WO2004024401A1 - Teaching method and processing system - Google Patents

Teaching method and processing system Download PDF

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Publication number
WO2004024401A1
WO2004024401A1 PCT/JP2003/011734 JP0311734W WO2004024401A1 WO 2004024401 A1 WO2004024401 A1 WO 2004024401A1 JP 0311734 W JP0311734 W JP 0311734W WO 2004024401 A1 WO2004024401 A1 WO 2004024401A1
Authority
WO
WIPO (PCT)
Prior art keywords
pick
transport mechanism
movement
processing system
target position
Prior art date
Application number
PCT/JP2003/011734
Other languages
French (fr)
Japanese (ja)
Inventor
Motohiro Kumagai
Shigeru Ishizawa
Hiroaki Saeki
Original Assignee
Tokyo Electron Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Limited filed Critical Tokyo Electron Limited
Publication of WO2004024401A1 publication Critical patent/WO2004024401A1/en
Priority to US11/075,707 priority Critical patent/US20050220582A1/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67745Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber characterized by movements or sequence of movements of transfer devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J11/00Manipulators not otherwise provided for
    • B25J11/0095Manipulators transporting wafers
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/06Programme-controlled manipulators characterised by multi-articulated arms
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B25HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
    • B25JMANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
    • B25J9/00Programme-controlled manipulators
    • B25J9/16Programme controls
    • B25J9/1656Programme controls characterised by programming, planning systems for manipulators
    • B25J9/1664Programme controls characterised by programming, planning systems for manipulators characterised by motion, path, trajectory planning
    • B25J9/1666Avoiding collision or forbidden zones
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00Programme-control systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67242Apparatus for monitoring, sorting or marking
    • H01L21/67276Production flow monitoring, e.g. for increasing throughput
    • GPHYSICS
    • G05CONTROLLING; REGULATING
    • G05BCONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00Program-control systems
    • G05B2219/30Nc systems
    • G05B2219/36Nc in input of data, input key till input tape
    • G05B2219/36468Teach and store intermediate stop position in moving route to avoid collision

Definitions

  • the present invention relates to a processing system for performing a predetermined processing on an object to be processed such as a semiconductor wafer, and a teaching method of a transport mechanism used for the processing system. Background technology
  • a semiconductor integrated circuit In order to manufacture a semiconductor integrated circuit, various processes such as film formation, etching, oxidation, and diffusion are performed on a wafer. In order to improve throughput and yield due to miniaturization and high integration of semiconductor integrated circuits, a plurality of processing units performing the same process or a plurality of processing units performing different processes are provided in a common transport chamber. A so-called clustered processing system device, which is capable of continuous processing of various processes without exposing the wafer to the atmosphere, is already known.
  • a semiconductor wafer is taken out from a cassette container installed at an introduction port of an object to be processed, which is provided in a preceding stage of the processing system, using a transfer mechanism, and the semiconductor wafer is taken out of the transfer chamber on the introduction side of the processing system.
  • the wafer is positioned by an orienter that performs positioning, it is carried into a vacuum-equipped mouth lock chamber, and the wafer is subjected to a plurality of vacuum processes.
  • the wafers are transferred into a common transfer chamber in a vacuum atmosphere connected to the surroundings using another transfer mechanism, and the wafers are sequentially introduced into the respective processing chambers with the common transfer chamber as the center to continuously process. Is supposed to do it.
  • the processed wafer is stored in the original cassette container, for example, via the original path.
  • this type of processing system has a single or multiple transfer mechanisms inside, and the transfer and transfer of wafers are automatically performed by these transfer mechanisms. .
  • This transfer mechanism is, for example, a multi-joint that can move horizontally, bend, extend, turn, and move up and down.
  • the pick-up provided at the end of the arm directly holds the wafer, horizontally moves to the transfer position, and transfers the wafer to a predetermined position. In this case, it is necessary to avoid interference or collision of the arm, pick or holding wafer with other members during the operation of the transfer mechanism, and the wafer placed in a certain place must be properly removed. It is necessary to hold the wafer, transfer the wafer to a target position, and deliver it to an appropriate place with high accuracy, for example, high positional accuracy within ⁇ 0.2 O mm.
  • an important position such as a place for transferring the wafer W in the movement path of the pick of the transfer mechanism is controlled by controlling the operation of the transfer mechanism.
  • a so-called teaching operation is performed in which a control unit such as a computer learns the position coordinates.
  • This teaching includes, for example, the positional relationship between the transport mechanism and the cassette container, the positional relationship between the pick for picking up wafers and each shelf of the cassette container in the height direction, the positional relationship between the loading table in the load lock chamber and the pick, The positional relationship between the pick and the orienter, the positional relationship between the pick and the susceptor in each processing chamber, and the like is performed in almost all cases for transferring the wafer, and the position coordinates are stored. It is a matter of course that all drive systems incorporate an encoder or the like for specifying the drive position.
  • the position coordinates of the position where the entire device should be taught are determined from the design values of the device with reference to a certain point on the moving path of the transport mechanism as the absolute reference.
  • the information is input and stored in the control unit in advance.
  • each temporary position coordinate is input in consideration of a predetermined margin so that the pick does not interfere with other members.
  • the operation of the transport mechanism is switched to manual (hereinafter also referred to as manual).
  • manual hereinafter also referred to as manual.
  • the picking operation is performed while visually checking that the positioning substrate previously installed at a predetermined position in the cassette container is in contact with an appropriate position, and the coordinates are stored as position coordinates in the control unit. And teaching.
  • the above-mentioned alignment substrates are respectively set at the centers of these, and the corresponding picks are first interfered. Automatically move to a safe nearby position, and then move it manually to match the two exactly as described above and store the position coordinates at that time in the control unit.
  • the positioning substrate is made of, for example, a transparent plate, on which a pick to be aligned and a contour of another mounting table or the like are drawn in advance.
  • the manual operation means that the moving direction (+ / _) and the moving amount are input to the control unit using a keyboard or a joystick, and the arm including the pick is operated. .
  • the transport mechanism itself is automatically moved to a sufficiently safe position in the vicinity of the target position to be taught, and then the manual operation is performed while visually confirming the safety.
  • the pick is moved by a small distance in the horizontal and vertical directions to move the pick to the target position.
  • An object of the present invention is to provide a teaching method and a processing system capable of greatly reducing and shortening a teaching operation time.
  • the present inventors have conducted intensive studies on shortening the teaching operation time, and as a result, even after automatically moving the transport mechanism to the vicinity of the target position, pay attention to the pick of the transport mechanism at a specific location.
  • the present invention was achieved by obtaining the knowledge that there is a certain part that can be automatically moved before reaching the target position if it is adjusted and moved.
  • the teaching method according to the present invention is a teaching method in which a movement target position of the transport mechanism in a processing system including a transport mechanism for holding and transporting an object to be processed by a pick is stored in a control unit.
  • the transportation mechanism pauses to confirm that there is no interference with other members at the point of caution where there is a risk of interference with other members.
  • the position of the pick is adjusted or moved when the pick-up target position is reached or the pick target is moved to the control means without being adjusted.
  • the transport mechanism is temporarily stopped only at places (points) where the transport mechanism may interfere with other members, and the position is adjusted if necessary. If the transport mechanism does not interfere with other members, the transport mechanism is stopped. Since the robot is automatically and positively moved, the time required for teaching operation can be significantly reduced as a whole.
  • the transport mechanism can be adjusted and moved to a position where there is no risk of interfering with other members.
  • the interference caution point may be calculated and obtained in advance by the control means based on a design dimension of the processing system.
  • control means can display a message for calling attention to interference to the operator on the display unit every time the transport mechanism is temporarily stopped. As described above, a message for calling attention to interference is displayed on the display unit, so that the operator recognizes this message, thereby more reliably preventing the transport mechanism from interfering with other members. Becomes possible.
  • the transport mechanism has a multi-joint arm that can be bent and extended and turned.
  • the movement target position is a predetermined position in an introduction port for taking the object to be processed into the processing system.
  • a processing system includes a processing chamber for performing a predetermined process on a processing target, an introduction port for introducing the processing target, an orienter for positioning the processing target, and holding the processing target.
  • a processing system comprising: a transport mechanism having a pick for transporting an object to be processed; and control means for controlling the operation of the transport mechanism, wherein the control means moves the transport mechanism to a temporary movement target position.
  • control unit may calculate and obtain the interference attention point in advance based on a design dimension of the processing system.
  • control unit is connected to a display unit, and the control unit may cause the display unit to display a message for calling attention to an operator on the display unit every time the transport mechanism is temporarily stopped. it can.
  • FIG. 1 is a configuration diagram showing an example of a processing system for implementing the teaching method of the present invention.
  • FIG. 2 is a schematic diagram of the processing system shown in FIG.
  • FIG. 3 is a schematic configuration diagram showing an introduction port.
  • FIG. 4 is a schematic configuration diagram showing an orienter.
  • FIG. 5 is a schematic configuration diagram showing a load lock chamber.
  • FIG. 6 is a plan view showing the operation unit.
  • FIG. 7A is an example when a teaching operation is performed on an introduction port according to the first embodiment of the present invention, and is a diagram illustrating a first interference attention point.
  • FIG. 7B is a diagram illustrating an example of performing a teaching operation on the introduction port according to the first embodiment of the present invention, and illustrates a second point of caution for interference.
  • FIG. 7C is a diagram showing an example of performing a teaching operation on the introduction port, which is the first embodiment of the method of the present invention, and is a diagram showing a third point of caution for interference.
  • FIG. 7D is an example of performing a teaching operation on the introduction port according to the first embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
  • FIG. 7E is an example of performing a teaching operation on the introduction port, which is the first embodiment of the method of the present invention, and is a diagram showing a movement target position.
  • FIG. 8 is a flowchart showing the flow of the teaching method of the present invention.
  • FIG. 9 is a diagram showing an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention.
  • FIG. 9A is an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention, and is a diagram illustrating a first point of caution for interference.
  • FIG. 9B is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a second point of caution for interference.
  • FIG. 9C is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
  • FIG. 9D is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a movement target position.
  • FIG. 1OA is an example when a teaching operation is performed on a load opening chamber according to a third embodiment of the present invention, and is a diagram illustrating a first interference attention point.
  • FIG. 1OB is a diagram showing an example of performing a teaching operation on a load lock chamber according to a third embodiment of the present invention, and is a diagram showing a second point of caution for interference.
  • FIG. 1 OC is an example of performing a teaching operation on a load lock chamber according to a third embodiment of the present invention, and is a diagram illustrating a third point of caution for interference.
  • FIG. 10D is an example when a teaching operation is performed on the load lock chamber according to the third embodiment of the present invention, and is a diagram illustrating a fourth point of caution for interference.
  • FIG. 10E is an example when a teaching operation is performed on the load opening chamber according to the third embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
  • FIG. 1 is a configuration diagram showing an example of a processing system for implementing the teaching method of the present invention
  • FIG. 2 is a schematic diagram of the processing system shown in FIG. 1
  • FIG. 3 is a schematic configuration diagram showing an introduction port
  • FIG. 5 is a schematic configuration diagram showing a load lock chamber
  • FIG. 6 is a plan view showing an operation unit.
  • the processing system 2 includes a plurality of, for example, four processing chambers 4A, 4B, 4C, and 4D, a substantially hexagonal common transfer chamber 6, and a first locking apparatus having a load lock function. And a second load lock chamber 8A, 8B, and a slender inlet-side transfer chamber 10 mainly.
  • the processing chambers 4A to 4D are joined to four sides of the substantially hexagonal common transfer chamber 6, and the first and second load lock chambers 8A are connected to the other two sides. , 8B are joined respectively.
  • the introduction-side transfer chamber 10 is commonly connected to the first and second load lock chambers 8A and 8B.
  • the space between the common transfer chamber 6 and the four processing units 4A to 4D and the space between the common transfer chamber 6 and the first and second load lock chambers 8A and 8B are airtight, respectively.
  • the gate valve G which can be opened and closed, is joined to form a cluster tool, and can be communicated with the common transfer chamber 6 as necessary.
  • Gate valves G which can be opened and closed in an airtight manner, are also interposed between the first and second load lock chambers 8A and 8B and the introduction-side transfer chamber 10 respectively. I have.
  • susceptors 12A to 12D for mounting semiconductor wafers as processing objects are provided, respectively, and the semiconductor wafer W to be processed is provided. To the same or different types of processing.
  • a second transfer mechanism 14 comprising an articulated arm is provided, which has two picks B 1 and B 2 which can bend and extend independently in opposite directions, and two picks B 1 and B 2 at a time. It can handle wafers. It should be noted that a mechanism having only one pick may be used as the second transport mechanism 14.
  • the introduction-side transfer chamber 10 is formed of a horizontally long box. One or more of the horizontally long boxes are used to introduce a semiconductor wafer to be processed.
  • One carry-in entrance 16 is provided, and each carry-in entrance 16 is provided with an opening / closing door 21 which can be opened and closed.
  • introduction ports 18 A, 18 B, and 18 C are respectively provided corresponding to the respective entrances 16, and one cassette container 20 can be placed in each of the introduction ports 18 A, 18 B, and 18 C. .
  • Each cassette container 20 is capable of accommodating a plurality of wafers W, for example, 25 wafers W, mounted in multiple stages at an equal pitch.
  • the cassette container 20 is also provided with an opening / closing lid 2OA (see FIG. 3). Fig.
  • FIG. 3 shows the central introduction port 18B of the three introduction ports 18A to 18C, and each of the introduction ports 18A to 18C opens and closes the cassette container 20.
  • a drive mechanism 21 A for an opening / closing door 21 that can move up and down and move forward and backward to open and close the lid 2 OA is provided.
  • a first transfer mechanism 22, which is an introduction-side transfer mechanism, for transferring the wafer W along its longitudinal direction is provided.
  • the first transfer mechanism 22 is slidably supported on a guide rail 24 ′ provided so as to extend along the length direction in the center of the introduction-side transfer chamber 10.
  • the first transfer mechanism 2 2 is composed of two articulated arms 3 arranged in two upper and lower stages. It has two, three and four. At the tip of each of the articulated arms 3 2 and 3 4, a bifurcated pick A 1 and A 2 are attached, respectively, and the wafer W is directly placed on each of the picks A 1 and A 2. To be held. Therefore, each articulated arm
  • Reference numerals 32 and 34 are provided to be able to freely bend and elongate and ascend and descend in the radial direction from the center, and the bending and elongation of each of the articulated arms 32 and 34 is individually controllable.
  • the rotating shafts of the articulated arms 32 and 34 are coaxially rotatably connected to the base 36, respectively, so that they can rotate integrally in the direction of rotation with respect to the base 36, for example. It has become.
  • the picks A 1 and A 2 may not be two but only one.
  • An orienter 26 for aligning a wafer is provided at the other end of the introduction-side transfer chamber 10. Further, in the longitudinal direction of the introduction-side transfer chamber 10, the two port lock chambers are provided. 8A and 8B are provided via the above-mentioned gout pulp G which can be opened and closed, respectively.
  • the orienter 26 has a turntable 28 rotated by a drive motor 27 as shown in FIG. 4, and rotates with the wafer W mounted thereon.
  • An optical sensor 30 for detecting the peripheral edge of the wafer W is provided on the outer periphery of the turntable 28, and thereby a positioning notch of the wafer W, for example, the position direction of the notch-orientation flat or the wafer W It is possible to detect the amount of positional deviation of the center of the image.
  • mounting tables 38A and 38B each having a diameter smaller than the wafer diameter are provided for temporarily mounting the wafer W. (See Figure 5).
  • the control unit 40 includes a display unit composed of a liquid crystal display unit or the like so that a predetermined message or the like can be used for the operator.
  • An operation unit 41 provided with a key group 44 such as 42 or a numeric keypad for performing a predetermined input is connected.
  • a touch panel method may be used for the display section 42 so that the function of the key group 44 is shared with the display section 42.
  • the teaching operation is carried out while holding the operation unit 41 when performing teaching and watching the pick. Is
  • the transfer target positions of the transfer mechanisms 14 and 22 for the transfer and transfer of the semiconductor wafer W are not determined. This operation must be stored in the control system, and this operation is called teaching. In this case, the temporary movement target position determined by calculation from the design dimensions of each part of the processing system 2 due to an assembly error of the processing system 2 or an error in the initial setting of each transport mechanism 14, 22 is actually In general, it is likely that the position is shifted by a certain distance from the movement target position in the processing system 2 after assembly.
  • the transport mechanism including the pick is automatically moved to another movement target position calculated by the design dimensions of the processing system for teaching operation, it will collide with other members in the movement path and collide. There is fear. Therefore, in the conventional teaching operation, it is a position far before the tentative movement target position obtained by calculation, that is, a position where there is a possibility that the transport mechanism absolutely interferes with other members, and In addition, the transport mechanism is automatically moved to the position closest to the temporary movement target position, and thereafter, as described above, a slight distance is manually operated by hand while confirming that there is no interference with other members. By moving the transport mechanism, the pick is finally positioned at a predetermined appropriate position, and the coordinates at that time are stored as the movement target position.
  • this conventional teaching method has a problem in that the time required to move the transport mechanism by manual operation while visually observing becomes extremely long, and the teaching operation requires a long time.
  • the transfer mechanism is moved to the temporary movement target position in the course of the movement, and the transfer mechanism may interfere with other members at a position where the transfer mechanism may interfere with other members.
  • a pause process for temporarily stopping the transfer mechanism to make sure that no transfer occurs a resumption process for resuming the resumption of the suspended transport mechanism by input of a relocation command, and a resumption process for the pause process and the resumption process.
  • a position where the transport mechanism may interfere or collide with another member in the middle of the movement route to the temporary movement target position determined from the design dimensions of the processing system or the like is obtained in advance as an interference caution point.
  • this interference caution location the dimensions and the turning radius of the articulated arm and pick of the transport mechanism are taken into account.
  • the location of the interference depends on the assembly error of the processing system and the error of the initial setting of the drive system of the transport mechanism.However, the transport mechanism including the pick has a It is a place (place) approaching a distance. Then, when this adjustment movement is performed, the coordinates of the interference attention point to be temporarily stopped next are increased or decreased by the adjustment movement amount.
  • the transport mechanism is actually driven to operate automatically, but at this time, the transport mechanism is temporarily stopped every time it reaches the point of caution. At this stop, visually check that no interference occurs with other members even if the transport mechanism is moved to the next step. At this time, if there is a risk that the transport mechanism will interfere with other components, the operator adjusts the transport mechanism to a position where there is no risk of interference with other components by manual operation.
  • the operator adjusts the pick position to the optimum position by manual operation while visually checking.
  • This position is stored in the control means as the movement target position. As a result, the teaching operation for the original movement target position is completed.
  • FIG. 7A to 7E show an example of performing a teaching operation on an introduction port according to a first embodiment of the present invention
  • FIG. 8 shows a flow of the teaching method of the present invention.
  • FIG. 7A to 7E the teaching operation of one pick A1 of the first transport mechanism 22 is performed on the central introduction port 18B of the three introduction ports 18A to 18C. Shows the case.
  • an alignment substrate W formed in the same size and shape as the semiconductor wafer is placed on the lowermost support shelf (not shown) of the cassette container 20, and immediately below the alignment substrate W
  • the position where the pick A 1 has been inserted (accessed) up to this point (FIG. 7D) is the temporary movement target position.
  • the pitch of each support shelf is specified, and the access of the pick to each support shelf is determined based on the pitch. Will be possible.
  • an attention point where the transfer mechanism 22 may interfere with other members Is determined in advance based on the design dimensions of the processing system 2, the dimensions of the articulated arm of the transfer mechanism 22, the turning radius, and the like, as described above.
  • a position at which the transport mechanism 22 comes close to another member, for example, up to a distance of 1 cm on the design dimensions is determined as an interference caution point, and this information is stored in the control means 40.
  • FIGS. 7A to 7E the three positions of the arm shown in FIGS. 7A to 7C are the positions determined as interference attention points.
  • the position of the right end of the guide rail 24 shown in FIG. 2 is the reference position (home position) 50 of the first transport mechanism 22.
  • the control means 40 controls the drive of the first transport mechanism 22 and, for example, To the location corresponding to the introduction port 18B, move the articulated arm in the vertical direction and the turning direction, bend and extend the articulated arm, e.g. Is automatically stopped at the first point of caution as shown in Fig. 7A (S3).
  • the first point of caution is the tip of this pick A 1 and the tip of the alignment substrate W.
  • the distance X1 from the edge is about 1 cm in the design dimensions of the processing system.
  • the display unit 42 displays a message to alert the operator to a pick interference, for example, Does not interfere with other parts? " It should be noted that a similar message may be transmitted by voice from a speaker or the like simultaneously or independently.
  • the operator determines whether or not the pick A1 is positioned about 2 to 3 mm below the other member, that is, the lower end of the positioning substrate W with respect to the vertical distance of the pick A1, It is visually checked whether or not there is a risk of interfering with the positioning substrate W even if 1 is moved forward as it is (S4).
  • the operator manually operates the pick A1 so that the pick A1 does not interfere with the positioning board W. , Ie, by a small distance so as to be positioned about 2 to 3 mm below the lower end (S5). This adjustment movement is performed by operating the movement button 44 C of the key group 44.
  • the operator again performs Press the progress button 4 4 A (S 1) to input the movement command.
  • the pick A1 of the first transport mechanism 22 automatically advances slightly, and as shown in FIG. 7B, the distance at which the tip of the pick A1 and the peripheral edge of the positioning substrate W overlap with each other in design dimensions. It automatically moves to the position where X2 becomes about 5 mm, that is, the second interference caution position, and pauses (32, 3, S3). Even during this pause, a message for calling attention to pick interference is displayed on the display section 42.
  • the operator confirms that the tip of the pick A1 has surely penetrated below the positioning substrate W.
  • the reason why the pick A1 was temporarily stopped when the overlap between the pick A1 and the positioning substrate W was about 5 mm was that if the two interfered, the damage such as breakage was minimized. It is.
  • the pick A 1 of the first transport mechanism 22 automatically advances again slightly, and FIG. As shown in C, the position where the horizontal distance X 3 between the base of the pick A 1 and the upper end of the lid opening / closing mechanism 21 (see FIG. 3) is about 1 cm, that is, the third interference Automatically move to the caution position and pause. Even during this pause, a message is displayed on the display unit 42 that calls attention to interference with the pick. At this time, the operator confirms that the base of the pick A1 does not interfere with the lid opening / closing mechanism 21 even if the base advances. At this time, if the operator determines that the base of the pick A1 may interfere, the pick A1 is slightly moved upward by manual operation as described above.
  • the pick A 1 of the first transport mechanism 22 automatically advances again, and temporarily moves on the design dimensions as shown in FIG. 7D. Move to the target position and pause. Note that, when the temporary movement target position is manually adjusted in the middle of the movement path so far, the movement target position is shifted by the movement adjustment amount.
  • FIG. 7E shows a state in which the pick A1 has been moved upward by a small distance. If the position of the pick A1 at the temporary movement target position shown in FIG. 7D is an appropriate position as shown in FIG. 7E, it goes without saying that the adjustment movement operation shown in S6 is unnecessary.
  • the pick A1 can automatically move to this movement target position without interfering with other members. it can.
  • the wafer is received at a predetermined height from the movement target position described above. Also, when taking wafers from other support shelves, since the pitch of the support shelves provided in multiple stages is known in advance as described above, the height corresponding to the number of stages of the support shelves should be easily obtained. Can be.
  • the pick is temporarily stopped only at the point of interference where the pick or the like may interfere with other members, and the pick is adjusted and moved by manual operation if necessary at each stop. Since the pick is automatically moved to the next point of caution, the time for the pick to move along the entire transport path is shortened, and the teaching operation can be performed in a short time and quickly by that much. it can.
  • the case where the teaching operation is performed on the introduction port has been described as an example.
  • the case where the teaching operation is performed on the orienter will be described as an example.
  • FIGS. 9A to 9D are views showing an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention.
  • FIGS. 9A to 9D plan views are partially shown.
  • a case where the teaching operation is performed on the pick A1 of the first transport mechanism 22 will be described.
  • a message is displayed on the display unit to alert the operator of the interference, but a description of that point is omitted. .
  • the processing system 2 of the design dimensions such as the control means obtains a movement target position of the interference attention point and the temporary against Orient motor 2 6 based on: stored in a 4 0.
  • FIG. 9A and FIG. 9B show an interference attention point
  • FIG. 9C shows a temporary automatic target position.
  • the second point of caution is a position where the horizontal distance Y2 between the periphery of the turntable 28 and the pick A1 is, for example, about 1 cm in the design dimensions of the processing system.
  • the operator adjusts the position of the pick A1 in the horizontal direction by manual operation if necessary, so that the pick A Set so that the turntable 28 can be fully accommodated between 1. That is, when the pick A 1 is further advanced, the position is manually adjusted so that the pick A 1 does not interfere with the turntable 28.
  • the pick A1 further advances in the horizontal direction automatically, and reaches the temporary movement target position as shown in FIG. 9C.
  • the operator adjusts and moves the pick A1 to an appropriate position by manual operation, and positions the pick A1 at the movement target position as shown in FIG. 9D.
  • the position coordinate data at this time is stored in the control means 40.
  • a transparent positioning board W is placed on the pick A1 as shown in the plan view of FIG. Check that platform 28 is positioned.
  • the pick A 1 is moved to the turntable 2 at the temporary movement target position (FIG. 9C). Since it is located below the position 8, the pick A 1 is manually adjusted upward and moved upward, and the position is properly adjusted as described above using the positioning W. .
  • the pick is temporarily stopped only at the point of caution where there is a possibility that the pick may interfere with other members, and the pick is adjusted and moved by manual operation if necessary at each stop. Then, the pick is automatically moved to the next point of caution, so the time for the pick to move along the entire transport path is shortened, and the teaching operation can be performed in a short time and quickly by that much. It can be carried out.
  • 10A to 10E are views showing an example when a teaching operation is performed on the load lock chamber according to the third embodiment of the present invention.
  • FIGS. 10A to 10D show a temporary movement target position. Since the display contents of the display unit are the same as those described above, the description is omitted here.
  • the first transport mechanism 22 is positioned at the reference position 50 (see FIG. 2), when the advance command button 44A (see FIG. 6) is pressed to input a movement command, the first transport mechanism 22 is automatically activated. And the pick A1 is temporarily stopped at the first interference attention point as shown in FIG. 1OA.
  • the first point of caution is that the horizontal distance Z 1 between the wall 10 B of the transfer chamber 10 on the loading side where the load lock chamber 8 A is installed and the tip of the pick A 1 is the processing system. This is a position that is, for example, about 1 cm in design dimensions. This is to prevent the tip of the pick A1 from colliding with the wall surface 10B because the height of the opening of the load lock chamber 8A is as small as about 4.9 cm.
  • the operator can manually select the pick A 1 if necessary. Move the pick A1 into the load opening chamber 8A without interfering with it by adjusting the height.
  • the pick A1 automatically advances in the horizontal direction, and stops at the second interference attention point as shown in FIG. 10B.
  • the second point of caution is that the horizontal distance Z2 between the periphery of the positioning substrate W on the mounting table 38A and the pick A1 is set to, for example, about 1 cm in the design dimensions of the processing system. It is a position that has become.
  • the operator manually adjusts the height and the horizontal position of the pick A1 if necessary, so that when the pick A1 is further advanced, Set so that the table 38 A above fits sufficiently between A 1. That is, when the pick A1 is further advanced, the position is adjusted by manual operation so that the pick A1 does not interfere with the mounting table 38A and the positioning substrate W.
  • the third interference point is a position where the horizontal distance Z3 between the peripheral portion of the positioning substrate W and the tip of the pick A1 in the vertical direction is about 5 mm in the design dimensions of the processing system. It is.
  • the reason for suspending Pick A1 here is to minimize damage such as damage if they interfere with each other.
  • the position is manually adjusted as needed so that the pick A1 does not interfere with other members in the next progress.
  • the pick A1 advances slightly automatically in the horizontal direction and temporarily stops at the fourth interference attention point as shown in FIG. 10D.
  • the fourth point of caution is where the horizontal distance Z4 between the upper end of the open gate valve G and the base end of the pick A1 is about l mm in the design dimensions of the processing system. is there.
  • the reason why the pick A1 is temporarily stopped here is to prevent the base of the pick A1 from colliding with the opened gate valve G.
  • the position is adjusted by manual operation as needed so that the pick A1 does not interfere with other members in the next progress.
  • the vehicle further advances in the horizontal direction automatically, and reaches the temporary movement target position as shown in FIG. 10E.
  • the operator adjusts and moves the pick A 1 to an appropriate position by manual operation, positions the pick A 1 at the movement target position, and presses the memory button 44 B (see FIG. 6).
  • the position coordinate data at this time is stored in the control means 40. In this case, before pressing the memory button 4 4 B, make sure that the pick A 1 is at an appropriate position with respect to, for example, the transparent alignment substrate W placed on the mounting table 38 A. I do.
  • the pick is temporarily stopped only at the point of caution where there is a possibility that the pick may interfere with other members. Since the pick is adjusted and moved automatically to the next point of caution, the pick travels along the entire transport path in a shorter time, and the teaching operation can be shortened by that much time. Can be done quickly.
  • the teaching method of the first transfer mechanism 22 has been described, but the picks B 1 and B 2 of the second transfer mechanism 14 in the common transfer chamber 6 also have processing chambers 4A to 4A. Perform the same procedure as described above for 4D and each load lock chamber 8A, 8B.
  • the alignment substrate W set at each of the determined moving destination positions is transported to the orienter 26 fully automatically, and the alignment substrate W at that time is transferred.
  • the coordinate data of the movement target position is further corrected based on the minute shift amount of the position.
  • the configuration of the processing system 2 and the configuration of each of the transport mechanisms 14 and 22 described here are merely examples, and all transport mechanisms installed in an atmospheric pressure atmosphere and a vacuum atmosphere are described below.
  • the teaching method of the present invention can be applied.
  • a semiconductor wafer has been described as an example of an object to be processed, the present invention is not limited to this, and the method of the present invention can be applied to a glass substrate, an LCD substrate, and the like.
  • the teaching method and the processing system of the present invention the following excellent operational effects can be exhibited.
  • the transport mechanism is temporarily stopped only at a location (location) where the transport mechanism may interfere with other members, and the position is adjusted if necessary, so that the transport mechanism does not interfere with other members. Since the transport mechanism is automatically and positively moved, the time required for the teaching operation can be significantly reduced as a whole.
  • a message for calling attention to interference is displayed on the display unit.
  • the operator can reduce the interference of the transport mechanism with other members. It can be reliably prevented.

Abstract

A teaching method capable of drastically reducing and shortening a teaching operation time. A teaching method for storing the moving destination positions of carrying mechanisms (14, 22) in a control means (40) in a processing system provided with carrying mechanisms for carrying elements to be processed (W) being held by picks (A1-B2), the method comprising the step of temporarily stopping a carrying mechanism in the middle of a moving route to a temporary moving destination position so as to make sure that the carry mechanism does not interfere with other members at a potential interference location where the possibility of interference with other members is anticipated, the step of resuming to move the temporarily stopped carrying mechanism by inputting a moving instruction, the step of repeating a temporarily stop ping step and a moving resuming step, and the step of storing, as a moving destination position, in a control means a position obtained by adjusting and moving or not adjusting and moving the position of a pick when the pick reaches a temporary moving destination position.

Description

明 細 書  Specification
. ティーチング方法及び処理システム 技 術 分 野 Teaching method and processing system
本発明は、 半導体ゥェハ等の被処理体に所定の処理を施すための処理システム 及びこれに用いられる搬送機構のティーチング方法に関する。 背 景 技 術  The present invention relates to a processing system for performing a predetermined processing on an object to be processed such as a semiconductor wafer, and a teaching method of a transport mechanism used for the processing system. Background technology
一般に、 半導体集積回路を製造するためにはウェハに対して成膜、 エッチング 、 酸化、 拡散等の各種の処理が行なわれる。 そして、 半導体集積回路の微細化及 び高集積化によって、 スループット及び歩留りを向上させるために、 同一処理を 行なう複数の処理装置、 或いは異なる処理を行なう複数の処理装置を、 共通の搬 送室を介して相互に結合して、 ウェハを大気に晒すことなく各種工程の連続処理 を可能とした、 いわゆるクラスタ化された処理システム装置が、 すでに知られて いる。  Generally, in order to manufacture a semiconductor integrated circuit, various processes such as film formation, etching, oxidation, and diffusion are performed on a wafer. In order to improve throughput and yield due to miniaturization and high integration of semiconductor integrated circuits, a plurality of processing units performing the same process or a plurality of processing units performing different processes are provided in a common transport chamber. A so-called clustered processing system device, which is capable of continuous processing of various processes without exposing the wafer to the atmosphere, is already known.
この種の処理システムにあっては、 例えば処理システムの前段に設けてある被 処理体の導入ポートに設置したカセット容器より搬送機構を用いて半導体ウェハ を取り出してこれを処理システムの導入側搬送室内へ取り込み、 そして、 このゥ ェハを、 位置合わせを行うオリエンタにて位置合わせを行った後に、 真空引き可 能になされた口 ドロック室内へ搬入し、 更にこのウェハを複数の真空になされ た処理室が周囲に連結された真空雰囲気の共通搬送室に他の搬送機構を用いて搬 入し、 この共通搬送室を中心として上記ウェハを各処理室に対して順次導入して 処理を連続的に行うようになっている。 そして、 処理済みのウェハは、 例えば元 の経路を通って元のカセット容器へ収容される。  In this type of processing system, for example, a semiconductor wafer is taken out from a cassette container installed at an introduction port of an object to be processed, which is provided in a preceding stage of the processing system, using a transfer mechanism, and the semiconductor wafer is taken out of the transfer chamber on the introduction side of the processing system. After the wafer is positioned by an orienter that performs positioning, it is carried into a vacuum-equipped mouth lock chamber, and the wafer is subjected to a plurality of vacuum processes. The wafers are transferred into a common transfer chamber in a vacuum atmosphere connected to the surroundings using another transfer mechanism, and the wafers are sequentially introduced into the respective processing chambers with the common transfer chamber as the center to continuously process. Is supposed to do it. Then, the processed wafer is stored in the original cassette container, for example, via the original path.
ところで、 上記したように、 この種の処理システムにあっては、 内部に単数、 或いは複数の搬送機構を有しており、 ウェハの受け渡し、 及び搬送はこれらの搬 送機構により自動的に行われる。  By the way, as described above, this type of processing system has a single or multiple transfer mechanisms inside, and the transfer and transfer of wafers are automatically performed by these transfer mechanisms. .
この搬送機構は、 例えば水平移動、 屈伸、 旋回及び昇降自在になされた多関節 アームよりなり、 このアーム先端に設けたピックでウェハを直接的に保持して搬 送位置まで水平移動してウェハを所定の位置まで搬送するようになつている。 この場合、 搬送機構の動作中にこのアームやピックや保持しているゥェハが他 の部材と干渉乃至衝突することを避けなければならないばかり力 ある一定の場 所に置かれているウェハを適正に保持し、 且つこのウェハを目的とする位置まで 搬送し、 適正な場所に精度良く、 例えば ± 0 . 2 O mm以内の高い位置精度で受 け渡す必要がある。 This transfer mechanism is, for example, a multi-joint that can move horizontally, bend, extend, turn, and move up and down. The pick-up provided at the end of the arm directly holds the wafer, horizontally moves to the transfer position, and transfers the wafer to a predetermined position. In this case, it is necessary to avoid interference or collision of the arm, pick or holding wafer with other members during the operation of the transfer mechanism, and the wafer placed in a certain place must be properly removed. It is necessary to hold the wafer, transfer the wafer to a target position, and deliver it to an appropriate place with high accuracy, for example, high positional accuracy within ± 0.2 O mm.
このため、 装置の組立の際や大きな装置改造を行った際などには、 搬送機構の ピックの移動経路においてウェハ Wの受け渡しを行なう場所などの重要な位置を 、 この搬送機構の動作を制御するコンピュータ等の制御部に位置座標として覚え こませる、 いわゆるティーチングという操作が行なわれている。  For this reason, when assembling the apparatus or performing a major remodeling of the apparatus, an important position such as a place for transferring the wafer W in the movement path of the pick of the transfer mechanism is controlled by controlling the operation of the transfer mechanism. A so-called teaching operation is performed in which a control unit such as a computer learns the position coordinates.
このティーチングは、 例えば搬送機構とカセット容器との位置関係、 ウェハを 取るためのピックとカセット容器の各载置棚の高さ方向の位置関係、 ロードロッ ク室の载置台とピックとの位置関係、 ピックとオリエンタとの位置関係、 ピック と各処理室内のサセプタとの位置関係など、 ウェハの受け渡しを行なうためのほ とんど全ての場合について行なわれ、 その位置座標が記憶される。 尚、 全ての駆 動系には、 その駆動位置を特定するためのェンコ一ダ等が組み込まれてレ、るのは 勿論である。  This teaching includes, for example, the positional relationship between the transport mechanism and the cassette container, the positional relationship between the pick for picking up wafers and each shelf of the cassette container in the height direction, the positional relationship between the loading table in the load lock chamber and the pick, The positional relationship between the pick and the orienter, the positional relationship between the pick and the susceptor in each processing chamber, and the like is performed in almost all cases for transferring the wafer, and the position coordinates are stored. It is a matter of course that all drive systems incorporate an encoder or the like for specifying the drive position.
具体的にティーチング操作を行うには、 まず、 搬送機構の移動経路のある点を 絶対基準として装置全体のティーチングすべき場所の位置座標を装置の設計値か ら求め、 これを仮の位置座標として制御部に予め入力して記憶させておく。 この 場合、 ピックが他の部材と干渉しないように所定量のマージンを見込んで各仮の 位置座標を入力する。  In order to perform the teaching operation, first, the position coordinates of the position where the entire device should be taught are determined from the design values of the device with reference to a certain point on the moving path of the transport mechanism as the absolute reference. The information is input and stored in the control unit in advance. In this case, each temporary position coordinate is input in consideration of a predetermined margin so that the pick does not interfere with other members.
次に、 個々の仮の位置座標に基づいて搬送機構を駆動してこのピックがティー チング基準位置の近傍まで移動してきたならば、 搬送機構の動作を手動 (以下、 マニュアルとも称す) に切り替えて、 ピックを他の部材と干渉しないように目視 で確認しながら僅かずつマニュアルで動かす。 そして、 ピックとカセット容器内 の所定の位置に予め設置した上記位置合わせ用基板とが適正な位置で接触するよ うに目視しながら操作し、 その座標を位置座標として制御部へ記憶することによ り、 ティーチングを行なっていた。 Next, when the transport mechanism is driven based on the individual temporary position coordinates and this pick has moved to the vicinity of the teaching reference position, the operation of the transport mechanism is switched to manual (hereinafter also referred to as manual). Manually move the pick little by little while visually checking the pick so as not to interfere with other members. Then, the picking operation is performed while visually checking that the positioning substrate previously installed at a predetermined position in the cassette container is in contact with an appropriate position, and the coordinates are stored as position coordinates in the control unit. And teaching.
また、 ロードロック室や各処理室の載置台ゃサセプタに対して、 ティーチング 操作を行う場合にも、 これらの中心に対して上記位置合わせ用基板をそれぞれ設 置し、 対応するピックをまず、 干渉しない安全な近傍の位置まで自動的に移動さ せ、 その後に、 これをマニュアルで動かして、 前述したと同様に両者を正確に一 致させてその時の位置座標を制御部へ記憶させる。 尚、 この位置合わせ用基板は 例えば透明板よりなり、 これには、 位置合わせすべきピックや他の载置台等の輪 郭などが予め描かれている。  Also, when performing a teaching operation on the mounting table and susceptor in the load lock chamber and each processing chamber, the above-mentioned alignment substrates are respectively set at the centers of these, and the corresponding picks are first interfered. Automatically move to a safe nearby position, and then move it manually to match the two exactly as described above and store the position coordinates at that time in the control unit. Note that the positioning substrate is made of, for example, a transparent plate, on which a pick to be aligned and a contour of another mounting table or the like are drawn in advance.
また、 上記手動操作 (マニュアル) とは、 具体的にはキーボードやジョイステ イツクで移動方向 ( + /_) と移動量とを制御部に入力してピックを含むアーム 等を動作させることを意味する。  In addition, the manual operation (manual) means that the moving direction (+ / _) and the moving amount are input to the control unit using a keyboard or a joystick, and the arm including the pick is operated. .
また、 先行技術である特開 2 0 0 0 _ 1 2 7 0 6 9号公報においては、 オリエ ンタを利用することにより、 ティ一チング操作の省力化及び高精度化を図ってい るが、 ティーチング作業の一部において上記手動操作が必要とされる、 という問 題がある。 発 明 の 開 示  Further, in Japanese Patent Application Laid-Open No. 2000-127690, which is a prior art, an orienter is used to save labor and increase the accuracy of the teaching operation. There is a problem that the above manual operation is required in a part of the work. Disclosure of the invention
ところで、 上述したようなティーチング方法では、 搬送機構自体を、 ティーチ ングすべき目的位置の近傍の十分に安全な位置まで自動的に移動させるようにし 、 その後に、 安全を目視で確認しつつマニュアル操作でピックを僅かな距離ずつ 水平方向及び上下方向等へ移動させてピックを目的とする位置まで動かすように している。  By the way, in the teaching method as described above, the transport mechanism itself is automatically moved to a sufficiently safe position in the vicinity of the target position to be taught, and then the manual operation is performed while visually confirming the safety. The pick is moved by a small distance in the horizontal and vertical directions to move the pick to the target position.
このため、 最初にピックを目的位置の近傍の十分に安全な位置まで自動的に移 動させたとはいえ、 その後にマ二ュアル操作でピックを僅かずつ移動させる区間 がかなり長くなり、 このためティーチング操作に長時間を要してしまう、 といつ た問題点が存在した。 特に、 このようなティーチング操作は、 前述したように、 半導体ウェハを受け渡しするほとんど全ての位置において行わなければならない ので、 ティーチング操作の時間が全体で非常に長くなつてしまう、 といった問題 があった。 本発明は、 以上のような問題点に着目し、 これを有効に解決すべく創案された ものである。 本発明の目的は、 ティーチング操作の時間を大幅に削減し、 短縮化 することが可能なティーチング方法及び処理システムを提供することにある。 本発明者等は、 ティーチング操作の時間短縮化について鋭意研究した結果、 搬 送機構を目的位置の近傍に自動で移動した後であつても、 搬送機構のピックを特 定の箇所の部分を注意して調整移動させるようにすれば、 目的位置に達するまで に自動で移動できる部分がある程度存在する、 という知見を得ることにより本発 明に至ったものである。 For this reason, although the pick was automatically moved to a sufficiently safe position near the target position first, the section in which the pick was moved little by little by manual operation became considerably longer. There was a problem that the operation took a long time. In particular, as described above, such a teaching operation has to be performed at almost all positions where the semiconductor wafer is transferred, so that there has been a problem that the entire time of the teaching operation becomes extremely long. The present invention has been devised in view of the above problems and effectively solving them. An object of the present invention is to provide a teaching method and a processing system capable of greatly reducing and shortening a teaching operation time. The present inventors have conducted intensive studies on shortening the teaching operation time, and as a result, even after automatically moving the transport mechanism to the vicinity of the target position, pay attention to the pick of the transport mechanism at a specific location. The present invention was achieved by obtaining the knowledge that there is a certain part that can be automatically moved before reaching the target position if it is adjusted and moved.
本発明によるティーチング方法は、 ピックにより被処理体を保持して搬送する ための搬送機構を備えた処理システムにおける前記搬送機構の移動目的位置を制 御手段に記憶させるティーチング方法において、 前記搬送機構を、 仮の移動目的 位置まで移動する移動経路の途中で前記搬送機構が他の部材と干渉する恐れのあ る干渉注意箇所において他の部材との干渉が生じないことを確認させるために一 時停止させる一時停止工程と、 一時停止された前記搬送機構を移動指令の入力に より移動再開させる移動再開工程と、 前記一時停止工程と移動再開工程とを繰り 返し行う繰り返し工程と、 前記ピックが前記仮の移動目的位置に到達した時に前 記ピックの位置を調整移動して 或いは調整移動しないで移動目的位置として前 記制御手段に記憶させる記憶工程と、 を備えたことを特徴とするものである。 このように、 搬送機構が他の部材と干渉する恐れのある場所 (箇所) だけ搬送 機構を一時停止させて必要なら位置調整し、 搬送機構が他の部材と干渉しないよ うな場所では搬送機構を自動で積極的に移動させるようにしたので、 全体として ティーチング操作に要する時間を大幅に削減することが可能となる。  The teaching method according to the present invention is a teaching method in which a movement target position of the transport mechanism in a processing system including a transport mechanism for holding and transporting an object to be processed by a pick is stored in a control unit. In the middle of the movement route to the temporary movement target position, the transportation mechanism pauses to confirm that there is no interference with other members at the point of caution where there is a risk of interference with other members. A pause step of causing the transport mechanism to pause and resume the movement of the transport mechanism by inputting a movement command; a repetition step of repeatedly performing the pause step and the movement resumption step; The position of the pick is adjusted or moved when the pick-up target position is reached or the pick target is moved to the control means without being adjusted. And a storing step of storing. In this way, the transport mechanism is temporarily stopped only at places (points) where the transport mechanism may interfere with other members, and the position is adjusted if necessary. If the transport mechanism does not interfere with other members, the transport mechanism is stopped. Since the robot is automatically and positively moved, the time required for teaching operation can be significantly reduced as a whole.
この場合、 前記一時停止した搬送機構が他の部材と干渉する恐れのある時には 前記搬送機構を他の部材と干渉する恐れのない位置まで調整移動させることがで さる。 '  In this case, when there is a risk that the temporarily stopped transport mechanism may interfere with other members, the transport mechanism can be adjusted and moved to a position where there is no risk of interfering with other members. '
また、 前記干渉注意箇所は、 前記処理システムの設計寸法に基づいて前記制御 手段が予め算出して求めるようにすることができる。  Further, the interference caution point may be calculated and obtained in advance by the control means based on a design dimension of the processing system.
また、 前記制御手段は、 前記搬送機構が一時停止する毎に、 表示部にオペレー タに対して干渉注意を喚起させるためのメッセージを表示させることができる。 このように、 表示部にて干渉注意を喚起させるためのメッセージを表示させる ようにしたので、 オペレータがこのメッセージを認識することにより、 搬送機構 に関して他の部材との干渉をより確実に防止することが可能となる。 Further, the control means can display a message for calling attention to interference to the operator on the display unit every time the transport mechanism is temporarily stopped. As described above, a message for calling attention to interference is displayed on the display unit, so that the operator recognizes this message, thereby more reliably preventing the transport mechanism from interfering with other members. Becomes possible.
また、 前記搬送機構は、 屈伸及び旋回可能になされた多関節アームを有してい ることが好ましい。  Further, it is preferable that the transport mechanism has a multi-joint arm that can be bent and extended and turned.
また、 前記移動目的位置は、 前記被処理体を前記処理システム内へ取り込む導 入ポート内の所定の位置であることが好ましい。  Further, it is preferable that the movement target position is a predetermined position in an introduction port for taking the object to be processed into the processing system.
本発明による処理システムは、 被処理体に対して所定の処理を施す処理室と、 被処理体を導入するための導入ポートと、 被処理体の位置決めを行うオリエンタ と、 被処理体を保持するピックを有して被処理体を搬送する搬送機構と、 前記搬 送機構の動作を制御する制御手段と、 を有する処理システムにおいて、 前記制御 手段は、 前記搬送機構を、 仮の移動目的位置まで移動する移動経路の途中で前記 搬送機構が他の部材と干渉する恐れのある干渉注意箇所において他の部材との干 渉が生じないことを確認させるために一時停止させる一時停止工程と、 一時停止 された前記搬送機構を移動指令の入力により移動再開させる移動再開工程と、 前 記一時停止工程と移動再開工程とを繰り返し行う繰り返し工程と、 前記ピックが 前記仮の移動目的位置に到達した時に前記ピックの位置を調整移動して、 或いは 調整移動しないで移動目的位置として前記制御手段に記憶させる記憶工程と、 を 実行させるように構成されていることを特徴とするものである。  A processing system according to the present invention includes a processing chamber for performing a predetermined process on a processing target, an introduction port for introducing the processing target, an orienter for positioning the processing target, and holding the processing target. In a processing system comprising: a transport mechanism having a pick for transporting an object to be processed; and control means for controlling the operation of the transport mechanism, wherein the control means moves the transport mechanism to a temporary movement target position. A suspending step of suspending to confirm that no interference occurs with another member at a point of caution where the transport mechanism may interfere with another member in the middle of a moving path; A movement resumption step of resuming the movement of the transport mechanism by input of a movement command, a repetition step of repeatedly performing the pause step and the movement resumption step, and And adjusting the position of the pick when it reaches the movement target position, or storing the pick position in the control means as the movement target position without performing the adjustment movement. Things.
この場合、 前記制御手段は、 前記処理システムの設計寸法に基づいて前記干渉 注意箇所を予め算出して求めるようにすることができる。  In this case, the control unit may calculate and obtain the interference attention point in advance based on a design dimension of the processing system.
また、 前記制御手段は表示部に接続されており、 前記制御手段は、 前記搬送機 構が一時停止する毎に、 表示部にオペレータに対して干渉注意を喚起させるため のメッセージを表示させることができる。. 図面の簡単な説明  Further, the control unit is connected to a display unit, and the control unit may cause the display unit to display a message for calling attention to an operator on the display unit every time the transport mechanism is temporarily stopped. it can. Brief description of the drawings
図 1は、 本発明のティーチング方法を実施するための処理システムの一例を示 す構成図である。  FIG. 1 is a configuration diagram showing an example of a processing system for implementing the teaching method of the present invention.
図 2は、 図 1に示す処理システムの模式図である。 図 3は、 導入ポートを示す概略構成図である。 FIG. 2 is a schematic diagram of the processing system shown in FIG. FIG. 3 is a schematic configuration diagram showing an introduction port.
図 4は、 オリエンタを示す概略構成図である。  FIG. 4 is a schematic configuration diagram showing an orienter.
図 5は、 ロードロック室を示す概略構成図である。  FIG. 5 is a schematic configuration diagram showing a load lock chamber.
図 6は、 操作ユニットを示す平面図である。  FIG. 6 is a plan view showing the operation unit.
図 7 Aは、 本発明方法の第 1実施例である導入ポートに対してティーチング操 作を行う時の一例であって、 第 1の干渉注意箇所を示す図である。  FIG. 7A is an example when a teaching operation is performed on an introduction port according to the first embodiment of the present invention, and is a diagram illustrating a first interference attention point.
図 7 Bは、 本発明方法の第 1実施例である導入ポートに対してティーチング操 作を行う時の一例であって、 第 2の干渉注意箇所を示す図である。  FIG. 7B is a diagram illustrating an example of performing a teaching operation on the introduction port according to the first embodiment of the present invention, and illustrates a second point of caution for interference.
図 7 Cは、 本発明方法の第 1実施例である導入ポートに対してティーチング操 作を行う時の一例であって、 第 3の干渉注意箇所を示す図である。  FIG. 7C is a diagram showing an example of performing a teaching operation on the introduction port, which is the first embodiment of the method of the present invention, and is a diagram showing a third point of caution for interference.
図 7 Dは、 本発明方法の第 1実施例である導入ポートに対してティーチング操 作を行う時の一例であって、 仮の移動目的位置を示す図である。  FIG. 7D is an example of performing a teaching operation on the introduction port according to the first embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
図 7 Eは、 本発明方法の第 1実施例である導入ポートに対してティーチング操 作を行う時の一例であって、 移動目的位置を示す図である。  FIG. 7E is an example of performing a teaching operation on the introduction port, which is the first embodiment of the method of the present invention, and is a diagram showing a movement target position.
図 8は、 本発明のティーチング方法の流れを示すフローチャートである。 図 9は、 本発明の第 2実施例であるオリエンタに対してティーチング操作を行 う時の一例を示す図である。  FIG. 8 is a flowchart showing the flow of the teaching method of the present invention. FIG. 9 is a diagram showing an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention.
図 9 Aは、 本発明の第 2実施例であるオリエンタに対してティーチング操作を 行う時の一例であって、 第 1の干渉注意箇所を示す図である。  FIG. 9A is an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention, and is a diagram illustrating a first point of caution for interference.
図 9 Bは、 本発明の第 2実施例であるオリエンタに対してティーチング操作を 行う時の一例であって、 第 2の干渉注意箇所を示す図である。  FIG. 9B is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a second point of caution for interference.
図 9 Cは、 本 明の第 2実施例であるオリエンタに対してティーチング操作を 行う時の一例であって、 仮の移動目的位置を示す図である。  FIG. 9C is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a temporary movement target position.
図 9 Dは、 本発明の第 2実施例であるオリエンタに対してティーチング操作を 行う時の一例であって、 移動目的位置を示す図である。  FIG. 9D is an example when a teaching operation is performed on the orienter according to the second embodiment of the present invention, and is a diagram illustrating a movement target position.
図 1 O Aは、 本発明の第 3実施例であるロード口ック室に対してティーチング 操作を行う時の一例であって、 第 1の干渉注意箇所を示す図である。  FIG. 1OA is an example when a teaching operation is performed on a load opening chamber according to a third embodiment of the present invention, and is a diagram illustrating a first interference attention point.
図 1 O Bは、 本発明の第 3実施例であるロードロック室に対してティーチング 操作を行う時の一例であって、 第 2の干渉注意箇所を示す図である。 図 1 O Cは、 本発明の第 3実施例であるロードロック室に対してティーチング 操作を行う時の一例であって、 第 3の干渉注意箇所を示す図である。 FIG. 1OB is a diagram showing an example of performing a teaching operation on a load lock chamber according to a third embodiment of the present invention, and is a diagram showing a second point of caution for interference. FIG. 1 OC is an example of performing a teaching operation on a load lock chamber according to a third embodiment of the present invention, and is a diagram illustrating a third point of caution for interference.
図 1 0 Dは、 本発明の第 3実施例であるロードロック室に対してティーチング 操作を行う時の一例であって、 第 4の干渉注意箇所を示す図である。  FIG. 10D is an example when a teaching operation is performed on the load lock chamber according to the third embodiment of the present invention, and is a diagram illustrating a fourth point of caution for interference.
図 1 0 Eは、 本発明の第 3実施例であるロード口ック室に対してティーチング 操作を行う時の一例であって、 仮の移動目的位置を示す図である。 発明を実施するための最良の形態  FIG. 10E is an example when a teaching operation is performed on the load opening chamber according to the third embodiment of the present invention, and is a diagram illustrating a temporary movement target position. BEST MODE FOR CARRYING OUT THE INVENTION
以下に、 本発明に係るティーチング方法及び処理システムの一実施例を添付図 面に基づいて詳述する。  Hereinafter, an embodiment of a teaching method and a processing system according to the present invention will be described in detail with reference to the accompanying drawings.
図 1は本発明のティーチング方法を実施するための処理システムの一例を示す 構成図、 図 2は図 1に示す処理システムの模式図、 図 3は導入ポートを示す概略 構成図、 図 4はオリエンタを示す概略構成図、 図 5はロードロック室を示す概略 構成図、 図 6は操作ュニットを示す平面図である。  1 is a configuration diagram showing an example of a processing system for implementing the teaching method of the present invention, FIG. 2 is a schematic diagram of the processing system shown in FIG. 1, FIG. 3 is a schematic configuration diagram showing an introduction port, and FIG. FIG. 5 is a schematic configuration diagram showing a load lock chamber, and FIG. 6 is a plan view showing an operation unit.
まず、 上記処理システムについて説明する。  First, the processing system will be described.
図 1に示すように、 この処理システム 2は、 複数、 例えば 4つの処理室 4 A、 4 B、 4 C、 4 Dと、 略六角形状の共通搬送室 6と、 ロードロック機能を有する 第 1及び第 2ロードロック室 8 A、 8 Bと、 細長い導入側搬送室 1 0とを主に有 している。  As shown in FIG. 1, the processing system 2 includes a plurality of, for example, four processing chambers 4A, 4B, 4C, and 4D, a substantially hexagonal common transfer chamber 6, and a first locking apparatus having a load lock function. And a second load lock chamber 8A, 8B, and a slender inlet-side transfer chamber 10 mainly.
具体的には、 略六角形状の上記共通搬送室 6の 4辺に上記各処理室 4 A〜 4 D が接合され、 他側の 2つの辺に、 上記第 1及び第 2ロードロック室 8 A、 8 Bが それぞれ接合される。 そして、 この第 1及び第2ロードロック室 8 A、 8 Bに、 上記導入側搬送室 1 0が共通に接続される。 Specifically, the processing chambers 4A to 4D are joined to four sides of the substantially hexagonal common transfer chamber 6, and the first and second load lock chambers 8A are connected to the other two sides. , 8B are joined respectively. The introduction-side transfer chamber 10 is commonly connected to the first and second load lock chambers 8A and 8B.
上記共通搬送室 6と上記 4つの各処理装置 4 A〜 4 Dとの間及び上記共通搬送 室 6と上記第 1及ぴ第 2ロードロック室 8 A、 8 Bとの間は、 それぞれ気密に開 閉可能になされたゲートバルブ Gが介在して接合されて、 クラスタツール化され ており、 必要に応じて共通搬送室 6内と連通可能になされている。 また、 上記第 1及ぴ第 2各ロードロック室 8 A、 8 Bと上記導入側搬送室 1 0との間にも、 そ れぞれ気密に開閉可能になされたゲートバルブ Gが介在されている。 上記 4つの処理室 4 A〜 4 D内には、 それぞれ被処理体としての半導体ウェハ を載置するサセプタ 1 2 A〜1 2 Dが設けられており、 被処理体である半導体ゥ ェハ Wに対して同種の、 或いは異種の処理を施すようになつている。 そして、 こ の共通搬送室 6内においては、 上記 2つの各ロードロック室 8 A、 8 B及び 4つ の各処理室 4 A〜4 Dにアクセスできる位置に、 屈伸、 昇降及び旋回可能になさ れた多関節アームよりなる第 2搬送機構 1 4が設けられており、 これは、 互いに 反対方向へ独立して屈伸できる 2つのピック B 1、 B 2を有しており、 一度に 2 枚のウェハを取り扱うことができるようになつている。 尚、 上記第 2搬送機構 1 4として 1つのみのピックを有しているものも用いることができる。 The space between the common transfer chamber 6 and the four processing units 4A to 4D and the space between the common transfer chamber 6 and the first and second load lock chambers 8A and 8B are airtight, respectively. The gate valve G, which can be opened and closed, is joined to form a cluster tool, and can be communicated with the common transfer chamber 6 as necessary. Gate valves G, which can be opened and closed in an airtight manner, are also interposed between the first and second load lock chambers 8A and 8B and the introduction-side transfer chamber 10 respectively. I have. In the four processing chambers 4A to 4D, susceptors 12A to 12D for mounting semiconductor wafers as processing objects are provided, respectively, and the semiconductor wafer W to be processed is provided. To the same or different types of processing. In the common transfer chamber 6, the two load lock chambers 8A and 8B and the four processing chambers 4A to 4D can be bent, stretched, raised and lowered, and turned in a position where they can be accessed. A second transfer mechanism 14 comprising an articulated arm is provided, which has two picks B 1 and B 2 which can bend and extend independently in opposite directions, and two picks B 1 and B 2 at a time. It can handle wafers. It should be noted that a mechanism having only one pick may be used as the second transport mechanism 14.
上記導入側搬送室 1 0は、 横長の箱体により形成されており、 この横長の一側 には、 被処理体である半導体ウェハを導入するための 1つ乃至複数の、 図示例で は 3つの搬入口 1 6が設けられ、 各搬入口 1 6には、 開閉可能になされた開閉ド ァ 2 1が設けられる。 そして、 この各搬入口 1 6に対応させて、 導入ポート 1 8 A、 1 8 B、 1 8 Cがそれぞれ設けられ、 ここにそれぞれ 1つずつカセット容器 2 0を载置できるようになつている。 各カセット容器 2 0には、 複数枚、 例えば 2 5枚のウェハ Wを等ピッチで多段に載置して収容できるようになつている。 こ のカセット容器 2 0にも開閉蓋 2 O A (図 3参照) が取り付けられている。 図 3 には上記 3つの導入ポート 1 8 A〜 1 8 Cの内の中央の導入ポート 1 8 Bが示さ れており、 各導入ポート 1 8 A〜1 8 Cにはカセット容器 2 0の開閉蓋 2 O Aを 開閉するために昇降及び進退可能になされた開閉ドア 2 1の駆動機構 2 1 Aが設 けられている。  The introduction-side transfer chamber 10 is formed of a horizontally long box. One or more of the horizontally long boxes are used to introduce a semiconductor wafer to be processed. One carry-in entrance 16 is provided, and each carry-in entrance 16 is provided with an opening / closing door 21 which can be opened and closed. In addition, introduction ports 18 A, 18 B, and 18 C are respectively provided corresponding to the respective entrances 16, and one cassette container 20 can be placed in each of the introduction ports 18 A, 18 B, and 18 C. . Each cassette container 20 is capable of accommodating a plurality of wafers W, for example, 25 wafers W, mounted in multiple stages at an equal pitch. The cassette container 20 is also provided with an opening / closing lid 2OA (see FIG. 3). Fig. 3 shows the central introduction port 18B of the three introduction ports 18A to 18C, and each of the introduction ports 18A to 18C opens and closes the cassette container 20. A drive mechanism 21 A for an opening / closing door 21 that can move up and down and move forward and backward to open and close the lid 2 OA is provided.
この導入側搬送室 1 0内には、 ウェハ Wをその長手方向に沿って搬送するため め導入側搬送機構である第 1搬送機構 2 2が設けられる。 この第 1搬送機構 2 2 は、 導入側搬送室 1 0内の中心部を長さ方向に沿って延びるように設けた案内レ ール 2 4'上にスライド移動可能に支持されている。 この案内レール 2 4には、 移 動機構として例えばエンコーダを有するリニァモータが内蔵されており、 このリ ニァモータを駆動することにより上記第 1搬送機構 2 2は案内レール 2 4に沿つ て移動することになる。 In the introduction-side transfer chamber 10, a first transfer mechanism 22, which is an introduction-side transfer mechanism, for transferring the wafer W along its longitudinal direction is provided. The first transfer mechanism 22 is slidably supported on a guide rail 24 ′ provided so as to extend along the length direction in the center of the introduction-side transfer chamber 10. This in the guide rail 2 4, Riniamota having, for example, an encoder as moving mechanism and is built, the first transport mechanism 2 2 by driving the re Niamota is moving Te沿Tsu the guide rail 2 4 become.
また、 上記第 1搬送機構 2 2は、 上下 2段に配置された 2つの多関節アーム 3 2、 3 4を有している。 この各多関節アーム 3 2、 3 4の先端にはそれぞれ 2股 状になされたピック A l、 A 2を取り付けており、 このピック A l、 A 2上にそ れぞれウェハ Wを直接的に保持するようになっている。 従って、 各多関節アームThe first transfer mechanism 2 2 is composed of two articulated arms 3 arranged in two upper and lower stages. It has two, three and four. At the tip of each of the articulated arms 3 2 and 3 4, a bifurcated pick A 1 and A 2 are attached, respectively, and the wafer W is directly placed on each of the picks A 1 and A 2. To be held. Therefore, each articulated arm
3 2、 3 4は、 この中心より半径方向へ屈伸自在及び昇降自在になされており、 また、 各多関節アーム 3 2、 3 4の屈伸動作は個別に制御可能になされている。 上記多関節アーム 3 2、 3 4の各回転軸は、 それぞれ基台 3 6に対して同軸状に 回転可能に連結されており、 例えば基台 3 6に対する旋回方向へ一体的に回転で きるようになつている。 尚、 ここで上記ピック A 1、 A 2は 2つではなく、 1つ のみ設ける場合もある。 Reference numerals 32 and 34 are provided to be able to freely bend and elongate and ascend and descend in the radial direction from the center, and the bending and elongation of each of the articulated arms 32 and 34 is individually controllable. The rotating shafts of the articulated arms 32 and 34 are coaxially rotatably connected to the base 36, respectively, so that they can rotate integrally in the direction of rotation with respect to the base 36, for example. It has become. Here, the picks A 1 and A 2 may not be two but only one.
また、 導入側搬送室 1 0の他端には、 ウェハの位置合わせを行なうオリエンタ 2 6が設けられ、 更に、 導入側搬送室 1 0の長手方向の途中には、 前記 2つの口 一ドロック室 8 A、 8 Bがそれぞれ開閉可能になされた前記グートパルプ Gを介 して設けら^ Lる。  An orienter 26 for aligning a wafer is provided at the other end of the introduction-side transfer chamber 10. Further, in the longitudinal direction of the introduction-side transfer chamber 10, the two port lock chambers are provided. 8A and 8B are provided via the above-mentioned gout pulp G which can be opened and closed, respectively.
上記オリエンタ 2 6は、 図 4にも示すように駆動モータ 2 7によって回転され る回転台 2 8を有しており、 この上にウェハ Wを載置した状態で回転するように なっている。 この回転台 2 8の外周には、 ウェハ Wの周縁部を検出するための光 学センサ 3 0が設けられ、 これによりウェハ Wの位置決め切り欠き、 例えばノッ チゃオリエンテーションフラットの位置方向やウェハ Wの中心の位置ずれ量を検 出できるようになつている。  The orienter 26 has a turntable 28 rotated by a drive motor 27 as shown in FIG. 4, and rotates with the wafer W mounted thereon. An optical sensor 30 for detecting the peripheral edge of the wafer W is provided on the outer periphery of the turntable 28, and thereby a positioning notch of the wafer W, for example, the position direction of the notch-orientation flat or the wafer W It is possible to detect the amount of positional deviation of the center of the image.
また、 上記第 1及び第 2ロードロック室 8 A、 8 B内には、 ウェハ Wを一時的 に載置するためにウェハ径よりも小さい直径の载置台 3 8 A、 3 8 Bがそれぞれ 設置されている (図 5参照) 。 そして、 この処理システム 2の動作全体の制御、 例えば各搬送機構 1 4 , 2 2ゃォリエンタ 2 6等の動作制御は、 例えばマイク口 コンピュータ等よりなる制御部 4 0により行われる。 この制御部 4 0には、 オペ レータに所定のメッセージ等を使えるための液晶表示ュニット等よりなる表示部 In the first and second load lock chambers 8A and 8B, mounting tables 38A and 38B each having a diameter smaller than the wafer diameter are provided for temporarily mounting the wafer W. (See Figure 5). The control of the entire operation of the processing system 2, for example, the operation control of each of the transport mechanisms 14, 22 and the aligner 26, is performed by a control unit 40 including, for example, a microphone computer. The control unit 40 includes a display unit composed of a liquid crystal display unit or the like so that a predetermined message or the like can be used for the operator.
4 2や所定の入力を行うテンキー等のキー群 4 4が設けられた操作ュニット 4 1 が接続される。 尚、 表示部 4 2にタツチパネル方式を用いて、 キー群 4 4の機能 を表示部 4 2に兼用させるようにしてもよい。 ティーチング操作は、 この操作ュ ニット 4 1をティーチングを行なう場合に持っていってピック等を注視しつつ行 われる。 An operation unit 41 provided with a key group 44 such as 42 or a numeric keypad for performing a predetermined input is connected. Note that a touch panel method may be used for the display section 42 so that the function of the key group 44 is shared with the display section 42. The teaching operation is carried out while holding the operation unit 41 when performing teaching and watching the pick. Is
次に、 以上のように形成された処理システムにおいて実施されるティ一チング 方法について説明する。  Next, a teaching method performed in the processing system formed as described above will be described.
まず、 上述のような処理システム 2を組み上げただけでは、 半導体ウェハ Wの 受け渡しゃ移载のために各搬送機構 1 4、 2 2の移動目的位置は定まっておらず 、 この移動目的位置を座標としてその制御系に記憶させる必要があり、 この操作 をティーチングと称す。 この場合、 処理システム 2の組み立て誤差や各搬送機構 1 4 , 2 2の初期設定における誤差等に起因して処理システム 2の各部の設計寸 法から計算によって定まる仮の移動目的位置は、 実際に組み立て後の処理システ ム 2における移動目的位置とは、 ある程度の距離だけ位置ずれするのが一般的で める。  First, only by assembling the processing system 2 as described above, the transfer target positions of the transfer mechanisms 14 and 22 for the transfer and transfer of the semiconductor wafer W are not determined. This operation must be stored in the control system, and this operation is called teaching. In this case, the temporary movement target position determined by calculation from the design dimensions of each part of the processing system 2 due to an assembly error of the processing system 2 or an error in the initial setting of each transport mechanism 14, 22 is actually In general, it is likely that the position is shifted by a certain distance from the movement target position in the processing system 2 after assembly.
従って、 ティーチング操作のために処理システムの設計寸法より計算によって 求めた他の移動目的位置までピックを含む搬送機構を自動的に移動させると、 そ の移動経路において他の部材と干渉して衝突する恐れがある。 そのため、 従来の ティ一チング操作においては、 計算によって求めた仮の移動目的位置よりもかな り手前の位置まで、 すなわち搬送機構が他の部材と絶対に干渉する恐れが いよ うな位置であって、 且つ仮の移動目的位置に最も近い位置まで自動で搬送機構を 移動させ、 その後は、 前述したように目視で他の部材と干渉が生じないことを確 認しながら、 マニュアル操作で僅かな距離ずつ搬送機構を移動させて、 最終的に ピックを所定の適正な場所に位置させ、 その時の座標を移動目的位置として記憶 させていた。 しかしながら、 この従来のティーチング方法では、 目視しつつマ- ュアル操作で搬送機構を移動させる時間が非常に長くなり、 ティーチング操作に 長時間を要する、 といった問題があった。  Therefore, if the transport mechanism including the pick is automatically moved to another movement target position calculated by the design dimensions of the processing system for teaching operation, it will collide with other members in the movement path and collide. There is fear. Therefore, in the conventional teaching operation, it is a position far before the tentative movement target position obtained by calculation, that is, a position where there is a possibility that the transport mechanism absolutely interferes with other members, and In addition, the transport mechanism is automatically moved to the position closest to the temporary movement target position, and thereafter, as described above, a slight distance is manually operated by hand while confirming that there is no interference with other members. By moving the transport mechanism, the pick is finally positioned at a predetermined appropriate position, and the coordinates at that time are stored as the movement target position. However, this conventional teaching method has a problem in that the time required to move the transport mechanism by manual operation while visually observing becomes extremely long, and the teaching operation requires a long time.
そこで、 本発明のティーチング方法では、 搬送機構を、 仮の移動目的位置まで 移動する移動経路の途中で前記搬送機構が他の部材と干渉する恐れのある干渉注 意箇所において他の部材との干渉が生じないことを確認させるために一時停止さ せる一時停止工程と、 一時停止された前記搬送機構を移動指令の入力により移動 再開させる移動再開工程と、 前記一時停止工程と移動再開工程とを繰り返し行う 繰り返し工程と、 前記ピックが前記仮の移動目的位置に到達した時に前記ピック の位置を調整移動して、 或いは調整移動しないで移動目的位置として前記制御手 段に記憶させる記憶工程とを備えるようにして行う。 すなわち、 処理システムの 設計寸法等より求まる仮の移動目的位置までの移動経路の途中において、 搬送機 構が他の部材と干渉乃至衝突する恐れのある位置を干渉注意箇所として予め求め る。 この干渉注意箇所を求める際には、 搬送機構の多関節アームやピックの寸法 、 旋回半径等が加味されて求められる。 この干渉注意箇所は、 処理システムの組 み立て誤差や搬送機構の駆動系の初期設定等の誤差にもよるが、 ピックを含む搬 送機構が、 他の部材に対して例えば約 1 c m程度の距離まで接近する箇所 (場所 ) である。 そして、 この調整移動が行われた場合には、 次に一時停止する干渉注 意箇所の座標を調整移動量だけ増減させる。 Therefore, in the teaching method of the present invention, the transfer mechanism is moved to the temporary movement target position in the course of the movement, and the transfer mechanism may interfere with other members at a position where the transfer mechanism may interfere with other members. A pause process for temporarily stopping the transfer mechanism to make sure that no transfer occurs, a resumption process for resuming the resumption of the suspended transport mechanism by input of a relocation command, and a resumption process for the pause process and the resumption process. Performing the repetition step, and when the pick reaches the temporary movement target position, the pick And a storing step of adjusting the position of the moving object or storing the moving position as the moving target position without performing the adjusting movement in the control means. That is, a position where the transport mechanism may interfere or collide with another member in the middle of the movement route to the temporary movement target position determined from the design dimensions of the processing system or the like is obtained in advance as an interference caution point. When determining this interference caution location, the dimensions and the turning radius of the articulated arm and pick of the transport mechanism are taken into account. The location of the interference depends on the assembly error of the processing system and the error of the initial setting of the drive system of the transport mechanism.However, the transport mechanism including the pick has a It is a place (place) approaching a distance. Then, when this adjustment movement is performed, the coordinates of the interference attention point to be temporarily stopped next are increased or decreased by the adjustment movement amount.
上述のように、 干渉注意箇所が計算上求められたならば、 実際に搬送機構を自 動的に動作するように駆動させるが、 この時、 干渉注意箇所に到達する毎に搬送 機構を一時停止させ、 この停止した時に、 次のステップへ搬送機構を移動させて も他の部材と干渉が生じないことを目視で確認する。 この時、 搬送機構が他の部 材と干渉する恐れが生じているならば、 オペレータはマ二ュアル操作によって搬 送機構を他の部材と干渉する恐れのない位置まで調整移動させる。  As described above, if the point of caution is calculated, the transport mechanism is actually driven to operate automatically, but at this time, the transport mechanism is temporarily stopped every time it reaches the point of caution. At this stop, visually check that no interference occurs with other members even if the transport mechanism is moved to the next step. At this time, if there is a risk that the transport mechanism will interfere with other components, the operator adjusts the transport mechanism to a position where there is no risk of interference with other components by manual operation.
次に、 オペレータが移動指令を入力することにより搬送機構を次の干渉注意箇 所まで自動で移動させる。 そして、 上記した目視による干渉の不存在の確認と必 要な場合の調整移動と移動指令の入力を順次繰り返し行う。  Next, when the operator inputs a movement command, the transport mechanism is automatically moved to the next point of caution. Then, the above-described visual confirmation of the absence of interference, the adjustment movement when necessary, and the input of the movement command are sequentially repeated.
そして、 ピックが処理システムの設計寸法等から求めた仮の移動目的位置に到 達したならば、 必要ならば、 オペレータは目視しつつマニュアル操作によってピ ックの位置を最適な位置に調整移動し、 この位置を移動目的位置として制御手段 に記憶させることになる。 これにより、 当初の移動目的位置に対するティーチン グ操作が終了することになる。  Then, when the pick reaches the temporary movement target position obtained from the design dimensions of the processing system, etc., if necessary, the operator adjusts the pick position to the optimum position by manual operation while visually checking. This position is stored in the control means as the movement target position. As a result, the teaching operation for the original movement target position is completed.
ぐ第 1実施例〉 First embodiment>
次に、 図 7 A〜 7 E及び図 8も参照して導入ポートに対してティーチング操作 を行う時の一例について説明する。  Next, an example of performing the teaching operation on the introduction port will be described with reference to FIGS. 7A to 7E and FIG.
図 7 A〜 7 Eは本発明方法の第 1実施例である導入ポートに対してティーチン グ操作を行う時の一例を示し、 図 8は本発明のティ一チング方法の流れを示すフ _ ローチャートである。 図 7 A〜7 Eにおいては、 3つの導入ポート 1 8 A〜 1 8 Cの内の中央の導入ポート 1 8 Bに対して第 1搬送機構 2 2の一方のピック A 1 のティーチング操作を行う場合を示している。 この場合、 カセット容器 2 0の最 下段の支持棚 (図示せず) に半導体ウェハと同一寸法及び形状に成形された位置 合わせ用基板 Wを載置しておき、 この位置合わせ用基板 Wの直下までピック A 1 を挿入 (アクセス) した位置 (図 7 D) が仮の移動目的位置であると仮定する。 尚、 この最下段の支持棚に載置した位置合わせ用基板に対するピックの位置が定 まれば、 各支持棚のピッチは特定されているので、 それに基づいて各支持棚に対 するピックのアクセスが可能になる。 7A to 7E show an example of performing a teaching operation on an introduction port according to a first embodiment of the present invention, and FIG. 8 shows a flow of the teaching method of the present invention. _ It is a row chart. 7A to 7E, the teaching operation of one pick A1 of the first transport mechanism 22 is performed on the central introduction port 18B of the three introduction ports 18A to 18C. Shows the case. In this case, an alignment substrate W formed in the same size and shape as the semiconductor wafer is placed on the lowermost support shelf (not shown) of the cassette container 20, and immediately below the alignment substrate W It is assumed that the position where the pick A 1 has been inserted (accessed) up to this point (FIG. 7D) is the temporary movement target position. When the position of the pick with respect to the positioning substrate placed on the lowermost support shelf is determined, the pitch of each support shelf is specified, and the access of the pick to each support shelf is determined based on the pitch. Will be possible.
まず、 この第 1搬送機構 2 2の基準位置から、 図 7 Dに示す仮の移動目的位置 までの移動経路の途中において、 この搬送機構 2 2が他の部材と干渉する恐れの ある干渉注意箇所を前述したように処理システム 2の設計寸法や搬送機構 2 2の 多関節アームの寸法や旋回半径等に基づいて予め求める。 この場合、 この搬送機 構 2 2が設計寸法上において他の部材と例えば 1 c mの距離まで接近する位置を 干渉注意箇所として定められており、 この情報が制御手段 4 0に記憶される。 図 7 A〜7 Eにおいては、 図 7 A〜図 7 cに示すアームの 3つの位置が、 それぞれ 干渉注意箇所として求められた位置である。 また、 ここでは図 2中に示す案内レ ール 2 4の右端の位置が、 第 1搬送機構 2 2の基準位置 (ホームポジシヨン) 5 0であると仮定している。  First, in the middle of the movement path from the reference position of the first transfer mechanism 22 to the temporary movement destination position shown in FIG. 7D, an attention point where the transfer mechanism 22 may interfere with other members. Is determined in advance based on the design dimensions of the processing system 2, the dimensions of the articulated arm of the transfer mechanism 22, the turning radius, and the like, as described above. In this case, a position at which the transport mechanism 22 comes close to another member, for example, up to a distance of 1 cm on the design dimensions is determined as an interference caution point, and this information is stored in the control means 40. In FIGS. 7A to 7E, the three positions of the arm shown in FIGS. 7A to 7C are the positions determined as interference attention points. Here, it is assumed that the position of the right end of the guide rail 24 shown in FIG. 2 is the reference position (home position) 50 of the first transport mechanism 22.
まず、 第 1搬送機構 2 2を基準位置 5 0 (図 2参照) に位置させた状態で、 ォ ペレ一タは図 1の制御部 4 0に接続されているキー群 4 4の進行ポタン 4 4 A ( 図 6参照) を押すことにより (S 1 ) 、 移動指令を入力する。 すると、 第 1搬送 機構 2 2の現在の位置は仮の移動目的位置ではないので ( S 2の N O) 、 制御手 段 4 0は第 1搬送機構 2 2の駆動を制御し、 例えばこれを水平方向移動させて導 入ポート 1 8 Bに対応する場所まで移動させ、 多関節アームを上下方向及び旋回 方向に移動させると共に、 多関節アームを屈伸させて、 例えば水平方向に伸ばし てそのピック A 1を図 7 Aに示すように第 1の干渉注意箇所にて自動的に一時停 止させる (S 3 ) 。  First, with the first transport mechanism 22 positioned at the reference position 50 (see FIG. 2), the operator operates the key group 4 4 connected to the control unit 40 shown in FIG. 4 Press A (see Fig. 6) to input a movement command (S1). Then, since the current position of the first transport mechanism 22 is not the temporary movement target position (NO in S2), the control means 40 controls the drive of the first transport mechanism 22 and, for example, To the location corresponding to the introduction port 18B, move the articulated arm in the vertical direction and the turning direction, bend and extend the articulated arm, e.g. Is automatically stopped at the first point of caution as shown in Fig. 7A (S3).
この第 1の干渉注意箇所は、 このピック A 1の先端と位置合わせ用基板 Wの先 端との間の距離 X 1が、 処理システムの設計寸法上で 1 c m程度の位置である。 このように、 第 1搬送機構 2 2が一時停止した時、 図 6に示すように表示部 4 2 には、 オペレータに対してピックの干渉注意を喚起するためのメッセージとして 、 例えば" ピック等は他の部材と干渉しませんか?" 等の文字を表示する。 尚、 これと同時、 或いは単独でスピーカ等から音声により同様なメッセージを伝える ようにしてもよい。 The first point of caution is the tip of this pick A 1 and the tip of the alignment substrate W. The distance X1 from the edge is about 1 cm in the design dimensions of the processing system. As described above, when the first transport mechanism 22 is temporarily stopped, as shown in FIG. 6, the display unit 42 displays a message to alert the operator to a pick interference, for example, Does not interfere with other parts? " It should be noted that a similar message may be transmitted by voice from a speaker or the like simultaneously or independently.
ここでオペレータは、 ピック A 1の上下方向の距離に関してピック A 1が他の 部材、 すなわち位置合わせ用基板 Wの下端よりも 2〜 3 mm程度だけ下方に位置 しているか否か、 例えばピック A 1をそのまま前進させても位置合わせ用基板 W と干渉する恐れがあるか否かを目視によって確認する (S 4 ) 。 ここで、 位置合 わせ用基板 Wとピック A 1とが干渉する恐れがある場合には (S 4の Y E S ) 、 オペレータはマニュアル操作でピック A 1を位置合わせ用基板 Wと干渉しないよ うな位置まで、 すなわち、 この下端よりも 2〜 3 mm程度だけ下方に位置するよ うに微少距離だけ調整移動させる (S 5 ) 。 この調整移動は、 キー群 4 4の移動 ポタン 4 4 Cを操作することにより行われる。  Here, the operator determines whether or not the pick A1 is positioned about 2 to 3 mm below the other member, that is, the lower end of the positioning substrate W with respect to the vertical distance of the pick A1, It is visually checked whether or not there is a risk of interfering with the positioning substrate W even if 1 is moved forward as it is (S4). Here, if there is a possibility that the positioning board W and the pick A1 may interfere (YES in S4), the operator manually operates the pick A1 so that the pick A1 does not interfere with the positioning board W. , Ie, by a small distance so as to be positioned about 2 to 3 mm below the lower end (S5). This adjustment movement is performed by operating the movement button 44 C of the key group 44.
このようにピック A 1の調整移動が終了したら、 或いは S 4にてオペレータが 、 ピック A 1は他の部材と干渉する恐れがない (S 4の N O) 、 と判断したなら ば、 オペレータは再度、 進行ボタン 4 4 Aを押すことにより (S 1 ) 、 移動指令 を入力する。 すると、 第 1搬送機構 2 2のピック A 1は僅かに自動的に前進し、 図 7 Bに示すように設計寸法上においてピック A 1の先端と位置合わせ用基板 W の周縁部とが重なる距離 X 2が 5 mm程度になる位置、 すなわち第 2の干渉注意 位置まで自動的に移動して一時停止する (3 2の 〇、 S 3 ) 。 この一時停止し た時も、 表示部 4 2にピックの干渉注意を喚起するためのメッセージが表示され る。 この時、 オペレータはピック A 1の先端が、 位置合わせ用基板 Wの下方に確 かに侵入したことを確認する。 尚、 ピック A 1と位置合わせ用基板 Wの重なりが 5 mm程度になる所でピック A 1を一時停止させた理由は、 万一両者が干渉した 場合に破損等の被害を最小限にくい止めるためである。  When the adjustment movement of the pick A1 is completed as described above, or when the operator determines in S4 that the pick A1 does not interfere with other members (NO in S4), the operator again performs Press the progress button 4 4 A (S 1) to input the movement command. Then, the pick A1 of the first transport mechanism 22 automatically advances slightly, and as shown in FIG. 7B, the distance at which the tip of the pick A1 and the peripheral edge of the positioning substrate W overlap with each other in design dimensions. It automatically moves to the position where X2 becomes about 5 mm, that is, the second interference caution position, and pauses (32, 3, S3). Even during this pause, a message for calling attention to pick interference is displayed on the display section 42. At this time, the operator confirms that the tip of the pick A1 has surely penetrated below the positioning substrate W. The reason why the pick A1 was temporarily stopped when the overlap between the pick A1 and the positioning substrate W was about 5 mm was that if the two interfered, the damage such as breakage was minimized. It is.
そして、 次にオペレータが進行ボタンを押すことにより (S 1 ) 、 移動指令を 入力すると、 第 1搬送機構 2 2のピック A 1は再度僅かに自動的に前進し、 図 7 Cに示すように設計寸法上において、 ピック A 1の基部と蓋開閉機構 2 1 (図 3 参照) の上端との間の水平距離 X 3が 1 c m程度になる位置、 すなわち第 3の干 渉注意位置まで自動的に移動して一時停止しする。 この一時停止した時も表示部 4 2にピックの干渉注意を喚起するメッセージが表示される。 この時、 オペレー タはピック A 1の基部が、 このまま前進しても蓋開閉機構 2 1に干渉しないこと を確認する。 この時、 オペレータが、 このピック A 1の基部が干渉する恐れがあ ると判断した時は、 ピック A 1をマニュアル操作により上方へ僅かに調整移動さ せるのは前述した通りである。 Then, when the operator presses the advance button (S 1), and inputs a movement command, the pick A 1 of the first transport mechanism 22 automatically advances again slightly, and FIG. As shown in C, the position where the horizontal distance X 3 between the base of the pick A 1 and the upper end of the lid opening / closing mechanism 21 (see FIG. 3) is about 1 cm, that is, the third interference Automatically move to the caution position and pause. Even during this pause, a message is displayed on the display unit 42 that calls attention to interference with the pick. At this time, the operator confirms that the base of the pick A1 does not interfere with the lid opening / closing mechanism 21 even if the base advances. At this time, if the operator determines that the base of the pick A1 may interfere, the pick A1 is slightly moved upward by manual operation as described above.
そして、 次にオペレータが進行ポタンを押すことにより、 移動指令を入力する と、 第 1搬送機構 2 2のピック A 1は再度自動的に前進し、 図 7 Dに示すように 設計寸法上において仮の移動目的位置まで移動して一時停止する。 尚、 この仮の 移動目的位置は、 ここまでの移動経路の途中においてマニュアル操作によって移 動調整した場合には、 その移動調整量だけシフトしている。  Then, when the operator presses the advance button to input a movement command, the pick A 1 of the first transport mechanism 22 automatically advances again, and temporarily moves on the design dimensions as shown in FIG. 7D. Move to the target position and pause. Note that, when the temporary movement target position is manually adjusted in the middle of the movement path so far, the movement target position is shifted by the movement adjustment amount.
このようにして、 仮の移動目的位置までピック A 1が前進したならば (S 2の Y E S ) 、 オペレータはこの位置が位置合わせ用基板 Wに対して適正な位置であ るか否かを確認し、 必要ならば、 すなわちもし位置ずれしているならば、 マエュ アル操作でこのピック A 1を移動目的位置まで微小距離だけ調整移動させて図 7 Eに示すように位置合わせ用基板 Wの直下に適正に位置させる (S 6 ) 。 図 7 E に示す場合には、 ピック A 1を僅かな距離だけ上方へ移動させた状態を示す。 尚 、 図 7 Dに示す仮の移動目的位置におけるピック A 1の位置が図 7 Eに示すよう な適正な位置ならば、 当然のこととして上記 S 6に示す調整移動操作は不要とな る。  In this way, if the pick A1 advances to the temporary movement target position (YES in S2), the operator checks whether or not this position is an appropriate position with respect to the positioning substrate W. If necessary, that is, if the position is misaligned, manually move this pick A 1 by a minute distance to the movement target position by manual operation, and immediately below the positioning substrate W as shown in FIG. (S 6). FIG. 7E shows a state in which the pick A1 has been moved upward by a small distance. If the position of the pick A1 at the temporary movement target position shown in FIG. 7D is an appropriate position as shown in FIG. 7E, it goes without saying that the adjustment movement operation shown in S6 is unnecessary.
このようにしてピック A 1が適正な位置、 すなわち移動目的位置に達したなら ば、 キー群 4 4の記憶ボタン 4 4 B (図 6参照) を押すことにより、 この時のピ ック A 1の位置座標データを制御手段 4 0に記憶する (S 8 ) 。 これによりティ' 一チング操作を完了する。  When the pick A1 reaches the proper position, that is, the movement target position in this way, the user presses the memory button 44B (see FIG. 6) of the key group 44 to thereby select the pick A1. Is stored in the control means 40 (S8). This completes the teeing operation.
このように、 移動目的位置の位置座標を制御手段 4 0に記憶させておくことに より、 ピック A 1はこの移動目的位置まで自動的に、 他の部材と干渉することな く移動することができる。 カセット容器 2 0内からウェハを取り上げる時は、 上 記した移動目的位置から所定の高さだけ上昇してウェハを受け取ることになる。 また、 他の支持棚のウェハを取る場合には、 前述のように多段に設けられた支持 棚のピツチは予め判明しているので、 その支持棚の段数に対応する高さは容易に 求めることができる。 In this way, by storing the position coordinates of the movement target position in the control means 40, the pick A1 can automatically move to this movement target position without interfering with other members. it can. When picking up wafers from inside cassette container 20, The wafer is received at a predetermined height from the movement target position described above. Also, when taking wafers from other support shelves, since the pitch of the support shelves provided in multiple stages is known in advance as described above, the height corresponding to the number of stages of the support shelves should be easily obtained. Can be.
このようなティーチング操作は、 ピック A 2に対しても同様に行い、 更に、 他 の導入ポート 1 8 A、 1 8 Cに対しても両ピック A 1、 A 2に対して同様に行う ことになる。 尚、 ちなみに従来のティーチング方法では図 7 Aに示す第 1の干渉 注意箇所までピック A 1を自動的に進めた後、 図 7 Eに示すピック A 1まではマ ニュアル操作によって少しずつピック A 1を移動している。  Such teaching operation is performed in the same manner for the pick A2, and also for the other pick-up ports 18A and 18C for both picks A1 and A2. Become. Incidentally, in the conventional teaching method, after the pick A1 is automatically advanced to the first point of caution shown in FIG. 7A, the pick A1 is gradually moved to the pick A1 shown in FIG. 7E by manual operation. Are moving.
従って、 本発明方法では、 ピック等が他の部材と干渉する恐れがある干渉注意 箇所だけでピックを一時停止し、 一時停止する毎に必要ならばピックをマ二ユア ノレ操作で調整移動して、 次の干渉注意箇所まではまた自動でピックを動かすよう にしているので、 ピックが全搬送経路に沿って移動する時間が短くなり、 その分 だけティーチング操作を短時間で且つ迅速に行うことができる。  Therefore, in the method of the present invention, the pick is temporarily stopped only at the point of interference where the pick or the like may interfere with other members, and the pick is adjusted and moved by manual operation if necessary at each stop. Since the pick is automatically moved to the next point of caution, the time for the pick to move along the entire transport path is shortened, and the teaching operation can be performed in a short time and quickly by that much. it can.
<第 2実施例 >  <Second embodiment>
上記第 1実施例では導入ポートに対してティ一チング操作を行う場合を例にと つて説明したが、 この第 2実施例ではォリエンタに対してティーチング操作を行 う場合を例にとって説明する。  In the first embodiment, the case where the teaching operation is performed on the introduction port has been described as an example. In the second embodiment, the case where the teaching operation is performed on the orienter will be described as an example.
図 9 A〜 9 Dは本発明の第 2実施例であるオリェンタに対してティーチング操 作を行う時の一例を示す図である。 尚、 この図 9 A〜 9 Dにおいては部分的に平 面図も併記されている。 ここでも第 1搬送機構 2 2のピック A 1に対してティー チング操作を行う場合について説明する。 また、 ピック A 1が干渉注意箇所で一 時停止する毎に表示部にはオペレータに対して干渉注意を喚起するためのメッセ ージが表示されるが、 その点についての記載は省略する。 .  9A to 9D are views showing an example when a teaching operation is performed on an orienter according to a second embodiment of the present invention. In FIGS. 9A to 9D, plan views are partially shown. Here, a case where the teaching operation is performed on the pick A1 of the first transport mechanism 22 will be described. In addition, every time the pick A1 temporarily stops at the point of interference, a message is displayed on the display unit to alert the operator of the interference, but a description of that point is omitted. .
まず、 第 1実施例と同様に、 処理システム 2の設計寸法等に基づいてオリエン タ 2 6に対する干渉注意箇所及び仮の移動目的位置を求めて制御手段 :4 0に記憶 しておく。 図示例では図 9 A及び図 9 Bが干渉注意箇所を示し、 図 9 Cが仮の自 動目的位置を示している。 First, like the first embodiment, the processing system 2 of the design dimensions such as the control means obtains a movement target position of the interference attention point and the temporary against Orient motor 2 6 based on: stored in a 4 0. In the illustrated example, FIG. 9A and FIG. 9B show an interference attention point, and FIG. 9C shows a temporary automatic target position.
まず、 第 1搬送機構 2 2を基準位置 5 0 (図 2参照) に位置させた状態で進行 P T/JP2003/011734 ボタン 4 4 A (図 6参照) を押して移動指令を入力すると、 第 1搬送機構 2 2は 自動的に駆動して、 そのピック A 1は図 9 Aに示すように第 1の干渉注意箇所で 一時停止する。 この第 1の干渉注意箇所は、 オリエンタ 2 6を取り付けている導 入側搬送室 1 0の壁面 1 0 Aとピック A 1の先端との間の水平距離 Y 1が処理シ ステムの設計寸法上において例えば 1 c m程度になっている位置である。 これは オリエンタ 2 6の開口部の高さが 3 . 6 c m程度と小さいため、 ピック A 1の先 端が壁面 1 0 Aに衝突することを防止するためである。 この第 1の干渉注意箇所 でオペレータは、 必要な場合にはマニュアル操作でピック A 1の高さ方向の調整 移動するなどして、 ピック A 1がォリエンタ 2 6内に干渉することなく侵入でき るようにする。 First, advance with the first transport mechanism 22 positioned at the reference position 50 (see Fig. 2). PT / JP2003 / 011734 When button 4 4 A (see Fig. 6) is pressed and a movement command is input, the first transport mechanism 22 automatically drives, and its pick A 1 is moved to the first position as shown in Fig. 9A. Pause at the point where caution is required. The first point of caution is that the horizontal distance Y 1 between the wall 10 A of the inlet transfer chamber 10 on which the orienter 26 is installed and the tip of the pick A 1 is determined by the design dimensions of the processing system. In this example, the position is about 1 cm. This is to prevent the tip end of the pick A1 from colliding with the wall surface 10A because the height of the opening of the orienter 26 is as small as about 3.6 cm. At this first point of caution, the operator can manually move the pick A 1 in the height direction if necessary, so that the pick A 1 can enter the orienter 26 without interference. To do.
次に、 オペレータが進行ボタンを押して移動指令を入力すると、 ピック A 1は 水平方向へ自動的に進行し、 図 9 Bに示すように第 2の干渉注意箇所にて一時停 止する。 この第 2の干渉注意箇所は、 回転台 2 8の周縁部とピック A 1との間の 水平距離 Y 2が処理システムの設計寸法上において、 例えば 1 c m程度になって いる位置である。 この第 2の干渉注意箇所でオペレータは、 必要な場合にはマ二 ュアル操作でピック A 1の水平方向の位置調整することによって、 平面から見て ピック A 1を更に進行した場合にこのピック A 1の間に上記回転台 2 8が十分に 納まるように設定する。 すなわち、 ピック A 1を更に進行した時にこれが回転台 2 8と干渉しないようにマニュアル操作で位置調整する。  Next, when the operator presses the progress button and inputs a movement command, the pick A1 automatically advances in the horizontal direction and temporarily stops at the second point of caution as shown in FIG. 9B. The second point of caution is a position where the horizontal distance Y2 between the periphery of the turntable 28 and the pick A1 is, for example, about 1 cm in the design dimensions of the processing system. At this second point of caution, the operator adjusts the position of the pick A1 in the horizontal direction by manual operation if necessary, so that the pick A Set so that the turntable 28 can be fully accommodated between 1. That is, when the pick A 1 is further advanced, the position is manually adjusted so that the pick A 1 does not interfere with the turntable 28.
次に、 オペレータが進行ボタンを押して移動指令を入力すると、 ピック A 1は 水平方向へ更に自動的に進行し、 図 9 Cに示すように仮の移動目的位置に到達す ることになる。  Next, when the operator presses the progress button and inputs a movement command, the pick A1 further advances in the horizontal direction automatically, and reaches the temporary movement target position as shown in FIG. 9C.
そして、 オペレータは、 必要な場合にはマ二ユアル操作によってピック A 1を 適正な位置まで調整移動して、 これを図 9 Dに示すように移動目的位置に位置さ せて、 記憶ボタン 4 4 B (図 6参照) を押すことによってこの時の位置座標デー タを制御手段 4 0に記憶させる。 この場合、 記憶ボタン 4 4 Bを押すに先立って 、 例えば図 9 Dの平面図に示すようにピック A 1に例えば透明な位置合わせ用基 板 Wを載置し、 この略中心部に上記回転台 2 8が位置することを確認する。  Then, if necessary, the operator adjusts and moves the pick A1 to an appropriate position by manual operation, and positions the pick A1 at the movement target position as shown in FIG. 9D. By pressing B (see FIG. 6), the position coordinate data at this time is stored in the control means 40. In this case, prior to pressing the memory button 44B, for example, a transparent positioning board W is placed on the pick A1 as shown in the plan view of FIG. Check that platform 28 is positioned.
図 9 Dに示す場合には、 仮の移動目的位置 (図 9 C ) でピック A 1が回転台 2 8の下方に位置してしまったので、 このピック A 1を上方向へマニュアル操作で 調整移動し、 そして、 位置合わせ用 Wを用いて上述のように適正に位置合わせし た状態を示している。 In the case shown in FIG. 9D, the pick A 1 is moved to the turntable 2 at the temporary movement target position (FIG. 9C). Since it is located below the position 8, the pick A 1 is manually adjusted upward and moved upward, and the position is properly adjusted as described above using the positioning W. .
この第 2実施例の場合にも、 ピック等が他の部材と干渉する恐れがある干渉注 意箇所だけでピックを一時停止し、 一時停止する毎に必要ならばピックをマユュ アル操作で調整移動して、 次の干渉注意箇所まではまた自動でピックを動かすよ うにしているので、 ピックが全搬送経路に沿つて移動する時間が短くなり、 その 分だけティーチング操作を短時間で且つ迅速に行うことができる。  In the case of the second embodiment as well, the pick is temporarily stopped only at the point of caution where there is a possibility that the pick may interfere with other members, and the pick is adjusted and moved by manual operation if necessary at each stop. Then, the pick is automatically moved to the next point of caution, so the time for the pick to move along the entire transport path is shortened, and the teaching operation can be performed in a short time and quickly by that much. It can be carried out.
ぐ第 3実施例 > Third embodiment>
次に、 第 3実施例としてロードロック室に対してティ一チング操作を行う場合 について説明する。  Next, a case where a teaching operation is performed on a load lock chamber as a third embodiment will be described.
図 1 0 A〜1 0 Eは本発明の第 3実施例であるロードロック室に対してティー チング操作を行う時の一例を示す図である。  10A to 10E are views showing an example when a teaching operation is performed on the load lock chamber according to the third embodiment of the present invention.
ここでは一例として、 2つのロードロック室 8 A、 8 Bの内の一方のロード口 ック室 8 Aに対してピック A 1をティーチング操作する場合について説明する。 ここでは、 ロードロック室 8 A内の載置台 3 8 A上に予め位置合わせ用基板 Wを 載置しておく。 そして、 処理システムの設計寸法等より、 予め図 1 0 A〜図 1 0 Dに示すような 4つの干渉注意箇所が求められており、 図 1 0 Eは仮の移動目的 位置を示している。 尚、 表示部に関する表示内容は前述した場合と同様なので、 ここでもその説明は省略する。  Here, as an example, a case in which the teaching operation of the pick A1 is performed on one of the load lock chambers 8A of the two load lock chambers 8A and 8B will be described. Here, the positioning substrate W is previously mounted on the mounting table 38A in the load lock chamber 8A. Then, four interference caution points as shown in FIGS. 10A to 10D are obtained in advance from the design dimensions of the processing system and the like, and FIG. 10E shows a temporary movement target position. Since the display contents of the display unit are the same as those described above, the description is omitted here.
まず、 第 1搬送機構 2 2を基準位置 5 0 (図 2参照) に位置させた状態で進行 ポタン 4 4 A (図 6参照) を押して移動指令を入力すると、 第 1搬送機構 2 2は 自動的に駆動して、 そのピック A 1は図 1 O Aに示すように第 1の干渉注意箇所 で一時停止する。 この第 1の干渉注意箇所は、 このロードロック室 8 Aを取り付 けている導入側搬送室 1 0の壁面 1 0 Bとピック A 1の先端との間の水平距離 Z 1が処理システムの設計寸法上において例えば 1 c m程度になっている位置であ る。 これはロードロック室 8 Aの開口部の高さが 4 . 9 c m程度と小さいため、 ピック A 1の先端が壁面 1 0 Bに衝突することを防止するためである。 この第 1 の干渉注意箇所でオペレータは、 必要な場合にはマニュアル操作でピック A 1の 高さ方向の調整移動するなどして、 ピック A 1がロード口ック室 8 A内に干渉す ることなく侵入できるようにする。 First, while the first transport mechanism 22 is positioned at the reference position 50 (see FIG. 2), when the advance command button 44A (see FIG. 6) is pressed to input a movement command, the first transport mechanism 22 is automatically activated. And the pick A1 is temporarily stopped at the first interference attention point as shown in FIG. 1OA. The first point of caution is that the horizontal distance Z 1 between the wall 10 B of the transfer chamber 10 on the loading side where the load lock chamber 8 A is installed and the tip of the pick A 1 is the processing system. This is a position that is, for example, about 1 cm in design dimensions. This is to prevent the tip of the pick A1 from colliding with the wall surface 10B because the height of the opening of the load lock chamber 8A is as small as about 4.9 cm. At this first point of caution, the operator can manually select the pick A 1 if necessary. Move the pick A1 into the load opening chamber 8A without interfering with it by adjusting the height.
次に、 オペレータが進行ボタンを押して移動指令を入力すると、 ピック A 1は 水平方向へ自動的に進行し、 図 1 0 Bに示すように第 2の干渉注意箇所にて一時 停止する。 この第 2の干渉注意箇所は、 载置台 3 8 A上の位置合わせ用基板 Wの 周縁部とピック A 1との間の水平距離 Z 2が処理システムの設計寸法上において 、 例えば 1 c m程度になっている位置である。 この第 2の干渉注意箇所でォペレ ータは、 必要な場合にはマニュアル操作でピック A 1の高さ方向と水平方向の位 置調整することによって、 ピック A 1を更に進行した場合にこのピック A 1の間 に上記載置台 3 8 Aが十分に納まるように設定する。 すなわち、 ピック A 1を更 に進行した時にこれが载置台 3 8 A及ぴ位置合わせ用基板 Wと干渉しないように マ二ユアノレ操作で位置調整する。  Next, when the operator presses the progress button and inputs a movement command, the pick A1 automatically advances in the horizontal direction, and stops at the second interference attention point as shown in FIG. 10B. The second point of caution is that the horizontal distance Z2 between the periphery of the positioning substrate W on the mounting table 38A and the pick A1 is set to, for example, about 1 cm in the design dimensions of the processing system. It is a position that has become. At this second point of caution, the operator manually adjusts the height and the horizontal position of the pick A1 if necessary, so that when the pick A1 is further advanced, Set so that the table 38 A above fits sufficiently between A 1. That is, when the pick A1 is further advanced, the position is adjusted by manual operation so that the pick A1 does not interfere with the mounting table 38A and the positioning substrate W.
次に、 オペレータが進行ポタンを押して移動指令を入力すると、 ピック A 1は 水平方向へ僅かに自動的に進行し、 図 1 0 Cに示すように第 3の干渉注意箇所に て一時停止する。 この第 3の干渉注意箇所は、 位置合わせ用基板 Wの周縁部とピ ック A 1の先端の上下方向における重なり部分の水平距離 Z 3が処理システムの 設計寸法上において 5 mm程度になる位置である。 ここでピック A 1を一時停止 させた理由は、 万一両者が干渉した場合に破損等の被害を最小限に食い止めるた めてある。 ここで、 ピック A 1が次の進行で他の部材と干渉しないように必要に 応じてマニュアル操作により位置調整する。  Next, when the operator presses the advance button and inputs a movement command, the pick A1 advances slightly automatically in the horizontal direction and temporarily stops at the third interference attention point as shown in FIG. 10C. The third interference point is a position where the horizontal distance Z3 between the peripheral portion of the positioning substrate W and the tip of the pick A1 in the vertical direction is about 5 mm in the design dimensions of the processing system. It is. The reason for suspending Pick A1 here is to minimize damage such as damage if they interfere with each other. Here, the position is manually adjusted as needed so that the pick A1 does not interfere with other members in the next progress.
次に、 オペレータが進行ボタンを押して移動指令を入力すると、 ピック A 1は 水平方向へ僅かに自動的に進行し、 図 1 0 Dに示すように第 4の干渉注意箇所に て一時停止する。 この第 4の干渉注意箇所は、 開放されているゲートバルブ Gの 上端とピック A 1の基端との間の水平距離 Z 4が処理システムの設計寸法上にお いて l mm程度になる位置である。 ここでピック A 1を一時停止させた理由は、 ピック A 1の基部が開放されているゲートバルブ Gに衝突することを避けるため てある。 ここで、 ピック A 1が次め進行で他の部材と干渉しないように必要に応 じてマニュアル操作により位置調整する。  Next, when the operator presses the advance button and inputs a movement command, the pick A1 advances slightly automatically in the horizontal direction and temporarily stops at the fourth interference attention point as shown in FIG. 10D. The fourth point of caution is where the horizontal distance Z4 between the upper end of the open gate valve G and the base end of the pick A1 is about l mm in the design dimensions of the processing system. is there. The reason why the pick A1 is temporarily stopped here is to prevent the base of the pick A1 from colliding with the opened gate valve G. Here, the position is adjusted by manual operation as needed so that the pick A1 does not interfere with other members in the next progress.
次に、 オペレータが進行ポタンを押して移動指令を入力すると、 ピック A 1は 水平方向へ更に自動的に進行し、 図 1 0 Eに示すように仮の移動目的位置に到達 することになる。 Next, when the operator presses the advance button and inputs a movement command, The vehicle further advances in the horizontal direction automatically, and reaches the temporary movement target position as shown in FIG. 10E.
そして、 オペレータは、 必要な場合にはマエユアル操作によってピック A 1を 適正な位置まで調整移動して、 これを移動目的位置に位置させて、 記憶ボタン 4 4 B (図 6参照) を押すことによってこの時の位置座標データを制御手段 4 0に 記憶させる。 この場合、 記憶ボタン 4 4 Bを押すに先立って、 载置台 3 8 A上に 載置されている例えば透明な位置合わせ用基板 Wに対してピック A 1が適正な位 置となるように確認する。  Then, if necessary, the operator adjusts and moves the pick A 1 to an appropriate position by manual operation, positions the pick A 1 at the movement target position, and presses the memory button 44 B (see FIG. 6). The position coordinate data at this time is stored in the control means 40. In this case, before pressing the memory button 4 4 B, make sure that the pick A 1 is at an appropriate position with respect to, for example, the transparent alignment substrate W placed on the mounting table 38 A. I do.
この第 3実施例の場合にも、 ピック等が他の部材と干渉する恐れがある干渉注 意箇所だけでピックを一時停止し、 一時停止する毎に必要ならばピックをマ-ュ アル操作で調整移動して、 次の干渉注意箇所まではまた自動でピックを動かすよ うにしているので、 ピックが全搬送経路に沿つて移動する時間が短くなり、 その 分だけティーチング操作を短時間で且つ迅速に行うことができる。  In the case of the third embodiment as well, the pick is temporarily stopped only at the point of caution where there is a possibility that the pick may interfere with other members. Since the pick is adjusted and moved automatically to the next point of caution, the pick travels along the entire transport path in a shorter time, and the teaching operation can be shortened by that much time. Can be done quickly.
尚、 上記しティーチング操作は、 各ピック A 1、 A 2について、 それぞれ各口 一ドロック室 8 A、 8 Bに対して行うのは勿論である。  The teaching operation described above is, of course, performed for each of the mouth lock rooms 8A and 8B for each of the picks A1 and A2.
上記各実施例においては、 第 1搬送機構 2 2のティーチング方法について説明 したが、 共通搬送室 6内の第 2搬送機構 1 4の両ピック B 1、 B 2に関しても、 各処理室 4 A〜4 D及び各ロードロック室 8 A、 8 Bに対して、 前述したと同様 な方法で行う。  In each of the above embodiments, the teaching method of the first transfer mechanism 22 has been described, but the picks B 1 and B 2 of the second transfer mechanism 14 in the common transfer chamber 6 also have processing chambers 4A to 4A. Perform the same procedure as described above for 4D and each load lock chamber 8A, 8B.
また、 実際には上記したティーチング方法を行った後、 定められた各移動目的 位置に設置した位置合わせ用基板 Wを完全自動でオリエンタ 2 6まで搬送し、 そ の時の位置合わせ用基板 Wの位置の微小なずれ量に基づいて上記移動目的位置の 座標データを更に補正することになる。  Also, in practice, after performing the teaching method described above, the alignment substrate W set at each of the determined moving destination positions is transported to the orienter 26 fully automatically, and the alignment substrate W at that time is transferred. The coordinate data of the movement target position is further corrected based on the minute shift amount of the position.
更に、 ここで説明した処理システム 2の構成や各搬送機構 1 4、 2 2の構成は 単に一例を示したに過ぎず、 大気圧雰囲気中及び真空雰囲気中に設置される全て の搬送機構について、 本発明のティーチング方法を適用できるのは勿論である。 また、 ここでは被処理体として半導体ウェハを例にとって説明したが、 これに 限定されず、 ガラス基板、 L C D基板等の場合にも本発明方法を適用できるのは 勿論である。 以上説明したように、 本発明のティーチング方法及び処理システムによれば次 のように優れた作用効果を発揮することができる。 Furthermore, the configuration of the processing system 2 and the configuration of each of the transport mechanisms 14 and 22 described here are merely examples, and all transport mechanisms installed in an atmospheric pressure atmosphere and a vacuum atmosphere are described below. Of course, the teaching method of the present invention can be applied. Further, although a semiconductor wafer has been described as an example of an object to be processed, the present invention is not limited to this, and the method of the present invention can be applied to a glass substrate, an LCD substrate, and the like. As described above, according to the teaching method and the processing system of the present invention, the following excellent operational effects can be exhibited.
本発明によれば、 搬送機構が他の部材と干渉する恐れのある場所 (箇所) だけ 搬送機構を一時停止させて必要なら位置調整し、 搬送機構が他の部材と干渉しな いような場所では搬送機構を自動で積極的に移動させるようにしたので、 全体と してティーチング操作に要する時間を大幅に削減することができる。  According to the present invention, the transport mechanism is temporarily stopped only at a location (location) where the transport mechanism may interfere with other members, and the position is adjusted if necessary, so that the transport mechanism does not interfere with other members. Since the transport mechanism is automatically and positively moved, the time required for the teaching operation can be significantly reduced as a whole.
また、 本宪明によれば、 表示部にて干渉注意を喚起させるためのメッセージを 表示させるようにしたので、 オペレータがこのメッセージを認識することにより 、 搬送機構に関して他の部材との干渉をより確実に防止することができる。  Further, according to the present invention, a message for calling attention to interference is displayed on the display unit. By recognizing this message, the operator can reduce the interference of the transport mechanism with other members. It can be reliably prevented.

Claims

請 求 の 範 囲 The scope of the claims
1 . ピックにより被処理体を保持して搬送するための搬送機構を備えた処理 システムにおける前記搬送機構の移動目的位置を制御手段に記憶させるティーチ ング方法において、 1. In a teaching method in which a movement target position of the transport mechanism is stored in a control unit in a processing system including a transport mechanism for holding and transporting an object to be processed by a pick,
前記搬送機構を、 仮の移動目的位置まで移動する移動経路の途中で前記搬送機 構が他の部材と干渉する恐れのある干渉注意箇所において他の部材との干渉が生 じないことを確認させるために一時停止させる一時停止工程と、  The transport mechanism is checked to make sure that there is no interference with other members at a cautionary point where the transport mechanism may interfere with other members in the middle of a movement path for moving to a temporary movement target position. A suspending step for suspending for
一時停止された前記搬送機構を移動指令の入力により移動再開させる移動再開 工程と、  A movement restarting step of restarting movement of the temporarily stopped transport mechanism by input of a movement command;
前記一時停止工程と移動再開工程とを繰り返し行う繰り返し工程と、 前記ピックが前記仮の移動目的位置に到達した時に前記ピックの位置を調整移 動して、 或いは調整移動しないで移動目的位置として前記制御手段に記憶させる 記憶工程と、  A repetition step of repeatedly performing the pause step and the movement resumption step; and adjusting and moving the position of the pick when the pick reaches the temporary movement target position, or as the movement target position without adjustment movement. A storage step for storing in the control means;
を備えたことを特徴とするティーチング方法。  A teaching method comprising:
2 . 前記一時停止した搬送機構が他の部材と干渉する恐れのある時には前記 搬送機構を他の部材と干渉する恐れのなレ、位置まで調整移動させることを特徴と する請求項 1記載のティ一チング方法。  2. The tee according to claim 1, wherein the transport mechanism is adjusted and moved to a position where there is no fear of interference with other members when the temporarily stopped transport mechanism may interfere with other members. One-ching method.
3 . 前記干渉注意箇所は、 前記処理システムの設計寸法に基づいて前記制御 手段が予め算出して求めることを特徴とする請求項 1または 2記載のティーチン グ方法。  3. The teaching method according to claim 1, wherein the point of caution is calculated and determined in advance by the control unit based on a design dimension of the processing system.
4 . 前記制御手段は、 前記搬送機構が一時停止する毎に、 表示部にオペレー タに対して干渉注意を喚起させるためのメッセージを表示させることを特徴とす る請求項 1乃至 3のいずれかに記載のティーチング方法。  4. The control device according to any one of claims 1 to 3, wherein each time the transport mechanism is temporarily stopped, a message is displayed on a display unit to alert the operator to interference. Teaching method described in 1.
5 . 前記搬送機構は、 屈伸及び旋回可能になされた多関節アームを有してい ることを特徴とする請求項 1乃至 4のいずれかに記載のティーチング方法。  5. The teaching method according to any one of claims 1 to 4, wherein the transport mechanism has a multi-joint arm capable of bending and extending and turning.
6 . 前記移動目的位置は、 前記被処理体を前記処理システム内へ取り込む導 入ポート内の所定の位置であることを特徴とする請求項 1乃至 5のいずれかに記 載のティーチング方法。 6. The teaching method according to any one of claims 1 to 5, wherein the movement target position is a predetermined position in an introduction port for taking the object to be processed into the processing system.
7 . 被処理体に対して所定の処理を施す処理室と、 7. A processing chamber for performing predetermined processing on the object to be processed,
被処理体を導入するための導入ポートと、  An introduction port for introducing an object to be processed,
被処理体の位置決めを行うオリエンタと、  An orienter for positioning the object,
被処理体を保持するピックを有して被処理体を搬送する搬送機構と、 前記搬送機構の動作を制御する制御手段と、  A transport mechanism that transports the workpiece with a pick that holds the workpiece, a control unit that controls the operation of the transport mechanism,
を有する処理システムにおいて、  In the processing system having
前記制御手段は、  The control means,
前記搬送機構を、 仮の移動目的位置まで移動する移動経路の途中で前記搬送機 構が他の部材と干渉する恐れのある干渉注意箇所において他の部材との干渉が生 じないことを確認させるために一時停止させる一時停止工程と、  The transport mechanism is checked to make sure that there is no interference with other members at a cautionary point where the transport mechanism may interfere with other members in the middle of a movement path for moving to a temporary movement target position. A suspending step for suspending for
一時停止された前記搬送機構を移動指令の入力により移動再開させる移動再開 工程と、  A movement restarting step of restarting movement of the temporarily stopped transport mechanism by input of a movement command;
前記一時停止工程と移動再開工程とを繰り返し行う繰り返し工程と、 前記ピックが前記仮の移動目的位置に到達した時に前記ピックの位置を調整移 動して、 或いは調整移動しないで移動目的位置として前記制御手段に記憶させる 記憶工程と、  A repetition step of repeatedly performing the pause step and the movement resumption step; and adjusting and moving the position of the pick when the pick reaches the temporary movement target position, or as the movement target position without adjustment movement. A storage step for storing in the control means;
を実行させるように構成されていることを特徴とする処理システム。  A processing system configured to execute the processing.
8 . 前記制御手段は、 前記処理システムの設計寸法に基づいて前記干渉注意 箇所を予め算出して求めることを特徴とする請求項 7記載の処理システム。  8. The processing system according to claim 7, wherein the control means calculates and obtains the interference attention point in advance based on a design dimension of the processing system.
9 . 前記制御手段は表示部に接続されており、 前記制御手段は、 前記搬送機 構が一時停止する毎に、 表示部にオペレータに対して干渉注意を喚起させるため のメッセージを表示させることを特徴とする請求項 7又は 8記載の処理システム  9. The control unit is connected to a display unit, and the control unit causes the display unit to display a message for calling the operator to be alert to interference each time the transport mechanism is temporarily stopped. The processing system according to claim 7 or 8, wherein
PCT/JP2003/011734 2002-09-13 2003-09-12 Teaching method and processing system WO2004024401A1 (en)

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