WO2004104654A1 - 偏光解消素子、照明光学装置、露光装置および露光方法 - Google Patents
偏光解消素子、照明光学装置、露光装置および露光方法 Download PDFInfo
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- WO2004104654A1 WO2004104654A1 PCT/JP2004/006821 JP2004006821W WO2004104654A1 WO 2004104654 A1 WO2004104654 A1 WO 2004104654A1 JP 2004006821 W JP2004006821 W JP 2004006821W WO 2004104654 A1 WO2004104654 A1 WO 2004104654A1
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- prism
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- deflection
- deflection prism
- polarization
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70566—Polarisation control
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
- G02B27/286—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising for controlling or changing the state of polarisation, e.g. transforming one polarisation state into another
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
Definitions
- the present invention relates to a depolarization element, an illumination optical device, an exposure apparatus, and an exposure method, and more particularly to a method for manufacturing a microdevice such as a semiconductor device, an imaging device, a liquid crystal display device, and a thin-film magnetic head by a lithography process.
- the present invention relates to a depolarizing element suitable for an exposure apparatus to be used.
- a light beam emitted from a light source forms a secondary light source as a substantial surface light source including a large number of optical light sources.
- the light flux from the secondary light source is restricted via an aperture stop arranged near the rear focal plane of the fly-eye lens, and then enters the condenser lens.
- the light beam condensed by the condenser lens illuminates the mask on which a predetermined pattern is formed in a superimposed manner.
- the light transmitted through the mask pattern forms an image on the wafer via the projection optical system.
- the mask pattern is projected and exposed (transferred) on the wafer. Since the pattern formed on the mask is highly integrated, it is essential to obtain a uniform illuminance distribution on the wafer in order to accurately transfer this fine pattern onto the wafer.
- linearly polarized light supplied from this type of light source is converted into non-polarized light by a depolarizing element, and the mask is illuminated with non-polarized light.
- the polarization direction of the incident light is It is necessary to set the crystal optic axis (fast axis or slow axis) of the depolarizing element at an angle of exactly 45 degrees with respect to (long axis direction of elliptically polarized light). In other words, if the polarization direction of the incident light is different from the assumed direction for some reason, or if the direction of the crystal optic axis of the depolarizing element deviates for the intended direction for some reason, a sufficient depolarizing effect will be obtained. I can't get it.
- the present invention has been made in view of the above-mentioned problem, and provides a depolarizing element that can surely convert incident polarized light to non-polarized light without depending on the polarization direction of incident polarized light.
- the purpose is to: It is another object of the present invention to provide an illumination optical device that can reliably illuminate an irradiated surface with unpolarized light without depending on the polarization direction of light from a light source, using the depolarizing element of the present invention. And Another object of the present invention is to provide an exposure apparatus and an exposure method capable of reliably illuminating a mask with non-polarized light using the illumination optical apparatus of the present invention and performing good exposure under appropriate illumination conditions. Aim.
- a depolarizing element for converting incident light having a degree of polarization into substantially unpolarized light.
- At least two deflection prisms arranged along the optical axis and formed of a birefringent crystal material
- the crystal optical axes of the at least two deflection prisms are set so as to face directions different from each other when viewed in the direction of the optical axis,
- a depolarizing element wherein the apical directions of the at least two deflection prisms are set so as to be different from each other and not to be opposite to each other when viewed from the optical axis direction.
- the at least two deflection prisms have only two deflection prisms, and the crystal optical axes of the two deflection prisms are viewed from the optical axis direction. Are set to form a 45-degree angle with each other.
- the at least two deflection prisms are formed of quartz, magnesium fluoride, or calcite.
- the at least two deflection prisms include a first deflection prism and a second deflection prism, and a first correction deflection for correcting the deflection effect of the first deflection prism.
- the apparatus further includes an angular prism and a second correction deflection prism for correcting a deflection effect by the second deflection prism.
- the first correction deflection prism and the second correction deflection prism are formed of a birefringent material
- the depolarizing element includes the first correction deflection prism and the first correction deflection prism in order from the incident side.
- the first deflection prism and the second deflection prism are arranged adjacent to each other.
- the apex angles of the two deflection prisms are set to be substantially orthogonal.
- a depolarizing element for converting incident light having a degree of polarization into substantially unpolarized light
- the first unit converts linearly polarized light having a plane of polarization in a first direction into non-polarized light, and the second unit polarizes in a second direction.
- the linearly polarized light having a light surface is converted into unpolarized light.
- a depolarizing element for converting incident light having a degree of polarization into substantially unpolarized light
- a depolarizing element comprising means for constantly converting the incident light into the substantially non-polarized light regardless of a change in the polarization state of the incident light. Offer.
- an illumination optical device including a light source that supplies light having a degree of polarization, and a light guide optical system that irradiates light from the light source to an irradiated surface.
- the illumination optical device is characterized in that the light guide optical system has a depolarizing element of the first mode, the second mode or the third mode.
- the means for constantly converting the incident light into the substantially unpolarized light converts the incident light in the first polarization state into non-polarized light.
- a second unit for converting incident light in a second polarization state, which cannot be converted into unpolarized light by the first unit, into non-polarized light is preferred.
- the first unit preferably includes at least one deflection prism formed of a birefringent crystal material
- the second unit includes It is preferable to include at least one deflection prism formed of a birefringent crystal material.
- each of the deflection prisms constituting the depolarizing element has a wedge angle of each deflection prism of ⁇ , and each deflection prism of each deflection prism as viewed from the optical axis direction.
- the high refractive index and the low refractive index of the two refractive indices are respectively nl and ⁇ 2
- the cross-sectional size of the light beam incident on the depolarizing element is L
- the wavelength of the light incident on the depolarizing element is L. Satisfies the condition L a (nl— ⁇ 2) ⁇ .
- an optical integrator is further provided in an optical path between the depolarizing element and the irradiated surface.
- the illumination optical device for illuminating a mask disposed on the surface to be irradiated, wherein a pattern formed on the mask is exposed on a photosensitive substrate.
- An exposure apparatus is provided.
- a mask disposed on the surface to be irradiated is illuminated using the illumination optical device of the fourth aspect, and a pattern formed on the mask is exposed on a photosensitive substrate.
- An exposure method characterized by this is provided.
- a depolarizing element is formed using two deflector prisms having birefringence, and the crystal optical axes of the two deflector prisms are set so as to face different directions.
- the apical angle directions are set so as to be different from each other and not opposite to each other.
- the illumination optical device using the depolarizing element of the present invention it is possible to reliably illuminate the irradiated surface with unpolarized light without depending on the polarization direction of the light from the light source. Therefore, in the exposure apparatus and the exposure method using the illumination optical device of the present invention, the mask can be reliably illuminated with light in a non-polarized state, and good exposure can be performed under appropriate illumination conditions. Good microdevices can be manufactured by good exposure.
- FIG. 1 is a view schematically showing a configuration of an exposure apparatus that embodies an embodiment of the present invention.
- FIG. 2 is a view showing a state in which a polarization state measuring instrument is detachably attached to a wafer stage.
- FIG. 3 is a diagram schematically showing an internal configuration of a polarization state measuring device of FIG. 2.
- FIG. 4 is a diagram schematically showing an internal configuration of the depolarization element of the present embodiment shown in FIG. 1.
- FIG. 5 is a diagram schematically showing a configuration of each deflection prism constituting the depolarization element of the present embodiment.
- FIG. 6 is a diagram for explaining the function and effect of the depolarization element of the present embodiment, and is a diagram showing a change in a status parameter of emitted light.
- FIG. 7 is a first diagram illustrating the operation of the depolarizing element of the present embodiment using a status parameter and a Poincare sphere.
- FIG. 8 is a second diagram illustrating the operation of the depolarization element according to the present embodiment using the status parameter and the Poincare sphere.
- FIG. 9 is a flowchart of a method for obtaining a semiconductor device as a micro device.
- FIG. 10 is a flowchart of a method for obtaining a liquid crystal display element as a micro device.
- FIG. 11 is a diagram schematically showing a configuration of a conventional depolarizing element.
- FIG. 14 is a first diagram illustrating the operation of the conventional depolarizing element shown in FIG. 11 using a status parameter and a Poincare sphere.
- FIG. 15 is a diagram illustrating inconveniences of the conventional depolarizing element shown in FIG. 11 using a status parameter and a Poincare sphere.
- FIG. 16 is a drawing schematically showing a configuration of a depolarizing element that is useful in a modification of the present embodiment.
- FIG. 17 is a diagram schematically showing the operation and effect of a depolarizing element according to a modification of the present embodiment.
- FIG. 11 is a diagram schematically showing a configuration of a conventional depolarizing element.
- the conventional depolarizing element includes a first deflection prism (wedge plate) 101 and a second deflection prism 102 in order from the light incident side.
- the first deflection prism 101 is made of a birefringent material such as quartz, and has a different thickness depending on the light passing position, and thus functions as a phase shifter having a different phase shift amount depending on the passing position.
- the first deflection prism 102 is made of a non-birefringent material such as quartz glass, and functions as a correction plate for returning a light beam bent by the deflection effect of the first deflection prism 101.
- the deflection prism made of a birefringent material has slightly different refraction angles between ordinary light and extraordinary light.
- the polarization state of the incident polarized light changes.
- the description will be made by approximating that the first deflection prism 101 is a phase shifter having a different phase shift amount depending on the passing position as described above. Further, in order to explain the objects and effects of the present invention, a description based on such approximation is sufficient.
- FIG. 11B shows the direction of the crystal optical axis and the polarization direction of incident light when the first deflection prism 101 is viewed from the optical axis direction.
- the vertical direction is defined as the S1 axis of the status parameter
- the ⁇ 45 ° and + 45 ° directions are defined as the S2 axis of the status parameter.
- the polarization direction of the incident light is the direction of the major axis of the elliptical polarization, and refers to the vibration direction of the light in the linear polarization.
- the angle of the first deflection prism 101 with respect to the vertical axis of the crystal optical axis direction 103 is represented by ⁇
- the angle of the polarization direction 104 of the incident light with respect to the vertical axis is represented by ⁇ .
- the polarization state of the emitted light can be regarded as the average of light that has undergone different polarization state changes depending on the passing position. Therefore, the status parameter of the emitted light is the average of the status parameters of the light that has undergone different polarization state changes depending on the passing position.
- nl refractive index
- n2 low refractive index
- n2 a wedge angle
- FIG. 12 shows how the status parameter of the emitted light depends on the angle ⁇ of the polarization direction of the incident light when the angle ⁇ in the crystal optical axis direction of the first deflection prism is set to 45 degrees. It is a figure which shows whether it changes.
- the horizontal axis represents the angle ⁇ of the polarization direction of the linearly polarized light incident on the first deflection prism 101
- the vertical axis represents the value of the status parameter of the emitted light.
- FIG. 13 shows that when the angle ⁇ of the first deflection prism in the direction of the crystal optical axis is set to ⁇ 22.5 degrees, the status parameter of the emitted light depends on the angle ⁇ of the polarization direction of the incident light. It is a figure showing how it changes. In this case, referring to FIG. 13, as the polarization direction of the incident light changes, both S 1 and S2 change, and the angles of the polarization directions of the incident light ⁇ 2.5 °, 112.5 °, 202. At 5 degrees and 292.5 degrees, it can be seen that the incident polarized light is completely depolarized.
- the angle of the crystal optic axis direction to the polarization direction of the incident light must be exactly 45 degrees + 90 degrees.
- Degree ⁇ ⁇ ( ⁇ is an integer: 1, 0, +1, +2 ⁇ ⁇ ⁇ ⁇ ) must be set.
- FIG. 14 is a diagram illustrating the operation of the conventional depolarizing element shown in FIG. 11 using a status parameter and a Poincare sphere.
- FIG. 15 is a diagram for explaining the inconvenience of the conventional depolarizing element shown in FIG. 11 using a status parameter and a Poincare sphere.
- the Stokes parameter and Poincare sphere are described in detail in Masao Tsuruta, Applied Optics II, Baifukan.
- the incident polarized light is horizontal linearly polarized light
- the linearly polarized light is represented by a point 106a on the Poincare sphere.
- the direction of the crystal optic axis of the first deflection prism 101 is set to form an angle of 45 degrees with the polarization direction of the incident light.
- the phase shift action of the first deflection prism 101 is expressed by rotation about the S2 axis in the Poincare sphere.
- the Poincare sphere is easy to understand if you consider that the equatorial circle corresponds to 180 degrees. In this way, the incident polarized light receives a different amount of phase shift depending on the passing position of the first deflection prism 101, so that the polarization state of the emitted light is distributed on a line indicated by reference numeral 106b.
- the incident polarized light is represented by a point 107a on the Poincare sphere.
- the polarization direction of the incident light represented by the point 107a is shifted from the angle of 45 degrees with respect to the S2 axis, so that the depolarization effect should be insufficient.
- the incident polarized light represented by the point 107a is subjected to the phase shift action of the first deflection prism 101 (that is, rotation about the S2 axis), and the polarization state of the emitted light is indicated by the reference numeral. It will be distributed on the line indicated by 107b.
- the crystal optic axis (fast axis or slow axis) of the depolarizing element is accurate with respect to the polarization direction of the incident light (the long axis direction of the elliptically polarized light).
- Angle must be set to 45 degrees.
- a depolarizing element is formed using two deflector prisms having birefringence, and the crystal optical axes of the two deflector prisms are different from each other when viewed from the optical axis direction. It is set to face the direction.
- the apical directions of the two deflection prisms are set to be different from each other when viewed from the optical axis direction and not to be opposite to each other.
- the action of the two deflection prisms described above can reliably convert incident polarized light into non-polarized light without depending on the polarization direction of the incident polarized light.
- the irradiated surface can be reliably illuminated with non-polarized light without depending on the polarization direction of the light from the light source. Therefore, in the exposure apparatus and the exposure method using the illumination optical device of the present invention, the mask can be reliably illuminated with light in a non-polarized state, and good exposure can be performed under appropriate illumination conditions. Good microdevices can be manufactured by good exposure.
- FIG. 1 is a diagram schematically showing a configuration of an exposure apparatus that is useful in an embodiment of the present invention.
- Figure 2 shows how the polarization state measuring instrument is detachably attached to the wafer stage.
- FIG. 3 is a diagram schematically showing an internal configuration of the polarization state measuring device of FIG.
- the exposure apparatus of the present embodiment includes a light source 1 for supplying exposure light (illumination light).
- a light source 1 for supplying exposure light (illumination light).
- the light source 1 use a KrF excimer laser light source that supplies light of 248 nm wavelength, an ArF excimer laser light source that supplies light of 193 nm wavelength, or an F laser light source that supplies light of 157 nm wavelength, for example.
- a substantially parallel light beam having a predetermined degree of polarization emitted from the light source 1 is shaped into a light beam having a predetermined rectangular cross section via the beam transmitting system 2 and then enters the depolarizing element 3.
- the degree of polarization V is represented by the following equation (a).
- SO is the total intensity
- S1 is the horizontal linear polarization intensity minus the vertical linear polarization intensity
- S2 is the 45-degree linear polarization intensity minus the 135-degree linear polarization intensity
- S3 is clockwise circular polarization intensity minus counterclockwise
- the circularly polarized light intensity is expressed respectively.
- V (Sl 2 + S2 2 + S3 2 ) 1/2 / SO (a)
- the beam transmitting system 2 converts the incident light beam into a light beam having a cross section of an appropriate size and shape, guides the light beam to the depolarization element 3, and changes the position of the light beam incident on the subsequent depolarization element 3. And a function of actively correcting angle fluctuation.
- the depolarization element 3 has a function of converting incident light having a degree of polarization (in this embodiment, for example, linearly polarized light) into substantially unpolarized light. The detailed configuration and operation of the depolarizing element 3 will be described later.
- the substantially parallel light beam converted to a non-polarized state via the depolarizing element 3 enters the microlens array (fly eye lens) 4.
- the microlens array 4 is an optical element composed of a large number of microlenses having a positive refractive power arranged vertically and horizontally and densely.
- the microlens array 4 is formed by forming a microlens group by etching a parallel plane plate. Is done.
- each micro lens constituting the micro lens array is smaller than each lens element constituting the fly eye lens.
- the microlens array Unlike a fly-eye lens composed of lens elements that are isolated from each other, the microlens array has a large number of microlenses (microrefractive surfaces) formed integrally without being isolated from each other. However, lens elements having a positive refractive power are arranged vertically and horizontally. In this respect, the microlens array is the same wavefront division type optical integrator as the fly-eye lens. Note that, instead of the microlens array 4, an optical integrator such as a diffractive optical element or a prismatic rod-type integrator can be used.
- the light beam incident on the microlens array 4 is two-dimensionally divided by a large number of minute lenses, and a light source is formed on the rear focal plane of each minute lens on which the light beam has entered.
- a substantial surface light source hereinafter, referred to as “secondary light source” including a large number of light sources is formed.
- the luminous flux from the secondary light source formed on the rear focal plane of the microlens array 4 is restricted by an aperture stop (not shown) arranged as necessary, and is condensed via a beam splitter 7a. After receiving the light condensing action of the optical system 5, the mask M on which the predetermined pattern is formed is illuminated in a superimposed manner.
- the light flux transmitted through the pattern of the mask M forms an image of the mask pattern on the photosensitive substrate wafer W via the projection optical system PL.
- the pattern of the mask M are sequentially exposed.
- a beam splitter 7a having the form of a non-coated parallel plane plate (ie, elementary glass) made of, for example, quartz glass is used to emit light from the secondary light source formed by the microlens array 4.
- a part of the light beam is branched and guided to a photoelectric detector 7b as an integrator sensor. Then, based on the output signal from the photoelectric detector 7b, a configuration for controlling the exposure amount on the wafer W is provided.
- the force using one optical integrator ⁇ two optical integrators as disclosed in, for example, US Patent No. 4,939,630 are arranged in series.
- the depolarizing element 3 should be arranged on the light source side of the optical integrator closest to the light source.
- the depolarizing element 3 is applied to an illumination optical device in which a diffractive optical element and an optical integrator are arranged in series as disclosed in US Pat. No. 6,563,567, What is necessary is just to arrange the depolarizing element 3 on the light source side of the diffractive optical element on the light source side. In this embodiment, as shown in FIG.
- a polarization state measuring device 6 for measuring the polarization state of illumination light (exposure light) with respect to the wafer W is provided on a wafer stage WS for holding the wafer W. It is attached detachably.
- the polarization state measuring device 6 includes a pinhole member 60 which can be positioned at or near the wafer W. When the polarization state measuring device 6 is used, the wafer W is retracted from the optical path.
- the light passing through the pinhole 60a of the pinhole member 60 becomes a substantially parallel light flux through the collimating lens 61, and is reflected by the reflecting mirror 62, and then serves as a phase shifter; an IZ4 plate 63 and a polarizer After passing through the polarizing beam splitter 64, the light reaches the detection surface 65a of the two-dimensional CCD 65.
- the ⁇ 4 plate 63 and the polarization beam splitter 64 are each configured to be rotatable about the optical axis.
- the polarization state measuring device 6 detects a change in the light intensity distribution on the detection surface 65a while rotating the ⁇ / 4 plate 63 around the optical axis, and from this detection result, the rotation W
- the polarization state of the illuminating light (and, consequently, the illuminating light for the mask M) can be measured.
- the rotation retarder method is described in detail in, for example, Tsuruta, "Light Pencil-Applied Optics for Optical Engineers", New Technology Communications Inc., and the like.
- the polarization state of the illumination light at a plurality of positions on the wafer surface is measured while the pinhole member 60 (and, consequently, the pinhole 60a) is moved two-dimensionally along the wafer surface.
- the polarization state measuring device 6 detects a change in the light intensity distribution on the two-dimensional detection surface 65a, it is necessary to measure the distribution of the polarization state in the pupil of the illumination light based on the detected distribution information. Can be.
- the polarization state of light may change due to the polarization characteristics of the reflecting mirror 62.
- the measurement result of the polarization state measuring device 6 is corrected by a required calculation based on the influence of the polarization characteristics of the reflecting mirror 62 on the polarization state, and the illumination light is corrected. Can be accurately measured.
- FIG. 4 is a diagram schematically showing an internal configuration of the depolarizing element of the present embodiment shown in FIG.
- FIG. 5 shows the configuration of each deflection prism constituting the depolarizing element of the present embodiment.
- FIG. 6 is a diagram for explaining the operation and effect of the depolarizing element of the present embodiment, and is a diagram showing a change in the status parameter of the emitted light.
- the depolarizing element 3 includes, in order from the light source side, a first deflection prism 31 made of quartz, a second deflection prism 32 also made of quartz, and quartz glass. And the third deflector prism 33 formed by the above.
- the direction 31a of the crystal optic axis is set to the vertical direction in the figure, and the apex angle direction 31b is inverted from the upward direction in the figure. It is set to rotate 45 degrees clockwise.
- the direction 32a of the crystal optic axis is set at 45 degrees to the vertical direction in the figure. (As if the direction 31a of the crystal optic axis of the first crystal prism 31 was rotated 45 degrees clockwise about the optical axis AX), and its apical direction 32b was 45 degrees clockwise from upward in the figure. It is set to the rotated direction. Further, referring to FIG. 5C, in the quartz prism 33 as the third deflection prism, the apex angle direction 33b is set downward in the figure.
- the crystal optical axis 32a of the prism 32 is set to form an angle of 45 degrees with each other when viewed from the optical axis AX direction.
- the apex angle direction 31b of the first crystal prism 31 and the apex angle direction 32b of the second crystal prism 32 are set to be orthogonal to each other when viewed from the optical axis AX direction.
- the apex angle of the first quartz prism 31 is adjusted so that the bending of the light beam due to the eccentric action of the first quartz prism 31 and the second quartz prism 32 is restored by the eccentric action of the quartz prism 33.
- the apex angle direction 33b of the quartz prism 33 is set with respect to the apex angle direction 32b of the 31b and the second quartz prism 32. That is, the quartz prism 33 constitutes a correction deflection prism for compensating the combined deflection effect of the first crystal prism 31 and the second crystal prism 32.
- the quartz prisms 31 and 32 have birefringence, they have two different refractive indices nl and n2 (nl> n2). Therefore, the first crystal prism 31 and the second crystal prism
- the declination of the light beam due to rhythm 32 is calculated assuming that the refractive index is (nl + n2) / 2, and the declination of the quartz prism 33 is determined so as to cancel the calculated declination of the light beam. ,.
- FIG. 7 is a first diagram illustrating the operation of the depolarizing element according to the present embodiment using the status parameters and the Poincare sphere.
- FIG. 8 is a second diagram illustrating the operation of the depolarizing element of the present embodiment using the status parameters and the Poincare sphere.
- FIGS. 7 and 8 it is possible to reliably convert incident polarized light to non-polarized light without depending on the polarization direction (polarization state) of the incident polarized light, and to achieve almost complete depolarization effect. Is obtained.
- the polarized light incident on the depolarizing element 3 is represented by an appropriate point 50a on the Poincare sphere.
- the polarized light incident on the depolarizing element 3 first enters the first quartz prism 31, and the crystal optic axis direction 31a of the first quartz prism 31 is in the vertical direction (in the vertical direction in FIG. 5). 0 degree direction).
- the phase shift action of the first quartz prism 31 is a rotation around the S1 axis, and the polarized light emitted from the first quartz prism 31 is distributed on the line indicated by reference numeral 50b.
- the emitted polarized light from the first quartz prism 31 represented by the line 50b enters the second quartz prism 32, and its crystal optic axis direction 32a is oriented at 45 ° to the vertical direction ( (The direction is 45 degrees from the vertical direction in Fig. 5.)
- the phase shift action of the second quartz prism 32 is a rotation around the S2 axis, and as shown in FIG. 8, the exit polarized light from the second quartz prism 32 is distributed on a band-shaped curved surface indicated by reference numeral 50c. Will be.
- the polarization state of the illuminating light on the wafer W (and thus the illuminating light on the mask M) is measured at any time using the above-mentioned polarization state measuring device 6, and almost completely by the action of the depolarizing element 3. It can be confirmed that an excellent depolarization effect is obtained. And If the desired depolarizing effect is not obtained, the optical adjustment of the depolarizing element 3 must be performed so as to reliably convert the incident polarized light into unpolarized light without depending on the polarization direction of the incident polarized light. it can.
- the depolarizing element 3 since the almost complete depolarization effect is obtained by the depolarizing element 3, it is assumed that the polarization state of the light beam incident on the depolarizing element 3 fluctuates with time. Also, the polarization state of the light beam incident on the beam splitter 7a that splits the light beam to the photoelectric detector 7b as an integrator sensor is kept constant. Therefore, even if the reflection characteristic of the beam splitter 7a changes depending on the state of the incident polarized light, a constant amount of light can always be guided to the photoelectric detector 7b. This allows accurate exposure control.
- the crystal optical axis direction 31a of the first crystal prism 31 is set to a direction of 0 ° with respect to the vertical direction
- the crystal optical axis direction 32a of the second crystal prism 32 is set in the vertical direction.
- the direction is set to 45 degrees.
- the crystal optical axis direction 31a of the first quartz prism 31 and the crystal optical axis direction 32a of the second quartz prism 32 are at an angle of 45 degrees to each other when viewed from the optical axis AX direction force. It is clear that almost perfect depolarization effect can be obtained regardless of the polarization state of the incident polarized light if the axis of rotation acts on the Poincare sphere at an angle of 90 degrees.
- the apex angle direction 31b of the first quartz prism 31 and the apex angle direction 32b of the second quartz prism 32 are set to be orthogonal to each other when viewed from the optical axis AX direction. I have. However, the apex angle direction 31b of the first quartz prism 31 and the apex angle direction 32b of the second quartz prism 32 are different from each other and opposite to each other when viewed from the optical axis AX direction. If it is set not to be good.
- the first quartz prism 31 It is preferable that the vertical angle direction 31b and the vertical angle direction 32b of the second quartz prism 32 are set to be orthogonal to each other when viewed from the optical axis AX direction. Note that the first crystal If the apex angle direction 31b of the rhythm 31 and the apex angle direction 32b of the second quartz prism 32 are opposite to each other (and the same direction), the degree of polarization of the incident polarized light can be reduced. However, almost complete depolarization effect cannot be obtained.
- the crystal optical axis directions (31a, 32a) of the two quartz prisms (31, 32) make an angle of 45 degrees with each other when viewed from the optical axis AX direction.
- the depolarizing element is configured using, for example, three or more quartz prisms
- the angle is not limited to 45 degrees. That is, for example, when a depolarizing element is configured using three quartz prisms, the center of gravity of the curved surface on the Poincare sphere representing the polarization state of the emitted light is the center of the Poincare sphere as a result of the phase shift effect of the three quartz prisms. If the direction of the crystal optical axis is set so as to obtain, it is possible to obtain a substantially complete depolarization effect.
- the quartz prism 33 as a correction deflection prism is arranged on the mask side of the two quartz prisms (31, 32).
- the quartz prism 33 can be arranged closest to the light source, or the quartz prism 33 can be arranged in the optical path between the two quartz prisms (31, 32). .
- the two deflection prisms (31, 32) having birefringence are formed of water crystals.
- the two deflection prisms can be formed using a birefringent crystal material such as, but not limited to, magnesium fluoride or calcite.
- a birefringent material obtained by applying an external stress to a non-birefringent material can be used.
- the depolarizing element 3 is arranged in the optical path between the beam transmitting system 2 and the microlens array 4.
- the depolarizing element 3 can also be arranged in the optical path between the system 5 and the mask M or in any other suitable optical path.
- the optical integrator is arranged in the optical path between the depolarizing element 3 and the mask M, the effective diameter (outer diameter) of the depolarizing element 3 can be reduced.
- the depolarizing element 3 is configured to be detachable from the illumination optical path. In this case, if necessary, set the depolarizing element 3 in the illumination light path. By illuminating the mask M with non-polarized light, the mask M can be illuminated with linearly polarized light by retracting the depolarizing element 3 from the illumination optical path. Will be possible.
- the crystal optical axis of the first crystal prism 31 and the crystal optical axis of the second crystal prism 32 are different from each other when viewed in the optical axis AX direction.
- the angle is set at an angle of degrees
- the vertex angle direction of the first crystal prism 31 and the vertex angle direction of the second crystal prism 32 are set so as to be orthogonal to each other when viewed from the optical axis AX direction. That is, as an example, as shown in FIG. 5 (a), the first quartz prism 31 was manufactured so that the direction 31a of the crystal optic axis and the apex angle direction 31b form an angle of 45 degrees, and FIG. As shown in (b), there is a force S required to manufacture the second quartz prism 32 so that the direction 32a of the crystal optical axis coincides with the apex angle direction 32b.
- the first crystal prism 31 and the apex angle direction of the second crystal prism 32 are set to be orthogonal to obtain an accurate declination compensation effect, the first crystal prism 31
- the crystal optic axis and the crystal optic axis of the second quartz prism 32 do not accurately form an angle of 45 degrees, and a desired depolarization effect cannot be obtained.
- a depolarizing element that can achieve a stimulating effect will be described.
- FIG. 16 is a diagram schematically illustrating a configuration of a depolarizing element that is useful in a modification of the present embodiment.
- FIG. 17 schematically shows the operation and effect of the depolarizing element according to the modification of the present embodiment.
- the depolarizing element 3 ′ working in the modification includes, in order from the light source side (left side in FIG. 16), a first correction deflection prism 34, a first deflection prism 35, and a second deflection angle 35. It is composed of a prism 36 and a second correction deflection prism 37.
- first deflection prism 35 and the second deflection prism 36 are deflection prisms formed of quartz, and the first correction deflection prism 34 and the second correction deflection prism 37 are formed of fluorite or quartz glass.
- the direction 35a of the crystal optical axis is set in the z direction as shown in FIG. 17 (a), and the apex angle as shown in FIG. 16 (b). The direction is also set to + Z direction.
- the direction 36a of the crystal optic axis is at 45 degrees to the z direction as shown in FIG.
- the direction 35a of the crystal optical axis is set to be rotated clockwise by 45 degrees about the optical axis AX), and the vertical angle is set to the + y direction as shown in FIG. 16 (a).
- the apex angle direction is in the z direction, that is, the first The directions of the apex angles of the crystal prism 35 are set to be opposite to each other.
- the apex angle direction is in the y direction, that is, the second correction prism.
- the directions of the apex angles of the quartz prism 36 are set to be opposite to each other.
- the two deflector prisms formed of quartz, which is a birefringent crystal material are used. That is, the crystal optical axis of the first crystal prism 35 and the crystal optical axis of the second crystal prism 36 are set so as to form an angle of 45 degrees with each other when viewed from the optical axis AX direction.
- the vertex angle direction of the first crystal prism 31 and the vertex angle direction of the second crystal prism 32 are set to be orthogonal to each other when viewed from the optical axis AX direction.
- the depolarizing element 3 ′ that works in the modification, but works in the modified example, is different from the case of the depolarizing element 3 in the above-described embodiment.
- the bend is canceled out by the deflective action of the first fluorite prism and the first quartz prism, and the bend of the light beam by the deflector action of the second quartz prism is reduced to the second fluorite prism (or the second quartz prism).
- the first quartz prism 35 and the first fluorite prism (or first quartz prism) 34 constitute a first unit (34, 35)
- the second fluorite prism and the second quartz prism 37 constitute a second unit (36, 37).
- one quartz prism 33 as a correction deflection prism is replaced with two deflection prisms, the first crystal prism 31 and the second crystal prism 32. And compensating for the combined deflection effect.
- the first fluorite prism (or the first quartz prism) 34 as the first correction deflection prism corrects the deflection effect by the first quartz prism 35 (
- the second fluorite prism (or second quartz prism) 37 as the second correction deflection prism corrects (compensates) the deflection effect of the second quartz prism 36.
- the crystal optic axis of the first crystal prism 35 and the crystal optic axis of the second crystal prism 36 are set to form an angle of 45 degrees with each other, and The point that the crystal optic axis of the first quartz prism 35 and the crystal optic axis of the second quartz prism 36 are set to form an angle of 45 degrees with each other in the depolarizing element 3 ′ that is an example is common to each other. are doing.
- the depolarizing element 3 ′ according to the modification as described above with reference to the Poincare sphere, a pair of crystal polarization axes whose crystal optic axes are set to form an angle of 45 degrees with each other.
- the direction 35a of the crystal optical axis is set in the z direction. Therefore, when linearly polarized light having a polarization plane in the direction 35c or 35d at an angle of 45 degrees with respect to the direction 35a of the crystal optical axis enters the first quartz prism 35, the phase shift amount varies depending on the light passing position. , And depolarization is possible.
- the direction 36a of the crystal optical axis Force S The angle is set at 45 degrees to the z direction. Therefore, when linearly polarized light having a plane of polarization in the y-direction 36c or the z-direction 36d at an angle of 45 degrees to the direction 36a of the crystal optical axis enters the second quartz prism 36, the light passing position Thus, different amounts of phase shift are imparted, and depolarization is possible.
- the first crystal prism 35 and the second crystal prism 36 each have linearly polarized light that cannot be depolarized, but the crystal optic axis of the first crystal prism 35 and the second crystal prism 36
- the crystal optic axes of the lenses are set to form an angle of 45 degrees with each other, so that linearly polarized light that cannot be depolarized by the first crystal prism 35 can be depolarized by the second crystal prism 36.
- the first crystal prism 35 can depolarize linearly polarized light that cannot be depolarized by the second crystal prism 36.
- the first unit (34, 35) converts linearly polarized light having a plane of polarization in the direction 35c or 35d, which cannot be converted into unpolarized light by the second unit (36, 37), into unpolarized light.
- the second unit (36, 37) converts linearly polarized light having a plane of polarization in the direction 36c or 36d, which cannot be converted into unpolarized light by the first unit (34, 35), into non-polarized light. Configured to convert
- the basic operation and effect of the depolarizing element 3 ′ according to the modification have been briefly described above by taking the case where linearly polarized light is incident as an example, but the incident light is not limited to linearly polarized light but may be elliptically polarized light.
- the first unit (34, 35) converts incident light in a polarization state, which cannot be converted to unpolarized light by the second unit (36, 37), into non-polarized light
- the second unit (36, 37) converts the incident light in the polarization state, which cannot be converted into unpolarized light by the first unit (34, 35), into unpolarized light.
- the same depolarizing effect as the depolarizing element 3 working on the above embodiment can be obtained.
- the depolarizing element 3 ′ according to the modified example can be applied to the manufacture of the first crystal prism 35 and the second crystal prism 36 similarly to the above-described embodiment, similarly to the case of the depolarizing element 3.
- a manufacturing error easily occurs in an angle between the direction of the crystal optical axis and the apex angle direction.
- the depolarizing element 3 ′ that works in the modification even if the apex angle direction of the first quartz prism 35 and the apex angle direction of the second quartz prism 36 are not exactly orthogonal, the desired depolarization is achieved.
- the crystal optical axis of the first crystal prism 35 and the crystal optical axis of the second crystal prism 36 may be accurately set so as to form an angle of 45 degrees with each other.
- the first fluorite prism is heated so that the vertex angle direction of the first quartz prism 35 and the vertex angle direction of the first fluorite prism (or first quartz prism) 34 are opposite to each other.
- the first quartz prism) 34 is accurately positioned so that the apex angle direction of the second quartz prism 36 and the apex angle direction of the second fluorite prism face 37 are opposite to each other.
- the second fluorite prism is the second quartz prism) 37.
- the first quartz prism 35 and the vertex angle direction of the first fluorite prism (or first quartz prism) 34 for example, the first quartz prism 35 and the first fluorite prism (Or the first quartz prism) It is conceivable that the positioning is performed with reference to the hardware holding the 34. An example of a technique for positioning with higher precision is described below.
- the first quartz prism 35 is irradiated with the collimated light beam, and the light beam passing through the first quartz prism 35 is condensed on the photoelectric detector by the condenser lens. Then, the first fluorite prism (or first quartz prism) 34 is inserted into the collimated light beam.
- the first crystal prism 35 and the first fluorite prism, or the first quartz prism) 34 the condensing point on the photoelectric detector when the collimated light beam does not exist, and the first crystal prism 35
- the first quartz prism 35 and the first fluorite prism (or first quartz prism) 34 are present in the collimated light beam
- the rotation position of the first fluorite prism (or the first quartz prism) around the optical axis is adjusted so that the converging point on the photoelectric detector is on the same straight line.
- the deflection effect of the first quartz prism 35 can be accurately corrected (compensated) by the first fluorite prism or the first quartz prism.
- the first fluorite prism first quartz pre- Although the rotation adjustment of 34 was performed, the rotation adjustment of the first quartz prism may be performed.
- the method of positioning the apex angle direction of the second quartz prism 36 and the apex angle direction of the second fluorite prism (or the second quartz prism) 37 is the same as that described above, and a description thereof will be omitted. .
- the eccentric effect of the first quartz prism 35 and the eccentric effect of the second quartz prism 36 are determined by the first fluorite prism (or the first quartz prism).
- the correction (compensation) is performed independently by the prism 34 and the second fluorite prism (or the second quartz prism) 37.
- the first quartz prism 35 The positional relationship of the crystal optic axis between 35 and the second quartz prism 36, the positional relationship in the vertex direction between the first quartz prism 35 and the first fluorite prism (or first quartz prism) 34, and By assembling the two quartz prisms 36 and the second fluorite prism (or second quartz prism) 37 so as to accurately satisfy the positional relationship in the apex direction, the desired depolarization effect and declination compensation can be achieved. The effect can be obtained.
- first quartz prism 35 and the first fluorite prism (or the first quartz prism) 34 are positioned in the vertex direction
- second quartz prism 36 and the second fluorite prism (or the second The quartz prism) 37 is assumed to be positioned in the vertex direction.
- a pair of the first quartz prism 35 and the first fluorite prism is a first quartz prism) 34
- a pair of the second quartz prism 36 and the second fluorite prism is a second quartz prism) 37.
- a polarizing beam splitter is placed on the exit side of the light beam through the pair of prism pairs 34-37, and glass (plain glass) without an anti-reflection coating is disposed on the reflecting side of the polarizing beam splitter or on the reflecting side of the polarizing beam splitter.
- a light amount detector is placed on the transmission side or on both sides. From the outputs of these (these) light quantity detectors, it is possible to determine the degree of polarization of the light beam through the pair of prism pairs 34-37.
- the output of the photoelectric detector is monitored while rotating the direction of the plane of polarization of the linearly polarized light incident on the pair of prisms 34-37 around the optical axis, and the direction of the plane of polarization of the incident linearly polarized light is monitored.
- the pair of the first quartz prism 35 and the first quartz prism (the first quartz prism) 34, the second quartz prism 36 and the second quartz Adjust the angular position around at least one optical axis with the pair of prisms (the second quartz prism) 37. This makes it possible to set the directions of the crystal optical axes of the first quartz prism 35 and the second quartz prism 36 in a predetermined angular relationship.
- the first fluorite prism or the first quartz prism) 34 is disposed on the light source side of the first quartz prism 35, and the second quartz prism 36 A second fluorite prism (or a second quartz prism) 37 on the mask side of is disposed.
- various modifications are possible for the position of the first fluorite prism (the first quartz prism) 34 and the second fluorite prism (the second quartz prism) 37, which are not limited to this. It is.
- first correction deflection prism 34 and the second correction deflection prism 37 are formed using an optical material having a property of changing the polarization state (for example, fluorite having birefringence)
- the first crystal prism 35 and the second crystal prism 36 are arranged adjacent to each other as shown in Fig. 16 so that the polarization state does not change in the optical path between the crystal prism 35 and the second crystal prism 36. It is preferable to adopt a configuration, that is, an arrangement in which a pair of quartz prisms 35 and 36 are sandwiched by a pair of correction deflection prisms 34 and 37.
- the depolarizing element 3 ′ it is not necessary to set the apex angle direction of the first quartz prism 35 and the apex angle direction of the second quartz prism 36 to be orthogonal to each other.
- the mask (reticle) is illuminated by the illumination optical device (illumination step), and the transfer pattern formed on the mask is exposed on the photosensitive substrate using the projection optical system.
- a micro device semiconductor element, imaging element, liquid crystal display element, thin film magnetic head, etc.
- An example of a method for obtaining a semiconductor device as a micro device by forming a predetermined circuit pattern on a wafer or the like as a photosensitive substrate using the exposure apparatus of the embodiment will be described with reference to a flowchart of FIG. 9. I do.
- a metal film is deposited on one lot of wafers.
- a photoresist is applied on the metal film on the one lot wafer.
- the image of the pattern on the mask is sequentially exposed and transferred to each shot area on the wafer of the lot through the projection optical system.
- the photoresist on the one lot of wafers is developed, and then in step 305, the pattern on the mask is etched by using the resist pattern as a mask on the one lot of wafers. Is formed in each shot area on each wafer.
- a device such as a semiconductor element is manufactured by forming a circuit pattern of a further upper layer and the like. According to the above-described semiconductor device manufacturing method, a semiconductor device having an extremely fine circuit pattern can be obtained with good throughput.
- a predetermined pattern is formed on a plate (glass substrate).
- a liquid crystal display element By forming (a circuit pattern, an electrode pattern, etc.), a liquid crystal display element as a micro device can be obtained.
- a so-called photolithography step of transferring and exposing a mask pattern to a photosensitive substrate (a glass substrate coated with a resist) using the exposure apparatus of the above-described embodiment is executed.
- a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate.
- the exposed substrate goes through each process such as a developing process, an etching process, and a resist stripping process, so that a predetermined pattern is formed on the substrate, and the process proceeds to the next color filter forming process 402.
- a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or R, G,
- a color filter is formed by arranging a plurality of sets of filters of three stripes B in the horizontal scanning line direction.
- a cell assembling step 403 is performed. You.
- a liquid crystal panel liquid crystal cell is assembled using the substrate having the predetermined pattern obtained in the pattern forming step 401, the color filter obtained in the color filter forming step 402, and the like.
- liquid crystal is injected between the substrate having the predetermined pattern obtained in the pattern forming step 401 and the color filter obtained in the color filter forming step 402, Manufacture panels (liquid crystal cells). Thereafter, in a module assembling step 404, components such as an electric circuit and a backlight for performing a display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete a liquid crystal display element. According to the above-described method for manufacturing a liquid crystal display element, a liquid crystal display element having an extremely fine circuit pattern can be obtained with a high throughput.
- the condenser optical system 5 collects light from the secondary light source to illuminate the mask M in a superimposed manner.
- the illumination field stop mask blind
- the image of the illumination field stop are placed on the mask M. It is OK to arrange the relay optical system to be formed.
- the condenser optical system 5 condenses the light from the secondary light source and illuminates the illumination field stop in a superimposed manner, and the relay optical system uses the light from the aperture (light transmission part) of the illumination field stop. An image will be formed on the mask M.
- KrF excimer laser light, ArF excimer laser light, or F laser light is used as the exposure light.
- the present invention is not limited to this.
- the present invention can also be applied to an appropriate light source.
- the present invention has been described by taking the projection exposure apparatus having the illumination optical device as an example.
- the present invention is suitable for a general illumination optical apparatus for illuminating an irradiated surface other than a mask. Obviously it can be used.
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- Environmental & Geological Engineering (AREA)
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Abstract
Description
Claims
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JP2006191088A (ja) * | 2004-12-30 | 2006-07-20 | Asml Netherlands Bv | リソグラフィ・デバイス製造方法 |
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TW200507055A (en) | 2005-02-16 |
JPWO2004104654A1 (ja) | 2006-07-20 |
JP4595809B2 (ja) | 2010-12-08 |
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