US5709922A - Transparent article and process for producing the same - Google Patents

Transparent article and process for producing the same Download PDF

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Publication number
US5709922A
US5709922A US08/361,504 US36150494A US5709922A US 5709922 A US5709922 A US 5709922A US 36150494 A US36150494 A US 36150494A US 5709922 A US5709922 A US 5709922A
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United States
Prior art keywords
resin
transparent
substrate
unevenness
transparent article
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US08/361,504
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English (en)
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Masahiko Ono
Yoshishige Endo
Kazunori Kagei
Kenji Sumida
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Hitachi Ltd
Washi Kosan Co Ltd
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Hitachi Ltd
Washi Kosan Co Ltd
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Assigned to WASHI KOSAN COMPANY LIMITED, HITACHI, LTD. reassignment WASHI KOSAN COMPANY LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ENDO, YOSHISHIGE, KAGEI, KAZUNORI, ONO, MASAHIKO, SUMIDA, KENJI
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24355—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.]
    • Y10T428/24364—Continuous and nonuniform or irregular surface on layer or component [e.g., roofing, etc.] with transparent or protective coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24521—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness with component conforming to contour of nonplanar surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/24612—Composite web or sheet
    • Y10T428/2462—Composite web or sheet with partial filling of valleys on outer surface
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31—Surface property or characteristic of web, sheet or block
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]

Definitions

  • the present invention relates to a transparent article having an anti-reflection effect and usable as lens of eyeglasses, protective plate for architectural structures, automobiles, show cases, pictures, meters, etc., lens and various kinds of optical parts, and a process for producing such a transparent article.
  • Anti-reflection films have for long been studied and practically applied to optical devices such as cameras, microscopes and binoculars. At present, such films are used, for instance, as an anti-reflection filter for reducing the reflected light on the CRT surfaces. In these optical devices, it is required to provide an anti-reflection effect without affecting their light transmittance.
  • a variety of anti-reflection films have been proposed, but those mainly used now are multi-layered films and heterogeneous films.
  • Multi-layered films have a structure in which a material having a low refractive index and a material having a high refractive index are alternately laminated to form at least three layers. Their anti-reflection effect is a synergistic effect produced by the optical interference action of each layer. Multi-layered films are discussed in Physics of Thin Films, 2 (1964), pp. 243-284.
  • Heterogeneous films having a reflectivity distribution in the film thickness direction can serve as an anti-reflection film when the average reflectivity of the film is lower than that of the substrate glass.
  • Such heterogeneous films generally comprise a transparent plate having a porous surface.
  • a method for forming an anti-reflection film on a glass substrate is disclosed in JP-A-4-334852, according to which thin optical films are formed in two or more layers on the substrate, with a layer of fine particles deposited thereon, and the thin optical film constituting the outermost layer is etched to form a surface unevenness, so as to inhibit reflection by a combined effect of interference by the thin optical films and light diffusion by the surface unevenness.
  • JP-A-5-88001 a coating solution prepared by mixing the coated particles of silicon oxide or aluminum oxide in an alcohol solution of ethyl silicate is coated on a substrate and then the particles are removed to form an uneven film which produces an anti-reflection effect due to a change of film to air volume ratio.
  • the above mentioned multi-layer deposition method has the problem that when plastic is used for the substrate, cracks tend to develop in the substrate and the layers thereon due to difference in thermal shrinkage between the layers. This method also involves the problem of high production cost for application to a large surface area.
  • JP-A-4-334852 and JP-A-5-88001 are disadvantageous in that the number of the production steps is increased since a step for removing the particles is required after film formation. Also, these methods require a long-time heat treatment, giving rise to the problem of thermal deformation in case of using plastic material which is poor in heat resistance.
  • the heterogeneous film forming method comprising immersion of soda glass in a H 2 SiF 6 solution to make the glass surface porous is incapable of producing a satisfactory anti-reflection effect as it is difficult to form fine unevenness on the film.
  • This method also has the problem that the transmittance of the film lowers with reduction of the reflectance because the film unevenness is not sufficiently fine.
  • the anti-reflection principle of this heterogeneous film is to minimize reflection of light by scattering the incident light by making use of unevenness of the film surface.
  • ng is the refractive index of glass
  • V(x) is the volume occupied by glass at x
  • n 0 is the refractive index of air.
  • the refractive index varies discontinuously at the interface between air and film and at the interface between film and glass substrate as shown in FIG. 16, so that when the refractive indices at these points are represented by n 1 and n 2 , respectively, the reflectance R of this layer is given by the equation 2: ##EQU1## wherein "da” denotes the depth of the unevenness (See FIG. 15).
  • the present inventors have previously proposed an anti-reflection body which satisfies both requirements of low reflectance and high transmittance by forming said unevenness with ultrafine particles directly coated as a film on the surface of a transparent substrate, and a method for forming such an anti-reflection body.
  • An object of the present invention is to provide transparent articles having a high transmittance and a high anti-reflection effect by making use of fine unevenness formed by monolayer deposition of ultrafine particles, and a method for producing such transparent articles.
  • the present invention provides a transparent article made of a resin and having on its surface fine indentations formed by direct transfer of a configuration of ultrafine particles.
  • a transparent article having a plastic resin layer formed on a transparent substrate, said plastic resin layer having on its surface fine indentations formed by direct transfer of a configuration of ultrafine particles.
  • a transparent article made of a plastic resin and having on its surface fine indentations formed by direct transfer of a configuration of ultrafine particles, wherein the inside of said recesses or the recesses are covered with a transparent resin.
  • a transparent article having a plastic resin layer provided on a transparent substrate, said plastic resin layer having on its surface fine indentations formed by direct transfer of a configuration of ultrafine particles, wherein the inside of said indentations or the indentations are coated with a transparent resin.
  • the indentations on the transparent article according to the present invention may have substantially continuous dimple-like or semispherical shape, and their depth may be, for instance, 20-300 nm.
  • the transparent substrate may be made of glass or plastic resin, more specifically it may be a plastic product selected from the group consisting of lens of eyeglasses, optical lens, windshield and window glass, materials for show cases, show window or display cases for pictures, and shields for gauges and shields for image display apparatuses.
  • an anti-reflection article using any one of said transparent articles having a light reflection preventive effect.
  • a protective plate comprising any one of said transparent articles, said protective plate being designed to protect an exhibit or a thing on display.
  • a process for producing a transparent article by supplying a fluid resin on to the surface of substrate provided with an ultrafine particle film having an unevenness surface formed by ultrafine particles so as to cover said surface, and curing said resin under pressure so as to transfer said unevenness to the surface of the cured resin.
  • a process for producing a transparent article comprising pressing an uneven surface of an ultrafine particle film formed on a substrate on a fluid resin provided on a transparent substrate; said uneven surface having been formed by coating a coating solution containing ultrafine particles, and curing said resin so as to transfer said uneven surface of said ultrafine particle film on the surface of the cured resin.
  • the resin may be cured by heating, photopolymerization or cooling.
  • said transfer of unevenness (hereinafter sometimes referred to merely as transfer) to the resin may be effected under pressure.
  • the ultrafine particle film provided on the substrate is one formed by depositing ultrafine particles as a monolayer on the substrate.
  • This ultrafine particle film may have been subjected to a water and/or oil repellency treatment on the surface.
  • This water and/or repellency treatment is carried out using a treating agent containing a silyl compound selected from chlorosilane compounds, alkoxysilane compounds and fluoroalkylsilane compounds.
  • a process for producing a transparent article comprising a first step in which a substrate on its surface an ultrafine particle film having a surface unevenness formed by ultrafine particles is placed in a mold so that said ultrafine particle film constitutes a part of the mold; a second step comprising filling a fluid resin in a cavity in said mold; a third step comprising curing said fluid resin; a fourth step comprising disassembling said mold; and a fifth step comprising separating the cured resin from the substrate.
  • a substrate having a monolayer of ultrafine particles thereon is used as matrix, and with this matrix properly placed in a specific mold, a fluid resin which is to form a transparent article is cast into the mold and cured, followed by separation of the cured resin from the matrix, whereby the fine unevenness of the ultrafine particle film is transferred to the cured plastic resin surface. It is thus possible to form a fine unevenness comprising dimple-like indentations which can not be formed by conventional mechanical working or etching.
  • the substrate having a monolayer of ultrafine particles thereon is pressed against a fluid resin disposed on the surface of a transparent substrate, the unevenness formed by said layer of ultrafine particles runs into the fluid resin, allowing faithful transfer of the unevenness.
  • a water and/or oil repellency treatment applied on the ultrafine particle layer surface facilitates separation of the unevenness-transferred cured plastic resin from the ultrafine particle layer surface of the substrate.
  • the unevenness formed on the transparent substrate surface has a prominent anti-reflection effect explained above using the equations 1 and 2, due to faithful transfer of the configuration of ultrafine particles. Also, such unevenness is of a fine size that gives no influence on transmittance.
  • the unevenness formed thereby has a depth half of the particle size.
  • an unevenness having a depth of 20-300 nm suited for prevention of light reflection can be formed.
  • fluid resin denotes a resin flowable or movable like a liquid or a fluid.
  • fluid resin includes any of liquid oligomers, liquid polymers and thermo-meltable resins.
  • fine indentations means a series of indentations having a diameter of 40 to 600 nm and a depth of 20 to 300 nm, and being adjacent to each other.
  • unevenness means a state of the surface having said fine indentations, or the indentations themselves.
  • FIG. 1 is a diagrammatic sectional view illustrating the unevenness transfer method in the first embodiment of the present invention.
  • FIG. 2 is a flow chart illustrating the unevenness transfer procedure in the first embodiment of the present invention.
  • FIG. 3 is a sectional view of the resin after transfer of unevenness in the first embodiment of the present invention.
  • FIG. 4 is a perspective view of the transferred portion of the resin after transfer of unevenness in the first embodiment of the present invention.
  • FIG. 5 is a sectional view showing a situation where a low-refractivity resin has been applied to the dimples in the transferred portion of the matrix resin in the first embodiment of the present invention.
  • FIG. 6 is a diagrammatic sectional view illustrating the unevenness transfer method in the second embodiment of the present invention.
  • FIG. 7 is a sectional view of the resin after transfer of unevenness in the second embodiment of the present invention.
  • FIG. 8 is a diagrammatic sectional view illustrating the unevenness transfer method in the third embodiment of the present invention.
  • FIG. 9 is a sectional view of the resin after transfer of unevenness in the third embodiment of the present invention.
  • FIG. 10 is a diagrammatic sectional view illustrating the unevenness transfer method in the fourth embodiment of the present invention.
  • FIG. 11 is a sectional view of the resin after transfer of unevenness in the fourth embodiment of the present invention.
  • FIG. 12 is a sectional view showing a situation where a low-refractivity resin has been applied to the matrix resin surface after transfer of unevenness in the fourth embodiment of the present invention.
  • FIG. 13 is a diagrammatic sectional view illustrating the unevenness transfer method in the fifth embodiment of the present invention.
  • FIG. 14 is a sectional view of the resin after transfer of unevenness in the fifth embodiment of the present invention.
  • FIG. 15 is a diagram illustrating the reflection preventing principle.
  • FIG. 16 is another diagram illustrating the reflection preventing principle.
  • FIG. 17 is a schematic drawing illustrating a method of forming an ultrafine particle film on a substrate usable for transfer of unevenness.
  • FIG. 18 is a flow chart illustrating the procedure of forming an ultrafine particle film on a substrate.
  • FIG. 19 is a perspective view, partly shown in section, of a substrate having formed thereon an ultrafine particle film used for transfer of unevenness.
  • FIG. 20 is a sectional view showing disposition of ultrafine particles on the surface of a substrate.
  • the transparent substrate to be transferred is not subject to specific quality restrictions as far as it has lower melting point than the ultrafine particles forming a coating film on the substrate or it is soft enough to serve as matrix.
  • thermosetting resins are preferably used as substrate material. But this does not apply in case the product is used for optical articles, and in this case thermoplastic resins may as well be used.
  • the shape of the transparent substrate may be plate or film, or the substrate may have a curvature.
  • thermosetting resins usable as substrate material in the present invention include melamine resin, epoxy resin, unsaturated polyester resin, polyimide resin, silicon resin, phenol resin, urea resin, aniline resin, diallyl phthalate resin, alkyd resin, polyurethane resin and diethylene glycolbisallyl carbonate resin.
  • Organosiloxane compounds are also usable.
  • thermoplastic resins usable for said purpose include acrylic resin, PMMA (polymethyl methacrylate), polycarbonate resin and styrene resin.
  • Acrylic resin is most suited for injection molding and preferred as lens material.
  • Various types of curing agent may be added for causing curing at low temperatures or for promoting curing. Typical examples of such curing agents are epoxy resin and organosilicon resin.
  • ultrafine particles is used in this invention to refer to the particles with a size of submicron order.
  • the ultrafine particles used in the present invention are not specifically defined as far as they are spherical or have a shape close to sphere, but the particles having an average size (diameter) of about 40-600 nm are preferably used.
  • the average size of the particles is less than 40 nm, the unevenness formed by the particles may not be transferred in a satisfactory manner and the surface of the transparent substrate may become too flat, making it unable to obtain a desired anti-reflection effect.
  • the particle size of the ultrafine particles used in this invention preferably falls in the range of 40-600 nm. These particles may be either limited in the particle size distribution or may have rather broad particle size distribution within the above-defined range.
  • the substrate having an ultrafine particle film which serves as a matrix for transfer of unevenness, may be for instance, a glass plate, a plastic plate, a metal plate, a plastic film or the like, but in the Examples shown below, glass and metal were used in view of adhesiveness of the ultrafine particle film to the substrate.
  • the surface of the substrate on which an ultrafine particle film is to be formed may not necessarily be planar; it may have a curvature like lens or may be cylindrical.
  • the ultrafine particle film may be formed on one side or both sides of the substrate.
  • the substrate surface is preferably subjected to a cleaning treatment with an alkali, hydrofluoric acid or a neutral detergent before forming an ultrafine particle film.
  • the substrate is placed in a container filled with a coating solution comprising a mixture of ultrafine particles and a binder, and the surface of the solution in the container is lowered down.
  • a coating solution comprising a mixture of ultrafine particles and a binder
  • the substrate is first placed in a container, then the coating solution is gradually poured into the container until it is filled up with the solution, and then the substrate is pulled up.
  • This dip coating method is suited for coating of the articles having a complicated surface configuration.
  • Curing of the ultrafine particle film after coating may be effected by applying hot air, ultraviolet rays, infrared rays or the like.
  • the heating temperature is decided considering the threshold temperature that the coated substrate can endure, but usually the coating film is dried at 50°-100° C. in the case of resin substrate and 100°-400° C. in the case of glass substrate.
  • ultraviolet rays are applied for curing.
  • a coating solution containing a predetermined amount of ultrafine particles and a binder is used for forming an ultrafine particle film for transfer of unevenness in the present invention.
  • ethyl silicate Si(OC 2 H 5 ) 4 ! is dissolved in ethanol, followed by addition of H 2 O for hydrolysis and ENO 3 as catalyst, and to this solution are added 10% by weight of ultrafine particles of SiO 2 .
  • the solution pH is adjusted to allow sufficient dispersion of the particles.
  • this solution After this solution has been applied on the substrate by a method such as mentioned above, it is dried to cause decomposition of ethyl silicate Si(OC 2 E 5 ) 4 ! to form a film. Since SiO 2 formed by decomposition can serve as a binder, the ultrafine SiO 2 particles added to the solution are strongly bonded to the binder, and they are also firmly attached to the surface of the substrate. By this method, it is possible to form a uniform continuous unevenness with the ultrafine SiO 2 particles arranged as a monolayer on the substrate surface.
  • a treating agent containing at least one kind of silyl compound selected from chlorosilane compounds, alkoxysilane compounds and fluoroalkylsilane compounds is used.
  • the chlorosilane compounds usable for said purpose include CH 3 SiCl 3 , (CH 3 )HSiCl 2 , (CH 3 ) 2 SiCl 2 and (CH 3 ) 3 SiCl.
  • the alkoxysilane compounds include CH 3 SiOCH 3 , (CH 3 ) 2 Si(OCH 3 ) 2 , CH 3 Si(OC 2 H 5 ) 3 and (CH 3 ) 2 Si(OC 2 H 5 ) 2 .
  • the fluoroalkylsilane compounds include CF 3 CH 2 CH 2 Si(OCH 3 ) 3 , CF 3 CH 2 CH 2 SiCl 3 and CF 3 (CF 2 )CH 2 CH 2 SiCH 3 Cl 2 .
  • silyl compound treatment of the surface of said ultrafine particle film formed by a combination of ultrafine particles and binder it is possible to easily induce the reaction to effectuate siloxane bonding without applying any specific pretreatment since both of the ultrafine particles and the binder have a large quantity of hydroxyl groups in their surfaces.
  • This treatment can be accomplished by merely blowing the compound vapors to the ultrafine particle film in case the treating agent is a fuming solvent such as (CH 3 ) 2 SiCl 2 .
  • the compound may be coated on the substrate having an ultrafine particle film thereon by an ordinary coating method such as dip coating, spray coating or spin coating.
  • the chlorosilane compounds used for water repellency treatment function to substitute the active hydrogen of the hydroxyl group (OK) in the surfaces of the ultrafine particles and the binder with a silyl group (R 3 S) (silylation).
  • Si--OH+Me 3 SiCl when it is reacted with Si--OH in the ultrafine particle film surface, Si--OH+Me 3 SiCl changes into Si--OSiMe 3 +HCl, so that the outermost layer is composed of Me 3 and thus provided with water repellency.
  • the single molecular layers are strongly bonded and the outermost layer comprises CH 3 groups alone and is provided with water repellency.
  • This water and/or oil repellency treatment allows easy separation of the ultrafine particle film from the matrix substrate, leaving the unevenness of the ultrafine particle film unaffected, after transfer has been completed.
  • Transfer of the unevenness of the ultrafine particle film surface can be accomplished as follows.
  • a substrate having an ultrafine particle film formed thereon in the manner described above is placed in a mold, and then a transparent base material comprising a liquid thermosetting resin to which the unevenness of the ultrafine particle film is to be transferred is placed in the mold after sufficient deaeration.
  • the transparent base material was cured and solidified by cooling, heating or photopolymerization, the mold is disassembled and the substrate and the transparent base material are separated from each other.
  • a releasing agent may be mixed in the base material, or a water and/or oil repellency treatment may be applied thereto.
  • the transparent base material to which the unevenness has been transferred is finished into a desired shape and put to practical used as various commercial articles such as shields for exhibits, shields for gauges, shields for image display apparatus etc., ophthalmic glasses, window glass of architectural structures, glass for vehicles, especially windshield, lenses, and various optical parts.
  • a substrate having an ultrafine particle film formed thereon is fixed in an injection mold, then the thermoplastic resin fed into the hopper of the injection molding machine is heated to be molten by a cylinder and supplied to the nozzle portion, and this molten resin is injected to the substrate from the nozzle end and cured, thereby transferring the unevenness of the substrate surface to the cured resin.
  • a release agent may be mixed in the thermoplastic resin, or a water and/or oil repellency treatment may be applied to the surface of the substrate having an ultrafine particle film formed thereon, or both treatments may be applied.
  • a liquid thermosetting resin is coated thinly on the surface of a transparent substrate to which unevenness is to be transferred, then a substrate having an ultrafine particle film formed thereon is pressed against said transparent substrate, followed by curing of the resin by cooling, heating or photopolymerization, and then the substrate having an ultrafine particle film formed thereon is separated from the transparent substrate, thereby transferring the unevenness of the ultrafine particle film to the transparent substrate.
  • the transfer position can be defined and the workability is improved when the transparent substrate (the article to which unevenness is to be transferred) is designed to serve as a female mold and the substrate having an ultrafine particle film is designed to serve as a male mold.
  • the unevenness may be transferred to one side or both sides of the transparent substrate.
  • FIG. 17 there is shown a schematic illustration of a method (dipping method) of forming an ultrafine particle film on a substrate which serves as a transfer matrix.
  • the procedure of forming the ultrafine particle film for transfer of unevenness is shown in FIG. 18.
  • An alkali surface treated glass substrate 6 is fixed to a jig 19 and placed in a coating bath 8.
  • the bath 8 is filled with a coating solution 9 comprising a mixture of ultrafine SiO 2 particles having an average size of 200 nm and Si(OR) 4 .
  • the coating solution is discharged out of the bath 8 by using a pump 10 so that the surface of the coating solution will be lowered at a rate of 5 mm/sec.
  • the ultrafine particles are deposited on the glass substrate surface.
  • the glass substrate having an ultrafine particle film formed thereon is dipped in a solution comprising a siloxane mixed with 5 wt % of a fluoroalkylsilane compound for 20 minutes to impart water and oil repellency to the ultrafine particle film surface.
  • the substrate having an ultrafine particle film coating thereon is taken out of the solution, dried by nitrogen blowing and then left in a 200° C. oven for 30 minutes to dry the film.
  • FIG. 19 is a perspective view, with parts shown in section, of the thus obtained substrate having an ultrafine particle film for transfer of unevenness
  • FIG. 20 is a partial enlarged sectional view thereof.
  • reference numeral 4 designates the ultrafine particles, 5 the binder, 6 the substrate, and 14 the water and oil repellent layer.
  • FIG. 20 represents the case where the ultrafine particles having a narrow particle size distribution were used.
  • the fine surface unevenness of said ultrafine particle film is transferred to a transparent base material in the manner described below.
  • FIG. 1 A schematic illustration of transfer is shown in FIG. 1, and the procedure of transfer is shown in FIG. 2.
  • the convexities 4 of the ultrafine particles of the transfer matrix are closely transferred to provide the concavities 17.
  • the fine unevenness formed by the ultrafine particles deposited on the substrate surface can be faithfully transferred to the resin surface.
  • the reflectance of the unevenness-transferred article at the wavelength of 550 nm was less than 1%, and thus an excellent anti-reflection effect could be obtained.
  • FIGS. 6 and 7 A second embodiment of the invention is illustrated in FIGS. 6 and 7.
  • a glass substrate 6 having an ultrafine particle film formed on its surface in the same way as in the first embodiment described above is properly set in a male mold 20.
  • Polystyrene 2 in a form of a plate or pellets is placed in a female mold 21 and heated for softening it.
  • the male mold is pressed into the female mold.
  • the male mold 20 is removed from the female mold 21.
  • said polystyrene 2 in the female mold is withdrawn in this embodiment, the sectional shape of the resin (polystyrene) 2 after transfer is as shown in FIG. 7, which is same as in the first embodiment (see FIG. 4).
  • This embodiment is advantageous in that the transfer molding cycle is fast as compared with the first embodiment.
  • FIGS. 8 and 9 an approximately 2 ⁇ m thick silicon resin film 3 is formed on a glass substrate 6 by roll coating, and while the film is still flexible, transfer is carried out under pressure by using a substrate 61 made of a flexible material having on its surface a film of ultrafine particles having an average size of 0.6 ⁇ m (600 nm). Then, after the resin film 3 has been cured, the substrate 61 having an ultrafine particle film 4 is removed.
  • FIG. 9 shows a sectional view of the resin film after transfer. According to this method, transfer can be accomplished with ease even when the article to which the unevenness is to be transferred is large in size.
  • a fourth embodiment of the invention concerning its application to lens is described with reference to FIGS. 10 and 11.
  • a substrate 18 having a curvature are formed an ultrafine particle film comprising ultrafine particles 4 and a binder 5 and a water and oil repellent layer 14 according to the procedure in the first embodiment, and this substrate is placed in a mold for transfer 7.
  • a liquid resin 16 with a release agent mixed therein is charged into the mold from an inlet opening 12 and heated for curing. After sufficiently cured, the cured resin 16 is taken out of the mold 7 to obtain a lens having an anti-reflection effect.
  • the lens surface represents perfect transfer of the unevenness as shown in FIG. 11.
  • a hard coating layer 13 made of a material with a lower refractivity than lens. This improves scuff resistance and weathering resistance essential for the lenses of eyeglasses without impairing the anti-reflection effect.
  • This embodiment concerns a case where a thermosetting resin is used as matrix resin as in the first embodiment, but transfer can be similarly accomplished even when injection molding is carried out using a thermoplastic resin.
  • FIGS. 13 and 14 A fifth embodiment of the invention is illustrated in FIGS. 13 and 14.
  • the ultrafine particles used in the instant embodiment varied in size as shown in FIG. 13, and in this case, too, transfer could be accomplished excellently as in the above-described case using the ultrafine particles having a narrow distribution of the particle size.
  • a sectional view of the resin after transfer is shown in FIG. 14. In this embodiment, it was possible to lower specular reflectance over the whole visible light range.
  • the present invention it is possible to easily transfer the fine unevenness formed by the ultrafine particles to the surface of a transparent base article by using a substrate on which the ultrafine particles have been deposited as a monolayer.
US08/361,504 1993-12-27 1994-12-22 Transparent article and process for producing the same Expired - Lifetime US5709922A (en)

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US5886819A (en) * 1995-10-27 1999-03-23 Tomoegawa Paper Co., Ltd. Antiglare material and polarizing film by using the same
US6008940A (en) * 1996-03-15 1999-12-28 Konica Corporation Protective film of polarizing plate
US6165061A (en) * 1995-04-10 2000-12-26 Dai Nippon Printing Co. Abrasive tape, process for producing it, and coating agent for abrasive tape
WO2001026924A1 (en) * 1999-10-13 2001-04-19 Exatec, Llc Automotive window having a masking border and process for producing an automotive window panel masking border
US20100243051A1 (en) * 2007-11-05 2010-09-30 Ben Slager Photovoltaic device
WO2010115954A1 (en) * 2009-04-08 2010-10-14 Photon B.V. Method for producing a cover plate for a photovoltaic device
WO2010115953A3 (en) * 2009-04-08 2011-01-13 Photon B.V. Method for producing a textured plate for a photovoltaic device
US20110075261A1 (en) * 2009-09-30 2011-03-31 Fujifilm Corporation Hard coating film, manufacturing method thereof, antireflective film, polarizing plate and image display unit
US20110114176A1 (en) * 2008-06-23 2011-05-19 Photon B.V. Photovoltaic device with spectral response

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US5763054A (en) * 1996-09-13 1998-06-09 Trw Inc. Anti-reflection treatment for optical elements
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US6165061A (en) * 1995-04-10 2000-12-26 Dai Nippon Printing Co. Abrasive tape, process for producing it, and coating agent for abrasive tape
US6398826B1 (en) 1995-04-10 2002-06-04 Dai Nippon Printing Co., Ltd. Abrasive tape, process for producing it, and coating agent for abrasive tape
US5886819A (en) * 1995-10-27 1999-03-23 Tomoegawa Paper Co., Ltd. Antiglare material and polarizing film by using the same
US6008940A (en) * 1996-03-15 1999-12-28 Konica Corporation Protective film of polarizing plate
WO2001026924A1 (en) * 1999-10-13 2001-04-19 Exatec, Llc Automotive window having a masking border and process for producing an automotive window panel masking border
US20100243051A1 (en) * 2007-11-05 2010-09-30 Ben Slager Photovoltaic device
US8283560B2 (en) 2007-11-05 2012-10-09 SolarExcel B.V. Photovoltaic device
US20110114176A1 (en) * 2008-06-23 2011-05-19 Photon B.V. Photovoltaic device with spectral response
WO2010115953A3 (en) * 2009-04-08 2011-01-13 Photon B.V. Method for producing a textured plate for a photovoltaic device
CN102422431A (zh) * 2009-04-08 2012-04-18 卓越太阳能有限公司 制造用于光伏器件的纹理板的方法
WO2010115954A1 (en) * 2009-04-08 2010-10-14 Photon B.V. Method for producing a cover plate for a photovoltaic device
CN102422431B (zh) * 2009-04-08 2015-09-23 帝斯曼知识产权资产管理有限公司 制造用于光伏器件的纹理板的方法
US20110075261A1 (en) * 2009-09-30 2011-03-31 Fujifilm Corporation Hard coating film, manufacturing method thereof, antireflective film, polarizing plate and image display unit
US8582207B2 (en) * 2009-09-30 2013-11-12 Fujifilm Corporation Hard coating film, manufacturing method thereof, antireflective film, polarizing plate and image display unit

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EP0660138B1 (de) 1998-07-15
DE69411694T2 (de) 1999-01-14
JP3323614B2 (ja) 2002-09-09
EP0660138A3 (de) 1995-08-09
EP0660138A2 (de) 1995-06-28
DE69411694D1 (de) 1998-08-20
JPH07186189A (ja) 1995-07-25

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