WO2005044931A1 - インクジェット用インク組成物 - Google Patents
インクジェット用インク組成物 Download PDFInfo
- Publication number
- WO2005044931A1 WO2005044931A1 PCT/JP2004/015707 JP2004015707W WO2005044931A1 WO 2005044931 A1 WO2005044931 A1 WO 2005044931A1 JP 2004015707 W JP2004015707 W JP 2004015707W WO 2005044931 A1 WO2005044931 A1 WO 2005044931A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ink composition
- wiring pattern
- substrate
- coupling agent
- group
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 32
- 239000000758 substrate Substances 0.000 claims abstract description 22
- 239000012190 activator Substances 0.000 claims abstract description 17
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 11
- 239000007822 coupling agent Substances 0.000 claims abstract description 4
- 238000007772 electroless plating Methods 0.000 claims description 10
- 229910052751 metal Inorganic materials 0.000 claims description 8
- 239000002184 metal Substances 0.000 claims description 8
- UGJPMSBRYUISGR-UHFFFAOYSA-N 1H-pyrrole silane Chemical compound [SiH4].N1C=CC=C1 UGJPMSBRYUISGR-UHFFFAOYSA-N 0.000 claims description 7
- 238000000576 coating method Methods 0.000 claims description 2
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 abstract description 7
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 12
- 238000007747 plating Methods 0.000 description 10
- 239000000243 solution Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 5
- -1 azole compound Chemical class 0.000 description 5
- 239000007795 chemical reaction product Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 125000002883 imidazolyl group Chemical group 0.000 description 3
- 239000003607 modifier Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 3
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 3
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 2
- KLSJWNVTNUYHDU-UHFFFAOYSA-N Amitrole Chemical group NC1=NC=NN1 KLSJWNVTNUYHDU-UHFFFAOYSA-N 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 2
- 239000004034 viscosity adjusting agent Substances 0.000 description 2
- UGUHFDPGDQDVGX-UHFFFAOYSA-N 1,2,3-thiadiazole Chemical group C1=CSN=N1 UGUHFDPGDQDVGX-UHFFFAOYSA-N 0.000 description 1
- ODIRBFFBCSTPTO-UHFFFAOYSA-N 1,3-selenazole Chemical group C1=C[se]C=N1 ODIRBFFBCSTPTO-UHFFFAOYSA-N 0.000 description 1
- ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 1H-imidazole silane Chemical group [SiH4].N1C=NC=C1 ZDDUSDYMEXVQNJ-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- YTLQFZVCLXFFRK-UHFFFAOYSA-N bendazol Chemical group N=1C2=CC=CC=C2NC=1CC1=CC=CC=C1 YTLQFZVCLXFFRK-UHFFFAOYSA-N 0.000 description 1
- 125000003785 benzimidazolyl group Chemical group N1=C(NC2=C1C=CC=C2)* 0.000 description 1
- 125000003354 benzotriazolyl group Chemical group N1N=NC2=C1C=CC=C2* 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000003453 indazolyl group Chemical group N1N=C(C2=C1C=CC=C2)* 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- ZLTPDFXIESTBQG-UHFFFAOYSA-N isothiazole Chemical group C=1C=NSC=1 ZLTPDFXIESTBQG-UHFFFAOYSA-N 0.000 description 1
- 125000000842 isoxazolyl group Chemical group 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- WCPAKWJPBJAGKN-UHFFFAOYSA-N oxadiazole Chemical group C1=CON=N1 WCPAKWJPBJAGKN-UHFFFAOYSA-N 0.000 description 1
- CQDAMYNQINDRQC-UHFFFAOYSA-N oxatriazole Chemical group C1=NN=NO1 CQDAMYNQINDRQC-UHFFFAOYSA-N 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 150000002940 palladium Chemical class 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 238000007788 roughening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 125000003831 tetrazolyl group Chemical group 0.000 description 1
- YGNGABUJMXJPIJ-UHFFFAOYSA-N thiatriazole Chemical group C1=NN=NS1 YGNGABUJMXJPIJ-UHFFFAOYSA-N 0.000 description 1
- 150000003852 triazoles Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D11/00—Inks
- C09D11/30—Inkjet printing inks
- C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
- B41M5/00—Duplicating or marking methods; Sheet materials for use therein
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
- H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
- H05K3/182—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating characterised by the patterning method
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/09—Use of materials for the conductive, e.g. metallic pattern
- H05K1/092—Dispersed materials, e.g. conductive pastes or inks
- H05K1/097—Inks comprising nanoparticles and specially adapted for being sintered at low temperature
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0239—Coupling agent for particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/01—Tools for processing; Objects used during processing
- H05K2203/0104—Tools for processing; Objects used during processing for patterning or coating
- H05K2203/013—Inkjet printing, e.g. for printing insulating material or resist
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/122—Organic non-polymeric compounds, e.g. oil, wax or thiol
- H05K2203/124—Heterocyclic organic compounds, e.g. azole, furan
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/12—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns
- H05K3/1241—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing
- H05K3/125—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using thick film techniques, e.g. printing techniques to apply the conductive material or similar techniques for applying conductive paste or ink patterns by ink-jet printing or drawing by dispensing by ink-jet printing
Definitions
- the present invention relates to an ink composition suitable for drawing a wiring pattern on a substrate by inkjet.
- a method of forming a fine wiring pattern by discharging an ink in which a metal fine particle adsorbed by a sulfur-containing compound is present in a solvent onto a substrate by an inkjet head is there.
- a method of forming a pattern of an activator for electroless plating on a substrate by ink jet is also known.
- there has been proposed a method of manufacturing a printed wiring board in which an initiator pattern is formed on a substrate by a group of dots of water-based ink ejected by an ink jet printer, and then dried and then electrolessly plated with copper Japanese Patent Laid-Open No. 7-2). No. 45467).
- an ink composed of a palladium salt, a water-soluble organic solvent and water is used as the aqueous ink.
- silane coupling agent to improve the adhesion of the pattern of the electroless metal to the substrate.
- Draw the turn with an ink jet printer using a silane coupling agent solution then immerse the turn in the activating treatment solution, attach the activator to the drawing pattern, and apply nickel electroless plating. That is to do.
- an amino-based silane coupling agent such as ⁇ -aminopropyltriethoxysilane is preferred.
- the present invention provides an inkjet ink composition for forming a wiring pattern uniformly and with excellent adhesion on a substrate, and a method of forming a wiring pattern using the ink composition. The purpose is to provide.
- the inventors of the present invention have conducted intensive studies and have found that, together with an activator of electroless plating in an ink composition, the activator is trapped and used as a coupling agent that adheres to a substrate. It has been found that the inclusion of a substance is effective, leading to the present invention.
- the present invention provides:
- An ink composition for inkjet for drawing a wiring pattern on a substrate comprising an azole silane coupling agent as an activator coupling agent.
- a metal coating method comprising using the ink composition according to claim 1.
- the ink composition of the present invention contains an azole silane coupling agent.
- the azole silane coupling agent can adhere the electroless plating activator to the substrate with good adhesion, and has a function of firmly adhering the film by the subsequent electroless plating.
- the activator may be contained in the ink composition, or may be prepared as a solution separately from the ink composition, and the wiring pattern drawn with the azole-based silane coupling agent ink may be used. May be immersed in the activator solution to adhere.
- the ink composition of the present invention has a viscosity control agent used for an ink-jet ink.
- General additives such as stabilizers and surface tension modifiers can be used as needed.
- the azole silane coupling agent used in the present invention is a compound containing an azole group and an alkoxysilane group.
- Examples of the azole group include an imidazole group, an oxazole group, a thiazole group, a selenazole group, a pyrazole group, an isoxazole group, an isothiazole group, a triazole group, an oxadiazole group, a thiadiazole group, a tetrazole group, an oxatriazole group, and a thiatriazole group.
- Examples thereof include a sol group, a bendazole group, an indazole group, a benzimidazole group, and a benzotriazole group.
- an imidazole group is particularly preferred!
- the alkoxysilane group is a silane having 113 lower alkoxy groups such as a methoxy group and an ethoxy group as long as it has a coupling function contained in a general silane coupling agent. .
- the azole silane coupling agent itself is known, and can be obtained, for example, by reacting an azole compound such as imidazole with an epoxysilane such as ⁇ -glycidoxypropyl trialkoxysilane. This reaction is described in, for example, JP-A-5-186479.
- the azole compound concentration is 0.01 to 100 gZL, preferably 0.05 to 5 gZL. If it is less than 0.0 lgZL, the amount of adhesion to the substrate surface is too small to be uniform. On the other hand, if the amount is larger than 100 g ZL, the amount of adhesion is too large, and it is difficult to dry, and it is uneconomical.
- the activator of the electroless plating used in the present invention includes a noble metal compound, for example, a halide such as platinum, palladium, gold and silver, a hydroxide, a sulfate, a carbonate and a fatty acid salt. Any compound can be used. Particularly, a palladium compound is preferable.
- the concentration is preferably 0.01 to 100 g / L. The same applies to a case where the solution is prepared as a solution different from the ink composition.
- An aqueous palladium chloride solution is added to an aqueous solution of an equimolar reaction product of imidazole and ⁇ -glycidoxypropyltrimethoxysilane to prepare a solution, and then water, a viscosity modifier and a surface tension modifier are added.
- Equimolar reaction product 300mgZL, palladium chloride aqueous solution An ink composition was prepared such that the liquid was 100 mg / L. This ink composition was discharged from an inkjet nozzle, and a wiring circuit was drawn on a substrate. Thereafter, electroless nickel plating (Nikko Metal Plating: 2COM 7N-0) was applied to a thickness of 0.2 m.
- An ink composition was prepared in the same manner as in Example 1 except that an aqueous solution of y-aminopropyltrimethoxysilane was used instead of the equimolar reaction product of imidazole and ⁇ -glycidoxypropyltrimethoxysilane.
- a wiring pattern was formed in the same manner as in Example 1 except that this ink composition was used, and electroless plating was performed.
- the peel strength of the plating film was 0.3 kgfZcm 2 .
- the ink composition has excellent adhesion to a substrate and a uniform force by using an ink-jet method.
- An electroplating activator can be provided, and therefore, a wiring pattern having excellent adhesion can be obtained by electroless plating on the substrate surface without requiring pretreatment such as roughening. .
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Inks, Pencil-Leads, Or Crayons (AREA)
- Chemically Coating (AREA)
- Ink Jet (AREA)
- Ink Jet Recording Methods And Recording Media Thereof (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/576,658 US20070120880A1 (en) | 2003-11-05 | 2004-10-22 | Inkjet ink composition |
JP2005515254A JP4863715B2 (ja) | 2003-11-05 | 2004-10-22 | インクジェット用インク組成物 |
EP20040792849 EP1681321B1 (en) | 2003-11-05 | 2004-10-22 | Inkjet ink composition |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003-375130 | 2003-11-05 | ||
JP2003375130 | 2003-11-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005044931A1 true WO2005044931A1 (ja) | 2005-05-19 |
Family
ID=34567060
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/015707 WO2005044931A1 (ja) | 2003-11-05 | 2004-10-22 | インクジェット用インク組成物 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20070120880A1 (ja) |
EP (1) | EP1681321B1 (ja) |
JP (1) | JP4863715B2 (ja) |
KR (1) | KR100764294B1 (ja) |
TW (1) | TWI289151B (ja) |
WO (1) | WO2005044931A1 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008041823A (ja) * | 2006-08-03 | 2008-02-21 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2008041824A (ja) * | 2006-08-03 | 2008-02-21 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2010168413A (ja) * | 2009-01-20 | 2010-08-05 | Konica Minolta Ij Technologies Inc | インクジェットインクおよび金属パターン形成方法 |
JP2013226784A (ja) * | 2012-03-27 | 2013-11-07 | Toyobo Co Ltd | 積層体とその製造方法及びそれを用いたデバイス構造体の製造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2004108986A1 (ja) * | 2003-06-09 | 2004-12-16 | Nikko Materials Co., Ltd. | 無電解めっき方法及び金属めっき物 |
JP4711415B2 (ja) * | 2004-01-29 | 2011-06-29 | Jx日鉱日石金属株式会社 | 無電解めっき前処理剤、それを用いる無電解めっき方法、及び無電解めっき物 |
JP4859232B2 (ja) * | 2004-09-10 | 2012-01-25 | Jx日鉱日石金属株式会社 | 無電解めっき前処理剤及びフレキシブル基板用銅張り積層体 |
CN106414664B (zh) * | 2014-05-20 | 2019-09-13 | 阿尔法金属公司 | 用于太阳能电池和半导体制作的可喷射的油墨 |
Citations (2)
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JPH10317159A (ja) * | 1997-05-22 | 1998-12-02 | Japan Energy Corp | 印刷回路用銅箔 |
JP3380880B2 (ja) * | 1999-01-14 | 2003-02-24 | 学校法人立命館 | 3次元デバイス構造の形成方法 |
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JPH0499272A (ja) * | 1990-08-09 | 1992-03-31 | Nec Corp | マグネトロンスパッタ装置用強磁性ターゲット交換治具 |
JPH0768256B2 (ja) * | 1991-08-01 | 1995-07-26 | 株式会社ジャパンエナジー | 新規イミダゾールシラン化合物及びその製造方法並びにそれを用いる金属表面処理剤 |
US7045461B2 (en) * | 2000-01-07 | 2006-05-16 | Nikkon Materials Co., Ltd. | Metal plating method, pretreatment agent, and semiconductor wafer and semiconductor device obtained using these |
US6780467B2 (en) * | 2000-04-25 | 2004-08-24 | Nikko Materials Co., Ltd. | Plating pretreatment agent and metal plating method using the same |
JP2002359347A (ja) * | 2001-03-28 | 2002-12-13 | Seiko Epson Corp | 半導体装置及びその製造方法、回路基板並びに電子機器 |
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- 2004-10-22 KR KR20067008602A patent/KR100764294B1/ko active IP Right Grant
- 2004-10-22 EP EP20040792849 patent/EP1681321B1/en not_active Expired - Lifetime
- 2004-10-22 US US10/576,658 patent/US20070120880A1/en not_active Abandoned
- 2004-10-22 WO PCT/JP2004/015707 patent/WO2005044931A1/ja active Application Filing
- 2004-10-22 JP JP2005515254A patent/JP4863715B2/ja not_active Expired - Lifetime
- 2004-10-29 TW TW93132896A patent/TWI289151B/zh active
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008041823A (ja) * | 2006-08-03 | 2008-02-21 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2008041824A (ja) * | 2006-08-03 | 2008-02-21 | Bridgestone Corp | 光透過性電磁波シールド材の製造方法、光透過性電磁波シールド材、およびディスプレイ用フィルタ |
JP2010168413A (ja) * | 2009-01-20 | 2010-08-05 | Konica Minolta Ij Technologies Inc | インクジェットインクおよび金属パターン形成方法 |
JP2013226784A (ja) * | 2012-03-27 | 2013-11-07 | Toyobo Co Ltd | 積層体とその製造方法及びそれを用いたデバイス構造体の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
JP4863715B2 (ja) | 2012-01-25 |
KR20060088899A (ko) | 2006-08-07 |
EP1681321A1 (en) | 2006-07-19 |
KR100764294B1 (ko) | 2007-10-05 |
JPWO2005044931A1 (ja) | 2007-11-29 |
EP1681321A4 (en) | 2006-11-22 |
TW200526745A (en) | 2005-08-16 |
US20070120880A1 (en) | 2007-05-31 |
EP1681321B1 (en) | 2011-08-10 |
TWI289151B (en) | 2007-11-01 |
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