WO1998028101A1 - Texturation et electro-ebavurage de substrat de disque magnetique - Google Patents

Texturation et electro-ebavurage de substrat de disque magnetique Download PDF

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Publication number
WO1998028101A1
WO1998028101A1 PCT/SG1996/000019 SG9600019W WO9828101A1 WO 1998028101 A1 WO1998028101 A1 WO 1998028101A1 SG 9600019 W SG9600019 W SG 9600019W WO 9828101 A1 WO9828101 A1 WO 9828101A1
Authority
WO
WIPO (PCT)
Prior art keywords
texturing
electro
deburring
tape
magnetic disk
Prior art date
Application number
PCT/SG1996/000019
Other languages
English (en)
Inventor
Tani Kazunori
Original Assignee
Unique Technology International Private Limited
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unique Technology International Private Limited filed Critical Unique Technology International Private Limited
Priority to PCT/SG1996/000019 priority Critical patent/WO1998028101A1/fr
Publication of WO1998028101A1 publication Critical patent/WO1998028101A1/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B24B1/002—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes using electric current
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23H—WORKING OF METAL BY THE ACTION OF A HIGH CONCENTRATION OF ELECTRIC CURRENT ON A WORKPIECE USING AN ELECTRODE WHICH TAKES THE PLACE OF A TOOL; SUCH WORKING COMBINED WITH OTHER FORMS OF WORKING OF METAL
    • B23H5/00—Combined machining
    • B23H5/04—Electrical discharge machining combined with mechanical working
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B19/00—Single-purpose machines or devices for particular grinding operations not covered by any other main group
    • B24B19/02—Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding grooves, e.g. on shafts, in casings, in tubes, homokinetic joint elements
    • B24B19/028—Single-purpose machines or devices for particular grinding operations not covered by any other main group for grinding grooves, e.g. on shafts, in casings, in tubes, homokinetic joint elements for microgrooves or oil spots
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
    • B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers

Definitions

  • This invention relates to the mechanical texturing of the nickel-phosphorus, NiP layer of the magnetic disk aluminium substrate and in the same process electrolytically deburring and smoothing the textured surface profile.
  • the recording densities of magnetic hard disks are increasing rapidly year after year.
  • one of the ways to increase recording density is to decrease the height of the read/write head from the disk surface.
  • a flat and smooth surface morphology is required.
  • a perfectly smooth disk surface causes serious stiction problems.
  • a small amount of roughness or texture is formed to overcome the above stiction problem during contact-start-stop operation.
  • the current method of mechanical texturing involves a piled cloth and a slurry of abrasive grains, such as alumina or diamond, pressing on the disk surfaces as the disk is rotating. Texturing of the data zone is also desirable, and it helps to improve and maintain a high magnetic characteristic, besides enabling a thin lubrication layer to be maintained on the finished disk surfaces.
  • Texturing and electro-deburring of magnetic disk aluminium substrate comprising of a combination of mechanical texturing with free abrasive and electrolytic deburring and smoothening of the textured surfaces, wherein the disk substrate is made the anode, the texturing tape is made the cathode and passing a current through the electrolyte.
  • This regular and smoothened surface profile essentially allows the read/write head to fly at less than 25 nm from the disk surface, enhances the magnetic characteristic and allows a thin lubrication layer to remain on the finished disk surfaces.
  • Figure 1 shows an embodiment of the combined mechanical and electrolytic texturing process
  • Figure 2 shows the various structures of the new conductive texturing tape
  • Figure 3 shows the abrasive grains on the bristles, some of which are lodged into the bristles and cutting into the NiP layer of the Al substrate,
  • Figure 4 shows the irregularity of the textured surface being electrolytically deburred and the surface profile smoothened
  • Figure 5 shows a variation of the combined mechanical and electrolytic texturing process on a single disk substrate.
  • Figure 1 shows one embodiment of the present invention.
  • Figure 2 shows the various structures of the conductive texturing tape 1.
  • the backing cloth 2 or plastic film 2 such as polyethene (PE) or metal film 2 essentially gives the texturing tape 1 its strength and rigidity.
  • the pile fibres 3, substantially less than 5 micron in diameter, are implanted onto an adhesive binder 4 with the aid of an electrostatic field, after which the pile fibres are clipped flat; the piles 3, of length less than 1 mm long, for example, are essentially perpendicular to the backing material.
  • Non-conductive plastic pile materials can be used, such as, polyamide, polyester, polyethene, polyvinyl chloride and so on.
  • Both the conductive binder 4 and metallised backing cloth/film 2A/conductive backing cloth/film 2B are made the cathode, while the substrate 5 is made the anode.
  • the abrasive grains 6, typically diamond, aluminium oxide or silicon oxide, is mixed in an electrolyte 7, typically a mixture of phosphoric acid, H 3 PO 4 , sulphuric acid, H 2 SO 4 , texturing coolant and water.
  • an electrolyte 7 typically a mixture of phosphoric acid, H 3 PO 4 , sulphuric acid, H 2 SO 4 , texturing coolant and water.
  • the texturing process machine is started, a continuous stream or spray of the electrolyte and abrasive slurry is directed at or before the texturing region.
  • the texturing head may oscillate at frequency F, while the Al substrate spins at W revolutions per minute on a spindle 8.
  • an electrolytic cell As the electrolyte flows, an electrolytic cell is set up; a viscous film forms at the NiP surface.
  • the film is effectively thinner over micro-peaks and thicker at micro- valleys.
  • the lower electric resistance, shorter diffusion path and higher charge density at the micro-peaks result in a more rapid dissolution, as shown in Figure 4, resulting in micro-deburring and rounding of the micro-peaks of the NiP surface.
  • This micro- smoothening gives the planar disk surfaces a consistently regular and smooth textured profile, substantially of arithematic roughness Ra less than 10 nm; this enables the read/write head to both overcome the stiction problem during the contact start/stop cycles and allow the head to fly at substantially less than 25 nm from the disk surface, as compared to the current 25 to 50 nm fly height; overcoming the stiction problem means improvement in the drive reliability, while the lower flying height enables higher recording densities.
  • This smooth textured profile also enhances the magnetic characteristics and enables a thin lubrication layer to remain on the finished disk surface.
  • Figure 5 shows a variation of the above invention.
  • the texturing tape 1 can be implanted with a uniform layer of fibres 3, or the implantation can follow any particular patterns. Such patterns can be achieved by depositing the adhesive binder onto the backing material 2, 2A,2B by means of screen printing, after which the fibres 3 are implanted onto the adhesive binder in an electrostatic field.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Abstract

La combinaison de procédés de texturation mécanique avec de l'abrasif libre et une bande (1) de texturation conductrice, avec l'électro-ébavurage et l'électro-lissage de la surface texturée de la couche NiP (5) du substrat de disque en aluminium, ou bien la combinaison de procédés de texturation mécanique avec une bande non conductrice (9) et d'électro-ébavurage et d'électro-lissage avec une bande (1) conductrice fournissent toutes deux une texture de surface régulière avec des microbosses arrondies.
PCT/SG1996/000019 1996-12-20 1996-12-20 Texturation et electro-ebavurage de substrat de disque magnetique WO1998028101A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PCT/SG1996/000019 WO1998028101A1 (fr) 1996-12-20 1996-12-20 Texturation et electro-ebavurage de substrat de disque magnetique

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/SG1996/000019 WO1998028101A1 (fr) 1996-12-20 1996-12-20 Texturation et electro-ebavurage de substrat de disque magnetique

Publications (1)

Publication Number Publication Date
WO1998028101A1 true WO1998028101A1 (fr) 1998-07-02

Family

ID=20429173

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/SG1996/000019 WO1998028101A1 (fr) 1996-12-20 1996-12-20 Texturation et electro-ebavurage de substrat de disque magnetique

Country Status (1)

Country Link
WO (1) WO1998028101A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001036138A1 (fr) * 1999-11-16 2001-05-25 Unique Technology International Pte Ltd Technique de polissage electrolytique et d'ultra-finition par abrasion
WO2002028597A1 (fr) * 2000-10-04 2002-04-11 Speedfam-Ipec Corporation Procede et dispositif de planarisation electrochimique d"une piece
US8727832B2 (en) 2011-09-27 2014-05-20 HGST Netherlands B.V. System, method and apparatus for enhanced cleaning and polishing of magnetic recording disk
CN108127540A (zh) * 2017-12-12 2018-06-08 山东金宝电子股份有限公司 一种电解铜箔生产用阴极辊的抛光工艺

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1988000871A1 (fr) * 1986-08-08 1988-02-11 Ulrich Jordan Procede et dispositif d'usinage electrochimique de pieces
US4866886A (en) * 1987-11-23 1989-09-19 Magnetic Peripherals Inc. Textured lapping plate and process for its manufacture
JPH01246017A (ja) * 1988-03-25 1989-10-02 Shizuoka Seiki Co Ltd ワイヤーカット放電加工物の電解仕上げ加工方法
WO1993014249A1 (fr) * 1992-01-10 1993-07-22 Ian Leonard Procedes et appareils d'usinage electrochimique
JPH07276247A (ja) * 1994-04-11 1995-10-24 Nippon Micro Kooteingu Kk 研磨部材およびその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1988000871A1 (fr) * 1986-08-08 1988-02-11 Ulrich Jordan Procede et dispositif d'usinage electrochimique de pieces
US4866886A (en) * 1987-11-23 1989-09-19 Magnetic Peripherals Inc. Textured lapping plate and process for its manufacture
JPH01246017A (ja) * 1988-03-25 1989-10-02 Shizuoka Seiki Co Ltd ワイヤーカット放電加工物の電解仕上げ加工方法
WO1993014249A1 (fr) * 1992-01-10 1993-07-22 Ian Leonard Procedes et appareils d'usinage electrochimique
JPH07276247A (ja) * 1994-04-11 1995-10-24 Nippon Micro Kooteingu Kk 研磨部材およびその製造方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN, Vol. 13, No. 588, (M-912), page 29; & JP,A,01 246 017 (SHIZUOKA SEIKO CO LTD) 2 October 1989. *
PATENT ABSTRACTS OF JAPAN, Vol. 96, No. 2; & JP,A,07 276 247 (NIPPON MICRO KOOTEINGU KK) 24 October 1995. *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2001036138A1 (fr) * 1999-11-16 2001-05-25 Unique Technology International Pte Ltd Technique de polissage electrolytique et d'ultra-finition par abrasion
WO2002028597A1 (fr) * 2000-10-04 2002-04-11 Speedfam-Ipec Corporation Procede et dispositif de planarisation electrochimique d"une piece
US8727832B2 (en) 2011-09-27 2014-05-20 HGST Netherlands B.V. System, method and apparatus for enhanced cleaning and polishing of magnetic recording disk
CN108127540A (zh) * 2017-12-12 2018-06-08 山东金宝电子股份有限公司 一种电解铜箔生产用阴极辊的抛光工艺
CN108127540B (zh) * 2017-12-12 2021-01-12 山东金宝电子股份有限公司 一种电解铜箔生产用阴极辊的抛光工艺

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