WO1999061434A1 - Verfahren zur herstellung von phthalsäureanhydrid durch katalytische gasphasenoxidation von o-xylol/naphthalin-gemischen - Google Patents
Verfahren zur herstellung von phthalsäureanhydrid durch katalytische gasphasenoxidation von o-xylol/naphthalin-gemischen Download PDFInfo
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- WO1999061434A1 WO1999061434A1 PCT/EP1999/003192 EP9903192W WO9961434A1 WO 1999061434 A1 WO1999061434 A1 WO 1999061434A1 EP 9903192 W EP9903192 W EP 9903192W WO 9961434 A1 WO9961434 A1 WO 9961434A1
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- Prior art keywords
- catalyst
- weight
- calculated
- cesium
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Links
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 title claims abstract description 40
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 title claims abstract description 34
- 239000000203 mixture Substances 0.000 title claims abstract description 33
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 title claims abstract description 12
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 title claims abstract description 12
- 230000003647 oxidation Effects 0.000 title claims abstract description 11
- 238000007254 oxidation reaction Methods 0.000 title claims abstract description 11
- 230000003197 catalytic effect Effects 0.000 title claims abstract description 10
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 239000012808 vapor phase Substances 0.000 title abstract 2
- 239000003054 catalyst Substances 0.000 claims abstract description 109
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 32
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 32
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims abstract description 32
- 239000007789 gas Substances 0.000 claims abstract description 19
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 10
- 150000001875 compounds Chemical class 0.000 claims abstract description 9
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 claims abstract description 7
- 229910000410 antimony oxide Inorganic materials 0.000 claims abstract description 7
- 229910001882 dioxygen Inorganic materials 0.000 claims abstract description 7
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 claims abstract description 7
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910001935 vanadium oxide Inorganic materials 0.000 claims abstract description 6
- 229910052758 niobium Inorganic materials 0.000 claims abstract description 4
- 239000010955 niobium Substances 0.000 claims abstract description 4
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229940078552 o-xylene Drugs 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 15
- 238000002360 preparation method Methods 0.000 claims description 9
- 239000012495 reaction gas Substances 0.000 claims description 6
- 239000007858 starting material Substances 0.000 claims description 6
- 229910001392 phosphorus oxide Inorganic materials 0.000 claims description 2
- VSAISIQCTGDGPU-UHFFFAOYSA-N tetraphosphorus hexaoxide Chemical compound O1P(O2)OP3OP1OP2O3 VSAISIQCTGDGPU-UHFFFAOYSA-N 0.000 claims description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 2
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Inorganic materials O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 abstract description 8
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 abstract description 4
- YEAUATLBSVJFOY-UHFFFAOYSA-N tetraantimony hexaoxide Chemical compound O1[Sb](O2)O[Sb]3O[Sb]1O[Sb]2O3 YEAUATLBSVJFOY-UHFFFAOYSA-N 0.000 abstract 2
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 abstract 1
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 239000011230 binding agent Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- FLJPGEWQYJVDPF-UHFFFAOYSA-L caesium sulfate Chemical compound [Cs+].[Cs+].[O-]S([O-])(=O)=O FLJPGEWQYJVDPF-UHFFFAOYSA-L 0.000 description 6
- 229910044991 metal oxide Inorganic materials 0.000 description 5
- 150000004706 metal oxides Chemical class 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- WNZQDUSMALZDQF-UHFFFAOYSA-N 2-benzofuran-1(3H)-one Chemical compound C1=CC=C2C(=O)OCC2=C1 WNZQDUSMALZDQF-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 4
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000006227 byproduct Substances 0.000 description 3
- MNNHAPBLZZVQHP-UHFFFAOYSA-N diammonium hydrogen phosphate Chemical compound [NH4+].[NH4+].OP([O-])([O-])=O MNNHAPBLZZVQHP-UHFFFAOYSA-N 0.000 description 3
- 239000000391 magnesium silicate Substances 0.000 description 3
- 229910052919 magnesium silicate Inorganic materials 0.000 description 3
- 235000019792 magnesium silicate Nutrition 0.000 description 3
- OGUCKKLSDGRKSH-UHFFFAOYSA-N oxalic acid oxovanadium Chemical compound [V].[O].C(C(=O)O)(=O)O OGUCKKLSDGRKSH-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 239000011591 potassium Substances 0.000 description 3
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical compound [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229930192627 Naphthoquinone Natural products 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 239000011149 active material Substances 0.000 description 2
- 229910052783 alkali metal Inorganic materials 0.000 description 2
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 2
- 150000001340 alkali metals Chemical class 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000001569 carbon dioxide Substances 0.000 description 2
- 229910002092 carbon dioxide Inorganic materials 0.000 description 2
- 239000012876 carrier material Substances 0.000 description 2
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 150000002791 naphthoquinones Chemical class 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000002243 precursor Substances 0.000 description 2
- 229910052701 rubidium Inorganic materials 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- -1 thalium (I) oxide Chemical compound 0.000 description 2
- 229910052716 thallium Inorganic materials 0.000 description 2
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- IKWTVSLWAPBBKU-UHFFFAOYSA-N a1010_sial Chemical compound O=[As]O[As]=O IKWTVSLWAPBBKU-UHFFFAOYSA-N 0.000 description 1
- 239000013543 active substance Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- 229960002594 arsenic trioxide Drugs 0.000 description 1
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical compound [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 1
- 229910001942 caesium oxide Inorganic materials 0.000 description 1
- 150000001244 carboxylic acid anhydrides Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- JIHMVMRETUQLFD-UHFFFAOYSA-N cerium(3+);dioxido(oxo)silane Chemical compound [Ce+3].[Ce+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O JIHMVMRETUQLFD-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 230000000779 depleting effect Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- GLVVKKSPKXTQRB-UHFFFAOYSA-N ethenyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OC=C GLVVKKSPKXTQRB-UHFFFAOYSA-N 0.000 description 1
- 238000011049 filling Methods 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- XNGIFLGASWRNHJ-UHFFFAOYSA-N o-dicarboxybenzene Natural products OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- ZFACJPAPCXRZMQ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O.OC(=O)C1=CC=CC=C1C(O)=O ZFACJPAPCXRZMQ-UHFFFAOYSA-N 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910001952 rubidium oxide Inorganic materials 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/21—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen
- C07C51/255—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting
- C07C51/265—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting having alkyl side chains which are oxidised to carboxyl groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/19—Catalysts containing parts with different compositions
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J37/00—Processes, in general, for preparing catalysts; Processes, in general, for activation of catalysts
- B01J37/02—Impregnation, coating or precipitation
- B01J37/0215—Coating
- B01J37/0221—Coating of particles
- B01J37/0223—Coating of particles by rotation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/31—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting
- C07C51/313—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting with molecular oxygen
Definitions
- the invention relates to a process for the preparation of phthalic anhydride by catalytic gas phase oxidation of o-xylene / naphthalene mixtures with molecular oxygen using 2 catalyst beds from shell catalysts which contain cesium, the cesium content of the catalyst of the second layer being less than 15% by weight. of the cesium content of the first layer.
- the gas phase oxidation of o-xylene and / or naphthalene to phthalic anhydride is well known and has been widely described in the literature.
- a mixture of a gas containing molecular oxygen, for example air, and the starting material to be oxidized are generally passed through a large number of tubes arranged in a reactor, in which there is a bed of at least one catalyst.
- the tubes are surrounded by a heat transfer medium, for example a molten salt.
- so-called "hot spots" can form in the catalyst bed, in which the temperature is higher than in the remaining part of the catalyst bed.
- hot spots give rise to side reactions, such as the total combustion of the starting material, or they lead to the formation of undesirable by-products which cannot be separated from the reaction product or can only be separated with great effort, for example the formation of phthalide or naphthoquinone.
- it has already been proposed to arrange differently active catalysts in layers in the catalyst bed the less active catalyst generally being arranged toward the gas inlet and the more active catalyst being arranged towards the gas outlet from the catalyst bed.
- the differently active catalysts in the catalyst bed can be exposed to the reaction gas at the same temperature, but the two layers of differently active catalysts can also be brought into contact with the reaction gas thermostatically at different reaction temperatures.
- So-called shell catalysts have proven themselves as catalysts for phthalic anhydride production (see below). Because of the different reactivities of the starting materials, different catalysts are generally used for the oxidation of naphthalene or o-xylene, so that when using o-xylene / naphthalene mixtures, specially adapted catalysts have to be used, which can be used both for o -Xylene- as well as for naphthalene oxidation, as described for example in BE 893521, EP 286448 and in DE 2238067.
- EP 539878 describes that when using catalysts in the entry stage at a bed height of 15-85%, based on the volume of the total height of the catalyst bed, and a catalyst in the subsequent stage at a bed height of 85- 15%, based on the volume of the total height of the catalyst bed, in the direction of the gas outlet, in the form of layers one on top of the other, very good results can be achieved if a catalyst substance on an inactive carrier in the ratio between 5 and 20g / 100ml, the catalytic substance comprising 1 to 20% by weight of V 2 0 5 and 99 to 80% by weight of anatase-type titanium dioxide with a specific surface area of 10 to 60 m 2 / g, and also the incorporation of, based on 100 parts by weight of the total amount of the aforementioned two components, 0.01 to 1% by weight of Nb 2 0 5 , 0.2 to 1.2% by weight of P 2 0 5 , 0.5 to 5% by weight % Sb0 3 and
- catalysts with almost the above composition using cesium as alkali metal and a cesium content of the second layer of less than 15% by weight of the cesium content of the first layer have particularly advantageous properties compared to the above catalysts in the have called "window".
- an improved process for the preparation of phthalic anhydride was found by catalytic gas phase oxidation of o-xylene / naphthalene mixtures with molecular oxygen using a Catalyst I in a first layer on the gas inlet side, which makes up 25 to 75 percent by volume of the total catalyst volume, containing, in each case based on the catalytically active composition, 1 to 10% by weight of vanadium oxide (calculated as V 2 O 5 ), 1 to 10 % By weight of antimony oxide (calculated as Sb 2 0 3 ) and 80 to 98% by weight of anatase-type titanium dioxide with a BET surface area of 13 to 28 m 2 / g and 0.05 to 1% by weight of cesium (calculated as Cs) applied to a steatite support and one
- Catalyst II in a second layer which makes up the remaining 75 to 25 percent by volume of the total catalyst volume, containing, in each case based on the catalytically active composition, 1 to 10% by weight of vanadium oxide (calculated as V 2 Os), 1 to 10% by weight. % Antimony oxide (calculated as Sb 2 0 3 ) and 80 to 98% by weight of anatase-type titanium oxide with a BET surface (cf. J. Amer. Chem. Soc. Volume 60, page 309 ff.
- the product quality can be increased significantly by reducing the content of the undesired by-products phthalide or naphthoquinone without significantly influencing the phthalic anhydride yield.
- This has an effect in particular at lower bath temperatures, which are necessary to achieve loads above 60g / Nm 3 .
- This effect occurs particularly clearly with a cesium content of the catalyst II of 10-13% by weight of the cesium content of the catalyst I and a portion of the layer of the catalyst
- the catalysts used can also contain small amounts of metal oxides such as niobium, tungsten and / or lead without doping. These occur due to possible contamination of the commercial anatase used and are therefore not to be regarded as doping active substances.
- Other impurities, especially alkali metal impurities, are usually Gen. less than 0.01% by weight.
- coated catalysts have proven successful in which the catalytically active composition (“active composition”) is in the form of a shell on a support material which is generally inert under the reaction conditions, such as quartz (SiO 2 ), porcelain, magnesium oxide, tin dioxide, silicon carbide, rutile, Alumina (A1 2 0 3 ), aluminum silicate, magnesium silicate (steatite), zirconium silicate or cerium silicate or mixtures of these carrier materials is applied .
- quartz SiO 2
- porcelain porcelain
- magnesium oxide tin dioxide
- silicon carbide silicon carbide
- rutile rutile
- Alumina A1 2 0 3
- aluminum silicate magnesium silicate
- magnesium silicate steatite
- zirconium silicate or cerium silicate or mixtures of these carrier materials is applied .
- vanadium pentoxide is generally used as a catalytically active component of the catalytic active mass of these coated catalysts
- the catalytically active composition may contain a large number of other oxidic compounds in small amounts which, as promoters, influence the activity and selectivity of the catalyst by lowering or increasing its activity, such as promoters being, for example, the alkali metal oxides, in particular lithium and potassium , Rubidium and cesium oxide, thalium (I) oxide, aluminum oxide, zirconium oxide, iron oxide, nickel oxide, cobalt oxide, manganese oxide, tin oxide, silver oxide, copper oxide, chromium oxide, molybdenum oxide, tungsten oxide, iridium oxide, tantalum oxide, niobium oxide, arsenic oxide, antimony oxide, Cerium oxide and phosphorus pentoxide called.
- the alkali metal oxides for example, act as promoters which reduce the activity and increase the selectivity
- the proportion of active mass in the total catalyst should generally only have a slight deviation from the target value, since the activity and selectivity of the catalyst are strongly influenced by the amount of active mass applied and thus the layer thickness of the shell. the. For this reason, in the production methods described, the catalyst frequently has to be cooled to determine the amount of active composition applied, removed from the coating drum or the fluidized bed and weighed again. If too much active material is deposited on the catalyst carrier, a subsequent, gentle removal of the excess amount of active material applied is not possible without impairing the strength of the shell, in particular without cracking in the catalyst shell.
- organic binders preferably copolymers of vinyl acetate / vinyl laurate, vinyl acetate / acrylate, styrene / acrylate, vinyl acetate / maleate and vinyl acetate / ethylene, advantageously in the form of an aqueous dispersion, where Amounts of binder of 10-20% by weight, based on the solids content of the mash, were used (EP-A 744214). If the mash is applied to the carrier without organic binders, coating temperatures above 150 ° C are an advantage.
- the usable coating temperatures are between 50 and 450 ° C., depending on the binder used (DE 2106796).
- the applied binders burn out within a short time after the catalyst has been filled into the reactor and the reactor has been started up.
- the addition of binder also has the advantage that the active composition adheres well to the support, so that the transportation and filling of the catalyst are made easier.
- the layer containing catalytically active metal oxides is applied in the form to a support material which is first prepared from a solution and / or a suspension of the catalytically active metal oxides and / or their precursor compounds, if appropriate in the presence of auxiliaries for the preparation of the catalyst, which then applied in the form of a shell for the catalyst preparation, if appropriate after preceding conditioning and if appropriate after heat treatment to produce the catalytically active metal oxides, and the support coated in this way is subjected to a heat treatment to produce the catalytically active metal oxides or a treatment for removing volatile constituents .
- the catalysts are first introduced into the reaction tubes of the reactor, which are brought up to the reaction temperature from the outside, for example by means of salt melts. are thermostatted, filled. The reaction gas is passed over the catalyst bed prepared in this way.
- the reaction gas supplied to the catalyst is generally generated by mixing a molecular oxygen-containing gas, which in addition to oxygen may also contain suitable reaction moderators and / or diluents, such as steam, carbon dioxide and / or nitrogen, with the aromatic hydrocarbon to be oxidized, whereby that contains the molecular oxygen
- 10 gas generally 1 to 100, preferably 2 to 50 and particularly preferably 10 to 30 mol% of oxygen, 0 to 30 mol%, preferably 0 to 10 mol% of water vapor and 0 to 50 mol%, preferably 0 to 1 mol% carbon dioxide, balance nitrogen.
- this is the molecular
- Gases containing 15 kular oxygen are generally charged with 30 to 150 g per Nm 3 of gas of the aromatic hydrocarbon to be oxidized.
- the o-xylene / naphthalene mixture to be oxidized can be used in a broad mixture ratio, for example in a weight ratio of 1:99 to 99: 1, but in particular in such a ratio that the o-xylene content is at least 30, preferably at least 50 and is in particular at least 70% by weight.
- the ratio of o-xylene / naphthalene can remain constant over the catalyst life or can also be changed.
- the content of o-xylene can advantageously be increased over time and a higher yield can thereby be achieved.
- the reaction is carried out at temperatures of generally from 300 to 30 450, preferably from 320 to 420 and particularly preferably from 340 to 400 ° C. and at an excess pressure of generally 0.1 to 2.5, preferably from 0.3 to 1, 5 bar with a space velocity of generally 750 to 500 h " 1 .
- Torschale consisted of 0.15 wt .-% phosphorus (calculated as P), 7.5 wt .-% vanadium (calculated as V 2 Os), 3.2 wt .-% antimony (calculated as Sb 2 0 3 ), 0.05% by weight of cesium (calculated as Cs) and 89.1% by weight of titanium dioxide.
- catalytically active composition applied in this way i.e. the catalyst shell, consisted of 0.15% by weight of phosphorus (calculated as P), 7.5% by weight of vanadium (calculated as V 2 Os), 3.2% by weight. -% anti mon (calculated as Sb 2 0 3 ), 0.1% by weight cesium (calculated as Cs) and 89.05% by weight titanium dioxide.
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- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
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Abstract
Description
Claims
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000550840A JP2002516320A (ja) | 1998-05-26 | 1999-05-10 | o−キシレン/ナフタレン混合物の接触気相酸化による無水フタル酸の製法 |
DE59904460T DE59904460D1 (de) | 1998-05-26 | 1999-05-10 | Verfahren zur herstellung von phthalsäureanhydrid durch katalytische gasphasenoxidation von o-xylol/naphthalin-gemischen |
US09/700,427 US6362345B1 (en) | 1998-05-26 | 1999-05-10 | Method for producing phthalic anhydride by means of catalytic vapor-phase oxidation of o-xylol/naphthalene mixtures |
KR1020007013284A KR20010043832A (ko) | 1998-05-26 | 1999-05-10 | o-크실렌/나프탈렌 혼합물의 기상 촉매접촉 산화를 통한프탈산 무수물의 제조 방법 |
EP99924921A EP1082317B1 (de) | 1998-05-26 | 1999-05-10 | Verfahren zur herstellung von phthalsäureanhydrid durch katalytische gasphasenoxidation von o-xylol/naphthalin-gemischen |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19823275A DE19823275A1 (de) | 1998-05-26 | 1998-05-26 | Verfahren zur Herstellung von Phthalsäureanhydrid durch katalytische Gasphasenoxidation von x-Xylol-/-Naphthalin-Gemischen |
DE19823275.6 | 1998-05-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1999061434A1 true WO1999061434A1 (de) | 1999-12-02 |
Family
ID=7868827
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP1999/003192 WO1999061434A1 (de) | 1998-05-26 | 1999-05-10 | Verfahren zur herstellung von phthalsäureanhydrid durch katalytische gasphasenoxidation von o-xylol/naphthalin-gemischen |
Country Status (9)
Country | Link |
---|---|
US (1) | US6362345B1 (de) |
EP (1) | EP1082317B1 (de) |
JP (1) | JP2002516320A (de) |
KR (1) | KR20010043832A (de) |
CN (1) | CN1302294A (de) |
DE (2) | DE19823275A1 (de) |
ID (1) | ID26586A (de) |
TW (1) | TW487705B (de) |
WO (1) | WO1999061434A1 (de) |
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DE19839001A1 (de) * | 1998-08-27 | 2000-03-02 | Basf Ag | Schalenkatalysatoren für die katalytische Gasphasenoxidation von aromatischen Kohlenwasserstoffen |
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CN102008971B (zh) * | 2010-10-19 | 2012-08-29 | 黑龙江省科学院石油化学研究院 | 均苯四甲酸二酐催化剂的制备方法 |
US9029289B2 (en) | 2012-07-16 | 2015-05-12 | Basf Se | Catalyst for preparing carboxylic acids and/or carboxylic anhydrides |
CN104487164A (zh) * | 2012-07-16 | 2015-04-01 | 巴斯夫欧洲公司 | 制备羧酸和/或羧酸酐的催化剂 |
DE102013000654B4 (de) | 2013-01-16 | 2020-10-15 | Clariant International Ltd. | Verfahren zur Optimierung der Aktivität eines Phthalsäureanhydrid-Katalysators |
DE102013000647A1 (de) | 2013-01-16 | 2014-07-17 | Clariant International Ltd. | Verfahren zur Optimierung von Lagenlängen eines Phthalsäureanhydrid-Katalysators |
DE102013000648A1 (de) | 2013-01-16 | 2014-07-17 | Clariant International Ltd. | Verfahren zur Optimierung der Aktivmassenbeladung eines Phthalsäureanhydrid-Katalysators |
EP3047904A1 (de) | 2015-01-22 | 2016-07-27 | Basf Se | Katalysatorsystem zur Oxidierung von O-Xylen und/oder Naphthalen zu Phthalsäureanhydrid |
CN112642454A (zh) * | 2019-10-12 | 2021-04-13 | 中国石油化工股份有限公司 | 一种邻二甲苯氧化制苯酐的催化剂及其制备方法 |
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- 1998-05-26 DE DE19823275A patent/DE19823275A1/de not_active Withdrawn
-
1999
- 1999-05-10 WO PCT/EP1999/003192 patent/WO1999061434A1/de not_active Application Discontinuation
- 1999-05-10 CN CN99806515A patent/CN1302294A/zh active Pending
- 1999-05-10 ID IDW20002423A patent/ID26586A/id unknown
- 1999-05-10 KR KR1020007013284A patent/KR20010043832A/ko not_active Application Discontinuation
- 1999-05-10 EP EP99924921A patent/EP1082317B1/de not_active Expired - Lifetime
- 1999-05-10 US US09/700,427 patent/US6362345B1/en not_active Expired - Fee Related
- 1999-05-10 JP JP2000550840A patent/JP2002516320A/ja not_active Withdrawn
- 1999-05-10 DE DE59904460T patent/DE59904460D1/de not_active Expired - Lifetime
- 1999-05-26 TW TW088108631A patent/TW487705B/zh not_active IP Right Cessation
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015162227A1 (de) | 2014-04-24 | 2015-10-29 | Clariant International Ltd | Katalysatoranordnung mit optimiertem lückengrad zur herstellung von phthalsäureanhydrid |
WO2015162230A1 (de) | 2014-04-24 | 2015-10-29 | Clariant International Ltd | Katalysatoranordnung mit optimierter oberfläche zur herstellung von phthalsäureanhydrid |
DE102014005939A1 (de) | 2014-04-24 | 2015-10-29 | Clariant International Ltd. | Katalysatoranordnung mit optimierter Oberfläche zur Herstellung von Phthalsäureanhydrid |
US10155713B2 (en) | 2014-04-24 | 2018-12-18 | Clariant International Ltd. | Catalyst arrangement with optimized void fraction for the production of phthalic acid anhydride |
US10227319B2 (en) | 2014-04-24 | 2019-03-12 | Clariant International Ltd. | Catalytic converter arrangement with optimized surface for producing phthalic anhydride |
Also Published As
Publication number | Publication date |
---|---|
JP2002516320A (ja) | 2002-06-04 |
DE19823275A1 (de) | 1999-12-02 |
TW487705B (en) | 2002-05-21 |
US6362345B1 (en) | 2002-03-26 |
ID26586A (id) | 2001-01-18 |
DE59904460D1 (de) | 2003-04-10 |
CN1302294A (zh) | 2001-07-04 |
KR20010043832A (ko) | 2001-05-25 |
EP1082317A1 (de) | 2001-03-14 |
EP1082317B1 (de) | 2003-03-05 |
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