WO2003022906A1 - Composes fluores insatures, fluoropolymeres et compositions durcissables les contenant - Google Patents

Composes fluores insatures, fluoropolymeres et compositions durcissables les contenant Download PDF

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Publication number
WO2003022906A1
WO2003022906A1 PCT/JP2002/009215 JP0209215W WO03022906A1 WO 2003022906 A1 WO2003022906 A1 WO 2003022906A1 JP 0209215 W JP0209215 W JP 0209215W WO 03022906 A1 WO03022906 A1 WO 03022906A1
Authority
WO
WIPO (PCT)
Prior art keywords
unsaturated compounds
same
fluorinated unsaturated
compositions containing
different
Prior art date
Application number
PCT/JP2002/009215
Other languages
English (en)
French (fr)
Inventor
Takayuki Araki
Mihoko Ohashi
Yoshito Tanaka
Tetsuo Shimizu
Original Assignee
Daikin Industries, Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries, Ltd. filed Critical Daikin Industries, Ltd.
Priority to JP2003526977A priority Critical patent/JP4285238B2/ja
Publication of WO2003022906A1 publication Critical patent/WO2003022906A1/ja

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D127/00—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers
    • C09D127/02—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment
    • C09D127/12—Coating compositions based on homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a halogen; Coating compositions based on derivatives of such polymers not modified by chemical after-treatment containing fluorine atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
PCT/JP2002/009215 2001-09-11 2002-09-10 Composes fluores insatures, fluoropolymeres et compositions durcissables les contenant WO2003022906A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003526977A JP4285238B2 (ja) 2001-09-11 2002-09-10 含フッ素不飽和化合物、含フッ素重合体、およびそれらを用いた硬化性組成物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001274831 2001-09-11
JP2001-274831 2001-09-11

Publications (1)

Publication Number Publication Date
WO2003022906A1 true WO2003022906A1 (fr) 2003-03-20

Family

ID=19099801

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/009215 WO2003022906A1 (fr) 2001-09-11 2002-09-10 Composes fluores insatures, fluoropolymeres et compositions durcissables les contenant

Country Status (2)

Country Link
JP (1) JP4285238B2 (ja)
WO (1) WO2003022906A1 (ja)

Cited By (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005085181A1 (ja) * 2004-03-08 2005-09-15 Daikin Industries, Ltd. 含フッ素化合物からなる機能性材料
WO2005092997A1 (ja) * 2004-03-26 2005-10-06 Daikin Industries, Ltd. 表面処理剤と、含フッ素単量体および含フッ素重合体
JP2006028280A (ja) * 2004-07-14 2006-02-02 Fuji Photo Film Co Ltd 含フッ素多官能モノマー、含フッ素重合体、反射防止膜、反射防止フィルムおよび画像表示装置
US7101618B2 (en) 2004-05-07 2006-09-05 3M Innovative Properties Company Article comprising fluorochemical surface layer
JP2006233172A (ja) * 2005-01-27 2006-09-07 Shin Etsu Chem Co Ltd 含フッ素硬化性組成物
US7173778B2 (en) 2004-05-07 2007-02-06 3M Innovative Properties Company Stain repellent optical hard coating
WO2007034818A1 (ja) * 2005-09-21 2007-03-29 Daikin Industries, Ltd. 紙用処理剤および紙の処理方法
US7288619B2 (en) 2004-05-07 2007-10-30 3M Innovative Properties Company Fluorinated polyether polyamine and method of making the same
JP2008009348A (ja) * 2006-06-30 2008-01-17 Dainippon Printing Co Ltd 反射防止積層体
US7342080B2 (en) 2004-05-07 2008-03-11 3M Innovative Properties Company Polymerizable compositions, methods of making the same, and composite articles therefrom
JP2008527090A (ja) * 2004-12-30 2008-07-24 スリーエム イノベイティブ プロパティズ カンパニー 耐汚染性フルオロケミカル組成物
WO2012078956A1 (en) 2010-12-10 2012-06-14 Ppg Industries Ohio, Inc. Polymeric substrates having a thin metal film and fingerprint resistant clear coating deposited thereon and related methods
WO2012078953A1 (en) 2010-12-10 2012-06-14 Ppg Industries Ohio, Inc. Color plus clear coating systems exhibiting desirable appearance and fingerprint resistance properties and related methods
US20130004780A1 (en) * 2009-11-11 2013-01-03 Gregory Hervieu Surface Treatment Composition, Process For Producing The Same, And Surface-Treated Article
WO2013129651A1 (ja) * 2012-03-02 2013-09-06 富士フイルム株式会社 撥液性処理剤、撥液性膜、撥水性領域と親水性領域とを有する部材及びその製造方法、並びに機能性材料のパターンが形成された部材の製造方法
US9279913B2 (en) 2008-07-22 2016-03-08 Fujifilm Corporation Antireflective film, polarizing plate, and image display device
CN113874129A (zh) * 2019-06-20 2021-12-31 田中贵金属工业株式会社 金属图案的形成方法
WO2022059623A1 (ja) * 2020-09-16 2022-03-24 Ａｇｃ株式会社 組成物、表面層付き基材、表面層付き基材の製造方法、化合物および化合物の製造方法

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101367641B1 (ko) 2012-06-29 2014-02-26 한국화학연구원 탄화수소기 함량이 적은 과불소폴리에테르를 포함하는 다관능 아크릴레이트 화합물 및 이의 제조방법

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0079590A1 (en) * 1981-11-12 1983-05-25 Daikin Kogyo Co., Ltd. Use of polyacrylic or methacrylic esters of fluorine-containing alcohols as ink repellant agent
JPS63301268A (ja) * 1987-06-02 1988-12-08 Asahi Glass Co Ltd 活性エネルギ−線硬化性組成物
JPH0848935A (ja) * 1994-08-09 1996-02-20 Nippon Oil & Fats Co Ltd 反射防止膜を備えた減反射材及びその製造法
JPH09104655A (ja) * 1995-10-09 1997-04-22 Sumitomo Electric Ind Ltd 含フッ素（メタ）アクリル化合物
JPH1180312A (ja) * 1997-09-05 1999-03-26 Matsushita Electric Ind Co Ltd パーフロロポリオキシアルキル化合物，反射防止膜用塗料及び該反射防止膜用塗料を用いた低反射材
JP2002069037A (ja) * 2000-08-31 2002-03-08 Nippon Mektron Ltd 含フッ素ポリエーテルカルボン酸エステル

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0079590A1 (en) * 1981-11-12 1983-05-25 Daikin Kogyo Co., Ltd. Use of polyacrylic or methacrylic esters of fluorine-containing alcohols as ink repellant agent
JPS63301268A (ja) * 1987-06-02 1988-12-08 Asahi Glass Co Ltd 活性エネルギ−線硬化性組成物
JPH0848935A (ja) * 1994-08-09 1996-02-20 Nippon Oil & Fats Co Ltd 反射防止膜を備えた減反射材及びその製造法
JPH09104655A (ja) * 1995-10-09 1997-04-22 Sumitomo Electric Ind Ltd 含フッ素（メタ）アクリル化合物
JPH1180312A (ja) * 1997-09-05 1999-03-26 Matsushita Electric Ind Co Ltd パーフロロポリオキシアルキル化合物，反射防止膜用塗料及び該反射防止膜用塗料を用いた低反射材
JP2002069037A (ja) * 2000-08-31 2002-03-08 Nippon Mektron Ltd 含フッ素ポリエーテルカルボン酸エステル

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005085181A1 (ja) * 2004-03-08 2005-09-15 Daikin Industries, Ltd. 含フッ素化合物からなる機能性材料
WO2005092997A1 (ja) * 2004-03-26 2005-10-06 Daikin Industries, Ltd. 表面処理剤と、含フッ素単量体および含フッ素重合体
US7638575B2 (en) 2004-03-26 2009-12-29 Daikin Industries, Ltd. Surface treating agent, fluorine-containing monomer and fluorine-containing polymer
US7101618B2 (en) 2004-05-07 2006-09-05 3M Innovative Properties Company Article comprising fluorochemical surface layer
US7173778B2 (en) 2004-05-07 2007-02-06 3M Innovative Properties Company Stain repellent optical hard coating
US7267850B2 (en) 2004-05-07 2007-09-11 3M Innovative Properties Company Article comprising fluorochemical surface layer
US7288619B2 (en) 2004-05-07 2007-10-30 3M Innovative Properties Company Fluorinated polyether polyamine and method of making the same
US7332217B2 (en) 2004-05-07 2008-02-19 3M Innovative Properties Company Article and comprising fluorochemical surface layer
US7342080B2 (en) 2004-05-07 2008-03-11 3M Innovative Properties Company Polymerizable compositions, methods of making the same, and composite articles therefrom
JP4691332B2 (ja) * 2004-07-14 2011-06-01 富士フイルム株式会社 含フッ素多官能モノマー、含フッ素重合体、反射防止膜、反射防止フィルムおよび画像表示装置
JP2006028280A (ja) * 2004-07-14 2006-02-02 Fuji Photo Film Co Ltd 含フッ素多官能モノマー、含フッ素重合体、反射防止膜、反射防止フィルムおよび画像表示装置
US9334418B2 (en) 2004-12-30 2016-05-10 3M Innovative Properties Company Stain-resistant fluorochemical compositions
JP2008527090A (ja) * 2004-12-30 2008-07-24 スリーエム イノベイティブ プロパティズ カンパニー 耐汚染性フルオロケミカル組成物
JP2006233172A (ja) * 2005-01-27 2006-09-07 Shin Etsu Chem Co Ltd 含フッ素硬化性組成物
WO2007034818A1 (ja) * 2005-09-21 2007-03-29 Daikin Industries, Ltd. 紙用処理剤および紙の処理方法
JP2008009348A (ja) * 2006-06-30 2008-01-17 Dainippon Printing Co Ltd 反射防止積層体
US9279913B2 (en) 2008-07-22 2016-03-08 Fujifilm Corporation Antireflective film, polarizing plate, and image display device
US20130004780A1 (en) * 2009-11-11 2013-01-03 Gregory Hervieu Surface Treatment Composition, Process For Producing The Same, And Surface-Treated Article
US9523004B2 (en) * 2009-11-11 2016-12-20 Essilor International Surface treatment composition, process for producing the same, and surface-treated article
WO2012078956A1 (en) 2010-12-10 2012-06-14 Ppg Industries Ohio, Inc. Polymeric substrates having a thin metal film and fingerprint resistant clear coating deposited thereon and related methods
WO2012078953A1 (en) 2010-12-10 2012-06-14 Ppg Industries Ohio, Inc. Color plus clear coating systems exhibiting desirable appearance and fingerprint resistance properties and related methods
WO2013129651A1 (ja) * 2012-03-02 2013-09-06 富士フイルム株式会社 撥液性処理剤、撥液性膜、撥水性領域と親水性領域とを有する部材及びその製造方法、並びに機能性材料のパターンが形成された部材の製造方法
CN113874129A (zh) * 2019-06-20 2021-12-31 田中贵金属工业株式会社 金属图案的形成方法
CN113874129B (zh) * 2019-06-20 2023-02-24 田中贵金属工业株式会社 金属图案的形成方法
WO2022059623A1 (ja) * 2020-09-16 2022-03-24 Ａｇｃ株式会社 組成物、表面層付き基材、表面層付き基材の製造方法、化合物および化合物の製造方法
CN116194225A (zh) * 2020-09-16 2023-05-30 Ａｇｃ株式会社 组合物、带表面层的基材、带表面层的基材的制造方法、化合物和化合物的制造方法

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JP4285238B2 (ja) 2009-06-24
JPWO2003022906A1 (ja) 2004-12-24

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