WO2001037312A1 - Procede et dispositif de traitement et de recouvrement de surfaces en materiaux dielectriques non conducteurs au moyen de plasmas excites par micro-ondes - Google Patents

Procede et dispositif de traitement et de recouvrement de surfaces en materiaux dielectriques non conducteurs au moyen de plasmas excites par micro-ondes Download PDF

Info

Publication number
WO2001037312A1
WO2001037312A1 PCT/DE2000/003971 DE0003971W WO0137312A1 WO 2001037312 A1 WO2001037312 A1 WO 2001037312A1 DE 0003971 W DE0003971 W DE 0003971W WO 0137312 A1 WO0137312 A1 WO 0137312A1
Authority
WO
WIPO (PCT)
Prior art keywords
plasma
treatment
treated
ignition
microwaves
Prior art date
Application number
PCT/DE2000/003971
Other languages
German (de)
English (en)
Inventor
Udo Krohmann
Bernd Neumann
Torsten Neumann
Andreas Ohl
Original Assignee
Knn Systemtechnik Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10052082A external-priority patent/DE10052082A1/de
Application filed by Knn Systemtechnik Gmbh filed Critical Knn Systemtechnik Gmbh
Priority to AU23494/01A priority Critical patent/AU2349401A/en
Priority to DE10083551T priority patent/DE10083551D2/de
Publication of WO2001037312A1 publication Critical patent/WO2001037312A1/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32366—Localised processing

Definitions

  • the present invention relates to a method for treating and coating surfaces made of non-conductive, dielectric materials by means of microwave-excited plasmas and a device for carrying out the method.
  • the plasma is generated via earth electrodes by means of high frequency (DE 197 19 911, DE 196 15 735) under normal pressure, preferably with the supply of a suitable foreign gas or under vacuum.
  • the present invention thus has for its object to provide a treatment or coating of surfaces of langge- stretched hollow bodies or counter Standen of non-conductive, dielectric materials by means of a modulated, microcrystalline ⁇ wave excited, current plasma in the region of atmosphäri ⁇ 's air pressure and to allow it without that there is thermal damage to the materials to be treated.
  • the object is located and is microwave-technically closed on all sides, is supplied by means of modulated microwaves, b) the plasma is ignited at a predetermined location, spatially separated from the microwave feed, c) the running, self-propelled, localized plasma is located within the waveguiding hollow structure of place the ignition moved over the surfaces to be treated in the direction of the microwave feed, wherein sufficient for the plasma overflow cavity surface to be treated is present in excess of that d) the plasma treatment in the range of atmospheric air ⁇ pressure and is carried out over, e) the current Plasma is interrupted as soon as it has swept over the surface to be treated, f) the atmospheric composition suitable for plasma treatment is used, g) the plasma treatment is repeated until a desired work result is achieved, h) the plasma is ignited automatically at the defined location, i) by introducing an additional limitation made of non-conductive, dielectric material into the treatment chamber, a targeted treatment by means of ongoing Plasmas on defined surfaces of containers and objects is realized.
  • the controlled stable movement (run) of the plasma is achieved in that the ignition takes place at a predetermined location within the treatment chamber which is at a sufficient spatial distance from the microwave feed and in that this microwave energy is modulated so that the plasma is within the defined cavities moved to the location of the microwave feed.
  • the plasma must be protected by suitable measures, e.g. Interrupt microwave switch-off by time control or light sensor as soon as the running plasma has swept over the surface to be treated. By restarting the treatment process, the plasma run can be repeated any number of times until the desired effect is achieved.
  • suitable measures e.g. Interrupt microwave switch-off by time control or light sensor as soon as the running plasma has swept over the surface to be treated.
  • the plasma is ignited using known ignition devices, such as: field strength controlling element additional discharge / additional plasma - pilot flame laser beam - UV radiation other high-energy radiation
  • the modulation of the microwave energy fed in for example in the form of 100 Hz sine half-waves, and by varying the frequency by changing the pressure conditions Also above the atmospheric air pressure and / or the gas composition, the running speed, size, effective time, temperature, energy content and thus the effect of the running plasma on the surface to be treated are changed.
  • additives can additionally be added to the plasma in gaseous, solid and liquid form, individually or in mixtures.
  • Plasma treatment can be used for any type of:
  • a preferred device for carrying out the method contains the following elements: a) a treatment chamber 9, which is formed from a wave-guiding hollow structure 1 and is closed on all sides by microwave technology, b) a microwave generator 15 including a device for modulating the microwaves fed in, c) a coupling device 5 for feeding the microwaves into the treatment chamber 9, d) an ignition device 11 which ignites the plasma at a defined location, e) a device 13 for switching off of the plasma.
  • a device with these features can be characterized in that f) a device 12, by means of which the treatment chamber 9 is supplied with the gas atmosphere required for the plasma treatment, g) in the treatment chamber 9, an additional plasma-leading boundary 6 made of dielectric material is arranged, h ) the plasma 4 is adapted to the geometry of the object 2 to be treated by changing the geometry of the wave-guiding structure 1 and / or the boundary 6, i) the ignition device 11 consists of a field strength-controlling element and is moved to the location predetermined for the ignition 3, j) the ignition device 11 is arranged as a field strength-controlling element at the tip of a lance 10 made of dielectric material which can be moved into and out of the cavity of the object 2 to be treated, k) the lance 10 is hollow and through it the plasma is liquid and / or solid and / or gaseous substances are supplied, 1) the ignition device 11 from a field The strength-controlling element exists and is arranged in the lower region of the treatment chamber 9, m) the treatment chamber 9 is divided as a
  • Figure 1 a schematic representation of a device for the internal treatment of a hollow body
  • Figure 2 a schematic representation of a device for the external treatment of a hollow body
  • Figure 3 a schematic representation for the treatment of surfaces of a body by arranging an additional limitation
  • Figure 4 the basic structure of a System with a fixed and movable part of the wave-guiding hollow structure
  • Figure 5 the basic structure of a system for
  • Fig.l shows the schematic structure is a device for domestic nen aspect of hollow bodies 2 shown, consisting of egg ⁇ ner waveguiding hollow structure 1, the coupling device 5, Be ⁇ treatment chamber 9, lance 10, ignition device 11, apparatus for Zubowung 12 for the treatment atmo sphere ⁇ required, shut-off device 13 for the plasma 4, means 15 for generating the microwaves and their modulation.
  • the device according to the invention according to FIG. 1 can be used to sterilize hollow bodies 2 (bottles) particularly advantageously by means of running plasmas 4 under atmospheric conditions.
  • the hollow body 2 to be treated stands upright with the floor facing downward, so that the open mouth points upward.
  • the ignition 3 of the modulated microwave-excited plasma 4 takes place in the bottom area within the bottle 2 to be treated by means of an ignition device 11 (here a field strength-controlling element) at the tip of a lance 10 made of dielectric material and immersed in the bottle.
  • an ignition device 11 here a field strength-controlling element
  • the lance 10 is retracted with the ignition device 11 at the tip up to near the floor and - as soon as the ignition device has reached the floor area - the modulated microwaves are switched on, so that the ignition 3 of the plasma 4 takes place at the defined location.
  • the plasma moves in the direction of the coupling device 5 to open the bottle 2.
  • the lance 10 is moved out of the hollow body 2 again.
  • a switch-off device 13 for example a light sensor
  • the lance 10 By designing the lance 10 as a hollow rod, one or more additives can be injected directly into the plasma zone through the lance 10.
  • the lance 10 can also be used after the treatment to fill the packaging.
  • FIG. 2 shows the schematic structure of a device for the external treatment of hollow bodies 2, consisting of a wave-guiding hollow structure 1, coupling device 5, treatment chamber 9, ignition device 11, device for supplying 12 the atmosphere required for the treatment, switch-off device 13 for the Plasma 4, device 15 for generating the microwaves and their modulation.
  • the structure of the device shown in FIG. 2 is basically identical to that of the device shown in FIG. However, the ignition 3 of the plasma 4 takes place here by means of an ignition device 11 at a defined location outside the object 2 to be treated (bottle), but within the cavity now produced between the bottle 2 and the waveguide hollow structure 1, so that the plasma 4 is located within this cavity moved over the bottle outer surface of bottle 2.
  • FIG. 3 shows the structure of a device for the external treatment of objects 2.
  • the structure of this device is in principle identical to the structure of the devices shown in FIGS. 1 and 2.
  • the device shown in FIG. 3 contains only an additional boundary 6 made of dielectric material in the treatment chamber 9
  • a targeted plasma treatment on selected surfaces of the object to be treated is possible by creating defined cavities over the surfaces to be treated and plasma ignition 3 taking place in such a way that the plasma 4 runs over these surfaces.
  • an additional limitation can also be introduced for the purpose that certain parts of the surface are covered by the additional limitation so that plasma treatment of these parts of the surface does not take place.
  • FIG. 4 shows the basic structure of a treatment chamber 9 in section, in which the wave-guiding hollow structure 1 is formed from a fixed part 7 (casing) and a moving part 8.
  • the treatment chamber 9 as a wave-guiding hollow structure 1 is designed in such a way that the bottles run continuously. Depending on the required fla- number of cycles, the arrangement of one or more treatment chambers 9 is possible.
  • the treatment chambers 9 are arranged on the moving part 8 such that the outer side of the treatment chamber 9 is open in order to ensure the smooth entry and exit of the bottles into and out of the treatment chambers 9.
  • the open side is delimited by a fixed part 7 (outer wall), past which the chambers 9 are guided, so that the wave-guiding part is guided during the rotational movement of the movable part 8
  • Hollow structure 1 of the treatment chambers 9 is permanently preserved in the area of the fixed part 7.
  • FIG. 5 shows the basic structure of a system for plasma treatment of objects in the form of strips, plates or prisms, e.g. for plasma cleaning of glass plates before the coating process.
  • the structure of this system is basically identical to the structure of the systems shown in FIGS. 1 and 2.
  • the wave-guiding hollow structure 1 here has two opposing openings 14 between the ignition device 11 and the coupling device 5, through which the sheet, plate or prism-shaped objects 2 to be treated are guided continuously or discontinuously through the treatment chamber 9 during the plasma treatment. In this way, a cavity is formed between the surface of the object 2 to be treated and the wave-guiding hollow structure 1, through which the plasma 4 runs over the surface to be treated.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Apparatus For Disinfection Or Sterilisation (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)

Abstract

L'invention concerne une solution technique pour le traitement et le recouvrement de surfaces en matériaux diélectriques non conducteurs au moyen de plasmas excités par micro-ondes, ce procédé étant caractérisé en ce que : a) l'énergie nécessaire à la formation du plasma (4) est introduite par des micro-ondes modulées produites par un générateur (15) dans la structure creuse (1) guidant les ondes, fermée de tous côtés pour contenir les micro-ondes et dans laquelle est placé l'objet (2) à traiter ; b) l'allumage (3) du plasma (4) a lieu grâce à un dispositif d'allumage (11) dans un endroit prédéfini, physiquement séparé de la zone d'entrée des micro-ondes (5) ; c) le plasma (4) piégé, en mouvement, se déplace à l'intérieur de la structure creuse (1) guidant les ondes, à partir du point d'allumage (3) et vers la zone d'entrée des micro-ondes (5), en passant par les surfaces à traiter, un vide suffisant étant prévu au-dessus de ces dernières pour le passage du plasma, dans la chambre de traitement (9) ; d) le traitement au plasma est effectué dans les limites de la pression atmosphérique et au-delà, avec une atmosphère d'une composition adaptée à ce traitement et délivrée par un dispositif (12) ; et e) le plasma (4) en mouvement est éteint par un dispositif (13) dès qu'il a balayé la surface à traiter.
PCT/DE2000/003971 1999-11-12 2000-11-10 Procede et dispositif de traitement et de recouvrement de surfaces en materiaux dielectriques non conducteurs au moyen de plasmas excites par micro-ondes WO2001037312A1 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
AU23494/01A AU2349401A (en) 1999-11-12 2000-11-10 Method and device for treating and coating non-conductive, dielectric surfaces using plasmas excited by microwaves
DE10083551T DE10083551D2 (de) 1999-11-12 2000-11-10 Verfahren und Vorrichtung zum Behandeln und Beschichten von Oberflächen aus nichtleitenden, dielektrischen Materialien mittels mikrowellenangeregter Plasmen

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
DE19956832.4 1999-11-12
DE19956832 1999-11-12
DE10052082.0 2000-10-19
DE10052082A DE10052082A1 (de) 1999-11-12 2000-10-19 Verfahren zum Behandeln und Beschichten von Oberflächen aus nichtleitenden, dielektrischen Materialien mittels mokrowellenangeregter Plasmen und Vorrichtung zur Durchführung des Verfahrens

Publications (1)

Publication Number Publication Date
WO2001037312A1 true WO2001037312A1 (fr) 2001-05-25

Family

ID=26007437

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2000/003971 WO2001037312A1 (fr) 1999-11-12 2000-11-10 Procede et dispositif de traitement et de recouvrement de surfaces en materiaux dielectriques non conducteurs au moyen de plasmas excites par micro-ondes

Country Status (3)

Country Link
AU (1) AU2349401A (fr)
DE (1) DE10083551D2 (fr)
WO (1) WO2001037312A1 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2503023A3 (fr) * 2003-03-12 2013-11-06 Toyo Seikan Kaisha, Ltd. Élément d'alimentation en gaz pour dispositif de traitement au plasma micro-ondes

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3222189A1 (de) * 1982-06-12 1984-01-26 Hans Dr.Rer.Nat. 5370 Kall Beerwald Plasmaverfahren zur innenbeschichtung von rohren mit dielektrischem material
DE3820237C1 (fr) * 1988-06-14 1989-09-14 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften Ev, 3400 Goettingen, De
EP0415122A2 (fr) * 1989-08-03 1991-03-06 Yuzo Mori Procédé et appareillage pour formation de couches par dépôt chimique en phase vapeur sous haute pression assisté par plasma à micro-ondes
EP0568049A1 (fr) * 1992-04-30 1993-11-03 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Dispositif et méthode pour la formation d'un revêtement sur la paroi interne d'un objet creux par CVD assisté par plasma à micro-ondes

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3222189A1 (de) * 1982-06-12 1984-01-26 Hans Dr.Rer.Nat. 5370 Kall Beerwald Plasmaverfahren zur innenbeschichtung von rohren mit dielektrischem material
DE3820237C1 (fr) * 1988-06-14 1989-09-14 Max-Planck-Gesellschaft Zur Foerderung Der Wissenschaften Ev, 3400 Goettingen, De
EP0415122A2 (fr) * 1989-08-03 1991-03-06 Yuzo Mori Procédé et appareillage pour formation de couches par dépôt chimique en phase vapeur sous haute pression assisté par plasma à micro-ondes
EP0568049A1 (fr) * 1992-04-30 1993-11-03 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V. Dispositif et méthode pour la formation d'un revêtement sur la paroi interne d'un objet creux par CVD assisté par plasma à micro-ondes

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2503023A3 (fr) * 2003-03-12 2013-11-06 Toyo Seikan Kaisha, Ltd. Élément d'alimentation en gaz pour dispositif de traitement au plasma micro-ondes
US8680424B2 (en) 2003-03-12 2014-03-25 Toyo Seikan Kaisha, Ltd. Microwave plasma processing device

Also Published As

Publication number Publication date
DE10083551D2 (de) 2002-12-19
AU2349401A (en) 2001-05-30

Similar Documents

Publication Publication Date Title
DE69532853T2 (de) Verfahren und vorrichtung zur mikrowellen-plasmaerzeugung
DE3830249C2 (fr)
DE3010314C2 (de) Verfahren zur innenbeschichtung von elektrisch nicht leitfähigen Rohren mittels Gasentladungen
DE3833232C2 (fr)
EP0446596B1 (fr) Procédé PCVD pour la production de substrats sous la forme de calotte pourvus à l'intérieur et/ou à l'extérieur de revêtements diélectriques et/ou métalliques
DE4316349C2 (de) Verfahren zur Innenbeschichtung von Hohlkörpern mit organischen Deckschichten durch Plasmapolymerisation, sowie Vorrichtung zur Durchführung des Verfahrens
EP2716139B1 (fr) Dispositif et procédé de production d'un plasma froid homogène dans des conditions de pression atmosphérique
DE4437050A1 (de) Vorrichtung zum Behandeln von Oberflächen von Hohlkörpern, insbesondere von Innenflächen von Kraftstofftanks
AT514555B1 (de) Verfahren und Vorrichtung zur Erzeugung eines Plasmastrahls
DE2332116C3 (de) Gerät zur Bestrahlung von bewegten aus einem mit einem fotohärtbaren Kunststoffilm beschichteten Substrat bestehenden Produkten während des Herstellungsprozesses
DE102005029360A1 (de) Verfahren zur kontinuierlichen Atmosphärendruck Plasmabehandlung von Werkstücken, insbesondere Materialplatten oder -bahnen
DE10202311A1 (de) Vorrichtung zur Plasmabehandlung von dielektrischen Körpern
CN106068053A (zh) 一种可产生均匀连续放电或等离子体光子晶体的装置及方法
DE202007018317U1 (de) Vorrichtung zur Erzeugung eines Plasmastrahls
WO2008061602A1 (fr) Procédé et dispositif pour produire un plasma, et utilisations du plasma
DE3128022A1 (de) Verfahren zum erzeugen von kohlenstoffueberzuegen fuer optische zwecke
DE19546827A1 (de) Einrichtung zur Erzeugung dichter Plasmen in Vakuumprozessen
DE102010056020B4 (de) Verfahren und Vorrichtung zum Ausbilden einer dielektrischen Schicht auf einem Substrat
WO2001037312A1 (fr) Procede et dispositif de traitement et de recouvrement de surfaces en materiaux dielectriques non conducteurs au moyen de plasmas excites par micro-ondes
EP1946623A2 (fr) Procede et dispositif pour amorcer et produire un plasma a micro-ondes diffus qui s'etend, et procede et dispositif pour traiter des surfaces et des matieres au moyen de ce plasma
EP3430864B1 (fr) Buse plasma et procede d'utilisation de la buse plasma
DE10052082A1 (de) Verfahren zum Behandeln und Beschichten von Oberflächen aus nichtleitenden, dielektrischen Materialien mittels mokrowellenangeregter Plasmen und Vorrichtung zur Durchführung des Verfahrens
DE19751003A1 (de) Verfahren und Vorrichtung zum Beschichten von Werkstücken
DE3619694A1 (de) Verfahren und vorrichtung zur erzeugung funktioneller atomgruppierungen in makromolekularen stoffen
DE4338040C2 (de) Vorrichtung zum Beschichten von Brillengläsern im Vakuum und Betriebsverfahren hierfür

Legal Events

Date Code Title Description
AK Designated states

Kind code of ref document: A1

Designated state(s): AE AL AM AT AU AZ BA BB BG BR BY CA CH CN CR CU CZ DE DK DM EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX NO NZ PL PT RO RU SD SE SG SI SK SL TJ TM TR TT TZ UA UG US UZ VN YU ZA ZW

AL Designated countries for regional patents

Kind code of ref document: A1

Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZW AM AZ BY KG KZ MD RU TJ TM AT BE CH CY DE DK ES FI FR GB GR IE IT LU MC NL PT SE TR BF BJ CF CG CI CM GA GN GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
DFPE Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101)
WWE Wipo information: entry into national phase

Ref document number: 2000987121

Country of ref document: EP

WWW Wipo information: withdrawn in national office

Ref document number: 2000987121

Country of ref document: EP

122 Ep: pct application non-entry in european phase