USD868993S1 - Electrode plate for a plasma processing apparatus - Google Patents
Electrode plate for a plasma processing apparatus Download PDFInfo
- Publication number
- USD868993S1 USD868993S1 US29/635,287 US201829635287F USD868993S US D868993 S1 USD868993 S1 US D868993S1 US 201829635287 F US201829635287 F US 201829635287F US D868993 S USD868993 S US D868993S
- Authority
- US
- United States
- Prior art keywords
- processing apparatus
- plasma processing
- electrode plate
- view
- elevational view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2017-18889F JP1598996S (fr) | 2017-08-31 | 2017-08-31 | |
JP2017-018889 | 2017-08-31 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD868993S1 true USD868993S1 (en) | 2019-12-03 |
Family
ID=61274622
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/635,287 Active USD868993S1 (en) | 2017-08-31 | 2018-01-30 | Electrode plate for a plasma processing apparatus |
Country Status (3)
Country | Link |
---|---|
US (1) | USD868993S1 (fr) |
JP (1) | JP1598996S (fr) |
TW (1) | TWD193613S (fr) |
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD939699S1 (en) * | 2019-11-29 | 2021-12-28 | Quanta Computer Inc. | Wireless stethoscope |
USD950738S1 (en) * | 2019-10-18 | 2022-05-03 | Masimo Corporation | Electrode pad |
USD954986S1 (en) * | 2019-10-18 | 2022-06-14 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing device |
USD958401S1 (en) * | 2020-05-27 | 2022-07-19 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing device |
USD962206S1 (en) * | 2020-01-09 | 2022-08-30 | Space Exploration Technologies Corp. | Antenna apparatus |
USD962906S1 (en) * | 2020-01-09 | 2022-09-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD962908S1 (en) * | 2020-07-09 | 2022-09-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD963623S1 (en) * | 2020-01-09 | 2022-09-13 | Space Exploration Technologies Corp. | Antenna apparatus |
USD965789S1 (en) | 2020-05-11 | 2022-10-04 | Masimo Corporation | Blood pressure monitor |
USD967433S1 (en) | 2019-08-16 | 2022-10-18 | Masimo Corporation | Patient monitor |
USD971192S1 (en) * | 2019-06-03 | 2022-11-29 | Space Exploration Technologies Corp. | Antenna apparatus |
TWD222303S (zh) | 2021-05-04 | 2022-12-01 | 南韓商吉佳藍科技股份有限公司 | 花灑頭支撐件 |
USD971900S1 (en) * | 2019-06-03 | 2022-12-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD976242S1 (en) * | 2019-06-03 | 2023-01-24 | Space Exploration Technologies Corp. | Antenna apparatus |
USD979516S1 (en) | 2020-05-11 | 2023-02-28 | Masimo Corporation | Connector |
US11637437B2 (en) | 2019-04-17 | 2023-04-25 | Masimo Corporation | Charging station for physiological monitoring device |
USD985498S1 (en) | 2019-08-16 | 2023-05-09 | Masimo Corporation | Connector |
USD986228S1 (en) * | 2020-01-09 | 2023-05-16 | Space Exploration Technologies Corp. | Antenna apparatus |
USD998817S1 (en) * | 2021-02-26 | 2023-09-12 | AnuCell Biosystems Limited | Assembly of bioreactor components |
USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
USD1008986S1 (en) * | 2021-04-26 | 2023-12-26 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing apparatus |
USD1037462S1 (en) | 2019-08-16 | 2024-07-30 | Masimo Corporation | Holder for a patient monitor |
Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
US20040179323A1 (en) * | 2003-03-11 | 2004-09-16 | Alon Litman | Electrostatic chuck for wafer metrology and inspection equipment |
US20040218339A1 (en) * | 2003-01-29 | 2004-11-04 | Kyocera Corporation | Electrostatic chuck |
USD548705S1 (en) * | 2005-09-29 | 2007-08-14 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD553104S1 (en) * | 2004-04-21 | 2007-10-16 | Tokyo Electron Limited | Absorption board for an electric chuck used in semiconductor manufacture |
USD587339S1 (en) * | 2008-01-31 | 2009-02-24 | Hansgrohe Ag | Showerhead |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
US8206506B2 (en) * | 2008-07-07 | 2012-06-26 | Lam Research Corporation | Showerhead electrode |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD672050S1 (en) * | 2012-01-13 | 2012-12-04 | Samsung Electronics Co., Ltd. | Disk for a medical testing machine |
JP1545406S (fr) | 2015-06-16 | 2016-03-14 | ||
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD789888S1 (en) * | 2016-01-08 | 2017-06-20 | Asm Ip Holding B.V. | Electrode plate for semiconductor manufacturing apparatus |
USD790039S1 (en) * | 2016-04-08 | 2017-06-20 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD790489S1 (en) * | 2015-07-08 | 2017-06-27 | Ebara Corporation | Vacuum contact pad |
USD793572S1 (en) * | 2015-06-10 | 2017-08-01 | Tokyo Electron Limited | Electrode plate for plasma processing apparatus |
USD793526S1 (en) * | 2016-04-08 | 2017-08-01 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
-
2017
- 2017-08-31 JP JPD2017-18889F patent/JP1598996S/ja active Active
-
2018
- 2018-01-30 US US29/635,287 patent/USD868993S1/en active Active
- 2018-01-31 TW TW107300618F patent/TWD193613S/zh unknown
Patent Citations (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD411516S (en) * | 1996-03-15 | 1999-06-29 | Tokyo Electron Limited | Gas diffusion plate for electrode of semiconductor wafer processing apparatus |
US20040218339A1 (en) * | 2003-01-29 | 2004-11-04 | Kyocera Corporation | Electrostatic chuck |
US20040179323A1 (en) * | 2003-03-11 | 2004-09-16 | Alon Litman | Electrostatic chuck for wafer metrology and inspection equipment |
USD553104S1 (en) * | 2004-04-21 | 2007-10-16 | Tokyo Electron Limited | Absorption board for an electric chuck used in semiconductor manufacture |
USD548705S1 (en) * | 2005-09-29 | 2007-08-14 | Tokyo Electron Limited | Attracting disc for an electrostatic chuck for semiconductor production |
USD587339S1 (en) * | 2008-01-31 | 2009-02-24 | Hansgrohe Ag | Showerhead |
US8206506B2 (en) * | 2008-07-07 | 2012-06-26 | Lam Research Corporation | Showerhead electrode |
USD667561S1 (en) * | 2009-11-13 | 2012-09-18 | 3M Innovative Properties Company | Sample processing disk cover |
USD638550S1 (en) * | 2009-11-13 | 2011-05-24 | 3M Innovative Properties Company | Sample processing disk cover |
USD672050S1 (en) * | 2012-01-13 | 2012-12-04 | Samsung Electronics Co., Ltd. | Disk for a medical testing machine |
USD793572S1 (en) * | 2015-06-10 | 2017-08-01 | Tokyo Electron Limited | Electrode plate for plasma processing apparatus |
JP1545406S (fr) | 2015-06-16 | 2016-03-14 | ||
USD790489S1 (en) * | 2015-07-08 | 2017-06-27 | Ebara Corporation | Vacuum contact pad |
USD787458S1 (en) * | 2015-11-18 | 2017-05-23 | Asm Ip Holding B.V. | Gas supply plate for semiconductor manufacturing apparatus |
USD789888S1 (en) * | 2016-01-08 | 2017-06-20 | Asm Ip Holding B.V. | Electrode plate for semiconductor manufacturing apparatus |
USD790039S1 (en) * | 2016-04-08 | 2017-06-20 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD793526S1 (en) * | 2016-04-08 | 2017-08-01 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
Non-Patent Citations (5)
Title |
---|
Bialetti Moka Express Espresso Gasket & Filter Replacements. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: https://www.surlatable.com/product/PRO-449611/Bialetti+Moka+Express+Espresso+Gasket+and+Filter+Replacements. * |
Isozaki et al., Design U.S. Appl. No. 29/635,292, filed Jan. 30, 2018. |
Isozaki et al., Design U.S. Appl. No. 29/635,296, filed Jan. 30, 2018. |
Okuda et al., Design U.S. Appl. No. 29/635,289, filed Jan. 30, 2018. |
Silicon Part. Online, published date unknown. Retrieved on Apr. 18, 2019 from URL: http://www.daewonspic.com/english/si_en.jsp. * |
Cited By (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11637437B2 (en) | 2019-04-17 | 2023-04-25 | Masimo Corporation | Charging station for physiological monitoring device |
US11986305B2 (en) | 2019-04-17 | 2024-05-21 | Masimo Corporation | Liquid inhibiting air intake for blood pressure monitor |
US11701043B2 (en) | 2019-04-17 | 2023-07-18 | Masimo Corporation | Blood pressure monitor attachment assembly |
US11678829B2 (en) | 2019-04-17 | 2023-06-20 | Masimo Corporation | Physiological monitoring device attachment assembly |
USD971900S1 (en) * | 2019-06-03 | 2022-12-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD1012070S1 (en) | 2019-06-03 | 2024-01-23 | Space Exploration Technologies Corp. | Antenna apparatus |
USD971192S1 (en) * | 2019-06-03 | 2022-11-29 | Space Exploration Technologies Corp. | Antenna apparatus |
USD976242S1 (en) * | 2019-06-03 | 2023-01-24 | Space Exploration Technologies Corp. | Antenna apparatus |
USD985498S1 (en) | 2019-08-16 | 2023-05-09 | Masimo Corporation | Connector |
USD1037462S1 (en) | 2019-08-16 | 2024-07-30 | Masimo Corporation | Holder for a patient monitor |
USD967433S1 (en) | 2019-08-16 | 2022-10-18 | Masimo Corporation | Patient monitor |
USD950738S1 (en) * | 2019-10-18 | 2022-05-03 | Masimo Corporation | Electrode pad |
USD954986S1 (en) * | 2019-10-18 | 2022-06-14 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing device |
USD939699S1 (en) * | 2019-11-29 | 2021-12-28 | Quanta Computer Inc. | Wireless stethoscope |
USD962206S1 (en) * | 2020-01-09 | 2022-08-30 | Space Exploration Technologies Corp. | Antenna apparatus |
USD962906S1 (en) * | 2020-01-09 | 2022-09-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD986228S1 (en) * | 2020-01-09 | 2023-05-16 | Space Exploration Technologies Corp. | Antenna apparatus |
USD963623S1 (en) * | 2020-01-09 | 2022-09-13 | Space Exploration Technologies Corp. | Antenna apparatus |
USD979516S1 (en) | 2020-05-11 | 2023-02-28 | Masimo Corporation | Connector |
USD965789S1 (en) | 2020-05-11 | 2022-10-04 | Masimo Corporation | Blood pressure monitor |
USD958401S1 (en) * | 2020-05-27 | 2022-07-19 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing device |
USD962908S1 (en) * | 2020-07-09 | 2022-09-06 | Space Exploration Technologies Corp. | Antenna apparatus |
USD998817S1 (en) * | 2021-02-26 | 2023-09-12 | AnuCell Biosystems Limited | Assembly of bioreactor components |
USD1005245S1 (en) * | 2021-04-19 | 2023-11-21 | Hitachi High-Tech Corporation | Electrode cover for a plasma processing apparatus |
USD1008986S1 (en) * | 2021-04-26 | 2023-12-26 | Hitachi High-Tech Corporation | Ion shield plate for plasma processing apparatus |
TWD222303S (zh) | 2021-05-04 | 2022-12-01 | 南韓商吉佳藍科技股份有限公司 | 花灑頭支撐件 |
Also Published As
Publication number | Publication date |
---|---|
TWD193613S (zh) | 2018-10-21 |
JP1598996S (fr) | 2018-03-05 |
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Legal Events
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FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |