WO1999045403A1 - Ic test apparatus - Google Patents

Ic test apparatus Download PDF

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Publication number
WO1999045403A1
WO1999045403A1 PCT/JP1999/000968 JP9900968W WO9945403A1 WO 1999045403 A1 WO1999045403 A1 WO 1999045403A1 JP 9900968 W JP9900968 W JP 9900968W WO 9945403 A1 WO9945403 A1 WO 9945403A1
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WO
WIPO (PCT)
Prior art keywords
temperature
low
bath
test
temperature bath
Prior art date
Application number
PCT/JP1999/000968
Other languages
French (fr)
Japanese (ja)
Inventor
Tsuyoshi Yamashita
Akihiko Ito
Original Assignee
Advantest Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advantest Corporation filed Critical Advantest Corporation
Priority to DE19980524T priority Critical patent/DE19980524T1/en
Publication of WO1999045403A1 publication Critical patent/WO1999045403A1/en

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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/26Testing of individual semiconductor devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor

Definitions

  • the present invention relates to an IC test apparatus for performing a test by applying a low-temperature thermal stress to an IC under test, and in particular, proposes a structure for preventing frost or ice from being generated on the outer wall of a low-temperature constant temperature bath due to dew condensation. is there.
  • Fig. 1 shows an example of an IC test device equipped with a low-temperature constant temperature bath.
  • 20L indicates a low-temperature constant temperature bath.
  • the IC transfer device 21 is built in the low temperature oven 20L.
  • the IC transport device 21 has the lid 22 of the low-temperature constant temperature bath 20L opened, and although not shown in detail in FIG. 1, a tray on which a large number of ICs are mounted is inserted.
  • the mounted IC under test is sucked by a vacuum suction head one or several pieces at a time, moved by the drive belt 24, and placed on a low-temperature plate (not shown) placed on the floor in the low-temperature oven 20L.
  • B) Apply a low-temperature heat stress in the range of 0 to -30 ° C to the IC under test on this low-temperature plate.
  • the IC under test subjected to the heat stress is again sucked into the vacuum suction head of the handler 21, and the sucked IC is transported to the opening 23 formed in the low-temperature constant temperature bath 20 L, and is tested through the opening 23.
  • the IC is brought into contact with the IC socket 31 placed on the upper surface of the head 30, and the IC under test is electrically connected to the main frame 40 through the IC socket 31 and the cable 32. Perform the test.
  • the handler 21 is provided with a metal rotary shaft 25 for driving a drive belt 24 as a transport means for moving the vacuum suction head in the X-Y directions.
  • the rotating shaft 25 is inserted, for example, between the opposite heat insulating walls 20W (only one side is shown) of the low temperature constant temperature bath 20 and the end thereof is formed into the wall 20W as shown in FIG.
  • the metal bearing housing 25H fitted and mounted in the formed hole 20A and the metal bearing 25B accommodated in the bearing housing 25H are exposed to the outside. Since the rotating shaft 25 in the low temperature oven 20 is cooled, the exposed portion of the rotating shaft 25, the bearing 25B, the bearing housing 25H containing it, and the insulating wall 20W around them are shown in Fig. 2.
  • the inconvenience of frost or ice 2D due to condensation may occur. Occurs. In other words, if the ice 2D adheres, the ice melts and drops as water drops at the end of the test, causing the floor or the like to become dirty, or it enters the tank 20L via the rotating shaft 25, and is fed to the test head. 30 Drops on the upper surface, causing inconvenience such as accidents such as water entering the electrical circuit. For this reason, conventionally, there is a disadvantage that when all the tests are completed, the ice 2D is forcibly removed by hand, and a measure must be taken to prevent the drops from falling as water droplets. Fig.
  • FIG. 3 shows another example of an IC tester equipped with a 20L low-temperature oven.
  • this type of IC testing apparatus for example, about 64 ICs are mounted on each test tray 11, and the test tray 11 is circulated through the inside of the constant temperature chamber 100 and the external passage, and the port on the external circulation path is provided.
  • the IC under test is loaded on the test tray 11 by the loader section 100A, and the test tray 11 loaded with the IC under test is introduced into the low-temperature oven 20.
  • Cryostat applied to the IC under test such as low temperature thermal stress at 20 teeth, sent into the cryostat 20 teeth 2 containing the test portion.
  • IC under test in the test cryostat 20L within 2 for Te be sampled while being mounted on the test tray is performed, after the test completion is sent to a high temperature thermostatic chamber 20H, the thermal stress at high temperature thermostatic chamber 20H
  • the IC under test is returned to room temperature, discharged again to the external passageway, and the tested IC is reloaded into a general-purpose tray (not shown in the figure) by a fan loader unit 100B while reclassifying it into good and defective products, and one test is performed. Tray 11 Testing of the IC mounted on 1 is completed.
  • cryostat 20 and Mr. cryostat 20 teeth 2 is maintained, for example, one 3 0 ° C as low temperature. Therefore there is a case where the ice is attached due to condensation on the outer wall surface of the cryostat 20 Shito 20 teeth 2. Ice may also adhere to the outlet 32H of the cable K32, and this ice may melt after the test and cause inconvenience.
  • An object of the present invention is to propose an IC test apparatus equipped with a low-temperature constant-temperature bath, which has a structure capable of preventing the occurrence of dew condensation outside the low-temperature constant-temperature bath during a low-temperature test. Is what you do.
  • a portion where dew condensation occurs can be covered with a sealing cover outside the low temperature constant temperature bath maintained at a low temperature, and the air open to the atmosphere is directly exposed to the portion where dew condensation occurs.
  • the IC tester equipped with a low-temperature constant-temperature bath and a high-temperature constant-temperature bath supplies the heat of the high-temperature constant-temperature bath to the outer wall surface of the low-temperature constant-temperature bath or the cable draw-out portion.
  • the present invention proposes an IC test apparatus configured to prevent dew condensation on the outer wall of the low-temperature constant temperature bath or the cable outlet.
  • dew condensation does not occur on the outer wall of the low-temperature constant-temperature bath, so that there is no need to remove dew condensation by hand after the test is completed, so that an easy-to-handle IC test apparatus is provided. can do.
  • FIG. 1 is a side view for explaining an example of a preferred Ic test apparatus to which the present invention is applied.
  • FIG. 2 is a cross-sectional view for explaining a conventional technique.
  • FIG. 3 is a schematic perspective view for explaining another type of IC test apparatus suitable for applying the present invention.
  • FIG. 4 is a sectional view of a main part showing an embodiment of the present invention.
  • FIG. 5 is a sectional view showing a modification of FIG.
  • FIG. 6 is a sectional view showing another embodiment of the present invention.
  • FIG. 7 is a sectional view showing a modified example of FIG.
  • FIG. 8 is a sectional view showing still another embodiment of the present invention.
  • FIG. 4 shows an embodiment of the present invention.
  • a case is shown in which the present invention is applied to a portion where the rotating shaft 25, the bearing 25B, the bearing housing 25H, and the like are exposed from the inside of the low-temperature oven 20L.
  • a box-shaped hermetic cover 12 is covered on the dew condensation portion 2a where dew condensation occurs on the outer wall surface of the wall 20W of the low-temperature constant temperature bath 20L.
  • the cover 12 is made of a hard material such as metal or plastic, and is formed in a box shape having an opening on one side, and the opening surface is joined to the outer wall surface of the wall 20W around the dew condensation generating portion 2a of the low-temperature constant temperature bath 20L. And seal the condensation generating part 2a.
  • a suitable means such as a screw or an adhesive can be used to attach the cover 12.
  • the water vapor that can be supplied to the wall area of the rotating shaft 25, the bearing 25 B, the bearing housing 25, and the surrounding cover 12 is at most The total amount of water vapor is very small, and even if all the water vapor is condensed, the amount of condensation is significantly smaller than that of conventional equipment.
  • the temperature inside the cover 12 is much higher than the temperature inside the low-temperature oven 20L, the occurrence of dew condensation on the outer surface of the cover 12 is also reduced, and there is no need to treat dew. It will be easier.
  • Fig. 5 shows the case where the present invention is applied when the low temperature oven 20L and the high temperature oven 20H are adjacent to each other.
  • the boundary between the low temperature oven 20L and the high temperature oven 20H is the dew condensation part 2a. Therefore, if the sealing cover 12 is put on the dew condensation generating portion 2a.
  • FIG. 6 shows a case where the present invention is applied to an IC test apparatus of the type shown in FIG. Fig. 6 shows the vertical cross section of the test equipment.
  • the test tray 11 with the IC under test is inserted into the low-temperature oven 20 at the highest position, and It is moved and cooled during this time. Torei 1 1 lowermost position is moved in the horizontal direction, into the cryostat 20L 2.
  • the IC is tested, and then inserted into the lowest position of the high-temperature oven 20H.
  • the IC in the tray is heated to room temperature while being moved to the uppermost position, and then is taken out by horizontal movement.
  • FIG. 6 may be combined with the embodiment shown in FIG. That is, As shown by the line, a sealing cover 12 is provided so as to surround the dew condensation portion 2a on the upper surface of the low temperature oven 20L 2 adjacent to the high temperature oven 20H, and the temperature from the blower 105 is provided on the upper surface of the cover 12. It is configured to blow the wind.
  • FIG. 7 shows a modification of the embodiment shown in FIG.
  • a tube 106 is piped along the inner wall of the high-temperature bath 20H, compressed air is sent from the air conditioner 107 into the tube 106, and the warm air 108 discharged from the outlet of the tube 106 is cooled at a low temperature.
  • An example is shown in which the configuration is such that dew condensation is prevented by injecting water onto the peripheral surfaces of the constant temperature baths 20 and 20, particularly at a portion where dew condensation occurs.
  • This embodiment may be implemented in combination with the embodiment shown in FIG.
  • a sealed cover 12 surrounding the dew condensation portion 2a on the upper surface of the low temperature constant temperature bath 20L 2 adjacent to the high temperature constant temperature bath 20H is provided as shown by a broken line, and the hot air from the tube 106 is provided on the upper surface of the cover 1 2. Spray.
  • Figure 8 shows the case of applying the invention of the cable outlets 32H Nico drawn from cryostat 20L 2 shown in FIG.
  • the cable outlet 32H is sealed with a heat-insulating bush 109, and one side of the L-shaped heat transfer plate 11 1 is brought into contact with the closed surface of the bush 109, and the other surface perpendicular to it is kept at high temperature and temperature.
  • the structure was screwed to the wall of tank 20H.

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

An IC test apparatus provided with a low- and constant-temperature tank wherein a sealing cover is put on the portion of the tank which encounters the occurrence of dews, or an IC test apparatus provided with a low- and constant-temperature tank and a high- and constant-temperature tank, wherein the occurrence of dews on a circumferential surface of the low- and constant- temperature tank is prevented by supplying the heat of the high- and constant-temperature tank to the circumferential surface of the low- and constant-temperature tank.

Description

明細書  Specification
I c試験装置  Ic test equipment
技術分野 Technical field
この発明は被試験 I Cに低温度の熱ストレスを与えて試験を行なう I C試験装 置に関し、 特に低温恒温槽の外壁に結露による霜、 あるいは氷が発生することを 阻止する構造を提案するものである。  The present invention relates to an IC test apparatus for performing a test by applying a low-temperature thermal stress to an IC under test, and in particular, proposes a structure for preventing frost or ice from being generated on the outer wall of a low-temperature constant temperature bath due to dew condensation. is there.
従来の技術 Conventional technology
図 1に低温恒温槽を具備した I C試験装置の一例を示す。 図中 20L は低温恒温 槽を示す。 低温恒温槽 20L の内部に I C搬送装置 2 1が内蔵される。 I C搬送装 置 2 1は低温恒温槽 20L の蓋 2 2が開かれた状態で、 図 1には特に詳しく示して ないが、 被試験 I Cが多数搭載されたトレイが揷入され、 このトレイに搭載した 被試験 I Cを真空吸着へッドで 1個乃至数個ずつ吸着して駆動ベルト 2 4により 移動され、 低温恒温槽 20L 内の床面に配置した低温プレート (図示せず) 上に並 ベ、 この低温プレート上で被試験 I Cに例えば 0〜- 30°C の範囲の低温の熱スト レスを与える。  Fig. 1 shows an example of an IC test device equipped with a low-temperature constant temperature bath. In the figure, 20L indicates a low-temperature constant temperature bath. The IC transfer device 21 is built in the low temperature oven 20L. The IC transport device 21 has the lid 22 of the low-temperature constant temperature bath 20L opened, and although not shown in detail in FIG. 1, a tray on which a large number of ICs are mounted is inserted. The mounted IC under test is sucked by a vacuum suction head one or several pieces at a time, moved by the drive belt 24, and placed on a low-temperature plate (not shown) placed on the floor in the low-temperature oven 20L. B) Apply a low-temperature heat stress in the range of 0 to -30 ° C to the IC under test on this low-temperature plate.
熱ストレスが与えられた被試験 I Cを再びハンドラ 2 1の真空吸着へッドに吸 着し、 その吸着した I Cを低温恒温槽 20L に形成した開口部分 2 3に運び、 開口 部分 2 3を通じてテストへッ ド 3 0の上面に配置した I Cソケッ ト 3 1に I Cを 接触させ、 I Cソケッ ト 3 1 とケーブル 3 2を通じて被試験 I Cをメインフレー ム 4 0に電気的に接続し、 被試験 I Cの試験を実行する。  The IC under test subjected to the heat stress is again sucked into the vacuum suction head of the handler 21, and the sucked IC is transported to the opening 23 formed in the low-temperature constant temperature bath 20 L, and is tested through the opening 23. The IC is brought into contact with the IC socket 31 placed on the upper surface of the head 30, and the IC under test is electrically connected to the main frame 40 through the IC socket 31 and the cable 32. Perform the test.
ここでハンドラ 2 1では真空吸着へッドを X— Y方向に移動させるための搬送 手段としての駆動ベルト 2 4を駆動する金属製の回転軸 2 5等が設けられる。 回 転軸 2 5は例えば低温恒温槽 20し の互いに対向する断熱性壁 20W (—方のみを示 す) 間に差し渡され、 その端部は図 2に示すように、 壁 2 0 Wに形成された穴 20 A に嵌合装着された金属製軸受ハウジング 25H と、 その軸受ハウジング 25H に収 容された金属製ベアリング 25B と共に外部に露出される。 低温恒温槽 20し 内の回 転軸 2 5は冷却されるため、 回転軸 2 5の露出部分及びベアリング 25B とそれを 収容している軸受ハウジング 25H 、 及びそれらの周辺の断熱壁 20W に図 2に示す ように結露による霜あるいは氷 2 D (以下、 単に氷と記す) が付着する不都合が 生じる。 つまり、 氷 2 Dが付着した場合、 試験終了時に氷が溶け水滴となって落 下するから床等を汚したり、 或は回転軸 2 5を伝って槽 20L 内に入り、 テス トへ ッ ド 3 0の上面に落下し、 電気回路部分に水が侵入する等の事故が起きる不都合 が生じる。 このため従来は全ての試験が終了すると氷 2 Dを強制的に手で除去し、 水滴となって落下することを阻止する処置を行なわなくてはならない欠点がある。 図 3に低温恒温槽 20L を具備した I C試験装置の他の例を示す。 この型式の I C試験装置は各テスト トレイ 1 1に例えば 6 4個程度の I Cを搭載し、 このテス ト トレイ 1 1を恒温槽 100 の内部と、 外部の通路を循環させ、 外部循環路上の口 ーダ部 100Aで被試験 I Cをテス ト トレイ 1 1に積み込むと共に、.被試験 I Cを積 み込んだテスト トレイ 1 1は低温恒温槽 20しに導入される。 低温恒温槽 20しで被 試験 I Cに例えば低温の熱ストレスを与え、 テスト部を収容した低温恒温槽 20し2 に送り込む。 Here, the handler 21 is provided with a metal rotary shaft 25 for driving a drive belt 24 as a transport means for moving the vacuum suction head in the X-Y directions. The rotating shaft 25 is inserted, for example, between the opposite heat insulating walls 20W (only one side is shown) of the low temperature constant temperature bath 20 and the end thereof is formed into the wall 20W as shown in FIG. The metal bearing housing 25H fitted and mounted in the formed hole 20A and the metal bearing 25B accommodated in the bearing housing 25H are exposed to the outside. Since the rotating shaft 25 in the low temperature oven 20 is cooled, the exposed portion of the rotating shaft 25, the bearing 25B, the bearing housing 25H containing it, and the insulating wall 20W around them are shown in Fig. 2. As shown in the figure, the inconvenience of frost or ice 2D (hereinafter simply referred to as ice) due to condensation may occur. Occurs. In other words, if the ice 2D adheres, the ice melts and drops as water drops at the end of the test, causing the floor or the like to become dirty, or it enters the tank 20L via the rotating shaft 25, and is fed to the test head. 30 Drops on the upper surface, causing inconvenience such as accidents such as water entering the electrical circuit. For this reason, conventionally, there is a disadvantage that when all the tests are completed, the ice 2D is forcibly removed by hand, and a measure must be taken to prevent the drops from falling as water droplets. Fig. 3 shows another example of an IC tester equipped with a 20L low-temperature oven. In this type of IC testing apparatus, for example, about 64 ICs are mounted on each test tray 11, and the test tray 11 is circulated through the inside of the constant temperature chamber 100 and the external passage, and the port on the external circulation path is provided. The IC under test is loaded on the test tray 11 by the loader section 100A, and the test tray 11 loaded with the IC under test is introduced into the low-temperature oven 20. Cryostat applied to the IC under test such as low temperature thermal stress at 20 teeth, sent into the cryostat 20 teeth 2 containing the test portion.
テスト用の低温恒温槽 20L2内で被試験 I Cはテスト トレイに搭載されたままテ ス トが行なわれ、 テス ト終了後は高温恒温槽 20H に送られ、 この高温恒温槽 20H で熱ストレスを除去し、 被試験 I Cを常温に戻して再び外部通路に排出され、 ァ ンローダ部 100Bで試験済 I Cを汎用のトレイ (特に図示しない) に良品と不良品 に分類しながら積み替えて 1つのテス ト トレイ 1 1に搭載した I Cの試験が終了 する。 IC under test in the test cryostat 20L within 2 for Te be sampled while being mounted on the test tray is performed, after the test completion is sent to a high temperature thermostatic chamber 20H, the thermal stress at high temperature thermostatic chamber 20H The IC under test is returned to room temperature, discharged again to the external passageway, and the tested IC is reloaded into a general-purpose tray (not shown in the figure) by a fan loader unit 100B while reclassifying it into good and defective products, and one test is performed. Tray 11 Testing of the IC mounted on 1 is completed.
この種の型式の I C試験装置では低温度で試験を行なう場合、 低温恒温槽 20し と低温恒温槽 20し 2の内部は例えば一 3 0 °C程度の低温度に維持される。 このため 低温恒温槽 20しと 20し 2の外壁面に結露による氷が付着する場合がある。 またケー ブル K 3 2の引出口 32H にも氷が付着する場合があり、 この氷が試験終了後に溶 けて不都合を生じさせるおそれがある。 If this is a kind of type of IC tester for testing at low temperatures, the interior of the cryostat 20 and Mr. cryostat 20 teeth 2 is maintained, for example, one 3 0 ° C as low temperature. Therefore there is a case where the ice is attached due to condensation on the outer wall surface of the cryostat 20 Shito 20 teeth 2. Ice may also adhere to the outlet 32H of the cable K32, and this ice may melt after the test and cause inconvenience.
この発明の目的は低温恒温槽を具備した I C試験装置において、 低温度のテス ト中に低温恒温槽の外部に結露が発生することを阻止することができる構造を具 備した I C試験装置を提案するものである。  An object of the present invention is to propose an IC test apparatus equipped with a low-temperature constant-temperature bath, which has a structure capable of preventing the occurrence of dew condensation outside the low-temperature constant-temperature bath during a low-temperature test. Is what you do.
発明の開示 Disclosure of the invention
この発明では低温度に維持される低温恒温槽の外部において、 結露が生じる部 位に対して密封カバー覆せ、 結露が生じる部位に大気に開放されている空気が直 接接触しない構造を提案すると共に、 低温恒温槽と高温恒温槽を具備した I C試 験装置では、 高温恒温槽の熱を低温恒温槽の外壁面又はケーブル引出部分に供給 し、 この熱の供給において低温恒温槽の外壁又はケーブル引出部分に結露を生じ させないように構成した I C試験装置を提案するものである。 According to the present invention, a portion where dew condensation occurs can be covered with a sealing cover outside the low temperature constant temperature bath maintained at a low temperature, and the air open to the atmosphere is directly exposed to the portion where dew condensation occurs. In addition to proposing a structure that does not make contact, the IC tester equipped with a low-temperature constant-temperature bath and a high-temperature constant-temperature bath supplies the heat of the high-temperature constant-temperature bath to the outer wall surface of the low-temperature constant-temperature bath or the cable draw-out portion. The present invention proposes an IC test apparatus configured to prevent dew condensation on the outer wall of the low-temperature constant temperature bath or the cable outlet.
この発明による I C試験装置によれば低温恒温槽の外壁に結露を生じさせない から、 試験終了後に人の手によって結露を取外す等の処置をしなくて済むため取 扱いが容易な I C試験装置を提供することができる。  According to the IC test apparatus of the present invention, dew condensation does not occur on the outer wall of the low-temperature constant-temperature bath, so that there is no need to remove dew condensation by hand after the test is completed, so that an easy-to-handle IC test apparatus is provided. can do.
図面の簡単な説明 BRIEF DESCRIPTION OF THE FIGURES
図 1はこの発明を適用して好適な I c試験装置の一例を説明するための側面図。 図 2は従来の技術を説明するための断面図。  FIG. 1 is a side view for explaining an example of a preferred Ic test apparatus to which the present invention is applied. FIG. 2 is a cross-sectional view for explaining a conventional technique.
図 3はこの発明を適用して好適な他の型式の I C試験装置を説明するための略 線的斜視図。  FIG. 3 is a schematic perspective view for explaining another type of IC test apparatus suitable for applying the present invention.
図 4はこの発明の一実施例を示す要部の断面図。  FIG. 4 is a sectional view of a main part showing an embodiment of the present invention.
図 5は図 4の変形例を示す断面図。  FIG. 5 is a sectional view showing a modification of FIG.
図 6はこの発明の他の実施例を示す断面図。  FIG. 6 is a sectional view showing another embodiment of the present invention.
図 7は図 6の変形実施例を示す断面図。  FIG. 7 is a sectional view showing a modified example of FIG.
図 8はこの発明の更に他の実施例を示す断面図。  FIG. 8 is a sectional view showing still another embodiment of the present invention.
発明を実施するための最良の形態 BEST MODE FOR CARRYING OUT THE INVENTION
図 4にこの発明の一実施例を示す。 図 4に示す実施例では低温恒温槽 20L の内 部から回転軸 2 5或はべァリング 25B 、 ベアリングハウジンク 25H 等が露出した 部分にこの発明を適用した場合を示す。 図 4に示す例では低温恒温槽 20L の壁 20 W の外壁面において結露が発生する結露発生部 2 aに箱状の密封カバー 1 2を覆 せた構成とするものである。  FIG. 4 shows an embodiment of the present invention. In the embodiment shown in FIG. 4, a case is shown in which the present invention is applied to a portion where the rotating shaft 25, the bearing 25B, the bearing housing 25H, and the like are exposed from the inside of the low-temperature oven 20L. In the example shown in FIG. 4, a box-shaped hermetic cover 12 is covered on the dew condensation portion 2a where dew condensation occurs on the outer wall surface of the wall 20W of the low-temperature constant temperature bath 20L.
カバー 1 2は例えば金属或はプラスチック等の硬質部材で一面が開口とされた 箱状に形成し、 その開口面を低温恒温槽 20L の結露発生部 2 aを囲んで壁 20W の 外壁面に接合させ、 結露発生部 2 aを密封させる。 カバー 1 2の取付にはネジ或 は接着剤等の適当な手段を用いることができる。 これにより、 密封カバー 1 2内 は外側空間とも、 低温恒温槽 20L 内ともほぼ空気の出入が遮断される。  The cover 12 is made of a hard material such as metal or plastic, and is formed in a box shape having an opening on one side, and the opening surface is joined to the outer wall surface of the wall 20W around the dew condensation generating portion 2a of the low-temperature constant temperature bath 20L. And seal the condensation generating part 2a. A suitable means such as a screw or an adhesive can be used to attach the cover 12. As a result, the inside and outside of the sealed cover 12 are almost completely shut off both in the outside space and in the low-temperature constant temperature bath 20L.
図 4に示したように結露発生部 2 aを密封カバ一 1 2によって覆い、 密封する ことにより回転軸 2 5、 ハウジング 25B 、 軸受ハウジング 25H 等の部材に接する 空気は密封カバー 1 2の内部に存在する空気だけに限られる。 密封カバー 1 2の 内の空気は序々に冷やされて温度が低下するが、 密封カバー 1 2の表面を通じて 外部の空気と熱交換されるから、 室温と低温恒温槽 20L 内の温度との中間に近い 温度で安定する。 この密封カバー 1 2の内で、 回転軸 2 5、 ベアリング 25B 、 軸 受ハウジング 2 5、 及びそれらの周辺のカバー 1 2の壁面領域に供給できる水蒸 気の送料は、 最大でもカバー 1 2内の水蒸気の総量であり、 その量は非常に少な く、 全ての水蒸気が結露したとしても、 従来の装置と比べて著しく結露量が少な レ、。 また、 カバー 1 2内の温度は低温恒温槽 20L 内の温度よりはかなり高いので、 カバー 1 2の外部表面での結露の発生も少なく抑えられ、 結露の処理をしなくて 済むため、 取扱が容易となる。 Cover the dew condensation area 2a with the sealing cover 1 2 and seal as shown in Fig. 4. As a result, the air in contact with members such as the rotating shaft 25, the housing 25B, and the bearing housing 25H is limited to only the air existing inside the sealing cover 12. The air inside the sealed cover 1 2 is gradually cooled and the temperature decreases, but heat is exchanged with the outside air through the surface of the sealed cover 1 2, so that the temperature is between the room temperature and the temperature in the low-temperature thermostat 20 L. Stabilizes at near temperature. In this sealed cover 12, the water vapor that can be supplied to the wall area of the rotating shaft 25, the bearing 25 B, the bearing housing 25, and the surrounding cover 12 is at most The total amount of water vapor is very small, and even if all the water vapor is condensed, the amount of condensation is significantly smaller than that of conventional equipment. In addition, since the temperature inside the cover 12 is much higher than the temperature inside the low-temperature oven 20L, the occurrence of dew condensation on the outer surface of the cover 12 is also reduced, and there is no need to treat dew. It will be easier.
図 5は低温恒温槽 20L と高温恒温槽 20H が隣接して存在する場合にこの発明を 適用した場合を示す。 空気は温度が高いほど飽和湿度が高くなり、 それだけ水蒸 気を多く含むことができる。 従って、 低温恒温槽 20し の、 高温恒温槽 20H に近接 した表面には特に結露しやすい。 図 5の場合には低温恒温槽 20L と高温恒温槽 20 H の境界部分が結露発生部 2 aとなる。 従ってこの結露発生部 2 aに密封カバー 1 2を被せればよレ、。  Fig. 5 shows the case where the present invention is applied when the low temperature oven 20L and the high temperature oven 20H are adjacent to each other. The higher the temperature of the air, the higher the saturation humidity, and the more air it can contain. Therefore, dew condensation is particularly likely to occur on the surface of the low-temperature oven 20 close to the high-temperature oven 20H. In the case of Fig. 5, the boundary between the low temperature oven 20L and the high temperature oven 20H is the dew condensation part 2a. Therefore, if the sealing cover 12 is put on the dew condensation generating portion 2a.
図 6は図 3に示した型式の I C試験装置にこの発明を適用した場合を示す。 図 6は試験装置の垂直断面を示しており、 図 3で説明したように、 被試験 I Cが積 載されたテスト トレイ 1 1は低温恒温槽 20し内の最高位置に順次挿入され、 下方 に移動され、 この間に冷却される。 最下位置でトレィ 1 1は水平方向に移動され、 低温恒温槽 20L2に入る。 ここで I Cの試験が行われ、 その後、 高温恒温槽 20H の 最下位置に挿入される。 トレイの I Cはここで最上位置まで移動される間に室温 まで加熱され、 その後、 水平移動により外に取り出される。 この実施例では高温 恒温槽 20H から放出される熱の一部を低温恒温槽 20しと 20し2の周面に送風機 105 によって供給し、 表面温度を温風により結露しない温度まで上昇させるように構 成したものである。 このように温風を低温恒温槽 20しと 20L2の表面に吹き付ける ことにより結露の発生を抑えることができる。 FIG. 6 shows a case where the present invention is applied to an IC test apparatus of the type shown in FIG. Fig. 6 shows the vertical cross section of the test equipment. As explained in Fig. 3, the test tray 11 with the IC under test is inserted into the low-temperature oven 20 at the highest position, and It is moved and cooled during this time. Torei 1 1 lowermost position is moved in the horizontal direction, into the cryostat 20L 2. Here, the IC is tested, and then inserted into the lowest position of the high-temperature oven 20H. The IC in the tray is heated to room temperature while being moved to the uppermost position, and then is taken out by horizontal movement. In this embodiment supplies by the blower 105 to a portion of the heat released from the hot thermostatic chamber 20H to the peripheral surface of the cryostat 20 Shito 20 teeth 2, to raise the surface temperature to a temperature at which no condensation by the hot air It is composed. Thus the hot air it is possible to suppress the generation of dew condensation by spraying the cryostat 20 Shito 20L 2 of surface.
図 6の実施例に図 5で示した実施例を組み合わせて実施してもよい。 即ち、 破 線で示すように、 低温恒温槽 20L2の、 高温恒温槽 20H に隣接する上面の結露発生 部 2 aを囲むように密封カバー 1 2を設け、 そのカバー 1 2の上面に送風機 105 からの温風を吹きかけるように構成する。 The embodiment shown in FIG. 6 may be combined with the embodiment shown in FIG. That is, As shown by the line, a sealing cover 12 is provided so as to surround the dew condensation portion 2a on the upper surface of the low temperature oven 20L 2 adjacent to the high temperature oven 20H, and the temperature from the blower 105 is provided on the upper surface of the cover 12. It is configured to blow the wind.
図 7は図 6に示した実施例の変形例である。 この図 7に示す実施例では高温恒 温槽 20H の内壁に沿ってチューブ 106 を配管し、 このチューブ 106 にエアコンプ レッサ 107 から圧縮空気を送り込み、 チューブ 106 の出口から排出される暖気 10 8 を低温恒温槽 20しと 20 の周面、 特に結露が発生する部分に射出させて結露の 発生を阻止させるように構成した場合を示す。 この実施例にも、 図 5で示した実 施例を組み合わせて実施してもよい。 即ち、 低温恒温槽 20L2の、 高温恒温槽 20H と隣接する上面の結露発生部 2 aを囲む密封カバー 1 2を破線で示すように設け、 そのカバー 1 2の上面にチューブ 106 からの温風を吹きかける。 FIG. 7 shows a modification of the embodiment shown in FIG. In the embodiment shown in FIG. 7, a tube 106 is piped along the inner wall of the high-temperature bath 20H, compressed air is sent from the air conditioner 107 into the tube 106, and the warm air 108 discharged from the outlet of the tube 106 is cooled at a low temperature. An example is shown in which the configuration is such that dew condensation is prevented by injecting water onto the peripheral surfaces of the constant temperature baths 20 and 20, particularly at a portion where dew condensation occurs. This embodiment may be implemented in combination with the embodiment shown in FIG. That is, a sealed cover 12 surrounding the dew condensation portion 2a on the upper surface of the low temperature constant temperature bath 20L 2 adjacent to the high temperature constant temperature bath 20H is provided as shown by a broken line, and the hot air from the tube 106 is provided on the upper surface of the cover 1 2. Spray.
図 8は図 3で示した低温恒温槽 20L 2から引き出されるケーブル引出口 32H にこ の発明を適用した場合を示す。 この場合にはケーブル引出口 32H を断熱性を持つ ブッシュ 109 で密封すると共に、 ブッシュ 109 の閉塞面に L字形熱伝達プレート 11 1 の一方の面を接触させ、 それと直角な他方の面を高温恒温槽 20H の壁面にネ ジ止めした構造としたものである。 Figure 8 shows the case of applying the invention of the cable outlets 32H Nico drawn from cryostat 20L 2 shown in FIG. In this case, the cable outlet 32H is sealed with a heat-insulating bush 109, and one side of the L-shaped heat transfer plate 11 1 is brought into contact with the closed surface of the bush 109, and the other surface perpendicular to it is kept at high temperature and temperature. The structure was screwed to the wall of tank 20H.
この構造によれば高温恒温槽 20H の熱が熱伝達プレート 1 11 を通じてブッシュ 109 に伝達されるから、 ブッシュ 109 の温度を低温恒温槽 20L2の内部の温度より 高くすることができる。 この結果ブッシュ 109 に湿気を含む空気が接触しても湿 気が結露することを防止することができる。 図 8の実施例は、 図 6の実施例及び 図 7の実施例のいずれとも組み合わせて実施することができる。 Since the heat of the high temperature thermostatic chamber 20H This structure is transmitted to the bushing 109 through the heat transfer plate 1 11 can be higher than the temperature of the internal temperature of the cryostat 20L 2 of the bushing 109. As a result, it is possible to prevent moisture from condensing even when the bush 109 is brought into contact with air containing moisture. The embodiment of FIG. 8 can be implemented in combination with any of the embodiment of FIG. 6 and the embodiment of FIG.
発明の効果 The invention's effect
以上説明したように、 この発明によれば低温恒温槽を備えた I C試験装置にお いて、 低温恒温槽の外部に結露が発生することを阻止し、 結露が発生した場合に 試験終了時に処置しなければならない事項を省略することができる。 従って取扱 いが容易な I C試験装置を構成することができ、 その効果は実用に供して頗る大 である。  As described above, according to the present invention, in an IC test apparatus provided with a low-temperature constant-temperature bath, dew condensation is prevented from occurring outside the low-temperature constant-temperature bath, and if dew condensation occurs, a measure is taken at the end of the test. Necessary items can be omitted. Therefore, an easy-to-handle IC test apparatus can be constructed, and its effect is extremely large for practical use.

Claims

請求の範囲 The scope of the claims
1 . 低温恒温槽の内部において被試験 I Cに低温度の熱ストレスを与えて試験を 行なう I C試験装置において、  1. In an IC test apparatus that performs a test by applying a low-temperature thermal stress to an IC under test inside a low-temperature constant temperature chamber,
上記低温恒温槽の外壁の結露発生部に、 この結露発生部を覆う密封カバーを装 着した構造とすることを特徴とする I C試験装置。  An IC test device, characterized in that a dew condensation portion on the outer wall of the low-temperature constant temperature bath is provided with a sealing cover for covering the dew condensation portion.
2 . 請求項 1の I C試験装置において、 上記低温恒温槽の壁に外部に貫通する穴 が形成されており、 その穴から I Cを搬送するための駆動手段を構成する回転軸 の一端が露出され、 その回転軸の一端を回動可能に保持するべァリング手段が設 けられ、 上記密封カバーが囲んで密封する上記結露発生部は、 これら上記回転軸 の一端と上記べァリング手段、 及びそれらを囲む周辺を含む。  2. In the IC test apparatus according to claim 1, a hole is formed through the wall of the low-temperature constant temperature bath so as to penetrate outside, and one end of a rotating shaft that constitutes a driving means for transporting the IC is exposed from the hole. A bearing means for rotatably holding one end of the rotating shaft is provided, and the dew condensation generating section, which is surrounded and sealed by the sealing cover, includes one end of the rotating shaft, the bearing means, and Including the surrounding area.
3 . 請求項 1の I C試験装置において、 上記低温恒温槽は高温恒温槽と隣接して 設けられ、 上記密封カバーが囲んで密封する上記結露発生部は、 上記低温恒温槽 の、 上記高温恒温槽と隣接した壁の外表面部である。  3. The IC test apparatus according to claim 1, wherein the low-temperature constant temperature bath is provided adjacent to the high-temperature constant temperature bath, and the dew condensation portion surrounded and sealed by the sealing cover is the high-temperature constant temperature bath of the low-temperature constant temperature bath. And the outer surface of the adjacent wall.
4 . 低温恒温槽の内部において被試験 I Cに低温度の熱ストレスを与えて試験を 行ない、 試験終了後の排出時は被試験 I Cに高温恒温槽において熱を加えて常温 に戻し、 試験済の I Cを高温恒温槽から排出させる構造の I C試験装置において、 上記試験済の I Cに熱を加える高温恒温槽の熱を上記低温恒温槽の外壁面に配 給し、 低温恒温槽の外壁面に結露を発生させない構造としたことを特徴とする I c試験装置。  4. Perform the test by applying a low-temperature thermal stress to the IC under test inside the low-temperature constant-temperature chamber, and after discharging the test, apply heat to the IC under test in the high-temperature constant-temperature chamber to return it to normal temperature, and In an IC tester that discharges ICs from the high-temperature oven, the heat of the high-temperature oven that applies heat to the tested ICs is distributed to the outer wall of the low-temperature oven, and dew forms on the outer wall of the low-temperature oven. An Ic test apparatus characterized by having a structure that does not generate any cracks.
5 . 請求項 4の I C試験装置において、 上記低温恒温槽は上記高温恒温槽と隣接 して設けられ、 上記密封カバーが囲んで密封する上記結露発生部は、 上記低温恒 温槽の、 上記高温恒温槽と隣接した壁の外表面部である。  5. The IC test apparatus according to claim 4, wherein the low-temperature constant temperature bath is provided adjacent to the high-temperature constant temperature bath, and the dew condensation portion surrounded by the sealing cover is sealed with the high-temperature constant temperature bath of the low-temperature constant temperature bath. The outer surface of the wall adjacent to the thermostat.
6 . 請求項 4又は 5の I C試験装置において、 上記高温恒温槽から排出される熱 は上記高温恒温槽の外壁から放出される熱である。  6. In the IC test apparatus according to claim 4 or 5, the heat discharged from the high-temperature bath is heat released from an outer wall of the high-temperature bath.
7 . 請求項 4又は 5の I C試験装置において、 上記高温恒温槽から排出される熱 は上記高温恒温槽内部に配管され、 外に導出されたチューブを通って温風により 供給される熱である。  7. The IC test apparatus according to claim 4 or 5, wherein the heat discharged from the high-temperature bath is heat supplied by hot air through a tube that is piped into the high-temperature bath and led out. .
8 . 請求項 4又は 5の I C試験装置において、 上記低温恒温槽から引き出される ケーブルの引き出口の周囲に上記高温恒温槽の壁面から熱を伝達して加熱する熱 伝達手段が設けられている。 8. The IC test apparatus according to claim 4 or 5, wherein heat is transferred from a wall surface of the high temperature constant temperature bath to a periphery of a cable outlet drawn from the low temperature constant temperature bath. Transmission means is provided.
9 . 請求項 8の I C試験装置において、 上記熱伝達手段は一端が上記高温恒温槽 の壁面と面接触された第 1板部と、 上記第 1板部の一端縁からほぼ L字状を形成 するように一体延長され、 上記ケーブルの引き出し口周囲と面接触する第 2板部 とを有する L字金具を含む。  9. The IC test apparatus according to claim 8, wherein the heat transfer means has a first plate portion, one end of which is in surface contact with a wall surface of the high temperature constant temperature bath, and a substantially L-shape formed from one end edge of the first plate portion. And an L-shaped fitting having a second plate portion which is integrally extended so as to be in contact with the periphery of the cable outlet.
PCT/JP1999/000968 1998-03-02 1999-03-01 Ic test apparatus WO1999045403A1 (en)

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JP5348731B2 (en) * 2007-12-26 2013-11-20 ホシザキ電機株式会社 Refrigerator unit
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0466882A (en) * 1990-07-06 1992-03-03 Advantest Corp Thermostat apparatus for testing ic
JPH0466588U (en) * 1990-10-19 1992-06-11
JPH0528039U (en) * 1991-09-13 1993-04-09 安藤電気株式会社 Driving mechanism of fan in low temperature tank

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0466882A (en) * 1990-07-06 1992-03-03 Advantest Corp Thermostat apparatus for testing ic
JPH0466588U (en) * 1990-10-19 1992-06-11
JPH0528039U (en) * 1991-09-13 1993-04-09 安藤電気株式会社 Driving mechanism of fan in low temperature tank

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