US6309992B1 - Dielectric forming material and dielectric forming paste for use in plasma display panel - Google Patents

Dielectric forming material and dielectric forming paste for use in plasma display panel Download PDF

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Publication number
US6309992B1
US6309992B1 US09/497,452 US49745200A US6309992B1 US 6309992 B1 US6309992 B1 US 6309992B1 US 49745200 A US49745200 A US 49745200A US 6309992 B1 US6309992 B1 US 6309992B1
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United States
Prior art keywords
glass
forming material
dielectric forming
nio
powder
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Expired - Fee Related
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US09/497,452
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English (en)
Inventor
Yoshiro Morita
Hiroyuki Oshita
Masahiko Ohji
Kazuo Hadano
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Nippon Electric Glass Co Ltd
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Nippon Electric Glass Co Ltd
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Assigned to NIPPON ELECTRIC GLASS CO., LTD. reassignment NIPPON ELECTRIC GLASS CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: HADANO, KAZUO, MORITA, YOSHIRO, OHJI, MASAHIKO, OSHITA, HIROYUKI
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    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/02—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass
    • C03C17/04—Surface treatment of glass, not in the form of fibres or filaments, by coating with glass by fritting glass powder
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/04—Frit compositions, i.e. in a powdered or comminuted form containing zinc
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
    • C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
    • C03C8/10—Frit compositions, i.e. in a powdered or comminuted form containing lead
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2211/00—Plasma display panels with alternate current induction of the discharge, e.g. AC-PDPs
    • H01J2211/20—Constructional details
    • H01J2211/34—Vessels, containers or parts thereof, e.g. substrates
    • H01J2211/38—Dielectric or insulating layers

Definitions

  • This invention relates to a dielectric forming material and a dielectric forming paste, each of which is for use as a transparent dielectric layer formed onto an inside surface of a front glass substrate in a plasma display panel.
  • An AC type plasma display panel (which may also be referred to as “PDP” hereunder) to which this invention is applicable comprises a front glass substrate for displaying a video image and a rear glass substrate opposed to the front glass substrate with a predetermined gap.
  • the front glass substrate has a plurality of display electrodes and a transparent dielectric layer formed on its inside surface facing the rear glass substrate.
  • the display electrodes are buried in the transparent dielectric layer.
  • An MgO film is formed on a surface of the transparent dielectric layer.
  • the rear glass substrate has a plurality of address electrodes formed on its inside surface facing the front glass substrate.
  • a plurality of barrier ribs vertically protrude from the rear glass substrate to be erected thereon to define a plurality of inner spaces between adjacent ones of the barrier ribs.
  • Each of the barrier ribs has a surface covered with a phosphor.
  • An inner space or cavity surrounded by the front and the rear glass substrates is filled with a rare gas.
  • the glass substrate use is generally made of a soda lime glass or a high-strain-point glass which has a strain point of 570° C. or more.
  • the light emitted from the phosphor is transmitted through the front glass substrate and the transparent dielectric layer formed thereon. However, a part of the light is scattered on the inside surfaces of the front glass substrate and the transparent dielectric layer and repeatedly reflected on the inside and the outside surfaces thereof. In this event, the light undesiredly leaks into adjacent spaces beyond the barrier ribs. This results in a phenomenon that the video image becomes unclear because of occurrence of glow around a shining point or bright spot. Such phenomenon is generally called a halation.
  • PDP plasma display panel
  • a dielectric forming material which is for use as a transparent dielectric layer formed on an inside surface of a front glass substrate in a plasma display panel, and which comprises powder of colored glass.
  • a dielectric forming paste which is for use as a transparent dielectric layer formed on an inside surface of a front glass substrate in a plasma display panel and which is characterized by including powder of colored glass as a solid component.
  • the transparent dielectric layer is formed on the front glass substrate to the thickness of about 30-40 ⁇ m in order to keep the discharge of the display electrodes.
  • the transparent dielectric layer is required to have a high breakdown voltage, an excellent transparency, and so on.
  • a transparent glass such as a PbO—B 2 O 3 —SiO 2 glass or a ZnO—B 2 O 3 —SiO 2 glass.
  • the dielectric forming material according to this invention comprises powder of a so-called colored glass containing a base glass and coloring ingredients added thereto.
  • Use of the colored glass decreases the transmittance of the light passing through the transparent dielectric layer within the wavelength range of visible light and enhances absorption of the scattered light. Accordingly, it is possible to suppress occurrence of halation. In addition, it is possible to improve the contrast in the video image.
  • Proposal is also made of a technique of coloring the transparent dielectric layer by adding pigment powder.
  • this technique is not preferable because the transmittance of the transparent dielectric layer is significantly decreased.
  • the coloring ingredients preferably comprise CoO and NiO different in light absorption within the wavelength range of visible light. It has also been confirmed that, as the base glass, a PbO—B 2 O 3 —SiO 2 glass or a ZnO—B 2 O 3 —SiO 2 glass is preferable.
  • the appropriate dielectric forming material provides a glass film having a spectral transmittance T% (460 nm) of 50-75% at the wavelength of 460 nm or which is higher than a spectral transmittance T% (550 nm) at the wavelength of 550 nm and a spectral transmittance T% (620 nm) at the wavelength of 620 nm.
  • the glass film is prepared from the dielectric forming material in the following manner. Specifically, the dielectric forming material is applied to a soda lime glass plate having a thickness of 1.7 mm and then baked or fired to form a baked film having a thickness of 20-40 ⁇ m thickness as the glass film. Thereafter, the transmittance of the glass film is measured together with the glass plate.
  • FIGURE is a cross-sectional view of an AC type plasma display panel to which this invention is applicable.
  • the AC type plasma display panel comprises a front glass substrate 1 for displaying a video image and a rear glass substrate 2 which is opposed to the front glass substrate 1 with a predetermined gap.
  • the front glass substrate 1 has a plurality of display electrodes 3 and a transparent dielectric layer 4 formed on its inside surface facing the rear glass substrate 2 .
  • the display electrodes 3 are buried in the transparent dielectric layer 4 .
  • An MgO film 5 is formed on a surface of the transparent dielectric layer 4 .
  • the rear glass substrate 2 has a plurality of address electrodes 6 formed on its inside surface facing the front glass substrate 1 .
  • a plurality of barrier ribs 7 protrude from the rear glass substrate 2 to be erected thereon to define a plurality of inner spaces between adjacent ones of the barrier ribs 7 .
  • Each of the barrier ribs 7 has a surface covered with a phosphor 8 .
  • An inner space or cavity surrounded by the front glass substrate 1 and the rear glass substrate 2 is filled with a rare gas 9 .
  • the glass substrate use is generally made of a soda lime glass or a high-strain-point glass which has a strain point of 570° C.or more.
  • the light emitted from the phosphor 8 is transmitted through the front glass substrate 1 and the transparent dielectric layer 4 formed thereon. However, a part of the light is scattered on the inside surfaces of the front glass substrate and the transparent dielectric layer and repeatedly reflected on the inside and the outside surfaces thereof. In this event, the light undesiredly leaks into adjacent spaces beyond barrier ribs 7 . This results in a phenomenon that the video image becomes unclear because of occurrence of glow around a shining point or bright spot. Such phenomenon is generally called a halation.
  • the present inventors have found that, in order to manufacture a plasma display panel suppressed in possibility of occurrence of halation, it is required to form a transparent dielectric layer capable of decreasing a transmittance within the wavelength range of visible light.
  • a dielectric forming material for use as a transparent dielectric layer formed on an inside surface of a front glass substrate in a plasma display panel comprises powder of colored glass.
  • the colored glass essentially consists of a base glass and coloring ingredients added thereto.
  • CoO has light absorbing power in the wavelength range of visible light of 440-660 nm. The light absorbing power is smaller at a shorter wavelength.
  • NiO also has light absorbing power in the wavelength range of visible light of 440-660 nm.
  • the light absorbing power is greater and smaller at a shorter wavelength and a longer wavelength, respectively. Accordingly, by adjusting the contents of CoO and NiO, it is possible to obtain desired light absorbing power in the wavelength range of visible light.
  • the content of CoO is preferably 0.01-1.0 wt % and the content of NiO is preferably 0.005-1.5 wt %. The reason why the contents of CoO and NiO are limited as mentioned above will be described below.
  • the content of CoO is less than 0.01 wt %, the light absorbing power in the wavelength range of visible light is excessively small. On the other hand, if the content of CoO is more than 1.0 wt %, the light absorbing power is excessive so that the light emitted from the phosphor is undesiredly absorbed to considerably decrease the brightness.
  • the light absorbing power in the wavelength range of visible light is excessively small.
  • the content of NiO exceeds 1.5 wt %, the light absorbing power is excessive so that the light beam emitted from the phosphor is undesiredly absorbed to considerably decrease the brightness.
  • the content of CoO is 0.05-0.8% by weight and the content of NiO is 0.03-0.8% by weight.
  • a color display panel has a disadvantage that the luminous efficiency of a blue phosphor is lower than those of other phosphors. Therefore, if the transmittance of the transparent dielectric layer is uniformly decreased, the light emitted from the blue phosphor is absorbed in the manner similar to the light emitted from the other phosphors, the brightness of the video image or picture is unfavorably degraded.
  • the light transmittance at the wavelength corresponding to the luminescent color of the blue phosphor is higher than those of the red and the green phosphors.
  • the content of NiO is limited so that the weight ratio of NiO/CoO is not greater than 2.5 (NiO/CoO ⁇ 2.5). In this manner, it is possible to reduce the absorption of the light having the wavelength corresponding to the luminescent color of the blue phosphor and, therefore, to obtain the light transmittance higher than that for each of the wavelengths corresponding to red and green.
  • the base glass comprises a PbO—B 2 O 3 —SiO 2 glass or a ZnO—B 2 O 3 —SiO 2 glass.
  • a glass having any one of the following compositions is preferable as the base glass because such glass is excellent in flowability, insulating property, and stability after baking at a temperature of 500-600° C.
  • a first preferred glass is a PbO—B 2 O 3 —SiO 2 glass essentially consisting of, by weight percent, 50-75% (preferably 55-73%) PbO, 2-30% (preferably 5-25%) B 2 O 3 , 2-35% (preferably 3-31%) SiO 2 , and 0-20% (preferably 0-10%) ZnO.
  • a second preferred glass is a PbO—B 2 O 3 —SiO 2 glass essentially consisting of, by weight percent, 20-50% (preferably 25-45%) PbO, 10-40% (preferably 15-35%) B 2 O 3 , 1-15% (preferably 2-10%) SiO 2 , 0-30% (preferably 10-30%) ZnO, and 0-30% (preferably 3-25%) CaO+BaO+Bi 2 O 3 .
  • a third preferred glass is a ZnO—B 2 O 3 —SiO 2 glass essentially consisting of, by weight percent, 20-45% (preferably 25-40%) ZnO, 10-35% (preferably 17-30%) B 2 O 3 , 0.5-10% (preferably 3-9%) SiO 2 , 20-60% (preferably 25-55CaO+SrO+BaO+Bi 2 O 3 , and 0-25% (preferably 0-20%) PbO.
  • the dielectric forming material according to this invention satisfies the following condition, regardless of whether or not CoO and NiO are used as the coloring ingredients.
  • the dielectric forming material preferably provides a glass film having a spectral transmittance T% (460 nm) of 50-75% at the wavelength of 460 nm. If the spectral transmittance T% (460 nm) is less than 50%, the brightness is decreased because the luminescent color of the blue phosphor becomes weak. If the spectral transmittance T% (460 nm) is higher than 75%, the effect of suppressing the halation is decreased.
  • the glass film is prepared from the dielectric forming material in the following manner. The dielectric forming material is applied by printing or the like onto a soda lime glass plate having a thickness of 1.7 mm and is then baked at a temperature of 500-600° C. during 10-30 minutes to form a baked film having a thickness of 20-40 ⁇ m as the glass film. Thereafter, the transmittance of the glass film is measured together with the glass plate.
  • the spectral transmittance T% (460 nm) at the wavelength of 460 nm is higher than the spectral transmittance T% (550 nm) at the wavelength of 550 nm and the spectral transmittance T% (620 nm) at the wavelength of 620 nm. If the spectral transmittance T% (460 nm) is lower than the spectral transmittances T% (550 nm) and T% (620 nm) , the luminescent color of the blue phosphor becomes relatively weak so that the brightness is decreased.
  • the dielectric forming material according to this invention includes the above-mentioned powder of colored glass (hereinafter simply called colored glass powder) as a major solid component. It is noted here that a mixture of a plurality of kinds of colored glass powder can be used. In addition to the colored glass powder, the dielectric forming material may include 50 wt % or less uncolored glass powder or 20 wt % or less filler powder as a solid component.
  • the manner of application onto a substrate and the mode of use may be appropriately determined taking various conditions into consideration.
  • the dielectric forming material is kneaded with a solvent or a binder to obtain a paste which is applied by screen printing, and so on.
  • use may be made of various other methods such as a green sheet method in which the dielectric forming material is molded into a green sheet to be attached to a substrate.
  • Tables 1 to 3 show examples (Samples Nos. 1 to 13) of this invention and a comparative example (Sample No. 14).
  • the classification was carried out by the use of a 45 ⁇ m-mesh filter. Each sample of glass powder was evaluated for the coefficient of thermal expansion, the softening point, the film thickness of the glass film obtained by baking, the spectral transmittance, and the color tone.
  • the coefficient of thermal expansion was obtained as follows.
  • the glass powder was baked at the softening point to obtain a glass body.
  • the glass body was polished into a cylinder having a diameter of 4 mm and a length of 40 mm. Then, measurement was made according to JIS (Japanese Industrial Standard) R3102. Thereafter, the coefficient of thermal expansion within the temperature range of 30-300° C. was obtained.
  • the softening point was measured by a macroscopic differential thermal analyzer and the value of the fourth inflection point was adopted as the softening point.
  • the spectral transmittance was measured as follows. At first, each sample of glass powder was mixed with 5% ethyl cellulose solution in terpineol as a solvent and then kneaded by a three-roll mill to produce a paste.
  • the paste was applied by screen printing onto a soda lime glass plate (spectral transmittances of 90.5% at 460 nm, 91.0% at 550 nm, 90.5% at 620 nm) having a thickness of 1.7 mm, put into an electric furnace, and held for 10 minutes at a temperature around the softening point to be baked.
  • a glass film having a thickness of about 30-40 ⁇ m was formed.
  • the thickness of the glass film obtained by baking was exactly measured. Then, the glass plate with the glass film formed thereon was measured for the spectral transmittances. Specifically, by the use of an integrating sphere of the spectral photometer UV-3100 which was manufactured and sold by Shimadzu Corporation in Japan, the spectral transmittances were obtained at the wavelengths of 460 nm (blue), 550 nm (green), and 620 nm (red).
  • the coefficient of thermal expansion, the softening point, the spectral transmittance, and the color tone are shown in the tables.
  • the content of each component is represented by weight percent.
  • each of the samples Nos. 1 through 13 according to this invention produced a transparent glass film having a color tone of blue and had the coefficient of thermal expansion of 76.5-82.0 ⁇ 10 ⁇ 7 ° C. and the softening point of 510-585° C.
  • each sample was suitable as a transparent dielectric forming material.
  • the sample No. 14 as the comparative example had the characteristics similar to those of the samples Nos. 1 through 13 but produced a colorless transparent glass film after baking.
  • two high-strain-point glass substrates having a predetermined size were prepared as front and rear glass substrates. Then, display electrodes and address electrodes were baked on the glass substrates.
  • the glass paste was printed and baked to form a dielectric layer having a thickness of about 30 ⁇ m.
  • the glass paste was prepared in the manner similar to that described in conjunction with the measurement of the spectral transmittance.
  • barrier ribs and phosphors were formed on the rear glass substrate. Subsequently, these glass substrates were sealed by the use of a sealing glass having a low melting point. Thereafter, an inner space between the glass substrates was filled with a gas mixture of xenon and neon as a main discharge gas and was sealed airtight. Thus, the AC type plasma display panel was manufactured.
  • the display panel using any one of the samples Nos. 1 through 12 always provided a clear image. No halation was observed and the brightness was high. In the display panel using the sample No. 13, no halation was observed although the brightness was not so high.
  • the transparent dielectric layer is formed on the front glass substrate of the plasma display panel by the use of the dielectric forming material or the dielectric forming paste according to this invention.
  • the dielectric forming material or the dielectric forming paste according to this invention it is possible to absorb the scattered light scattered on the inside and the outside surfaces of the dielectric layer and the front glass substrate. Accordingly, occurrence of halation can be considerably suppressed. As a result, it is possible to manufacture the plasma display panel which provides a clear image.

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
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  • Organic Chemistry (AREA)
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  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
US09/497,452 1999-02-04 2000-02-03 Dielectric forming material and dielectric forming paste for use in plasma display panel Expired - Fee Related US6309992B1 (en)

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JP11027746A JP2000226229A (ja) 1999-02-04 1999-02-04 誘電体形成材料及び誘電体形成ペースト
JP11-027746 1999-02-04

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Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020082155A1 (en) * 2000-10-12 2002-06-27 Nippon Electric Glass Co., Ltd. Barrier rib material for plasma display panel
US20050017640A1 (en) * 2003-07-26 2005-01-27 Lg Electronics Inc. Plasma display panel and fabrication method thereof
US20050042364A1 (en) * 2003-08-18 2005-02-24 Lg Electronics Inc. Front substrate of plasma display panel and fabricating method thereof
EP1612193A1 (en) * 2004-06-29 2006-01-04 Samsung SDI Co., Ltd. Pb-Free glass composition for barrier ribs of plasma display panel, and plasma display panel comprising the Pb-free glass barrier ribs
EP1258902A3 (de) * 2001-05-08 2006-05-10 Philips Intellectual Property & Standards GmbH Plasmabildschirm mit verbessertem Weissfarbpunkt
EP1829832A1 (en) * 2004-10-07 2007-09-05 Matsushita Electric Industrial Co., Ltd. Plasma display panel
US20080111487A1 (en) * 2006-11-09 2008-05-15 Seong-Hun Choo Plasma display panel (PDP)
US20210271842A1 (en) * 2016-06-13 2021-09-02 Taiwan Semiconductor Manufacturing Co., Ltd. Fingerprint sensor in info structure and formation method

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JP4899249B2 (ja) * 2001-04-05 2012-03-21 旭硝子株式会社 無鉛ガラス、ガラスセラミックス組成物およびガラスペースト
KR100446727B1 (ko) * 2001-11-30 2004-09-01 엘지전자 주식회사 플라즈마 디스플레이 패널의 상판구조
KR100469389B1 (ko) 2001-12-03 2005-02-02 엘지전자 주식회사 플라즈마 디스플레이 패널의 상판구조
KR20040068772A (ko) * 2003-01-27 2004-08-02 엘지전자 주식회사 플라즈마 디스플레이 패널의 유전체층과 그 제조방법
JP2007099573A (ja) * 2005-10-06 2007-04-19 Asahi Glass Co Ltd 電極被覆用ガラスおよびプラズマディスプレイパネル
JP2007126319A (ja) * 2005-11-02 2007-05-24 Nihon Yamamura Glass Co Ltd ビスマス系無鉛ガラス組成物
JP2008071515A (ja) * 2006-09-12 2008-03-27 Pioneer Electronic Corp プラズマディスプレイパネル及びその駆動方法
JP2008303077A (ja) * 2007-06-05 2008-12-18 Central Glass Co Ltd 絶縁性保護被膜材料

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Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020082155A1 (en) * 2000-10-12 2002-06-27 Nippon Electric Glass Co., Ltd. Barrier rib material for plasma display panel
EP1258902A3 (de) * 2001-05-08 2006-05-10 Philips Intellectual Property & Standards GmbH Plasmabildschirm mit verbessertem Weissfarbpunkt
US20050017640A1 (en) * 2003-07-26 2005-01-27 Lg Electronics Inc. Plasma display panel and fabrication method thereof
US8062696B2 (en) 2003-08-18 2011-11-22 Lg Electronics Inc. Front substrate of plasma display panel and fabricating method thereof
US20050042364A1 (en) * 2003-08-18 2005-02-24 Lg Electronics Inc. Front substrate of plasma display panel and fabricating method thereof
US20070196584A1 (en) * 2003-08-18 2007-08-23 Lg Electronics Inc. Front substrate of plasma display panel and fabricating method thereof
US7508138B2 (en) * 2003-08-18 2009-03-24 Lg Electronics Inc. Front substrate of plasma display panel and fabricating method thereof
EP1612193A1 (en) * 2004-06-29 2006-01-04 Samsung SDI Co., Ltd. Pb-Free glass composition for barrier ribs of plasma display panel, and plasma display panel comprising the Pb-free glass barrier ribs
US20060019814A1 (en) * 2004-06-29 2006-01-26 Nam-Seok Baik Pb-free glass composition for barrier ribs of plasma display panel, and plasma display panel comprising the Pb-free glass barrier ribs prepared therefrom
EP1829832A1 (en) * 2004-10-07 2007-09-05 Matsushita Electric Industrial Co., Ltd. Plasma display panel
EP1829832A4 (en) * 2004-10-07 2008-09-17 Matsushita Electric Ind Co Ltd PLASMA SCREEN
US20080111487A1 (en) * 2006-11-09 2008-05-15 Seong-Hun Choo Plasma display panel (PDP)
US7906908B2 (en) 2006-11-09 2011-03-15 Samsung Sdi Co., Ltd. Plasma Display Panel (PDP)
EP1921654A3 (en) * 2006-11-09 2009-06-17 Samsung SDI Co., Ltd. Plasma display panel (PDP)
US20210271842A1 (en) * 2016-06-13 2021-09-02 Taiwan Semiconductor Manufacturing Co., Ltd. Fingerprint sensor in info structure and formation method
US11741737B2 (en) * 2016-06-13 2023-08-29 Taiwan Semiconductor Manufacturing Company, Ltd Fingerprint sensor in info structure and formation method

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