WO2004024401A1 - Procede d'apprentissage et systeme de traitement - Google Patents

Procede d'apprentissage et systeme de traitement Download PDF

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Publication number
WO2004024401A1
WO2004024401A1 PCT/JP2003/011734 JP0311734W WO2004024401A1 WO 2004024401 A1 WO2004024401 A1 WO 2004024401A1 JP 0311734 W JP0311734 W JP 0311734W WO 2004024401 A1 WO2004024401 A1 WO 2004024401A1
Authority
WO
WIPO (PCT)
Prior art keywords
pick
transport mechanism
movement
processing system
target position
Prior art date
Application number
PCT/JP2003/011734
Other languages
English (en)
Japanese (ja)
Inventor
Motohiro Kumagai
Shigeru Ishizawa
Hiroaki Saeki
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Publication of WO2004024401A1 publication Critical patent/WO2004024401A1/fr
Priority to US11/075,707 priority Critical patent/US20050220582A1/en

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00—Manipulators not otherwise provided for
    • B25J11/0095—Manipulators transporting wafers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00—Programme-controlled manipulators
    • B25J9/06—Programme-controlled manipulators characterised by multi-articulated arms
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00—Programme-controlled manipulators
    • B25J9/16—Programme controls
    • B25J9/1656—Programme controls characterised by programming, planning systems for manipulators
    • B25J9/1664—Programme controls characterised by programming, planning systems for manipulators characterised by motion, path, trajectory planning
    • B25J9/1666—Avoiding collision or forbidden zones
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Programme-control systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67276—Production flow monitoring, e.g. for increasing throughput
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/36—Nc in input of data, input key till input tape
    • G05B2219/36468—Teach and store intermediate stop position in moving route to avoid collision

Definitions

  • the present invention relates to a processing system for performing a predetermined processing on an object to be processed such as a semiconductor wafer, and a teaching method of a transport mechanism used for the processing system. Background technology
  • a semiconductor integrated circuit In order to manufacture a semiconductor integrated circuit, various processes such as film formation, etching, oxidation, and diffusion are performed on a wafer. In order to improve throughput and yield due to miniaturization and high integration of semiconductor integrated circuits, a plurality of processing units performing the same process or a plurality of processing units performing different processes are provided in a common transport chamber. A so-called clustered processing system device, which is capable of continuous processing of various processes without exposing the wafer to the atmosphere, is already known.
  • a semiconductor wafer is taken out from a cassette container installed at an introduction port of an object to be processed, which is provided in a preceding stage of the processing system, using a transfer mechanism, and the semiconductor wafer is taken out of the transfer chamber on the introduction side of the processing system.
  • the wafer is positioned by an orienter that performs positioning, it is carried into a vacuum-equipped mouth lock chamber, and the wafer is subjected to a plurality of vacuum processes.
  • the wafers are transferred into a common transfer chamber in a vacuum atmosphere connected to the surroundings using another transfer mechanism, and the wafers are sequentially introduced into the respective processing chambers with the common transfer chamber as the center to continuously process. Is supposed to do it.
  • the processed wafer is stored in the original cassette container, for example, via the original path.
  • this type of processing system has a single or multiple transfer mechanisms inside, and the transfer and transfer of wafers are automatically performed by these transfer mechanisms. .
  • This transfer mechanism is, for example, a multi-joint that can move horizontally, bend, extend, turn, and move up and down.
  • the pick-up provided at the end of the arm directly holds the wafer, horizontally moves to the transfer position, and transfers the wafer to a predetermined position. In this case, it is necessary to avoid interference or collision of the arm, pick or holding wafer with other members during the operation of the transfer mechanism, and the wafer placed in a certain place must be properly removed. It is necessary to hold the wafer, transfer the wafer to a target position, and deliver it to an appropriate place with high accuracy, for example, high positional accuracy within ⁇ 0.2 O mm.
  • an important position such as a place for transferring the wafer W in the movement path of the pick of the transfer mechanism is controlled by controlling the operation of the transfer mechanism.
  • a so-called teaching operation is performed in which a control unit such as a computer learns the position coordinates.
  • This teaching includes, for example, the positional relationship between the transport mechanism and the cassette container, the positional relationship between the pick for picking up wafers and each shelf of the cassette container in the height direction, the positional relationship between the loading table in the load lock chamber and the pick, The positional relationship between the pick and the orienter, the positional relationship between the pick and the susceptor in each processing chamber, and the like is performed in almost all cases for transferring the wafer, and the position coordinates are stored. It is a matter of course that all drive systems incorporate an encoder or the like for specifying the drive position.
  • the position coordinates of the position where the entire device should be taught are determined from the design values of the device with reference to a certain point on the moving path of the transport mechanism as the absolute reference.
  • the information is input and stored in the control unit in advance.
  • each temporary position coordinate is input in consideration of a predetermined margin so that the pick does not interfere with other members.
  • the operation of the transport mechanism is switched to manual (hereinafter also referred to as manual).
  • manual hereinafter also referred to as manual.
  • the picking operation is performed while visually checking that the positioning substrate previously installed at a predetermined position in the cassette container is in contact with an appropriate position, and the coordinates are stored as position coordinates in the control unit. And teaching.
  • the above-mentioned alignment substrates are respectively set at the centers of these, and the corresponding picks are first interfered. Automatically move to a safe nearby position, and then move it manually to match the two exactly as described above and store the position coordinates at that time in the control unit.
  • the positioning substrate is made of, for example, a transparent plate, on which a pick to be aligned and a contour of another mounting table or the like are drawn in advance.
  • the manual operation means that the moving direction (+ / _) and the moving amount are input to the control unit using a keyboard or a joystick, and the arm including the pick is operated. .
  • the transport mechanism itself is automatically moved to a sufficiently safe position in the vicinity of the target position to be taught, and then the manual operation is performed while visually confirming the safety.
  • the pick is moved by a small distance in the horizontal and vertical directions to move the pick to the target position.
  • An object of the present invention is to provide a teaching method and a processing system capable of greatly reducing and shortening a teaching operation time.
  • the present inventors have conducted intensive studies on shortening the teaching operation time, and as a result, even after automatically moving the transport mechanism to the vicinity of the target position, pay attention to the pick of the transport mechanism at a specific location.
  • the present invention was achieved by obtaining the knowledge that there is a certain part that can be automatically moved before reaching the target position if it is adjusted and moved.
  • the teaching method according to the present invention is a teaching method in which a movement target position of the transport mechanism in a processing system including a transport mechanism for holding and transporting an object to be processed by a pick is stored in a control unit.
  • the transportation mechanism pauses to confirm that there is no interference with other members at the point of caution where there is a risk of interference with other members.
  • the position of the pick is adjusted or moved when the pick-up target position is reached or the pick target is moved to the control means without being adjusted.
  • the transport mechanism is temporarily stopped only at places (points) where the transport mechanism may interfere with other members, and the position is adjusted if necessary. If the transport mechanism does not interfere with other members, the transport mechanism is stopped. Since the robot is automatically and positively moved, the time required for teaching operation can be significantly reduced as a whole.
  • the transport mechanism can be adjusted and moved to a position where there is no risk of interfering with other members.
  • the interference caution point may be calculated and obtained in advance by the control means based on a design dimension of the processing system.
  • control means can display a message for calling attention to interference to the operator on the display unit every time the transport mechanism is temporarily stopped. As described above, a message for calling attention to interference is displayed on the display unit, so that the operator recognizes this message, thereby more reliably preventing the transport mechanism from interfering with other members. Becomes possible.
  • the transport mechanism has a multi-joint arm that can be bent and extended and turned.
  • the movement target position is a predetermined position in an introduction port for taking the object to be processed into the processing system.
  • a processing system includes a processing chamber for performing a predetermined process on a processing target, an introduction port for introducing the processing target, an orienter for positioning the processing target, and holding the processing target.
  • a processing system comprising: a transport mechanism having a pick for transporting an object to be processed; and control means for controlling the operation of the transport mechanism, wherein the control means moves the transport mechanism to a temporary movement target position.
  • control unit may calculate and obtain the interference attention point in advance based on a design dimension of the processing system.
  • control unit is connected to a display unit, and the control unit may cause the display unit to display a message for calling attention to an operator on the display unit every time the transport mechanism is temporarily stopped. it can.
  • FIG. 1 is a configuration diagram showing an example of a processing system for implementing the teaching method of the present invention.
  • FIG. 2 is a schematic diagram of the processing system shown in FIG.
  • FIG. 3 is a schematic configuration diagram showing an introduction port.
  • FIG. 4 is a schematic configuration diagram showing an orienter.
  • FIG. 5 is a schematic configuration diagram showing a load lock chamber.
  • FIG. 6 is a plan view showing the operation unit.
  • FIG. 7A is an example when a teaching operation is performed on an introduction port according to the first embodiment of the present invention, and is a diagram illustrating a first interference attention point.
  • FIG. 7B is a diagram illustrating an example of performing a teaching operation on the introduction port according to the first embodiment of the present invention, and illustrates a second point of caution for interference.
  • FIG. 7C is a diagram showing an example of performing a teaching operation on the introduction port, which is the first embodiment of the method of the present invention, and is a diagram showing a third point of caution for interference.
  • FIG. 7D is an example of performing a teaching operation on the introduction port according to the first embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
  • FIG. 7E is an example of performing a teaching operation on the introduction port, which is the first embodiment of the method of the present invention, and is a diagram showing a movement target position.
  • FIG. 8 is a flowchart showing the flow of the teaching method of the present invention.
  • FIG. 9 is a diagram showing an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention.
  • FIG. 9A is an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention, and is a diagram illustrating a first point of caution for interference.
  • FIG. 9B is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a second point of caution for interference.
  • FIG. 9C is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
  • FIG. 9D is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a movement target position.
  • FIG. 1OA is an example when a teaching operation is performed on a load opening chamber according to a third embodiment of the present invention, and is a diagram illustrating a first interference attention point.
  • FIG. 1OB is a diagram showing an example of performing a teaching operation on a load lock chamber according to a third embodiment of the present invention, and is a diagram showing a second point of caution for interference.
  • FIG. 1 OC is an example of performing a teaching operation on a load lock chamber according to a third embodiment of the present invention, and is a diagram illustrating a third point of caution for interference.
  • FIG. 10D is an example when a teaching operation is performed on the load lock chamber according to the third embodiment of the present invention, and is a diagram illustrating a fourth point of caution for interference.
  • FIG. 10E is an example when a teaching operation is performed on the load opening chamber according to the third embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
  • FIG. 1 is a configuration diagram showing an example of a processing system for implementing the teaching method of the present invention
  • FIG. 2 is a schematic diagram of the processing system shown in FIG. 1
  • FIG. 3 is a schematic configuration diagram showing an introduction port
  • FIG. 5 is a schematic configuration diagram showing a load lock chamber
  • FIG. 6 is a plan view showing an operation unit.
  • the processing system 2 includes a plurality of, for example, four processing chambers 4A, 4B, 4C, and 4D, a substantially hexagonal common transfer chamber 6, and a first locking apparatus having a load lock function. And a second load lock chamber 8A, 8B, and a slender inlet-side transfer chamber 10 mainly.
  • the processing chambers 4A to 4D are joined to four sides of the substantially hexagonal common transfer chamber 6, and the first and second load lock chambers 8A are connected to the other two sides. , 8B are joined respectively.
  • the introduction-side transfer chamber 10 is commonly connected to the first and second load lock chambers 8A and 8B.
  • the space between the common transfer chamber 6 and the four processing units 4A to 4D and the space between the common transfer chamber 6 and the first and second load lock chambers 8A and 8B are airtight, respectively.
  • the gate valve G which can be opened and closed, is joined to form a cluster tool, and can be communicated with the common transfer chamber 6 as necessary.
  • Gate valves G which can be opened and closed in an airtight manner, are also interposed between the first and second load lock chambers 8A and 8B and the introduction-side transfer chamber 10 respectively. I have.
  • susceptors 12A to 12D for mounting semiconductor wafers as processing objects are provided, respectively, and the semiconductor wafer W to be processed is provided. To the same or different types of processing.
  • a second transfer mechanism 14 comprising an articulated arm is provided, which has two picks B 1 and B 2 which can bend and extend independently in opposite directions, and two picks B 1 and B 2 at a time. It can handle wafers. It should be noted that a mechanism having only one pick may be used as the second transport mechanism 14.
  • the introduction-side transfer chamber 10 is formed of a horizontally long box. One or more of the horizontally long boxes are used to introduce a semiconductor wafer to be processed.
  • One carry-in entrance 16 is provided, and each carry-in entrance 16 is provided with an opening / closing door 21 which can be opened and closed.
  • introduction ports 18 A, 18 B, and 18 C are respectively provided corresponding to the respective entrances 16, and one cassette container 20 can be placed in each of the introduction ports 18 A, 18 B, and 18 C. .
  • Each cassette container 20 is capable of accommodating a plurality of wafers W, for example, 25 wafers W, mounted in multiple stages at an equal pitch.
  • the cassette container 20 is also provided with an opening / closing lid 2OA (see FIG. 3). Fig.
  • FIG. 3 shows the central introduction port 18B of the three introduction ports 18A to 18C, and each of the introduction ports 18A to 18C opens and closes the cassette container 20.
  • a drive mechanism 21 A for an opening / closing door 21 that can move up and down and move forward and backward to open and close the lid 2 OA is provided.
  • a first transfer mechanism 22, which is an introduction-side transfer mechanism, for transferring the wafer W along its longitudinal direction is provided.
  • the first transfer mechanism 22 is slidably supported on a guide rail 24 ′ provided so as to extend along the length direction in the center of the introduction-side transfer chamber 10.
  • the first transfer mechanism 2 2 is composed of two articulated arms 3 arranged in two upper and lower stages. It has two, three and four. At the tip of each of the articulated arms 3 2 and 3 4, a bifurcated pick A 1 and A 2 are attached, respectively, and the wafer W is directly placed on each of the picks A 1 and A 2. To be held. Therefore, each articulated arm
  • Reference numerals 32 and 34 are provided to be able to freely bend and elongate and ascend and descend in the radial direction from the center, and the bending and elongation of each of the articulated arms 32 and 34 is individually controllable.
  • the rotating shafts of the articulated arms 32 and 34 are coaxially rotatably connected to the base 36, respectively, so that they can rotate integrally in the direction of rotation with respect to the base 36, for example. It has become.
  • the picks A 1 and A 2 may not be two but only one.
  • An orienter 26 for aligning a wafer is provided at the other end of the introduction-side transfer chamber 10. Further, in the longitudinal direction of the introduction-side transfer chamber 10, the two port lock chambers are provided. 8A and 8B are provided via the above-mentioned gout pulp G which can be opened and closed, respectively.
  • the orienter 26 has a turntable 28 rotated by a drive motor 27 as shown in FIG. 4, and rotates with the wafer W mounted thereon.
  • An optical sensor 30 for detecting the peripheral edge of the wafer W is provided on the outer periphery of the turntable 28, and thereby a positioning notch of the wafer W, for example, the position direction of the notch-orientation flat or the wafer W It is possible to detect the amount of positional deviation of the center of the image.
  • mounting tables 38A and 38B each having a diameter smaller than the wafer diameter are provided for temporarily mounting the wafer W. (See Figure 5).
  • the control unit 40 includes a display unit composed of a liquid crystal display unit or the like so that a predetermined message or the like can be used for the operator.
  • An operation unit 41 provided with a key group 44 such as 42 or a numeric keypad for performing a predetermined input is connected.
  • a touch panel method may be used for the display section 42 so that the function of the key group 44 is shared with the display section 42.
  • the teaching operation is carried out while holding the operation unit 41 when performing teaching and watching the pick. Is
  • the transfer target positions of the transfer mechanisms 14 and 22 for the transfer and transfer of the semiconductor wafer W are not determined. This operation must be stored in the control system, and this operation is called teaching. In this case, the temporary movement target position determined by calculation from the design dimensions of each part of the processing system 2 due to an assembly error of the processing system 2 or an error in the initial setting of each transport mechanism 14, 22 is actually In general, it is likely that the position is shifted by a certain distance from the movement target position in the processing system 2 after assembly.
  • the transport mechanism including the pick is automatically moved to another movement target position calculated by the design dimensions of the processing system for teaching operation, it will collide with other members in the movement path and collide. There is fear. Therefore, in the conventional teaching operation, it is a position far before the tentative movement target position obtained by calculation, that is, a position where there is a possibility that the transport mechanism absolutely interferes with other members, and In addition, the transport mechanism is automatically moved to the position closest to the temporary movement target position, and thereafter, as described above, a slight distance is manually operated by hand while confirming that there is no interference with other members. By moving the transport mechanism, the pick is finally positioned at a predetermined appropriate position, and the coordinates at that time are stored as the movement target position.
  • this conventional teaching method has a problem in that the time required to move the transport mechanism by manual operation while visually observing becomes extremely long, and the teaching operation requires a long time.
  • the transfer mechanism is moved to the temporary movement target position in the course of the movement, and the transfer mechanism may interfere with other members at a position where the transfer mechanism may interfere with other members.
  • a pause process for temporarily stopping the transfer mechanism to make sure that no transfer occurs a resumption process for resuming the resumption of the suspended transport mechanism by input of a relocation command, and a resumption process for the pause process and the resumption process.
  • a position where the transport mechanism may interfere or collide with another member in the middle of the movement route to the temporary movement target position determined from the design dimensions of the processing system or the like is obtained in advance as an interference caution point.
  • this interference caution location the dimensions and the turning radius of the articulated arm and pick of the transport mechanism are taken into account.
  • the location of the interference depends on the assembly error of the processing system and the error of the initial setting of the drive system of the transport mechanism.However, the transport mechanism including the pick has a It is a place (place) approaching a distance. Then, when this adjustment movement is performed, the coordinates of the interference attention point to be temporarily stopped next are increased or decreased by the adjustment movement amount.
  • the transport mechanism is actually driven to operate automatically, but at this time, the transport mechanism is temporarily stopped every time it reaches the point of caution. At this stop, visually check that no interference occurs with other members even if the transport mechanism is moved to the next step. At this time, if there is a risk that the transport mechanism will interfere with other components, the operator adjusts the transport mechanism to a position where there is no risk of interference with other components by manual operation.
  • the operator adjusts the pick position to the optimum position by manual operation while visually checking.
  • This position is stored in the control means as the movement target position. As a result, the teaching operation for the original movement target position is completed.
  • FIG. 7A to 7E show an example of performing a teaching operation on an introduction port according to a first embodiment of the present invention
  • FIG. 8 shows a flow of the teaching method of the present invention.
  • FIG. 7A to 7E the teaching operation of one pick A1 of the first transport mechanism 22 is performed on the central introduction port 18B of the three introduction ports 18A to 18C. Shows the case.
  • an alignment substrate W formed in the same size and shape as the semiconductor wafer is placed on the lowermost support shelf (not shown) of the cassette container 20, and immediately below the alignment substrate W
  • the position where the pick A 1 has been inserted (accessed) up to this point (FIG. 7D) is the temporary movement target position.
  • the pitch of each support shelf is specified, and the access of the pick to each support shelf is determined based on the pitch. Will be possible.
  • an attention point where the transfer mechanism 22 may interfere with other members Is determined in advance based on the design dimensions of the processing system 2, the dimensions of the articulated arm of the transfer mechanism 22, the turning radius, and the like, as described above.
  • a position at which the transport mechanism 22 comes close to another member, for example, up to a distance of 1 cm on the design dimensions is determined as an interference caution point, and this information is stored in the control means 40.
  • FIGS. 7A to 7E the three positions of the arm shown in FIGS. 7A to 7C are the positions determined as interference attention points.
  • the position of the right end of the guide rail 24 shown in FIG. 2 is the reference position (home position) 50 of the first transport mechanism 22.
  • the control means 40 controls the drive of the first transport mechanism 22 and, for example, To the location corresponding to the introduction port 18B, move the articulated arm in the vertical direction and the turning direction, bend and extend the articulated arm, e.g. Is automatically stopped at the first point of caution as shown in Fig. 7A (S3).
  • the first point of caution is the tip of this pick A 1 and the tip of the alignment substrate W.
  • the distance X1 from the edge is about 1 cm in the design dimensions of the processing system.
  • the display unit 42 displays a message to alert the operator to a pick interference, for example, Does not interfere with other parts? " It should be noted that a similar message may be transmitted by voice from a speaker or the like simultaneously or independently.
  • the operator determines whether or not the pick A1 is positioned about 2 to 3 mm below the other member, that is, the lower end of the positioning substrate W with respect to the vertical distance of the pick A1, It is visually checked whether or not there is a risk of interfering with the positioning substrate W even if 1 is moved forward as it is (S4).
  • the operator manually operates the pick A1 so that the pick A1 does not interfere with the positioning board W. , Ie, by a small distance so as to be positioned about 2 to 3 mm below the lower end (S5). This adjustment movement is performed by operating the movement button 44 C of the key group 44.
  • the operator again performs Press the progress button 4 4 A (S 1) to input the movement command.
  • the pick A1 of the first transport mechanism 22 automatically advances slightly, and as shown in FIG. 7B, the distance at which the tip of the pick A1 and the peripheral edge of the positioning substrate W overlap with each other in design dimensions. It automatically moves to the position where X2 becomes about 5 mm, that is, the second interference caution position, and pauses (32, 3, S3). Even during this pause, a message for calling attention to pick interference is displayed on the display section 42.
  • the operator confirms that the tip of the pick A1 has surely penetrated below the positioning substrate W.
  • the reason why the pick A1 was temporarily stopped when the overlap between the pick A1 and the positioning substrate W was about 5 mm was that if the two interfered, the damage such as breakage was minimized. It is.
  • the pick A 1 of the first transport mechanism 22 automatically advances again slightly, and FIG. As shown in C, the position where the horizontal distance X 3 between the base of the pick A 1 and the upper end of the lid opening / closing mechanism 21 (see FIG. 3) is about 1 cm, that is, the third interference Automatically move to the caution position and pause. Even during this pause, a message is displayed on the display unit 42 that calls attention to interference with the pick. At this time, the operator confirms that the base of the pick A1 does not interfere with the lid opening / closing mechanism 21 even if the base advances. At this time, if the operator determines that the base of the pick A1 may interfere, the pick A1 is slightly moved upward by manual operation as described above.
  • the pick A 1 of the first transport mechanism 22 automatically advances again, and temporarily moves on the design dimensions as shown in FIG. 7D. Move to the target position and pause. Note that, when the temporary movement target position is manually adjusted in the middle of the movement path so far, the movement target position is shifted by the movement adjustment amount.
  • FIG. 7E shows a state in which the pick A1 has been moved upward by a small distance. If the position of the pick A1 at the temporary movement target position shown in FIG. 7D is an appropriate position as shown in FIG. 7E, it goes without saying that the adjustment movement operation shown in S6 is unnecessary.
  • the pick A1 can automatically move to this movement target position without interfering with other members. it can.
  • the wafer is received at a predetermined height from the movement target position described above. Also, when taking wafers from other support shelves, since the pitch of the support shelves provided in multiple stages is known in advance as described above, the height corresponding to the number of stages of the support shelves should be easily obtained. Can be.
  • the pick is temporarily stopped only at the point of interference where the pick or the like may interfere with other members, and the pick is adjusted and moved by manual operation if necessary at each stop. Since the pick is automatically moved to the next point of caution, the time for the pick to move along the entire transport path is shortened, and the teaching operation can be performed in a short time and quickly by that much. it can.
  • the case where the teaching operation is performed on the introduction port has been described as an example.
  • the case where the teaching operation is performed on the orienter will be described as an example.
  • FIGS. 9A to 9D are views showing an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention.
  • FIGS. 9A to 9D plan views are partially shown.
  • a case where the teaching operation is performed on the pick A1 of the first transport mechanism 22 will be described.
  • a message is displayed on the display unit to alert the operator of the interference, but a description of that point is omitted. .
  • the processing system 2 of the design dimensions such as the control means obtains a movement target position of the interference attention point and the temporary against Orient motor 2 6 based on: stored in a 4 0.
  • FIG. 9A and FIG. 9B show an interference attention point
  • FIG. 9C shows a temporary automatic target position.
  • the second point of caution is a position where the horizontal distance Y2 between the periphery of the turntable 28 and the pick A1 is, for example, about 1 cm in the design dimensions of the processing system.
  • the operator adjusts the position of the pick A1 in the horizontal direction by manual operation if necessary, so that the pick A Set so that the turntable 28 can be fully accommodated between 1. That is, when the pick A 1 is further advanced, the position is manually adjusted so that the pick A 1 does not interfere with the turntable 28.
  • the pick A1 further advances in the horizontal direction automatically, and reaches the temporary movement target position as shown in FIG. 9C.
  • the operator adjusts and moves the pick A1 to an appropriate position by manual operation, and positions the pick A1 at the movement target position as shown in FIG. 9D.
  • the position coordinate data at this time is stored in the control means 40.
  • a transparent positioning board W is placed on the pick A1 as shown in the plan view of FIG. Check that platform 28 is positioned.
  • the pick A 1 is moved to the turntable 2 at the temporary movement target position (FIG. 9C). Since it is located below the position 8, the pick A 1 is manually adjusted upward and moved upward, and the position is properly adjusted as described above using the positioning W. .
  • the pick is temporarily stopped only at the point of caution where there is a possibility that the pick may interfere with other members, and the pick is adjusted and moved by manual operation if necessary at each stop. Then, the pick is automatically moved to the next point of caution, so the time for the pick to move along the entire transport path is shortened, and the teaching operation can be performed in a short time and quickly by that much. It can be carried out.
  • 10A to 10E are views showing an example when a teaching operation is performed on the load lock chamber according to the third embodiment of the present invention.
  • FIGS. 10A to 10D show a temporary movement target position. Since the display contents of the display unit are the same as those described above, the description is omitted here.
  • the first transport mechanism 22 is positioned at the reference position 50 (see FIG. 2), when the advance command button 44A (see FIG. 6) is pressed to input a movement command, the first transport mechanism 22 is automatically activated. And the pick A1 is temporarily stopped at the first interference attention point as shown in FIG. 1OA.
  • the first point of caution is that the horizontal distance Z 1 between the wall 10 B of the transfer chamber 10 on the loading side where the load lock chamber 8 A is installed and the tip of the pick A 1 is the processing system. This is a position that is, for example, about 1 cm in design dimensions. This is to prevent the tip of the pick A1 from colliding with the wall surface 10B because the height of the opening of the load lock chamber 8A is as small as about 4.9 cm.
  • the operator can manually select the pick A 1 if necessary. Move the pick A1 into the load opening chamber 8A without interfering with it by adjusting the height.
  • the pick A1 automatically advances in the horizontal direction, and stops at the second interference attention point as shown in FIG. 10B.
  • the second point of caution is that the horizontal distance Z2 between the periphery of the positioning substrate W on the mounting table 38A and the pick A1 is set to, for example, about 1 cm in the design dimensions of the processing system. It is a position that has become.
  • the operator manually adjusts the height and the horizontal position of the pick A1 if necessary, so that when the pick A1 is further advanced, Set so that the table 38 A above fits sufficiently between A 1. That is, when the pick A1 is further advanced, the position is adjusted by manual operation so that the pick A1 does not interfere with the mounting table 38A and the positioning substrate W.
  • the third interference point is a position where the horizontal distance Z3 between the peripheral portion of the positioning substrate W and the tip of the pick A1 in the vertical direction is about 5 mm in the design dimensions of the processing system. It is.
  • the reason for suspending Pick A1 here is to minimize damage such as damage if they interfere with each other.
  • the position is manually adjusted as needed so that the pick A1 does not interfere with other members in the next progress.
  • the pick A1 advances slightly automatically in the horizontal direction and temporarily stops at the fourth interference attention point as shown in FIG. 10D.
  • the fourth point of caution is where the horizontal distance Z4 between the upper end of the open gate valve G and the base end of the pick A1 is about l mm in the design dimensions of the processing system. is there.
  • the reason why the pick A1 is temporarily stopped here is to prevent the base of the pick A1 from colliding with the opened gate valve G.
  • the position is adjusted by manual operation as needed so that the pick A1 does not interfere with other members in the next progress.
  • the vehicle further advances in the horizontal direction automatically, and reaches the temporary movement target position as shown in FIG. 10E.
  • the operator adjusts and moves the pick A 1 to an appropriate position by manual operation, positions the pick A 1 at the movement target position, and presses the memory button 44 B (see FIG. 6).
  • the position coordinate data at this time is stored in the control means 40. In this case, before pressing the memory button 4 4 B, make sure that the pick A 1 is at an appropriate position with respect to, for example, the transparent alignment substrate W placed on the mounting table 38 A. I do.
  • the pick is temporarily stopped only at the point of caution where there is a possibility that the pick may interfere with other members. Since the pick is adjusted and moved automatically to the next point of caution, the pick travels along the entire transport path in a shorter time, and the teaching operation can be shortened by that much time. Can be done quickly.
  • the teaching method of the first transfer mechanism 22 has been described, but the picks B 1 and B 2 of the second transfer mechanism 14 in the common transfer chamber 6 also have processing chambers 4A to 4A. Perform the same procedure as described above for 4D and each load lock chamber 8A, 8B.
  • the alignment substrate W set at each of the determined moving destination positions is transported to the orienter 26 fully automatically, and the alignment substrate W at that time is transferred.
  • the coordinate data of the movement target position is further corrected based on the minute shift amount of the position.
  • the configuration of the processing system 2 and the configuration of each of the transport mechanisms 14 and 22 described here are merely examples, and all transport mechanisms installed in an atmospheric pressure atmosphere and a vacuum atmosphere are described below.
  • the teaching method of the present invention can be applied.
  • a semiconductor wafer has been described as an example of an object to be processed, the present invention is not limited to this, and the method of the present invention can be applied to a glass substrate, an LCD substrate, and the like.
  • the teaching method and the processing system of the present invention the following excellent operational effects can be exhibited.
  • the transport mechanism is temporarily stopped only at a location (location) where the transport mechanism may interfere with other members, and the position is adjusted if necessary, so that the transport mechanism does not interfere with other members. Since the transport mechanism is automatically and positively moved, the time required for the teaching operation can be significantly reduced as a whole.
  • a message for calling attention to interference is displayed on the display unit.
  • the operator can reduce the interference of the transport mechanism with other members. It can be reliably prevented.

Abstract

L'invention concerne un procédé d'apprentissage permettant de réduire et de raccourcir de manière radicale une durée d'apprentissage. L'invention concerne un procédé d'apprentissage de stockage des positions de destination de déplacement de mécanismes (14, 22) de transport d'un moyen (40) de commande dans un système de traitement équipé de mécanismes de transport destinés à transporter des éléments destinés à être traités (W), retenus par des éléments de préhension (A1-B2). Ledit procédé consiste à arrêter provisoirement un mécanisme de transport au milieu d'une trajectoire de déplacement sur une position de destination de déplacement provisoire, afin que le mécanisme de transport n'interagisse pas avec d'autres éléments au niveau d'un emplacement à interférence potentielle où la possibilité d'interférence avec d'autres éléments est anticipée, à reprendre le mouvement du mécanisme provisoirement arrêté par entrée d'une instruction de mouvement, à répéter l'étape d'arrêt provisoire et l'étape de reprise du mouvement, et à stocker, comme position de destination de déplacement, dans un moyen de commande une position obtenue par réglage et déplacement ou non de la position d'un élément de préhension lorsque celui-ci atteint une position de destination de déplacement provisoire.
PCT/JP2003/011734 2002-09-13 2003-09-12 Procede d'apprentissage et systeme de traitement WO2004024401A1 (fr)

Priority Applications (1)

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US11/075,707 US20050220582A1 (en) 2002-09-13 2005-03-10 Teaching method and processing system

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JP2002-269255 2002-09-13
JP2002269255A JP3928527B2 (ja) 2002-09-13 2002-09-13 ティーチング方法及び基板処理システム

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KR (1) KR20050044913A (fr)
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USRE45772E1 (en) 2006-07-20 2015-10-20 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
WO2018051601A1 (fr) * 2016-09-14 2018-03-22 Dmg森精機株式会社 Système de traitement de pièce à usiner
US11713147B2 (en) 2019-07-30 2023-08-01 Anheuser-Busch Inbev S.A. Article picking and treating apparatus

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JP4174517B2 (ja) * 2006-03-13 2008-11-05 ファナック株式会社 教示位置修正装置および教示位置修正方法
JP2014192356A (ja) * 2013-03-27 2014-10-06 Tokyo Electron Ltd 被処理体の処理装置、及び、ティーチング方法
KR102219879B1 (ko) * 2018-05-17 2021-02-24 세메스 주식회사 기판 처리 장치 및 기판 정렬 방법
CN113103231A (zh) * 2021-03-31 2021-07-13 北京北方华创微电子装备有限公司 机械手归位方法及半导体热处理设备

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JP2000127069A (ja) * 1998-10-27 2000-05-09 Tokyo Electron Ltd 搬送システムの搬送位置合わせ方法
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EP0582715A1 (fr) * 1992-01-28 1994-02-16 Fanuc Ltd. Procede de commande multi-robots
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Publication number Priority date Publication date Assignee Title
USRE45772E1 (en) 2006-07-20 2015-10-20 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
USRE46465E1 (en) 2006-07-20 2017-07-04 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
USRE47145E1 (en) 2006-07-20 2018-11-27 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
USRE47909E1 (en) 2006-07-20 2020-03-17 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
USRE48031E1 (en) 2006-07-20 2020-06-02 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
USRE48792E1 (en) 2006-07-20 2021-10-26 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
USRE49671E1 (en) 2006-07-20 2023-09-26 Kawasaki Jukogyo Kabushiki Kaisha Wafer transfer apparatus and substrate transfer apparatus
WO2018051601A1 (fr) * 2016-09-14 2018-03-22 Dmg森精機株式会社 Système de traitement de pièce à usiner
JP2018043314A (ja) * 2016-09-14 2018-03-22 Dmg森精機株式会社 ワーク処理システム
EP3511128A4 (fr) * 2016-09-14 2020-05-06 DMG Mori Co., Ltd. Système de traitement de pièce à usiner
US10987799B2 (en) 2016-09-14 2021-04-27 Dmg Mori Co., Ltd. Workpiece processing system
US11713147B2 (en) 2019-07-30 2023-08-01 Anheuser-Busch Inbev S.A. Article picking and treating apparatus

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CN1671519A (zh) 2005-09-21
KR20050044913A (ko) 2005-05-13
JP3928527B2 (ja) 2007-06-13
JP2004106078A (ja) 2004-04-08

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