WO2005086199A1 - Pate pour diaphragme et procede de fabrication de panneau d’affichage plasma - Google Patents

Pate pour diaphragme et procede de fabrication de panneau d’affichage plasma Download PDF

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Publication number
WO2005086199A1
WO2005086199A1 PCT/JP2005/003537 JP2005003537W WO2005086199A1 WO 2005086199 A1 WO2005086199 A1 WO 2005086199A1 JP 2005003537 W JP2005003537 W JP 2005003537W WO 2005086199 A1 WO2005086199 A1 WO 2005086199A1
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Prior art keywords
paste
partition
resin
meth
acrylate
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PCT/JP2005/003537
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English (en)
Japanese (ja)
Inventor
Masamichi Tanida
Hiroyuki Yamamoto
Toshihiro Takeuchi
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Asahi Glass Company, Limited
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Priority to JP2006510698A priority Critical patent/JPWO2005086199A1/ja
Publication of WO2005086199A1 publication Critical patent/WO2005086199A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/07—Glass compositions containing silica with less than 40% silica by weight containing lead
    • C03C3/072—Glass compositions containing silica with less than 40% silica by weight containing lead containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/066—Glass compositions containing silica with less than 40% silica by weight containing boron containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/062—Glass compositions containing silica with less than 40% silica by weight
    • C03C3/064—Glass compositions containing silica with less than 40% silica by weight containing boron
    • C03C3/068—Glass compositions containing silica with less than 40% silica by weight containing boron containing rare earths
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/078—Glass compositions containing silica with 40% to 90% silica, by weight containing an oxide of a divalent metal, e.g. an oxide of zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/083—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound
    • C03C3/085—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal
    • C03C3/087—Glass compositions containing silica with 40% to 90% silica, by weight containing aluminium oxide or an iron compound containing an oxide of a divalent metal containing calcium oxide, e.g. common sheet or container glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
    • C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
    • C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C3/00—Glass compositions
    • C03C3/04—Glass compositions containing silica
    • C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
    • C03C3/095—Glass compositions containing silica with 40% to 90% silica, by weight containing rare earths

Definitions

  • the present invention relates to a paste used for forming a partition wall of a plasma display panel (PDP), a fluorescent display tube (VFD), and the like.
  • PDP plasma display panel
  • VFD fluorescent display tube
  • the present invention also relates to a method for producing a PDP.
  • One of the features of the panel structure of a PDP or VFD which is a thin flat panel color display device, is a partition formed at equal intervals over the entire screen to separate pixels.
  • a PDP a front glass substrate and a rear glass substrate are overlapped, and a transparent electrode and a dielectric layer covering the transparent electrode are usually formed on the surface of the front glass substrate. The dielectric layer is covered and protected by an MgO film.
  • an address electrode and an insulating coating layer covering the address electrode are usually formed on the surface of the back glass substrate, and a partition is formed on the insulating coating layer.
  • the partition walls are formed in a grid pattern at equal intervals over the entire screen, and the grid interval is typically 200 to 300 m.
  • the width and height of the partition are typically 80 m and 150 / z m, respectively.
  • Partition walls of a PDP are, for example, partition walls obtained by mixing a ceramic filler for maintaining the partition wall shape, a glass powder as a fixing material, and an inorganic powder including a heat-resistant pigment for color tone adjustment with a vehicle. It is formed as follows using a paste for use.
  • a paste for a partition is applied to the entire surface of a glass substrate having a surface on which an address electrode and an insulating coating layer covering the address electrode are formed, and dried.
  • a dry film resist is laminated on the dried coating layer (hereinafter, referred to as a dried film), and an exposure mask having a desired partition pattern is set and exposed, and then an aqueous solution of sodium carbonate or the like is used.
  • a partition pattern on the dried film.
  • Unnecessary portions of the dried film on which the partition wall pattern is formed are cut by sandblasting to obtain unfired partition walls, and the dry film remaining on the unfired partition walls is subjected to sodium hydroxide aqueous solution, ethanolamine solution, and the like. After removal by, for example, baking at 500-620 ° C., partition walls are formed on the glass substrate.
  • the paste for the partition wall has a PbO—SiO—BO glass powder as a glass powder.
  • white pigments such as titania or black pigments such as Cr-Cu composite acids are used.
  • Ceramic ceramic powders such as alumina, zircon, and zirconia are used, respectively.
  • a typical composition of the PbO—SiO—BO system glass expressed in mol% is
  • the paste for the partition walls mainly made of glass powder of PbO—SiO—B O based glass is used.
  • Lead-containing glass represented by 223 has excellent properties as a glass for forming partition walls, but in recent years, low-lead or lead-free glass has been desired, and there are various alternatives to lead-containing glass. Proposed. For example, bismuth-containing glass using BiO instead of PbO, ZnO
  • bismuth is a small amount of material and expensive, it is also desirable that bismuth be low in bismuth or no bismuth.
  • glass powder used for the paste for partition walls is required to have low lead siding and low bismuth.
  • the conventional partition wall paste when the glass powder is replaced with a lead-containing glass powder that does not contain alkali metal oxide, for example, an alkali-containing glass, the dry film obtained from the partition wall paste and the dry film become incompatible. Since the adhesion is greatly reduced, there is a problem that the dry film is peeled off in the developing step and the sandblasting step in the partition wall forming step.
  • the decrease in adhesion between the dry film and the dry film when the alkali-containing glass is replaced is considered to be due in part to elution of the alkali component into the developer and an increase in the pH of the developer. This prevents the dry film from peeling off. It may be possible to lower the pH of the developing solution or to lower the sandblasting speed (blast rate) in order to avoid this, but there are problems such as a longer time required for manufacturing the partition walls.
  • the present invention can maintain good adhesion between a dry film and a dry film without lengthening the time required for sandblasting even when using an alkali-containing glass.
  • the purpose of the present invention is to provide a partition wall paste capable of shortening the time required for sandblasting without reducing the properties.
  • Another object of the present invention is to provide a method for manufacturing a plasma display panel using the partition wall paste.
  • the present invention provides a method for manufacturing a paste for partition walls and a plasma display panel having the following structures.
  • Acrylic polymer strength The polymer for a partition wall according to any one of (1) to (5) above, wherein a monomer having a Tg of 0 ° C. or less when formed into a homopolymer is contained as a polymerization component. Strike.
  • Alkali-containing glass powder power In terms of mol% on the basis of the following Sanigata, essentially B 2 O 3
  • a method for manufacturing a plasma display panel having a rear substrate comprising applying the partition wall paste according to any one of (1) to (8) above on a glass substrate of the rear substrate, followed by drying,
  • a method for producing a plasma display panel comprising a step of processing and firing to form a partition.
  • the adhesion between the dry film and the dry film is maintained well without prolonging the time required for sandblasting.
  • a paste for partition walls, which has little dry film peeling even during sandblasting, or a paste for partition walls, which can reduce the time required for sandblasting without lowering the adhesion, can be obtained.
  • a PDP having high brightness and excellent image quality can be manufactured without particularly increasing or shortening the time required for the sand blasting.
  • FIG. 1 is a schematic sectional view of a typical example of a plasma display.
  • the paste for partition walls of the present invention (hereinafter referred to as the paste of the present invention) is usually prepared by dissolving an inorganic powder such as an alkali-containing glass powder, a ceramic filler, a heat-resistant pigment, a resin as an organic binder, and the resin. And a vehicle containing a solvent.
  • the paste of the present invention is used to form barrier ribs such as PDPs and VFDs, and is usually applied over the entire surface of a glass substrate having an address electrode and an insulating coating layer covering the address electrodes formed thereon, and dried. After being processed into a desired shape by a sand blast method or the like, it is fired.
  • the content of the alkali-containing glass powder in the inorganic powder is preferably 70% by mass or more, more preferably 80% by mass or more.
  • the content is typically not more than 95% by mass or not more than 85% by mass.
  • the softening point T of the alkali-containing glass powder is preferably 450 to 650 ° C. T force 5 s s
  • the glass flows too much during the firing, and a predetermined partition shape cannot be obtained. If the T force exceeds 50 ° C, the glass flow during firing s
  • the mobility may be reduced, and a dense partition wall may not be obtained.
  • the temperature is more preferably 620 ° C or less, and particularly preferably less than 600 ° C.
  • the average linear expansion coefficient of the glass substrate is typically 65 X 10- 7 - is a 85 X 10- 7 / ° C.
  • the alkali-containing glass powder contains R O (R represents an alkali metal) as a component thereof.
  • the alkali-containing glass powder in the paste of the present invention is essentially represented by the following oxide based mol%,
  • the content of PbO + BiO is preferably 10% or less.
  • B 0 0-60% means that B 2 O is not essential but contains up to 60%.
  • the content of PbO + Bi O is more preferably 5% or less.
  • the alkali-containing glass powder may contain other components as long as the object of the present invention is not impaired.
  • the total content of the "other components” is preferably 5% or less! / ,.
  • rare earth oxides such as La O, P O, MnO, Fe O, Co
  • the ceramic filler is not essential, but may be contained as necessary. When a ceramic filler is contained, its typical content is 5-25% by mass. Examples of the ceramic filler include powders of alumina, mullite, zircon, zirconia, cordierite, aluminum titanate, ⁇ -spodumene, ⁇ -quartz, quartz glass, j8-quartz solid solution, and eucryptite. .
  • the heat-resistant pigment is not essential, but may be contained as necessary. When a heat-resistant pigment is contained, its typical content is 0.5 to 10% by mass.
  • heat-resistant pigments include white pigments such as titer, and pigments such as Fe—Mn double oxide, Fe—Co—Cr double oxide, and Fe—Mn—A1 double oxide.
  • the content of the resin in the paste of the present invention is preferably 0.5 to 15 parts by mass based on 100 parts by mass of the inorganic powder. If the content is less than 0.5 part by mass, the adhesion to the dry film may be weak, more preferably 1 part by mass or more, and if it exceeds 15 parts by mass, the blast rate may be too slow, Preferably not more than 10 parts by mass
  • the resin of the paste of the present invention contains an acrylic polymer.
  • the acrylic polymer content in the resin is preferably at least 10% by mass, more preferably at least 20% by mass, and typically at least 40% by mass.
  • the resin of the paste of the present invention contains an acrylic polymer having, as a polymerization component, a monomer having a Tg (glass transition temperature) of 40 ° C. or lower when formed into a homopolymer.
  • a dry film can be formed without increasing the time required for sandblasting. Good adhesion to the dry film can be maintained to reduce the peeling of the dry film in the formation of the partition walls, or the time required for sandblasting can be reduced without lowering the adhesion, In some cases, the phenomenon in which the clear layer (transparent layer) separates to cause non-uniformity can be suppressed.
  • the acrylic polymer is a homopolymer
  • Monomers having a Tg of 40 ° C or less when formed into a homopolymer include n-butyl (meth) acrylate (Tg: 30 ° C) and n-hexyl (meth) acrylate (Tg: —5 ° C), ethylhexyl (meth) acrylate (Tg: -20 ° C), n-dodecyl (meth) acrylate (Tg: -60 ° C), 2-ethylaminoethyl (meth) acrylic acid ( (Tg: 26 ° C) (the temperature in parentheses indicates the Tg of the homopolymer obtained from each monomer).
  • the acrylic polymer contained in the resin of the paste of the present invention preferably has an acid value or an amine value. Acrylic polymer strength If there is no acid value or amine value, the blast rate will be slow, the adhesion between the dry film and the dry film will be reduced, or the clear layer (transparent layer) will separate from the surface when the paste is used May cause non-uniformity.
  • the acid value of the acrylic polymer is preferably 30 mgKOHZg or less. If the acid value exceeds 30 mgKOH / g, the adhesion between the dried film and the dry film may be reduced.
  • a monomer having a polar group such as a carboxyl group, an amino group, or an amine group is used as a polymerization component in accordance with a desired acid value or an amine value. What is necessary is just to contain. Examples of such a monomer include (meth) acrylic acid, 2-getylaminoethyl (meth) acrylic acid, and the like. The content of these monomer components in the acrylic polymer is preferably 0.5 5 5 mol 0/0.
  • the acrylic polymer impairs the purpose of the present invention by using a monomer having a Tg of 40 ° C or less when the above homopolymer is used, and other monomers other than a monomer for providing an acid value or an amine value. It may be contained as a polymerization component within a range not present.
  • Examples of the above-mentioned other monomers include methyl (meth) acrylate, ethyl (meth) acrylate, n-propyl (meth) acrylate, i-butyl (meth) acrylate, t-butyl (meth) acrylate, stearyl ( (Meta) acrylate, oleyl (meta) acrylate, cyclohexyl Sil (meth) acrylate, benzyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, Monomers having a polymerizable group other than (meth) acrylate are exemplified.
  • the content of the monomer component having a Tg of 40 ° C or less is 5 mol% or more.
  • the content is less than 5 mol%, a high blast rate can be achieved to achieve good adhesion between the dry film and the dry film, or the talli layer separation phenomenon can easily occur. It is typically at least 40 mol%.
  • the mass average molecular weight of the acrylic polymer is preferably from 40,000 to 200,000, more preferably from 40,000 to 100,000! If the weight average molecular weight is less than 40,000, the adhesion between the dry film and the dry film may be insufficient. If the weight average molecular weight exceeds 200,000, it may be dissolved in an organic solvent such as tavinelone.
  • a resin other than the acrylic polymer for example, ethyl cellulose, may be used as the resin if necessary. Let me contain it.
  • the weight average molecular weight is preferably from 50,000 to 200,000. If the weight average molecular weight is less than 50,000, the adhesion between the dried film and the dry film may be insufficient, and if it exceeds 200,000, it becomes difficult to dissolve in an organic solvent such as turbineol.
  • ethyl cellulose When ethyl cellulose is contained as a resin, the content of the ethyl cellulose in the resin is typically 40% by mass or more.
  • the resin other than the acrylic polymer of the paste of the present invention examples include thermoplastic resins such as polyvinyl butyral in addition to ethyl cellulose.
  • the resin in the paste of the present invention is essentially composed of a thermoplastic resin, but may contain a resin other than the thermoplastic resin as long as the object of the present invention is not impaired!
  • the content ratio of the organic solvent in the paste of the present invention is based on 100 parts by mass of the inorganic powder.
  • the organic solvent of the paste of the present invention includes terbineol, ethylene glycol alkyl ether (eg, ethylene glycol monoethyl ether), diethylene glycol monoether.
  • Alkyl ether for example, diethylene glycol monobutyl ether (butyl carbitol)
  • ethylene glycol monoleno quinoleate enorea acetate diethylene glycol mono oleno alkyl ether acetate (for example, diethylene glycol monobutyl ether acetate (butyl carbitol acetate))
  • a surfactant is not essential, but may be contained as necessary.
  • the surfactant preferably has a polar group in the hydrophilic portion.
  • the polar group include one or more polar groups selected from the group consisting of a carboxyl group, a phosphate group, an amino group, and a hydroxyl group.
  • alkyl is a straight-chain or branched-chain alkyl having 8 to 20 carbon atoms (for example, octyl, Lil, cetyl, stearyl, oleyl, etc. )
  • alkylene is a straight-chain or branched-chain alkylene having 2 to 5 carbon atoms (eg, ethylene, propylene, etc.).
  • R is a linear or branched alkyl group having 8 to 20 carbon atoms, and R is a 2 to 5 carbon atom.
  • n 120
  • X is a carboxyl group or a phosphate group.
  • compounds represented by the above formula 1 include polyoxyethylene lauryl ether carboxylate, polyoxyethylene lauryl ether phosphate and the like, and alkyl phosphates such as lauryl phosphate and hydroxyethyl.
  • alkylamine examples include N-hydroxyethyl laurylamine
  • polyoxyalkylenealkylamine examples include polyoxyethylene laurylamine.
  • Including these surfactants may be preferable in that cracks in the dried film and a decrease in adhesion between the dried film and the substrate can be prevented. Further, it may be effective to shorten the time required for sandblasting and to maintain good adhesion between the dry film and the dry film.
  • the content ratio is preferably 0.2 to 2 parts by mass with 100 parts by mass of the inorganic powder, typically 0.5 parts by mass or more. If the amount is more than 2 parts by mass, there may be problems such as cracking of the dried film by force and reduction in adhesion between the dried film and the substrate.
  • the surfactant of the present invention may contain two or more of these surfactants as necessary.
  • the paste of the present invention may preferably contain a nonionic surfactant when viscosity adjustment or the like is performed.
  • the content ratio of the nonionic surfactant is preferably 0.2 to 2 parts by mass based on 100 parts by mass of the inorganic powder.
  • Non-ionic surfactants include polyethylene glycol alkyl ether, polyethylene glycol alkyl ester, polyoxyethylene alkyl ether, polyoxyethylene alkyl ester, polyoxyethylene polypropylene alkyl ether, polyethylene glycol alkylamine, hydroxyethyl alkyla Min, phosphate ester, carboxylic acid ester, polyalkyl glycol ether, alkyl polyether Examples thereof include min or alkylammonium salts.
  • alkyl refers to octyl, radial, cetyl, stearyl, oleyl and the like.
  • the PDP is manufactured as follows, for example, in the case of an AC system.
  • an electrode 2 is formed on the front glass substrate la by patterning, a nose line (not shown) is formed, and then a transparent dielectric layer 3 for protecting the electrode is formed.
  • a protective film usually made of MgO, is formed on the transparent dielectric layer 3 to manufacture a front substrate.
  • a patterned address electrode 5 is formed on the rear glass substrate lb, and then an insulating coating layer 8 covering the address electrode is formed.
  • the partition walls 6 are formed by applying the paste of the present invention on the entire surface of the insulating coating layer 8, drying the paste, processing it into a desired partition pattern by sandblasting, and firing.
  • the temperature at which the calcination is performed is usually 500 to 620 ° C. If the temperature is lower than 500 ° C, the resin partially remains on the fired partition walls, and the residual resin is released as a gas when sealing the panel with PDP or VFD or when discharging the panel. If the temperature exceeds 620 ° C, the glass substrate may be deformed
  • the phosphor layer 4 is formed by printing and baking.
  • a sealing material (not shown) is applied to the periphery of the front glass substrate la and the rear glass substrate lb with a dispenser, and the electrodes of the front substrate and the rear substrate manufactured as described above are opposed to each other.
  • the plasma display is evacuated, the discharge space 7 is filled with a discharge gas such as Ne or He—Xe, and the plasma display is manufactured.
  • inorganic powders Al, A2 and B1 were prepared using glass powders A and B. That is, the inorganic powder A1 was prepared by mixing glass powder A: 91.3% by mass, silica powder: 8.0% by mass, and titanium powder: 0.7% by mass. The inorganic powder A2 was prepared by mixing 95.1% by mass of glass powder A and 4.9% by mass of titania powder. The inorganic powder B1 was prepared by mixing glass powder B: 84.5% by mass, silica powder: 15.0% by mass, and titanium powder: 0.5% by mass.
  • Example 11 to 17 the inorganic powder A1 was used, in Examples 18 and 20, the inorganic powder A2 was used, and in Example 19, the inorganic powder B1 was used.
  • a resin (acrylic polymer, ethylcellulose) and an organic solvent (turbineol, ethylene glycol monobutyl ether acetate (DEGBEA), propylene glycol diacetate (PGDA)) were added.
  • the mixture was stirred at 85 ° C. for 4 hours to dissolve the resin and prepare a vehicle.
  • Example 11 The acrylic polymers used in 17, 19, and 20 were n-BMA (n-butyl methacrylate), 2DEAEA (2-dimethylaminoethyl (meth) acrylic acid), and EHMA (ethylhexyl (meta-hexyl)).
  • n-BMA n-butyl methacrylate
  • 2DEAEA 2-dimethylaminoethyl (meth) acrylic acid
  • EHMA ethylhexyl (meta-hexyl)
  • MMA methyl methacrylate (Tg: 110 ° C)
  • iBMA i-butyl methacrylate
  • methacrylic acid in the ratio shown in mol% in the table (The temperature in parentheses indicates the Tg of the homopolymer from which each monomer force is also obtained).
  • Tg represents the glass transition temperature of the acrylic polymer
  • Mw represents the mass average molecular weight of the acrylic polymer.
  • surfactant 1 or 2 was added to the mixture of inorganic powder and vehicle at the ratio shown in parts by mass in the table with respect to 100 parts by mass of inorganic powder, and three rolls were added. And adjust the viscosity to a viscosity of 0 Pa ⁇ s at a shear rate of 4 s- 1 to obtain a paste.
  • Surfactant 1 is N-hydroxyethyllaurylamine (a compound having a structure represented by the following formula (1))
  • Surfactant 2 is an alkylolamine salt of a copolymer containing a phosphate group. "Di sperbykl80j (manufactured by BYK Japan KK) was used.
  • the obtained paste was blade-coated with a 10-cm square glass substrate (PD200 manufactured by Asahi Glass Co., Ltd.) with a 400- ⁇ m spacer, dried for 1.5 hours in a dryer at 120 ° C, and dried. It was a membrane.
  • Examples 11 to 11 are examples of the present invention, Examples 12 to 18 are comparative examples, and Examples 19 and 20 are reference examples. In the paste of Example 20, the clear layer separation phenomenon was remarkable.
  • Example 1-120 the blast rate (unit: ⁇ m / and the cumulative number of dry film peelings (unit: pieces), which is an index of dry film adhesion, was examined as described below. The results are shown in the columns of the blast rate and the number of peeled pieces in the table.
  • Blast rate Using a sand blasting machine (model SCM-1ADE-NH-401P) manufactured by Fuji Seisakusho, suction pressure 150 kPa, pumping air pressure 200 kPa, gun moving speed 4. lm Z minute, roller rotation speed 2 The dried film was blasted once under the condition of .5 rpm, the cutting depth was measured, and this was used as a blast straight.
  • the cumulative number of peeled dry films is preferably less than 35 in total. With 35 or more, the dry film may peel off from the dry film even under the sand blasting condition for forming the partition walls, which is usually performed under milder conditions than the above sand blasting condition. More preferably, it is less than 25, even more preferably less than 20.
  • the blast rate is preferably 40 ⁇ mZ times or more.
  • the blast rate is 70 ⁇ mZ or more, the number of strips is preferably less than 30.
  • Example 9 Example 10 Example 11 Example 12 Example 13 Example 14 Example 15 Example 16

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  • Geochemistry & Mineralogy (AREA)
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  • Organic Chemistry (AREA)
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Abstract

Il est prévu une pâte pour diaphragmes comprenant des particules de verre contenant des alcalins, une résine, et un solvant organique, dans laquelle la résine comprend un polymère acrylique contenant des unités dérivées d’un monomère donnant un homopolymère ayant une température de transition vitreuse inférieure ou égale à 40°C et la teneur des unités du monomère donnant un homopolymère ayant une température de transition vitreuse inférieure ou égale à 40°C, dans le polymère acrylique est supérieure ou égale à 5 mol%.
PCT/JP2005/003537 2004-03-05 2005-03-02 Pate pour diaphragme et procede de fabrication de panneau d’affichage plasma WO2005086199A1 (fr)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011213526A (ja) * 2010-03-31 2011-10-27 Nihon Yamamura Glass Co Ltd ガラス組成物

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10241580A (ja) * 1997-02-27 1998-09-11 Toppan Printing Co Ltd プラズマディスプレイパネル及びその製造方法
JPH1192171A (ja) * 1997-09-12 1999-04-06 Okuno Chem Ind Co Ltd プラズマディスプレイパネルの隔壁形成用ガラスペースト組成物
JP2000026558A (ja) * 1998-07-07 2000-01-25 Mitsubishi Rayon Co Ltd 硬化性樹脂組成物及びそれを用いた防水材施工方法並びに樹脂コンクリート施工方法
JP2000319476A (ja) * 1999-05-07 2000-11-21 Toray Ind Inc 感光性ペーストおよびプラズマディスプレイ用部材の製造方法
JP2002214781A (ja) * 2001-11-21 2002-07-31 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物
JP2002326839A (ja) * 2001-02-28 2002-11-12 Nippon Electric Glass Co Ltd プラズマディスプレイパネル用隔壁形成材料及びガラス組成物
JP2003054992A (ja) * 2001-08-09 2003-02-26 Nippon Electric Glass Co Ltd 隔壁形成用ペースト

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10241580A (ja) * 1997-02-27 1998-09-11 Toppan Printing Co Ltd プラズマディスプレイパネル及びその製造方法
JPH1192171A (ja) * 1997-09-12 1999-04-06 Okuno Chem Ind Co Ltd プラズマディスプレイパネルの隔壁形成用ガラスペースト組成物
JP2000026558A (ja) * 1998-07-07 2000-01-25 Mitsubishi Rayon Co Ltd 硬化性樹脂組成物及びそれを用いた防水材施工方法並びに樹脂コンクリート施工方法
JP2000319476A (ja) * 1999-05-07 2000-11-21 Toray Ind Inc 感光性ペーストおよびプラズマディスプレイ用部材の製造方法
JP2002326839A (ja) * 2001-02-28 2002-11-12 Nippon Electric Glass Co Ltd プラズマディスプレイパネル用隔壁形成材料及びガラス組成物
JP2003054992A (ja) * 2001-08-09 2003-02-26 Nippon Electric Glass Co Ltd 隔壁形成用ペースト
JP2002214781A (ja) * 2001-11-21 2002-07-31 Nippon Synthetic Chem Ind Co Ltd:The 感光性樹脂組成物

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011213526A (ja) * 2010-03-31 2011-10-27 Nihon Yamamura Glass Co Ltd ガラス組成物

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