US9257439B2 - Structure and method for FinFET SRAM - Google Patents

Structure and method for FinFET SRAM Download PDF

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US9257439B2
US9257439B2 US14/191,789 US201414191789A US9257439B2 US 9257439 B2 US9257439 B2 US 9257439B2 US 201414191789 A US201414191789 A US 201414191789A US 9257439 B2 US9257439 B2 US 9257439B2
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pitch
patterns
lines
sram
fin
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US20150243667A1 (en
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Jhon Jhy Liaw
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Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Taiwan Semiconductor Manufacturing Co TSMC Ltd
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Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. reassignment TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: LIAW, JHON JHY
Priority to US14/191,789 priority Critical patent/US9257439B2/en
Priority to CN201410187533.5A priority patent/CN104882444B/zh
Priority to KR1020140081170A priority patent/KR101706420B1/ko
Priority to TW103146488A priority patent/TWI552314B/zh
Publication of US20150243667A1 publication Critical patent/US20150243667A1/en
Priority to KR1020150146569A priority patent/KR101594743B1/ko
Priority to US14/991,526 priority patent/US9673202B2/en
Publication of US9257439B2 publication Critical patent/US9257439B2/en
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Priority to US15/613,387 priority patent/US10141318B2/en
Priority to US16/199,338 priority patent/US10461087B2/en
Priority to US16/666,061 priority patent/US10971503B2/en
Priority to US17/222,143 priority patent/US11342337B2/en
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    • H01L27/1104
    • G06F17/5068
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F30/00Computer-aided design [CAD]
    • G06F30/30Circuit design
    • G06F30/39Circuit design at the physical level
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • H01L23/528Geometry or layout of the interconnection structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0207Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/0886Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate including transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
    • H01L27/04Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
    • H01L27/08Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind
    • H01L27/085Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
    • H01L27/088Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
    • H01L27/092Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors
    • H01L27/0924Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate complementary MIS field-effect transistors including transistors with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof  ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66227Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by the electric current supplied or the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched, e.g. three-terminal devices
    • H01L29/66409Unipolar field-effect transistors
    • H01L29/66477Unipolar field-effect transistors with an insulated gate, i.e. MISFET
    • H01L29/66787Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel
    • H01L29/66795Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET
    • H01L29/6681Unipolar field-effect transistors with an insulated gate, i.e. MISFET with a gate at the side of the channel with a horizontal current flow in a vertical sidewall of a semiconductor body, e.g. FinFET, MuGFET using dummy structures having essentially the same shape as the semiconductor body, e.g. to provide stability
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • H10B10/12Static random access memory [SRAM] devices comprising a MOSFET load element
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B10/00Static random access memory [SRAM] devices
    • H10B10/18Peripheral circuit regions
    • H01L27/1116
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Definitions

  • IC semiconductor integrated circuit
  • functional density i.e., the number of interconnected devices per chip area
  • geometry size i.e., the smallest component (or line) that can be created using a fabrication process
  • This scaling down process generally provides benefits by increasing production efficiency and lowering associated costs.
  • Such scaling down has also increased the complexity of processing and manufacturing ICs and, for these advances to be realized, similar developments in IC manufacturing are needed.
  • logic circuits and embedded static random-access memory (SRAM) cells are frequently integrated into semiconductor devices for increased functional density.
  • Such applications range from industrial and scientific subsystems, automotive electronics, cell phones, digital cameras, microprocessors, and so on.
  • SRAM density simply scalding down the semiconductor feature size is no longer enough.
  • traditional SRAM cell structure with planar transistors has experienced degraded device performance and higher leakage when manufactured with smaller semiconductor geometries.
  • One of the techniques for meeting such a challenge is to use three-dimensional transistors having a fin or multi-fin structure (e.g., FinFETs).
  • FinFETs can be implemented for controlling short channel effect for metal-oxide-semiconductor field-effect transistors (MOSFETs).
  • MOSFETs metal-oxide-semiconductor field-effect transistors
  • the fin structures are desired to be as thin as possible.
  • One of the techniques for manufacturing very thin fin structures is spacer lithography. For example, spacers are formed on sidewalls of mandrel patterns. After the mandrel patterns are removed, the spacers become an etch mask for etching a silicon substrate in forming the fin structures. The dimensions of the mandrel patterns and spacers control the width and pitch of the fin structures.
  • a tight control of critical dimension (CD) uniformity of the mandrel patterns and spacers is a design challenge for embedded FinFET SRAM.
  • CD critical dimension
  • FIG. 1 is a simplified block diagram of an integrated circuit (IC) with embedded SRAM cells, according to various aspects of the present disclosure.
  • FIG. 2 shows embedded SRAM cells with peripheral logic circuits, according to various aspects of the present disclosure.
  • FIG. 3 illustrates some components of the peripheral logic circuit of FIG. 2 , in accordance with an embodiment.
  • FIGS. 4A and 4B show schematic views of a six-transistor (6T) single-port (SP) SRAM cell, in accordance with an embodiment.
  • FIGS. 5-7 show a portion of a layout of the 6T SP SRAM cell of the FIG. 4A , in accordance with some embodiments.
  • FIG. 8 shows a schematic view of a two-port (TP) SRAM cell, in accordance with an embodiment.
  • FIG. 9 shows a portion of a layout of the TP SRAM cell of FIG. 8 , in accordance with an embodiment.
  • FIGS. 10A and 10B illustrate metal layer routing of embedded SRAM designs, according to various aspects of the present disclosure.
  • FIG. 11 is a simplified block diagram of an integrated circuit (IC) with embedded SRAM cells, according to various aspects of the present disclosure.
  • FIG. 12A illustrates a layout of fin active lines of four SRAM cells, according to various aspects of the present disclosure.
  • FIG. 12B illustrates a three-layer partition of the fin active line layout of FIG. 12A , in accordance with an embodiment.
  • FIG. 12C illustrates gate features of the four SRAM cells of FIG. 12A overlapping with the fin active line thereof, in accordance with an embodiment.
  • FIG. 13 shows a method of forming an IC with embedded SRAM cells, according to various aspects of the present disclosure.
  • FIGS. 14-20B illustrate top and/or cross-sectional views of a portion of embedded SRAM cells manufactured with the method in FIG. 13 , in accordance with an embodiment.
  • FIG. 21 shows a method of forming an IC with embedded SRAM cells, according to various aspects of the present disclosure.
  • FIGS. 22A-24C illustrate top and/or cross-sectional views of a portion of embedded SRAM cells manufactured with the method in FIG. 21 , in accordance with an embodiment.
  • FIG. 25A illustrates a layout of fin active lines of four SRAM cells, according to various aspects of the present disclosure.
  • FIG. 25B illustrates a three-layer partition of the fin active line layout of FIG. 25A , in accordance with an embodiment.
  • FIG. 25C illustrates gate features of the four SRAM cells of FIG. 25A overlapping with the fin active line thereof, in accordance with an embodiment.
  • first and second features are formed in direct contact
  • additional features may be formed between the first and second features, such that the first and second features may not be in direct contact
  • present disclosure may repeat reference numerals and/or letters in the various examples. This repetition is for the purpose of simplicity and clarity and does not in itself dictate a relationship between the various embodiments and/or configurations discussed.
  • spatially relative terms such as “beneath,” “below,” “lower,” “above,” “upper” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures.
  • the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures.
  • the apparatus may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein may likewise be interpreted accordingly.
  • FIG. 1 shows a semiconductor device 100 with an SRAM macro 102 .
  • the semiconductor device can be, e.g., a microprocessor, an application specific integrated circuit (ASIC), a field programmable gate array (FPGA), or a digital signal processor (DSP).
  • ASIC application specific integrated circuit
  • FPGA field programmable gate array
  • DSP digital signal processor
  • FIG. 2 shows a more detailed view of a portion of the SRAM macro 102 , according to various aspects of the present disclosure.
  • the SRAM macro 102 includes a plurality of SRAM cells 202 and a plurality of peripheral logic circuits 210 .
  • Each SRAM cell 202 is used to store one memory bit, while the peripheral logic circuits 210 are used to implement various logic functions, such as write and/or read address decoder, word/bit selector, data drivers, memory self-testing, etc.
  • the logic circuits 210 include a plurality of FinFETs having gate features 218 and fin active lines 212 .
  • each of the SRAM cells 202 also includes a plurality of FinFETs having gate features and fin active lines.
  • the SRAM macro 102 may include a large number of SRAM cells 202 for a given semiconductor device 100 .
  • the SRAM macro 102 may include thousands or millions of the SRAM cells 202 .
  • the SRAM cells 202 are formed over a plurality of P-wells or P-diffusions (e.g., for n-type FinFETs or N-FinFETs) and N-wells or N-diffusions (e.g., for p-type FinFETs or P-FinFETs) wherein the P-wells and the N-wells are rectangular semiconductor regions arranged in alternating order in an X direction.
  • each of the SRAM cells 202 includes a plurality of N-FinFETs and a plurality of P-FinFETs.
  • the SRAM cells 202 are arranged in an array with one SRAM cell abutting another.
  • Each of the SRAM cells 202 occupies a rectangular region of the SRAM macro 102 wherein the rectangular region has a first dimension 204 in the X direction and a second dimension 206 in a Y direction that is orthogonal to the X direction.
  • the first dimension 204 is also referred to as the SRAM cell 202 's X-pitch
  • the second dimension 206 the SRAM cell 202 's Y-pitch.
  • each of the SRAM cells 202 is configured in one of four orientations.
  • a group 203 includes four SRAM cells 202 in a two-by-two array, denoted as Cell-R 0 , Cell-Mx, Cell-My, and Cell-R 180 for the convenience of discussion.
  • the gate features and fin active lines of the Cell-R 0 are mirror images (or reflection) of those respective features of the Cell-Mx with respect to an imaginary lines A-A through a geometric center of the group 203 in the X direction.
  • the gate features and fin active lines of the Cell-R 0 are mirror images of those respective features of the Cell-My with respect to an imaginary lines B-B through the geometric center of the group 203 in the Y direction.
  • the Cell-R 180 is a mirror image of the Cell-Mx with respect to the imaginary lines B-B, and a mirror image of the Cell-My with respect to the imaginary lines A-A.
  • the configuration of the SRAM macro 102 allows alignment of the features of the peripheral logic circuits 210 (e.g., the gate features 218 and fin active lines 212 ) with those respective features of the SRAM cells 202 . This can be accomplished by careful consideration of ratios between the X-pitch 204 and fin pitch 214 , and between the Y-pitch 206 and gate pitch 216 . Such alignment enables dense fin active line definition and formation thereby providing many benefits, such as higher SRAM cell density, higher manufacturing reliability in view of optical proximity effect, etc.
  • having a fixed ratio between the Y-pitch 206 and gate pitch 216 allows certain peripheral logic circuits (e.g., word-line drivers, decoders, etc.) to be automatically generated as a circuit block which is then repetitively placed along the SRAM cells.
  • having a fixed ratio between the X-pitch 204 and fin pitch 214 allows certain peripheral logic circuits (e.g., column selector, bit-line pre-charge circuit, decoders, etc.) to be automatically generated and placed.
  • FIG. 3 illustrates a top view of a portion of the peripheral logic circuit 210 .
  • Each of the fin active lines 212 has a rectangular shape with its long edge extending in the Y direction and its short edge extending in the X direction.
  • the fin pitch 214 is defined as the edge-to-edge spacing between two adjacent fin active lines 212 .
  • the fin pitch 214 may be defined as the center-line-to-center-line spacing between two adjacent fin active lines 212 .
  • the gate features 218 are oriented orthogonally with respect to the fin active lines 212 .
  • Each of the gate features 218 has a rectangular shape with its long edge extending in the X direction and its short edge extending in the Y direction.
  • the gate pitch 216 is defined as the edge-to-edge spacing between two adjacent gate features 218 .
  • the gate pitch 216 may be defined as the center-line-to-center-line spacing between two adjacent gate features 218 .
  • the peripheral logic circuit 210 further includes a plurality of active contacts 220 that couple multiple fin active lines 212 to form common drains/sources for respective FinFETs.
  • FIG. 4A shows a schematic view of a six-transistor (6T) single port (SP) SRAM cell that may be implemented as the SRAM cell 202 of FIG. 2 .
  • the 6T SP SRAM cell 202 includes two P-FinFETs as pull-up transistors, PU- 1 and PU- 2 ; two N-FinFETs as pull-down transistors, PD- 1 and PD- 2 ; and two N-FinFETs as pass-gate transistors, PG- 1 and PG- 2 .
  • the PU- 1 and PD- 1 are coupled to form an inverter (Inverter- 1 in FIG. 4B ).
  • FIG. 4A further shows word line (WL), bit line (BL), and bit line bar (BL) for accessing the storage unit of the SRAM cell 202 .
  • the SRAM cell 202 of FIG. 4A can be implemented physically (e.g., layout) in many ways.
  • the following discussion will describe some layout designs of three embodiments of the SRAM cell 202 , namely, SRAM cells 202 A, 202 B, and 202 C, according to various aspects of the present disclosure.
  • SRAM cells 202 A, 202 B, and 202 C are merely examples and are not intended to limit the inventive scope of the provided subject matter.
  • FIG. 5 shows a top view of a portion of the SRAM macro 102 's layout including the SRAM cell 202 A.
  • the SRAM cell 202 A is indicated with a rectangular boundary (a dotted line) with a first dimension (X-pitch) 204 A and a second dimension (Y-pitch) 206 A.
  • the layout includes one N-well active region and two P-well active regions, one on each side of the N-well active region in the X direction.
  • the layout further includes two fin active lines, 222 A and 224 A, with one in each of the P-well active regions, extending lengthwise in the Y direction and overlapping the SRAM cell 202 A.
  • the layout further includes two fin active lines, 226 A and 228 A, in the N-well active region, extending lengthwise in the Y direction and partially overlapping the SRAM cell 202 A.
  • the fin active lines 226 A and 228 A are shortened for reducing cell area.
  • the four fin active lines, 222 A, 226 A, 228 A, and 224 A are spaced edge-to-edge by about twice of the fin pitch 214 .
  • the spacing between these fin active lines are set to between about 2 and about 2.5 times of the fin pitch 214 to allow enough design margin and process margin when forming the SRAM cell fin lines.
  • the X-pitch 204 A can still be maintained as an integer multiple of the fin pitch 214 .
  • the layout includes two gate features, 232 A and 234 A, extending lengthwise in the X direction and partially overlapping the SRAM cell 202 A and being shared between the SRAM cell 202 A and adjacent SRAM cells (not shown), and two gate features, 236 A and 238 A, extending lengthwise in the X direction within the SRAM cell 222 A.
  • the above gate features and the fin active lines collectively define the six transistors, PU- 1 / 2 , PD- 1 / 2 , and PG- 1 / 2 of FIG. 4A .
  • the Y-pitch 206 A is substantially equal to the sum of the pass-gate transistor (PG- 1 or PG- 2 ) pitch and the pull-down transistor (PD- 1 or PD- 2 ) pitch, wherein a transistor's pitch refers to a distance between the transistor's source and drain.
  • the Y-pitch 206 A is set to be about twice of the gate pitch 216 ( FIG. 3 ), while the X-pitch 204 A is set to be about 8, 8.5, or 9 times of the fin pitch 214 ( FIG. 3 ).
  • Such settings take into account the fact that proper alignment of respective features between the SRAM cells 202 A and the peripheral logic circuits 210 improves overall manufacturability of the semiconductor device 100 having the SRAM macro 102 ( FIGS. 1 and 2 ). For example, having a single fin pitch rule among the SRAM cells 202 A and the peripheral circuits 210 helps improve fin active lines' critical dimension uniformity during lithography process. Due to its compact layout, the SRAM cell 202 A is well-suited for high density embedded SRAM applications.
  • the SRAM macro 102 ( FIG. 2 ) includes only this type of SRAM cell and the X-pitch 204 A is set to about 8 times of the fin pitch 214 ( FIG. 3 ). In another embodiment, the X-pitch 204 A is set to about 9 times of the fin pitch 214 . In some embodiments, the X-pitch 204 A is set to a non-integer multiple of the fin pitch 214 , such as 8.5 times. That is made possible by the configuration of the SRAM cells 202 A in the SRAM macro 102 ( FIG.
  • FIG. 6 shows a portion of the SRAM cell 202 B's layout
  • FIG. 7 shows a portion of the SRAM cell 202 C's layout.
  • Many aspects of the SRAM cells 202 B and 202 C are similar to those of the SRAM cell 202 A, and are hereby omitted from discussion for brevity.
  • the SRAM cell 202 B is indicated with a rectangular boundary (a dotted line) with a first dimension (X-pitch) 204 B and a second dimension (Y-pitch) 206 B.
  • One difference between the SRAM cells 202 B and 202 A is that the SRAM cell 202 B includes two fin active lines in each of the two P-well active regions, 222 B- 1 / 2 and 224 B- 1 / 2 .
  • the transistors PG- 1 / 2 and PD- 1 / 2 of the SRAM cell 202 B have dual-fin active lines for increased current sourcing capability.
  • the two fins 222 B- 1 and 222 B- 2 are spaced edge-to-edge by one fin pitch 214 , so are the two fins 224 B- 1 and 224 B- 2 .
  • the X-pitch 204 B is greater than the X-pitch 204 A ( FIG. 5 ) by about twice of the fin pitch 214 ( FIG. 3 ).
  • the Y-pitch 206 B is about twice of the gate pitch 216 .
  • a ratio between the X-pitch 204 B and the Y-pitch 206 B is in a range of about 2.7 to about 2.9.
  • the transistors PG- 1 / 2 and PD- 1 / 2 of the SRAM cell 202 C have triple-fin active lines 222 C- 1 / 2 / 3 and 224 C- 1 / 2 / 3 respectively for increased current sourcing capability;
  • the X-pitch 204 C is greater than the X-pitch 204 A ( FIG. 5 ) by about four times of the fin pitch 214 ( FIG. 3 ); and the Y-pitch 206 C is about twice of the gate pitch 216 ( FIG. 3 ).
  • the three fins 222 C- 1 , 222 C- 2 , and 222 C- 3 are spaced edge-to-edge by one fin pitch 214 , so are the three fins 224 C- 1 , 2224 - 2 , and 2224 - 3 .
  • FIG. 8 shows a schematic view of a two-port (TP) SRAM cell 202 D that may be implemented as the SRAM cell 202 of FIG. 2 .
  • the SRAM cell 202 D includes a write-port portion 802 and a read-port portion 804 .
  • the write-port portion 802 is effectively a 6T SP SRAM cell as shown in FIG. 4A .
  • the read-port portion 804 includes a read pull-down transistor R_PD and read pass-gate transistor R_PG.
  • FIG. 9 shows a top view of a portion of the SRAM cell 202 D's layout, in accordance with an embodiment.
  • the layout of the write-port portion 802 is substantially the same as that of the SRAM cell 202 B ( FIG. 6 ), while the layout of the read-port portion 804 includes the transistors R_PD and R_PG, each as a dual-fin FinFET.
  • Two fin active lines 902 - 1 and 902 - 2 are spaced edge-to-edge by one fin pitch 214 .
  • Many aspects of the SRAM cells 202 D are similar to those discussed above with respect to FIGS.
  • the Y-pitch 206 D is set to about twice of the gate pitch 216 , while the X-pitch 204 D is an integer multiple, e.g., 15 times, of the fin pitch 214 .
  • FIGS. 10A and 10B show metal routing of the SRAM cells thus far discussed, in accordance with some embodiments.
  • FIG. 10A shows that the power supply lines (CVdd), bit lines ( BL ), and bit bar lines (BL) are routed in a first metal layer, while the word lines (WL) and the ground lines (Vss) are routed in a second metal layer.
  • FIG. 10B shows that the word lines (WL) are routed in the first metal layer; and the power supply lines (CVdd), bit lines (BL), bit bar lines ( BL ), and the ground lines (Vss) are routed in the second metal layer.
  • the first metal layer is located in between the second metal layer and the active regions of the respective SRAM cells.
  • the first and second metal layers are coupled through inter-layer vias.
  • a semiconductor device may include more than one SRAM macros. Careful considerations must be taken to ensure manufacturability and circuit density of each of the SRAM macros as well as that at the device level. The present disclosure is well adapted to solving such a problem.
  • FIG. 11 shows that the semiconductor device 100 includes another SRAM macro 104 in addition to the SRAM macro 102 . Although they are shown side by side in FIG. 11 , in practice, the two SRAM macros may be placed anywhere in the semiconductor device 100 . Furthermore, the two SRAM macros 102 and 104 may include the same or different types of SRAM cells.
  • the SRAM macro 102 includes an array of the SRAM cells 202 A
  • the SRAM macro 104 includes an array of the SRAM cells 202 A, 202 B, 202 C, or 202 D.
  • various dimensions of the SRAM macros and the peripheral logic circuits are designed so as to improve full-chip layout automation, fin active line critical dimension uniformity, and overall device manufacturability.
  • the SRAM macro 102 includes an array of the SRAM cells 202 A ( FIG. 5 ) while the SRAM macro 104 includes an array of the SRAM cells 202 B ( FIG. 6 ).
  • the X-pitch 204 B is set to be about equal to the X-pitch 204 A plus twice of the fin pitch 214 ( FIG. 3 ). In an embodiment, the X-pitch 204 A is set to be about 8 times of the fin pitch 214 and the X-pitch 204 B is set to be about 10 times of the fin pitch 214 .
  • the X-pitch 204 A is set to be about 8.5 times of the fin pitch 214 and the X-pitch 204 B is set to be about 10.5 times of the fin pitch 214 . In yet another embodiment, the X-pitch 204 A is set to be about 9 times of the fin pitch 214 and the X-pitch 204 B is set to be about 11 times of the fin pitch 214 . Both the Y-pitch 206 A and the Y-pitch 206 B are set to be about twice of the gate pitch 216 .
  • the ratio of the X-pitch 204 B to the Y-pitch 206 B is in a range of about 2.7 to about 2.9, such as 2.8; and the ratio of the X-pitch 204 A to the Y-pitch 206 A is in a range of about 2.25 to about 2.28, such as 2.2667.
  • the SRAM macro 102 includes an array of the SRAM cells 202 B ( FIG. 6 ) while the SRAM macro 104 includes an array of the SRAM cells 202 D ( FIG. 8 ).
  • the X-pitch 204 B is set to be about 10.5 times of the fin pitch 214 ( FIG. 3 ) and the X-pitch 204 D is set to be about 15 times of the fin pitch 214 .
  • Both the Y-pitch 206 B and the Y-pitch 206 D are set to be about twice of the gate pitch 216 .
  • the SRAM macro 102 includes an array of the SRAM cells 202 B ( FIG. 6 ) while the SRAM macro 104 includes an array of the SRAM cells 202 C ( FIG. 7 ).
  • the X-pitch 204 C is set to be about the X-pitch 204 B plus twice of the fin pitch 214 ( FIG. 3 ).
  • the X-pitch 204 B is set to be about 10 times of the fin pitch 214 and the X-pitch 204 C is set to be about 12 times of the fin pitch 214 .
  • the X-pitch 204 B is set to be about 10.5 times of the fin pitch 214 and the X-pitch 204 C is set to be about 12.5 times of the fin pitch 214 .
  • FIG. 12A shows fin active lines of the group 203 ( FIG. 2 ) that includes four adjacent SRAM cells 202 A ( FIG. 5 ), Cell-R 0 , Cell-My, Cell-Mx, and Cell-R 180 .
  • the four cells are arranged in two rows and two columns.
  • the imaginary line A-A denotes their boundary along the X direction
  • the imaginary line B-B denotes their boundary along the Y direction.
  • Cell-R 0 and Cell-My are mirror images of Cell-Mx and Cell-R 180 along the line A-A
  • Cell-R 0 and Cell-Mx are mirror images of Cell-My and Cell-R 180 along the line B-B.
  • these fin active lines are formed using spacer lithography with three masks (or reticles), 1202 , 1204 , and 1206 , as shown in FIG. 12B .
  • the three masks, 1202 , 1204 , and 1206 are three layers of the design layout of the SRAM macro 102 (and of the semiconductor device 100 ).
  • the mask 1202 defines mandrel patterns for spacer formation
  • the mask 1204 defines dummy-fin cut patterns for removing dummy spacers (or dummy fin lines)
  • the mask 1206 defines fin-end cut patterns, e.g., for shortening fin lines for the pull-up transistors (e.g. PU- 1 and PU- 2 in FIG. 5 ).
  • Each mandrel pattern has a rectangular shape (top view) extending lengthwise in the Y direction.
  • each mandrel pattern extends over at least four SRAM cells 202 A (see FIG. 2 ). In an embodiment, there are four mandrel patterns extending over each SRAM cell 202 A.
  • mandrel pattern configuration shape, size, and position of the mandrel patterns within each cell
  • Cell-R 0 and Cell-My are mirror images of Cell-Mx and Cell-R 180 along the line A-A
  • Cell-R 0 and Cell-Mx are translations of Cell-My and Cell-R 180 , i.e., shifted by one X-pitch 204 A in the X direction.
  • Each dummy-fin cut pattern 1204 is also a rectangular shape (top view) extending lengthwise in the Y direction.
  • the fin-end cut patterns 1206 are located at the boundaries of the SRAM cells in the Y direction for cutting fin lines, e.g., for reducing active areas for the PU- 1 and PU- 2 transistors. Partitioning the layout of FIG. 12A into three masks of FIG. 12B allows dense and/or regular patterns to be created with each of the masks 1202 , 1204 and 1206 , which greatly improves pattern critical dimension uniformity during photolithography.
  • FIG. 12C shows the gate features of the group 203 superimposed onto the fin active lines of the same group.
  • Each gate feature is a rectangular shape extending lengthwise in the X direction.
  • the gate features are spaced in the Y direction having a pitch about half of the Y-pitch 206 A.
  • the gate features extend over the fin active lines for forming various P-FinFETs and N-FinFETs.
  • gate feature configuration shape, size, and position of gate features within each cell
  • Cell-R 0 and Cell-My are mirror images of Cell-Mx and Cell-R 180 along the line A-A
  • Cell-R 0 and Cell-Mx are mirror images of Cell-My and Cell-R 180 along the line B-B.
  • FIG. 13 shows a method 1300 of forming the fin active lines of the group 203 ( FIG. 12A ) using the masks 1202 , 1204 , and 1206 ( FIG. 12B ), in accordance with an embodiment. Additional operations can be provided before, during, and after the method 1300 , and some operations described can be replaced, eliminated, or moved around for additional embodiments of the method. The method 1300 will be described in conjunction with FIGS. 14-24C .
  • the method 1300 deposits dielectric layers 1404 and 1406 over a silicon substrate 1402 (e.g., semiconductor wafer).
  • a silicon substrate 1402 e.g., semiconductor wafer.
  • the silicon substrate 1402 with the first dielectric layer 1404 (such as silicon oxide) and the second dielectric layer 1406 (such as silicon nitride) formed thereon.
  • Materials suitable for the dielectric layers 1404 and 1406 include, but not limited to, silicon oxide, silicon nitride, poly-silicon, Si 3 N 4 , SiON, TEOS, nitrogen-containing oxide, nitride oxide, high K material (K>5), or combinations thereof.
  • the dielectric layers 1404 and 1406 are formed by a procedure that includes deposition.
  • the first dielectric layer 1404 of silicon oxide is formed by thermal oxidation.
  • the second dielectric layer 1406 of silicon nitride (SiN) is formed by chemical vapor deposition (CVD).
  • the SiN layer is formed by CVD using chemicals including Hexachlorodisilane (HCD or Si 2 C 16 ), Dichlorosilane (DCS or SiH 2 C 12 ), Bis(TertiaryButylAmino) Silane (BTBAS or C 8 H 22 N 2 Si) and Disilane (DS or Si 2 H 6 ).
  • the dielectric layer 1406 is about 20 nm to about 200 nm thick.
  • the method 1300 proceeds to operation 1304 to form mandrel patterns 1502 in the dielectric layer 1406 .
  • the mandrel patterns 1502 are evenly distributed in the X direction.
  • the mandrel patterns 1502 are formed by patterning the dielectric layer 1406 with a procedure including a lithography process and an etching process.
  • a photoresist layer is formed on the dielectric layer 1406 using a spin-coating process and soft baking process. Then, the photoresist layer is exposed to a radiation using the mask 1202 ( FIG. 12B ).
  • the exposed photoresist layer is developed using post-exposure baking (PEB), developing, and hard baking thereby forming a patterned photoresist layer over the dielectric layer 1406 .
  • PEB post-exposure baking
  • the dielectric layer 1406 is etched through the openings of the patterned photoresist layer, forming a patterned dielectric layer 1406 .
  • the patterned photoresist layer is removed thereafter using a suitable process, such as wet stripping or plasma ashing.
  • the etching process includes applying a dry (or plasma) etch to remove the dielectric layer 1406 within the openings of the patterned photoresist layer.
  • the etching process includes applying a wet etch with a hydrofluoric acid (HF) solution to remove the SiO layer 1406 within the openings.
  • HF hydrofluoric acid
  • the method 1300 proceeds to operation 1306 to form spacers 1602 .
  • FIG. 16A top view
  • FIG. 16B cross-sectional view along the A-A lines of FIG. 16A
  • the spacers 1602 include one or more material different from the mandrel patterns 1502 .
  • the spacers 1602 may include a dielectric material, such as titanium nitride, silicon nitride, or titanium oxide.
  • the spacers 1602 can be formed by various processes, including a deposition process and an etching process.
  • the deposition process includes a chemical vapor deposition (CVD) process or a physical vapor deposition (PVD) process.
  • the etching process includes an anisotropic etch such as plasma etch.
  • the method 1300 proceeds to operation 1308 to remove the mandrel patterns 1502 .
  • the spacers 1602 remain over the dielectric layer 1404 after the mandrel patterns 1502 have been removed, e.g., by an etching process selectively tuned to remove the dielectric material 1406 but not the spacer material.
  • the etching process can be a wet etching, a dry etching, or a combination thereof.
  • the method 1300 proceeds to operation 1310 to form fin lines 1802 in the silicon substrate 1402 .
  • FIG. 18B which is cross-sectional view along the A-A lines of FIG. 18A
  • the silicon substrate 1402 are etched with the spacers 1602 as an etch mask.
  • the spacers 1602 and the dielectric layer 1404 are subsequently removed thereby forming the fin lines 1802 in the silicon substrate 1402 ( FIG. 18C ).
  • the method 1300 proceeds to operation 1312 to perform a first fin cut process with the mask 1204 ( FIG. 12B ) thereby removing dummy fin lines.
  • dummy fin lines 1802 D are removed thereby leaving the fin lines 1802 A on the silicon substrate 1402 .
  • the dummy fin lines 1802 D are removed by a procedure including a lithography process and an etching process. For example, a photoresist layer is formed on the silicon substrate using a spin-coating process and soft baking process.
  • the photoresist layer is exposed to a radiation using the mask 1204 where the dotted lines of FIG. 19A indicate openings to be formed.
  • the exposed photoresist layer is subsequently developed and stripped thereby forming a patterned photoresist layer.
  • the fin lines 1802 A are protected by the patterned photoresist layer while the dummy fin lines 1802 D are not protected as such.
  • the dummy fin lines 1802 D are etched through the openings of the patterned photoresist layer.
  • the patterned photoresist layer is removed thereafter using a suitable process, such as wet stripping or plasma ashing.
  • the method 1300 proceeds to operation 1314 to perform a second fin cut process with the mask 1206 ( FIG. 12B ) thereby cutting fin lines for pull-up transistors such as PU- 1 and PU- 2 of FIG. 5 .
  • FIG. 20A top view
  • FIG. 20B cross-sectional view along the A-A lines of FIG. 20A
  • portions of the fin lines 1802 A are removed across the boundaries of the SRAM cells 202 A thereby forming shortened fin lines for the pull-up transistors PU- 1 and PU- 2 .
  • the second fin cut process is similar to the first fin cut process discussed with respect to FIGS. 19A and 19B except that the second fin cut process uses the mask 1206 .
  • the method 1300 proceeds to operation 1316 to form a final device with the fin lines 1802 A.
  • the operation 1316 may include implanting dopant for well and channel doping, forming gate dielectric, forming lightly doped source/drain, forming gate stacks, and so on.
  • FIG. 21 shows a method 2100 of forming the fin active lines of the group 203 ( FIG. 12A ) with the three masks, 1202 , 1204 , and 1206 , of FIG. 12B , in accordance with an embodiment. Additional operations can be provided before, during, and after the method 2100 , and some operations described can be replaced, eliminated, or moved around for additional embodiments of the method. Some operations of the method 2100 are the same or similar to those respective operations of the method 1300 , and are hereby omitted from discussion for brevity.
  • the method 2100 ( FIG. 21 ) has formed spacers 1602 A and 1602 D ( FIGS. 22A and 22B ) where the spacers 1602 A will be used for forming fin active lines while the spacers 1602 D (dummy spacers) will not.
  • the method 2100 removes the dummy spacers 1602 D with the aid of the mask 1204 , e.g., by a photolithography process and an etching process as discussed above with reference to FIGS. 19A and 19B , wherein the etching process is selectively tuned to remove the spacer material ( FIG. 22C ).
  • the method 2100 ( FIG. 21 ) cuts the spacers 1602 A across the boundaries of the SRAM cells 202 A with the aid of the mask 1206 ( FIGS. 23A and 23B ). This can be done with a process similar to the photolithography process and the etching process as discussed above with reference to FIGS. 20A and 20B , wherein the etching process is selectively tuned to remove the spacer material ( FIG. 23B ).
  • the method 2100 etches the silicon substrate 1402 with the remaining spacers 1602 A as an etch mask ( FIGS. 24A and 24B ).
  • the spacers 1602 A and the dielectric layer 1404 are subsequently removed thereby forming fin lines 1802 A in the silicon substrate 1402 for the transistors PU- 1 / 2 , PD- 1 / 2 , and PG- 1 / 2 ( FIG. 24C ).
  • the method 2100 ( FIG. 21 ) proceeds to operation 1316 to form a final device with the fin lines 1802 A as discussed above.
  • FIG. 25A shows fin active lines of the group 203 ( FIG. 2 ) that includes four adjacent SRAM cells 202 B ( FIG. 6 ), Cell-R 0 , Cell-My, Cell-Mx, and Cell-R 180 .
  • the four cells are arranged in two rows and two columns.
  • the imaginary line A-A denotes their boundary along the X direction
  • the imaginary line B-B denotes their boundary along the Y direction.
  • Cell-R 0 and Cell-My are mirror images of Cell-Mx and Cell-R 180 along the line A-A
  • Cell-R 0 and Cell-Mx are mirror images of Cell-My and Cell-R 180 along the line B-B.
  • these fin active lines are formed using spacer lithography with three masks, 2502 , 2504 , and 2506 , as shown in FIG. 25B .
  • the three masks 2502 , 2504 , and 2506 are three layers of the design layout of the SRAM macro 102 (and of the semiconductor device 100 ).
  • the mask 2502 defines mandrel patterns for spacer formation
  • the mask 2504 defines dummy-fin cut patterns for removing dummy fin lines (or dummy spacers)
  • the mask 2506 defines fin-end cut patterns for shortening fin lines for the pull-up transistors (e.g. PU- 1 and PU- 2 in FIG. 5 ).
  • the mandrel patterns are evenly distributed in the X direction.
  • Each mandrel pattern has a rectangular shape (top view) extending lengthwise in the Y direction.
  • each mandrel pattern extends over at least four SRAM cells 202 B (see FIG. 2 ).
  • the layout includes five mandrel patterns extending over each SRAM cell 202 B.
  • Cell-R 0 and Cell-My are mirror images of Cell-Mx and Cell-R 180 along the line A-A, while Cell-R 0 and Cell-Mx are translations of Cell-My and Cell-R 180 , i.e., shifted by one X-pitch 204 B in the X direction.
  • Each dummy-fin cut pattern is also a rectangular shape (top view) extending lengthwise in the Y direction.
  • the fin-end cut patterns are located at the boundaries of the SRAM cells 202 B in the Y direction and are used for cutting fin lines, e.g., for reducing active areas for the PU- 1 and PU- 2 transistors. Partitioning the layout of FIG. 25A into three masks of FIG. 25B allows dense and/or regular patterns to be created with the masks, which improves pattern critical dimension uniformity during photolithography.
  • the fin active lines of FIG. 25A can be formed with the masks of FIG. 25B using an embodiment of the method 1300 ( FIG. 13 ) or the method 2100 ( FIG. 21 ) as discussed above.
  • FIG. 25C shows the gate features of the group 203 superimposed onto the fin active lines of the same group ( FIG. 25A ).
  • Each gate feature is a rectangular shape extending lengthwise in the X direction.
  • the gate features are spaced in the Y direction having a pitch about half of the Y-pitch 206 B.
  • the gate features extend over the fin active lines for forming various P-FinFETs and N-FinFETs.
  • gate feature configuration shape, size, and position of gate features within each cell
  • Cell-R 0 and Cell-My are mirror images of Cell-Mx and Cell-R 180 along the line A-A
  • Cell-R 0 and Cell-Mx are mirror images of Cell-My and Cell-R 180 along the line B-B.
  • the present disclosure defines an embedded FinFET SRAM macro structure which enables alignment of respective features (e.g., fin active lines, gate features, etc.) between SRAM cells and peripheral logic circuits. Such alignment enables dense fin active lines formation and single fin pitch design, as an example.
  • the embedded FinFET SRAM macro structure is flexible in that it may include high density SRAM cells, high current SRAM cells, single port SRAM cells, two-port SRAM cells, or a combination thereof. Therefore, it can be deployed in a wide range of applications, such as computing, communication, mobile phones, and automotive electronics.
  • the present disclosure further teaches layout designs of the fin active regions for some embodiments of the SRAM cells, as well as methods for making the same.
  • the fin active region layout is partitioned into a mandrel pattern layer (mask) and two cut pattern layers (masks).
  • the mandrel patterns are dense, parallel, and rectangular shapes, enhancing critical dimension uniformity during photolithography process.
  • the present disclosure is directed to an integrated circuit (IC) layout.
  • the IC layout includes a first rectangular region, wherein the first rectangular region has its longer sides in a first direction and its shorter sides in a second direction that is orthogonal to the first direction; and a first imaginary line through a geometric center of the first rectangular region in the first direction and a second imaginary line through the geometric center in the second direction divide the first rectangular region into a first, second, third, and fourth sub-regions in counter-clockwise order with the first sub-region located at an upper-right portion of the first rectangular region.
  • the IC layout further includes at least eight first patterns located at a first layer of the IC layout, wherein each of the first patterns is a rectangular shape extending lengthwise in the second direction over the first rectangular region; the first patterns are spaced from each other in the first direction; a first, second, third, and fourth portions of the first patterns overlap with the first, second, third, and fourth sub-regions respectively; the first and second portions of the first patterns are mirror images of the respective fourth and third portions of the first patterns with respect to the first imaginary line; and the first and fourth portions of the first patterns are translations of the respective second and third portions of the first patterns.
  • the IC layout further includes at least eight second patterns located at a second layer of the IC layout, wherein each of the second patterns is a rectangular shape extending lengthwise in the second direction, the second patterns are spaced from each other in the first direction, each of the second patterns partially overlaps with one of the first patterns and fully covers a longer side of the respective first pattern when the first and second layers are superimposed.
  • the IC layout further includes a plurality of third patterns located at a third layer of the IC layout, wherein each of the third patterns is a rectangular shape, the third patterns are spaced from each other, each of the third patterns partially overlaps with one of the first patterns and covers a portion of a longer side of the respective first pattern that is not covered by the second patterns when the first, second, and third layers are superimposed.
  • the first, second, and third patterns are used for collectively defining a plurality of active regions for forming transistors; and the plurality of active regions are defined along longer sides of the first patterns that are not covered by the second and third patterns when the first, second, and third layers are superimposed.
  • the present disclosure is directed to a semiconductor device.
  • the semiconductor device includes a first SRAM macro, wherein the first SRAM macro includes a first plurality of single-port SRAM cells and a second plurality of peripheral logic circuits, the first plurality are arranged to have a first pitch in a first direction and a second pitch in a second direction orthogonal to the first direction, the first plurality include FinFET transistors formed by first gate features and first fin active lines, the second plurality include FinFET transistors formed by second gate features and second fin active lines, the second gate features are arranged to have a third pitch in the second direction, and the second fin active lines are arranged to have a fourth pitch in the first direction.
  • the semiconductor device further includes a second SRAM macro, wherein the second SRAM macro includes a third plurality of single-port SRAM cells and a fourth plurality of peripheral logic circuits, the third plurality are arranged to have a fifth pitch in the first direction and a sixth pitch in the second direction, the third plurality include FinFET transistors formed by third gate features and third fin active lines, the fourth plurality include FinFET transistors formed by fourth gate features and fourth fin active lines, the fourth gate features are arranged to have the third pitch in the second direction, and the fourth fin active lines are arranged to have the fourth pitch in the first direction.
  • the second pitch is about twice of the third pitch
  • the sixth pitch is about the same as the second pitch
  • the fifth pitch is greater than the first pitch by about twice of the fourth pitch.
  • the present disclosure is directed to a semiconductor device.
  • the semiconductor device includes a first SRAM macro, wherein the first SRAM macro includes a first plurality of single-port SRAM cells and a second plurality of peripheral logic circuits, the first plurality are arranged to have a first pitch in a first direction and a second pitch in a second direction orthogonal to the first direction, the first plurality include first FinFET transistors formed by first gate features and first fin active lines, the second plurality include second FinFET transistors formed by second gate features and second fin active lines, the second gate features are arranged to have a third pitch in the second direction, and the second fin active lines are arranged to have a fourth pitch in the first direction.
  • the semiconductor device further includes a second SRAM macro, wherein the second SRAM macro includes a third plurality of two-port SRAM cells and a fourth plurality of peripheral logic circuits, the third plurality are arranged to have a fifth pitch in the first direction and a sixth pitch in the second direction, the third plurality include third FinFET transistors formed by third gate features and third fin active lines, the fourth plurality include fourth FinFET transistors formed by fourth gate features and fourth fin active lines, the fourth gate features are arranged to have the third pitch in the second direction, and the fourth fin active lines are arranged to have the fourth pitch in the first direction.
  • the second pitch is about twice of the third pitch
  • the sixth pitch is about the same as the second pitch
  • a first ratio between the first pitch and the fourth pitch is not an integer
  • a second ratio between the fifth pitch and the fourth pitch is an integer.
US14/191,789 2014-02-27 2014-02-27 Structure and method for FinFET SRAM Active 2034-05-28 US9257439B2 (en)

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US14/191,789 US9257439B2 (en) 2014-02-27 2014-02-27 Structure and method for FinFET SRAM
CN201410187533.5A CN104882444B (zh) 2014-02-27 2014-05-05 鳍式场效应晶体管sram的结构和方法
KR1020140081170A KR101706420B1 (ko) 2014-02-27 2014-06-30 집적 회로 레이아웃으로부터 형성되는 반도체 디바이스
TW103146488A TWI552314B (zh) 2014-02-27 2014-12-31 積體電路佈局及半導體裝置
KR1020150146569A KR101594743B1 (ko) 2014-02-27 2015-10-21 Finfet sram을 위한 구조물
US14/991,526 US9673202B2 (en) 2014-02-27 2016-01-08 Structure and method for FinFET SRAM
US15/613,387 US10141318B2 (en) 2014-02-27 2017-06-05 Structure and method for FinFET SRAM
US16/199,338 US10461087B2 (en) 2014-02-27 2018-11-26 Structure and method for FinFET SRAM
US16/666,061 US10971503B2 (en) 2014-02-27 2019-10-28 Structure and method for FinFET SRAM
US17/222,143 US11342337B2 (en) 2014-02-27 2021-04-05 Structure and method for FinFET SRAM

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