JPH11248787A - Ic testing apparatus - Google Patents
Ic testing apparatusInfo
- Publication number
- JPH11248787A JPH11248787A JP10049523A JP4952398A JPH11248787A JP H11248787 A JPH11248787 A JP H11248787A JP 10049523 A JP10049523 A JP 10049523A JP 4952398 A JP4952398 A JP 4952398A JP H11248787 A JPH11248787 A JP H11248787A
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- low
- test
- ton
- dew
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Environmental & Geological Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】この発明は被試験ICに低温
度の熱ストレスを与えて試験を行なうIC試験装置に関
し、特に低温恒温槽の外壁に結露が発生することを阻止
する構造を提案するものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an IC test apparatus for performing a test by applying a low-temperature thermal stress to an IC under test, and more particularly, to a structure for preventing the occurrence of dew condensation on the outer wall of a low-temperature oven. It is.
【0002】[0002]
【従来の技術】図6に低温恒温槽を具備したIC試験装
置の一例を示す。図中TONは低温恒温槽を示す。低温
恒温槽TONの内部にIC搬送装置HANDが内蔵され
る。IC搬送装置HANDは図6には特に詳しく示して
ないが、低温恒温槽TONの開閉蓋DORが付設された
側に被試験ICが多数搭載されたトレイが挿入され、こ
のトレイに搭載した被試験ICを真空吸着ヘッドで1個
乃至数個ずつ吸着して低温恒温槽TONの床面に配置し
た低温プレート上に並べ、この低温プレート上で被試験
ICに低温の熱ストレスを与える。2. Description of the Related Art FIG. 6 shows an example of an IC test apparatus provided with a low-temperature constant temperature bath. In the figure, TON indicates a low-temperature constant temperature bath. The IC transport device HAND is built in the low temperature constant temperature bath TON. Although the IC transfer device HAND is not shown in detail in FIG. 6, a tray on which a large number of ICs to be tested are mounted is inserted on the side of the low-temperature constant temperature bath TON where the open / close lid DOR is attached, and the test target mounted on this tray is mounted. One or several ICs are sucked by a vacuum suction head and arranged on a low-temperature plate arranged on the floor of the low-temperature constant temperature bath TON, and a low-temperature thermal stress is applied to the IC under test on the low-temperature plate.
【0003】熱ストレスが与えられた被試験ICを再び
真空吸着ヘッドに吸着し、その吸着したICを低温恒温
槽TONに形成した開口部分WINに運び、開口部分W
INを通じてテストヘッドTSHの上面に配置したIC
ソケットSKにICを接触させ、ICソケットSKとケ
ーブルKBを通じて被試験ICをメインフレームMIN
に電気的に接続し、被試験ICの試験を実行する。The IC under test to which the thermal stress has been applied is sucked again by the vacuum suction head, and the sucked IC is carried to the opening WIN formed in the low temperature constant temperature bath TON.
IC placed on top of test head TSH through IN
The IC is brought into contact with the socket SK, and the IC under test is connected to the mainframe MIN through the IC socket SK and the cable KB.
, And a test of the IC under test is executed.
【0004】ここでハンドラHANDでは真空吸着ヘッ
ドをX−Y方向に移動させるための搬送手段の駆動機構
として回転軸JKU等が設けられる。回転軸JKUは例
えば低温恒温槽TONの壁面間に差し渡され、その端部
は図7に示すようにベアリングBRとハウジングHUG
と共に外部に露出される。この結果回転軸JKUの露出
部分に図7に示すように結露KTUが付着する不都合が
生じる。つまり、結露KTUが付着した場合、試験終了
時に結露が溶け水滴となって落下するから床等を汚した
り、或はテストヘッドTSHの上面に落下し、電気回路
部分に水が侵入する等の事故が起きる不都合が生じる。
このため従来は全ての試験が終了すると結露を強制的に
手で取外し、水滴となって落下することを阻止する処置
を行なわなくてはならない欠点がある。In the handler HAND, a rotary shaft JKU or the like is provided as a drive mechanism of a transfer means for moving the vacuum suction head in the XY directions. The rotating shaft JKU is, for example, inserted between the wall surfaces of the low-temperature constant temperature bath TON, and its ends are provided with a bearing BR and a housing HUG as shown in FIG.
And is exposed to the outside. As a result, there is a problem that the dew condensation KTU adheres to the exposed portion of the rotation shaft JKU as shown in FIG. That is, when the dew condensation KTU adheres, the dew drops at the end of the test and drops as water droplets, thereby contaminating the floor or the like, or dropping on the upper surface of the test head TSH and causing water to enter the electric circuit portion. Occurs.
For this reason, conventionally, there is a disadvantage that when all tests are completed, dew condensation must be forcibly removed by hand and a measure must be taken to prevent the condensation from falling as water droplets.
【0005】図8に低温恒温槽TONを具備したIC試
験装置の他の例を示す。この型式のIC試験装置はテス
トトレイTSTに例えば64個程度のICを搭載し、こ
のテストトレイTSTを恒温槽100の内部と、外部の
通路を循環させ、外部循環路上のローダ部Aで被試験I
CをテストトレイTSTに積み込むと共に、被試験IC
を積み込んだテストトレイTSTは低温恒温槽TON−
1に導入される。低温恒温槽TON−1で被試験ICに
例えば低温の熱ストレスを与え、テスト部を収容した低
温恒温槽TON−2に送り込む。FIG. 8 shows another example of an IC test apparatus having a low-temperature constant temperature bath TON. In this type of IC test apparatus, for example, about 64 ICs are mounted on a test tray TST, and the test tray TST is circulated through the inside of the thermostat 100 and an external passage, and a test object is tested by a loader unit A on an external circulation path. I
C on the test tray TST and the IC under test
Is loaded in the test tray TST.
Introduced in 1. For example, a low temperature thermal stress is applied to the IC under test in the low temperature oven TON-1 and the IC is sent to the low temperature oven TON-2 containing the test unit.
【0006】テスト用の低温恒温槽TON−2内で被試
験ICはテストトレイに搭載されたままテストが行なわ
れ、テスト終了後は高温恒温槽HONに送られ、この高
温恒温槽HONで熱ストレスを除去し、被試験ICを常
温に戻して再び外部通路に排出され、ローダ部Bで試験
済ICを汎用のトレイ(特に図示しない)に良品と不良
品に分類しながら積み替えて1つのテストトレイTST
に搭載したICの試験が終了する。[0006] In the low temperature oven TON-2 for testing, the IC under test is tested while being mounted on the test tray, and after completion of the test, is sent to the high temperature oven HON. Is removed, the IC under test is returned to room temperature, discharged again to the external passage, and the tested ICs are reloaded into a general-purpose tray (not shown in the drawing) by the loader unit B while being sorted into a non-defective product and a non-defective product, so that one test tray is obtained. TST
The test of the IC mounted on the is completed.
【0007】この種の型式のIC試験装置では低温度で
試験を行なう場合、低温恒温槽TON−1と低温恒温槽
TON−2の内部は例えば−30℃程度の低温度に維持
される。このため低温恒温槽TON−1とTON−2の
外壁面に結露が発生する場合がある。またケーブルKB
引出口KBHにも結露が発生する場合があり、この結露
が試験終了後に溶けて不都合を生じさせるおそれがあ
る。When a test is performed at a low temperature in this type of IC test apparatus, the insides of the low-temperature constant temperature baths TON-1 and TON-2 are maintained at a low temperature of, for example, about -30.degree. For this reason, dew condensation may occur on the outer wall surfaces of the low temperature constant temperature baths TON-1 and TON-2. Also cable KB
Condensation may also occur at the outlet KBH, and the dew may melt after the test to cause inconvenience.
【0008】この発明の目的は低温恒温槽を具備したI
C試験装置において、低温度のテスト中に低温恒温槽の
外部に結露が発生することを阻止することができる構造
を具備したIC試験装置を提案するものである。[0008] It is an object of the present invention to provide a low-temperature constant-temperature bath.
An object of the present invention is to propose an IC test apparatus having a structure capable of preventing dew condensation from occurring outside a low-temperature constant-temperature bath during a low-temperature test in a C test apparatus.
【0009】[0009]
【課題を解決するための手段】この発明では低温度に維
持される低温恒温槽の外部において、結露が生じる部位
に対して密封カバー覆せ、結露が生じる部位に大気に開
放されている空気が直接接触しない構造を提案すると共
に、低温恒温槽と高温恒温槽を具備したIC試験装置で
は、高温恒温槽の熱を低温恒温槽の外壁面又はケーブル
引出部分に配給し、この熱の配給において低温恒温槽の
外壁又はケーブル引出部分に結露を生じさせないように
構成したIC試験装置を提案するものである。According to the present invention, outside of a low-temperature constant temperature bath maintained at a low temperature, a portion where dew condensation occurs can be covered with a sealing cover, and air released to the atmosphere is directly applied to a portion where dew condensation occurs. In addition to proposing a structure that does not make contact, the IC tester equipped with a low-temperature constant-temperature chamber and a high-temperature constant-temperature chamber distributes heat from the high-temperature constant-temperature chamber to the outer wall surface or the cable outlet of the low-temperature constant-temperature chamber. It is an object of the present invention to provide an IC test apparatus configured so as not to cause dew condensation on an outer wall of a bath or a cable drawing portion.
【0010】この発明によるIC試験装置によれば低温
恒温槽の外壁に結露を生じさせないから、試験終了後に
人の手によって結露を取外す等の処置をしなくて済むた
め取扱いが容易なIC試験装置を提供することができ
る。According to the IC test apparatus of the present invention, since dew condensation does not occur on the outer wall of the low-temperature constant-temperature bath, there is no need to remove dew condensation by hand after completion of the test, so that the IC test apparatus is easy to handle. Can be provided.
【0011】[0011]
【発明の実施の形態】図1にこの発明の一実施例を示
す。図1に示す実施例では低温恒温槽TONの内部から
回転軸JKU或はハウジンクHUG、ベアリングBR等
が露出した部分にこの発明を適用した場合を示す。図1
に示す例では低温恒温槽TONの外壁において結露が発
生する結露発生部11に密封カバー12を覆せた構成と
するものである。FIG. 1 shows an embodiment of the present invention. In the embodiment shown in FIG. 1, a case is shown in which the present invention is applied to a portion where the rotating shaft JKU, the housing HUG, the bearing BR and the like are exposed from the inside of the low-temperature constant temperature bath TON. FIG.
In the example shown in FIG. 5, the sealing cover 12 is covered by the dew condensation generating portion 11 where dew condensation occurs on the outer wall of the low temperature constant temperature bath TON.
【0012】カバー12は例えば金属或はプラスチック
等の硬質部材で一面が開口とされた箱状に形成し、その
開口面を低温恒温槽TONの結露発生部11に接合さ
せ、結露発生部11を密封させる。カバー12の取付に
はネジ或は接着剤等の適当な手段を用いることができ
る。図1に示したように結露発生部11を密封カバー1
2によって覆い、密封することにより回転軸JKU、ハ
ウジングHUG、ベアリングBR等の部材に接する空気
は密封カバー12の内部に存在する空気だけに限られ
る。密封カバー12の内の空気は序々に冷やされて温度
が低下するが、密封カバー12の表面を通じて外部の空
気と熱交換されるから、極度に温度が低下せず、室温に
近い温度で安定する。従って密封カバー12の内部で
も、また外部でも結露の発生は抑えられ、結露の処理を
しなくて済むため、取扱が容易となる。The cover 12 is made of a hard material such as metal or plastic, and is formed in a box shape having an opening on one side, and the opening surface is joined to the dew condensation generating portion 11 of the low temperature constant temperature bath TON. Allow to seal. An appropriate means such as a screw or an adhesive can be used to attach the cover 12. As shown in FIG.
2, the air in contact with members such as the rotating shaft JKU, the housing HUG, and the bearing BR is limited to air existing inside the sealing cover 12. Although the air inside the sealing cover 12 is gradually cooled and its temperature is lowered, the heat is exchanged with the outside air through the surface of the sealing cover 12, so that the temperature does not drop extremely and stabilizes at a temperature close to room temperature. . Therefore, the occurrence of dew condensation is suppressed both inside and outside of the sealing cover 12, and it is not necessary to treat the dew condensation, thereby facilitating the handling.
【0013】図2は低温恒温槽TONと高温恒温槽HO
Nが隣接して存在する場合にこの発明を適用した場合を
示す。この場合には低温恒温槽TONと高温恒温槽HO
Nの境界部分が結露発生部11となる。従ってこの結露
発生部11に密封カバー12を被せればよい。図3は図
8に示した型式のIC試験装置にこの発明を適用した場
合を示す。この場合には高温恒温槽HONから放出され
る熱の一部を低温恒温槽TON−1とTON−2の周面
に送風機105によって配給し、低温恒温槽TON−1
とTON−2の外周面に結露が発生しようとしている状
態で、低温恒温槽TON−1とTON−2の表面温度を
温風により結露しない温度まで上昇させるように構成し
たものである。FIG. 2 shows a low-temperature oven TON and a high-temperature oven HO.
The case where the present invention is applied when N exists adjacently is shown. In this case, the low-temperature oven TON and the high-temperature oven HO
The boundary part of N becomes the dew condensation generating part 11. Therefore, it is sufficient to cover the dew condensation portion 11 with the sealing cover 12. FIG. 3 shows a case where the present invention is applied to an IC test apparatus of the type shown in FIG. In this case, part of the heat released from the high-temperature oven HON is distributed to the peripheral surface of the low-temperature ovens TON-1 and TON-2 by the blower 105, and the low-temperature oven TON-1 is supplied.
And the surface temperature of the low-temperature constant temperature baths TON-1 and TON-2 is raised to a temperature at which dew condensation does not occur due to the hot air while dew condensation is about to occur on the outer peripheral surface of the TON-2.
【0014】このように温風を低温恒温槽TON−1と
TON−2の表面に配給しても結露の発生を抑えること
ができる。図4は図3に示した実施例の変形例である。
この図4に示す実施例では高温恒温槽HONの例では内
壁に沿ってチューブ106を配管し、このチューブ10
6にエアコンプレッサ107から圧縮空気を送り込み、
チューブ106の出口から排出される暖気108を低温
恒温槽TON−1とTON−2の周面、特に結露が発生
する部分に射出させて結露の発生を阻止させるように構
成した場合を示す。As described above, even when hot air is distributed to the surfaces of the low-temperature constant temperature baths TON-1 and TON-2, the occurrence of dew condensation can be suppressed. FIG. 4 is a modification of the embodiment shown in FIG.
In the embodiment shown in FIG. 4, a tube 106 is piped along the inner wall in the example of the high-temperature constant-temperature bath HON.
6, compressed air is sent from the air compressor 107,
A case is shown in which the warm air 108 discharged from the outlet of the tube 106 is injected to the peripheral surfaces of the low-temperature constant temperature baths TON-1 and TON-2, particularly to a portion where dew condensation occurs, to prevent the dew formation.
【0015】図5は低温恒温槽TON−2から引き出さ
れるケーブル引出口KBHにこの発明を適用した場合を
示す。この場合にはケーブル引出口KBHを断熱性を持
つブッシュ109で密封すると共に、ブッシュ109の
閉塞面に熱伝達プレート111を接触させ、熱伝達プレ
ート111の端部を高温恒温槽HONの壁部材にネジ止
めした構造としたものである。FIG. 5 shows a case where the present invention is applied to a cable outlet KBH drawn out of a low-temperature constant temperature bath TON-2. In this case, the cable outlet KBH is sealed with a heat-insulating bush 109, and the heat transfer plate 111 is brought into contact with the closed surface of the bush 109, and the end of the heat transfer plate 111 is attached to the wall member of the high-temperature constant temperature bath HON. It has a screwed structure.
【0016】この構造によれば高温恒温槽HONの熱が
熱伝達プレート111を通じてブッシュ109に伝達さ
れるから、ブッシュ109の温度を低温恒温槽TOH−
2の内部の温度より高くすることができる。この結果ブ
ッシュ109に湿気を含む空気が接触しても湿気が結露
することを防止することができる。According to this structure, the heat of the high temperature oven HON is transmitted to the bush 109 through the heat transfer plate 111, so that the temperature of the bush 109 is reduced to the low temperature oven TOH-.
2 can be higher than the internal temperature. As a result, it is possible to prevent moisture from condensing even when air containing moisture contacts the bush 109.
【0017】[0017]
【発明の効果】以上説明したように、この発明によれば
低温恒温槽を備えたIC試験装置において、低温恒温槽
の外部に結露が発生することを阻止し、結露が発生した
場合に試験終了時に処置しなければならない事項を省略
することができる。従って取扱いが容易なIC試験装置
を構成することができ、その効果は実用に供して頗る大
である。As described above, according to the present invention, in an IC test apparatus provided with a low-temperature constant-temperature bath, the occurrence of dew condensation outside the low-temperature constant-temperature bath is prevented, and the test ends when the dew condensation occurs. Items that must be dealt with sometimes can be omitted. Therefore, an easy-to-handle IC test apparatus can be constructed, and the effect is extremely large for practical use.
【図1】この発明の一実施例を示す要部の断面図。FIG. 1 is a sectional view of a main part showing one embodiment of the present invention.
【図2】図1の変形例を示す断面図。FIG. 2 is a sectional view showing a modification of FIG. 1;
【図3】この発明の他の実施例を示す断面図。FIG. 3 is a sectional view showing another embodiment of the present invention.
【図4】図3の変形実施例を示す断面図。FIG. 4 is a sectional view showing a modified example of FIG. 3;
【図5】この発明の更に他の実施例を示す断面図。FIG. 5 is a sectional view showing still another embodiment of the present invention.
【図6】この発明を適用して好適なIC試験装置の一例
を説明するための側面図。FIG. 6 is a side view for explaining an example of a preferred IC test apparatus to which the present invention is applied.
【図7】従来の技術を説明するための断面図。FIG. 7 is a sectional view for explaining a conventional technique.
【図8】この発明を適用して好適な他の型式のIC試験
装置を説明するための略線的斜視図。FIG. 8 is a schematic perspective view for explaining another type of IC test apparatus suitable for applying the present invention.
HAND ハンドラ MIN メインフレーム TON,TON−1,TON−2 低温恒温槽 HON 高温恒温槽 TSH テストヘッド SK ICソケット KTU 結露 11 結露発生部 12 密封カバー HAND Handler MIN Main frame TON, TON-1, TON-2 Low temperature oven HON High temperature oven TSH Test head SK IC socket KTU Condensation 11 Condensation generating part 12 Sealing cover
Claims (3)
低温度の熱ストレスを与えて試験を行なうIC試験装置
において、 上記低温恒温槽の外壁の結露発生部に、この結露発生部
を覆う密封カバーを装着した構造とすることを特徴とす
るIC試験装置。1. An IC test apparatus for performing a test by applying a low-temperature thermal stress to an IC under test inside a low-temperature constant-temperature bath, wherein the dew-condensation generating portion on the outer wall of the low-temperature constant-temperature bath covers the dew condensation generating portion. An IC test apparatus having a structure with a cover attached.
低温度の熱ストレスを与えて試験を行ない、試験終了後
の排出時は被試験ICに高温恒温槽において熱を加えて
常温に戻し、試験済のICを高温恒温槽から排出させる
構造のIC試験装置において、 上記試験済のICに熱を加える高温恒温槽の熱を上記低
温恒温槽の外壁面に配給し、低温恒温槽の外壁面に結露
を発生させない構造としたことを特徴とするIC試験装
置。2. A test is performed by applying a low-temperature thermal stress to the IC under test inside the low-temperature oven, and after the test is completed, heat is applied to the IC under test in a high-temperature oven to return to normal temperature. An IC testing apparatus having a structure for discharging a tested IC from a high-temperature oven, wherein the heat of the high-temperature oven for applying heat to the tested IC is distributed to an outer wall surface of the low-temperature oven, and an outer wall surface of the low-temperature oven is provided. An IC test apparatus characterized by having a structure in which dew condensation does not occur.
上記低温恒温槽から引き出されるケーブルの引き出口に
上記高温恒温槽の熱を伝達し、ケーブル引き出口に結露
が発生することを阻止する構造としたIC試験装置。3. The IC test apparatus according to claim 2, wherein
An IC test apparatus having a structure in which heat of the high-temperature constant-temperature bath is transmitted to an outlet of a cable drawn from the low-temperature constant-temperature bath to prevent dew condensation from occurring at the cable outlet.
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10049523A JPH11248787A (en) | 1998-03-02 | 1998-03-02 | Ic testing apparatus |
DE19980524T DE19980524T1 (en) | 1998-03-02 | 1999-03-01 | IC test device |
KR1019997009946A KR20010020333A (en) | 1998-03-02 | 1999-03-01 | Ic test apparatus |
TW088103095A TW428095B (en) | 1998-03-02 | 1999-03-01 | IC testing apparatus |
PCT/JP1999/000968 WO1999045403A1 (en) | 1998-03-02 | 1999-03-01 | Ic test apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10049523A JPH11248787A (en) | 1998-03-02 | 1998-03-02 | Ic testing apparatus |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007230448A Division JP2008008912A (en) | 2007-09-05 | 2007-09-05 | Ic testing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH11248787A true JPH11248787A (en) | 1999-09-17 |
Family
ID=12833509
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10049523A Pending JPH11248787A (en) | 1998-03-02 | 1998-03-02 | Ic testing apparatus |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPH11248787A (en) |
KR (1) | KR20010020333A (en) |
DE (1) | DE19980524T1 (en) |
TW (1) | TW428095B (en) |
WO (1) | WO1999045403A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009156503A (en) * | 2007-12-26 | 2009-07-16 | Hoshizaki Electric Co Ltd | Refrigerator unit |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102179036B1 (en) * | 2019-07-02 | 2020-11-16 | 세메스 주식회사 | Chamber wall structure of test handler |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2915969B2 (en) * | 1990-07-06 | 1999-07-05 | 株式会社アドバンテスト | Constant temperature bath for IC testing |
JP2540703Y2 (en) * | 1990-10-19 | 1997-07-09 | 株式会社アドバンテスト | IC test equipment |
JP2561115Y2 (en) * | 1991-09-13 | 1998-01-28 | 安藤電気株式会社 | Driving mechanism of fan in low temperature chamber |
-
1998
- 1998-03-02 JP JP10049523A patent/JPH11248787A/en active Pending
-
1999
- 1999-03-01 WO PCT/JP1999/000968 patent/WO1999045403A1/en not_active Application Discontinuation
- 1999-03-01 TW TW088103095A patent/TW428095B/en not_active IP Right Cessation
- 1999-03-01 DE DE19980524T patent/DE19980524T1/en not_active Ceased
- 1999-03-01 KR KR1019997009946A patent/KR20010020333A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009156503A (en) * | 2007-12-26 | 2009-07-16 | Hoshizaki Electric Co Ltd | Refrigerator unit |
Also Published As
Publication number | Publication date |
---|---|
DE19980524T1 (en) | 2000-05-25 |
KR20010020333A (en) | 2001-03-15 |
WO1999045403A1 (en) | 1999-09-10 |
TW428095B (en) | 2001-04-01 |
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