WO1999060625A1 - Procede et appareil pour le transport de plaquettes, systeme d'exposition, micro dispositif et banque de reticules - Google Patents

Procede et appareil pour le transport de plaquettes, systeme d'exposition, micro dispositif et banque de reticules Download PDF

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Publication number
WO1999060625A1
WO1999060625A1 PCT/JP1999/002538 JP9902538W WO9960625A1 WO 1999060625 A1 WO1999060625 A1 WO 1999060625A1 JP 9902538 W JP9902538 W JP 9902538W WO 9960625 A1 WO9960625 A1 WO 9960625A1
Authority
WO
WIPO (PCT)
Prior art keywords
reticle
substrate
case
opening
transfer
Prior art date
Application number
PCT/JP1999/002538
Other languages
English (en)
Japanese (ja)
Inventor
Kanefumi Nakahara
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Priority to AU37312/99A priority Critical patent/AU3731299A/en
Publication of WO1999060625A1 publication Critical patent/WO1999060625A1/fr

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/7075—Handling workpieces outside exposure position, e.g. SMIF box
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67769—Storage means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
    • H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers

Definitions

  • Substrate transfer device substrate transfer method, exposure device and ( , and
  • the present invention relates to a substrate transfer apparatus and a substrate transfer method for transferring a substrate, an exposure apparatus for performing an exposure process using a substrate transferred by the substrate transfer apparatus, a microphone port device onto which a pattern is transferred by the exposure apparatus, And a reticle library for storing reticles.
  • an exposure apparatus is often used to form a circuit pattern on a surface of a micro device such as a semiconductor element, for example, a semiconductor wafer (hereinafter, referred to as a wafer).
  • a so-called stepper which mainly sequentially projects and transfers a pattern onto a plurality of exposure regions of a wafer by moving the wafer in a step-and-repeat manner, has been mainstream.
  • a transfer step of printing a pattern while exchanging a reticle (mask) on one wafer is usually performed several times to several tens of times.
  • a plurality of reticles used at the time of exposure are preliminarily stored in a reticle library having a plurality of slots in the vertical direction, which is provided in or near the exposure apparatus, and then taken out of each slot by the transfer device, and the reticle stage is taken out.
  • the reticle is housed in each slot of the reticle library in a state of being housed in a reticle case (substrate case) to prevent adhesion of dust and the like, and is taken out of the reticle case by a transfer device. Being transported.
  • a reticle case containing the above reticle is loaded and unloaded by an operator.
  • the size of the reticle is expected to increase from the conventional 5-inch to 6-inch to about 9-inch.
  • the weight of the reticle case, including the reticle is about three times that of the conventional one, and is about 2 kg.
  • the reticle case is directly loaded and unloaded into the higher slot in the reticle library. Is difficult to do.
  • a reticle transport device has been developed and provided in which an operator loads and unloads a reticle case to and from a specific slot at a relatively low position, and a transport system transports a reticle case from the reticle case to a predetermined slot.
  • FIGS. 14 and 15 show an example of a conventional reticle transport device.
  • the reticle transport device 1 is provided in the exposure device 2 and includes a reticle library 3 and a transport system 4.
  • the reticle library 3 is disposed opposite to a door 5 provided on the front of the exposure apparatus 2, and a slot 7 for accommodating a reticle case 6 is provided inside the reticle library 6, as shown in FIG. More than one is provided.
  • the slot 7 is open on the side facing the side facing the door 5. Further, the slot 7 a located at the lowermost end has an open surface facing the door 5. Then, the operator 8 opens the door 5 and loads the reticle case 6 into the slot 7a through the opening 2a.
  • the transport system 4 includes a case transport system 9 and a reticle transport system 10.
  • the case transport system 9 includes a suction arm 12 for sucking a negative pressure and a vertical drive system 11. Then, the reticle case 6 loaded in the slot 7a is sucked and taken out by the suction arm 12, and is moved up by the vertical drive system 11 and stored in the upper slot 7.
  • the case transport system 9 takes out the designated reticle case 6 from the reticle library 3, rotates it by 180 °, and transports it to the reticle removal position 13.
  • the arm 10 a of the reticle transport system 10 moves up and down the vertical drive system 15, and the reticle case 6 Substrate) Take out R and transport it to standby position 17 on the side of exposure apparatus main body 16.
  • the reticle R on the standby position 17 is transported to the reticle stage 19 by a reticle transport system 18 which is vertically movable and rotatable.
  • a reticle transport system 18 which is vertically movable and rotatable.
  • the direction in which the reticle transport system 10 takes out the reticle R from the reticle case 6 and the direction in which the case transport system 9 takes out the reticle case 6 from the reticle library 3 are set to be the same. Therefore, it is necessary to provide a reticle take-out position 13 between these two transfer systems 9 and 10. Therefore, the reticle transport system 10 takes out the reticle R after the case transport system 9 takes out the reticle case 6 from the reticle library 3 and transports it to the reticle removal position 13, so that the transport time is long. As a result, there has been a problem that IC production efficiency is reduced. In the reticle transport device 1, the occupied area of the two transport systems 9, 10 having the reticle take-out position 13 is increased.
  • the present invention has been made in consideration of the above points, and provides a substrate transfer apparatus, a substrate transfer method, an exposure apparatus, and a reticle library that have a small occupied area and a short time for transferring a substrate. The purpose is to do. Another object of the present invention is to provide a microdevice with high manufacturing efficiency. DISCLOSURE OF THE INVENTION.
  • a substrate transfer device includes a substrate storage means (24, 24a and 57) for storing a substrate (R), and a substrate storage means (24, 24a and 57).
  • a substrate transport device (22) provided with transport means (25, 26) for transporting the substrate (R) between the device (7) and the device (16) using the substrate (R), Receiving and receiving substrates (R) in multiple directions in substrate storage means (24, 24a and 57)
  • the solution was to form openings (30, 31 and 63, 64) for handover.
  • each of the transfer means (25, 26) is provided through the openings (30, 31 and 63, 64) formed in a plurality of directions of the substrate storage means.
  • the substrate (R) can be carried in and out of the substrate storage means (24, 24a and 57). Therefore, when the substrate (R) is stored in the case (6) and transferred, one of the transfer means (25) transfers the case (6) through the opening (31 and 63), and The transfer system (26) can take out the substrate (R) from the case (6) through the openings (30 and 64).
  • the substrate transfer method of the present invention includes a method of transferring a substrate (R) between substrate storage means (24, 24a, 57) for storing a substrate (R) and an apparatus (16) using the substrate (R).
  • the solution is to receive and transfer the substrate (R) to and from the substrate storage means (24, 24a, 57) in a plurality of directions. Therefore, in the substrate transport method of the present invention, when the substrate (R) is stored in the case (6) and transported, the case (6) is transported from one direction, and the substrate (R) from the case (6) is transported. Can be taken from another direction.
  • the exposure apparatus of the present invention includes: an exposure apparatus main body (16) for transferring a pattern of a mask (R) held on a mask stage (19) to a photosensitive member held on a photosensitive member stage; A substrate transport device (22) that accommodates at least one of the photosensitive members and transports the photosensitive member to and from the exposure device main body (16).
  • the solution is to use the substrate transfer device (22) described in the first section.
  • the transfer means (25, 26) Respectively transfer the substrate (R) to the substrate storage means (24, 24a and 57) through openings (30, 31 and 63, 64) formed in a plurality of directions of the substrate storage means. It can be loaded and unloaded. Therefore, when the substrate (R) is stored in the case (6) and transferred, one of the transfer means (25) transfers the case (6) through the openings (31 and 63), The transfer system (26) can take out the substrate (R) from the case (6) through the openings (30 and 64).
  • the micro device of the present invention is a microphone opening device manufactured through a transfer step of transferring a pattern of a mask (R) onto a photosensitive member, and the exposure apparatus (2) according to claim 9. 0) to perform the transfer step. Therefore, in the micro device of the present invention, the transfer step in manufacturing the micro device can be performed by transferring the pattern of the mask (R) to the photosensitive member using the exposure apparatus (20).
  • the opening (30, 40) for receiving and transferring the reticle (R) in a plurality of directions. 3 1) was adopted as the solution.
  • the substrate (R) can be loaded and unloaded through the openings (30, 31) facing in different directions. Therefore, when the substrate (R) is stored in the case (6) and transported, the case (6) can be loaded and unloaded through one of the openings (31), and the case (6) can be transported.
  • the substrate (R) in) can be carried in and out through another opening (30).
  • FIG. 1 is a diagram showing a first embodiment of the present invention, and is a plan view in which a case transport robot and a reticle transport robot are provided to face an opening of a reticle library.
  • FIG. 2 is a front view of a reticle library constituting the reticle transport device of the present invention.
  • FIG. 3 is a front sectional view of FIG.
  • FIG. 4 is a view showing a second embodiment of the present invention, and is a plan view in which a reticle library is added and a left and right driving mechanism is mounted on a reticle transport pot.
  • FIG. 5 is a view showing a third embodiment of the present invention, and is a plan view in which a reticle library is provided side by side, and a left and right driving mechanism is mounted on a reticle transport robot.
  • FIG. 6 is a cross-sectional view of a reticle stored in a SMIF-type reticle case.
  • FIG. 7 is a view showing a fourth embodiment of the present invention, and is a plan view of an exposure apparatus provided with a case transfer robot, a reticle transfer robot, and a storage separation unit. is there.
  • FIG. 8 is a front view of a reticle library constituting the reticle transport device of the present invention.
  • FIG. 9 is a front sectional view of FIG.
  • FIG. 10 is a rear view of the storage separation unit constituting the exposure apparatus of the present invention.
  • FIG. 11 is a plan view showing the internal structure of the storage / separation unit.
  • FIG. 12 is a view showing a fifth embodiment of the present invention, and is a front view of a reticle library provided with a storage separation unit.
  • FIG. 13 is a plan view in which a case transfer robot and a reticle transfer robot are arranged so as to face the reticle library.
  • FIG. 14 is a plan sectional view showing an example of a reticle transport device according to the related art.
  • FIG. 15 is a front sectional view of FIG. BEST MODE FOR CARRYING OUT THE INVENTION
  • FIG. 1 to FIG. an example will be described in which a reticle is transported as a substrate in an exposure apparatus, and a pattern of the reticle is transferred to a wafer for manufacturing a semiconductor device (microphone device).
  • a semiconductor device microphone device
  • reference numeral 20 denotes an exposure apparatus.
  • the exposure apparatus 20 includes a reticle transfer apparatus (substrate transfer apparatus) 22, a foreign substance inspection apparatus 27, and an exposure apparatus main body (apparatus) 16 in the chamber 21.
  • a door 5 for opening and closing the opening 23 is provided in the center of the front of the chamber 21 facing the operating room 8.
  • the reticle transport device 22 transports the reticle R to the exposure apparatus main body 16 side.
  • the reticle library (substrate cassette) 6 stores a reticle case (substrate cassette) 6 in which a substantially square reticle R is stored.
  • the reticle library 24, the reticle transport port pot 26, and the exposure apparatus main body 16 are arranged so as to be sequentially arranged in the front center of the exposure apparatus 20.
  • the direction in which the reticle library 24, the reticle transport robot 26, and the exposure apparatus body 16 are arranged is the X direction
  • the direction orthogonal to the X direction in the horizontal plane is the Y direction
  • the vertical direction is the Z direction. It will be described as.
  • the reticle case 6 has projections 6a and 6b on both sides, and a front door 14 on the front side (+ X side in FIG. 1).
  • the reticle case 6 has projections 6a and 6b.
  • (Y direction in Fig. 1) Force is longer than the front and rear direction (X direction in Fig. 1) where front door 14 is provided.
  • the front door 14 is openable and closable by a hinge method with its upper edge side as an opening / closing axis. Both ends in the length direction (Y direction) of the front door 14 are set to protrude from the reticle case 6.
  • a bar code 42 for identifying the reticle case 6 is attached to a rear end surface of the reticle case 6.
  • the reticle library 24 has a pair of support shelves 28 a and 28 that position and support the projections 6 a and 6 b of the reticle case 6 from the left and right sides when viewed from the front.
  • a plurality of b are provided at predetermined intervals in the up-down direction (Z direction).
  • slots 29-29 for accommodating the reticle case 6 are formed.
  • a notch 32 is formed at the center of each support shelf 28b located on the right side (lower side in FIG. 1) of the reticle library 24.
  • the lower two tiers are the case setting positions S 1 and S 2 by the operator 8, which open toward the front side and have the opening 2 3 It is arranged so that it may face.
  • the upper slots 29-29 from the case setting positions SI and S2 are used as stock positions S3 where the reticle case 6 is stocked. There may be any number of slots 29-29 in these stock positions S3 as long as the space allows.
  • each opening 30 is in the horizontal direction of the reticle case 6. Is formed in a rectangular shape having a size corresponding to the length of.
  • the openings 3 1 that open toward the slots 29 to 29, respectively. are formed.
  • Each opening 31 is formed in a size different from that of the opening 30.
  • each opening 3 1 has a length in the front-rear direction (X direction) of the reticle case 6, a thickness of the reticle case 6, and a stroke for detaching the reticle case 6 from the supporting shelves 28 a and 28 b. It is formed in a rectangular shape having a height corresponding to the height.
  • the slots 29 and 29 of the case set positions S l and S 2 face the opening 23 of the chamber 21, and the openings 52 and 29 set to the same size as the opening 30. 5 2 are formed.
  • a front door opening / closing unit 33 is attached to the left rear (+ Y) side of the reticle library 24. The front door opening / closing unit 33 opens and closes the front door 14 of the reticle case 6, and the front door opening / closing unit 33 is a slot.
  • It comprises a vertical drive mechanism 34 for moving up and down along 29-29, and an opening and closing pin 36 rotating around the axis of the rotating shaft 35.
  • the case transfer robot 25 is disposed so as to face the opening 31 of the reticle library 24, and receives and transfers the reticle case 6 between the slots 29 to 29. Moving part that moves up and down along 2 9 2 9
  • the rotating unit 39 rotates along a horizontal plane around the center of the moving unit 38.
  • the rotating section 40 is provided at the tip of the rotating section 39 so as to be rotatable along a horizontal plane.
  • the suction arm 41 is rotatably provided at the tip of the rotating section 40, and is movable in a direction approaching to and away from the reticle library 24 by combining the rotation angles of the rotating sections 39, 40. It has a configuration. Further, the suction arm 41 is configured to vacuum-suction the reticle case 6 on the upper surface of the tip. On the other hand, near the front side of the case transfer robot 25, a bar code attached to the reticle case 6 is attached.
  • a bar code reader 43 for reading 42 is provided.
  • the reticle transport robot 26 is arranged to face the opening 30 of the reticle library 24, and receives and delivers the reticle R to and from the reticle case 6 stored in the slots 29-29.
  • Slot 2 9 It comprises a moving part 45 that moves up and down along 29, rotating parts 46 and 47, and a suction arm 48.
  • the rotating section 46 rotates along a horizontal plane around the center of the moving section 45.
  • the rotating section 47 is provided at the tip of the rotating section 46 so as to be rotatable along a horizontal plane.
  • the suction arm 48 has a U-shape in a plan view, is rotatably provided at the tip of the rotating unit 46, and approaches the reticle library 24 by combining the rotation angles of the rotating units 46 and 47. It is configured to be movable in the separating direction and in the direction approaching and separating from the exposure apparatus main body 16 side. Further, the suction arm 48 is configured to vacuum-adsorb the reticle R on the upper surfaces of the parallel arm tips.
  • a foreign matter inspection device 27 for detecting foreign matter (dust, particles, etc.) attached to the reticle R is arranged on the left side of the reticle transfer port pot 26, a foreign matter inspection device 27 for detecting foreign matter (dust, particles, etc.) attached to the reticle R is arranged.
  • the foreign object inspection device 27 scans the reticle R adsorbed and conveyed by the suction arm 48 on the lower surface side where the circuit pattern is formed, and detects reflected scattered light. Is used to inspect the presence or absence of foreign matter on the reticle R.
  • the foreign object inspection device 27 can also detect foreign matter on the surface of the pellicle film provided on the reticle R and the upper surface (non-pattern surface) of the reticle R in order to prevent the pattern surface of the reticle R from dust.
  • the exposure apparatus main body 16 transfers the pattern of the reticle R onto a wafer (photosensitive member) (not shown).
  • the exposure apparatus main body 16 includes a reticle transport rotation arm unit 18 and a reticle holding the reticle R.
  • a stage (mask stage) 19 and an illumination optical system (not shown), a projection optical system, and a wafer table (photosensitive member stage) for holding and moving the wafer are provided.
  • the reticle transport rotation arm unit 18 transports the reticle R transported to the standby position 17 onto the reticle stage 19, and is movable up and down and rotatable.
  • the reticle transport rotation arm unit 18 has a U-shape in plan view, and suction arms 49, 49 for vacuum suction on the lower surface are linearly arranged in a direction away from each other. I have.
  • Opera 8 opens the door 5
  • the reticle case 6 containing the reticle R is loaded from the opening 23 of the chamber 21 through the opening 52 of the reticle library 24.
  • the reticle case 6 has its projections 6 a and 613 supported by the support shelves 28 & 28 b and the slot at the case set position S 1 of the reticle library 24.
  • the reticle case 6 may be loaded at the case setting position S2 or at both the case setting positions S1 and S2 when two reticle cases 6 are loaded.
  • the moving section 38 of the case transport robot 25 is lowered by the lifting mechanism 37, and the suction arm 41 faces the reticle case 6 at the case setting position S1.
  • the suction arm 41 is set so that the upper surface thereof is slightly lower than the lower surface of the reticle case 6.
  • the rotating units 39 and 40 rotate, the suction arm 41 moves in a direction approaching the reticle library 24 and enters the slot 29 from the notch 32.
  • the elevating mechanism 37 is raised, the reticle case 6 is vacuum-sucked by the suction arm 41 and moves to a position facing the opening 31.
  • the suction arm 41 moves in a direction away from the reticle library 24 and the reticle case 6 moves the reticle through the opening 31. Removed from library 24.
  • the suction arm 41 stops at a position where the barcode 42 attached to the reticle case 6 faces the barcode reader 43.
  • the barcode reader 43 reads the barcode 42 and checks whether the reticle case 6 is a predetermined one. If the collation result is not as specified, for example, an alarm is issued and the transport of the reticle case 6 is stopped.
  • the elevating mechanism 37 moves up to move the reticle case 6 to a position facing the opening 31 of the designated slot 29 at the stock position S3. Then, the rotating units 39 and 40 rotate again, and the suction arm 41 moves in the direction approaching the reticle library 24, so that the reticle case 6 has the opening 3 1 as shown in FIG. To reach the predetermined slot 29 at the stock position S3.
  • the elevating mechanism 37 descends a little, and the suction arm 41 releases the suction, the reticle case 6 has the protrusions 6a and 6b. It is supported by the supporting shelves 28a and 28b, and is loaded while being positioned in the slot 29 of the stock position S3 of the reticle library 24.
  • the front door opening / closing unit 33 is raised, for example, by the vertical drive mechanism 34, and the opening / closing pin 36 is positioned behind the front door 14 projecting from the reticle case 6, as shown in FIG. .
  • the rotation shaft 35 rotates around the axis
  • the opening / closing pin 36 rotates counterclockwise, for example, when viewed from below in FIG.
  • the opening / closing pin 36 contacts the lower rear end of the front door 14 to rotate the front door 14 about the opening / closing axis to open it.
  • the moving section 45 of the reticle transport robot 26 is moved by the lifting mechanism 44, and the suction arm 48 faces the reticle case 6 at the stock position S3.
  • the suction arm 48 is set so that the upper surface thereof is slightly lower than the lower surface of the reticle R stored in the reticle case 6.
  • the movement of the suction arm 48 by the lifting mechanism 44 may be performed simultaneously with the operation of the front door opening / closing unit 33.
  • the suction arm 48 moves in a direction approaching the reticle library 24 and enters the reticle case 6 from the opening 30.
  • the reticle R is vacuum-adsorbed to the suction arm 48 by raising the lifting mechanism 44.
  • the suction arm 48 moves in a direction away from the reticle library 24, and as shown in FIG. It is carried out of the reticle library 24 through the opening 30 while being sucked on the upper surface of the suction arm 48.
  • the suction arm 48 positions the reticle R inside the foreign matter inspection device 27.
  • the foreign matter inspection device 27 scans the reticle R from the lower surface side (or the upper surface side as necessary) and detects the reflected scattered light to detect dust on the reticle R or the pellicle film. Inspect for presence.
  • the rotating units 46 and 47 rotate, and the suction arm 48 rotates so that the reticle R faces the standby position 17 of the exposure apparatus main body 16.
  • the reticle R moves so as to be higher than the standby position 17 by moving the elevating mechanism 44.
  • the rotating parts 46 and 47 rotate again to move the suction arm 48 to the standby position 17. Move in the approaching direction.
  • the rotation of the rotating units 46 and 47 stops, and the elevating mechanism 44 descends to place the reticle R at the standby position 17.
  • the vacuum suction of the suction arm 48 is released, and the reticle R is released from the suction arm 48.
  • the suction arms 49 and 49 of the reticle transfer rotation arm unit 18 may hinder the transfer of the reticle R by the suction arm 48 because the reticle transfer rotation arm unit 18 is raised. There is no.
  • the reticle transport rotation arm unit 18 descends, and the suction arm 49 sucks the reticle R on the lower surface side. Then, the reticle transport rotation arm unit 18 rises again and rotates 180 °, so that the reticle R is positioned above the reticle stage 19. Here, the reticle transport rotation arm unit 18 is lowered, and the vacuum suction of the suction arm 49 is released, so that the reticle R is transported to the reticle stage 19 and set.
  • the reticle transport rotation arm unit 18 is lowered, and at the same time one suction arm 49 picks up the reticle R on the standby position 17, The other suction arm 49 sucks the reticle on reticle stage 19.
  • the reticle transport rotary arm unit 18 rotates and then descends to set the reticle R on the reticle stage 19, the used reticle is placed at the standby position 17 at the same time.
  • the reticle is transported toward the reticle library 24 by the reticle transport robot 26 and stored in a predetermined reticle case 6 in which the front door 14 has been opened by the front door opening / closing unit 33 in advance.
  • the image of the circuit pattern of the reticle R illuminated by the illumination optical system is projected onto an exposure area of the wafer located on the wafer table via the projection optical system.
  • the wafer is sent to a developing process.
  • the reticle R that has been exposed is conveyed by the operation reverse to the above, and stored in the reticle case 6 located at the stock position S 3 of the reticle library 24.
  • the rotation shaft 35 of the front door opening / closing unit 33 rotates in the opposite direction to the above, so that the front door 14 of the opening / closing pin 36 is attached.
  • the abutment is released and the front door 14 is closed.
  • the case transfer port pot 25 transfers the reticle case 6 at the stock position S3 of the reticle library 24 to the case setting position S2 by an operation reverse to the above.
  • the bar code reader 43 reads the bar code 42 affixed to the reticle case 6 and checks whether the reticle case 6 is specified.
  • the case setting position may be set to one, and the loading and unloading of the reticle case 6 may also be performed here.
  • the reticle case 6 transported to the case set position S2 is collected again by the operator 8 through the opening 23.
  • the reticle transfer robot 26 and the case transfer robot 25 can be arranged to face these openings 30 and 31 respectively. Therefore, the case transfer robot 25 transfers the reticle case 6 through the opening 31 of the reticle library 24, and the reticle transfer robot 26 transfers the reticle R from the reticle library 24 through the opening 30.
  • the reticle R can be directly taken out and transported, and the time required for transporting the reticle R to the exposure apparatus main body 16 can be shortened.
  • the above-described substrate transfer device and reticle library there is no need to separately provide a reticle take-out position for transferring the reticle R to the reticle transfer robot 26 from the case transfer robot 25.
  • the occupied area of the reticle transfer device 22 can be reduced. Therefore, the installation area of the exposure apparatus 20 in the clean room can be reduced.
  • a bar code reader 43 for reading the bar code 42 attached to the reticle case 6 is provided near the case transfer robot 25. It is possible to check whether the reticle case 6 conveyed by the robot 25 is a predetermined one, and therefore, it is possible to surely convey the predetermined reticle R to the exposure apparatus main body 16. In addition, the management of the slots 2 9 ••• 29 and the reticle case 6 stored in them, that is, the reticle R Can also be easily performed.
  • FIG. 4 is a diagram showing a second embodiment of the substrate transfer apparatus, the exposure apparatus, and the reticle library according to the present invention.
  • the same elements as those of the first embodiment shown in FIGS. 1 to 3 are denoted by the same reference numerals, and description thereof will be omitted.
  • the difference between the second embodiment and the first embodiment is the configuration of the reticle library and the reticle transport robot.
  • reticle library 24 is arranged at a position shifted from the center of exposure apparatus 20.
  • a reticle library 24 a having the same configuration as the reticle library 24 has an opening 31 through the case transport robot 25. It is being expanded toward. All slots of the reticle library 24a are in the stock position. Further, the reticle library 24 a is not provided with a front door opening / closing unit 33.
  • the reticle transfer port pot 26 is provided with a left-right drive mechanism 51.
  • the left / right drive mechanism 51 can freely move the reticle transport robot 26 in the left / right direction when viewed from the front, that is, between a position facing the reticle library 24 and a position facing the standby position 17. It is something to move. Although the foreign matter inspection device is not shown in the figure, it is arranged on the left side of the reticle library 24. This balances the arrangement of the case transfer robot 25 and the reticle library 24a on the right side. Other configurations are the same as those in the first embodiment.
  • the case transport robot when transporting the reticle case 6 loaded in the slot 29 at the case setting position S1 of the reticle library 24 to the reticle library 24a, first, the case transport robot The suction arm 41 of 25 sucks the reticle case 6 and carries it out of the reticle library 24 through the opening 31. Next, by moving the suction arm 41 toward the reticle library 24a after rotating the suction arm 41 by 180 °, the reticle case 6 is moved to the opening 3 1 of the reticle library 24a in the same manner as described above. It can be stored in the stock position via. Also, from the reticle library 24a to the reticle library 24 When the reticle case 6 is transported to the device, the reverse operation is performed.
  • the reticle transport robot 26 is moved by the left and right drive mechanism 51 to face the reticle library 24. Becomes Then, when the suction arm 48 takes out the reticle R from the reticle case 6 stored in the reticle library 24 via the opening 30, the left and right drive mechanism 51 is driven and the reticle transport robot 26 stands by. Move to position opposite position 17 Then, the suction arm 48 rotates by 180 ° and moves toward the standby position 17 to place the reticle R on the standby position 17.
  • the reticle libraries 24 and 24a include the case transfer robot 25. Since the reticle R is disposed between the reticle R and the reticle R, the number of reticle Rs to be stored can be increased without increasing the number of case transfer robots. In addition, even if the reticle library, J 24, is located at a position deviated from the center of the exposure apparatus 20 due to the installation environment, etc., the reticle transport robot 26 can be moved left and right using the left and right drive mechanism 51. By moving, reticle R stored in reticle library 24 can be smoothly transported to standby position 17.
  • FIG. 5 is a diagram showing a third embodiment of the substrate transfer device, the exposure device, and the reticle library of the present invention.
  • the difference between the third embodiment and the second embodiment is the configuration of the reticle library and the reticle transport robot. That is, in this embodiment, two reticle libraries 24 are arranged to face each other with the case transfer robot 25 interposed therebetween. Openings 23, 23 are provided on the opposite front sides of both reticle libraries 24, 24 of chamber bar 21, respectively. Further, the reticle transport robot 26 can be moved between the reticle libraries 24, 24 in the direction in which they are arranged by the left and right drive mechanism 51. Other configurations are the same as those of the second embodiment.
  • the additional reticle The reticle transfer robot 26 can directly take out the reticle R and transfer it to the standby position 17 instead of using the reticle library 24 simply for stock.
  • the reticle library 24 can be directly loaded with the reticle case 6 through the opening 23, so that when the number of reticle R used increases, various types of usage are selected. be able to.
  • the case transfer robot 25 and the reticle transfer robot 26 are not additionally provided, the above effects can be obtained without increasing the cost and the installation area.
  • the configuration is such that a robot or a rotating arm is used to transport the reticle R, but the present invention is not limited to this configuration.
  • the projections 6a and 6b are provided on the reticle case 6, and the positioning is performed with respect to the reticle library 24 by the projections 6a and 6b.
  • the present invention is not limited to this. It may be.
  • the openings 30 and 31 of the reticle library 24 do not need to be opened in the above-described direction.
  • the opening 31 is provided on the left side, and the case transfer robot 2 faces the opening 31. 5 may be arranged.
  • the foreign matter inspection device 27 does not need to be located on the side of the reticle transport robot 26, and may be arranged on the left side of the reticle library 24.
  • the reticle R has a substantially square shape.
  • the reticle R has a rectangular shape, such as a mask for a liquid crystal display device, or a so-called EB type exposure apparatus that transfers a pattern by a charged particle beam such as an electron beam. It may be circular like the membrane mask used.
  • the cassette for accommodating the mask may be set in a shape corresponding to the mask, and the openings 30 and 31 of the reticle library 24 may be formed in a shape and size corresponding to the cassette.
  • the sizes of the openings 30 and 31 are different.
  • the openings 30 and 31 may have the same shape and size depending on the shapes of the mask and the reticle. .
  • FIGS. 6 to 11 are views showing a fourth embodiment of the substrate transfer device, the exposure device, and the reticle library of the present invention.
  • the same elements as those of the first embodiment shown in FIGS. 1 to 3 are denoted by the same reference numerals, and description thereof will be omitted.
  • the difference between the fourth embodiment and the first embodiment is that
  • the reticle case uses a bottom-open type and the configuration of the reticle transport device.
  • the reticle case (substrate cassette) 53 shown in FIG. 6 is an SMI F (St and Mechanical Mechanical Interface Face) type case, and a cover (lid) having an opening at the bottom side. 54, a bottom plate (bottom) 55 attached to the cover 54 so that the opening can be opened and closed, and a holding shelf 56 disposed on the bottom plate 55.
  • the cover 54 can be locked and engaged with the bottom plate 55 by a lock mechanism (not shown).
  • a cover cord 42 is attached to one side of the cover 54.
  • the holding shelf 56 is provided with a single-stage shelf, into which the reticle R can be inserted and held.
  • a reticle case 53a capable of storing six reticles R is also used, as shown by a two-dot chain line in FIG.
  • the reticle case 53a has the same configuration as the reticle case 53, but the holding shelf of the reticle case 53a is provided with six-stage shelves so that the reticle R can be inserted and held in each shelf. . For this reason, the overall height of the reticle case 53 a is higher than that of the reticle case 53. Note that a reticle case for storing other numbers of reticles may be used.
  • the reticle transfer device 22 is arranged so as to face the reticle library 24, the case transfer robot 25, the reticle transfer robot 26, and both the case transfer robot 25 and the reticle transfer robot 26.
  • the storage separation unit 57 is mainly used.
  • the support shelves 28a and 28b of the reticle library 24 position the reticle case 53 from both left and right sides.
  • the reticle library 24 of the present embodiment is not provided with an opening that opens on the reticle transport port 26 side (+ X side).
  • the storage separation unit 57 corresponds to the substrate storage means described in the claims.
  • FIG. 10 is a front view of the storage / separation unit 57 viewed from the reticle transport robot 26 side.
  • the storage separation unit On the upper surface 57, a mounting portion 58 for receiving and holding the reticle case 53 is provided on the upper surface, and a space 62 below the mounting portion 58 is provided.
  • the mounting portion 58 holds the reticle case 53 in an exposed state so as to open at least the X side of the reticle case 53 on the side of the case transfer robot 25 (for convenience, this opening is opened. Part 6 3).
  • the mounting portion 58 has an opening 59 for accommodating the bottom plate 55 and the holding shelf 56 in the space 62.
  • the mounting portion 58 has a mechanism (not shown) for unlocking the cover 54 and the bottom plate 55 of the reticle case 53 attached here.
  • a groove 68 extending in the X direction and opening on the X side is formed on the upper surface of the mounting portion 58 to be slightly larger than the width and thickness of the suction arm 41.
  • the storage / separation unit 57 is provided with a vertical moving mechanism (moving mechanism) 60 including a ball screw 60a, a ball nut 60b, and the like.
  • the bottom plate 5 5 and the holding shelf 56 released from the lock with the support 4 can be moved up and down in the space 62 by being supported by the movable plate 61. At this time, the cover 54 is left attached to the attachment portion 58.
  • a discriminating sensor 65 is provided.
  • the discrimination sensor 65 has an irradiation system for irradiating the detection light and a light receiving system for detecting the reflected light.
  • the irradiation system irradiates the end surface of the reticle R with the detection light obliquely from the irradiation system, and this end surface The reflected light is received by the light receiving system.
  • the discrimination sensor 65 is disposed at a position facing the holding shelf 56 that moves in the space 62 by the vertical movement mechanism 60, and as described above, the reticle R received and held by the holding shelf 56.
  • the detection light is irradiated to the front end face of the storage shelf 56 to detect the presence or absence of the reticle R on the holding shelf 56.
  • the discriminating sensor 65 is disposed in the middle of the moving path of the holding shelf 56, and when the holding shelf 56 is completely moved down by the vertical movement mechanism 60 (the position shown in FIG. 10). ),
  • the discrimination sensor 65 is located above the holding shelf 56, and the opening 64 on the front side (+ Y side) of the holding shelf 56 is completely opened.
  • the presence or absence of a reticle is determined for each shelf on the holding shelf based on the Z-direction position of the vertical movement mechanism 60 and the detection result of the discrimination sensor 65. Can be determined You.
  • a size detection sensor including a light emitter 66 and a light receiver 67 is provided above the storage separation unit 57.
  • This size detection sensor is a light-transmitting sensor that emits detection light from the light emitter 66 to the light receiver 67, and detects the presence or absence of light reception by the light receiver 67, and is arranged so as to sandwich the mounting part 58. Have been. Further, when the reticle case 53a capable of storing six reticles is attached, the size detection sensor blocks the detection light from the light emitter 66 to the light receiver 67, but has a smaller number of reticles. Even if a reticle case 53 for storing R is attached, it is arranged at a height where the detection light is not blocked.
  • reticle case 53 is attached when receiver 67 cannot receive the detection light from light emitter 66, and that reticle case 53 is attached when receiver 67 can receive the detection light.
  • a foreign matter inspection device 27 is provided below the storage separation unit 57 so as to face the reticle transfer robot 22.
  • the suction arm 41 moves out of the reticle library 24 through the opening 31 while moving in the -Y direction while holding the reticle case 53 by suction.
  • the suction arm rises to the position facing the predetermined slot 29 at the stock position S 3, and the opening is opened. 3 Enter slot 2 9 through 1 and remove reticle case 5 3 Load it.
  • the reticle case 53 is carried out of the reticle library 24 by the suction arm 41 in the same procedure as described above.
  • the suction arm 41 moves the reticle case 53 to a position slightly higher than the mounting portion 58 of the storage separation unit 57, and then moves to the + X side to open the opening 63.
  • the reticle case 53 is placed on the mounting portion 58 via the reticle case 53.
  • the suction arm 41 advances in the groove 68, places the reticle case 53 on the mounting portion 58, and then retreats along the groove 68 again.
  • the size detection sensor detects the size of the reticle case 53 and confirms that this reticle case is a reticle case 53 for storing one sheet. .
  • the lock between the cover 54 and the bottom plate 55 is released, and the bottom plate 55 and the holding shelf 56 are supported and moved by the vertical movement mechanism 60 via the moving plate 61, and These are moved into the space 62.
  • the presence or absence of the reticle R on the holding shelf 56 is detected by the determination sensor 65.
  • an alarm is issued and the operator waits for an instruction.
  • the reception of the reticle R is confirmed, as shown in FIG.
  • the suction arm 48 of the reticle transfer port pot 26 moves in the ⁇ Y direction, enters the holding shelf 56 through the opening 64, and sucks and holds the reticle R.
  • the suction arm 48 has been moved in the Z direction so as to face the holding shelf 56 in advance. Then, the suction arm 48 retracts in the + Y direction while holding the reticle R, and carries out the reticle R from the holding shelf 56.
  • the suction arm 48 descends, and the foreign matter inspection device 27 inspects the presence or absence of dust on the reticle R or the pellicle film.
  • the suction arm 48 rotates the reticle R toward the standby position 17 of the exposure apparatus main body 16 and rises, and then moves in the + X direction to move the reticle R to the standby position 17. Place on The subsequent operation is the same as in the first embodiment.
  • the reticle R that has been subjected to the exposure processing is stored in the reticle case 53 in the reverse order to the above, transported together with the reticle case 53, and reloaded into the reticle library 24.
  • the reticle R is housed in the sealed reticle case 53 of the SMIF type, so that the degree of cleaning around the reticle transfer device 22 in the chamber 21 is reduced. There is no need to make it so high, and equipment costs can be reduced.
  • FIGS. 12 and 13 are diagrams showing a fifth embodiment of the substrate transfer apparatus, the exposure apparatus, and the reticle library of the present invention.
  • the same elements as those of the fourth embodiment shown in FIGS. 6 to 11 are denoted by the same reference numerals, and description thereof will be omitted.
  • the difference between the fifth embodiment and the fourth embodiment is that a reticle library is provided with a storage separation unit.
  • case set position S 1 is set for one slot 29, and three slots above case set position S 1 are set.
  • Stock position S 3 is set for 2 9.
  • a storage separation unit 57 having a mounting portion 58 is provided below the case setting position S1.
  • An opening 63 opening toward the case transfer robot 25 is formed on the Y side above the mounting portion 58.
  • the foreign matter inspection device 27 is installed on the + Y side of the reticle transfer robot 26.
  • Other configurations are the same as those of the fourth embodiment.
  • the reticle case 53 loaded in the slot 29 at the case setting position S 1 is operated in the same manner as described above by the suction arm 41 of the case transport robot 25 to the —Y side. After being once unloaded from the reticle library 24 through the opening 31 located at the position, it is stored in the slot .29 at the stock position S3.
  • the predetermined reticle case 53 at the stock position S 3 is temporarily removed from the reticle library 24 through the opening 31 by the suction arm 41. After that, it is placed on the mounting portion 58 through the opening 63. Also at this time, the suction arm 41 enters and retracts along the groove 68 formed on the mounting portion 58.
  • reticle case 53 is attached to mounting part 58. Then, after unlocking the cover 54 and the bottom plate 55, the bottom plate 55 and the holding shelf 56 are moved down by the vertical movement mechanism 60 to be positioned in the space 52. Next, the suction arm 48 lowered to a position facing the holding shelf 56 moves in the ⁇ X direction, enters the holding shelf 56 through the opening 64, and holds the reticle R by suction. Then, the suction arm 48 retracts in the + X direction while holding the reticle R, and carries out the reticle R from the holding shelf 56.
  • the suction arm 48 is moved in the + X direction to place the reticle R at the standby position 17.
  • the subsequent operation is the same as in the first embodiment. Since the above operation is the same as that of the fourth embodiment, the description of the size detection of the reticle case 53 and the determination for the reticle R is omitted.
  • the reticle library 24 is provided with the storage separation unit 57, the time required for transporting the reticle case 53 to the storage separation unit 57 can be reduced, and the area occupied by the reticle transport device 22 in the exposure device 20 can be reduced.
  • the identification unit for identifying the reticle cases 6, 53 is a bar code 42
  • the reading unit for reading the identification unit is a bar code reader 43
  • the identification unit may be a letter or a number
  • the reading unit may be an optical reading device such as an OCR (Optical Character Reader).
  • the identification unit may be a magnetic tape and the reading unit may be a magnetic head.
  • a two-dimensional code having information in both the horizontal and vertical directions may be used as the identification unit instead of the bar code.
  • a reticle is set as a transfer target as a substrate.
  • the present invention is not limited to this.
  • a glass substrate used for a liquid crystal display device or a thin film magnetic head may be used.
  • the present invention is also applicable to a case where another substrate such as a ceramic wafer, an original mask or reticle used in an exposure apparatus (synthetic quartz, a silicon wafer), or a wafer is transferred.
  • the substrate transfer apparatus and reticle library of the present invention are not limited to an exposure apparatus, but may be applied to a pellicle attachment apparatus or an inspection apparatus that uses a substrate or attaches a veicle to a substrate. It can also be installed.
  • the exposure apparatus 20 is a step-and-repeat type exposure apparatus (stepper) that exposes the pattern of the reticle R while the reticle (mask) R and the wafer are stationary and sequentially moves the wafer.
  • stepper a step-and-repeat type exposure apparatus
  • the present invention can also be applied to a step-and-scan type scanning projection exposure apparatus (scanning stepper) for exposing the pattern of the reticle R by synchronously moving the reticle R and the glass substrate.
  • the types of exposure equipment include not only those used for semiconductor manufacturing, but also those used for manufacturing liquid crystal display devices, thin-film magnetic heads, imaging devices (CCDs), masks, and reticles. Widely applicable.
  • KrF excimer laser (248 nm), ArF excimer laser (193 nm), F2 laser (157 nm), X-ray, etc. are used as the light source of the illumination optical system. be able to.
  • a high frequency such as a YAG laser or a semiconductor laser may be used.
  • the magnification of the projection optical system may be any of a reduction system, an equal magnification, and an enlargement system.
  • far ultraviolet rays such as excimer laser are used as the projection optical system
  • a material that transmits far ultraviolet rays such as quartz or fluorite is used as the glass material
  • a catadioptric or refraction optical system is used. System.
  • each stage may be a type that moves along a guide, or may be a guideless type in which a guide is not provided.
  • the reaction force generated by the movement of the wafer stage may be mechanically released to the floor (ground) using a frame member.
  • the reaction force generated by the movement of the reticle stage 19 may be mechanically released to the floor (ground) using a frame member.
  • An illumination optical system and a projection optical system composed of a plurality of optical elements are incorporated into the exposure equipment body 16 to adjust their optical properties, and a reticle stage 19 consisting of many mechanical parts and a wafer stage are exposed to the exposure equipment.
  • the exposure apparatus 20 of the present embodiment can be manufactured by attaching to the main body 16 to connect wiring and piping, and performing overall adjustment (electrical adjustment, operation confirmation, and the like). It is desirable that the exposure apparatus 20 be manufactured in a clean room in which the temperature, cleanliness, and the like are controlled.
  • the reticle R is manufactured through the steps of exposing the pattern of the reticle R to a wafer or a glass substrate, assembling each device, and inspecting steps using the exposure apparatus 20 of the present invention.
  • the present invention relates to a substrate transfer apparatus and a substrate transfer method for transferring a substrate, an exposure apparatus for performing an exposure process using a substrate transferred by the substrate transfer apparatus, a microphone port device onto which a pattern is transferred by the exposure apparatus, And a reticle library for storing reticles.
  • the substrate accommodating means is configured such that the openings for receiving and transferring the substrate are provided in a plurality of directions, a separate substrate take-out position is provided. No need. As a result, the occupied area of the substrate transfer device is reduced, and the cost for maintaining the environment in the clean room is suppressed, so that the cost of IC production can be reduced. In addition, since the substrate transfer time is shortened, IC production can be performed efficiently. Further, since a plurality of transfer means are provided to face the openings formed in a plurality of directions, the transfer of the substrate can be performed independently in each of the openings, and the transfer efficiency is improved.
  • the sizes of these openings are different in a plurality of directions based on the shape of the substrate, it is possible to easily cope with the shape and size of various substrates. Further, by setting the plurality of directions in which the openings are provided to be substantially orthogonal to each other, when the substrate or the substrate cassette has a rectangular shape, the transporting means can be opposed to the end face of the substrate or the substrate cassette. Can be transported smoothly. Further, since the transfer means is provided between the plurality of substrate storage means, it is possible to store more substrates and to transfer more substrates without adding a transfer means. Can be.
  • the substrate transfer apparatus of the present invention since the substrates are stored in the substrate storage means via the substrate cassette having the lid and the bottom, it is necessary to make the cleanliness around the substrate transfer apparatus so high. And equipment costs can be reduced. Also, move the bottom relative to the lid By providing a moving mechanism, it is possible to automatically take out substrates from the substrate cassette, thereby improving productivity. In addition, since the moving mechanism is provided in the reticle library, the time for transporting the substrate cassette can be reduced, and the area occupied by the substrate transport device in the exposure apparatus can be reduced.
  • the exposure apparatus of the present invention since the above-described substrate transfer apparatus is used as a substrate transfer apparatus that stores a substrate and transfers the substrate to and from the exposure apparatus main body, the substrate transfer time is reduced. As a result, the throughput is improved, the occupied area of the substrate transfer device is reduced, and the cost for maintaining the environment in the clean room is suppressed, so that the cost of IC production can be reduced. Further, according to the micro device of the present invention, the transfer step is performed by the above-described exposure apparatus, so that efficient and low-cost manufacturing is possible.
  • the openings for receiving and transferring the reticle are formed in a plurality of directions, it is not necessary to provide a separate substrate removal position. As a result, the occupied area of the substrate transfer device using the reticle library is reduced, and the cost for maintaining the environment in the clean room is suppressed, so that the cost of IC production can be reduced. Also, the reticle transfer time is shortened, so that IC production can be performed efficiently. Since the size of these openings differs in a plurality of directions based on the shape of the reticle, it is possible to easily adapt to the shape and size of various reticle.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
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  • Library & Information Science (AREA)
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Abstract

L'invention se rapporte à un appareil de transport (22) de plaquettes comportant un organe (24) de stockage des plaquettes (R) et un organe (25, 26) permettant de transporter les plaquettes (R) entre ledit organe de stockage (24) et un appareil (16) qui utilise des plaquettes (R). Ledit organe de stockage (24) est muni d'ouvertures (30, 31) orientées suivant au moins deux directions, par lesquelles les plaquettes (R) sont transférées. Etant donné qu'aucun espace supplémentaire n'est nécessaire pour sortir les plaquettes (R), il est possible de réduire la zone occupée par l'appareil (22), ce qui permet de réduire la durée de transport des plaquettes.
PCT/JP1999/002538 1998-05-20 1999-05-17 Procede et appareil pour le transport de plaquettes, systeme d'exposition, micro dispositif et banque de reticules WO1999060625A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AU37312/99A AU3731299A (en) 1998-05-20 1999-05-17 Method and apparatus for wafer transportation, exposure system, micro device, and reticle library

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13893098 1998-05-20
JP10/138930 1998-05-20

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Publication Number Publication Date
WO1999060625A1 true WO1999060625A1 (fr) 1999-11-25

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008118146A (ja) * 2002-02-22 2008-05-22 Asml Holding Nv レチクルを保護する２部分カバーを用いるシステムおよび方法
JP2008219032A (ja) * 2001-08-10 2008-09-18 Asml Holding Nv レチクルを保護及び搬送する装置及び方法
WO2009063903A1 (fr) * 2007-11-15 2009-05-22 Nikon Corporation Boîtier de masque, appareil de transfert, appareil d'exposition, procédé de transfert de masque et procédé de fabrication de dispositif
US9472430B2 (en) 2013-02-14 2016-10-18 Kabushiki Kaisha Toshiba Substrate storage container and exposure apparatus

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04118913A (ja) * 1990-09-10 1992-04-20 Canon Inc 半導体製造装置
JPH06329218A (ja) * 1993-05-17 1994-11-29 Canon Inc 基板供給装置
JPH0729963A (ja) * 1993-07-15 1995-01-31 Kokusai Electric Co Ltd 半導体製造装置
JPH08340043A (ja) * 1995-06-13 1996-12-24 Shinko Electric Co Ltd ウエハ保管装置
JPH0974126A (ja) * 1995-09-04 1997-03-18 Dainippon Screen Mfg Co Ltd 基板搬送装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04118913A (ja) * 1990-09-10 1992-04-20 Canon Inc 半導体製造装置
JPH06329218A (ja) * 1993-05-17 1994-11-29 Canon Inc 基板供給装置
JPH0729963A (ja) * 1993-07-15 1995-01-31 Kokusai Electric Co Ltd 半導体製造装置
JPH08340043A (ja) * 1995-06-13 1996-12-24 Shinko Electric Co Ltd ウエハ保管装置
JPH0974126A (ja) * 1995-09-04 1997-03-18 Dainippon Screen Mfg Co Ltd 基板搬送装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008219032A (ja) * 2001-08-10 2008-09-18 Asml Holding Nv レチクルを保護及び搬送する装置及び方法
JP4717096B2 (ja) * 2001-08-10 2011-07-06 エーエスエムエル ホールディング エヌ．ブイ． レチクルを保護及び搬送する装置及び方法
JP2008118146A (ja) * 2002-02-22 2008-05-22 Asml Holding Nv レチクルを保護する２部分カバーを用いるシステムおよび方法
WO2009063903A1 (fr) * 2007-11-15 2009-05-22 Nikon Corporation Boîtier de masque, appareil de transfert, appareil d'exposition, procédé de transfert de masque et procédé de fabrication de dispositif
JP5316420B2 (ja) * 2007-11-15 2013-10-16 株式会社ニコン マスクケース、搬送装置、搬送方法、露光装置及びデバイス製造方法
US9472430B2 (en) 2013-02-14 2016-10-18 Kabushiki Kaisha Toshiba Substrate storage container and exposure apparatus

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