EP1946623A2 - Procede et dispositif pour amorcer et produire un plasma a micro-ondes diffus qui s'etend, et procede et dispositif pour traiter des surfaces et des matieres au moyen de ce plasma - Google Patents

Procede et dispositif pour amorcer et produire un plasma a micro-ondes diffus qui s'etend, et procede et dispositif pour traiter des surfaces et des matieres au moyen de ce plasma

Info

Publication number
EP1946623A2
EP1946623A2 EP06793298A EP06793298A EP1946623A2 EP 1946623 A2 EP1946623 A2 EP 1946623A2 EP 06793298 A EP06793298 A EP 06793298A EP 06793298 A EP06793298 A EP 06793298A EP 1946623 A2 EP1946623 A2 EP 1946623A2
Authority
EP
European Patent Office
Prior art keywords
plasma
microwave
resonant
ignition
wave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP06793298A
Other languages
German (de)
English (en)
Other versions
EP1946623B1 (fr
Inventor
Udo Krohmann
Torsten Neumann
Jörg EHLBECK
Kristian Rackow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Institut fur Niedertemperatur-Plasmaphysik Ev
Original Assignee
Institut fur Niedertemperatur-Plasmaphysik Ev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE200510043278 external-priority patent/DE102005043278B4/de
Application filed by Institut fur Niedertemperatur-Plasmaphysik Ev filed Critical Institut fur Niedertemperatur-Plasmaphysik Ev
Publication of EP1946623A2 publication Critical patent/EP1946623A2/fr
Application granted granted Critical
Publication of EP1946623B1 publication Critical patent/EP1946623B1/fr
Not-in-force legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/30—Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the present invention relates to a method for igniting and generating a propagating, diffuse microwave plasma. Furthermore, the invention relates to an apparatus for carrying out such a method.
  • the method is suitable for producing microwave plasmas for the purpose of plasma treatment of surfaces and substances, in particular of three-dimensional objects, as well as of particles under atmospheric pressure.
  • Microwave plasmas are eminently suitable for performing various types of plasma treatments, e.g. the activation, purification, coating, sterilization, modification and functionalization of surfaces.
  • plasma treatments e.g. the activation, purification, coating, sterilization, modification and functionalization of surfaces.
  • the use of a diffuse, largely homogeneous, expanded plasma is desired.
  • Plasmajets of various designs (DE19605518, EP0968524,
  • US Pat. No. 5,798,146 basically require a high gas flow, usually a special working gas, to drive out the plasma and are problematic in the ignition behavior. In addition, they generate only a small volume of plasma with a small diameter. As a result, they are not suitable for mass applications and too expensive to manufacture and operate.
  • the present invention is therefore an object of the invention to provide a method for igniting and generating a diffuse, spatially extended microwave plasma, which in particular in normal and high pressure is simple and reliable and in principle to realize without gas flow.
  • the method for igniting and generating a propagating diffuse Mikrowellenplasmas is characterized in that a) within a wave-limiting hollow structure at least one resonant ignition structure is arranged, b) a plasma ignition by microwave coupling is thereby caused by the resonant ignition structure dimensioned and arranged that a power input into the resonant ignition structure takes place and locally a high resonance field strength for the plasma ignition is achieved, a simultaneous driving of the plasma by the resonant ignition structure, however, is not possible and thus an inherent protection of the ignition device is given (a self-controlling Transition between the ignition and entertainment phase of the plasma), c) the plasma ignited by the resonant ignition structure is supplied with energy via a surrounding microwave field in such a way that a propagating, diffuse plasma is formed, d) the feed into the resonant ignition structure and into the plasma via the same microwave field.
  • This method can be applied both in low pressure and in atmospheric pressure and above.
  • a gas flow By applying a gas flow, a driving of the plasma is possible, which can cause an increase in the plasma volume according to the coupled power.
  • the method can be realized with any gases and their mixtures with and without gas flow.
  • the resonant ignition structure can be supplied with microwave energy via a direct coupling or from an ambient free microwave field.
  • a particularly interesting embodiment of the method is the generation of an expanding, diffuse plasma within a coaxial hollow structure.
  • the inner conductor is designed at the end as a resonant ignition structure so that a microwave coupling leads to the ignition of the plasma, the plasma but over the coaxial line is self-powered.
  • the diameter of the coaxial outer conductor is to be chosen so that according to the frequency used in the continuation of the outer conductor beyond the end of the inner conductor beyond a wave propagation through the open end of the outer conductor is not possible, however, a protrusion of the plasma from the opening is given.
  • the resonant ignition structure in the vicinity of a field maximum of a microwave field is arranged so that the forming plasma grows into the field maximum, a detachment of the plasma from the ignition structure is to be achieved.
  • the resonant ignition structure In an arrangement of the resonant ignition structure at one end of a waveguide and a feeding of the microwaves from the other end, the resonant ignition structure is largely decoupled from the microwave supply after formation of the plasma. This protects the ignition structure from the effects of the plasma.
  • the plasma can be influenced in its properties (e.g., temperature, expansion) by pulsing and modulating the energy input.
  • a further particularly advantageous embodiment of the resonant ignition structure is characterized in that it is arranged in the center conductor or in the outer conductor of the coaxial line and that they as a coaxial structure with a resonant length of ⁇ / 2 (lambda / 2) (half wavelength) or an odd multiple of ⁇ / 2 (lambda / 2) according to the frequency used.
  • the method for surface treatment by means of an expanding, diffuse microwave plasma is characterized in that within a coaxial hollow structure, a propagating and emerging from the structure diffused microwave plasma is ignited, the plasma for a plasma treatment suitable substances are supplied and to be treated surfaces and substances are guided into the effective range of the plasma.
  • the substances intended for the plasma treatment can be supplied to the plasma in solid (powdery form), liquid and gaseous form.
  • a modulation and pulsation of the energy supply is suitable.
  • a plasma treatment can only with atmospheric air under
  • color particles e.g., low melting polymers
  • the particles are melted in the plasma and deliquesce upon impact with the surface to form a uniform film.
  • the particles are subjected to a plasma treatment which causes the layer formed on the surface to harden in the shortest possible time solely by the plasma modification of the particles.
  • further additional (e.g., UV-curing) treatment is not required.
  • the method can be influenced in its scope and performance in that several plasma sources are arranged in series, annular to each other and one above the other or as an array.
  • a preferred apparatus for carrying out the method contains the following elements:
  • a device with these features can be configured by the fact that the microwave line is designed to be flexible and substances are supplied to the plasma via a plurality of feeders.
  • Fig. 1 is a schematic representation of a basic device for generating an expanding, diffuse microwave plasma
  • Fig. 2 is a schematic representation of a specific embodiment of the
  • FIG. 3 is a schematic representation of a special embodiment of the resonant ignition structure as a coaxial structure
  • FIG. 4 Basic structure of a plasma processing apparatus;
  • Fig. 5 Plasma processing apparatus with a flexible material feeder.
  • Fig. 1 the schematic structure of a basic device for the implementation of
  • a method of igniting and generating an expanding, diffuse microwave plasma within a wave-limiting hollow structure is a method of igniting and generating an expanding, diffuse microwave plasma within a wave-limiting hollow structure.
  • the device consists of a wave-limiting hollow structure (1), a resonant ignition structure (3), a microwave generator (4) and a microwave feed (5).
  • the wave-limiting hollow structure (1) is made of electrically conductive material so that a cavity is formed, which is dimensioned so that a wave propagation within the cavity is possible, but is prevented to the outside.
  • a resonant ignition structure (3) is arranged so that it can extract from an electromagnetic field the energy required for the plasma ignition and the ignited, spread de plasma (2) from the surrounding electromagnetic field with energy becomes.
  • the resonant ignition structure (3) is formed from two electrically conductive resonant circuits (6) coupled to one another such that the open positions of the resonant circuits (6) are opposite one another.
  • the resonant length of the resonant circuit (6) is formed of at least one half wavelength of the frequency used.
  • the necessary for the construction of an electromagnetic field microwaves (2.45 GHz) are generated in a microwave generator (4) and via a micro- Welleneinspeisung (5) fed into the wave-limiting hollow structure (1).
  • the plasma (2) is ignited in air under atmospheric conditions (7) and remains within the wave-limiting hollow structure (1).
  • FIG. 2 the schematic structure of a specific embodiment for generating a propagating diffuse Mikrowellenplasmas (2) from a coaxial wave-limiting hollow structure (1) is shown out.
  • the device consists of a wave-limiting hollow structure (1), a resonant ignition structure (3), a microwave generator (4), a flexible microwave line (8) and a microwave feed (5) in the wave-limiting hollow structure (1).
  • the wave-limiting hollow structure (1) is designed in this case as a tube with an open end (9).
  • the diameter of the tube is selected according to the frequency used (2.45 GHz) so that wave propagation is not possible ( ⁇ / 2 - small lambda / 2).
  • the resonant ignition structure (3) is carried out in extension of the central conductor of the coaxial line so that on the one hand a direct energy input into the resonant ignition structure (3) for plasma ignition (7) takes place and on the other hand with the wave-limiting hollow structure (1) as a outer conductor formed a coaxial line is passed over the energy to the end of this coaxial line and thus outside the resonant ignition structure (3) builds up an electromagnetic field. Since the wave-limiting hollow structure (1) is extended beyond the end of the center conductor, wave propagation through the opening (9) to the outside is not possible.
  • the microwave energy generated by the microwave generator (4) is coupled in part via the flexible microwave line (8) in the resonant ignition structure (3), so that a plasma ignition (7) at the top of the resonant ignition structure (3), as well as on the resonant ignition structure (3) and the wave-limiting hollow structure (1) formed coaxial line led to the end of this coaxial line, so that from the resonant ignition structure (3) ignited plasma (2) is supplied via this coaxial line with energy that a Propagation of the plasma (2) takes place in such a way that a spread to the outside is achieved.
  • the plasma (2) is ignited under atmospheric conditions in air and enters out of the opening (9) automatically out.
  • a plasma diameter and an exit length of several cm can be achieved.
  • Fig. 3 shows a schematic representation of a particularly advantageous
  • resonant ignition structure This is given by the fact that it is designed as a coaxial structure with a resonant length of ⁇ / 2 (lambda / 2) (half wavelength) or an odd multiple of ⁇ / 2 (lambda / 2) according to the frequency used.
  • the depth of the resonant structure (3) is approximately lambda / 4 in this example.
  • This resonant structure (3) can be arranged both in the center conductor and in the outer conductor of the coaxial line.
  • FIG. 4 the schematic basic structure of an apparatus for implementing the method for the purpose of a plasma treatment of surfaces is shown.
  • the microwave energy generated by a microwave supply (4) is fed coaxially (5) into the wave-limiting hollow structure (1) via a preferably flexible microwave line (8).
  • the wave-limiting hollow structure (1) is preferably dimensioned as a tube corresponding to the frequency of 2.45 GHz used here so that wave propagation is possible only in the region of the coaxial structure. Wave propagation beyond the open end of the wave-limiting structure (1), however, is not possible by sufficient extension of the wave-limiting structure (1).
  • the resonant ignition structure (3) is coupled as an extension of the coaxial feed (5) to the power supply, that at a power coupling a high ignition field strength at the top of the resonant ignition structure (3) is formed, which is sufficient for plasma ignition (7), a feeding of the ignited plasma (2) but via the resonant ignition structure (3) as the center conductor and the wave-limiting hollow structure (1) formed as an outer conductor coaxial line.
  • a surface (13) to be treated is now arranged in the effective range of the plasma (2) such that a desired treatment effect, e.g. an activation of the surface (13) is achieved.
  • the plasma treatment can be carried out without any active gas flow with air at atmospheric pressure.
  • suitable substances can be supplied to the plasma (2) both inside and outside via a special delivery device (12) for achieving a defined treatment effect the wave limiting structure (1) are supplied.
  • a special delivery device (12) for achieving a defined treatment effect the wave limiting structure (1) are supplied.
  • the substances are in a container (10) and are supplied to the plasma (2) via the supply device (12).
  • By exchanging the container (10) different substances can be used depending on the desired application.
  • By arranging the containers (10) directly on the shaft-limiting hollow structure (1) a high flexibility and mobility of the device is provided.
  • Fig. 5 shows a comparison with Fig. 4 extended device, provided for the plasma treatment substances via a flexible conduit (11) from the fabric containers (10) via the feed device for substances (12) the plasma (2)

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

La présente invention concerne un procédé pour amorcer et produire un plasma à micro-ondes diffus qui s'étend, et un dispositif pour mettre en oeuvre le procédé. Le procédé convient particulièrement à la production de plasmas à micro-ondes destinés à traiter au plasma des surfaces et des matières, en particulier des objets tridimensionnels, aussi bien que des particules, sous pression atmosphérique normale. L'invention a pour objet de mettre au point un procédé pour amorcer et produire un tel plasma, qui peut être mis en oeuvre en particulier sous pression normale ou élevée, avec une bonne fiabilité et simplicité de fonctionnement, et intrinsèquement sans circulation de gaz. L'invention a également pour objet de mettre au point un procédé et un dispositif pour traiter des surfaces et des matières au moyen d'un tel plasma, rendant possible un traitement au plasma efficace, grâce à une stabilité élevée en ce qui concerne la production du plasma et son entretien, l'utilisation de gaz limitée et le volume de plasma important. A cet effet, un amorçage de plasma a lieu dans une structure creuse qui limite le passage des ondes, par introduction de micro-ondes via une structure d'amorçage résonante, le passage simultané du plasma en sens opposé à travers la structure d'amorçage résonante, étant impossible. Le plasma amorcé est alimenté en énergie par un champ de micro-ondes périphérique, pour conduire à la formation d'un plasma diffus qui s'étend. Une forme particulière qui se caractérise par une disposition coaxiale, permet la production d'un plasma qui sort du dispositif et sert au traitement au plasma mobile.
EP06793298.8A 2005-09-09 2006-09-07 Dispositif pour amorcer et produire un plasma a micro-ondes diffus qui s'etend, et dispositif pour traiter des surfaces et des matieres au moyen de ce plasma Not-in-force EP1946623B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE200510043278 DE102005043278B4 (de) 2005-09-09 2005-09-09 Verfahren und Vorrichtung zum Erzeugen eines sich ausdehnenden, diffusen Mikrowellenplasmas
DE102005045825 2005-09-24
PCT/EP2006/066100 WO2007028813A2 (fr) 2005-09-09 2006-09-07 Procede et dispositif pour amorcer et produire un plasma a micro-ondes diffus qui s'etend, et procede et dispositif pour traiter des surfaces et des matieres au moyen de ce plasma

Publications (2)

Publication Number Publication Date
EP1946623A2 true EP1946623A2 (fr) 2008-07-23
EP1946623B1 EP1946623B1 (fr) 2014-06-11

Family

ID=37428863

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06793298.8A Not-in-force EP1946623B1 (fr) 2005-09-09 2006-09-07 Dispositif pour amorcer et produire un plasma a micro-ondes diffus qui s'etend, et dispositif pour traiter des surfaces et des matieres au moyen de ce plasma

Country Status (3)

Country Link
US (1) US8232728B2 (fr)
EP (1) EP1946623B1 (fr)
WO (1) WO2007028813A2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008036766B4 (de) * 2008-08-07 2013-08-01 Alexander Gschwandtner Vorrichtung und Verfahren zum Erzeugen dielektrischer Schichten im Mikrowellenplasma
DE102008045187A1 (de) * 2008-08-30 2010-03-04 Krones Ag Elektronenstrahlsterilisation für Behältnisse
DE102012004034A1 (de) * 2012-03-02 2013-09-05 Johannes Gartzen HF-Plasma-Zündkopf, -Strahlerkopf und -Strahler insbesondere zum Zünden und Betreiben eines Plasmas im MHz- und GHz-Bereich
US9736920B2 (en) 2015-02-06 2017-08-15 Mks Instruments, Inc. Apparatus and method for plasma ignition with a self-resonating device
KR20180061135A (ko) * 2015-06-19 2018-06-07 어플라이드 머티어리얼스, 인코포레이티드 레이저 및 가스 유동을 이용한 적층 제조에서의 표면 처리
EP3536348A1 (fr) * 2018-03-07 2019-09-11 Leibniz-Institut für Plasmaforschung und Technologie e.V. Procédé, dispositif d'allumage du plasma et système de décontamination biologique, de désinfection ou de stérilisation des produits à traiter au moyen d'un gaz réactif

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Publication number Priority date Publication date Assignee Title
FR2583250B1 (fr) 1985-06-07 1989-06-30 France Etat Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique
JPH03110798A (ja) * 1989-09-25 1991-05-10 Ryohei Itaya マイクロ波プラズマ発生装置
DE4235914A1 (de) 1992-10-23 1994-04-28 Juergen Prof Dr Engemann Vorrichtung zur Erzeugung von Mikrowellenplasmen
JP2972477B2 (ja) 1993-01-27 1999-11-08 日本電気株式会社 Ｒｆ・ｅｃｒプラズマエッチング装置
US5798146A (en) 1995-09-14 1998-08-25 Tri-Star Technologies Surface charging to improve wettability
DE19605518C2 (de) 1996-02-15 2000-01-27 Dornier Gmbh Vorrichtung zur Herstellung von Hochdruck/Hochtemperatur-Plasmajets
JPH10134996A (ja) * 1996-10-31 1998-05-22 Nec Corp プラズマ処理装置
US5767627A (en) * 1997-01-09 1998-06-16 Trusi Technologies, Llc Plasma generation and plasma processing of materials
US5961772A (en) 1997-01-23 1999-10-05 The Regents Of The University Of California Atmospheric-pressure plasma jet
DE19726663A1 (de) 1997-06-23 1999-01-28 Sung Spitzl Hildegard Dr Ing Vorrichtung zur Erzeugung von homogenen Mikrowellenplasmen
DE19802971C2 (de) * 1998-01-27 1999-12-02 Fraunhofer Ges Forschung Plasmareaktor
US6841201B2 (en) * 2001-12-21 2005-01-11 The Procter & Gamble Company Apparatus and method for treating a workpiece using plasma generated from microwave radiation
WO2003096766A1 (fr) * 2002-05-08 2003-11-20 Dana Corporation Regulation de plasma reposant sur l'utilisation de la phase et / ou de la frequence de sources de rayonnement multiples

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Title
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Also Published As

Publication number Publication date
US20100001647A1 (en) 2010-01-07
WO2007028813A2 (fr) 2007-03-15
WO2007028813A3 (fr) 2007-11-22
US8232728B2 (en) 2012-07-31
EP1946623B1 (fr) 2014-06-11

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