USD846514S1 - Boat of substrate processing apparatus - Google Patents
Boat of substrate processing apparatus Download PDFInfo
- Publication number
- USD846514S1 USD846514S1 US29/646,328 US201829646328F USD846514S US D846514 S1 USD846514 S1 US D846514S1 US 201829646328 F US201829646328 F US 201829646328F US D846514 S USD846514 S US D846514S
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- US
- United States
- Prior art keywords
- boat
- processing apparatus
- substrate processing
- view
- elevational view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The broken lines shown in the drawing views of FIG. 8 and FIG. 9 form no part of the claimed design.
Claims (1)
- The ornamental design for a boat of substrate processing apparatus, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/646,328 USD846514S1 (en) | 2018-05-03 | 2018-05-03 | Boat of substrate processing apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US29/646,328 USD846514S1 (en) | 2018-05-03 | 2018-05-03 | Boat of substrate processing apparatus |
Publications (1)
Publication Number | Publication Date |
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USD846514S1 true USD846514S1 (en) | 2019-04-23 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US29/646,328 Active USD846514S1 (en) | 2018-05-03 | 2018-05-03 | Boat of substrate processing apparatus |
Country Status (1)
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US (1) | USD846514S1 (en) |
Cited By (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD893438S1 (en) * | 2017-08-21 | 2020-08-18 | Tokyo Electron Limited | Wafer boat |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD908102S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
USD908103S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
US20210035835A1 (en) * | 2019-07-31 | 2021-02-04 | Kokusai Electric Corporation | Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device |
USD920935S1 (en) * | 2018-09-20 | 2021-06-01 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
USD939459S1 (en) * | 2019-08-07 | 2021-12-28 | Kokusai Electric Corporation | Boat for wafer processing apparatus |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD965542S1 (en) * | 2020-03-19 | 2022-10-04 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1019581S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
USD1019582S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
USD1019583S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
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USD366868S (en) * | 1993-09-29 | 1996-02-06 | Tokyo Electron Kabushiki Kaisha | Wafer boat or rack |
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USD411176S (en) * | 1997-08-20 | 1999-06-22 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
US6062853A (en) * | 1996-02-29 | 2000-05-16 | Tokyo Electron Limited | Heat-treating boat for semiconductor wafers |
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US6099302A (en) * | 1998-06-23 | 2000-08-08 | Samsung Electronics Co., Ltd. | Semiconductor wafer boat with reduced wafer contact area |
US6099054A (en) * | 1998-10-28 | 2000-08-08 | Custom Metalcraft, Inc. | Latch dog assembly |
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US20020130061A1 (en) * | 2000-11-02 | 2002-09-19 | Hengst Richard R. | Apparatus and method of making a slip free wafer boat |
US20020187023A1 (en) * | 2001-05-11 | 2002-12-12 | Itsuo Araki | Vertical type wafer supporting jig |
US20030024888A1 (en) * | 2001-07-16 | 2003-02-06 | Rohm And Haas Company | Wafer holding apparatus |
US20050145584A1 (en) * | 2004-01-06 | 2005-07-07 | Buckley Richard F. | Wafer boat with interference fit wafer supports |
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US7033168B1 (en) * | 2005-01-24 | 2006-04-25 | Memc Electronic Materials, Inc. | Semiconductor wafer boat for a vertical furnace |
USD570309S1 (en) * | 2006-10-25 | 2008-06-03 | Tokyo Electron Limited | Wafer boat |
USD570308S1 (en) * | 2006-05-01 | 2008-06-03 | Tokyo Electron Limited | Wafer boat |
USD580894S1 (en) * | 2006-05-01 | 2008-11-18 | Tokyo Electron Limited | Wafer boat |
US7484958B2 (en) * | 2003-07-16 | 2009-02-03 | Shin-Etsu Handotai Co., Ltd. | Vertical boat for heat treatment and method for producing the same |
USD600222S1 (en) * | 2008-03-28 | 2009-09-15 | Tokyo Electron Limited | Wafer boat |
USD600221S1 (en) * | 2008-03-28 | 2009-09-15 | Tokyo Electron Limited | Wafer boat |
US20090250005A1 (en) * | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process |
USD616396S1 (en) * | 2009-03-12 | 2010-05-25 | Tokyo Electron Limited | Pedestal of heat insulating cylinder for manufacturing semiconductor wafers |
US7857140B2 (en) * | 2005-12-06 | 2010-12-28 | Fujitsu Semiconductor Limited | Semiconductor wafer storage case and semiconductor wafer storing method |
USD655255S1 (en) * | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
USD655682S1 (en) * | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
USD734730S1 (en) * | 2012-12-27 | 2015-07-21 | Hitachi Kokusai Electric Inc. | Boat of substrate processing apparatus |
USD737785S1 (en) * | 2013-07-29 | 2015-09-01 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD738329S1 (en) * | 2013-07-29 | 2015-09-08 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD747279S1 (en) * | 2013-07-29 | 2016-01-12 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
JP1563649S (en) | 2016-02-12 | 2016-11-21 |
-
2018
- 2018-05-03 US US29/646,328 patent/USD846514S1/en active Active
Patent Citations (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD366868S (en) * | 1993-09-29 | 1996-02-06 | Tokyo Electron Kabushiki Kaisha | Wafer boat or rack |
USD378675S (en) * | 1995-05-30 | 1997-04-01 | Tokyo Electron Limited | Wafer boat |
USD378823S (en) * | 1995-05-30 | 1997-04-15 | Tokyo Electron Limited | Wafer boat |
USD380454S (en) * | 1995-05-30 | 1997-07-01 | Tokyo Electron Limited | Wafer boat |
US5752609A (en) * | 1996-02-06 | 1998-05-19 | Tokyo Electron Limited | Wafer boat |
US6065615A (en) * | 1996-02-28 | 2000-05-23 | Asahi Glass Company, Ltd. | Vertical wafer boat |
US6062853A (en) * | 1996-02-29 | 2000-05-16 | Tokyo Electron Limited | Heat-treating boat for semiconductor wafers |
USD404015S (en) * | 1997-01-31 | 1999-01-12 | Tokyo Electron Ltd. | Wafer boat for use in a semiconductor wafer heat processing apparatus |
USD411176S (en) * | 1997-08-20 | 1999-06-22 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
USD409158S (en) * | 1997-08-20 | 1999-05-04 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
USD404371S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Wafer boat for use in a semiconductor wafer heat processing apparatus |
US6099302A (en) * | 1998-06-23 | 2000-08-08 | Samsung Electronics Co., Ltd. | Semiconductor wafer boat with reduced wafer contact area |
US6099054A (en) * | 1998-10-28 | 2000-08-08 | Custom Metalcraft, Inc. | Latch dog assembly |
US6287112B1 (en) * | 2000-03-30 | 2001-09-11 | Asm International, N.V. | Wafer boat |
US6341935B1 (en) * | 2000-06-14 | 2002-01-29 | Taiwan Semiconductor Manufacturing Company, Ltd. | Wafer boat having improved wafer holding capability |
US20020130061A1 (en) * | 2000-11-02 | 2002-09-19 | Hengst Richard R. | Apparatus and method of making a slip free wafer boat |
US20020092815A1 (en) * | 2001-01-18 | 2002-07-18 | Hong-Guen Kim | Semiconductor wafer boat having stackable independently replaceable boat parts and vertical heat-treating apparatus comprising the same |
US20020113027A1 (en) * | 2001-02-20 | 2002-08-22 | Mitsubishi Denki Kabushiki Kaisha | Retainer for use in heat treatment of substrate, substrate heat treatment equipment, and method of manufacturing the retainer |
US20020187023A1 (en) * | 2001-05-11 | 2002-12-12 | Itsuo Araki | Vertical type wafer supporting jig |
US20030024888A1 (en) * | 2001-07-16 | 2003-02-06 | Rohm And Haas Company | Wafer holding apparatus |
US6966771B2 (en) * | 2001-12-27 | 2005-11-22 | Tokyo Electron Limited | Boat for heat treatment and vertical heat treatment equipment |
US7484958B2 (en) * | 2003-07-16 | 2009-02-03 | Shin-Etsu Handotai Co., Ltd. | Vertical boat for heat treatment and method for producing the same |
US20050145584A1 (en) * | 2004-01-06 | 2005-07-07 | Buckley Richard F. | Wafer boat with interference fit wafer supports |
US7033168B1 (en) * | 2005-01-24 | 2006-04-25 | Memc Electronic Materials, Inc. | Semiconductor wafer boat for a vertical furnace |
US7857140B2 (en) * | 2005-12-06 | 2010-12-28 | Fujitsu Semiconductor Limited | Semiconductor wafer storage case and semiconductor wafer storing method |
USD570308S1 (en) * | 2006-05-01 | 2008-06-03 | Tokyo Electron Limited | Wafer boat |
USD580894S1 (en) * | 2006-05-01 | 2008-11-18 | Tokyo Electron Limited | Wafer boat |
USD570309S1 (en) * | 2006-10-25 | 2008-06-03 | Tokyo Electron Limited | Wafer boat |
USD600222S1 (en) * | 2008-03-28 | 2009-09-15 | Tokyo Electron Limited | Wafer boat |
USD600221S1 (en) * | 2008-03-28 | 2009-09-15 | Tokyo Electron Limited | Wafer boat |
US20090250005A1 (en) * | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process |
USD616396S1 (en) * | 2009-03-12 | 2010-05-25 | Tokyo Electron Limited | Pedestal of heat insulating cylinder for manufacturing semiconductor wafers |
USD655255S1 (en) * | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
USD655682S1 (en) * | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
USD734730S1 (en) * | 2012-12-27 | 2015-07-21 | Hitachi Kokusai Electric Inc. | Boat of substrate processing apparatus |
USD737785S1 (en) * | 2013-07-29 | 2015-09-01 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD738329S1 (en) * | 2013-07-29 | 2015-09-08 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
USD747279S1 (en) * | 2013-07-29 | 2016-01-12 | Hitachi Kokusai Electric Inc. | Boat for substrate processing apparatus |
JP1563649S (en) | 2016-02-12 | 2016-11-21 |
Non-Patent Citations (1)
Title |
---|
U.S. Appl. No. 29/573,943, filed Aug. 10, 2016 (Corresponds to JP-S-1563649). |
Cited By (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD893438S1 (en) * | 2017-08-21 | 2020-08-18 | Tokyo Electron Limited | Wafer boat |
USD894137S1 (en) | 2017-10-05 | 2020-08-25 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD868124S1 (en) * | 2017-12-11 | 2019-11-26 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD946638S1 (en) | 2017-12-11 | 2022-03-22 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD902165S1 (en) | 2018-03-09 | 2020-11-17 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD920935S1 (en) * | 2018-09-20 | 2021-06-01 | Kokusai Electric Corporation | Boat for substrate processing apparatus |
USD908102S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
USD908103S1 (en) * | 2019-02-20 | 2021-01-19 | Veeco Instruments Inc. | Transportable semiconductor wafer rack |
US11929272B2 (en) * | 2019-07-31 | 2024-03-12 | Kokusai Electric Corporation | Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device |
US20210035835A1 (en) * | 2019-07-31 | 2021-02-04 | Kokusai Electric Corporation | Substrate processing apparatus, substrate support, and method of manufacturing semiconductor device |
USD939459S1 (en) * | 2019-08-07 | 2021-12-28 | Kokusai Electric Corporation | Boat for wafer processing apparatus |
USD908645S1 (en) | 2019-08-26 | 2021-01-26 | Applied Materials, Inc. | Sputtering target for a physical vapor deposition chamber |
USD965542S1 (en) * | 2020-03-19 | 2022-10-04 | Kokusai Electric Corporation | Boat of substrate processing apparatus |
USD970566S1 (en) | 2020-03-23 | 2022-11-22 | Applied Materials, Inc. | Sputter target for a physical vapor deposition chamber |
USD940765S1 (en) | 2020-12-02 | 2022-01-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD966357S1 (en) | 2020-12-02 | 2022-10-11 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1007449S1 (en) | 2021-05-07 | 2023-12-12 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD1019581S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
USD1019582S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
USD1019583S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
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