WO2004111312A2 - Kontaktoberflächen für elektrische kontakte und verfahren zur herstellung - Google Patents
Kontaktoberflächen für elektrische kontakte und verfahren zur herstellung Download PDFInfo
- Publication number
- WO2004111312A2 WO2004111312A2 PCT/EP2004/050881 EP2004050881W WO2004111312A2 WO 2004111312 A2 WO2004111312 A2 WO 2004111312A2 EP 2004050881 W EP2004050881 W EP 2004050881W WO 2004111312 A2 WO2004111312 A2 WO 2004111312A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- metal
- alloys
- deposited
- layer
- lubricant
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01R—ELECTRICALLY-CONDUCTIVE CONNECTIONS; STRUCTURAL ASSOCIATIONS OF A PLURALITY OF MUTUALLY-INSULATED ELECTRICAL CONNECTING ELEMENTS; COUPLING DEVICES; CURRENT COLLECTORS
- H01R13/00—Details of coupling devices of the kinds covered by groups H01R12/70 or H01R24/00 - H01R33/00
- H01R13/02—Contact members
- H01R13/03—Contact members characterised by the material, e.g. plating, or coating materials
- H01R13/035—Plated dielectric material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/01—Layered products comprising a layer of metal all layers being exclusively metallic
- B32B15/018—Layered products comprising a layer of metal all layers being exclusively metallic one layer being formed of a noble metal or a noble metal alloy
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C13/00—Alloys based on tin
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C5/00—Alloys based on noble metals
- C22C5/06—Alloys based on silver
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C9/00—Alloys based on copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/48—After-treatment of electroplated surfaces
- C25D5/50—After-treatment of electroplated surfaces by heat-treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/24—Reinforcing the conductive pattern
- H05K3/244—Finish plating of conductors, especially of copper conductors, e.g. for pads or lands
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12479—Porous [e.g., foamed, spongy, cracked, etc.]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/249921—Web or sheet containing structurally defined element or component
- Y10T428/249953—Composite having voids in a component [e.g., porous, cellular, etc.]
Definitions
- the invention relates to improved contact surfaces for electrical contacts and a method for their production according to the preamble of the independent claims.
- substrates made of a copper-based alloy are typically used, which ensures good electrical conductivity.
- the substrate is made of a copper-based alloy with high strength and high stress relaxation resistance.
- a cover layer is often applied to the substrate in order to reduce the insertion forces, wear, oxidation, to ensure the electrical function and to reduce tarnishing of the copper-based substrate at elevated temperature, and to improve the solderability.
- Typical cover layers consist of silver, gold, nickel, palladium / nickel alloys, tin or tin alloys.
- Tin is often used to minimize costs, and these are usually hot-dip tinned or galvanically deposited layers with thicknesses in the range of a few ⁇ m. Tin is characterized by its ductility and its good electrical conductivity. Disadvantages of these tin cover layers are their high susceptibility to fretting corrosion, their plastic deformation, their tendency to adhesion and their low wear resistance.
- the substrate consists of copper-based alloys such as CuSn-Bronze, CuNiSi, etc., which often serve as the base material for electrical connectors. At elevated temperatures, copper can diffuse out of the substrate and settle with it Tin combined to form intermetallic compounds such as Cu 6 Sn 5 and Cu 3 Sn The formation of these intermetallic compounds reduces the amount of unreacted or free tin on the surface, which degrades the electrical, corrosion and other performance characteristics.
- thermal tin has not proven to be a successful solution under all test conditions (e.g. chemical tests or abrasive loads) and therefore only has a negligible market share.
- US-A-5,916,695 discloses electrical contact with a copper-based substrate provided with a tin-based top layer.
- a barrier layer is applied between the substrate and the cover layer.
- This barrier layer contains 20 to 40% by weight of nickel and preferably consists mainly of copper (Cu-based).
- the tin-based cover layer can contain additives such as SiO 2 , Al 2 O 3 , SiC, graphite or MoS 2 as lubricants.
- the contact surfaces according to the invention have the advantage over the prior art that, with good contacting, they require lower insertion forces.
- antioxidants in the lubricant contained offers protection of the surface against corrosion.
- a diffusion barrier layer is additionally deposited on the substrate.
- the essence of the invention is the construction of a cover layer on a copper-based substrate for electrical contacts, which allows lower plug-in forces to be required with consistently good contacting and that good wear resistance is achieved over the entire service life of the electrical contact.
- a contact surface 12 is first produced on the electrical contact, ie on the copper-based substrate 10, by means of galvanic processes, for example high-speed deposition in belt systems.
- a metal for example tin, silver or copper
- placeholder material a further substance that can be easily removed from the metal at a later time
- the layer thickness is generally between approximately 0.5 and approximately 10 ⁇ m.
- the placeholder material can be polystyrene balls, for example. However, latex balls or other plastics are also conceivable that can be easily thermally decomposed or dissolved.
- Polyethylene, base metals, sulfur, phosphorus, sulfur compounds, phosphorus compounds, sisal, corn starch and the like can also be used.
- the detachment of the substance can be carried out by means of thermal and / or solvent treatment, e.g. dissolving the polystyrene balls in toluene.
- Thermal treatment lends itself to substances that decompose easily and pass into the gas phase, treatment with solvents, for example toluene, acetone, cleaning gasoline, alcohols and the like, is preferred if, for example, a thermal load causes a Melt forms, which is difficult to remove, or if it is easier, faster or cheaper in terms of process technology.
- a highly porous skeleton formed by the metal, the so-called metal foam 14 remains. The pores form over the entire layer. It is important to ensure that the percentage of pores is in the range of approx. 20 to approx. 50%, otherwise the percolation of the lubricant is not guaranteed. If problems with mechanical stability should occur, the pore content should be adjusted so that the layer is also mechanically stable.
- this metal foam is soaked with a lubricant.
- This lubricant can be both solid lubricants such as graphite, MoS 2 and the like, as well as liquid lubricants such as oils or greases dissolved in solvents.
- the lubricant Due to the very large capillary action due to the small pores 16 (average pore size in the range of 0.1 to 5 ⁇ m) of the metal foam 14, the lubricant is sucked into the pores 16 and held there. It is also possible to dissolve a solid lubricant in a solvent and then let it soak in. In this way, the metal foam represents a retention volume for the lubricant. It can therefore not be removed from the wear area be driven out and is available over the entire life of the contact.
- the deposited metal can be, for example, copper and Cu alloys, for example with Be or similar metals, Sn and Sn alloys, in particular Sn-Ag, Ag and Ag alloys, and Au and Au alloys. Trade alloys. These metals can be used with or without diffusion barriers such as nickel plating, as well as with or without flash made of precious metal such as Au, Pt, Ru or Pd, these are preferably deposited on the Cu alloys.
- the layer thickness of the deposited layer is generally between about 0.5 and 10 ⁇ m.
- the pore geometry can be either round or multifaceted.
- the average pore size depends on the size distribution of the placeholder material used and on the layer thickness, whereby pore size ⁇ layer thickness applies. Whether the pore geometry is round or extensive depends on the morphology of the placeholder material used. The proportion of pores is between 1 and 80% by volume of the layer formed.
- the contact surfaces according to the invention allow lower insertion forces due to the lubricant present, which is preferably oil or fat, but can also be a solid lubricant in the form of graphite, MoS 2 or the like. Good contacting is guaranteed due to the electrical conductivity of the (solid) lubricant. Antioxidants contained in the lubricant protect the surface from corrosion, high wear resistance and a high number of mating cycles are obtained.
- a great advantage of the contact surfaces according to the invention lies in the fact that the porous metal foam has a retention volume for the lubricant provides. This cannot be driven out of the wear hub and is therefore available over the entire service life of the contact.
- 10 g / l polystyrene balls with a diameter of approximately 1 ⁇ m are electrodeposited together with Ag.
- the polystyrene balls are installed in the Ag layer.
- the balls are then removed with toluene.
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Contacts (AREA)
- Electroplating Methods And Accessories (AREA)
- Manufacture Of Switches (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006516115A JP2006527305A (ja) | 2003-06-13 | 2004-05-21 | 電気接点用の接点表面および形成方法 |
US10/544,718 US20060204741A1 (en) | 2003-06-13 | 2004-05-21 | Contact surfaces for electrical contacts and method for producing the same |
EP04741622A EP1636402A2 (de) | 2003-06-13 | 2004-05-21 | Kontaktoberflächen für elektrische kontakte und verfahren zur herstellung |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10326788.3 | 2003-06-13 | ||
DE2003126788 DE10326788B4 (de) | 2003-06-13 | 2003-06-13 | Kontaktoberflächen für elektrische Kontakte und Verfahren zur Herstellung |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004111312A2 true WO2004111312A2 (de) | 2004-12-23 |
WO2004111312A3 WO2004111312A3 (de) | 2005-06-16 |
Family
ID=33546557
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2004/050881 WO2004111312A2 (de) | 2003-06-13 | 2004-05-21 | Kontaktoberflächen für elektrische kontakte und verfahren zur herstellung |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060204741A1 (de) |
EP (1) | EP1636402A2 (de) |
JP (1) | JP2006527305A (de) |
DE (1) | DE10326788B4 (de) |
WO (1) | WO2004111312A2 (de) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007092144A (ja) * | 2005-09-29 | 2007-04-12 | Dowa Metaltech Kk | 複合めっき材およびその製造方法 |
JP2008106290A (ja) * | 2006-10-23 | 2008-05-08 | Ricoh Co Ltd | 電気接点部材 |
WO2008067293A2 (en) * | 2006-11-30 | 2008-06-05 | Honeywell International Inc. | Abrasive powder coatings and methods for inhibiting tin whisker growth |
WO2008154926A1 (en) * | 2007-06-21 | 2008-12-24 | Danmarks Tekniske Universitet - Dtu | A microporous coating or structure and a process for producing it |
WO2008154925A1 (en) * | 2007-06-21 | 2008-12-24 | Danmarks Tekniske Universitet - Dtu | A microporous layer for lowering friction in metal-forming processes |
WO2009035444A1 (en) * | 2006-11-15 | 2009-03-19 | Massachusetts Institute Of Technology | Methods for tailoring the surface topography of a nanocrystalline or amorphous metal or alloy and articles formed by such methods |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009209453A (ja) * | 2008-02-05 | 2009-09-17 | Kyushu Nogeden:Kk | 錫めっき膜および該錫めっき膜を形成する錫めっき浴 |
FR2962856B1 (fr) * | 2010-07-16 | 2012-08-17 | Amc Holding | Dispositif de connexion electrique a conductance amelioree |
DE102011088793A1 (de) * | 2011-12-16 | 2013-06-20 | Tyco Electronics Amp Gmbh | Elektrischer Steckverbinder mit mikrostrukturiertem Kontaktelement |
JP5851232B2 (ja) * | 2011-12-22 | 2016-02-03 | 日本圧着端子製造株式会社 | 部品 |
JP5851231B2 (ja) * | 2011-12-22 | 2016-02-03 | 日本圧着端子製造株式会社 | 部品 |
KR20130096045A (ko) * | 2012-02-21 | 2013-08-29 | 엘지전자 주식회사 | 다공성 금속 구조체 및 그 제조 방법 |
FR2996348B1 (fr) | 2012-10-03 | 2015-05-15 | Amc Holding | Poudre et pate pour ameliorer la conductance des connexions electriques |
FR2997788B1 (fr) | 2012-11-05 | 2016-01-22 | Amc Etec | Dispositif de sectionnement d'une ligne d'alimentation electrique a courant de haute intensite |
FR3008429A1 (fr) * | 2013-07-12 | 2015-01-16 | Commissariat Energie Atomique | Procede de synthese d'une mousse metallique, mousse metallique, ses utilisations et dispositif comprenant une telle mousse metallique |
DE102014005941A1 (de) * | 2014-04-24 | 2015-11-12 | Te Connectivity Germany Gmbh | Verfahren zum Herstellen eines elektrischen Kontaktelements zur Vermeidung von Zinnwhiskerbildung, und Kontaktelement |
JP6514031B2 (ja) * | 2015-05-19 | 2019-05-15 | 日本圧着端子製造株式会社 | 圧着端子 |
DE102016214693B4 (de) * | 2016-08-08 | 2018-05-09 | Steinbeiss-Forschungszentrum, Material Engineering Center Saarland | Elektrisch leitendes Kontaktelement für einen elektrischen Steckverbinder, elektrischer Steckverbinder, der ein solches Kontaktelement umfasst, und Verfahren zum Einschließen eines Hilfsstoffes unter der Kontaktoberfläche eines solchen Kontaktelements |
JP7082337B2 (ja) * | 2017-03-06 | 2022-06-08 | 帝国イオン株式会社 | 耐摩耗性皮膜及びその形成方法、並びに耐摩耗性部材 |
JP7118496B2 (ja) * | 2018-06-29 | 2022-08-16 | エルジー・ケム・リミテッド | 複合材 |
EP3867948A1 (de) * | 2018-10-15 | 2021-08-25 | Semtech Corporation | Halbleitergehäuse zur bereitstellung von mechanischer isolierung von zusammengesetzten dioden |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US3676308A (en) * | 1969-06-19 | 1972-07-11 | Udylite Corp | Electrolytic codeposition of polyvinylidene and copolymer particles with copper |
JPS57110697A (en) * | 1980-12-26 | 1982-07-09 | Mazda Motor Corp | Formation of abrasion resistant layer on metal surface |
JPS62158899A (ja) * | 1986-01-08 | 1987-07-14 | Toagosei Chem Ind Co Ltd | 複合メツキ用樹脂 |
US5667659A (en) * | 1996-04-04 | 1997-09-16 | Handy & Harman | Low friction solder electrodeposits |
US5916695A (en) * | 1995-12-18 | 1999-06-29 | Olin Corporation | Tin coated electrical connector |
US5967860A (en) * | 1997-05-23 | 1999-10-19 | General Motors Corporation | Electroplated Ag-Ni-C electrical contacts |
Family Cites Families (10)
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CH623851A5 (de) * | 1975-10-04 | 1981-06-30 | Akzo Nv | |
JPS5486041A (en) * | 1977-12-14 | 1979-07-09 | Daido Metal Co Ltd | Bearing material |
US4222828A (en) * | 1978-06-06 | 1980-09-16 | Akzo N.V. | Process for electro-codepositing inorganic particles and a metal on a surface |
US4399339A (en) * | 1981-03-02 | 1983-08-16 | Cherry Electrical Products Corporation | Electrical contact |
JPS6045716B2 (ja) * | 1982-05-21 | 1985-10-11 | 上村工業株式会社 | 複合めつき方法 |
DE3735751A1 (de) * | 1987-10-22 | 1989-05-03 | Plansee Metallwerk | Heteroporoeses formwerkzeug zur herstellung von gussformen aus formsand und verfahren zu dessen herstellung |
US5141702A (en) * | 1990-03-13 | 1992-08-25 | Olin Corporation | Method of making coated electrical connectors |
US5227080A (en) * | 1990-10-10 | 1993-07-13 | Integral Corporation | Intrinsically lubricated material compositions and products thereof |
WO1997018905A1 (en) * | 1995-11-20 | 1997-05-29 | Berg Technology, Inc. | Method of providing corrosion protection |
DE10246062A1 (de) * | 2002-10-02 | 2004-04-15 | Robert Bosch Gmbh | Elektrischer Kontakt |
-
2003
- 2003-06-13 DE DE2003126788 patent/DE10326788B4/de not_active Expired - Fee Related
-
2004
- 2004-05-21 JP JP2006516115A patent/JP2006527305A/ja active Pending
- 2004-05-21 WO PCT/EP2004/050881 patent/WO2004111312A2/de active Application Filing
- 2004-05-21 EP EP04741622A patent/EP1636402A2/de not_active Withdrawn
- 2004-05-21 US US10/544,718 patent/US20060204741A1/en not_active Abandoned
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
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US3676308A (en) * | 1969-06-19 | 1972-07-11 | Udylite Corp | Electrolytic codeposition of polyvinylidene and copolymer particles with copper |
JPS57110697A (en) * | 1980-12-26 | 1982-07-09 | Mazda Motor Corp | Formation of abrasion resistant layer on metal surface |
JPS62158899A (ja) * | 1986-01-08 | 1987-07-14 | Toagosei Chem Ind Co Ltd | 複合メツキ用樹脂 |
US5916695A (en) * | 1995-12-18 | 1999-06-29 | Olin Corporation | Tin coated electrical connector |
US5667659A (en) * | 1996-04-04 | 1997-09-16 | Handy & Harman | Low friction solder electrodeposits |
US5967860A (en) * | 1997-05-23 | 1999-10-19 | General Motors Corporation | Electroplated Ag-Ni-C electrical contacts |
Non-Patent Citations (2)
Title |
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PATENT ABSTRACTS OF JAPAN Bd. 006, Nr. 202 (C-129), 13. Oktober 1982 (1982-10-13) & JP 57 110697 A (TOYO KOGYO KK), 9. Juli 1982 (1982-07-09) * |
PATENT ABSTRACTS OF JAPAN Bd. 011, Nr. 398 (C-466), 25. Dezember 1987 (1987-12-25) & JP 62 158899 A (TOAGOSEI CHEM IND CO LTD), 14. Juli 1987 (1987-07-14) * |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007092144A (ja) * | 2005-09-29 | 2007-04-12 | Dowa Metaltech Kk | 複合めっき材およびその製造方法 |
US7604871B2 (en) | 2006-06-07 | 2009-10-20 | Honeywell International Inc. | Electrical components including abrasive powder coatings for inhibiting tin whisker growth |
US8329248B2 (en) | 2006-06-07 | 2012-12-11 | Honeywell International Inc. | Methods for inhibiting tin whisker growth using abrasive powder coatings |
JP2008106290A (ja) * | 2006-10-23 | 2008-05-08 | Ricoh Co Ltd | 電気接点部材 |
WO2009035444A1 (en) * | 2006-11-15 | 2009-03-19 | Massachusetts Institute Of Technology | Methods for tailoring the surface topography of a nanocrystalline or amorphous metal or alloy and articles formed by such methods |
WO2008067293A2 (en) * | 2006-11-30 | 2008-06-05 | Honeywell International Inc. | Abrasive powder coatings and methods for inhibiting tin whisker growth |
WO2008067293A3 (en) * | 2006-11-30 | 2008-07-24 | Honeywell Int Inc | Abrasive powder coatings and methods for inhibiting tin whisker growth |
WO2008154926A1 (en) * | 2007-06-21 | 2008-12-24 | Danmarks Tekniske Universitet - Dtu | A microporous coating or structure and a process for producing it |
WO2008154925A1 (en) * | 2007-06-21 | 2008-12-24 | Danmarks Tekniske Universitet - Dtu | A microporous layer for lowering friction in metal-forming processes |
EP2006420A1 (de) * | 2007-06-22 | 2008-12-24 | Danmarks Tekniske Universitet - DTU | Mikroporöse Schicht zur Minderung der Reibung bei Metallverformungsprozessen |
Also Published As
Publication number | Publication date |
---|---|
DE10326788B4 (de) | 2005-05-25 |
EP1636402A2 (de) | 2006-03-22 |
WO2004111312A3 (de) | 2005-06-16 |
DE10326788A1 (de) | 2005-02-10 |
JP2006527305A (ja) | 2006-11-30 |
US20060204741A1 (en) | 2006-09-14 |
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