|
US10844486B2
(en)
|
2009-04-06 |
2020-11-24 |
Asm Ip Holding B.V. |
Semiconductor processing reactor and components thereof
|
|
US10804098B2
(en)
|
2009-08-14 |
2020-10-13 |
Asm Ip Holding B.V. |
Systems and methods for thin-film deposition of metal oxides using excited nitrogen-oxygen species
|
|
US10707106B2
(en)
|
2011-06-06 |
2020-07-07 |
Asm Ip Holding B.V. |
High-throughput semiconductor-processing apparatus equipped with multiple dual-chamber modules
|
|
US10854498B2
(en)
|
2011-07-15 |
2020-12-01 |
Asm Ip Holding B.V. |
Wafer-supporting device and method for producing same
|
|
US11725277B2
(en)
|
2011-07-20 |
2023-08-15 |
Asm Ip Holding B.V. |
Pressure transmitter for a semiconductor processing environment
|
|
US10832903B2
(en)
|
2011-10-28 |
2020-11-10 |
Asm Ip Holding B.V. |
Process feed management for semiconductor substrate processing
|
|
US11501956B2
(en)
|
2012-10-12 |
2022-11-15 |
Asm Ip Holding B.V. |
Semiconductor reaction chamber showerhead
|
|
US10714315B2
(en)
|
2012-10-12 |
2020-07-14 |
Asm Ip Holdings B.V. |
Semiconductor reaction chamber showerhead
|
|
US11967488B2
(en)
|
2013-02-01 |
2024-04-23 |
Asm Ip Holding B.V. |
Method for treatment of deposition reactor
|
|
USD793976S1
(en)
|
2013-05-15 |
2017-08-08 |
Ebara Corporation |
Substrate retaining ring
|
|
USD766849S1
(en)
*
|
2013-05-15 |
2016-09-20 |
Ebara Corporation |
Substrate retaining ring
|
|
USD741823S1
(en)
*
|
2013-07-10 |
2015-10-27 |
Hitachi Kokusai Electric Inc. |
Vaporizer for substrate processing apparatus
|
|
US10683571B2
(en)
|
2014-02-25 |
2020-06-16 |
Asm Ip Holding B.V. |
Gas supply manifold and method of supplying gases to chamber using same
|
|
US10604847B2
(en)
|
2014-03-18 |
2020-03-31 |
Asm Ip Holding B.V. |
Gas distribution system, reactor including the system, and methods of using the same
|
|
US11015245B2
(en)
|
2014-03-19 |
2021-05-25 |
Asm Ip Holding B.V. |
Gas-phase reactor and system having exhaust plenum and components thereof
|
|
US10858737B2
(en)
|
2014-07-28 |
2020-12-08 |
Asm Ip Holding B.V. |
Showerhead assembly and components thereof
|
|
US10787741B2
(en)
|
2014-08-21 |
2020-09-29 |
Asm Ip Holding B.V. |
Method and system for in situ formation of gas-phase compounds
|
|
US11795545B2
(en)
|
2014-10-07 |
2023-10-24 |
Asm Ip Holding B.V. |
Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
|
|
US10561975B2
(en)
|
2014-10-07 |
2020-02-18 |
Asm Ip Holdings B.V. |
Variable conductance gas distribution apparatus and method
|
|
US10941490B2
(en)
|
2014-10-07 |
2021-03-09 |
Asm Ip Holding B.V. |
Multiple temperature range susceptor, assembly, reactor and system including the susceptor, and methods of using the same
|
|
US11742189B2
(en)
|
2015-03-12 |
2023-08-29 |
Asm Ip Holding B.V. |
Multi-zone reactor, system including the reactor, and method of using the same
|
|
USD770992S1
(en)
|
2015-06-12 |
2016-11-08 |
Hitachi High-Technologies Corporation |
Electrode cover for a plasma processing apparatus
|
|
US11242598B2
(en)
|
2015-06-26 |
2022-02-08 |
Asm Ip Holding B.V. |
Structures including metal carbide material, devices including the structures, and methods of forming same
|
|
US10600673B2
(en)
|
2015-07-07 |
2020-03-24 |
Asm Ip Holding B.V. |
Magnetic susceptor to baseplate seal
|
|
USD802472S1
(en)
*
|
2015-08-06 |
2017-11-14 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment
|
|
USD803802S1
(en)
*
|
2015-08-18 |
2017-11-28 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment
|
|
USD795208S1
(en)
*
|
2015-08-18 |
2017-08-22 |
Tokyo Electron Limited |
Electrostatic chuck for semiconductor manufacturing equipment
|
|
USD799437S1
(en)
*
|
2015-08-25 |
2017-10-10 |
Ebara Corporation |
Substrate retaining ring
|
|
US11233133B2
(en)
|
2015-10-21 |
2022-01-25 |
Asm Ip Holding B.V. |
NbMC layers
|
|
US11139308B2
(en)
|
2015-12-29 |
2021-10-05 |
Asm Ip Holding B.V. |
Atomic layer deposition of III-V compounds to form V-NAND devices
|
|
US11956977B2
(en)
|
2015-12-29 |
2024-04-09 |
Asm Ip Holding B.V. |
Atomic layer deposition of III-V compounds to form V-NAND devices
|
|
US11676812B2
(en)
|
2016-02-19 |
2023-06-13 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on top/bottom portions
|
|
US10720322B2
(en)
|
2016-02-19 |
2020-07-21 |
Asm Ip Holding B.V. |
Method for forming silicon nitride film selectively on top surface
|
|
USD810705S1
(en)
*
|
2016-04-01 |
2018-02-20 |
Veeco Instruments Inc. |
Self-centering wafer carrier for chemical vapor deposition
|
|
USD797691S1
(en)
*
|
2016-04-14 |
2017-09-19 |
Applied Materials, Inc. |
Composite edge ring
|
|
US10865475B2
(en)
|
2016-04-21 |
2020-12-15 |
Asm Ip Holding B.V. |
Deposition of metal borides and silicides
|
|
US10851456B2
(en)
|
2016-04-21 |
2020-12-01 |
Asm Ip Holding B.V. |
Deposition of metal borides
|
|
US10665452B2
(en)
|
2016-05-02 |
2020-05-26 |
Asm Ip Holdings B.V. |
Source/drain performance through conformal solid state doping
|
|
US11101370B2
(en)
|
2016-05-02 |
2021-08-24 |
Asm Ip Holding B.V. |
Method of forming a germanium oxynitride film
|
|
US11453943B2
(en)
|
2016-05-25 |
2022-09-27 |
Asm Ip Holding B.V. |
Method for forming carbon-containing silicon/metal oxide or nitride film by ALD using silicon precursor and hydrocarbon precursor
|
|
US11649546B2
(en)
|
2016-07-08 |
2023-05-16 |
Asm Ip Holding B.V. |
Organic reactants for atomic layer deposition
|
|
US11749562B2
(en)
|
2016-07-08 |
2023-09-05 |
Asm Ip Holding B.V. |
Selective deposition method to form air gaps
|
|
US11094582B2
(en)
|
2016-07-08 |
2021-08-17 |
Asm Ip Holding B.V. |
Selective deposition method to form air gaps
|
|
US10714385B2
(en)
|
2016-07-19 |
2020-07-14 |
Asm Ip Holding B.V. |
Selective deposition of tungsten
|
|
US11107676B2
(en)
|
2016-07-28 |
2021-08-31 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
|
US10741385B2
(en)
|
2016-07-28 |
2020-08-11 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
|
US11694892B2
(en)
|
2016-07-28 |
2023-07-04 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
|
US11205585B2
(en)
|
2016-07-28 |
2021-12-21 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method of operating the same
|
|
US11610775B2
(en)
|
2016-07-28 |
2023-03-21 |
Asm Ip Holding B.V. |
Method and apparatus for filling a gap
|
|
US10643826B2
(en)
|
2016-10-26 |
2020-05-05 |
Asm Ip Holdings B.V. |
Methods for thermally calibrating reaction chambers
|
|
US10943771B2
(en)
|
2016-10-26 |
2021-03-09 |
Asm Ip Holding B.V. |
Methods for thermally calibrating reaction chambers
|
|
US11532757B2
(en)
|
2016-10-27 |
2022-12-20 |
Asm Ip Holding B.V. |
Deposition of charge trapping layers
|
|
US10643904B2
(en)
|
2016-11-01 |
2020-05-05 |
Asm Ip Holdings B.V. |
Methods for forming a semiconductor device and related semiconductor device structures
|
|
US10714350B2
(en)
|
2016-11-01 |
2020-07-14 |
ASM IP Holdings, B.V. |
Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
|
US10720331B2
(en)
|
2016-11-01 |
2020-07-21 |
ASM IP Holdings, B.V. |
Methods for forming a transition metal nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
|
US11810788B2
(en)
|
2016-11-01 |
2023-11-07 |
Asm Ip Holding B.V. |
Methods for forming a transition metal niobium nitride film on a substrate by atomic layer deposition and related semiconductor device structures
|
|
US10622375B2
(en)
|
2016-11-07 |
2020-04-14 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by using the method
|
|
US10644025B2
(en)
|
2016-11-07 |
2020-05-05 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by using the method
|
|
US10934619B2
(en)
|
2016-11-15 |
2021-03-02 |
Asm Ip Holding B.V. |
Gas supply unit and substrate processing apparatus including the gas supply unit
|
|
US11396702B2
(en)
|
2016-11-15 |
2022-07-26 |
Asm Ip Holding B.V. |
Gas supply unit and substrate processing apparatus including the gas supply unit
|
|
USD913977S1
(en)
|
2016-12-12 |
2021-03-23 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing
|
|
USD839224S1
(en)
*
|
2016-12-12 |
2019-01-29 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing
|
|
US11222772B2
(en)
|
2016-12-14 |
2022-01-11 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11970766B2
(en)
|
2016-12-15 |
2024-04-30 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus
|
|
US11581186B2
(en)
|
2016-12-15 |
2023-02-14 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus
|
|
US11447861B2
(en)
|
2016-12-15 |
2022-09-20 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
|
US11851755B2
(en)
|
2016-12-15 |
2023-12-26 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
|
US12000042B2
(en)
|
2016-12-15 |
2024-06-04 |
Asm Ip Holding B.V. |
Sequential infiltration synthesis apparatus and a method of forming a patterned structure
|
|
US11001925B2
(en)
|
2016-12-19 |
2021-05-11 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11251035B2
(en)
|
2016-12-22 |
2022-02-15 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
|
US10784102B2
(en)
|
2016-12-22 |
2020-09-22 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
|
US10867788B2
(en)
|
2016-12-28 |
2020-12-15 |
Asm Ip Holding B.V. |
Method of forming a structure on a substrate
|
|
US11390950B2
(en)
|
2017-01-10 |
2022-07-19 |
Asm Ip Holding B.V. |
Reactor system and method to reduce residue buildup during a film deposition process
|
|
US12043899B2
(en)
|
2017-01-10 |
2024-07-23 |
Asm Ip Holding B.V. |
Reactor system and method to reduce residue buildup during a film deposition process
|
|
USD840364S1
(en)
*
|
2017-01-31 |
2019-02-12 |
Hitachi High-Technologies Corporation |
Electrode cover for a plasma processing apparatus
|
|
USD827592S1
(en)
*
|
2017-01-31 |
2018-09-04 |
Hitachi High-Technologies Corporation |
Electrode cover for a plasma processing apparatus
|
|
US10655221B2
(en)
|
2017-02-09 |
2020-05-19 |
Asm Ip Holding B.V. |
Method for depositing oxide film by thermal ALD and PEALD
|
|
US12106965B2
(en)
|
2017-02-15 |
2024-10-01 |
Asm Ip Holding B.V. |
Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
|
|
US11410851B2
(en)
|
2017-02-15 |
2022-08-09 |
Asm Ip Holding B.V. |
Methods for forming a metallic film on a substrate by cyclical deposition and related semiconductor device structures
|
|
US11658030B2
(en)
|
2017-03-29 |
2023-05-23 |
Asm Ip Holding B.V. |
Method for forming doped metal oxide films on a substrate by cyclical deposition and related semiconductor device structures
|
|
USD876504S1
(en)
*
|
2017-04-03 |
2020-02-25 |
Asm Ip Holding B.V. |
Exhaust flow control ring for semiconductor deposition apparatus
|
|
US10950432B2
(en)
|
2017-04-25 |
2021-03-16 |
Asm Ip Holding B.V. |
Method of depositing thin film and method of manufacturing semiconductor device
|
|
US10714335B2
(en)
|
2017-04-25 |
2020-07-14 |
Asm Ip Holding B.V. |
Method of depositing thin film and method of manufacturing semiconductor device
|
|
US10770286B2
(en)
|
2017-05-08 |
2020-09-08 |
Asm Ip Holdings B.V. |
Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
|
|
US11848200B2
(en)
|
2017-05-08 |
2023-12-19 |
Asm Ip Holding B.V. |
Methods for selectively forming a silicon nitride film on a substrate and related semiconductor device structures
|
|
US10892156B2
(en)
|
2017-05-08 |
2021-01-12 |
Asm Ip Holding B.V. |
Methods for forming a silicon nitride film on a substrate and related semiconductor device structures
|
|
US12040200B2
(en)
|
2017-06-20 |
2024-07-16 |
Asm Ip Holding B.V. |
Semiconductor processing apparatus and methods for calibrating a semiconductor processing apparatus
|
|
US11976361B2
(en)
|
2017-06-28 |
2024-05-07 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
|
|
US11306395B2
(en)
|
2017-06-28 |
2022-04-19 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal nitride film on a substrate by atomic layer deposition and related deposition apparatus
|
|
US10685834B2
(en)
|
2017-07-05 |
2020-06-16 |
Asm Ip Holdings B.V. |
Methods for forming a silicon germanium tin layer and related semiconductor device structures
|
|
US10734497B2
(en)
|
2017-07-18 |
2020-08-04 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor device structure and related semiconductor device structures
|
|
US11164955B2
(en)
|
2017-07-18 |
2021-11-02 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor device structure and related semiconductor device structures
|
|
US11695054B2
(en)
|
2017-07-18 |
2023-07-04 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor device structure and related semiconductor device structures
|
|
US11374112B2
(en)
|
2017-07-19 |
2022-06-28 |
Asm Ip Holding B.V. |
Method for depositing a group IV semiconductor and related semiconductor device structures
|
|
US11004977B2
(en)
|
2017-07-19 |
2021-05-11 |
Asm Ip Holding B.V. |
Method for depositing a group IV semiconductor and related semiconductor device structures
|
|
US11018002B2
(en)
|
2017-07-19 |
2021-05-25 |
Asm Ip Holding B.V. |
Method for selectively depositing a Group IV semiconductor and related semiconductor device structures
|
|
US11802338B2
(en)
|
2017-07-26 |
2023-10-31 |
Asm Ip Holding B.V. |
Chemical treatment, deposition and/or infiltration apparatus and method for using the same
|
|
US10590535B2
(en)
|
2017-07-26 |
2020-03-17 |
Asm Ip Holdings B.V. |
Chemical treatment, deposition and/or infiltration apparatus and method for using the same
|
|
US11587821B2
(en)
|
2017-08-08 |
2023-02-21 |
Asm Ip Holding B.V. |
Substrate lift mechanism and reactor including same
|
|
US10770336B2
(en)
|
2017-08-08 |
2020-09-08 |
Asm Ip Holding B.V. |
Substrate lift mechanism and reactor including same
|
|
US11417545B2
(en)
|
2017-08-08 |
2022-08-16 |
Asm Ip Holding B.V. |
Radiation shield
|
|
US10692741B2
(en)
|
2017-08-08 |
2020-06-23 |
Asm Ip Holdings B.V. |
Radiation shield
|
|
US11769682B2
(en)
|
2017-08-09 |
2023-09-26 |
Asm Ip Holding B.V. |
Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
|
|
US11139191B2
(en)
|
2017-08-09 |
2021-10-05 |
Asm Ip Holding B.V. |
Storage apparatus for storing cassettes for substrates and processing apparatus equipped therewith
|
|
US10672636B2
(en)
|
2017-08-09 |
2020-06-02 |
Asm Ip Holding B.V. |
Cassette holder assembly for a substrate cassette and holding member for use in such assembly
|
|
USD900036S1
(en)
|
2017-08-24 |
2020-10-27 |
Asm Ip Holding B.V. |
Heater electrical connector and adapter
|
|
US11830730B2
(en)
|
2017-08-29 |
2023-11-28 |
Asm Ip Holding B.V. |
Layer forming method and apparatus
|
|
US11056344B2
(en)
|
2017-08-30 |
2021-07-06 |
Asm Ip Holding B.V. |
Layer forming method
|
|
US11581220B2
(en)
|
2017-08-30 |
2023-02-14 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
|
|
US11069510B2
(en)
|
2017-08-30 |
2021-07-20 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11295980B2
(en)
|
2017-08-30 |
2022-04-05 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum metal film over a dielectric surface of a substrate by a cyclical deposition process and related semiconductor device structures
|
|
USD871609S1
(en)
*
|
2017-08-31 |
2019-12-31 |
Hitachi High-Technologies Corporation |
Electrode plate peripheral ring for a plasma processing apparatus
|
|
US11993843B2
(en)
|
2017-08-31 |
2024-05-28 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US10928731B2
(en)
|
2017-09-21 |
2021-02-23 |
Asm Ip Holding B.V. |
Method of sequential infiltration synthesis treatment of infiltrateable material and structures and devices formed using same
|
|
US10844484B2
(en)
|
2017-09-22 |
2020-11-24 |
Asm Ip Holding B.V. |
Apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
|
|
US11387120B2
(en)
|
2017-09-28 |
2022-07-12 |
Asm Ip Holding B.V. |
Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
|
|
US10658205B2
(en)
|
2017-09-28 |
2020-05-19 |
Asm Ip Holdings B.V. |
Chemical dispensing apparatus and methods for dispensing a chemical to a reaction chamber
|
|
US11094546B2
(en)
|
2017-10-05 |
2021-08-17 |
Asm Ip Holding B.V. |
Method for selectively depositing a metallic film on a substrate
|
|
US12033861B2
(en)
|
2017-10-05 |
2024-07-09 |
Asm Ip Holding B.V. |
Method for selectively depositing a metallic film on a substrate
|
|
US10734223B2
(en)
|
2017-10-10 |
2020-08-04 |
Asm Ip Holding B.V. |
Method for depositing a metal chalcogenide on a substrate by cyclical deposition
|
|
US12040184B2
(en)
|
2017-10-30 |
2024-07-16 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor structure and related semiconductor structures
|
|
US10923344B2
(en)
|
2017-10-30 |
2021-02-16 |
Asm Ip Holding B.V. |
Methods for forming a semiconductor structure and related semiconductor structures
|
|
US10734244B2
(en)
|
2017-11-16 |
2020-08-04 |
Asm Ip Holding B.V. |
Method of processing a substrate and a device manufactured by the same
|
|
US10910262B2
(en)
|
2017-11-16 |
2021-02-02 |
Asm Ip Holding B.V. |
Method of selectively depositing a capping layer structure on a semiconductor device structure
|
|
US11022879B2
(en)
|
2017-11-24 |
2021-06-01 |
Asm Ip Holding B.V. |
Method of forming an enhanced unexposed photoresist layer
|
|
US11127617B2
(en)
|
2017-11-27 |
2021-09-21 |
Asm Ip Holding B.V. |
Storage device for storing wafer cassettes for use with a batch furnace
|
|
US11682572B2
(en)
|
2017-11-27 |
2023-06-20 |
Asm Ip Holdings B.V. |
Storage device for storing wafer cassettes for use with a batch furnace
|
|
US11639811B2
(en)
|
2017-11-27 |
2023-05-02 |
Asm Ip Holding B.V. |
Apparatus including a clean mini environment
|
|
US11501973B2
(en)
|
2018-01-16 |
2022-11-15 |
Asm Ip Holding B.V. |
Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
|
|
US10872771B2
(en)
|
2018-01-16 |
2020-12-22 |
Asm Ip Holding B. V. |
Method for depositing a material film on a substrate within a reaction chamber by a cyclical deposition process and related device structures
|
|
US11393690B2
(en)
|
2018-01-19 |
2022-07-19 |
Asm Ip Holding B.V. |
Deposition method
|
|
US11972944B2
(en)
|
2018-01-19 |
2024-04-30 |
Asm Ip Holding B.V. |
Method for depositing a gap-fill layer by plasma-assisted deposition
|
|
US11482412B2
(en)
|
2018-01-19 |
2022-10-25 |
Asm Ip Holding B.V. |
Method for depositing a gap-fill layer by plasma-assisted deposition
|
|
US12119228B2
(en)
|
2018-01-19 |
2024-10-15 |
Asm Ip Holding B.V. |
Deposition method
|
|
USD903477S1
(en)
|
2018-01-24 |
2020-12-01 |
Asm Ip Holdings B.V. |
Metal clamp
|
|
US11018047B2
(en)
|
2018-01-25 |
2021-05-25 |
Asm Ip Holding B.V. |
Hybrid lift pin
|
|
USD913980S1
(en)
|
2018-02-01 |
2021-03-23 |
Asm Ip Holding B.V. |
Gas supply plate for semiconductor manufacturing apparatus
|
|
US11081345B2
(en)
|
2018-02-06 |
2021-08-03 |
Asm Ip Holding B.V. |
Method of post-deposition treatment for silicon oxide film
|
|
US11735414B2
(en)
|
2018-02-06 |
2023-08-22 |
Asm Ip Holding B.V. |
Method of post-deposition treatment for silicon oxide film
|
|
US11387106B2
(en)
|
2018-02-14 |
2022-07-12 |
Asm Ip Holding B.V. |
Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
|
|
US11685991B2
(en)
|
2018-02-14 |
2023-06-27 |
Asm Ip Holding B.V. |
Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
|
|
US10896820B2
(en)
|
2018-02-14 |
2021-01-19 |
Asm Ip Holding B.V. |
Method for depositing a ruthenium-containing film on a substrate by a cyclical deposition process
|
|
US10731249B2
(en)
|
2018-02-15 |
2020-08-04 |
Asm Ip Holding B.V. |
Method of forming a transition metal containing film on a substrate by a cyclical deposition process, a method for supplying a transition metal halide compound to a reaction chamber, and related vapor deposition apparatus
|
|
US11482418B2
(en)
|
2018-02-20 |
2022-10-25 |
Asm Ip Holding B.V. |
Substrate processing method and apparatus
|
|
US10658181B2
(en)
|
2018-02-20 |
2020-05-19 |
Asm Ip Holding B.V. |
Method of spacer-defined direct patterning in semiconductor fabrication
|
|
US10975470B2
(en)
|
2018-02-23 |
2021-04-13 |
Asm Ip Holding B.V. |
Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
|
|
US11939673B2
(en)
|
2018-02-23 |
2024-03-26 |
Asm Ip Holding B.V. |
Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment
|
|
US11473195B2
(en)
|
2018-03-01 |
2022-10-18 |
Asm Ip Holding B.V. |
Semiconductor processing apparatus and a method for processing a substrate
|
|
US11629406B2
(en)
|
2018-03-09 |
2023-04-18 |
Asm Ip Holding B.V. |
Semiconductor processing apparatus comprising one or more pyrometers for measuring a temperature of a substrate during transfer of the substrate
|
|
US11114283B2
(en)
|
2018-03-16 |
2021-09-07 |
Asm Ip Holding B.V. |
Reactor, system including the reactor, and methods of manufacturing and using same
|
|
US11398382B2
(en)
|
2018-03-27 |
2022-07-26 |
Asm Ip Holding B.V. |
Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
|
|
US12020938B2
(en)
|
2018-03-27 |
2024-06-25 |
Asm Ip Holding B.V. |
Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
|
|
US10847371B2
(en)
|
2018-03-27 |
2020-11-24 |
Asm Ip Holding B.V. |
Method of forming an electrode on a substrate and a semiconductor device structure including an electrode
|
|
US11088002B2
(en)
|
2018-03-29 |
2021-08-10 |
Asm Ip Holding B.V. |
Substrate rack and a substrate processing system and method
|
|
US11230766B2
(en)
|
2018-03-29 |
2022-01-25 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
US10867786B2
(en)
|
2018-03-30 |
2020-12-15 |
Asm Ip Holding B.V. |
Substrate processing method
|
|
US11469098B2
(en)
|
2018-05-08 |
2022-10-11 |
Asm Ip Holding B.V. |
Methods for depositing an oxide film on a substrate by a cyclical deposition process and related device structures
|
|
US12025484B2
(en)
|
2018-05-08 |
2024-07-02 |
Asm Ip Holding B.V. |
Thin film forming method
|
|
US11056567B2
(en)
|
2018-05-11 |
2021-07-06 |
Asm Ip Holding B.V. |
Method of forming a doped metal carbide film on a substrate and related semiconductor device structures
|
|
US11908733B2
(en)
|
2018-05-28 |
2024-02-20 |
Asm Ip Holding B.V. |
Substrate processing method and device manufactured by using the same
|
|
US11361990B2
(en)
|
2018-05-28 |
2022-06-14 |
Asm Ip Holding B.V. |
Substrate processing method and device manufactured by using the same
|
|
US11270899B2
(en)
|
2018-06-04 |
2022-03-08 |
Asm Ip Holding B.V. |
Wafer handling chamber with moisture reduction
|
|
US11837483B2
(en)
|
2018-06-04 |
2023-12-05 |
Asm Ip Holding B.V. |
Wafer handling chamber with moisture reduction
|
|
US11718913B2
(en)
|
2018-06-04 |
2023-08-08 |
Asm Ip Holding B.V. |
Gas distribution system and reactor system including same
|
|
US11286562B2
(en)
|
2018-06-08 |
2022-03-29 |
Asm Ip Holding B.V. |
Gas-phase chemical reactor and method of using same
|
|
US10797133B2
(en)
|
2018-06-21 |
2020-10-06 |
Asm Ip Holding B.V. |
Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
|
|
US11296189B2
(en)
|
2018-06-21 |
2022-04-05 |
Asm Ip Holding B.V. |
Method for depositing a phosphorus doped silicon arsenide film and related semiconductor device structures
|
|
US11530483B2
(en)
|
2018-06-21 |
2022-12-20 |
Asm Ip Holding B.V. |
Substrate processing system
|
|
US11499222B2
(en)
|
2018-06-27 |
2022-11-15 |
Asm Ip Holding B.V. |
Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
|
|
US11814715B2
(en)
|
2018-06-27 |
2023-11-14 |
Asm Ip Holding B.V. |
Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
|
|
US11952658B2
(en)
|
2018-06-27 |
2024-04-09 |
Asm Ip Holding B.V. |
Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
|
|
US11492703B2
(en)
|
2018-06-27 |
2022-11-08 |
Asm Ip Holding B.V. |
Cyclic deposition methods for forming metal-containing material and films and structures including the metal-containing material
|
|
US10612136B2
(en)
|
2018-06-29 |
2020-04-07 |
ASM IP Holding, B.V. |
Temperature-controlled flange and reactor system including same
|
|
US11168395B2
(en)
|
2018-06-29 |
2021-11-09 |
Asm Ip Holding B.V. |
Temperature-controlled flange and reactor system including same
|
|
US10914004B2
(en)
|
2018-06-29 |
2021-02-09 |
Asm Ip Holding B.V. |
Thin-film deposition method and manufacturing method of semiconductor device
|
|
US11646197B2
(en)
|
2018-07-03 |
2023-05-09 |
Asm Ip Holding B.V. |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
|
|
US10755923B2
(en)
|
2018-07-03 |
2020-08-25 |
Asm Ip Holding B.V. |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
|
|
US10755922B2
(en)
|
2018-07-03 |
2020-08-25 |
Asm Ip Holding B.V. |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
|
|
US11923190B2
(en)
|
2018-07-03 |
2024-03-05 |
Asm Ip Holding B.V. |
Method for depositing silicon-free carbon-containing film as gap-fill layer by pulse plasma-assisted deposition
|
|
US10767789B2
(en)
|
2018-07-16 |
2020-09-08 |
Asm Ip Holding B.V. |
Diaphragm valves, valve components, and methods for forming valve components
|
|
TWD208174S
(zh)
|
2018-07-25 |
2020-11-11 |
日商日本碍子股份有限公司 |
半導體製造用晶圓支持器
|
|
TWD208176S
(zh)
|
2018-07-25 |
2020-11-11 |
日商日本碍子股份有限公司 |
半導體製造用晶圓支持器
|
|
TWD208175S
(zh)
|
2018-07-25 |
2020-11-11 |
日商日本碍子股份有限公司 |
半導體製造用晶圓支持器
|
|
TWD208177S
(zh)
|
2018-07-25 |
2020-11-11 |
日商日本碍子股份有限公司 |
半導體製造用晶圓支持器
|
|
TWD208178S
(zh)
|
2018-07-25 |
2020-11-11 |
日商日本碍子股份有限公司 |
半導體製造用晶圓支持器之部分
|
|
US11053591B2
(en)
|
2018-08-06 |
2021-07-06 |
Asm Ip Holding B.V. |
Multi-port gas injection system and reactor system including same
|
|
US10883175B2
(en)
|
2018-08-09 |
2021-01-05 |
Asm Ip Holding B.V. |
Vertical furnace for processing substrates and a liner for use therein
|
|
US10829852B2
(en)
|
2018-08-16 |
2020-11-10 |
Asm Ip Holding B.V. |
Gas distribution device for a wafer processing apparatus
|
|
US11430674B2
(en)
|
2018-08-22 |
2022-08-30 |
Asm Ip Holding B.V. |
Sensor array, apparatus for dispensing a vapor phase reactant to a reaction chamber and related methods
|
|
US11804388B2
(en)
|
2018-09-11 |
2023-10-31 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
US11274369B2
(en)
|
2018-09-11 |
2022-03-15 |
Asm Ip Holding B.V. |
Thin film deposition method
|
|
US11024523B2
(en)
|
2018-09-11 |
2021-06-01 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
US11049751B2
(en)
|
2018-09-14 |
2021-06-29 |
Asm Ip Holding B.V. |
Cassette supply system to store and handle cassettes and processing apparatus equipped therewith
|
|
US11885023B2
(en)
|
2018-10-01 |
2024-01-30 |
Asm Ip Holding B.V. |
Substrate retaining apparatus, system including the apparatus, and method of using same
|
|
US11232963B2
(en)
|
2018-10-03 |
2022-01-25 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method
|
|
US11414760B2
(en)
|
2018-10-08 |
2022-08-16 |
Asm Ip Holding B.V. |
Substrate support unit, thin film deposition apparatus including the same, and substrate processing apparatus including the same
|
|
US10847365B2
(en)
|
2018-10-11 |
2020-11-24 |
Asm Ip Holding B.V. |
Method of forming conformal silicon carbide film by cyclic CVD
|
|
US10811256B2
(en)
|
2018-10-16 |
2020-10-20 |
Asm Ip Holding B.V. |
Method for etching a carbon-containing feature
|
|
US11664199B2
(en)
|
2018-10-19 |
2023-05-30 |
Asm Ip Holding B.V. |
Substrate processing apparatus and substrate processing method
|
|
US11251068B2
(en)
|
2018-10-19 |
2022-02-15 |
Asm Ip Holding B.V. |
Substrate processing apparatus and substrate processing method
|
|
USD948463S1
(en)
|
2018-10-24 |
2022-04-12 |
Asm Ip Holding B.V. |
Susceptor for semiconductor substrate supporting apparatus
|
|
US11735445B2
(en)
|
2018-10-31 |
2023-08-22 |
Asm Ip Holding B.V. |
Substrate processing apparatus for processing substrates
|
|
US11087997B2
(en)
|
2018-10-31 |
2021-08-10 |
Asm Ip Holding B.V. |
Substrate processing apparatus for processing substrates
|
|
US11499226B2
(en)
|
2018-11-02 |
2022-11-15 |
Asm Ip Holding B.V. |
Substrate supporting unit and a substrate processing device including the same
|
|
US11866823B2
(en)
|
2018-11-02 |
2024-01-09 |
Asm Ip Holding B.V. |
Substrate supporting unit and a substrate processing device including the same
|
|
US11572620B2
(en)
|
2018-11-06 |
2023-02-07 |
Asm Ip Holding B.V. |
Methods for selectively depositing an amorphous silicon film on a substrate
|
|
US11031242B2
(en)
|
2018-11-07 |
2021-06-08 |
Asm Ip Holding B.V. |
Methods for depositing a boron doped silicon germanium film
|
|
US11244825B2
(en)
|
2018-11-16 |
2022-02-08 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
|
|
US10818758B2
(en)
|
2018-11-16 |
2020-10-27 |
Asm Ip Holding B.V. |
Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
|
|
US11798999B2
(en)
|
2018-11-16 |
2023-10-24 |
Asm Ip Holding B.V. |
Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
|
|
US10847366B2
(en)
|
2018-11-16 |
2020-11-24 |
Asm Ip Holding B.V. |
Methods for depositing a transition metal chalcogenide film on a substrate by a cyclical deposition process
|
|
US11411088B2
(en)
|
2018-11-16 |
2022-08-09 |
Asm Ip Holding B.V. |
Methods for forming a metal silicate film on a substrate in a reaction chamber and related semiconductor device structures
|
|
US10559458B1
(en)
|
2018-11-26 |
2020-02-11 |
Asm Ip Holding B.V. |
Method of forming oxynitride film
|
|
US12040199B2
(en)
|
2018-11-28 |
2024-07-16 |
Asm Ip Holding B.V. |
Substrate processing apparatus for processing substrates
|
|
US11217444B2
(en)
|
2018-11-30 |
2022-01-04 |
Asm Ip Holding B.V. |
Method for forming an ultraviolet radiation responsive metal oxide-containing film
|
|
US11488819B2
(en)
|
2018-12-04 |
2022-11-01 |
Asm Ip Holding B.V. |
Method of cleaning substrate processing apparatus
|
|
US11158513B2
(en)
|
2018-12-13 |
2021-10-26 |
Asm Ip Holding B.V. |
Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
|
|
US11769670B2
(en)
|
2018-12-13 |
2023-09-26 |
Asm Ip Holding B.V. |
Methods for forming a rhenium-containing film on a substrate by a cyclical deposition process and related semiconductor device structures
|
|
US11658029B2
(en)
|
2018-12-14 |
2023-05-23 |
Asm Ip Holding B.V. |
Method of forming a device structure using selective deposition of gallium nitride and system for same
|
|
USD1040304S1
(en)
*
|
2018-12-17 |
2024-08-27 |
Applied Materials, Inc. |
Deposition ring for physical vapor deposition chamber
|
|
US11390946B2
(en)
|
2019-01-17 |
2022-07-19 |
Asm Ip Holding B.V. |
Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
|
|
US11959171B2
(en)
|
2019-01-17 |
2024-04-16 |
Asm Ip Holding B.V. |
Methods of forming a transition metal containing film on a substrate by a cyclical deposition process
|
|
US11171025B2
(en)
|
2019-01-22 |
2021-11-09 |
Asm Ip Holding B.V. |
Substrate processing device
|
|
US11127589B2
(en)
|
2019-02-01 |
2021-09-21 |
Asm Ip Holding B.V. |
Method of topology-selective film formation of silicon oxide
|
|
US11342216B2
(en)
|
2019-02-20 |
2022-05-24 |
Asm Ip Holding B.V. |
Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
|
|
US11227789B2
(en)
|
2019-02-20 |
2022-01-18 |
Asm Ip Holding B.V. |
Method and apparatus for filling a recess formed within a substrate surface
|
|
US11798834B2
(en)
|
2019-02-20 |
2023-10-24 |
Asm Ip Holding B.V. |
Cyclical deposition method and apparatus for filling a recess formed within a substrate surface
|
|
US11251040B2
(en)
|
2019-02-20 |
2022-02-15 |
Asm Ip Holding B.V. |
Cyclical deposition method including treatment step and apparatus for same
|
|
US11615980B2
(en)
|
2019-02-20 |
2023-03-28 |
Asm Ip Holding B.V. |
Method and apparatus for filling a recess formed within a substrate surface
|
|
US11482533B2
(en)
|
2019-02-20 |
2022-10-25 |
Asm Ip Holding B.V. |
Apparatus and methods for plug fill deposition in 3-D NAND applications
|
|
US11629407B2
(en)
|
2019-02-22 |
2023-04-18 |
Asm Ip Holding B.V. |
Substrate processing apparatus and method for processing substrates
|
|
US11424119B2
(en)
|
2019-03-08 |
2022-08-23 |
Asm Ip Holding B.V. |
Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
|
|
US11114294B2
(en)
|
2019-03-08 |
2021-09-07 |
Asm Ip Holding B.V. |
Structure including SiOC layer and method of forming same
|
|
US11901175B2
(en)
|
2019-03-08 |
2024-02-13 |
Asm Ip Holding B.V. |
Method for selective deposition of silicon nitride layer and structure including selectively-deposited silicon nitride layer
|
|
US11742198B2
(en)
|
2019-03-08 |
2023-08-29 |
Asm Ip Holding B.V. |
Structure including SiOCN layer and method of forming same
|
|
USD900176S1
(en)
*
|
2019-03-19 |
2020-10-27 |
Makerbot Industries, Llc |
Spool for filament of a three-dimensional printer
|
|
USD900178S1
(en)
*
|
2019-03-20 |
2020-10-27 |
Makerbot Industries, Llc |
Spool for filament of a three-dimensional printer
|
|
US11378337B2
(en)
|
2019-03-28 |
2022-07-05 |
Asm Ip Holding B.V. |
Door opener and substrate processing apparatus provided therewith
|
|
US11551925B2
(en)
|
2019-04-01 |
2023-01-10 |
Asm Ip Holding B.V. |
Method for manufacturing a semiconductor device
|
|
US11447864B2
(en)
|
2019-04-19 |
2022-09-20 |
Asm Ip Holding B.V. |
Layer forming method and apparatus
|
|
US11814747B2
(en)
|
2019-04-24 |
2023-11-14 |
Asm Ip Holding B.V. |
Gas-phase reactor system-with a reaction chamber, a solid precursor source vessel, a gas distribution system, and a flange assembly
|
|
US11289326B2
(en)
|
2019-05-07 |
2022-03-29 |
Asm Ip Holding B.V. |
Method for reforming amorphous carbon polymer film
|
|
US11781221B2
(en)
|
2019-05-07 |
2023-10-10 |
Asm Ip Holding B.V. |
Chemical source vessel with dip tube
|
|
US11355338B2
(en)
|
2019-05-10 |
2022-06-07 |
Asm Ip Holding B.V. |
Method of depositing material onto a surface and structure formed according to the method
|
|
US11996309B2
(en)
|
2019-05-16 |
2024-05-28 |
Asm Ip Holding B.V. |
Wafer boat handling device, vertical batch furnace and method
|
|
US11515188B2
(en)
|
2019-05-16 |
2022-11-29 |
Asm Ip Holding B.V. |
Wafer boat handling device, vertical batch furnace and method
|
|
USD947913S1
(en)
|
2019-05-17 |
2022-04-05 |
Asm Ip Holding B.V. |
Susceptor shaft
|
|
USD975665S1
(en)
|
2019-05-17 |
2023-01-17 |
Asm Ip Holding B.V. |
Susceptor shaft
|
|
USD935572S1
(en)
|
2019-05-24 |
2021-11-09 |
Asm Ip Holding B.V. |
Gas channel plate
|
|
USD922229S1
(en)
|
2019-06-05 |
2021-06-15 |
Asm Ip Holding B.V. |
Device for controlling a temperature of a gas supply unit
|
|
US11345999B2
(en)
|
2019-06-06 |
2022-05-31 |
Asm Ip Holding B.V. |
Method of using a gas-phase reactor system including analyzing exhausted gas
|
|
US11453946B2
(en)
|
2019-06-06 |
2022-09-27 |
Asm Ip Holding B.V. |
Gas-phase reactor system including a gas detector
|
|
US11476109B2
(en)
|
2019-06-11 |
2022-10-18 |
Asm Ip Holding B.V. |
Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
|
|
US11908684B2
(en)
|
2019-06-11 |
2024-02-20 |
Asm Ip Holding B.V. |
Method of forming an electronic structure using reforming gas, system for performing the method, and structure formed using the method
|
|
USD944946S1
(en)
|
2019-06-14 |
2022-03-01 |
Asm Ip Holding B.V. |
Shower plate
|
|
USD931978S1
(en)
|
2019-06-27 |
2021-09-28 |
Asm Ip Holding B.V. |
Showerhead vacuum transport
|
|
US11746414B2
(en)
|
2019-07-03 |
2023-09-05 |
Asm Ip Holding B.V. |
Temperature control assembly for substrate processing apparatus and method of using same
|
|
US11390945B2
(en)
|
2019-07-03 |
2022-07-19 |
Asm Ip Holding B.V. |
Temperature control assembly for substrate processing apparatus and method of using same
|
|
US11605528B2
(en)
|
2019-07-09 |
2023-03-14 |
Asm Ip Holding B.V. |
Plasma device using coaxial waveguide, and substrate treatment method
|
|
US12107000B2
(en)
|
2019-07-10 |
2024-10-01 |
Asm Ip Holding B.V. |
Substrate support assembly and substrate processing device including the same
|
|
US11664267B2
(en)
|
2019-07-10 |
2023-05-30 |
Asm Ip Holding B.V. |
Substrate support assembly and substrate processing device including the same
|
|
US11664245B2
(en)
|
2019-07-16 |
2023-05-30 |
Asm Ip Holding B.V. |
Substrate processing device
|
|
US11996304B2
(en)
|
2019-07-16 |
2024-05-28 |
Asm Ip Holding B.V. |
Substrate processing device
|
|
US11615970B2
(en)
|
2019-07-17 |
2023-03-28 |
Asm Ip Holding B.V. |
Radical assist ignition plasma system and method
|
|
US11688603B2
(en)
|
2019-07-17 |
2023-06-27 |
Asm Ip Holding B.V. |
Methods of forming silicon germanium structures
|
|
US11643724B2
(en)
|
2019-07-18 |
2023-05-09 |
Asm Ip Holding B.V. |
Method of forming structures using a neutral beam
|
|
US11282698B2
(en)
|
2019-07-19 |
2022-03-22 |
Asm Ip Holding B.V. |
Method of forming topology-controlled amorphous carbon polymer film
|
|
US12112940B2
(en)
|
2019-07-19 |
2024-10-08 |
Asm Ip Holding B.V. |
Method of forming topology-controlled amorphous carbon polymer film
|
|
US11557474B2
(en)
|
2019-07-29 |
2023-01-17 |
Asm Ip Holding B.V. |
Methods for selective deposition utilizing n-type dopants and/or alternative dopants to achieve high dopant incorporation
|
|
US11443926B2
(en)
|
2019-07-30 |
2022-09-13 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11430640B2
(en)
|
2019-07-30 |
2022-08-30 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11227782B2
(en)
|
2019-07-31 |
2022-01-18 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
US11587814B2
(en)
|
2019-07-31 |
2023-02-21 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
US11876008B2
(en)
|
2019-07-31 |
2024-01-16 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
US11587815B2
(en)
|
2019-07-31 |
2023-02-21 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly
|
|
US11680839B2
(en)
|
2019-08-05 |
2023-06-20 |
Asm Ip Holding B.V. |
Liquid level sensor for a chemical source vessel
|
|
USD965524S1
(en)
|
2019-08-19 |
2022-10-04 |
Asm Ip Holding B.V. |
Susceptor support
|
|
USD965044S1
(en)
|
2019-08-19 |
2022-09-27 |
Asm Ip Holding B.V. |
Susceptor shaft
|
|
US11639548B2
(en)
|
2019-08-21 |
2023-05-02 |
Asm Ip Holding B.V. |
Film-forming material mixed-gas forming device and film forming device
|
|
USD940837S1
(en)
|
2019-08-22 |
2022-01-11 |
Asm Ip Holding B.V. |
Electrode
|
|
USD930782S1
(en)
|
2019-08-22 |
2021-09-14 |
Asm Ip Holding B.V. |
Gas distributor
|
|
US11594450B2
(en)
|
2019-08-22 |
2023-02-28 |
Asm Ip Holding B.V. |
Method for forming a structure with a hole
|
|
USD979506S1
(en)
|
2019-08-22 |
2023-02-28 |
Asm Ip Holding B.V. |
Insulator
|
|
US12040229B2
(en)
|
2019-08-22 |
2024-07-16 |
Asm Ip Holding B.V. |
Method for forming a structure with a hole
|
|
USD949319S1
(en)
|
2019-08-22 |
2022-04-19 |
Asm Ip Holding B.V. |
Exhaust duct
|
|
US11286558B2
(en)
|
2019-08-23 |
2022-03-29 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
|
|
US11527400B2
(en)
|
2019-08-23 |
2022-12-13 |
Asm Ip Holding B.V. |
Method for depositing silicon oxide film having improved quality by peald using bis(diethylamino)silane
|
|
US11898242B2
(en)
|
2019-08-23 |
2024-02-13 |
Asm Ip Holding B.V. |
Methods for forming a polycrystalline molybdenum film over a surface of a substrate and related structures including a polycrystalline molybdenum film
|
|
US12033849B2
(en)
|
2019-08-23 |
2024-07-09 |
Asm Ip Holding B.V. |
Method for depositing silicon oxide film having improved quality by PEALD using bis(diethylamino)silane
|
|
US11827978B2
(en)
|
2019-08-23 |
2023-11-28 |
Asm Ip Holding B.V. |
Methods for depositing a molybdenum nitride film on a surface of a substrate by a cyclical deposition process and related semiconductor device structures including a molybdenum nitride film
|
|
US11495459B2
(en)
|
2019-09-04 |
2022-11-08 |
Asm Ip Holding B.V. |
Methods for selective deposition using a sacrificial capping layer
|
|
US11823876B2
(en)
|
2019-09-05 |
2023-11-21 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11562901B2
(en)
|
2019-09-25 |
2023-01-24 |
Asm Ip Holding B.V. |
Substrate processing method
|
|
US11610774B2
(en)
|
2019-10-02 |
2023-03-21 |
Asm Ip Holding B.V. |
Methods for forming a topographically selective silicon oxide film by a cyclical plasma-enhanced deposition process
|
|
US11339476B2
(en)
|
2019-10-08 |
2022-05-24 |
Asm Ip Holding B.V. |
Substrate processing device having connection plates, substrate processing method
|
|
US12006572B2
(en)
|
2019-10-08 |
2024-06-11 |
Asm Ip Holding B.V. |
Reactor system including a gas distribution assembly for use with activated species and method of using same
|
|
US11735422B2
(en)
|
2019-10-10 |
2023-08-22 |
Asm Ip Holding B.V. |
Method of forming a photoresist underlayer and structure including same
|
|
US12009241B2
(en)
|
2019-10-14 |
2024-06-11 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly with detector to detect cassette
|
|
US11637011B2
(en)
|
2019-10-16 |
2023-04-25 |
Asm Ip Holding B.V. |
Method of topology-selective film formation of silicon oxide
|
|
US11637014B2
(en)
|
2019-10-17 |
2023-04-25 |
Asm Ip Holding B.V. |
Methods for selective deposition of doped semiconductor material
|
|
US11315794B2
(en)
|
2019-10-21 |
2022-04-26 |
Asm Ip Holding B.V. |
Apparatus and methods for selectively etching films
|
|
US11996292B2
(en)
|
2019-10-25 |
2024-05-28 |
Asm Ip Holding B.V. |
Methods for filling a gap feature on a substrate surface and related semiconductor structures
|
|
US11646205B2
(en)
|
2019-10-29 |
2023-05-09 |
Asm Ip Holding B.V. |
Methods of selectively forming n-type doped material on a surface, systems for selectively forming n-type doped material, and structures formed using same
|
|
US11594600B2
(en)
|
2019-11-05 |
2023-02-28 |
Asm Ip Holding B.V. |
Structures with doped semiconductor layers and methods and systems for forming same
|
|
US11501968B2
(en)
|
2019-11-15 |
2022-11-15 |
Asm Ip Holding B.V. |
Method for providing a semiconductor device with silicon filled gaps
|
|
US11626316B2
(en)
|
2019-11-20 |
2023-04-11 |
Asm Ip Holding B.V. |
Method of depositing carbon-containing material on a surface of a substrate, structure formed using the method, and system for forming the structure
|
|
US11915929B2
(en)
|
2019-11-26 |
2024-02-27 |
Asm Ip Holding B.V. |
Methods for selectively forming a target film on a substrate comprising a first dielectric surface and a second metallic surface
|
|
US11401605B2
(en)
|
2019-11-26 |
2022-08-02 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11923181B2
(en)
|
2019-11-29 |
2024-03-05 |
Asm Ip Holding B.V. |
Substrate processing apparatus for minimizing the effect of a filling gas during substrate processing
|
|
US11646184B2
(en)
|
2019-11-29 |
2023-05-09 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11929251B2
(en)
|
2019-12-02 |
2024-03-12 |
Asm Ip Holding B.V. |
Substrate processing apparatus having electrostatic chuck and substrate processing method
|
|
US11840761B2
(en)
|
2019-12-04 |
2023-12-12 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11885013B2
(en)
|
2019-12-17 |
2024-01-30 |
Asm Ip Holding B.V. |
Method of forming vanadium nitride layer and structure including the vanadium nitride layer
|
|
US12119220B2
(en)
|
2019-12-19 |
2024-10-15 |
Asm Ip Holding B.V. |
Methods for filling a gap feature on a substrate surface and related semiconductor structures
|
|
US11527403B2
(en)
|
2019-12-19 |
2022-12-13 |
Asm Ip Holding B.V. |
Methods for filling a gap feature on a substrate surface and related semiconductor structures
|
|
US12033885B2
(en)
|
2020-01-06 |
2024-07-09 |
Asm Ip Holding B.V. |
Channeled lift pin
|
|
US11976359B2
(en)
|
2020-01-06 |
2024-05-07 |
Asm Ip Holding B.V. |
Gas supply assembly, components thereof, and reactor system including same
|
|
US11993847B2
(en)
|
2020-01-08 |
2024-05-28 |
Asm Ip Holding B.V. |
Injector
|
|
US11551912B2
(en)
|
2020-01-20 |
2023-01-10 |
Asm Ip Holding B.V. |
Method of forming thin film and method of modifying surface of thin film
|
|
US11521851B2
(en)
|
2020-02-03 |
2022-12-06 |
Asm Ip Holding B.V. |
Method of forming structures including a vanadium or indium layer
|
|
US11828707B2
(en)
|
2020-02-04 |
2023-11-28 |
Asm Ip Holding B.V. |
Method and apparatus for transmittance measurements of large articles
|
|
US11776846B2
(en)
|
2020-02-07 |
2023-10-03 |
Asm Ip Holding B.V. |
Methods for depositing gap filling fluids and related systems and devices
|
|
US11781243B2
(en)
|
2020-02-17 |
2023-10-10 |
Asm Ip Holding B.V. |
Method for depositing low temperature phosphorous-doped silicon
|
|
US11986868B2
(en)
|
2020-02-28 |
2024-05-21 |
Asm Ip Holding B.V. |
System dedicated for parts cleaning
|
|
US11488854B2
(en)
|
2020-03-11 |
2022-11-01 |
Asm Ip Holding B.V. |
Substrate handling device with adjustable joints
|
|
US11876356B2
(en)
|
2020-03-11 |
2024-01-16 |
Asm Ip Holding B.V. |
Lockout tagout assembly and system and method of using same
|
|
US11837494B2
(en)
|
2020-03-11 |
2023-12-05 |
Asm Ip Holding B.V. |
Substrate handling device with adjustable joints
|
|
US11961741B2
(en)
|
2020-03-12 |
2024-04-16 |
Asm Ip Holding B.V. |
Method for fabricating layer structure having target topological profile
|
|
USD943539S1
(en)
*
|
2020-03-19 |
2022-02-15 |
Applied Materials, Inc. |
Confinement plate for a substrate processing chamber
|
|
USD986190S1
(en)
|
2020-03-19 |
2023-05-16 |
Applied Materials, Inc. |
Confinement plate for a substrate processing chamber
|
|
USD979524S1
(en)
*
|
2020-03-19 |
2023-02-28 |
Applied Materials, Inc. |
Confinement liner for a substrate processing chamber
|
|
US11823866B2
(en)
|
2020-04-02 |
2023-11-21 |
Asm Ip Holding B.V. |
Thin film forming method
|
|
US11830738B2
(en)
|
2020-04-03 |
2023-11-28 |
Asm Ip Holding B.V. |
Method for forming barrier layer and method for manufacturing semiconductor device
|
|
US11437241B2
(en)
|
2020-04-08 |
2022-09-06 |
Asm Ip Holding B.V. |
Apparatus and methods for selectively etching silicon oxide films
|
|
US11821078B2
(en)
|
2020-04-15 |
2023-11-21 |
Asm Ip Holding B.V. |
Method for forming precoat film and method for forming silicon-containing film
|
|
US12087586B2
(en)
|
2020-04-15 |
2024-09-10 |
Asm Ip Holding B.V. |
Method of forming chromium nitride layer and structure including the chromium nitride layer
|
|
US11996289B2
(en)
|
2020-04-16 |
2024-05-28 |
Asm Ip Holding B.V. |
Methods of forming structures including silicon germanium and silicon layers, devices formed using the methods, and systems for performing the methods
|
|
US11530876B2
(en)
|
2020-04-24 |
2022-12-20 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly comprising a cooling gas supply
|
|
US11898243B2
(en)
|
2020-04-24 |
2024-02-13 |
Asm Ip Holding B.V. |
Method of forming vanadium nitride-containing layer
|
|
US11887857B2
(en)
|
2020-04-24 |
2024-01-30 |
Asm Ip Holding B.V. |
Methods and systems for depositing a layer comprising vanadium, nitrogen, and a further element
|
|
US11959168B2
(en)
|
2020-04-29 |
2024-04-16 |
Asm Ip Holding B.V. |
Solid source precursor vessel
|
|
US11515187B2
(en)
|
2020-05-01 |
2022-11-29 |
Asm Ip Holding B.V. |
Fast FOUP swapping with a FOUP handler
|
|
US11798830B2
(en)
|
2020-05-01 |
2023-10-24 |
Asm Ip Holding B.V. |
Fast FOUP swapping with a FOUP handler
|
|
US12051602B2
(en)
|
2020-05-04 |
2024-07-30 |
Asm Ip Holding B.V. |
Substrate processing system for processing substrates with an electronics module located behind a door in a front wall of the substrate processing system
|
|
US11626308B2
(en)
|
2020-05-13 |
2023-04-11 |
Asm Ip Holding B.V. |
Laser alignment fixture for a reactor system
|
|
US12057314B2
(en)
|
2020-05-15 |
2024-08-06 |
Asm Ip Holding B.V. |
Methods for silicon germanium uniformity control using multiple precursors
|
|
US11804364B2
(en)
|
2020-05-19 |
2023-10-31 |
Asm Ip Holding B.V. |
Substrate processing apparatus
|
|
US11705333B2
(en)
|
2020-05-21 |
2023-07-18 |
Asm Ip Holding B.V. |
Structures including multiple carbon layers and methods of forming and using same
|
|
US11987881B2
(en)
|
2020-05-22 |
2024-05-21 |
Asm Ip Holding B.V. |
Apparatus for depositing thin films using hydrogen peroxide
|
|
US11767589B2
(en)
|
2020-05-29 |
2023-09-26 |
Asm Ip Holding B.V. |
Substrate processing device
|
|
US12106944B2
(en)
|
2020-06-02 |
2024-10-01 |
Asm Ip Holding B.V. |
Rotating substrate support
|
|
US11646204B2
(en)
|
2020-06-24 |
2023-05-09 |
Asm Ip Holding B.V. |
Method for forming a layer provided with silicon
|
|
US11658035B2
(en)
|
2020-06-30 |
2023-05-23 |
Asm Ip Holding B.V. |
Substrate processing method
|
|
US12020934B2
(en)
|
2020-07-08 |
2024-06-25 |
Asm Ip Holding B.V. |
Substrate processing method
|
|
US11644758B2
(en)
|
2020-07-17 |
2023-05-09 |
Asm Ip Holding B.V. |
Structures and methods for use in photolithography
|
|
US12055863B2
(en)
|
2020-07-17 |
2024-08-06 |
Asm Ip Holding B.V. |
Structures and methods for use in photolithography
|
|
US11674220B2
(en)
|
2020-07-20 |
2023-06-13 |
Asm Ip Holding B.V. |
Method for depositing molybdenum layers using an underlayer
|
|
US12040177B2
(en)
|
2020-08-18 |
2024-07-16 |
Asm Ip Holding B.V. |
Methods for forming a laminate film by cyclical plasma-enhanced deposition processes
|
|
US11725280B2
(en)
|
2020-08-26 |
2023-08-15 |
Asm Ip Holding B.V. |
Method for forming metal silicon oxide and metal silicon oxynitride layers
|
|
US12074022B2
(en)
|
2020-08-27 |
2024-08-27 |
Asm Ip Holding B.V. |
Method and system for forming patterned structures using multiple patterning process
|
|
USD990534S1
(en)
|
2020-09-11 |
2023-06-27 |
Asm Ip Holding B.V. |
Weighted lift pin
|
|
USD1012873S1
(en)
|
2020-09-24 |
2024-01-30 |
Asm Ip Holding B.V. |
Electrode for semiconductor processing apparatus
|
|
US12009224B2
(en)
|
2020-09-29 |
2024-06-11 |
Asm Ip Holding B.V. |
Apparatus and method for etching metal nitrides
|
|
US12107005B2
(en)
|
2020-10-06 |
2024-10-01 |
Asm Ip Holding B.V. |
Deposition method and an apparatus for depositing a silicon-containing material
|
|
US12051567B2
(en)
|
2020-10-07 |
2024-07-30 |
Asm Ip Holding B.V. |
Gas supply unit and substrate processing apparatus including gas supply unit
|
|
US11827981B2
(en)
|
2020-10-14 |
2023-11-28 |
Asm Ip Holding B.V. |
Method of depositing material on stepped structure
|
|
US11873557B2
(en)
|
2020-10-22 |
2024-01-16 |
Asm Ip Holding B.V. |
Method of depositing vanadium metal
|
|
US11901179B2
(en)
|
2020-10-28 |
2024-02-13 |
Asm Ip Holding B.V. |
Method and device for depositing silicon onto substrates
|
|
US12027365B2
(en)
|
2020-11-24 |
2024-07-02 |
Asm Ip Holding B.V. |
Methods for filling a gap and related systems and devices
|
|
US11891696B2
(en)
|
2020-11-30 |
2024-02-06 |
Asm Ip Holding B.V. |
Injector configured for arrangement within a reaction chamber of a substrate processing apparatus
|
|
US11946137B2
(en)
|
2020-12-16 |
2024-04-02 |
Asm Ip Holding B.V. |
Runout and wobble measurement fixtures
|
|
US11885020B2
(en)
|
2020-12-22 |
2024-01-30 |
Asm Ip Holding B.V. |
Transition metal deposition method
|
|
US12125700B2
(en)
|
2021-01-13 |
2024-10-22 |
Asm Ip Holding B.V. |
Method of forming high aspect ratio features
|
|
USD1023959S1
(en)
|
2021-05-11 |
2024-04-23 |
Asm Ip Holding B.V. |
Electrode for substrate processing apparatus
|
|
USD980813S1
(en)
|
2021-05-11 |
2023-03-14 |
Asm Ip Holding B.V. |
Gas flow control plate for substrate processing apparatus
|
|
USD981973S1
(en)
|
2021-05-11 |
2023-03-28 |
Asm Ip Holding B.V. |
Reactor wall for substrate processing apparatus
|
|
USD980814S1
(en)
|
2021-05-11 |
2023-03-14 |
Asm Ip Holding B.V. |
Gas distributor for substrate processing apparatus
|
|
USD981459S1
(en)
*
|
2021-06-16 |
2023-03-21 |
Ebara Corporation |
Retaining ring for substrate
|
|
USD990441S1
(en)
|
2021-09-07 |
2023-06-27 |
Asm Ip Holding B.V. |
Gas flow control plate
|
|
US12131885B2
(en)
|
2021-12-17 |
2024-10-29 |
Asm Ip Holding B.V. |
Plasma treatment device having matching box
|
|
US12129545B2
(en)
|
2021-12-17 |
2024-10-29 |
Asm Ip Holding B.V. |
Precursor capsule, a vessel and a method
|
|
USD1049067S1
(en)
*
|
2022-04-04 |
2024-10-29 |
Applied Materials, Inc. |
Ring for an anti-rotation process kit for a substrate processing chamber
|
|
US12130084B2
(en)
|
2022-11-14 |
2024-10-29 |
Asm Ip Holding B.V. |
Vertical batch furnace assembly comprising a cooling gas supply
|
|
US12129548B2
(en)
|
2023-04-05 |
2024-10-29 |
Asm Ip Holding B.V. |
Method of forming structures using a neutral beam
|
