes plastifiees pour accumulateurs
CA1288473C (fr) * 1987-03-11 1991-09-03 Andre Belanger Electrode mince supportee sur feuillard conducteur electronique et procede de fabrication
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JPH01197959A (ja) * 1988-02-02 1989-08-09 Toshiba Corp 低圧水銀蒸気放電灯用アマルガムおよびこのアマルガムを用いた低圧水銀蒸気放電灯
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JPH08264154A (ja) * 1995-03-24 1996-10-11 Toshiba Lighting & Technol Corp 低圧水銀蒸気放電ランプおよび照明装置
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IT1277239B1 (it) * 1995-11-23 1997-11-05 Getters Spa Dispositivo per l'emissione di mercurio,l'assorbimento di gas reattivi e la schermatura dell'elettrodo all'interno di lampade
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IT1285988B1 (it) 1996-11-22 1998-06-26 Getters Spa Dispensatore di ossigeno per lampade a scarica ad alta pressione
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JP3925591B2 (ja) * 1997-10-31 2007-06-06 東芝ライテック株式会社 放電ランプ、放電ランプ装置、蛍光ランプおよび蛍光ランプ装置
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Also Published As

Publication number Publication date
RU2395617C2 (ru) 2010-07-27
CN101090989B (zh) 2010-05-12
ATE508213T1 (de) 2011-05-15
JP4988594B2 (ja) 2012-08-01
TW200639272A (en) 2006-11-16
WO2006070426A2 (en) 2006-07-06
AR051868A1 (es) 2007-02-14
KR20070100767A (ko) 2007-10-11
EP1834006A2 (en) 2007-09-19
WO2006070426A3 (en) 2007-06-07
JP2008527163A (ja) 2008-07-24
DE602005027902D1 (de) 2011-06-16
ITMI20042516A1 (it) 2005-03-27
US20090022892A1 (en) 2009-01-22
IL183866A0 (en) 2007-10-31
MY139734A (en) 2009-10-30
US8071172B2 (en) 2011-12-06
CA2590987A1 (en) 2006-07-06
CN101090989A (zh) 2007-12-19
WO2006070426A8 (en) 2007-08-02
MX2007007875A (es) 2007-07-13
EP1834006B1 (en) 2011-05-04
RU2007128769A (ru) 2009-02-10

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Legal Events

Date Code Title Description
B08F Application dismissed because of non-payment of annual fees [chapter 8.6 patent gazette]

Free format text: REFERENTE 7A, ANUIDADE.

B08K Patent lapsed as no evidence of payment of the annual fee has been furnished to inpi [chapter 8.11 patent gazette]

Free format text: REFERENTE AO DESPACHO 8.6 PUBLICADO NA RPI 2203 DE 26/03/2013.