WO2000038221A1 - Vorrichtung zum behandeln von substraten - Google Patents
Vorrichtung zum behandeln von substraten Download PDFInfo
- Publication number
- WO2000038221A1 WO2000038221A1 PCT/EP1999/009450 EP9909450W WO0038221A1 WO 2000038221 A1 WO2000038221 A1 WO 2000038221A1 EP 9909450 W EP9909450 W EP 9909450W WO 0038221 A1 WO0038221 A1 WO 0038221A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- guide elements
- pair
- guide
- substrates
- wafers
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 68
- 239000012530 fluid Substances 0.000 claims description 29
- 239000007788 liquid Substances 0.000 abstract description 3
- 235000012431 wafers Nutrition 0.000 description 54
- 239000004065 semiconductor Substances 0.000 description 8
- 230000005484 gravity Effects 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000001035 drying Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 241000478345 Afer Species 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000036316 preload Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/67313—Horizontal boat type carrier whereby the substrates are vertically supported, e.g. comprising rod-shaped elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
Definitions
- the present invention relates to a device for treating substrates in a fluid container with a substrate receiving device which can be brought over the fluid container and has at least one pair of lateral guide elements.
- Devices for wet treatment of substrates in a container containing a treatment fluid are described in EP-B-0 385 536 and DE-A-197 03 646, in which the substrates can be inserted into the container together with a substrate carrier.
- the substrates e.g. B. semiconductor wafers
- the substrates are brought via a lowering and lifting device into the container containing the treatment fluid and then treated with the treatment fluid.
- the semiconductor wafers are moved out of the treatment fluid by means of a knife-like device and dried, for example according to the arangoni method known from EP-B-0 385 536, in order subsequently to be received in a hood located above the container with lateral guides for the afer become.
- the basin and the hoods are each for the treatment of substrates with certain dimensions, such as.
- a gripping device for gripping semiconductor wafers which has two separately operable pairs of gripping arms which can be brought into contact with and released from the wafers via an actuating mechanism.
- the gripper is immersed in a fluid-filled basin and a lower one of the pairs of grippers is closed to grip the wafers.
- the gripper is then raised until the upper pair of grippers lie above the fluid surface.
- the upper pair of grippers is then closed to grip the wafers and the lower pair of grippers is opened. Now the wafers are completely lifted out of the treatment fluid.
- This complicated gripping mechanism is provided to ensure that the grippers are not in contact with the wafer during the passage through the fluid surface, since fluid could accumulate on the contact surface between the gripper and the wafer, which impairs the drying of the wafer.
- JP-5-36668A shows a substrate gripper similar to that described above, but in which, in addition to the two pairs of grippers, a rigid pair of receiving ele enten is provided to receive an upper end of the substrates.
- a wafer gripper which consists of an upper pair of rigid receiving elements and a movable pair of lower grippers.
- JP-7-169731A shows a wafer carrier for holding semiconductor wafers in a treatment fluid, which has a lower holding element and two lateral, adjustable holding elements for holding wafers with different diameters.
- the present invention is therefore based on the object of creating a simple and efficient device for treating substrates in a fluid container with a substrate receiving device which can be brought over the fluid container and has at least one pair of lateral guide elements in which the substrate Pick-up device is easily able to pick up substrates with different diameters and to guide them safely.
- the invention solves this problem in that the guide elements are movable relative to one another by contact with the substrates and by their movement. This has the advantage that the guide elements automatically adapt to the size and contour of the substrate without separate actuation and control mechanisms.
- the device thus enables in a simple manner that substrates with different dimensions can be picked up and guided.
- a second pair of guide elements that can be moved relative to one another is provided in order to guide and thus improve provide stability.
- the second pair of guide elements advantageously lies above the first pair of guide elements.
- the guide elements of each pair are essentially movable towards and away from one another in order to accommodate substrates of different sizes and to enable the guide elements to move along the outer circumference of the substrates.
- the guide elements are guided in guideways of the substrate receiving device, which is preferably a hood, in which the guideways are formed in the end faces of the hood.
- the guide elements are guided in a relatively simple and uncomplicated manner, which specifies the relative movement of the guide elements.
- the guide elements of at least one pair are pivotally mounted about a common pivot point, the common pivot point preferably being above the guide elements.
- the pivotable mounting results in a particularly simple configuration for the relative movement of the elements, wherein a common pivot point can preferably be used for a pair of the guide elements.
- the guide elements of at least one pair are pivotable about separate pivot points to a certain form of the pivoting movement, such as. B. to achieve a relatively flat.
- the pivot point or the pivot points of the first pair of guide elements are advantageously arranged at the highest point within the substrate receiving device in order to make a relative movement of the substrates relatively flat, ie with the lowest possible height component. see. It is also advantageous if the guide elements are located near the surface of a treatment fluid so that the substrates moving out of the treatment fluid are received and guided as early as possible by the guide element.
- the fulcrum or the fulcrums of the second pair of guide elements is or are advantageously below the fulcrum or fulcrums of the first pair of guide elements in order to enable a special position of the guide elements in the case of a substrate completely accommodated in the substrate receiving device.
- connection legs are advantageously provided between the guide elements and the pivot points, the connection legs of the first pair of guide elements being longer than those of the second pair. This, in particular in combination with the position of the pivot points, ensures a relatively flat pivoting behavior of the first pair of guide elements just above a surface of a treatment fluid. In the second pair of guide elements, it is ensured that the guide elements lie substantially on or somewhat below a horizontal center line of the substrates when the substrates are completely picked up. This results in a particularly good and secure hold of the substrates.
- At least one pair of the lateral guide elements can be locked. This can be achieved in a simple manner that the substrates are held securely in the receiving device in order, for. B. to be transported together with the receiving device without the need for an additional locking element.
- the guide elements are at least of a pair arranged symmetrically with respect to a central plane of the substrate receiving device.
- the guide elements of at least one pair are preloaded with respect to one another, the preload preferably being determined by the weight of the guide elements, i. H. by gravity. If the effect of gravity is not sufficient, the guide elements are advantageously additionally biased towards one another by means of a spring.
- the guide elements of each pair of guide elements are spaced a minimum distance in their rest position. This ensures that the substrates can be easily inserted between the guide elements in order to then move them apart.
- the guide elements are rods with a multiplicity of guide slots, the rods advantageously being designed in the form of a roller, so that the guide elements are of simple construction.
- the guide slots in the guide elements are circumferential, so that a special alignment of the guide elements with respect to a substrate to be received or guided is not necessary.
- the guide elements are preferably rotatable about their longitudinal axis.
- the invention is described below using a preferred embodiment with reference to the drawings. Show it:
- Figure 1 shows a device in schematic representation for treating substrates with a substrate receiving device according to a first embodiment of the invention.
- FIG. 2 shows a substrate receiving device in a schematic representation according to a second exemplary embodiment of the invention
- FIG. 3 shows a substrate receiving device in a schematic representation according to a further exemplary embodiment of the invention.
- FIG. 5 shows a schematic representation of the positions of wafers with different diameters before being lifted out of a treatment fluid, as well as the rest position of the substrate receiving device.
- a device 1 for treating substrates 2 has a basin 3 and a hood 4 located above the basin 3 for receiving the substrates 2.
- the basin 3 is formed by a substantially V-shaped bottom 5 and adjoining side walls 6 and 7.
- nozzles 9 and an outlet 10 for introducing or discharging a treatment fluid, such as DI water.
- the upper edges of the side walls 6 and 7 each form an overflow 12 or 13, which defines the maximum fill level of the basin 3.
- the treatment fluid flowing over the overflows 12 and 13 is drained off in a known manner.
- a lifting and lowering device 20 for a substrate carrier 23 and a knife-like element 25, which is referred to below as a knife is referred to below as a knife.
- the substrate carrier 23 and the knife 25 can be raised and lowered separately, as is known from the prior art.
- a lifting and lowering device 20 which is suitable for this is described, for example, in DE-A-197 37 802, which goes back to the same applicant. To avoid repetition, the content of DE-A-197 37 802 is made the subject of this application.
- a plurality of wafers 2 (of which only one in FIG. 1
- FIG. 1 shows how the knife 25 is in contact with the lowermost point of a wafer 2 and how the wafer 2 emerges from the substrate carrier 23 in the manner described in DE-A-197 37 802 and partly in more detail below hood 4 has moved into it.
- the hood 4 located above the basin 3 has a feed 32 for IPA a gas or a gas mixture which is provided for drying the wafers 2 in accordance with the Marangoni method known from the above-mentioned EP-B-0 385 536.
- the hood 4 has a first pair of guide rods 35 for lateral guidance of the substrates 2 in its interior, 36 and a second pair of guide rods 39, 40.
- the guide rods 35, 36 and 39, 40 each have circumferential guide slots, not shown.
- the guide rods 35, 36 of the first pair are pivotably attached to a bolt 47 via connecting legs 45 and 46, which in turn is fastened to an end wall of the hood 4.
- the position of the bolt 47 and the length of the connecting legs 45 and 46, which defines the pivoting movement of the guide rods, is selected such that a pivoting movement of the guide rods 45, 46 around the bolt 47 is kept relatively flat and close to the fluid surface.
- the guide rods 39, 40 are pivotally attached in the same way via connecting legs 49 and 50 to a bolt 51, which in turn is fastened to an end wall of the hood 4.
- the height of the bolt 51 is below the bolt 47 and the length of the connecting legs 49, 50 is shorter than that of the connecting legs 45, 46.
- the position of the bolt 51 and the length of the connecting legs 49, 50 is chosen such that the guide rods 39, 40 are above the height of the guide rods 35, 36 and that the guide rods 39, 40 for a wafer accommodated in the hood lie on or just below a horizontal center line of the wafers.
- the guide rods 35, 36 and / or the guide rods 39, 40 are rotatably mounted on the connecting legs about their longitudinal axis, and they can be locked in such a way that the wafers 2 accommodated in the hood 4 are solely by the guide rods 35, 36 and / or the guide rods 39, 40 are held.
- FIG. 2 schematically shows an alternative embodiment of the invention, in which pairs of guide rods 55, 56 and 59, 60 slide in guide tracks 62, 63 and 65, 66, which are formed on opposite end walls 67 (only one of which is shown schematically) of an alternative hood 68.
- the guideways are shown curved, they can also be linear, and in particular the lower guideways could be designed horizontally in order to keep the substrates guiding as close as possible to the fluid surface.
- the guide elements could be biased towards each other by springs or other suitable means.
- Fig. 3 shows schematically another alternative embodiment of the invention, in which guide rods 75, 76, 79 and 80 are pivotally attached to respective bolts 81, 82, 83 and 84.
- the bolts 81 to 84 are each attached to opposite end walls 87 (only one of which is shown schematically) of an alternative hood 88.
- FIGS. 4a to d show the sequence in a device according to FIG.
- Treatment fluid lifted out the surface of which is provided with the reference numeral 90.
- the upper edges of the wafers 2 are brought into contact with the first pair of guide rods 35, 36 and received in their guide slots.
- the wafers 2 are guided laterally by the guide rods 35, 36 of the first pair during a further lifting movement.
- the guide rods 35, 36 are separated by the wafers 2 presses.
- the upper edge of the wafers 2 is brought into contact with the second pair of guide rods 39, 40 and received in their guide slots.
- the wafers 2 are now guided laterally by both pairs of the guide rods while pushing the two pairs apart.
- the wafers 2 are raised further until they are completely lifted out of the treatment liquid.
- the wafers 2 are raised so far that the guide rods 39, 40 also cross the horizontal center line of the wafers 2 and slide along the underside of the wafers 2. Furthermore, the wafers are raised so far that they can only be passed through the second, i.e. the upper pair of guide rods 39, 40 are guided.
- the wafers can only be lifted so far that they have just been lifted out of the treatment fluid and are still guided by both pairs of the guide rods.
- at least one of the pairs of guide rods is locked by a device, not shown, such as a stop pin, so that the guide rods can no longer move apart.
- the knife is moved back and the wafers 2 are held securely in the hood 4 by the guide elements.
- the wafers can optionally be transported with the hood or subsequently placed back in the (meanwhile dried) substrate carrier 23.
- the knife is moved into contact with the wafers 2, and the locking of the guide rods is released, as a result of which the wafers are carried again by the knife.
- the wafers are subsequently lowered, they are again guided through the guide rods.
- the relative movement between the wafers and the guide rods takes place in the reverse order to that described above.
- FIG. 5 schematically shows the wafer positions of wafers with different diameters before being lifted out of the treatment fluid.
- the guide bars are shown in their rest positions spaced apart from each other so that the wafers can be inserted between the guide bars and then pressed apart.
- wafers with different diameters can be received and guided in the hood.
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
Description
Claims
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000590200A JP2002533921A (ja) | 1998-12-22 | 1999-12-03 | 基板を処理するための装置 |
KR1020017008056A KR20010089696A (ko) | 1998-12-22 | 1999-12-03 | 기판을 프로세싱하기 위한 장치 |
EP99961055A EP1145291A1 (de) | 1998-12-22 | 1999-12-03 | Vorrichtung zum behandeln von substraten |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19859468.2 | 1998-12-22 | ||
DE19859468A DE19859468C2 (de) | 1998-12-22 | 1998-12-22 | Vorrichtung zum Behandeln und Handhaben von Substraten |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2000038221A1 true WO2000038221A1 (de) | 2000-06-29 |
Family
ID=7892264
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1999/009450 WO2000038221A1 (de) | 1998-12-22 | 1999-12-03 | Vorrichtung zum behandeln von substraten |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1145291A1 (de) |
JP (1) | JP2002533921A (de) |
KR (1) | KR20010089696A (de) |
CN (1) | CN1331839A (de) |
DE (1) | DE19859468C2 (de) |
TW (1) | TW463262B (de) |
WO (1) | WO2000038221A1 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10034744B4 (de) | 1999-08-26 | 2012-05-24 | Schaeffler Technologies Gmbh & Co. Kg | Verfahren zur Bestimmung des von einer Reibungskupplung eines mit einem Antriebsmotor gekoppelten Lastschaltgetriebes übertragenen Moments |
DE10127042A1 (de) * | 2001-06-02 | 2002-12-12 | Astec Halbleitertechnologie Gm | Verfahren und Vorrichtung zum Behandeln von Substraten |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5301700A (en) * | 1992-03-05 | 1994-04-12 | Tokyo Electron Limited | Washing system |
EP0658923A1 (de) * | 1993-12-14 | 1995-06-21 | Shin-Etsu Handotai Company Limited | Reinigungsbehälter für Halbleitersubstrate |
WO1998008754A1 (en) * | 1996-08-29 | 1998-03-05 | Scp Global Technologies, A Division Of Preco, Inc. | Compliant process cassette |
DE19753471A1 (de) * | 1996-12-28 | 1998-07-02 | Lg Semicon Co Ltd | Wafer-Träger- und/oder -Beförderungs-Vorrichtung |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2574411B2 (ja) * | 1988-08-09 | 1997-01-22 | 富士通株式会社 | 純水引き上げ乾燥用支持方法 |
JPH0290522A (ja) * | 1988-09-28 | 1990-03-30 | Toshiba Corp | ウエハ洗浄用のウエハハンドリング装置 |
NL8900480A (nl) * | 1989-02-27 | 1990-09-17 | Philips Nv | Werkwijze en inrichting voor het drogen van substraten na behandeling in een vloeistof. |
JPH0536668A (ja) * | 1991-07-30 | 1993-02-12 | Toshiba Corp | 半導体基板乾燥方法 |
DE19703646C2 (de) * | 1996-04-22 | 1998-04-09 | Steag Micro Tech Gmbh | Vorrichtung und Verfahren zum Behandeln von Substraten in einem Fluid-Behälter |
-
1998
- 1998-12-22 DE DE19859468A patent/DE19859468C2/de not_active Expired - Lifetime
-
1999
- 1999-12-03 EP EP99961055A patent/EP1145291A1/de not_active Withdrawn
- 1999-12-03 WO PCT/EP1999/009450 patent/WO2000038221A1/de not_active Application Discontinuation
- 1999-12-03 KR KR1020017008056A patent/KR20010089696A/ko not_active Application Discontinuation
- 1999-12-03 JP JP2000590200A patent/JP2002533921A/ja active Pending
- 1999-12-03 CN CN99814921A patent/CN1331839A/zh active Pending
- 1999-12-09 TW TW088121541A patent/TW463262B/zh not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5301700A (en) * | 1992-03-05 | 1994-04-12 | Tokyo Electron Limited | Washing system |
EP0658923A1 (de) * | 1993-12-14 | 1995-06-21 | Shin-Etsu Handotai Company Limited | Reinigungsbehälter für Halbleitersubstrate |
WO1998008754A1 (en) * | 1996-08-29 | 1998-03-05 | Scp Global Technologies, A Division Of Preco, Inc. | Compliant process cassette |
DE19753471A1 (de) * | 1996-12-28 | 1998-07-02 | Lg Semicon Co Ltd | Wafer-Träger- und/oder -Beförderungs-Vorrichtung |
Also Published As
Publication number | Publication date |
---|---|
KR20010089696A (ko) | 2001-10-08 |
DE19859468C2 (de) | 2002-01-17 |
DE19859468A1 (de) | 2000-07-06 |
CN1331839A (zh) | 2002-01-16 |
JP2002533921A (ja) | 2002-10-08 |
EP1145291A1 (de) | 2001-10-17 |
TW463262B (en) | 2001-11-11 |
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