WO2005114674A1 - 透明導電材料、透明導電ペースト、透明導電膜及び透明電極 - Google Patents
透明導電材料、透明導電ペースト、透明導電膜及び透明電極 Download PDFInfo
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- WO2005114674A1 WO2005114674A1 PCT/JP2005/009260 JP2005009260W WO2005114674A1 WO 2005114674 A1 WO2005114674 A1 WO 2005114674A1 JP 2005009260 W JP2005009260 W JP 2005009260W WO 2005114674 A1 WO2005114674 A1 WO 2005114674A1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/06—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances
- H01B1/08—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors mainly consisting of other non-metallic substances oxides
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
- H01B1/20—Conductive material dispersed in non-conductive organic material
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional [2D] radiating surfaces
- H05B33/26—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode
- H05B33/28—Light sources with substantially two-dimensional [2D] radiating surfaces characterised by the composition or arrangement of the conductive material used as an electrode of translucent electrodes
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
- H10F77/247—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising indium tin oxide [ITO]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
- H10F77/244—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers
- H10F77/251—Electrodes made of transparent conductive layers, e.g. transparent conductive oxide [TCO] layers comprising zinc oxide [ZnO]
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K30/00—Organic devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation
- H10K30/80—Constructional details
- H10K30/81—Electrodes
- H10K30/82—Transparent electrodes, e.g. indium tin oxide [ITO] electrodes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/805—Electrodes
- H10K50/81—Anodes
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Definitions
- Transparent conductive material transparent conductive paste, transparent conductive film and transparent electrode
- the present invention relates to a transparent conductive material, a transparent conductive paste, a transparent conductive film, and a transparent electrode.
- Transparent electrodes are used in LCDs, PDPs, organic ELs, touch panels, and the like, and the large transparent electrodes are made of a transparent conductive material.
- a transparent conductive material metal oxides such as tin oxide, indium-tin composite oxide, indium oxide, zinc oxide, and zinc-antimony composite oxide have been known.
- These transparent conductive materials are formed as films on substrates by various methods such as sputtering, vapor deposition, ion plating, and CVD, and are used as transparent conductive films.
- a transparent conductive material obtained by a liquid phase synthesis method has an advantage of being inexpensive to manufacture, but generally uses a chloride containing a halogen in a molecule such as indium chloride tetrahydrate. It tends to contain a large amount of a halogen element as an impurity. Therefore, a transparent electrode using a transparent conductive material obtained by a liquid phase synthesis method has a problem that the resistance value is unstable or large due to the influence of impurities.
- Patent Document 1 JP 05-201731 A
- the present inventors have noticed that the ITO conductive powder described in Patent Document 1 mentioned above may have an increased resistance value particularly when used for a long period of time in a high humidity environment. I found it. [0007]
- the present invention has been made in view of the above circumstances, and a transparent conductive material, a transparent conductive paste, and a transparent material that can sufficiently prevent a change in resistance value with time even in a high humidity environment.
- An object is to provide a conductive film and a transparent electrode.
- the present inventors have conducted intensive studies to solve the above-mentioned problems. For example, the present inventors performed X-ray diffraction on tin-doped indium oxide (ITO) under a high-temperature and high-humidity environment, and found a peak corresponding to In (OH) in an X-ray diffraction spectrum. We have this peak
- the dissociable hydrogen atoms present in the particles combine with the halogen element contained as an impurity in the ITO particles to form halogenated hydrogen, and the hydrogen halide etches the ITO particles to form indium cations.
- the present inventors thought that this was caused by the indium ions binding to moisture.
- the present inventors have conducted further intensive studies based on a strong guess, and as a result, have found that the above-mentioned object can be solved by the following invention, and have completed the present invention.
- the present invention provides an indium composite in which indium oxide or indium oxide is doped with at least one element selected from the group consisting of tin, zinc, tellurium, silver, gallium, zirconium, hafnium and magnesium.
- a transparent conductive material containing an oxidized product, wherein the pH of the mixture containing lwt% of the transparent conductive material is 3 or more, preferably 4 to 9. is there.
- the present invention also provides an indium composite acid obtained by doping indium oxide or at least one element selected from the group consisting of tin, zinc, tellurium, silver, gallium, zirconium, hafnium, and magnesium.
- Transparent conductive material is obtained by doping indium oxide or at least one element selected from the group consisting of tin, zinc, tellurium, silver, gallium, zirconium, hafnium, and magnesium.
- the present invention provides a transparent conductive material containing a tin composite oxide obtained by doping tin oxide or tin oxide with at least one element selected from the group consisting of antimony, zinc and fluorine.
- a transparent conductive material wherein the pH of a mixed solution containing lwt% of the transparent conductive material is 1 or more and the halogen element concentration is 1.5% by mass or less.
- the present invention provides a zinc composite in which zinc oxide or zinc oxide is doped with at least one element selected from the group consisting of aluminum, gallium, indium, boron, fluorine and manganese.
- the present invention is a transparent conductive paste containing the above-mentioned transparent conductive material. Further, the present invention is a transparent conductive film containing the above-mentioned transparent conductive material. Furthermore, the present invention is a transparent electrode including a substrate and a transparent conductive layer provided on one surface side of the substrate, wherein the transparent conductive layer contains the transparent conductive material.
- a transparent conductive material capable of sufficiently preventing a change in resistance value with time even in a high humidity environment. be able to.
- FIG. 1 is a schematic cross-sectional view showing one embodiment of the transparent electrode of the present invention.
- FIG. 2 is a cross-sectional view showing an apparatus for measuring a green compact resistance in an example.
- FIG. 1 is a schematic sectional view showing one embodiment of the transparent electrode of the present invention.
- the transparent electrode 1 according to the present embodiment includes a substrate 10 and a transparent conductive layer 20 formed on one surface of the substrate 10 and containing a transparent conductive material.
- the transparent conductive material contained in the transparent conductive layer 20 contains indium oxide.
- the transparent conductive material has a pH of 3 or more in a mixed solution containing lwt% of the transparent conductive material. According to this transparent conductive material, it is possible to sufficiently prevent the resistance value from changing with time, even in a high humidity environment, regardless of the concentration of the halogen element present in the indium oxide. Although the reason for this is not clear, if the pH of the mixture containing lwt% of the transparent conductive material is 3 or more, the number of dissociable hydrogen atoms can be reduced sufficiently, and it is assumed that halogenated hydrogen is generated. Does not dissolve the transparent conductive material, and as a result, the generation of the insulator In (OH) is sufficiently suppressed, and the resistance of the transparent conductive material is sufficiently increased.
- the pH of a mixed solution containing lwt% of the transparent conductive material is less than 3, and the transparent conductive material having a halogen element concentration of more than 0.2% by mass is used.
- the transmittance of the transparent electrode 1 can be sufficiently increased.
- the transparent conductive material preferably has a pH of 4 or more in a mixed solution containing 1 wt% of the transparent conductive material.
- the pH of the mixed solution containing lwt% of the transparent conductive material is less than 4, the transparent conductive material may generate insolubles such as indium ions and tin ions as compared with the case where the pH is 4 or more. Tend to be higher.
- the transparent conductive material shall have a pH of 9 or less in a mixture containing lwt% of the transparent conductive material. Is preferred.
- pH is set to a value greater than 9
- by-products such as sodium ions and ammonium ions generated will be adsorbed on the surface of the transparent conductive material, and the characteristic will be reduced. Is likely to decrease.
- the transparent conductive material has a pH of 3 or more in a mixed solution containing lwt% of the transparent conductive material, and the halogen element concentration is 0.2% by mass or less. In this case, an increase in the resistance value can be more sufficiently prevented as compared with the case where the concentrations of the element (a) and the element (b) exceed 0.2% by mass.
- the transparent conductive material may have a pH of less than 3 in a mixture containing lwt% of the transparent conductive material, and may have a halogen element concentration of 0.2% by mass or less. Even in this case, it is possible to sufficiently prevent the resistance value from changing with time even in a high humidity environment. This is because when the transparent conductive material has a pH of less than 3 in a liquid mixture containing lwt% of the transparent conductive material, halogenated hydrogen may be sufficiently generated. It is considered that the production of hydrogen halide is sufficiently reduced by setting the concentration to 0.2% by mass or less.
- the form of the transparent conductive material is usually a powder.
- the average particle size of the powder made of the transparent conductive material is preferably 10 to 80 nm! If the average particle size is less than lOnm, the conductivity of the transparent conductive material tends to be unstable. That is, the transparent conductive material according to the present invention generates conductivity due to oxygen deficiency.
- the transparent conductive material has such a small particle size, for example, when the external oxygen concentration is high, the oxygen deficiency occurs. And the conductivity may fluctuate.
- the average particle size exceeds 80 nm for example, light scattering increases in the wavelength region of visible light, the transmittance of the transparent electrode 1 decreases in the wavelength region of visible light, and the haze value tends to increase.
- the specific surface area of the powder which also becomes the transparent conductive material is preferably 10 to 50 m 2 Zg.
- the specific surface area refers to a value measured after vacuum drying a sample at 300 ° C for 30 minutes using a specific surface area measuring device (model: NOVA2000, manufactured by Cantachrome).
- the substrate 10 is not particularly limited as long as it has transparency, but a material constituting the substrate 10 is preferably excellent in transparency. Specific examples of such a material include films of polyester, polyethylene, polypropylene and the like, in addition to glass.
- the indium oxide may be doped with at least one element selected from the group consisting of tin, zinc, tellurium, silver, gallium, zirconium, hafdium, and magnesium.
- the transparent conductive material may contain an indium composite oxide. Even in this case, it is possible to sufficiently prevent the resistance value from changing with time even in a high humidity environment.
- tin is preferable from the viewpoint of sufficiently suppressing the change over time in the resistance value.
- the transparent electrode 1 can be manufactured as follows.
- a co-precipitation is performed by neutralizing the chloride of the element to be doped using an aluminum alloy (precipitation step).
- indium is used as the metal.
- by-product salts are removed by decantation or centrifugation. Since the obtained coprecipitate is contained in the medium, the medium is dried, and the obtained coprecipitate is subjected to calcination and pulverization. Thus, a powdery transparent conductive material is manufactured.
- the baking treatment is preferably performed in a nitrogen atmosphere or a rare gas atmosphere such as helium, argon, or xenon, from the viewpoint of sufficiently suppressing generation of impurities.
- a powder of the transparent conductive material is dispersed in a liquid, and the dispersion is applied on one surface of the substrate 10.
- the liquid in which the transparent conductive material is dispersed include water, saturated hydrocarbons such as hexane, aromatic hydrocarbons such as toluene and xylene, alcohols such as methanol, ethanol, propanol, and butanol, acetone, and methylethyl.
- Ketones such as ketone, isobutyl methyl ketone and diisobutyl ketone, esters such as ethyl acetate and butyl acetate, ethers such as tetrahydrofuran, dioxane and getyl ether, N, N-dimethylacetamide, N, N-dimethylformamide And amides such as N-methylpyrrolidone.
- the transparent conductive materials are adhered to each other to make the thickness of the transparent conductive layer 20 uniform. Therefore, it is preferable to add a binder.
- the binder for example, polymethyl methacrylate can be used.
- the method of applying the dispersion onto the substrate 10 is not particularly limited, and a known method can be used.
- a known method can be used.
- reverse roll method direct roll method, blade method, knife method, extrusion method, nozzle method, curtain method, gravure roll method, bar coat method, dip method, kiss coat method, spin coat method, squeeze method, spray method Is mentioned.
- the dispersion is dried.
- the transparent conductive layer 20 is formed on one surface side of the substrate 10, and the transparent electrode 1 is obtained.
- the solution during the neutralization treatment described above is adjusted.
- the pH of the solution may be adjusted. That is, for example, if the solution is made alkaline, the obtained powdery transparent conductive material can be made alkaline, and the pH of the mixed solution can be increased. Conversely, if the pH of the above solution is lowered by reducing the amount of alkali used in obtaining the coprecipitate, the resulting powdery transparent conductive material can be made acidic, and pH can be lowered. Even after the production of the transparent conductive material, the pH of the mixed solution can be adjusted to an acidic range or a neutral range by sufficiently washing the transparent conductive material.
- the concentration of a halogen element (for example, the concentration of chlorine) in the transparent conductive material can be controlled by a neutralization method in the precipitation step. That is, if a sufficient neutralization treatment is not performed in the precipitation step, the resulting powdery transparent conductive material contains unreacted chloride (such as indium chloride), and the transparent conductive material The concentration of halogen elements in them can be increased. On the other hand, if a sufficient neutralization treatment is performed in the precipitation step to make the solution into a neutral region or an alkaline region, the amount of chlorine in the resulting powdery transparent conductive material can be reduced, and the amount of chlorine in the transparent conductive material can be reduced. The halogen element concentration can be reduced.
- the transparent conductive material having a high halogen element concentration (for example, about 0.5 wt%) and lowering the pH of a mixed liquid containing lwt% of the transparent conductive material (for example, setting the pH to 3.1) is as described above.
- a high halogen element concentration for example, about 0.5 wt%
- lowering the pH of a mixed liquid containing lwt% of the transparent conductive material for example, setting the pH to 3.1
- the transparent conductive material whose concentration of halogen element is so low as to be undetectable and lowers the pH of the mixed solution uses indium nitrate or the like as an indium source used in the above-mentioned precipitation step. In an acidic region.
- the method of adjusting the halogen element concentration is not limited to this, and the method of vaporizing halogen by increasing the heating temperature at the time of oxide generation, the method of ion exchange by using an ion exchange membrane, the method of A method of removing a halogen element contained in impurities by performing washing can be used.
- the concentration of the halogen element in the transparent conductive material can be reduced by performing a water washing step on the transparent conductive material.
- the efficiency of removing the halogen element decreases, and the halogen element concentration cannot be sufficiently reduced. Therefore, in order to further reduce the halogen element concentration, an alkali washing step of washing with an alkali solution is added to the above-mentioned water washing step. As a result, the efficiency of removing the halogen element from the transparent conductive material can be increased, and the concentration can be sufficiently reduced to such an extent that the halogen element concentration cannot be detected.
- the dispersion When a dispersion without a binder is used as the dispersion, the dispersion is applied on one surface of the substrate 10 and dried to form a transparent conductive layer 20 containing a transparent conductive material. After that, the transparent conductive layer 20 may be compressed into a compressed layer of a transparent conductive material. In this case, the transparent conductive layer 20 can be bonded to the substrate 10 without using any solder, which is useful. This compression can be performed by a sheet press, a roll press, or the like. Further, a transparent conductive material can be fixed by impregnating the binder into the compressed layer.
- the transparent electrode of this embodiment is one in which the transparent conductive material contains tin oxide instead of indium oxide, the pH of the mixed solution containing lwt% of the transparent conductive material is 1 or more, and the halogen element concentration is This is different from the transparent electrode of the first embodiment in that an electrode having a content of 1.5% by mass or less is used.
- the transparent electrode since the transparent conductive material is included, it is possible to sufficiently prevent the resistance value from changing with time even in a high humidity environment. Also, by using this transparent conductive material, the pH of the mixed solution containing lwt% of the transparent conductive material is reduced to less than 1, and the transparent conductive material having a halogen element concentration exceeding 1.5% by mass is used. Thus, the transmittance of the transparent electrode can be made sufficiently high.
- the halogen element concentration in the transparent conductive material is more preferably 1.0% by mass or less. In this case, there is an advantage that the moisture resistance is improved as compared with the case where the halogen element concentration exceeds 1.0% by mass.
- the tin oxide may be doped with at least one element selected from the group consisting of antimony, zinc, and fluorine.
- the transparent conductive material may contain a tin composite oxide. In this case, it is possible to sufficiently prevent the resistance value from changing with time even in a high humidity environment.
- antimony is preferable from the viewpoint of sufficiently suppressing the change with time in the resistance value.
- the transparent electrode of the present embodiment is different from the first embodiment in that a transparent conductive material containing zinc oxide instead of indium oxide and having a pH of 4 to 9 in a mixed solution containing lwt% of the transparent conductive material is used. It is different from the transparent electrode of the form.
- the transparent electrode since the transparent conductive material is included, a change in the resistance value with time can be sufficiently prevented even in a high humidity environment.
- the transmittance of the transparent electrode can be sufficiently increased compared to the case where the pH of the mixed solution containing lwt% of the transparent conductive material is made less than 4 or the case where the transparent conductive material is made more than 9 is used. Can be higher. If the pH of the mixture containing lwt% of the transparent conductive material is higher than 9, deterioration under high temperature and high humidity tends to be promoted.
- the transparent conductive material preferably has a pH of 5 or more in a mixed solution containing lwt% of the transparent conductive material.
- impurities can be reduced as compared with a transparent conductive material in which the pH of a mixture containing lwt% of the transparent conductive material is less than 5.
- the halogen element concentration in the transparent conductive material is preferably 0.05% by mass or less. This In this case, even in a high-humidity environment, an increase in resistance can be prevented more sufficiently.
- the zinc oxide may be doped with at least one element selected from the group consisting of aluminum, gallium, indium, boron, fluorine and manganese.
- the transparent conductive material may contain a zinc composite oxide. In this case, it is possible to sufficiently prevent the resistance value from changing with time even in a high humidity environment.
- Al and Ga are preferable from the viewpoint of sufficiently suppressing the change over time in the resistance value.
- the present invention is not limited to the above embodiment.
- the above embodiment relates to a transparent electrode, but the present invention may be a transparent conductive paste containing the above-described transparent conductive material.
- the strong transparent conductive paste contains the transparent conductive material described above. For this reason, the strong transparent conductive paste can sufficiently prevent the resistance value from changing with time even in a high humidity environment. Since the transparent conductive paste has a certain viscosity, it can be uniformly applied to the substrate 10 and can be easily applied to a narrow portion or a concave / convex portion.
- This transparent conductive paste can be obtained by adding a viscosity-increasing agent such as an acrylic resin to the above-described dispersion and drying the dispersion.
- a viscosity-increasing agent such as an acrylic resin
- the present invention may be a transparent conductive film containing the above-mentioned transparent conductive material.
- an acrylic monomer, an epoxy monomer, or the like may be added to the above-described dispersion, and the dispersion may be cured by UV irradiation, EB irradiation, or heating.
- the transparent conductive layer 20 and the substrate 10 are in direct contact, but the transparent electrode of the present invention is provided between the transparent conductive layer and the substrate. It is preferable to provide an anchor coat layer for increasing the adhesive strength to the substrate.
- an anchor coat layer for example, a resin such as urethane is used.
- the diluted product is mixed while adjusting so that the pH is around 5 to 7, and in the case of Example 8, it is adjusted so that the pH is around 7 and mixed.
- mixing was carried out while adjusting the pH to be around 9, thereby producing a white precipitate (coprecipitate).
- the liquid containing the generated precipitate was subjected to solid-liquid separation with a centrifuge to obtain a solid. This was further poured into 100 g of water, dispersed with a homogenizer, and subjected to solid-liquid separation with a centrifuge. This operation of dispersion and solid-liquid separation was repeated so that the chlorine content and pH became the values shown in Table 2, thereby obtaining an indium-tin composite hydroxide.
- the chlorine content in Table 2 was measured using a fluorescent X-ray analyzer (model: ZSX100e, manufactured by Rigaku Corporation). In Table 2, “not detectable” means that the chlorine content is less than 10 ppm.
- Example 2 the pH in Table 2 was measured using a pH meter (model: HM-40S, manufactured by Toa Denpa Kogyo) after mixing the transparent conductive material lg with 99 g of water and leaving it to stand for 10 minutes.
- a pH meter model: HM-40S, manufactured by Toa Denpa Kogyo
- Example 1 an indium tin composite oxide having a chlorine content equal to or lower than the detection limit value and a 1N acetic acid aqueous solution were mixed and dried at 100 ° C. for 1 hour.
- the indium-tin composite hydroxide was dried with a spray drier and heated in a nitrogen atmosphere at 600 ° C for 1 hour to obtain an indium-tin composite oxide as a transparent conductive material. .
- the obtained transparent conductive material an acrylic monomer (lwt% of a UV curing agent was added to a mixture of equal amounts of methyl methacrylate and polyethylene glycol dimethacrylate) and methyl ethyl ketone were added to methyl ethyl ketone.
- the transparent conductive material after volatilization was adjusted to 20% by volume and mixed to prepare a paste.
- This paste is applied to a glass substrate of 5 cm square by a spin coating method, and after methylethylketone is volatilized, the number of rotations is adjusted so that the film thickness becomes 5 m, and the transparent conductive film is irradiated with UV. Got.
- a transparent conductive film was obtained in the same manner as in Example 1, except that the chlorine content was controlled as described below using a Shii-Dani Ammodium. That is, the chlorine content control is performed by mixing an indium tin composite oxidized product having a chlorine content of not more than the detection limit value with a 1N aqueous solution of a salted amide. went. In addition, in the case of Example 7, mixing was performed while adjusting the pH to be around 7, to produce a white precipitate (coprecipitate).
- Example 2 The procedure of dispersing with a homogenizer and performing solid-liquid separation with a centrifugal separator was repeated, and the chlorine content and the pH were adjusted to the values shown in Table 2 to obtain indium tin composite hydroxide. In the same manner as in Example 1, a transparent conductive film was obtained. In the case of Comparative Examples 1 and 2, the pH was adjusted to be around 5 to 7 and mixed, and in the case of Comparative Example 3, the pH was adjusted to be around 9 and mixed. (Coprecipitate) was formed.
- Example 11 The liquid containing the generated precipitate was subjected to solid-liquid separation with a centrifuge to obtain a solid. This was further poured into 100 g of water, dispersed with a homogenizer, and subjected to solid-liquid separation with a centrifuge. This operation of dispersion and solid-liquid separation was repeated so that the chlorine content and the pH became the values shown in Table 3, to obtain a tin hydroxide.
- Example 11 a mixture of a stannic oxide having a chlorine content equal to or lower than the detection limit and a 1N aqueous nitric acid solution and dried at 100 ° C. for 1 hour was used.
- the tin hydroxide was dried with a spray dryer and heat-treated at 600 ° C for 1 hour in a nitrogen atmosphere to obtain a tin oxide.
- the obtained transparent conductive material an acrylic monomer (lwt% of a UV curing agent was added to a mixture of equal amounts of methyl methacrylate and polyethylene glycol dimethacrylate) and methyl ethyl ketone were converted to methyl ethyl ketone.
- the paste was prepared by mixing the components prepared so that the transparent conductive material after volatilization was 20% by volume.
- This paste was applied to a 5 cm square glass substrate by spin coating, and after methylethylketone was evaporated, the number of revolutions was adjusted so that the film thickness was 5 / zm. This was irradiated with UV to obtain a transparent conductive film.
- Examples 15-18 and Comparative Examples were prepared by dissolving an aqueous solution obtained by dissolving 10 g of Shii-dani zinc (manufactured by Kanto Idani Gakusha) in 990 g of water and diluting ammonia water (manufactured by Kanto Kagaku) 10-fold with water.
- aqueous solution obtained by dissolving 10 g of Shii-dani zinc (manufactured by Kanto Idani Gakusha) in 990 g of water and diluting ammonia water (manufactured by Kanto Kagaku) 10-fold with water.
- mixing was performed while adjusting the pH to around 5 to 7
- Example 19 and Comparative Example 6 the mixing was performed while adjusting the pH to around 9 to obtain a white precipitate. (Coprecipitate).
- the zinc hydroxide was dried with a spray drier and heat-treated at 600 ° C for 1 hour in a nitrogen atmosphere to obtain a zinc oxide.
- the obtained transparent conductive material an acrylic monomer (lwt% of a UV curing agent added to a mixture of equal amounts of methyl methacrylate and polyethylene glycol dimethacrylate) and methyl ethyl ketone were added to methyl ethyl ketone.
- the paste was prepared by mixing the components prepared so that the transparent conductive material after volatilization was 20% by volume.
- This paste was applied to a 5 cm square glass substrate by spin coating, and after methylethylketone was evaporated, the number of revolutions was adjusted so that the film thickness became 5 / zm. This was irradiated with UV to obtain a transparent conductive film.
- the change in resistance of the transparent conductive film obtained as described above was measured as follows. That is, the measurement point of the surface resistance of the transparent conductive film is determined in advance, and the measurement point is measured using a four-probe surface resistance measurement device (MCP-T600, manufactured by Mitsubishi Electric Corporation). Next, the transparent conductive film was left at 60 ° C. and 95% RH for 1000 hours, taken out, and left in the air for 1 hour. The measurement point of the transparent conductive film was measured again. Tables 2 to 4 show the results of resistance change before and after humidification.
- the green compact resistance was measured using the apparatus shown in FIG.
- the device 30 has a diameter of 15 mm at the bottom, A stainless steel jig 31 having a convex portion 31a with a height of 6 mm at the center is provided.
- a cylindrical body 32 is provided.
- the inner wall of the body 32 is provided with an insulating plastic inner 33 having a thickness of lmm.
- the side surface of the protrusion 31a and the inner wall of the body 32 form the inner 33. It is pinched.
- the upper surface of the convex portion 31a is flat so that the sample 35 can be placed thereon.
- ITO in Table 1 is an evaluation when the conductive material is ITO (Examples 1 to 10 and Comparative Examples 1 to 3), and SnO is a case where the conductive material is SnO ( Evaluation of Examples 11 to 14 and Comparative Example 4)
- ZnO is an evaluation when the conductive material is ZnO (Examples 15 to 19 and Comparative Examples 5 and 6).
- Example 1 IT 0 Undetectable 3.0 1 .1 8 0 .05 A
- Example 2 IT 0 0 .0 8 3.91 .1 6 0 .06 A
- Example 3 IT 0 0 .1 0 3 7 1 .3 3 0.06 A
- Example 4 IT 0 0 .1 1 3.5 .2 3 0 .0 6 B
- Example 5 IT 0 .2 0 2.9 5.83.
- Example 6 IT 0 0.3 0 3 .1 4.0 2 0 .0 5 B
- Example 7 IT 0 0 .5 0 7.5 5 .4 5 0 .0 7
- Example 8 IT 0 0.06 5.0 0 .1 3 0 .0 7
- Example 9 IT 0 0 .0 7 8.8 1 .2 7 0 .1 3 B
- Example 10 IT 0 0 .0 8 9.0 1. 3 5 0. 1 2 B Comparative example 1 IT 0 0. 7 2 2. 5 6. 7 5 X 1 0 8 0. 0 5 C Comparative example 2 IT 0 0. 5 9 2. 7 9. 7 6 X 1 0 0. 0 5 C Comparative Example 3 IT 0 0 .0 9 9.3 1.4 .2 0 .3 0 c
- ITO Examples 1 to: L0 can sufficiently prevent the resistance value from increasing over time because the resistance value change is significantly smaller than Comparative Examples 1 and 2 related to ITO. Helped.
- Examples 1 to 5 relating to ITO: LO is the same as Comparative Example 3 relating to ITO. It was a component that the resistance value of the green compact could be considerably reduced.
- Examples 11 to 14 relating to SnO had a higher resistance than Comparative Example 4 relating to SnO.
- the transparent conductive material of the present invention can sufficiently prevent the resistance value from changing with time even in a high humidity environment.
- a transparent conductive material a transparent conductive paste, a transparent conductive film, and a transparent electrode capable of sufficiently preventing a change in resistance value with time even in a high humidity environment.
- These can be suitably used for LCDs, PDPs, organic ELs, touch panels, and the like.
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- Dispersion Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
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- Electromagnetism (AREA)
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- Inorganic Chemistry (AREA)
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Abstract
Description
Claims
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US11/597,133 US20080014452A1 (en) | 2004-05-21 | 2005-05-20 | Transparent Conductive Material, Transparent Conductive Paste, Transparent Conductive Film and Transparent Electrode |
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004152444 | 2004-05-21 | ||
| JP2004-152444 | 2004-05-21 | ||
| JP2005-133156 | 2005-04-28 | ||
| JP2005133156A JP2006012783A (ja) | 2004-05-21 | 2005-04-28 | 透明導電材料、透明導電ペースト、透明導電膜及び透明電極 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005114674A1 true WO2005114674A1 (ja) | 2005-12-01 |
Family
ID=35428600
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/009260 Ceased WO2005114674A1 (ja) | 2004-05-21 | 2005-05-20 | 透明導電材料、透明導電ペースト、透明導電膜及び透明電極 |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20080014452A1 (ja) |
| JP (1) | JP2006012783A (ja) |
| KR (1) | KR100846081B1 (ja) |
| WO (1) | WO2005114674A1 (ja) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009302020A (ja) * | 2008-06-17 | 2009-12-24 | Idemitsu Kosan Co Ltd | 導電性微粒子及びその製造方法 |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4590978B2 (ja) * | 2004-08-20 | 2010-12-01 | Tdk株式会社 | 透明導電材料及び透明導電体 |
| JP5114846B2 (ja) * | 2006-02-02 | 2013-01-09 | 東レ・ファインケミカル株式会社 | 酸化亜鉛分散ペーストの製造方法 |
| KR100862593B1 (ko) * | 2007-02-01 | 2008-10-09 | 한양대학교 산학협력단 | 투명 전도성 박막 및 이의 제조방법 |
| CN102171160A (zh) * | 2008-09-25 | 2011-08-31 | Jx日矿日石金属株式会社 | 透明导电膜制造用的氧化物烧结体 |
| KR101300560B1 (ko) * | 2009-07-01 | 2013-09-03 | 삼성코닝정밀소재 주식회사 | 산화아연계 전도체 |
| WO2012122508A2 (en) | 2011-03-09 | 2012-09-13 | Board Of Regents | Network routing system, method, and computer program product |
Citations (5)
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| JPH05201731A (ja) * | 1991-10-15 | 1993-08-10 | Mitsubishi Materials Corp | 超微粒低抵抗スズドープ酸化インジウム粉末とその製法 |
| JPH0822722A (ja) * | 1994-07-08 | 1996-01-23 | Mitsubishi Materials Corp | 透明導電膜形成用組成物 |
| JPH08102227A (ja) * | 1994-09-30 | 1996-04-16 | Mitsubishi Materials Corp | 透明導電膜およびその形成方法 |
| JPH08302246A (ja) * | 1995-05-09 | 1996-11-19 | Sumitomo Osaka Cement Co Ltd | 高導電性と高膜強度とを有する透明な被膜形成用の塗料及び高導電性と高膜強度とを有する透明な被膜の形成方法と、陰極線管 |
| JPH1059720A (ja) * | 1996-08-12 | 1998-03-03 | Konica Corp | 非晶質酸化スズゾル及びその製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3355733B2 (ja) * | 1992-12-28 | 2002-12-09 | 三菱マテリアル株式会社 | 低抵抗導電性顔料及びその製造方法 |
| NL1004635C2 (nl) * | 1995-12-06 | 1999-01-12 | Sumitomo Chemical Co | Indiumoxyde-tinoxydepoeders en werkwijze voor het voortbrengen daarvan. |
| JP2001332130A (ja) * | 2000-05-19 | 2001-11-30 | Tdk Corp | 機能性膜 |
| US6605341B2 (en) * | 2000-05-19 | 2003-08-12 | Tdk Corporation | Functional film having specific surface dispersion ratio |
| US6819044B2 (en) * | 2002-04-10 | 2004-11-16 | Tdk Corporation | Thin-film EL device and composite substrate |
-
2005
- 2005-04-28 JP JP2005133156A patent/JP2006012783A/ja active Pending
- 2005-05-20 WO PCT/JP2005/009260 patent/WO2005114674A1/ja not_active Ceased
- 2005-05-20 US US11/597,133 patent/US20080014452A1/en not_active Abandoned
- 2005-05-20 KR KR1020067026995A patent/KR100846081B1/ko not_active Expired - Fee Related
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05201731A (ja) * | 1991-10-15 | 1993-08-10 | Mitsubishi Materials Corp | 超微粒低抵抗スズドープ酸化インジウム粉末とその製法 |
| JPH0822722A (ja) * | 1994-07-08 | 1996-01-23 | Mitsubishi Materials Corp | 透明導電膜形成用組成物 |
| JPH08102227A (ja) * | 1994-09-30 | 1996-04-16 | Mitsubishi Materials Corp | 透明導電膜およびその形成方法 |
| JPH08302246A (ja) * | 1995-05-09 | 1996-11-19 | Sumitomo Osaka Cement Co Ltd | 高導電性と高膜強度とを有する透明な被膜形成用の塗料及び高導電性と高膜強度とを有する透明な被膜の形成方法と、陰極線管 |
| JPH1059720A (ja) * | 1996-08-12 | 1998-03-03 | Konica Corp | 非晶質酸化スズゾル及びその製造方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009302020A (ja) * | 2008-06-17 | 2009-12-24 | Idemitsu Kosan Co Ltd | 導電性微粒子及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006012783A (ja) | 2006-01-12 |
| KR100846081B1 (ko) | 2008-07-14 |
| KR20070014205A (ko) | 2007-01-31 |
| US20080014452A1 (en) | 2008-01-17 |
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