US9803162B2 - Liquid composition for cleaning semiconductor device, and method for cleaning semiconductor device - Google Patents

Liquid composition for cleaning semiconductor device, and method for cleaning semiconductor device Download PDF

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US9803162B2
US9803162B2 US15/118,230 US201515118230A US9803162B2 US 9803162 B2 US9803162 B2 US 9803162B2 US 201515118230 A US201515118230 A US 201515118230A US 9803162 B2 US9803162 B2 US 9803162B2
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phosphonic acid
hydrogen peroxide
semiconductor device
cobalt
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US20170183607A1 (en
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Kenji Shimada
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Mitsubishi Gas Chemical Co Inc
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    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/39—Organic or inorganic per-compounds
    • C11D3/3947—Liquid compositions
    • C11D11/0047—
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/02—Inorganic compounds
    • C11D7/04—Water-soluble compounds
    • C11D7/06—Hydroxides
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3209—Amines or imines with one to four nitrogen atoms; Quaternized amines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/32—Organic compounds containing nitrogen
    • C11D7/3281—Heterocyclic compounds
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
    • C11D7/22—Organic compounds
    • C11D7/36—Organic compounds containing phosphorus
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02057—Cleaning during device manufacture
    • H01L21/0206—Cleaning during device manufacture during, before or after processing of insulating layers
    • H01L21/02063—Cleaning during device manufacture during, before or after processing of insulating layers the processing being the formation of vias or contact holes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31105—Etching inorganic layers
    • H01L21/31111—Etching inorganic layers by chemical means
    • H01L21/31116—Etching inorganic layers by chemical means by dry-etching
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3105—After-treatment
    • H01L21/311—Etching the insulating layers by chemical or physical means
    • H01L21/31144—Etching the insulating layers by chemical or physical means using masks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
    • H01L21/3205—Deposition of non-insulating-, e.g. conductive- or resistive-, layers on insulating layers; After-treatment of these layers
    • H01L21/321—After treatment
    • H01L21/3213—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer
    • H01L21/32133—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only
    • H01L21/32134—Physical or chemical etching of the layers, e.g. to produce a patterned layer from a pre-deposited extensive layer by chemical means only by liquid etching only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
    • H01L21/768—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics
    • H01L21/76801—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing
    • H01L21/76802—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics
    • H01L21/76807—Applying interconnections to be used for carrying current between separate components within a device comprising conductors and dielectrics characterised by the formation and the after-treatment of the dielectrics, e.g. smoothing by forming openings in dielectrics for dual damascene structures
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors

Definitions

  • the present invention relates to a liquid cleaning composition used in a process of fabricating a semiconductor integrated circuit, and to a method for cleaning a semiconductor device using the same.
  • the present invention particularly relates to a liquid cleaning composition for cleaning a semiconductor device which is obtained by: laminating a barrier dielectric film, a low-dielectric-constant interlayer dielectric film, a hard mask and a photoresist on a substrate having a barrier metal, metal wiring and a low-dielectric-constant interlayer dielectric film; subjecting the photoresist to selective exposure followed by development to form a photoresist pattern; subsequently subjecting the hard mask, the low-dielectric-constant interlayer dielectric film and the barrier dielectric film laminated on the substrate to dry etch treatment using this photoresist pattern as a mask, so as to remove said hard mask and the dry etch residue while suppressing damage to the low-dielectric-constant interlayer dielectric film, the metal wiring, the barrier metal and the barrier dielectric film, and to a cleaning method using the same.
  • a highly integrated semiconductor device is fabricated by a series of steps comprising:
  • a conductive thin film such as a metal film or the like as a conductive wiring material and an interlayer dielectric film for insulating between the conductive thin films on an element such as a silicon wafer, and then uniformly applying a photoresist onto the surface of the resultant to provide a photosensitive layer, which is subjected to selective exposure and development to make a desired photoresist pattern; then,
  • dry etch residue completely removing the photoresist pattern as well as the residue resulting from the dry etch treatment (hereinafter, referred to as a “dry etch residue”) by oxygen plasma ashing, use of a cleaning solution, or the like.
  • the interlayer dielectric film is making a shift from a silicon oxide film to a low-dielectric-constant interlayer dielectric film (a film with a dielectric constant of less than 3: hereinafter, referred to as a “low-dielectric-constant interlayer dielectric film”).
  • a photoresist with a film thickness of 1 ⁇ m will result the aspect ratio of the pattern (a ratio obtained by dividing the thickness of the photoresist film by the line width of the photoresist) to be too large, causing problems such as destruction of the pattern.
  • a hard mask technique is sometimes employed, in which a film of a titanium (Ti) series, a silicon (Si) series or the like (hereinafter, referred to as a “hard mask”) is inserted between the pattern film that is to be actually formed and the photoresist film so as to once transfer the photoresist pattern onto the hard mask by dry etch.
  • this hard mask is used as an etch mask to transfer the pattern onto the film that is to be actually formed by dry etch.
  • the gas used upon etching the hard mask is exchangeable with the gas used upon etching the film that is to be actually formed, one can select a gas that ensures selectivity between the photoresist and the hard mask upon etching the hard mask, and a gas that ensures selectivity between the hard mask and the film to be actually etched upon etching the actual film. Therefore, it is advantageous in that a pattern can be formed while causing minimum damage to the actual film.
  • the low-dielectric-constant interlayer dielectric film may be exposed to the oxygen plasma or the like and may be damaged.
  • a hard mask is removed by oxygen plasma after forming vias and trenches. Upon this removal, the low-dielectric-constant interlayer dielectric film of the vias and trenches is damaged, which causes a problem of significant deterioration of the electric characteristics.
  • dry etch residues are attached to the wafer upon removal of the hard mask, the dry etch residues must also be removed at the same time.
  • Patent Document 2 International Publication No. WO 2008/114616 proposes a method of cleaning a semiconductor device with a cleaning composition containing hydrogen peroxide, aminopolymethylene phosphonic acids, potassium hydroxide and water.
  • Patent Document 3 Japanese Unexamined Patent Application Publication No. 2010-2324866 proposes an etch composition having pH greater than 8.5 and comprising at least one selected from the group consisting of ammonia, a compound having an amino group and a compound having a ring structure containing a nitrogen atom, and hydrogen peroxide in an aqueous medium.
  • Patent Document 4 Japanese Unexamined Patent Application Publication (translation of PCT) No. 2005-529363 proposes a cleaning composition comprising a polar organic solvent selected from the group consisting of dimethylpiperidone, sulfones and sulfolanes, a base selected from the group consisting of tetraalkylammonium hydroxide, choline hydroxide, sodium hydroxide and potassium hydroxide, a chelator or a metal complexing agent selected from the group consisting of water and trans-1,2-cyclohexanediamine tetraacetic acid, and ethane-1-hydroxy-1,1-diphosphonate and ethylenediamine tetra(methylene phosphonic acid).
  • a polar organic solvent selected from the group consisting of dimethylpiperidone, sulfones and sulfolanes
  • a base selected from the group consisting of tetraalkylammonium hydroxide, choline hydroxide, sodium hydro
  • Patent Document 5 Japanese Unexamined Patent Application Publication No. 2003-234307 proposes a method for cleaning a semiconductor device in which an aqueous sulfuric acid solution at 70° C. or higher is used for cleaning so that titanium nitride (TiN) film is removed while cobalt (Co) silicide is not etched.
  • Patent Document 6 International Publication No. WO 2007/072727 proposes a residue removing composition for removing dry etch residues having pH of 1-7 and comprising hydrogen peroxide, an azole compound and a stabilizer for hydrogen peroxide.
  • etch composition described in Patent Document 3 is insufficient to remove the hard mask and the dry etch residue, and cannot sufficiently suppress damage to cobalt and the low-dielectric-constant interlayer dielectric film. Therefore, it cannot be used for the intended purpose.
  • ethylenediamine tetraacetic acid, diethylenetriamine pentaacetic acid, triethylenetetramine, tetraethylenepentamine, pentaethylenehexamine, 1,4,7,10-tetraazacyclododecane, 8-quinolinol, 8-hydroxyquinaldine and 2,2′-azodiphenol are ineffective as a stabilizing agent for hydrogen peroxide that is to be combined with a liquid cleaning composition of the present invention which comprises hydrogen peroxide, potassium hydroxide, an anticorrosive for cobalt and water (see Comparative Examples 2 and 9-17).
  • Patent Document 4 The cleaning composition described in Patent Document 4 is insufficient to remove the hard mask and the dry etch residue, and cannot sufficiently suppress damage to cobalt and the low-dielectric-constant interlayer dielectric film. Therefore, it cannot be used for the intended purpose (see Comparative Example 3).
  • Patent Document 5 The aqueous sulfuric acid solution described in Patent Document 5 is insufficient to remove the hard mask, and cannot sufficiently suppress damage to cobalt. Therefore, it cannot be used for the intended purpose (see Comparative Example 4).
  • the objective of the present invention is to provide a liquid cleaning composition for removing a hard mask and a dry etch residue while suppressing damage to a low-dielectric-constant interlayer dielectric film, cobalt or a cobalt alloy upon fabricating a semiconductor device, and a cleaning method using the same.
  • the present invention provides a method for solving the above-described problems.
  • the present invention is as follows.
  • the liquid cleaning composition according to Item 1 wherein the amines are 1,2-propanediamine and/or 1,3-propanediamine.
  • liquid cleaning composition according to Item 1 wherein the azoles are one or more selected from the group consisting of 1-methylimidazole, 1-vinylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, N-benzyl-2-methylimidazole, 2-methylbenzimidazole, pyrazole, 4-methylpyrazole, 3,5-dimethylpyrazole, 1,2,4-triazole, 1H-benzotriazole, 5-methyl-1H-benzotriazole and 1H-tetrazole. 4.
  • the azoles are one or more selected from the group consisting of 1-methylimidazole, 1-vinylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, N-benzyl-2-methylimidazole, 2-methylbenzimidazole, pyrazole, 4-methylpyrazole, 3,5-dimethylpyrazole, 1,2,4-triazole, 1H-benzotriazole
  • liquid cleaning composition according to Item 1 wherein the aminopolymethylene phosphonic acid is one or more selected from the group consisting of amino tri(methylene phosphonic acid), ethylenediamine tetra(methylene phosphonic acid), diethylenetriamine penta(methylene phosphonic acid) and 1,2-propylenediamine tetra(methylene phosphonic acid). 5.
  • a cleaning method for removing, using a liquid cleaning composition, a hard mask and a dry etch residue in a semiconductor device provided with a low-dielectric-constant interlayer dielectric film, the hard mask and cobalt or a cobalt alloy while suppressing damage to the low-dielectric-constant interlayer dielectric film and the cobalt or the cobalt alloy comprising the step of bringing the liquid cleaning composition comprising hydrogen peroxide at 10-30% by mass, potassium hydroxide at 0.005-0.7% by mass, aminopolymethylene phosphonic acid at 0.00001-0.01% by mass, at least one selected from amines and azoles at 0.001-5% by mass and water into contact with the semiconductor device. 6.
  • the cleaning method according to Item 5 wherein the amines are 1,2-propanediamine and/or 1,3-propanediamine.
  • the azoles are one or more selected from the group consisting of 1-methylimidazole, 1-vinylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, N-benzyl-2-methylimidazole, 2-methylbenzimidazole, pyrazole, 4-methylpyrazole, 3,5-dimethylpyrazole, 1,2,4-triazole, 1H-benzotriazole, 5-methyl-1H-benzotriazole and 1H-tetrazole. 8.
  • aminopolymethylene phosphonic acid is one or more selected from the group consisting of amino tri(methylene phosphonic acid), ethylenediamine tetra(methylene phosphonic acid), diethylenetriamine penta(methylene phosphonic acid) and 1,2-propylenediamine tetra(methylene phosphonic acid).
  • the hard mask and the dry etch residue on the surface to be processed can be removed while suppressing damage to the low-dielectric-constant interlayer dielectric film, the metal wiring, the barrier metal and the barrier dielectric film in the process of fabricating a semiconductor device, thereby fabricating a high-precision high-quality semiconductor device at good yield.
  • FIG. 1 A cross-sectional view of one exemplary wiring structure (pattern 1) of a semiconductor device that is to be cleaned with a liquid cleaning composition of the present invention.
  • FIG. 2 A cross-sectional view of one exemplary wiring structure (pattern 2) of a semiconductor device that is to be cleaned with a liquid cleaning composition of the present invention.
  • a liquid cleaning composition of the present invention (hereinafter, sometimes simply referred to as a “cleaning solution”) contains hydrogen peroxide, potassium hydroxide, aminopolymethylene phosphonic acid, at least one selected from amines and azoles, and water.
  • the liquid composition of the present invention for cleaning a hard mask and a dry etch residue is used during the process of fabricating a semiconductor device, and thus it must suppress damage to a low-dielectric-constant interlayer dielectric film, metal wiring, a barrier metal and a barrier dielectric film.
  • the concentration range of hydrogen peroxide used with the present invention is 10-30% by mass, preferably 13-25% by mass and particularly preferably 15-20% by mass.
  • concentration range of hydrogen peroxide is 10-30% by mass, the hard mask, the dry etch residue and the photoresist can be removed effectively while suppressing damage to the metal wiring and the barrier metal.
  • the concentration range of potassium hydroxide used with the present invention is 0.005-0.7% by mass, preferably 0.01-0.5% by mass and particularly preferably 0.02-0.4% by mass.
  • concentration range of potassium hydroxide is 0.005-0.7% by mass, the hard mask and the dry etch residue can be removed effectively while suppressing damage to the low-dielectric-constant interlayer dielectric film and the metal wiring.
  • aminopolymethylene phosphonic acid used with the present invention examples include amino tri(methylene phosphonic acid), ethylenediamine tetra(methylene phosphonic acid), diethylenetriamine penta(methylene phosphonic acid) and 1,2-propylenediamine tetra(methylene phosphonic acid). These aminopolymethylene phosphonic acids may be used alone or two or more types of them may be used in combination.
  • the concentration range of the above-mentioned aminopolymethylene phosphonic acid used with the present invention is 0.00001-0.01% by mass, preferably 0.00005-0.007% by mass and particularly preferably 0.0001-0.005% by mass.
  • concentration range of aminopolymethylene phosphonic acid is 0.00001-0.01% by mass, decomposition of hydrogen peroxide as well as damage to the metal wiring can be suppressed.
  • the amines used with the present invention are preferably 1,2-propanediamine and/or 1,3-propanediamine.
  • the concentration range of said amines is 0.001-5% by mass, preferably 0.01-4% by mass and particularly preferably 0.05-3% by mass.
  • concentration range of the amines is within a range of 0.001-5% by mass, damage to the metal wiring can be suppressed.
  • the azoles used with the present invention are, but not limited to, one or more selected from the group consisting of 1-methylimidazole, 1-vinylimidazole, 2-phenylimidazole, 2-ethyl-4-methylimidazole, N-benzyl-2-methylimidazole, 2-methylbenzimidazole, pyrazole, 4-methylpyrazole, 3,5-dimethylpyrazole, 1,2,4-triazole, 1H-benzotriazole, 5-methyl-1H-benzotriazole and 1H-tetrazole.
  • the above-mentioned amines and azoles used with the present invention may be used alone or two or more types of them may be used in combination.
  • the concentration range of azoles is 0.001-5% by mass, preferably 0.01-4% by mass and particularly preferably 0.05-3% by mass. When the concentration of the azoles is within the above-mentioned range, damage to the metal wiring can be suppressed.
  • the liquid cleaning composition of the present invention may be added with an additive that is conventionally used in a liquid composition for cleaning a semiconductor as long as the purpose of the present invention is not interfered.
  • an additive that is conventionally used in a liquid composition for cleaning a semiconductor as long as the purpose of the present invention is not interfered.
  • a surfactant, an antifoaming agent or the like may be added as such additive.
  • the cleaning method of the present invention is a method for removing, using a liquid cleaning composition, a hard mask and a dry etch residue in a semiconductor device provided with a low-dielectric-constant interlayer dielectric film, the hard mask and cobalt or a cobalt alloy while suppressing damage to the low-dielectric-constant interlayer dielectric film and the cobalt or the cobalt alloy, the method comprising the step of bringing the liquid cleaning composition comprising hydrogen peroxide at 10-30% by mass, potassium hydroxide at 0.005-0.7% by mass, aminopolymethylene phosphonic acid at 0.00001-0.01% by mass, at least one selected from amines and azoles at 0.001-5% by mass, and water into contact with the semiconductor device.
  • the method for bringing the liquid cleaning composition of the present invention into contact with the semiconductor device is not particularly limited.
  • a method in which the semiconductor device is immersed in the liquid cleaning composition of the present invention or a method in which the semiconductor device is brought into contact with the liquid cleaning composition by dropping, spraying or the like may be employed.
  • the temperature of the liquid cleaning composition of the present invention upon use is preferably 20-80° C. and more preferably in a range of 25-70° C., which may suitably be selected according to etch conditions and a semiconductor base to be used. If necessary, the cleaning method of the present invention may also employ ultrasonication in combination.
  • the time to use the liquid cleaning composition of the present invention is preferably 0.3-20 minutes and particularly preferably in a range of 0.5-10 minutes, which may suitably be selected according to etch conditions and a semiconductor base to be used.
  • a rinsing liquid after the usage of the liquid cleaning composition of the present invention may be an organic solvent such as alcohol, simply rinsing with water is also sufficient.
  • a semiconductor device and a display element includes: a substrate material such as silicon, amorphous silicon, polysilicon or glass; an dielectric material such as silicon oxide, silicon nitride, silicon carbide or a derivative thereof; a barrier material such as tantalum, tantalum nitride, ruthenium or ruthenium oxide; a wiring material such as copper or a copper alloy; a compound semiconductor such as gallium-arsenic, gallium-phosphorus, indium-phosphorus, indium-gallium-arsenic or indium-aluminum-arsenic; and an oxide semiconductor such as chrome oxide.
  • a low-dielectric-constant interlayer dielectric film OCD (trade name, Tokyo Ohka Kogyo) of a hydroxysilsesquioxane (HSQ) series or a methylsilsesquioxane (MSQ) series, Black Diamond (trade name, Applied Materials), Aurora (trade name, ASM International) or Coral (trade name, Novellus Systems) of a carbon-doped silicon oxide (SiOC) series or the like may be used, although the low-dielectric-constant interlayer dielectric film is not limited thereto.
  • OCD trade name, Tokyo Ohka Kogyo
  • HSQ hydroxysilsesquioxane
  • MSQ methylsilsesquioxane
  • Black Diamond trade name, Applied Materials
  • Aurora trade name, ASM International
  • Coral trademark, Novellus Systems
  • SiOC carbon-doped silicon oxide
  • barrier metal tantalum, tantalum nitride, ruthenium, manganese, magnesium, cobalt or an oxide thereof may be used, although the barrier metal is not limited thereto.
  • barrier dielectric film silicon nitride, silicon carbide, silicon carbonitride or the like may be used, although the barrier dielectric film is not limited thereto.
  • titanium nitride, titanium or the like may be used as a hard mask to which the present invention can be applied.
  • cobalt or a cobalt alloy formed on copper or a copper alloy, cobalt or a cobalt alloy, or the like may be used.
  • the copper or the copper alloy When cobalt or a cobalt alloy formed on copper or a copper alloy is used as the metal wiring, the copper or the copper alloy usually does not make contact with the cleaning solution since the copper or the copper alloy are completely covered by the cobalt or the cobalt alloy. If, however, there is even a slight defect in the cobalt or the cobalt alloy, the liquid cleaning composition will make contact with the copper or the copper alloy. Therefore, the liquid cleaning composition intended for the present invention needs to have an anticorrosion property against copper or a copper alloy. Since the liquid cleaning composition of the present invention has an anticorrosion property against copper or a copper alloy, it can be used for metal wiring which has cobalt or a cobalt alloy formed on copper or a copper alloy.
  • a semiconductor device that is to be cleaned with the liquid cleaning composition of the present invention is not particularly limited as long as it is provided with a low-dielectric-constant interlayer dielectric film, a hard mask and cobalt or a cobalt alloy.
  • the liquid cleaning composition of the present invention can be used for cleaning a semiconductor device obtained by: laminating a barrier dielectric film, a low-dielectric-constant interlayer dielectric film, a hard mask and a photoresist on a substrate having a barrier metal, metal wiring and a low-dielectric-constant interlayer dielectric film or a substrate having metal wiring and a low-dielectric-constant interlayer dielectric film; then subjecting the photoresist to selective exposure followed by development to form a photoresist pattern; and subjecting the hard mask, the low-dielectric-constant interlayer dielectric film and the barrier dielectric film laminated on the substrate to a dry etch treatment using this photoresist pattern as a mask.
  • Examples of such a semiconductor device include semiconductor devices having wiring structures with the cross-sections shown in FIGS. 1 and 2 .
  • a barrier dielectric film 5 , a low-dielectric-constant interlayer dielectric film 4 and a hard mask 2 are laminated on a substrate including a barrier metal 7 , metal wiring having cobalt or a cobalt alloy 1 formed on copper or a copper alloy 6 and a low-dielectric-constant interlayer dielectric film 4 , where a predetermined pattern is formed.
  • a dry etch residue 3 is attached to the surface of the semiconductor device.
  • the wiring structure shown in FIG. 2 is the same as FIG. 1 except that cobalt or a cobalt alloy 1 is used as the metal wiring.
  • the liquid cleaning composition of the present invention can be used to clean such a semiconductor device to remove the hard mask and the dry etch residue while suppressing damage to the low-dielectric-constant interlayer dielectric film, the metal wiring, the barrier metal and the barrier dielectric film.
  • the removal states of the hard mask and/or the dry etch residue from the substrate as well as damages to the low-dielectric-constant interlayer dielectric film and the cobalt or the cobalt alloy were assessed by SEM observation.
  • a SEM instrument used was ultrahigh-resolution field emission type scanning electron microscope SU9000 from Hitachi High-Technologies Corporation.
  • Rate of hydrogen peroxide decomposition was 5% or more and less than 10%
  • Rate of hydrogen peroxide decomposition was 10% or more and less than 20%
  • Rate of hydrogen peroxide decomposition was 20% or more
  • Liquid cleaning composition did not contain hydrogen peroxide.
  • Semiconductor devices having a wiring structure with the cross-section shown in FIG. 1 or 2 were used for the test.
  • the semiconductor devices were immersed in the liquid cleaning compositions indicated in Table 1 at temperatures and for time indicated in Table 2. Then, the devices were rinsed with ultrapure water and dried with dry nitrogen gas jet. The semiconductor devices after washing were observed with SEM to assess the removal states of the hard masks 2 and the dry etch residues 3 as well as damage to the cobalt or the cobalt alloys 1 , the low-dielectric-constant interlayer dielectric films 4 , the barrier dielectric films 5 and the barrier metals 7 . In addition, stability of hydrogen peroxide was also examined.
  • Example 1-29 in which the liquid cleaning compositions of the present invention indicated in Table 2 were applied, the hard masks 2 and the dry etch residues 3 were found to be removed while damage to the cobalt or the cobalt alloys 1 and the low-dielectric-constant interlayer dielectric films 4 were found to be prevented. In all examples, no damage to the barrier dielectric films 5 , the copper or the copper alloys 6 and the barrier metals 7 were observed. In addition, the rates of hydrogen peroxide decomposition were less than 10%.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution described in Patent Document 2 containing hydrogen peroxide at 15% by mass, potassium hydroxide at 0.02% by mass, 1,2-propylenediamine tetra(methylene phosphonic acid) at 0.0005% by mass and water at 84.9795% by mass (Table 3, cleaning solution 3A).
  • the cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed, damage to the low-dielectric-constant interlayer dielectric film 4 was prevented and the rate of hydrogen peroxide decomposition was low, a large hole was found in the cobalt or the cobalt alloy 1 .
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution described in Patent Document 3 containing hydrogen peroxide at 0.35% by mass, 2-(2-aminoethylamino)ethanol at 2.0% by mass, tetramethylammonium hydroxide at 1.5% by mass, ethylenediamine tetraacetic acid at 1.2% by mass and water at 94.95% by mass (Table 3, cleaning solution 3B).
  • the cleaning conditions and the assessment results are shown in Table 4. Although the rate of hydrogen peroxide decomposition was low, the hard mask 2 and the dry etch residue 3 were not removed and damage to the low-dielectric-constant interlayer dielectric film 4 was not prevented.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution described in Patent Document 4 containing hydrogen peroxide at 3% by mass, potassium hydroxide at 2% by mass, sulfolane at 70% by mass, diethylenetriamine penta(methylene phosphonic acid) at 1% by mass and water at 24% by mass (Table 3, cleaning solution 3C).
  • the cleaning conditions and the assessment results are shown in Table 4.
  • the rate of hydrogen peroxide decomposition was high, the hard mask 2 and the dry etch residue 3 were not removed and damage to the low-dielectric-constant interlayer dielectric film 4 was not prevented.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution described in Patent Document 5 containing sulfuric acid at 98% by mass and water at 2% by mass (Table 3, cleaning solution 3D).
  • the cleaning conditions and the assessment results are shown in Table 4. Although the dry etch residue 3 was removed and damage to the low-dielectric-constant interlayer dielectric film 4 was prevented, the hard mask 2 was not removed and a large hole was found in the cobalt or the cobalt alloy 1 .
  • Patent Documents 2-5 Comparative Examples 1-4 were found that they cannot be used as a cleaning solution for removing a hard mask and a dry etch residue while preventing damage to cobalt or a cobalt alloy and a low-dielectric-constant interlayer dielectric film since cleaning performance was insufficient, the cobalt or the cobalt alloy or the low-dielectric-constant interlayer dielectric film was damaged, or stability of the cleaning solution was poor (Table 4).
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, diethylenetriamine penta(methylene phosphonic acid) at 0.0005% by mass and water at 82.7995% by mass (Table 3, cleaning solution 3E).
  • Table 3E cleaning solution 3E
  • the cleaning conditions and the assessment results are shown in Table 4. Although the rate of hydrogen peroxide decomposition was low, the hard mask 2 and the dry etch residue 3 were removed and damage to the low-dielectric-constant interlayer dielectric film 4 was prevented, a large hole was found in the cobalt or the cobalt alloy 1 .
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, diethylenetriamine penta(methylene phosphonic acid) at 0.0005% by mass and water at 99.2995% by mass (Table 3, cleaning solution 3F).
  • the cleaning conditions and the assessment results are shown in Table 4.
  • the hard mask 2 and the dry etch residue 3 were not removed, and damage to the cobalt or a cobalt alloy and the low-dielectric-constant interlayer dielectric film 4 was not prevented.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, 1H-tetrazole at 0.5% by mass, diethylenetriamine penta(methylene phosphonic acid) at 0.0005% by mass and water at 82.4995% by mass (Table 3, cleaning solution 3F).
  • Table 3F cleaning solution 3F
  • the cleaning conditions and the assessment results are shown in Table 4. Although the rate of hydrogen peroxide decomposition was low and damage to the low-dielectric-constant interlayer dielectric film 4 was prevented, the hard mask 2 and the dry etch residue 3 were not removed and damage to the cobalt or the cobalt alloy 1 was not prevented.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass and water at 82.3% by mass (Table 3, cleaning solution 3H).
  • Table 3 cleaning solution 3H
  • the cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, ethylenediamine tetraacetic acid at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3I).
  • Table 3, cleaning solution 3I The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, diethylenetriamine pentaacetic acid at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3J).
  • Table 3, cleaning solution 3J The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, triethylenetetramine at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3K).
  • Table 3, cleaning solution 3K The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, tetraethylenepentamine at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3L).
  • Table 3, cleaning solution 3L The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, pentaethylenehexamine at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3M).
  • Table 3, cleaning solution 3M The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, 1,4,7,10-tetraazacyclododecane at 1.2% by mass and water at 81.1% (Table 3, cleaning solution 3N).
  • Table 3, cleaning solution 3N The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, 8-quinolinol at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3O).
  • Table 3, cleaning solution 3O The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed, and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, 8-hydroxyquinaldine at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3P).
  • Table 3, cleaning solution 3P The cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, 2,2′-azodiphenol at 1.2% by mass and water at 81.1% by mass (Table 3, cleaning solution 3Q).
  • Table 3Q cleaning solution 3Q
  • the cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, 1H-tetrazole at 0.5% by mass, phosphonic acid at 0.0005% by mass and water at 82.2995% by mass (Table 3, cleaning solution 3R).
  • Table 3R cleaning solution 3R
  • the cleaning conditions and the assessment results are shown in Table 4. Although the hard mask 2 and the dry etch residue 3 were removed and damage to the cobalt or the cobalt alloy 1 and the low-dielectric-constant interlayer dielectric film 4 was prevented, the rate of hydrogen peroxide decomposition was high.
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, ethylenediamine at 0.5% by mass, diethylenetriamine penta(methylene phosphonic acid) at 0.005% by mass and water at 82.2995% by mass (Table 3, cleaning solution 3S).
  • Table 3 cleaning solution 3S
  • the cleaning conditions and the assessment results are shown in Table 4. Although the rate of hydrogen peroxide decomposition was low, the hard mask 2 and the dry etch residue 3 were removed and damage to the low-dielectric-constant interlayer dielectric film 4 was prevented, a large hole was found in the cobalt or the cobalt alloy 1 .
  • a semiconductor device shown in FIG. 1 was cleaned with an aqueous solution containing hydrogen peroxide at 17% by mass, potassium hydroxide at 0.2% by mass, ethanolamine at 0.5% by mass, diethylenetriamine penta(methylene phosphonic acid) at 0.005% by mass and water at 82.2995% by mass (Table 3, cleaning solution 3T).
  • Table 3T cleaning solution 3T
  • the cleaning conditions and the assessment results are shown in Table 4. Although the rate of hydrogen peroxide decomposition was low, the hard mask 2 and the dry etch residue 3 were removed and damage to the low-dielectric-constant interlayer dielectric film 4 was prevented, a large hole was found in the cobalt or the cobalt alloy 1 .

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US10035978B2 (en) * 2014-05-02 2018-07-31 Mitsubishi Gas Chemical Company, Inc. Semiconductor element cleaning liquid and cleaning method

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CN105210176B (zh) 2016-09-28
CN105210176A (zh) 2015-12-30
KR20150123959A (ko) 2015-11-04
EP3093875A1 (en) 2016-11-16
US20170183607A1 (en) 2017-06-29
KR101608952B1 (ko) 2016-04-05
TW201600596A (zh) 2016-01-01
JP5835534B1 (ja) 2015-12-24
EP3093875A4 (en) 2017-03-08
IL247182A (en) 2017-04-30
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