WO2004034758A1 - セラミック多層基板の製造方法 - Google Patents
セラミック多層基板の製造方法 Download PDFInfo
- Publication number
- WO2004034758A1 WO2004034758A1 PCT/JP2003/010609 JP0310609W WO2004034758A1 WO 2004034758 A1 WO2004034758 A1 WO 2004034758A1 JP 0310609 W JP0310609 W JP 0310609W WO 2004034758 A1 WO2004034758 A1 WO 2004034758A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- ceramic
- multilayer substrate
- shrinkage
- green sheet
- ceramic green
- Prior art date
Links
- 239000000919 ceramic Substances 0.000 title claims abstract description 266
- 238000000034 method Methods 0.000 title claims description 49
- 239000000843 powder Substances 0.000 claims abstract description 63
- 238000010304 firing Methods 0.000 claims abstract description 25
- 239000002131 composite material Substances 0.000 claims abstract description 21
- 238000004506 ultrasonic cleaning Methods 0.000 claims abstract description 9
- 239000000758 substrate Substances 0.000 claims description 112
- 238000005507 spraying Methods 0.000 claims description 24
- 238000004519 manufacturing process Methods 0.000 claims description 23
- 239000002245 particle Substances 0.000 claims description 18
- 239000011344 liquid material Substances 0.000 claims description 12
- 238000004140 cleaning Methods 0.000 claims description 8
- 239000007788 liquid Substances 0.000 claims description 8
- 239000000126 substance Substances 0.000 claims description 6
- 238000010030 laminating Methods 0.000 claims description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 27
- 239000011521 glass Substances 0.000 abstract description 11
- 238000005245 sintering Methods 0.000 abstract description 8
- 230000005764 inhibitory process Effects 0.000 abstract 4
- 230000001629 suppression Effects 0.000 description 24
- 230000000052 comparative effect Effects 0.000 description 22
- 239000007789 gas Substances 0.000 description 22
- 239000004020 conductor Substances 0.000 description 21
- 238000009413 insulation Methods 0.000 description 9
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 8
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- 239000000203 mixture Substances 0.000 description 7
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 230000007423 decrease Effects 0.000 description 6
- 238000007747 plating Methods 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 239000003054 catalyst Substances 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 229910052763 palladium Inorganic materials 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 239000011230 binding agent Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 230000007613 environmental effect Effects 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 3
- 239000007921 spray Substances 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000005012 migration Effects 0.000 description 2
- 238000013508 migration Methods 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000004014 plasticizer Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000000243 solution Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- -1 anosite Chemical compound 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 229910052878 cordierite Inorganic materials 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- JSKIRARMQDRGJZ-UHFFFAOYSA-N dimagnesium dioxido-bis[(1-oxido-3-oxo-2,4,6,8,9-pentaoxa-1,3-disila-5,7-dialuminabicyclo[3.3.1]nonan-7-yl)oxy]silane Chemical compound [Mg++].[Mg++].[O-][Si]([O-])(O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2)O[Al]1O[Al]2O[Si](=O)O[Si]([O-])(O1)O2 JSKIRARMQDRGJZ-UHFFFAOYSA-N 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000003021 phthalic acid derivatives Chemical class 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 229910052845 zircon Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4803—Insulating or insulated parts, e.g. mountings, containers, diamond heatsinks
- H01L21/481—Insulating layers on insulating parts, with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4857—Multilayer substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
- H01L21/4814—Conductive parts
- H01L21/4846—Leads on or in insulating or insulated substrates, e.g. metallisation
- H01L21/4864—Cleaning, e.g. removing of solder
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/26—Cleaning or polishing of the conductive pattern
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0306—Inorganic insulating substrates, e.g. ceramic, glass
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/025—Abrading, e.g. grinding or sand blasting
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/02—Details related to mechanical or acoustic processing, e.g. drilling, punching, cutting, using ultrasound
- H05K2203/0285—Using ultrasound, e.g. for cleaning, soldering or wet treatment
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0736—Methods for applying liquids, e.g. spraying
- H05K2203/0746—Local treatment using a fluid jet, e.g. for removing or cleaning material; Providing mechanical pressure using a fluid jet
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4629—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating inorganic sheets comprising printed circuits, e.g. green ceramic sheets
Definitions
- the present invention relates to a method for manufacturing a ceramic multilayer substrate for mounting a semiconductor device, a chip capacitor, and the like.
- an unfired ceramic laminate is formed by laminating ceramic green sheets for a substrate, and firing the laminate.
- the unfired ceramic laminate is fired as it is, the unfired ceramic laminate shrinks during firing, resulting in dimensional errors.
- sintering is not performed on both main surfaces of the unfired ceramic laminate at the firing temperature of the unfired ceramic laminate.
- the ceramic for shrinkage suppression Green sheets After arranging ceramic green sheets for shrinkage suppression and firing at a temperature higher than the sintering temperature of the unfired ceramic laminate and lower than the sintering temperature of the ceramic green sheet for shrinkage suppression, the ceramic for shrinkage suppression Green sheets have been removed.
- a specific method for removing the shrinkage-suppressing ceramic green sheet a method described in WO 956510 is known.
- the first method is to spray ceramic powder with compressed air
- the second method is to spray water with compressed air
- the third method is to mix ceramic powder and water with compressed air. A method of spraying a mixture is mentioned.
- the spraying spot of the ceramic powder is small, the processing ability for removing the green sheet is low, and the positional accuracy with respect to the processing range is not high, so that processing unevenness may occur. As a result, it becomes difficult to uniformly remove the shrinkage suppressing ceramic green sheets. Furthermore, the equipment for collecting the dust of the ceramic powder to be sprayed and the powder of the removed ceramic green sheet for suppressing shrinkage is large and requires large-scale equipment, which increases the cost.
- the second method by using the second method, most of the ceramic green sheets for shrinkage suppression are removed. It is possible to do.
- this method may not be able to remove the shrinkage suppressing ceramic green sheet in the following cases.
- the firing when glass is contained in the unfired ceramic laminate, the firing combines the glass component of the unfired ceramic laminate with the ceramic component of the shrinkage suppressing ceramic green sheet to form a reaction layer. Sometimes. Simply spraying water with compressed air cannot sufficiently remove such a reaction layer.
- the green sheet can be removed more uniformly than the method of spraying the ceramic powder together with the compressed air. Also, its removal ability is higher than the method of spraying only water with compressed air.
- the ceramic powder to be sprayed in order to reuse the ceramic powder to be sprayed, the ceramic powder to be sprayed must have an average particle diameter close to or equal to the ceramic powder of the ceramic green sheet for shrinkage suppression. You need to use If the particle size of the ceramic powder to be sprayed is larger than the particle size of the ceramic powder of the ceramic green sheet for shrinkage suppression, it becomes difficult to remove the ceramic powder of the ceramic green sheet for shrinkage suppression with a filter. This is because the average particle size of the ceramic powder to be sprayed changes over time.
- the state of removal of the shrinkage-suppressing ceramic green sheet changes, making uniform processing difficult.
- the ceramic powder to be sprayed is smaller than the particle size of the ceramic powder of the ceramic green sheet for shrinkage suppression, the ceramic powder of the ceramic green sheet for shrinkage suppression can be removed with a filter.
- ceramic powder having an extremely different average particle size is used, a part of the sprayed ceramic powder will be removed by the filter, and the average particle size of the sprayed ceramic powder will increase over time. The diameter changes. As a result, the state of removal of the shrinkage-suppressing ceramic green sheet changes, making uniform processing difficult.
- the present invention has been made in view of the above-described conventional situation, and has been made to uniformly remove the shrinkage-suppressing ceramic green sheet when manufacturing a ceramic multilayer substrate using the shrinkage-suppressing ceramic green sheet.
- the purpose is to provide a method that can be used. Disclosure of the invention
- the present invention provides an unfired ceramic laminated body formed by laminating a plurality of ceramic green sheets for a substrate, and at least one principal surface of the unfired ceramic laminated body, A ceramic green sheet for suppressing shrinkage that does not substantially sinter at the firing temperature of the body; and a step of preparing a composite laminate comprising: A step of firing the layer body at a temperature at which the unfired ceramic laminate is sintered, which is lower than a temperature at which the shrinkage-suppressing ceramic green sheet is sintered; and Removing a ceramic green sheet for shrinkage suppression after firing from the body, a method for manufacturing a ceramic multilayer substrate, comprising: removing the ceramic green sheet for shrinkage suppression after the firing.
- the method for manufacturing a ceramic multilayer substrate of the present invention may further include a step of ultrasonically cleaning the ceramic multilayer substrate as a third removing step following the first removing step and the second removing step. Is desirable.
- the method further includes, as a third removing step following the first removing step and the second removing step, a step of spraying a liquid material (particularly water) and a compressed gas (particularly air) onto the main surface of the ceramic multilayer substrate. Desirable.
- the ceramic multilayer sheet for shrinkage suppression is mainly formed by the first removing step of spraying a liquid substance and a compressed gas onto the shrinkage suppression ceramic green sheet.
- the portion that has not reacted with the glass component of the first removal process can be removed, and then most of the residue that could not be removed in the first removal process can be removed by the second removal process in which the ceramic powder, liquid material and compressed gas are sprayed. Can be removed.
- the second removal process in which the ceramic powder, liquid material and compressed gas are sprayed.
- FIG. 1 is a schematic sectional view showing a ceramic multilayer substrate according to the present invention.
- FIG. 2 is a schematic process diagram illustrating a method for manufacturing a ceramic multilayer substrate according to the present invention.
- FIG. 3 is a schematic process diagram illustrating a method for manufacturing a ceramic multilayer substrate according to the present invention.
- FIG. 4 is a schematic sectional view showing a comb-shaped electrode on a ceramic multilayer substrate according to the present invention.
- FIG. 5 is a schematic diagram showing migration at an electrode on a ceramic multilayer substrate.
- the composite laminate 1 has ceramic green sheets 2 for shrinkage suppression on both main surfaces of an unfired ceramic laminate 4 formed by laminating a plurality of ceramic green sheets 2 for a substrate and a conductor layer 3.
- Sheet 5 is laminated and crimped.
- via conductors 6 are formed inside the composite laminate 1 and connect the conductor layers 3 having different height positions.
- the shrinkage suppression ceramic green sheet 5 may be provided only on one main surface.
- the ceramic green sheet 2 for a substrate is prepared, for example, by adding a binder, a plasticizer, and a solvent to a ceramic powder and mixing the resulting mixture with a ball mill or an attractor to form a slurry.
- a sheet shaped into about 200 / m can be used.
- LTCC Low Temperature Co-Fi red Ceram ic
- the binder for example, polyvinyl butyral, methacrylic polymer, acrylic polymer and the like can be used.
- the plasticizer for example, a derivative of phthalic acid can be used.
- solvent for example, alcohols, ketones, and chlorinated organic solvents can be used.
- the conductor layer 3 includes a so-called surface conductor layer and an inner conductor layer.
- a conductor paste containing a metal powder such as Ag or Cu is printed on the ceramic green sheet 2 for a substrate by screen printing. It is formed by this.
- the via conductor 6 provided in the composite laminate 1 is formed, for example, by filling a via hole provided in the ceramic green sheet 2 for a substrate with the conductor paste.
- the shrinkage-suppressing ceramic green sheet 5 is manufactured by the same manufacturing method as that of the ceramic green sheet 2 for a substrate.
- the sintering temperature is higher than the temperature at which the ceramic green sheet for a substrate 2 sinters.
- the ceramic powder contained in the shrinkage suppressing ceramic green sheet 5 may be, for example, aluminum powder. , Zirconium oxide, aluminum nitride, boron nitride, mullite, magnesium oxide, and silicon carbide can be used.
- the average particle size of these ceramic powders is preferably 0.5 to 4 im. If the particle size is coarse, the force of controlling shrinkage of the ceramic green sheet for a substrate may be weak, and the surface of the obtained ceramic multilayer substrate may be rough.
- the pressure for pressure contact is 10 to 20 OMPa, and the temperature is The temperature is preferably from 40 ° C to 90 ° C.
- the firing temperature at this time is a temperature at which the unfired ceramic laminate 4, that is, the ceramic green sheet for a substrate, is sintered, and must be lower than the sintering temperature of the shrinkage suppressing ceramic green sheet 5.
- the shrinkage suppressing ceramic green sheet does not sinter during firing, that is, the shrinkage suppressing ceramic green sheet does not shrink during firing, so that shrinkage of the ceramic laminate in the plane direction is suppressed. This is considered to be due to the fact that the glass component that oozes out of the ceramic laminate during firing and the ceramic green sheet for suppressing shrinkage react with each other to form a reaction layer at the interface. Therefore, even if the conductor pattern provided on the ceramic laminate is subjected to the firing treatment, the positional accuracy is maintained, and the disconnection hardly occurs.
- a liquid material is sprayed on the ceramic green sheet for suppressing shrinkage together with the compressed gas.
- the ceramic green sheet for shrinkage suppression is in a porous state because organic components such as a binder have been burned off.
- the liquid material an acidic aqueous solution, an alkaline aqueous solution, an organic solvent, or the like can be used, but water is particularly preferable in consideration of environmental resistance and cost efficiency.
- Nitrogen gas can also be used as the compressed gas, but compressed air is particularly desirable in view of cost efficiency.
- a method using a blast nozzle can be mentioned. That is, first, the ceramic multilayer substrate 24 having undergone the firing step is placed on the support 7. Next, the enclosure 8 (here, water) is sprayed onto the ceramic green sheet 25 for shrinkage suppression provided on one main surface of the ceramic multilayer substrate 24 while being accelerated by a compressed gas 9. At this time, a mixture 11 of water 8 and compressed gas 9 is discharged from nozzle 10 which is a discharge port of the blast nozzle. Next, the mixture 11 is sprayed continuously while the nozzle 10 is sequentially scanned in the direction of arrow A in the figure.
- the enclosure 8 here, water
- the pressure of the compressed gas is desirably 1 47 to 539 kPa. If the treatment is performed at a pressure of less than 147 kPa, the spraying pressure is too low, and the processing ability for removing the ceramic green sheet for suppressing shrinkage is inferior, leading to a decrease in productivity. Conversely, if the treatment is performed at a pressure of 539 kPa or more, the pressure will accelerate the deterioration of the nozzle 10, increase the consumption of the compressed gas 9, increase the running cost, and reduce the ceramic multilayer substrate 24. May be damaged.
- the pressure of the compressed gas is the pressure in the pipe before spraying.
- the first removing step When the first removing step is performed, a portion of the ceramic green sheet 25 for suppressing shrinkage that is not mainly reacted with the glass component of the ceramic multilayer substrate 24 is removed by the pressure of the mixture 11. You. As a result, at the stage after the first removal step, both the main surfaces of the ceramic multilayer substrate 24 mainly react with the ceramic green sheet 25 for suppressing shrinkage and the glass component of the ceramic multilayer substrate 24. The remaining reaction layer remains as a residue. Further, the unreacted portion of the shrinkage suppressing ceramic green sheet 25 that has not reacted with the glass component of the ceramic multilayer substrate 24 may not be removed in the first removing step and may remain as a residue. In FIG. 2, the state in which the shrinkage-reducing ceramic green sheet 25 has been removed is exaggerated, and the residue of the shrinkage-reducing ceramic green sheet 25 is not shown.
- the powder to be recovered in the first removal step is substantially only the ceramic powder of the ceramic green sheet for suppressing shrinkage, so that the powder is efficiently recovered, and particularly, as the ceramic powder used for the ceramic green sheet for suppressing shrinkage, Can be reused.
- a ceramic powder and a liquid material are sprayed together with the compressed gas on both main surfaces of the ceramic multilayer substrate having undergone the first removing step.
- this method for example, there is a method of spraying using a blast nozzle as in the method described in the description of the first removing step.
- a mixture of ceramic powder and water is injected as an enclosure 8, and a mixture of ceramic powder, water and compressed air is discharged from a nozzle 10.
- the liquid substance an acidic aqueous solution, an alkaline aqueous solution, an organic solvent and the like can be used, but water is particularly preferable in consideration of environmental resistance and cost efficiency.
- the compressed gas nitrogen gas or the like can be used, but compressed air is particularly preferable in consideration of cost efficiency.
- the pressure of the compressed gas at this time is desirably 98 to 343 kPa. If the treatment is performed at 98 kPa or less, the spray pressure is too low, and the ability to remove the shrinkage-suppressing ceramic green sheet is inferior, leading to a decrease in productivity. If the treatment is carried out at more than 3 4 3 kPa, cracks are likely to occur at the interface between the surface conductor layer and the ceramic multilayer substrate, causing a decrease in the adhesive strength between the conductor layer and the composite laminate. Problems such as peeling May occur. Further, it is desirable that the pressure at this time be lower than the pressure at the time of the first removal step.
- the ceramic powder is used as abrasive grains in the second removal step, if the pressure of the compressed air here is higher than the pressure in the first removal step, the surface properties of the ceramic multilayer substrate, especially However, the surface property of the surface conductor layer of the ceramic multilayer substrate may be deteriorated.
- the average particle size of the ceramic powder to be sprayed is preferably 9.5 to 40 jUm. If a ceramic powder having an average particle size of less than 9.5 ⁇ m is used, the productivity of the ceramic green sheet for suppressing shrinkage may be reduced, resulting in a reduction in productivity. Conversely, if a ceramic powder with an average particle size of more than 4 Om is used, the impact force at the time of spraying will be large, and cracks will easily occur at the interface between the conductor layer and the composite laminate. This may cause problems such as peeling of the conductor layer in the plating process. In addition, the large particle size also causes problems such as an uneven processing of the wiring, particularly in a portion having a narrow wiring interval.
- the first removal step of both main surfaces of the ceramic multilayer substrate is performed by the physical action of the liquid material (particularly water), ceramic powder and compressed gas (particularly compressed air). Most of the trace residues that could not be removed are removed. Since the powder recovered in the second removal step is substantially only the ceramic powder sprayed with water, the powder can be efficiently recovered and reused particularly as the ceramic powder for spraying. it can.
- the ceramic multilayer substrate that has been subjected to the first and second removal steps is subjected to ultrasonic cleaning.
- a cleaning liquid 13 is put into a cleaning tank 12
- a ceramic multilayer substrate 24 to be cleaned is put into a cleaning basket 14 provided in the cleaning tank 12
- Ultrasonic waves are irradiated into the cleaning liquid 13 using the ultrasonic vibrator 16 connected to the ultrasonic wave oscillator 15.
- the washing liquid include an aqueous methylene chloride solution and an aqueous trichloroethylene solution.
- the ceramic multilayer substrate 24 be stored in the cleaning basket 14 in a standing state, since both sides can be processed simultaneously. In this step, residues that could not be completely removed in the first and second removal steps and ceramic powder that was sprayed and remained on the surface in the second removal step are removed.
- the vibrator frequency at the time of performing ultrasonic cleaning is desirably 40 to 100 kHz.
- the cavitation force is strong, so that the substrate may have a large deflection during processing, and the substrate may be broken if the substrate is thin.
- the portion close to the oscillator oscillating portion has a large damage to the conductor layer, and the conductor layer may be destroyed.
- the cavity force increases, the ability to remove the ceramic powder that has entered the porous portions of the ceramic layer and the conductor layer is reduced, which may cause problems such as nonuniform plating and abnormal deposition. 1
- the cavitation force will be extremely weak, and the effect of removing ceramic powder (sprayed ceramic powder) remaining on the surface of the ceramic multilayer substrate will be weak. May lead to a decline.
- the output per unit area of the ultrasonic vibrator is 0.2 to 2. It is desirable that the O WZ cm 2. If the treatment is performed at 0.2 W / cm 2 or less, the effect of removing ceramic powder (sprayed ceramic powder) remaining on the surface of the ceramic multilayer substrate is weakened, which may lead to a reduction in productivity. Conversely, when processing is performed at 2. O WZ cm 2 or more, the substrate may have a large deflection during processing, and may be broken if the substrate becomes thin. In addition, the portion close to the vibrator oscillation portion is greatly damaged to the conductor layer, and the conductor layer may be destroyed in some cases. In addition, the ability to remove ceramic powder that has entered the porous portions of the ceramic and conductor layers is reduced, which may cause problems such as non-uniform plating and abnormal deposition.
- the ceramic powder sprayed in the removing step is removed.
- a composite laminate having ceramic green sheets for suppressing shrinkage on both main surfaces is prepared, and the first and second removal steps are performed.
- a liquid material is sprayed together with the compressed gas on the ceramic multilayer substrate that has undergone the first and second removal steps.
- a method using a blast nozzle performed in the first removal step of the first embodiment may be mentioned.
- the liquid material an acidic aqueous solution, an alkaline aqueous solution, an organic solvent, or the like can be used, but water is particularly preferable in consideration of environmental resistance and cost efficiency.
- Nitrogen gas or the like can be used as the compressed gas, but compressed air is particularly preferable in consideration of cost efficiency.
- the pressure of the compressed gas is desirably 1 47 to 539 kPa. If the treatment is performed at a pressure of less than 147 kPa, the spraying pressure is too low, and the processing ability for removing the ceramic green sheet for suppressing shrinkage is inferior, leading to a decrease in productivity. Conversely, if the treatment is performed at a pressure of 539 kPa or more, the pressure will accelerate the deterioration of the nozzle 10, increase the consumption of the compressed gas 9, increase the running cost, and reduce the ceramic multilayer substrate 24. May be damaged. Further, it is desired that the pressure at this time is higher than the pressure during the second removal step. That is, If the pressure of the compressed air here is smaller than the pressure in the second removal step, it will be difficult to remove the ceramic powder (sprayed ceramic powder) that has infiltrated the surface of the ceramic multilayer substrate during the second removal step. .
- the comb-shaped electrode 17 has a first electrode finger 18 a formed on the first terminal 18 and a second electrode finger formed on the second terminal 19. 19a are formed so as to face each other on the ceramic green sheet 2 for a substrate, and the width of the first electrode finger 18a and the second electrode finger 19a is 100 m. The distance between the first electrode finger 18a and the second electrode finger 19a is 100 m.
- alumina powder having an average particle size of 1.8 m 15 parts by weight of polyvinyl butyral, 40 parts by weight of isopropyl alcohol, and 20 parts by weight of trolley were added, and mixed with a pole mill for 24 hours.
- a ceramic green sheet having a thickness of 120 ⁇ m was prepared from this slurry by a doctor blade method, and a ceramic green sheet for suppressing shrinkage was prepared.
- the ceramic green sheet for a substrate was sintered by applying pressure at a temperature of 900 ° C. for 1 hour.
- a first removal step water was added to the ceramic green sheets for shrinkage suppression provided on both main surfaces of the ceramic multilayer substrate together with each of the compressed air of 147 to 539 kPa shown in Table 1. Spraying was performed for 120 seconds.
- a second removal step water and each alumina powder having an average particle diameter of 9.5 to 40 ⁇ m shown in Table 1 were added to the residue on the ceramic multilayer substrate having undergone the first removal step for 98 to 343 k. Spraying was performed for 120 seconds together with each compressed air of Pa.
- the ultrasonic vibrator frequency 40 to 100 kHz shown in Table 1 and the output per unit of the ultrasonic vibrator are applied to the ceramic multilayer substrate having undergone the first and second removing steps.
- Ultrasonic cleaning was performed at 0.2 to 2. OWZ cm 2 for 300 seconds.
- ceramic multilayer substrates of sample numbers 1 to 8 were produced.
- the ceramic green sheets for shrinkage suppression were removed without going through the second removal step.
- the first removal step water was sprayed onto the ceramic green sheets for shrinkage suppression provided on both main surfaces of the ceramic multilayer substrate for 120 seconds together with 539 kPa compressed air.
- ultrasonic cleaning was performed for 300 seconds at an ultrasonic oscillator frequency of 40 KHz and an output of 0.2 cm 2 per unit area of the ultrasonic oscillator.
- a composite laminate was prepared and fired under the same conditions as in Example 1 to prepare 20 samples.
- the second and third removing steps were performed on the 20 samples to remove the shrinkage-suppressing ceramic green sheets.
- the second removing step water and alumina powder having an average particle size of 9.5 jum are compressed with compressed air of 98 kPa on both main surfaces of the shrinkage suppressing ceramic green sheets provided on both main surfaces of the ceramic multilayer substrate.
- 20 substrates were subjected to an ultrasonic oscillator frequency of 40 KHz, an output of the ultrasonic oscillator per unit area of 0.2 / cm 2 of 300/300. Ultrasonic cleaning was performed for 2 seconds.
- the second and third removal steps were performed one by one from the first to the twentieth.
- Example Nos. 1 to 8 comparative example 1, comparative examples 2a and 2b
- Table 1 shows the X with the removal unevenness as X.
- Example 2 In the same manner as in Example 1, a ceramic multilayer substrate provided with ceramic green sheets for shrinkage suppression on both main surfaces was prepared, and the first and second removal steps were performed under the conditions shown in Table 2. Next, as a third removing step, water shown in Table 2 was sprayed on the ceramic multilayer substrate having undergone the first and second removing steps together with each compressed air of 147 to 539 kPa for 120 seconds.
- a composite laminate was produced and fired, and then the shrinkage-suppressing ceramic green sheet was removed without going through the second removal step. That is, as the first removal step, water is sprayed on compressed ceramic air at 539 kPa for 120 seconds to the ceramic green sheets for shrinkage suppression provided on both main surfaces of the ceramic multilayer substrate, and then the third removal step is performed. As a process, water was sprayed for 120 seconds together with compressed air of 147 to 539 kPa. Through the above steps, a ceramic multilayer substrate of Comparative Example 3 was produced.
- Example 2 According to the same manufacturing conditions as those described in the description of Example 2, to produce a composite laminate, by baking, 20 samples were prepared. Without passing through the first removing step, the second and third removing steps were performed on the 20 samples to remove the shrinkage-suppressing ceramic green sheets. In the second removing step, water and alumina powder having an average particle size of 9.5 im of 98 kPa were applied to both main surfaces of the ceramic green sheet for shrinkage suppression provided on both main surfaces of the ceramic multilayer substrate. After spraying with compressed air for 120 seconds, as a third removal step, water is sprayed on 20 substrates with compressed air of 1 47 to 539 kPa for 120 seconds. Was.
- the second and third removal steps were performed in order from the first to the 20th one by one.
- a ceramic multilayer substrate of Comparative Example 4a (first) and a ceramic multilayer substrate of Comparative Example 4b (20th) were produced.
- Example numbers 9 to 14, comparative example 3, comparative examples 4a and 4b The appearance of each sample (sample numbers 9 to 14, comparative example 3, comparative examples 4a and 4b) of each ceramic multilayer substrate manufactured in Example 2 and Comparative Examples 3 and 4 was not removed, and was uniform.
- Table 2 shows the values as 0 and those with uneven removal as X.
- a palladium catalyst was applied to each sample of each ceramic multilayer substrate, and then washed to form palladium catalyst nuclei on the comb-shaped electrode portions.
- the electrode portion was plated with nickel. 8 for comb-shaped electrodes
- the insulation resistance was measured by applying a voltage of 50 V for 100 hours under the conditions of 5 ° C ⁇ 85 ”1 ⁇ 2RH. Table 2 shows the measurement results.
- the ceramic green sheet for suppressing shrinkage could be evenly removed, and a good insulation resistance value could be maintained.
- Comparative Example 1 On the other hand, in Comparative Example 1, there is an appearance of uneven removal, and the insulation resistance value is 5 or less.
- the first ceramic multilayer substrate did not have the appearance of uneven removal, but the 20th ceramic multilayer substrate had the appearance of uneven removal, and the insulation resistance value was 1 piece.
- the Log IR was 9 or more for the second ceramic multilayer substrate, but the Log IR was 5 or less for the 20th ceramic multilayer substrate. In other words, it was revealed that the repetition of the second removal step reduced the ability to remove the shrinkage-suppressing ceramic green sheet.
- the first ceramic multilayer substrate did not have the appearance of uneven removal, but the 20th ceramic multilayer substrate had the appearance of uneven removal, and the insulation resistance value was 1 piece.
- the Log IR was 9 or more for the second ceramic multilayer substrate, but the Log IR was 5 or less for the 20th ceramic multilayer substrate. In other words, it was clarified that the repetition of the second removal step reduced the ability to remove the shrinkage-reducing ceramic green sheet.
- the insulation resistance value of the 20th ceramic multilayer substrate of Comparative Examples 1 and 3 and Comparative Examples 2 and 4 was reduced for the following reason.
- the residue 20 of the ceramic green sheet for suppressing shrinkage is present on the surface of the ceramic multilayer substrate 34, so that the end surface 17a of the electrode 17 of the comb-shaped electrode is used for suppressing shrinkage.
- the residue 20 is porous, Ag migration occurs in the direction indicated by the arrow in the portion where the plating 21 is not applied, and as a result, the insulation resistance value decreases.
- the method for manufacturing a ceramic multilayer substrate of the present invention is suitable for efficiently manufacturing a ceramic multilayer substrate having high dimensional accuracy.
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Ceramic Engineering (AREA)
- Devices For Post-Treatments, Processing, Supply, Discharge, And Other Processes (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
Claims
Priority Applications (4)
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DE10393466T DE10393466T5 (de) | 2002-10-10 | 2003-08-22 | Verfahren zum Erzeugen eines Keramik-Mehrschicht-Substrats |
JP2004542808A JP3649246B2 (ja) | 2002-10-10 | 2003-08-22 | セラミック多層基板の製造方法 |
US10/530,374 US7148136B2 (en) | 2002-10-10 | 2003-08-22 | Method of producing ceramic multi-layer substrate |
AU2003257659A AU2003257659A1 (en) | 2002-10-10 | 2003-08-22 | Process for producing ceramic multilayer board |
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JP2002297837 | 2002-10-10 | ||
JP2002-297837 | 2002-10-10 |
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US (1) | US7148136B2 (ja) |
JP (1) | JP3649246B2 (ja) |
AU (1) | AU2003257659A1 (ja) |
DE (1) | DE10393466T5 (ja) |
TW (1) | TWI226815B (ja) |
WO (1) | WO2004034758A1 (ja) |
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KR102107985B1 (ko) * | 2019-06-05 | 2020-05-07 | 주식회사 케이에스엠컴포넌트 | 플라즈마 처리 장치용 세라믹 구조체 및 그의 제조방법 |
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JP4926481B2 (ja) * | 2006-01-26 | 2012-05-09 | 共立エレックス株式会社 | 発光ダイオード用パッケージ及び発光ダイオード |
TW200932081A (en) * | 2008-01-11 | 2009-07-16 | Murata Manufacturing Co | Multilayer ceramic substrate, method for manufacturing multilayer ceramic substrate and method for suppressing warpage of multilayer ceramic substrate |
WO2009110338A1 (ja) * | 2008-03-03 | 2009-09-11 | 株式会社村田製作所 | セラミック基板の製造方法およびセラミック基板 |
KR101004942B1 (ko) * | 2008-08-29 | 2010-12-28 | 삼성전기주식회사 | 다층 세라믹 기판 제조방법 |
CN110545924A (zh) | 2017-04-13 | 2019-12-06 | 康宁股份有限公司 | 涂覆带材 |
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EP0993242A1 (en) * | 1998-04-24 | 2000-04-12 | Matsushita Electric Industrial Co., Ltd. | Method of producing ceramic multilayer substrate |
JP2000277914A (ja) * | 1999-03-23 | 2000-10-06 | Murata Mfg Co Ltd | 多層セラミック基板の製造方法 |
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US5254191A (en) | 1990-10-04 | 1993-10-19 | E. I. Du Pont De Nemours And Company | Method for reducing shrinkage during firing of ceramic bodies |
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- 2003-08-22 DE DE10393466T patent/DE10393466T5/de not_active Ceased
- 2003-08-22 AU AU2003257659A patent/AU2003257659A1/en not_active Abandoned
- 2003-08-22 WO PCT/JP2003/010609 patent/WO2004034758A1/ja active Application Filing
- 2003-08-22 JP JP2004542808A patent/JP3649246B2/ja not_active Expired - Fee Related
- 2003-08-22 US US10/530,374 patent/US7148136B2/en not_active Expired - Lifetime
- 2003-09-05 TW TW092124642A patent/TWI226815B/zh not_active IP Right Cessation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
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EP0993242A1 (en) * | 1998-04-24 | 2000-04-12 | Matsushita Electric Industrial Co., Ltd. | Method of producing ceramic multilayer substrate |
JP2000277914A (ja) * | 1999-03-23 | 2000-10-06 | Murata Mfg Co Ltd | 多層セラミック基板の製造方法 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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KR102107985B1 (ko) * | 2019-06-05 | 2020-05-07 | 주식회사 케이에스엠컴포넌트 | 플라즈마 처리 장치용 세라믹 구조체 및 그의 제조방법 |
US11456158B2 (en) | 2019-06-05 | 2022-09-27 | Ksm Component Co., Ltd. | Ceramic structure for plasma processing apparatus and manufacturing method thereof |
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JP3649246B2 (ja) | 2005-05-18 |
TW200420214A (en) | 2004-10-01 |
US20050269012A1 (en) | 2005-12-08 |
JPWO2004034758A1 (ja) | 2006-02-09 |
DE10393466T5 (de) | 2005-10-13 |
US7148136B2 (en) | 2006-12-12 |
AU2003257659A1 (en) | 2004-05-04 |
TWI226815B (en) | 2005-01-11 |
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