WO2004067465A1 - 低反射ガラス板の製造方法および低反射ガラス板 - Google Patents
低反射ガラス板の製造方法および低反射ガラス板 Download PDFInfo
- Publication number
- WO2004067465A1 WO2004067465A1 PCT/JP2004/000937 JP2004000937W WO2004067465A1 WO 2004067465 A1 WO2004067465 A1 WO 2004067465A1 JP 2004000937 W JP2004000937 W JP 2004000937W WO 2004067465 A1 WO2004067465 A1 WO 2004067465A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- low
- glass plate
- film
- reflection
- resin
- Prior art date
Links
- 239000011521 glass Substances 0.000 title claims abstract description 160
- 238000000034 method Methods 0.000 title abstract description 26
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims abstract description 80
- 239000010931 gold Substances 0.000 claims abstract description 78
- 229910052737 gold Inorganic materials 0.000 claims abstract description 70
- 239000007788 liquid Substances 0.000 claims abstract description 68
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 59
- 229920005989 resin Polymers 0.000 claims abstract description 48
- 239000011347 resin Substances 0.000 claims abstract description 48
- 239000010419 fine particle Substances 0.000 claims abstract description 33
- 150000001875 compounds Chemical class 0.000 claims abstract description 31
- 229910052751 metal Inorganic materials 0.000 claims abstract description 29
- 239000002184 metal Substances 0.000 claims abstract description 29
- 229910052742 iron Inorganic materials 0.000 claims abstract description 27
- 239000003960 organic solvent Substances 0.000 claims abstract description 24
- 238000004519 manufacturing process Methods 0.000 claims abstract description 23
- 239000010936 titanium Substances 0.000 claims abstract description 19
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 18
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 17
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052726 zirconium Inorganic materials 0.000 claims abstract description 15
- 239000000758 substrate Substances 0.000 claims description 37
- 239000002245 particle Substances 0.000 claims description 35
- 150000002902 organometallic compounds Chemical class 0.000 claims description 26
- 239000011164 primary particle Substances 0.000 claims description 22
- 238000012545 processing Methods 0.000 claims description 21
- 239000000020 Nitrocellulose Substances 0.000 claims description 20
- 229920001220 nitrocellulos Polymers 0.000 claims description 20
- 238000002834 transmittance Methods 0.000 claims description 19
- 238000005979 thermal decomposition reaction Methods 0.000 claims description 16
- 230000005540 biological transmission Effects 0.000 claims description 13
- 239000005357 flat glass Substances 0.000 claims description 10
- 229910052710 silicon Inorganic materials 0.000 claims description 9
- 239000010703 silicon Substances 0.000 claims description 9
- 239000001856 Ethyl cellulose Substances 0.000 claims description 7
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 claims description 7
- 235000019325 ethyl cellulose Nutrition 0.000 claims description 7
- 229920001249 ethyl cellulose Polymers 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 150000003377 silicon compounds Chemical class 0.000 claims description 2
- 238000010304 firing Methods 0.000 abstract description 17
- 238000000576 coating method Methods 0.000 abstract description 13
- 239000011248 coating agent Substances 0.000 abstract description 11
- 238000001035 drying Methods 0.000 abstract description 11
- 230000001747 exhibiting effect Effects 0.000 abstract description 5
- 230000001603 reducing effect Effects 0.000 abstract description 2
- 238000000354 decomposition reaction Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 31
- 238000005299 abrasion Methods 0.000 description 29
- 239000010410 layer Substances 0.000 description 25
- 238000012360 testing method Methods 0.000 description 18
- 230000000052 comparative effect Effects 0.000 description 15
- 239000006185 dispersion Substances 0.000 description 13
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 12
- 239000002253 acid Substances 0.000 description 10
- 230000003287 optical effect Effects 0.000 description 10
- 230000000694 effects Effects 0.000 description 9
- 239000002904 solvent Substances 0.000 description 9
- 239000000463 material Substances 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 6
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 5
- 239000001191 butyl (2R)-2-hydroxypropanoate Substances 0.000 description 5
- -1 gold ions Chemical class 0.000 description 5
- 150000003961 organosilicon compounds Chemical class 0.000 description 5
- 238000002310 reflectometry Methods 0.000 description 5
- 150000003609 titanium compounds Chemical class 0.000 description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- 150000004703 alkoxides Chemical class 0.000 description 4
- 238000001246 colloidal dispersion Methods 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000002506 iron compounds Chemical class 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 125000004093 cyano group Chemical group *C#N 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 238000011156 evaluation Methods 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- ZBKIUFWVEIBQRT-UHFFFAOYSA-N gold(1+) Chemical compound [Au+] ZBKIUFWVEIBQRT-UHFFFAOYSA-N 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 239000005340 laminated glass Substances 0.000 description 3
- 238000010030 laminating Methods 0.000 description 3
- 238000005259 measurement Methods 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000003980 solgel method Methods 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- FIPWRIJSWJWJAI-UHFFFAOYSA-N Butyl carbitol 6-propylpiperonyl ether Chemical compound C1=C(CCC)C(COCCOCCOCCCC)=CC2=C1OCO2 FIPWRIJSWJWJAI-UHFFFAOYSA-N 0.000 description 2
- 102000004190 Enzymes Human genes 0.000 description 2
- 108090000790 Enzymes Proteins 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 230000002776 aggregation Effects 0.000 description 2
- 125000003277 amino group Chemical group 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 229920002678 cellulose Polymers 0.000 description 2
- 235000010980 cellulose Nutrition 0.000 description 2
- 238000004040 coloring Methods 0.000 description 2
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- HHFAWKCIHAUFRX-UHFFFAOYSA-N ethoxide Chemical compound CC[O-] HHFAWKCIHAUFRX-UHFFFAOYSA-N 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 239000005329 float glass Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 150000002576 ketones Chemical class 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 239000012071 phase Substances 0.000 description 2
- 238000002186 photoelectron spectrum Methods 0.000 description 2
- 229960005235 piperonyl butoxide Drugs 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- IKNCGYCHMGNBCP-UHFFFAOYSA-N propan-1-olate Chemical compound CCC[O-] IKNCGYCHMGNBCP-UHFFFAOYSA-N 0.000 description 2
- 238000000985 reflectance spectrum Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 125000003396 thiol group Chemical group [H]S* 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- FYELSNVLZVIGTI-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-5-ethylpyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C=NN(C=1CC)CC(=O)N1CC2=C(CC1)NN=N2 FYELSNVLZVIGTI-UHFFFAOYSA-N 0.000 description 1
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BDAGIHXWWSANSR-UHFFFAOYSA-N Formic acid Chemical compound OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 1
- AEMRFAOFKBGASW-UHFFFAOYSA-M Glycolate Chemical compound OCC([O-])=O AEMRFAOFKBGASW-UHFFFAOYSA-M 0.000 description 1
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 1
- 229920000571 Nylon 11 Polymers 0.000 description 1
- 229920002292 Nylon 6 Polymers 0.000 description 1
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- ZMIGMASIKSOYAM-UHFFFAOYSA-N cerium Chemical compound [Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce][Ce] ZMIGMASIKSOYAM-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 235000009508 confectionery Nutrition 0.000 description 1
- 230000036461 convulsion Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000006059 cover glass Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000855 fermentation Methods 0.000 description 1
- 230000004151 fermentation Effects 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 229940014144 folate Drugs 0.000 description 1
- OVBPIULPVIDEAO-LBPRGKRZSA-N folic acid Chemical compound C=1N=C2NC(N)=NC(=O)C2=NC=1CNC1=CC=C(C(=O)N[C@@H](CCC(O)=O)C(O)=O)C=C1 OVBPIULPVIDEAO-LBPRGKRZSA-N 0.000 description 1
- 235000019152 folic acid Nutrition 0.000 description 1
- 239000011724 folic acid Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 150000002344 gold compounds Chemical class 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- FYKBHPZYQWSXTG-UHFFFAOYSA-L iron(2+);octanoate Chemical compound [Fe+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O FYKBHPZYQWSXTG-UHFFFAOYSA-L 0.000 description 1
- DLAPQHBZCAAVPQ-UHFFFAOYSA-N iron;pentane-2,4-dione Chemical compound [Fe].CC(=O)CC(C)=O DLAPQHBZCAAVPQ-UHFFFAOYSA-N 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 239000002932 luster Substances 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229940100630 metacresol Drugs 0.000 description 1
- 150000002736 metal compounds Chemical class 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 125000005609 naphthenate group Chemical group 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
- C03C1/008—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route for the production of films or coatings
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/008—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/445—Organic continuous phases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/479—Metals
Definitions
- the present invention relates to a method for producing a low-reflection glass plate (a glass plate with a low-reflection film) and a low-reflection glass plate, and more particularly to a low-reflection glass plate having a low reflectance and excellent abrasion resistance and chemical resistance. And a low reflection glass plate having the above-mentioned excellent characteristics.
- a high-refractive-index material such as titanium oxide and a low-refractive-index material such as silicon oxide are coated on a glass substrate by controlling the refractive index and film thickness by a vapor deposition method such as a vacuum film forming method or sputtering.
- a vapor deposition method such as a vacuum film forming method or sputtering.
- Two or more layers of a light-absorbing material such as titanium nitride and a low-refractive-index material such as silicon oxide are formed on a glass substrate by controlling the refractive index and film thickness by a gas phase method such as sputtering.
- Two or more layers of a high refractive index material such as titanium oxide and a low refractive index material such as silicon oxide on a glass substrate by controlling the refractive index and film thickness by a sol-gel method using a metal alkoxide.
- a method of manufacturing a low-reflection glass plate using optical interference by stacking the films so that the interface between the films becomes clear, and
- a high refractive index material such as titanium oxide and a low refractive index material such as silicon oxide are formed on a glass substrate by controlling the refractive index and film thickness by a sol-gel method using a metal ion-containing aqueous solution or a metal alkoxide.
- the above-mentioned prior art has various problems as described below, and the present inventors have solved the problems by using a process-friendly method of coating a coating solution, drying and firing. And proposes a method for producing a low-reflection glass plate with low reflectance and excellent abrasion resistance and chemical resistance (see Japanese Patent Application No. 2002-3599776). Also, a method of forming a colored fired film having excellent chemical resistance on a glass substrate has been proposed (see JP-A-10-231145).
- the method using the vacuum film forming method or the sputtering method requires a large-scale facility, and thus has a problem that the cost increases.
- the interface between the films is clarified by a sol-gel method using metal alkoxide, etc., and for low-reflection glass plates using optical interference, after the treatment liquid is applied to each layer, the interface between the films is clarified. It needs to be dried at high temperature, and there is a problem that productivity is deteriorated.
- a low reflection glass plate having low reflectance and excellent abrasion resistance and chemical resistance can be obtained. Although it was obtained in light, the reflectance reduction effect was not sufficient for other light at an incident angle of 60 °.
- a first object of the present invention is to solve the above-mentioned problems of the prior art and produce a low-reflection glass plate having low reflectance and excellent abrasion resistance ⁇ chemical resistance, and preferably having a blue transmission color tone. It is to provide sexually.
- a second object of the present invention is to provide a low-reflection glass plate having a sufficient reflectance-reducing effect even with light at an incident angle of 60 ° with high productivity in addition to the above-mentioned problems. Disclosure of the invention
- the present invention provides a treatment solution (1) comprising a resin B1, gold fine particles, an organometallic compound of at least one metal (Ml) selected from the group consisting of iron, titanium and zirconium, and an organic solvent. ), A film-forming compound, a resin B2 having the same thermal decomposition temperature as that of the resin B1, or a resin B2 having a higher thermal decomposition temperature than the resin B1, and an organic solvent, and the above treatment is performed.
- Transparent liquid (1) Coating on the surface of a glass substrate, and then drying at 50 to 250 to remove the organic solvent. Then, further apply the treatment liquid (2) thereon, and then drying at 50 to 250 ° C to dry the organic solvent.
- the present invention provides a method for producing a low reflection glass plate, comprising removing a solvent, and then baking the treated transparent glass substrate at 400 to 800 ° C.
- the resin B1 has a thermal decomposition temperature of 150 to 300 ° C .; the organometallic compound is an organoiron compound; Ml / Au ratio (mass ratio) to Ml) is 3 to 25; resin B 1 is nitrocellulose; resin B2 is nitrocellulose; resin B 1 is nitrocellulose
- the resin B2 is ethyl cellulose; the transparent glass substrate is a heat ray absorbing glass or a high heat ray absorbing glass, and the treatment liquid (2) contains an organic silicon compound which is a film forming compound;
- the transmission color tone of the low-reflection glass plate to be used must be a single color; and the film thickness after baking made of the processing solution (1) is 5 to 50 nm, and the film thickness after baking made of the processing solution (2) is 50 to 350 nm. It is preferably nm.
- the present invention provides a low-reflection glass plate provided with a low-reflection film on at least one surface of a transparent glass substrate, wherein the low-reflection film comprises an oxide of at least one metal selected from iron, titanium and zirconium. And a low-reflection glass plate characterized by containing a film-forming oxide and fine gold particles.
- At least one metal selected from iron, titanium and zirconium is iron; the oxide for film formation is an oxide of silicon;
- the average primary particle diameter of the included fine gold particles should be 1.0 to 12.0 nm, and the standard deviation should be "average primary particle size +2.0 nm" or less; the amount of fine gold particles present in the low reflection film Is preferably 0.01 to 0.80 atomic% of all atoms of the low reflection film.
- the transparent glass substrate is a heat ray absorbing glass or a high heat ray absorbing glass, and has a transmission color tone of blue; stipulated in JIS-R 3106 (1999).
- the visible light transmittance is preferably 30 to 85%.
- the low reflection glass plate of the present invention has a visible light transmittance of 70 to 85% specified in JIS-R3106 (1999) and is intended for window glass for automobiles; JIS-R3106 (1999) The visible light reflectance at an incident angle of 5 ° on the glass surface specified in (Year) is 5.5% or less and must be used for automotive window glass; and the glass specified in JIS-R3106 (1999) The visible light reflectance at an incident angle of 60 ° on the surface is 11.0% or less, and is preferably used for automotive window glass.
- the transparent glass substrate after applying the processing solutions (1) and Z or the processing solution (2) is dried at a high temperature of 50 to 250 ° C. without drying at a high temperature.
- the components of the film change continuously in the depth direction of the film, and there is no clear interface between the two types of films, forming a film like a single layer, and in the film thickness direction
- the component changes, that is, the refractive index changes in the film thickness direction, and has good reflection characteristics.
- an organometallic compound of at least one metal selected from the group consisting of iron, titanium and zirconium to the treatment liquid (1) in a specific range of mass ratio to the fine gold particles, an incident angle of 60 ° is obtained.
- the “light at an incident angle of 60 °” is 60 with respect to the normal to the glass plate. Means that the light is incident. The same applies to “light with an incident angle of 5 °”.
- an oxide of an organometallic compound of at least one metal selected from the group consisting of silica and zirconium, particularly a film containing an oxide of an organic iron compound and fine gold particles coexist with an absorption peak at a wavelength of around 630 nm.
- the film formed by the method of the present invention has an incident angle of 60 as well as light having an incident angle of 5 °. There is an effect that the reflectance can also be reduced for the light of the above.
- the transparent glass substrate is a heat-absorbing glass or a high-heat-absorbing glass such as a glass having a transmission color of green
- gold fine particles that act as a color-forming source as well as a heat-ray-cutting effect are obtained.
- FIG. 1 is an explanatory diagram of the film thickness of the first and second layers formed in the present invention.
- FIG. 2 is a photoelectron spectrum showing an elemental analysis of a low-reflection film of Example 4 in a film cross-sectional direction.
- FIG. 3 is an enlarged view of the gold and iron portions of FIG.
- FIG. 4 is an ESC A spectrum in which the content of atoms in the low reflection film of the low reflection glass plate of Example 3 was measured.
- FIG. 5 shows reflectance spectra of the low-reflection glass plates of Examples 1, 18, and 20 and Comparative Example 3.
- the fine gold particles used in the present invention can be produced, for example, by the invention disclosed in Japanese Patent Application Laid-Open No. 11-76080. That is, as described in the above publication, after dissolving a gold compound in a solvent and then reducing gold ions in the solvent in the presence of a polymer pigment dispersant, the particle diameter is preferably from 1 to 100 nm, preferably Can obtain gold fine particles of 1 to 50 nm.
- the gold fine particles are protected by a polymer pigment dispersant and can be dispersed in a solvent such as alcohol, ketone, ether, and toluene.
- the polymer pigment dispersant used in the step of producing the fine gold particles is not particularly limited.
- a pigment-affinitive group having a pigment-affinity group in the main chain and / or a plurality of side chains and a solvent-affinity moiety (2) a polymer having a plurality of pigment-affinity moieties consisting of a pigment-affinity group in the main chain, (3) a pigment-affinity at one end of the main chain
- Specific commercial products include, for example, Solsperse series (manufactured by Zeneki Co., Ltd.) and Dispersivik series
- a solution in which gold fine particles are independently dispersed in an organic solvent is prepared by a method called an in-gas evaporation method as disclosed in Japanese Patent Application Laid-Open No. 3-32411. That is, the helium inert gas is introduced into the chamber to evaporate the metal, and the metal is cooled and condensed by collision with the inert gas. Solvent vapor is introduced to coat the particle surface.
- the organic solvent for example, a solvent such as p-xylene, toluene, and ⁇ _terneol is used.
- the organic solvent has a particle diameter of preferably 1 to 100 nm, more preferably 1 to 50 nm. Gold fine particles independently dispersed therein are obtained.
- the dispersion liquid is dispersed by dispersing gold fine particles having a particle diameter of preferably l to 100 nm, more preferably 1 to 50 nm in a polymer soluble in alcohol, ketone, ether, toluene and the like. It can also be made.
- a polymer having at least one functional group selected from a cyano group (—CN), an amino group (one NH 2 ), and a thiol group (one SH) at a terminal or a side chain of a polymer molecule Use molecules or oligomers.
- the skeleton is composed of polyethylene oxide, polyvinyl alcohol, polyamide 11, polyamide 6, polyamide 6.6, polyamide 6.10, polyethylene terephthalate, polystyrene, etc., and its melting point or softening point is 40%. 1100.
- the number average molecular weight of the oligomer is not particularly limited, but is about 50,000 to 6,000.
- the functional group particularly easily forms a covalent bond or a coordination bond with a gold atom on the surface of the fine gold particles, suppresses grain growth, and enhances the dispersibility of the fine gold particles.
- the organometallic compound of at least one metal (Ml) selected from the group consisting of iron, titanium and zirconium used in the present invention is soluble in an organic solvent described later, for example, iron octanoate, naphthene Iron acid, iron acetylacetone salt, iron alkoxide salt, and organometallic compounds of titanium and zirconium described below can be used.
- an organic iron compound is particularly preferable in consideration of the balance between the reflectance and the transmittance and the wear resistance of the film.
- Ml / Au is preferably in the range of 3 to 25. If M 1 / A 11 is less than 3, the amount of the organometallic compound is too small, and the absorption peak of the obtained low-reflection film does not reach the intended 630 nm, but stays at around 550 nm and 60 ° The reflectance for the light at the incident angle is less likely to decrease. On the other hand, if Ml / Au exceeds 25, the amount of the organometallic compound becomes too large, the refractive index of the formed film increases, and it is difficult to reduce the reflectance. Further, Ml / Au is present in the film at the same mass ratio, and MlZAu is preferably in the range of 3 to 25. The organometallic compound changes to a metal oxide by calcination and is present in the film.
- the resin B1 used in the present invention is soluble in an organic solvent, maintains an appropriate viscosity of the processing solution to apply it to a transparent glass substrate, improves the handling of the applied material after drying, and reduces the time required for firing. It is necessary to pyrolyze at a relatively low temperature.
- the thermal decomposition temperature of the resin B1 is in the range of 150 to 400 ° C, more preferably 150 to 300 ° C. If the thermal decomposition temperature is lower than 150 ° C., the resin B1 may be thermally decomposed in the drying step of the coating film. On the other hand, if the thermal decomposition temperature exceeds 40 Ot :, the strength of the oxide film after firing may be insufficient.
- the resin B1 include resins such as thermally decomposable cellulose such as nitrocellulose, polyvinyl chloride, and polyacryl such as polymethyl methacrylate. More preferred resin B1 is nitrocellulose.
- the nitrocellulose preferably has a weight average molecular weight in the range of 2,000 to 200,000, and more preferably a weight average molecular weight in the range of 3,000 to 150,000.
- the amount of nitrocellulose to be added is determined by the viscosity of the processing solution (1) and the desired film thickness, and is not particularly limited.
- the nitrocell orifice added to the processing solution (1) has a molecular weight The amount is preferably 1.0 to 30.0 parts by mass in 100 parts by mass of the treatment solution (1).
- Examples of the film-forming compound which is contained in the treatment liquid (2), and preferably contained in the treatment liquid (1) in some cases include, for example, silicon alkoxides such as ethoxide, propoxide and butoxide; Various silicon oils with a siloxane skeleton, organosilicon compounds that form low-refractive-index films such as silicon varnish, and titanium and jill Alkoxides such as ethoxide, propoxide and butoxide of konium, cerium and cobalt; chelates such as acetyl acetate and aminate; organic acid metal salts such as stearate, octylate, naphthenate and glycolate; And an organometallic compound such as an oligomer obtained by polycondensation.
- silicon alkoxides such as ethoxide, propoxide and butoxide
- organosilicon compounds that form low-refractive-index films such as silicon varnish, and titanium and jill Alkoxides
- the film-forming compound changes to a film-forming oxide by firing, and is present in the film.
- the resin B2 used in the present invention may be the same resin as the resin B1, or may be a resin having a higher thermal decomposition temperature than the resin B1. These resins B 2 are soluble in an organic solvent described below, and maintain the viscosity of the processing solution at an appropriate level to improve the application of the processing liquid to the glass substrate, the handling of the processing liquid after drying, and the firing. It is necessary to decompose at relatively high temperature.
- the thermal decomposition temperature of the resin B2 is preferably in the range of 150 to 500 ° C.
- the thermal decomposition temperature of the resin means a temperature (° C) at which 90% by mass or more of the resin is burned off.
- the resin B2 include resins such as ethyl cellulose, thermally decomposable celluloses such as nitrocellulose, polychlorinated vinyls, and polyacryls such as polymethyl methacrylate. More preferred resins B2 are ethylcell mouth and the aforementioned nitrocellulose.
- the former ethyl cellulose preferably has a weight-average molecular weight of 8,000 to 150,000, and more preferably has a weight-average molecular weight of 10,000 to 120,000. belongs to.
- the amount of the resin B2 to be added is determined by the viscosity of the treatment liquid (2) and the desired film thickness, and is not limited, but is a resin that is mixed with the treatment liquid (2). It depends on the method. For example, the luster B2 is added in 100 parts by mass of the treatment liquid (2), preferably in the range of 1.0 to 30.0 parts by mass.
- the organic solvent used in the present invention is not particularly limited as long as it can stably disperse the gold fine particles without agglomeration and can dissolve the film-forming compound containing the organic metal compound, the resin B 1 and the resin B 2. It is appropriately selected depending on the method of applying the treatment liquid. Specifically, meta-cresol, dimethylformamide, butyl carbitol, ⁇ -terbineo Solvents, diacetone alcohol, triethylene glycol, para-xylene, toluene and other high-boiling solvents are preferred for applying the treatment liquid to the glass plate surface.
- treatment solution (1) and treatment solution (2) are prepared as follows. First, it is preferable to weigh a predetermined amount of the solvent and the resin, and to stir at a temperature of 60 to 100 (preferably 70 to 80 ° C) for 20 to 40 minutes. This solution is mixed with necessary components selected from gold fine particles, an organometallic compound and a film-forming compound, and stirred and mixed at a temperature of 60 to 100 ° C (preferably 70 to 80 ° C) for 20 to 40 minutes. It is preferable to do so. By transferring the obtained solution to a storage container and allowing it to cool naturally,
- treatment solution (2) can be prepared.
- the treatment liquid (2) contains an organosilicon compound
- the treatment liquid (1) contains a film-forming compound having a higher refractive index than the organosilicon compound.
- the treatment liquid (1) contains the organometallic compound and gold fine particles
- the amount of the fine gold particles to be blended in the treatment liquid (1) is appropriately determined depending on the desired transmittance, reflectance, color tone of the low reflection glass plate, the method of applying the treatment liquid, and the like.
- M2 / N is less than 0.1
- the gold fine particles sinter together to form a noble metal lump, which is no different from the state where the gold fine particles alone are applied and baked on the surface of the glass plate, and the colloid coloring which is the object of the present invention May not be obtained.
- M2ZN exceeds 100, the number of gold particles in the above-mentioned processing solution is remarkably reduced, so that an effective glass plate cannot be colored and the object of the present invention may not be achieved.
- the amount of the above colloidal gold dispersion added in the treatment liquid (1) is although it depends on the concentration of the colloidal dispersion and the desired optical characteristics, the solid content of the fine gold particles is preferably 0.01 to 10 parts by mass with respect to 100 parts by mass of the treatment liquid (1).
- the solid content of the gold fine particles is less than 0.01 parts by mass, the transmission color tone of the low-reflection glass plate obtained when the amount of the gold colloidal dispersion is too small becomes gray, and the light at an incident angle of 60 ° is obtained. It is difficult for the reflectivity to fall.
- the solid content of the gold fine particles exceeds 10 parts by mass, the amount of the gold colloidal dispersion becomes too large, and the transmittance of the obtained low-reflection glass plate is greatly reduced, so that desired optical characteristics can be obtained. It becomes difficult.
- the addition amount of the organometallic compound in the treatment liquid (1) is preferably 0.01 to 10 parts by mass with respect to 100 parts by mass of the treatment liquid (1). If the amount of the organometallic compound is less than 0.01 parts by mass, the transmission color tone of the low-reflection glass plate obtained when the amount of metal such as iron is too small becomes gray, and the light at an incident angle of 60 ° is obtained. The reflectance of the light is less likely to decrease. On the other hand, if the amount of the organometallic compound exceeds 10 parts by mass, the amount of the organometallic compound becomes too large, and the refractive index of the film to be formed increases, making it difficult to reduce the reflectance.
- the amount of the film-forming compound added to the treatment liquid (1) or the treatment liquid (2) depends on the kind of the film-forming compound, the organic solvent, the amount of the resin B2 and the resin B1, and the coating method. Although different, when blended in the treatment solution (1), it is desirable to set the film thickness after firing to 5 to 50 nm. Specifically, the compounding amount of the film-forming compound is preferably 0.5 to 20 parts by mass in 100 parts by mass of the treatment liquid. At a concentration at which the film thickness after firing is less than 5 nm, the film forming properties of the obtained low reflection film may not be improved, and only a film having a low film strength may be obtained.
- the coating film after firing exceeds 50 nm, the amount of the film forming compound contained in the low-reflection film becomes too large with the added amount of the film forming compound, resulting in a film to be obtained. May not be sufficiently low. Therefore, in the present invention, in order to obtain an excellent film-forming property and an excellent low-reflection film, it is preferable to set the film thickness of the treatment liquid (1) after firing to 5 to 50 nm.
- the amount of the film-forming compound to be added to the treatment liquid (2) varies depending on the type and amount of the resin B2 and the organic solvent, the amount used, and the coating method. It is desirable that the post-film thickness be set to 50 to 350 nm. If the amount of the film-forming compound added becomes less than 5 Onm after baking, an excellent low-reflection film may not be obtained. On the other hand, if the amount of the compound for film formation exceeding 350 nm is added, the amount of the compound for film formation contained in the low reflection film becomes too large, and only a film having a low film strength may be obtained. Because. Therefore, in the present invention, in order to obtain an excellent film-forming property and an excellent low-reflection film, it is preferable to set the film thickness after firing made of the treatment liquid (2) to be 50 to 350 nm.
- the transparent glass substrate used in the present invention is not particularly limited, but it is preferable to use a heat ray absorbing glass or a high heat ray absorbing glass having a further enhanced heat ray cutting effect. Also, colorless float glass can be used. For example, for applications requiring a heat ray cut effect, such as window glass for automobiles, it is preferable to use a green glass substrate because a colored glass plate having a low reflection property and a heat ray cutoff effect can be obtained.
- the green glass plate may be any as long as it exhibits a green color, for example, a soda-lime-silica based glass component and base component, Fe 2 ⁇ 3, N i O, suitably blended and T i 0 2 the green glass plate, F e 2 0 3 in the glass component, C O_ ⁇ , it is like S e and green glass plate obtained by blending, float glass, and the like ⁇ Rukarigarasu.
- the transparent glass substrate preferably has a thickness of 0.4 to 3.0 mm.
- the visible light transmittance of the transparent glass substrate is preferably at least 90%, particularly preferably at least 95%.
- Examples of a method of applying the treatment liquid to a glass substrate include methods such as spraying, dipping, roll coating, spin coating, flexographic printing, and screen printing. Apply treatment solution (1) to a glass substrate, dry it for 50 to 250 minutes ( € 30 to 30 minutes) to remove organic solvent, apply treatment solution (2), and apply After drying for 30 minutes to remove the organic solvent, baking is performed in a furnace at 400 to 800 ° C. for 1 to 10 minutes, and after cooling, the low reflection glass plate of the present invention is obtained.
- the interface of the second layer is not clear, and the layer structure is as if it were a single layer.
- the firing conditions for the coating film are preferably firing in the range of 400 to 800 ° C. If the firing is performed at a temperature lower than 40 ° C, the film forming property of the film is deteriorated. The formation is not preferable because the aggregation of the fine gold particles occurs.
- the low-reflection glass plate obtained by the method of the present invention as described above has low reflectivity and a heat-ray blocking effect when the glass substrate is a heat-absorbing or high-heat-absorbing glass. It is useful for vehicles, for example, as window glass for automobiles. It is also useful as a low reflection glass plate for display applications that does not require high transmittance performance.
- the present invention provides a low-reflection glass plate provided with a low-reflection film on at least one surface of a transparent glass substrate, wherein the low-reflection film comprises an oxide of at least one metal selected from iron, titanium and zirconium. And a low-reflection glass plate characterized by containing a film-forming oxide and fine gold particles.
- the low reflection glass plate of the present invention can be manufactured by the manufacturing method of the present invention, but the manufacturing method is not limited to the manufacturing method of the present invention.
- the preferred embodiment of the low-reflection glass plate of the present invention is as described for the manufacturing method.
- Other preferred embodiments include an average primary particle diameter of gold fine particles contained in the low-reflection film. Is 1.0-2.0 nm, preferably 1.0-8.0 Onm, and the standard deviation is “average primary particle diameter +2.0 nmj or less, preferably“ average primary particle diameter +1.0 nmj or less ”. Below.
- the average primary particle diameter of the gold fine particles contained in the low reflection film is smaller than 1. Onm, it is difficult to produce such small gold fine particles themselves, while the average primary particle diameter of the gold fine particles is 12 If it exceeds O nm, or if the standard deviation of the fine gold particles exceeds “average primary particle diameter + 2. O nm”, the abrasion resistance of the low-reflection film will be insufficient under severe use conditions. There are cases.
- the abundance of the fine gold particles in the low-reflection film (the film comprising the first layer and the second layer) of the low-reflection glass plate of the present invention is 0.01 to 0.80 atom in all atoms of the low-reflection film. %, Preferably 0.05 to 0.3 atomic%.
- the abundance of the gold fine particles exceeds the above range, the gold fine particles sinter together to form a noble metal lump, which is no different from the state where the single gold fine particles are applied to the surface of the glass plate and fired. Colloidal coloring May not be obtained.
- the abundance of the gold fine particles is less than the above range, the number of gold fine particles in the low-reflection film is significantly reduced, so that an effective glass plate cannot be attached: the color cannot be obtained, and the object of the present invention cannot be achieved. There are cases.
- the abundance of at least one metal selected from the group consisting of iron, titanium and zirconium in the low reflection film of the low reflection glass plate of the present invention is from 01 to 8 in all atoms of the low reflection film. It is 1.0 atomic%, preferably 1.0 to 4.0 atomic%. If the amount of these metals is less than the above range, the transmission color tone of the low-reflection glass plate obtained because the amount of metals such as iron is too small becomes gray, and the reflection for light at an incident angle of 60 ° is obtained. The rate is less likely to fall. On the other hand, if the amount of the metal exceeds the above range, the amount of the organometallic compound becomes too large, and the refractive index of the film to be formed increases, making it difficult to reduce the reflectance.
- the low-reflection glass plate of the present invention preferably has a visible light transmittance of 30 to 85% as specified in JIS-R3106 (1999).
- the content is preferably 70 to 85%.
- high reflectance of the glass surface gives a glaring impression and impairs the luxury, so the glass surface specified in JIS-R3106 (1999) Horn 5.
- the visible light reflectance is preferably 5.5% or less, particularly preferably 5.0% or less.
- the incident angle is 60. Has a visible light reflectance of 11.0% or less.
- the low-reflection glass plate formed by the present invention can be used as a substrate constituting a laminate.
- the laminate has a structure in which an intermediate film or a heat insulating layer is interposed between the first and second substrates, and the low reflection glass plate of the present invention can be used as the first and Z or second substrates.
- the intermediate film include transparent or colored polypinyl butyral, ethylene vinyl acetate copolymer, and the like.
- the heat insulating layer for example, a layer filled with an inert gas, air, nitrogen, or the like, or a vacuum layer And the like.
- the laminate examples include a laminated glass using, as the first and second, or the first or second substrate, one of a heat ray absorbing glass and a high heat ray absorbing glass, and an intermediate film using polyvinyl butyral.
- the laminated glass using low-reflection high-heat-absorbing glass as the first and second or first or second substrate and using polyvinyl butyral as the intermediate film, the transmittance of the high-heat-absorbing glass is low. Therefore, the reflectance of light incident from the film surface on the non-film surface side can be reduced, which is particularly preferable.
- the laminated glass is suitably used as a cover glass for transportation equipment windows (for example, vehicle windows).
- Gold colloidal dispersion (a) Prepared by a gas phase method (evaporation in gas).
- the average primary particle diameter of the fine gold particles in the dispersion is 4 nm, and the solid content as gold is 7%.
- the average primary particle diameter in the coating liquid was the same.
- Gold colloid dispersion (b) prepared by the liquid phase method, the average primary particle diameter of the fine gold particles in the dispersion is 13 nm, the solid content as gold is 7%, The same applies to the uniform primary particle size.
- Each sample was immersed in a 3% aqueous sodium hydroxide solution for 2 hours, and the transmittance and reflectance before and after immersion were measured with a spectrophotometer.
- the change in visible light transmittance ( ⁇ ) and the angle of incidence of each sample were measured.
- ° change in visible light reflectance (ARv) was calculated. Practically, it is preferably 1.0% or less.
- Each sample was immersed in a 3% sulfuric acid aqueous solution for 2 hours, and the transmittance and reflectance before and after immersion were measured with a spectrophotometer, and the change in visible light transmittance ( ⁇ ) and the visible light at an incident angle of 5 ° for each sample were measured.
- the reflectance change (ARv) was calculated. Practically, it is preferably 1.0% or less.
- the abrasion resistance of the low-reflection film of the low-reflection glass plate of the present invention does not pose any practical problems as long as it passes the rubbing test. However, depending on the application, it may be used under more severe conditions.
- the load on the worn wheel (CALIBRASE CS-10F) was set to 250 gf with a taper wear tester, and the appearance after 500 rotations was visually evaluated.
- the evaluation criteria are as follows.
- Tables 1 to 7 show the compositions of the processing solutions (1) and (2) used in Examples 1 to 21 and Comparative Examples 2 and 3.
- the treatment liquid (1) was prepared by adding components other than the gold colloid dispersion to the organic solvent according to the formulations shown in Tables 1 to 7, heating and stirring to dissolve, and then dissolving the gold colloid dispersion. It was prepared by adding and heating and stirring again.
- the treatment liquid (2) was prepared by adding each component to an organic solvent according to the composition shown in Tables 1 to 7, and heating and stirring to dissolve each component.
- Example 1 to 21 and Comparative Examples 2 and 3 a 3.5 mm thick green heat absorbing glass (manufactured by Asahi Glass Co., Ltd., product name: UV cut glass) was screen-printed with the treatment liquid (1). After coating by the method, it was dried in an atmosphere of hot air at 150 ° C. for 5 minutes in an air atmosphere. Next, the treatment liquid (2) having the same mass as the treatment liquid (1) is applied, dried in a hot-air circulating oven at 150 ° C for 5 minutes in an air atmosphere, and then dried in a Matsufur furnace at 600 ° C. For 5 minutes to obtain samples of the low-reflection glass plates of Examples 1 to 21 and Comparative Examples 2 and 3.
- Comparative Example 1 is a case in which only the green heat ray absorbing glass is used, and Comparative Examples 2 and 3 are examples in which an organic iron compound is not used in the treatment liquid (1).
- the thermal decomposition temperatures of nitrocellulose and ethylcellulose used were 190 ° C. and 330 T :, respectively.
- Tables 1 to 7 show the results of the test items of the low reflection glass plates obtained in Examples 1 to 21 and Comparative Examples 2 and 3.
- the interfaces of the first and second low-reflection films of the above Examples and Comparative Examples are not clear, and it is difficult to measure the thickness of each layer after baking and forming the films.
- the film thickness in the table is applied on a glass substrate so that the processing solution (1) and the processing solution (2) are partially overlapped, dried and dried under the same conditions as described above. After baking, measure the film thickness of the part where the processing liquid does not overlap, and use it as the first and second layer thickness.
- the processing solution (1) and the processing solution (2) are partially overlapped, dried and dried under the same conditions as described above.
- FIGS. Figure 3 is an enlarged view of the gold and iron parts in Figure 2. This analysis result shows that the interface between the first and second layers of the low reflection film is not clear.
- Example 7 Example 8 Difficult Example 9 ⁇ Example 10
- Example 11 Severe Petit ⁇ . 89.45g 89.43g 89.45g 89.48g
- Mouth fem I (acid resistance) (%) 0.29 0.54 0.38 0.61 0.31 m Rv (tolerance (%) 0.32 0.20 0.49 0.52
- Enzyme rubbing abrasion test (appearance) ⁇ ⁇ ⁇ ⁇ ⁇ Abrasion taper abrasion test 1
- Titanium compound diisopropoxybisacetylacetonato titanium (same in the table below) Table 4
- the particle diameter of the gold fine particles in the low reflection film of the low reflection glass plate obtained in Examples 7, 9, 11, and 13 was measured, and the average primary particle diameter and the standard deviation of the gold fine particles in the low reflection film were measured. It was measured.
- the measuring method is as follows.
- Example 7 average primary particle diameter 6.40 nm, standard deviation 3.96 nm
- Example 9 average primary particle size 6.21 nm, standard deviation 2.52 nm
- Example 11 average primary particle size 9.69 nm, standard deviation 9.60 nm
- Example 13 average primary particle diameter 11.26 nm, standard deviation 13.22 nm
- Example 3 gold content 0.668535% iron content 1.42060%
- Example 7 gold content 0.220323% iron content 2.29401%
- FIG. 4 shows an ESC A spectrum obtained by measuring the atomic content (metal atomic%) in the low reflection film of the low reflection glass plate of Example 3.
- Comparative Example 2 has a high visible light reflectance at an incident angle of 60 °
- Comparative Example 3 has a low visible light transmittance, so that the object of the present invention cannot be achieved.
- a low-reflection film having a high low-reflection function even at incident angles of 5 ° and 60 ° and having good alkali resistance and acid resistance was obtained.
- the low-reflection glass plates of Examples 1 to 4 and 6 exhibited a single color.
- the film surface is composed of silicon and oxygen, and as shown in FIGS. 2 and 3, the presence of iron and gold can be confirmed near the glass substrate. Also, as shown in Fig. 2 and Fig. 3, the diffusion of gold has reached the position where iron is present, and therefore the sample is considered to be blue.
- the examples using nitrocellulose for both treatment solutions 1 and 2 showed good results in the fiber abrasion test, and it was found that they could be used under severe conditions.
- the presence or absence of a titanium compound in the treatment liquid 2 and the particle size of the gold fine particles in the film affect the wear resistance.
- the examples using nitrocellulose as the treatment liquid 1 and ethyl cellulose as the treatment liquid 2 have high transmittance and excellent low reflectivity.
- there was a difference in the presence or absence of the titanium compound in the treatment liquid 2 but no difference was observed in the abrasion resistance in the Taber abrasion test.
- the sample containing titanium has abrasion resistance containing iron. It was found that it was inferior to the sample to be performed.
- the organometallic compound of at least one metal selected from iron, titanium and zirconium is blended, the Since the film body containing the oxide of the compound and the fine gold particles coexist shows an absorption peak near 630 and the peak shape in the absorption curve is relatively broad, it is formed by the method of the present invention.
- the resulting film has an incident angle of 60, as well as light with an incident angle of 5 °. It has been found that there is an effect that the reflectance can be reduced with respect to the light.
- a treatment liquid comprising a combination of the treatment liquid (1) and the treatment liquid (2) is applied to the surface of the glass substrate, dried, and then fired to obtain a colored low-reflection glass plate.
- a low-reflection glass plate having excellent film-forming properties, good alkali resistance and acid resistance of the coating, a low Hz ratio, and a low reflectance can be obtained.
- This low reflection characteristic is effective not only for visible light at an incident angle of 5 ° but also for visible light at an incident angle of 60 °.
- the transparent glass substrate is a heat ray absorbing glass or a high heat ray absorbing glass such as a glass exhibiting a green color, a heat ray cutting effect can be obtained.
- the film formed on the low reflection glass plate obtained by the present invention is characterized in that the component changes in the film thickness direction, that is, the refractive index changes in the film thickness direction, and good reflection characteristics are obtained.
- the combination of the processing solution (1), the fine gold particles blended in the processing solution (2), and the film-forming compound can result in a low-reflection glass plate exhibiting a single color when applied on a substrate exhibiting a green color. it can.
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Composite Materials (AREA)
- Dispersion Chemistry (AREA)
- Surface Treatment Of Glass (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04706807A EP1588990A4 (en) | 2003-01-31 | 2004-01-30 | METHOD FOR PRODUCING A REFLECTION-LOW GLASS PLATE AND REFLECTION-SAID GLASS PLATE |
US11/178,453 US7276263B2 (en) | 2003-01-31 | 2005-07-12 | Process for producing low reflection glass plate, and low reflection glass plate |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003024774 | 2003-01-31 | ||
JP2003-024774 | 2003-01-31 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/178,453 Continuation US7276263B2 (en) | 2003-01-31 | 2005-07-12 | Process for producing low reflection glass plate, and low reflection glass plate |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004067465A1 true WO2004067465A1 (ja) | 2004-08-12 |
Family
ID=32820774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/000937 WO2004067465A1 (ja) | 2003-01-31 | 2004-01-30 | 低反射ガラス板の製造方法および低反射ガラス板 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7276263B2 (ja) |
EP (1) | EP1588990A4 (ja) |
KR (1) | KR101026656B1 (ja) |
CN (1) | CN100418914C (ja) |
WO (1) | WO2004067465A1 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008059700A1 (de) * | 2008-11-29 | 2010-06-02 | Eckart Gmbh | Eingefärbte Glaspartikel, Verfahren zu deren Herstellung und deren Verwendung |
CN105555567A (zh) * | 2013-09-18 | 2016-05-04 | 旭硝子株式会社 | 夹层玻璃及车用显示装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0422582A1 (en) * | 1989-10-09 | 1991-04-17 | Asahi Glass Company Ltd. | Process for manufacturing glass with functional coating |
JPH1176800A (ja) * | 1997-07-17 | 1999-03-23 | Nippon Paint Co Ltd | 貴金属又は銅の固体ゾル及び製造方法並びに塗料組成物及び樹脂成型物 |
EP1029832A1 (en) * | 1998-08-05 | 2000-08-23 | Nippon Sheet Glass Co., Ltd. | Antireflection colored film coated glass article and plasma display panel optical filter |
JP2004091286A (ja) * | 2002-09-02 | 2004-03-25 | Asahi Glass Co Ltd | 低反射ガラス板の製造方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5112693A (en) * | 1988-10-03 | 1992-05-12 | Ppg Industries, Inc. | Low reflectance, highly saturated colored coating for monolithic glazing |
JP2561537B2 (ja) | 1989-03-30 | 1996-12-11 | 真空冶金株式会社 | 金属ペースト及びその製造方法 |
JP2916085B2 (ja) * | 1994-08-31 | 1999-07-05 | 三ツ星ベルト株式会社 | ガラス着色用発色剤 |
CN1189813A (zh) * | 1996-03-07 | 1998-08-05 | 圣戈班玻璃制造公司 | 在玻璃上沉积反射层的方法及所获得的产品 |
JPH10231145A (ja) | 1996-11-21 | 1998-09-02 | Mitsuboshi Belting Ltd | 着色焼成膜の製造方法 |
US6068939A (en) * | 1996-11-21 | 2000-05-30 | Mitsuboshi Belting Ltd. | Colored and fired film and method for producing the same |
US6379803B1 (en) * | 1997-06-03 | 2002-04-30 | Nippon Sheet Glass Co., Ltd. | Low-reflectance glass article and process for preparing the same |
JP2000109345A (ja) * | 1998-08-05 | 2000-04-18 | Nippon Sheet Glass Co Ltd | 反射防止着色膜被覆ガラス物品およびプラズマディスプレイパネル用光学フィルタ |
JP2002194295A (ja) | 2000-12-27 | 2002-07-10 | Mitsuboshi Belting Ltd | 着色塗料および着色膜付きガラスの製造方法 |
JP4054669B2 (ja) | 2002-09-02 | 2008-02-27 | 三ツ星ベルト株式会社 | 低反射ガラス板の製造方法 |
-
2004
- 2004-01-30 WO PCT/JP2004/000937 patent/WO2004067465A1/ja active Application Filing
- 2004-01-30 KR KR1020057012517A patent/KR101026656B1/ko not_active IP Right Cessation
- 2004-01-30 CN CNB2004800030815A patent/CN100418914C/zh not_active Expired - Fee Related
- 2004-01-30 EP EP04706807A patent/EP1588990A4/en not_active Withdrawn
-
2005
- 2005-07-12 US US11/178,453 patent/US7276263B2/en not_active Expired - Fee Related
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0422582A1 (en) * | 1989-10-09 | 1991-04-17 | Asahi Glass Company Ltd. | Process for manufacturing glass with functional coating |
JPH1176800A (ja) * | 1997-07-17 | 1999-03-23 | Nippon Paint Co Ltd | 貴金属又は銅の固体ゾル及び製造方法並びに塗料組成物及び樹脂成型物 |
EP1029832A1 (en) * | 1998-08-05 | 2000-08-23 | Nippon Sheet Glass Co., Ltd. | Antireflection colored film coated glass article and plasma display panel optical filter |
JP2004091286A (ja) * | 2002-09-02 | 2004-03-25 | Asahi Glass Co Ltd | 低反射ガラス板の製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1588990A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP1588990A1 (en) | 2005-10-26 |
KR101026656B1 (ko) | 2011-04-04 |
EP1588990A4 (en) | 2008-07-09 |
US7276263B2 (en) | 2007-10-02 |
CN100418914C (zh) | 2008-09-17 |
KR20050089998A (ko) | 2005-09-09 |
CN1745044A (zh) | 2006-03-08 |
US20050243426A1 (en) | 2005-11-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3434320B2 (ja) | 鏡の製造方法およびこの方法により製造した鏡 | |
CN105517968B (zh) | 可热处理的涂覆玻璃板 | |
US6602541B1 (en) | Method of preparing vaporized antimony precursors | |
US5580364A (en) | Method of producing a coated glass substrate exhibiting reflected color | |
US8153265B2 (en) | Coated substrate and process for the production of a coated substrate | |
CN102548923B (zh) | 包含介电层的低辐射率玻璃及其制备方法 | |
EP1916547B1 (en) | Mirror and hydrophilic composite film having photo catalyst activity | |
WO2010106370A1 (en) | Coated substrate | |
CN101111783A (zh) | 带防反射膜的基体 | |
JP2007269523A (ja) | 熱線遮蔽ガラス及びその製造方法 | |
US20090084488A1 (en) | Method of preparing colorless and transparent f-doped tin oxide conductive film using polymer post-treatment process | |
WO2004067465A1 (ja) | 低反射ガラス板の製造方法および低反射ガラス板 | |
JP4409301B2 (ja) | 低反射ガラス板の製造方法 | |
CA2307070A1 (en) | Highly reflective, durable titanium/tin oxide films | |
JPH10202776A (ja) | 透明積層体及びその製法 | |
JP4054641B2 (ja) | 低反射ガラス板の製造方法 | |
JP4054669B2 (ja) | 低反射ガラス板の製造方法 | |
WO1998041481A1 (fr) | Composition permettant de former un revetement colore et procede de production d'un article en verre pourvu dudit revetement colore | |
JP2000335940A (ja) | 低反射ガラス物品 | |
EP4332069A1 (en) | Thermochromic coating with nanoparticles | |
WO2024029459A1 (ja) | ガラス物品 | |
JPH11228184A (ja) | 熱線遮蔽着色膜被覆ガラス板 | |
JP2000264679A (ja) | 緑色被膜ガラス基板及びその製造方法 | |
JPH10297938A (ja) | プライバシ−ガラス及びその製法 | |
JP2002338302A (ja) | 着色膜形成用塗布液およびその作製方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004706807 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020057012517 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11178453 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20048030815 Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 1020057012517 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2004706807 Country of ref document: EP |