US20160137673A1 - Silicon oligomer and production method therefor - Google Patents
Silicon oligomer and production method therefor Download PDFInfo
- Publication number
- US20160137673A1 US20160137673A1 US14/901,148 US201314901148A US2016137673A1 US 20160137673 A1 US20160137673 A1 US 20160137673A1 US 201314901148 A US201314901148 A US 201314901148A US 2016137673 A1 US2016137673 A1 US 2016137673A1
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- United States
- Prior art keywords
- silicon oligomer
- formula
- group
- coating agent
- reaction
- Prior art date
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 131
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 126
- 239000010703 silicon Substances 0.000 title claims abstract description 126
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 7
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 21
- 125000002768 hydroxyalkyl group Chemical group 0.000 claims abstract description 12
- 125000000217 alkyl group Chemical group 0.000 claims abstract description 10
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 9
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 claims description 69
- 238000006243 chemical reaction Methods 0.000 claims description 57
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 19
- 238000000034 method Methods 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 239000003054 catalyst Substances 0.000 claims description 12
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 claims description 9
- 238000010438 heat treatment Methods 0.000 claims description 9
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 claims description 7
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 7
- 229910052725 zinc Inorganic materials 0.000 claims description 7
- 239000011701 zinc Substances 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 239000003513 alkali Substances 0.000 claims description 4
- 239000010941 cobalt Substances 0.000 claims description 4
- 229910017052 cobalt Inorganic materials 0.000 claims description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 3
- 238000004508 fractional distillation Methods 0.000 claims description 3
- 229910052718 tin Inorganic materials 0.000 claims description 3
- 239000011135 tin Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 2
- 229910052750 molybdenum Inorganic materials 0.000 claims description 2
- 239000011733 molybdenum Substances 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 13
- 239000007859 condensation product Substances 0.000 abstract description 6
- 239000011248 coating agent Substances 0.000 description 79
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 41
- 238000012360 testing method Methods 0.000 description 25
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 21
- 239000010410 layer Substances 0.000 description 18
- 238000002360 preparation method Methods 0.000 description 18
- 229920005989 resin Polymers 0.000 description 15
- 239000011347 resin Substances 0.000 description 15
- 238000000926 separation method Methods 0.000 description 15
- 238000005260 corrosion Methods 0.000 description 14
- 230000007797 corrosion Effects 0.000 description 14
- 0 [2*]O[Si]([1*]O)(O[3*])OC[Si](O[7*])(OC[Si]([4*]O)(O[5*])O[6*])OC[Si](O[8*])(O[9*])O[10*] Chemical compound [2*]O[Si]([1*]O)(O[3*])OC[Si](O[7*])(OC[Si]([4*]O)(O[5*])O[6*])OC[Si](O[8*])(O[9*])O[10*] 0.000 description 13
- 239000000047 product Substances 0.000 description 13
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 12
- 229920001577 copolymer Polymers 0.000 description 11
- -1 hydroxyethyl group Chemical group 0.000 description 11
- 239000002356 single layer Substances 0.000 description 10
- 239000000243 solution Substances 0.000 description 10
- 238000007865 diluting Methods 0.000 description 9
- 238000001354 calcination Methods 0.000 description 8
- 239000002904 solvent Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 229920001223 polyethylene glycol Polymers 0.000 description 7
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 239000003086 colorant Substances 0.000 description 6
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 238000006116 polymerization reaction Methods 0.000 description 6
- JGDITNMASUZKPW-UHFFFAOYSA-K aluminium trichloride hexahydrate Chemical compound O.O.O.O.O.O.Cl[Al](Cl)Cl JGDITNMASUZKPW-UHFFFAOYSA-K 0.000 description 5
- 229940009861 aluminum chloride hexahydrate Drugs 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 5
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 5
- 230000007062 hydrolysis Effects 0.000 description 5
- 238000006460 hydrolysis reaction Methods 0.000 description 5
- 229940113115 polyethylene glycol 200 Drugs 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- 239000007921 spray Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 238000005160 1H NMR spectroscopy Methods 0.000 description 4
- 238000005133 29Si NMR spectroscopy Methods 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- 239000002202 Polyethylene glycol Substances 0.000 description 4
- 150000003863 ammonium salts Chemical class 0.000 description 4
- 239000002131 composite material Substances 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000007747 plating Methods 0.000 description 4
- 241001163841 Albugo ipomoeae-panduratae Species 0.000 description 3
- OBIKDXTWAKQVGO-UHFFFAOYSA-N C.C.[H]OBO Chemical compound C.C.[H]OBO OBIKDXTWAKQVGO-UHFFFAOYSA-N 0.000 description 3
- 229920000604 Polyethylene Glycol 200 Polymers 0.000 description 3
- 229920002565 Polyethylene Glycol 400 Polymers 0.000 description 3
- 229940063656 aluminum chloride Drugs 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229920006242 ethylene acrylic acid copolymer Polymers 0.000 description 3
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 3
- JLFNLZLINWHATN-UHFFFAOYSA-N pentaethylene glycol Chemical compound OCCOCCOCCOCCOCCO JLFNLZLINWHATN-UHFFFAOYSA-N 0.000 description 3
- 229920002523 polyethylene Glycol 1000 Polymers 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 239000012085 test solution Substances 0.000 description 3
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 3
- 229940058015 1,3-butylene glycol Drugs 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 235000019437 butane-1,3-diol Nutrition 0.000 description 2
- NCEXYHBECQHGNR-UHFFFAOYSA-N chembl421 Chemical compound C1=C(O)C(C(=O)O)=CC(N=NC=2C=CC(=CC=2)S(=O)(=O)NC=2N=CC=CC=2)=C1 NCEXYHBECQHGNR-UHFFFAOYSA-N 0.000 description 2
- 229910052804 chromium Inorganic materials 0.000 description 2
- 239000011651 chromium Substances 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- NRNCYVBFPDDJNE-UHFFFAOYSA-N pemoline Chemical compound O1C(N)=NC(=O)C1C1=CC=CC=C1 NRNCYVBFPDDJNE-UHFFFAOYSA-N 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 239000011369 resultant mixture Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000013112 stability test Methods 0.000 description 2
- 238000003860 storage Methods 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 239000012756 surface treatment agent Substances 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- YONPGGFAJWQGJC-UHFFFAOYSA-K titanium(iii) chloride Chemical compound Cl[Ti](Cl)Cl YONPGGFAJWQGJC-UHFFFAOYSA-K 0.000 description 2
- FYELSNVLZVIGTI-UHFFFAOYSA-N 2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-5-ethylpyrazol-1-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C=1C=NN(C=1CC)CC(=O)N1CC2=C(CC1)NN=N2 FYELSNVLZVIGTI-UHFFFAOYSA-N 0.000 description 1
- YJLUBHOZZTYQIP-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=N2 YJLUBHOZZTYQIP-UHFFFAOYSA-N 0.000 description 1
- DFGKGUXTPFWHIX-UHFFFAOYSA-N 6-[2-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]acetyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)CC(=O)C1=CC2=C(NC(O2)=O)C=C1 DFGKGUXTPFWHIX-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- 229910000861 Mg alloy Inorganic materials 0.000 description 1
- 238000005481 NMR spectroscopy Methods 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 229910001297 Zn alloy Inorganic materials 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- XECAHXYUAAWDEL-UHFFFAOYSA-N acrylonitrile butadiene styrene Chemical compound C=CC=C.C=CC#N.C=CC1=CC=CC=C1 XECAHXYUAAWDEL-UHFFFAOYSA-N 0.000 description 1
- 229920000122 acrylonitrile butadiene styrene Polymers 0.000 description 1
- 239000004676 acrylonitrile butadiene styrene Substances 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N but-2-ene Chemical group CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001868 cobalt Chemical class 0.000 description 1
- GFHNAMRJFCEERV-UHFFFAOYSA-L cobalt chloride hexahydrate Chemical compound O.O.O.O.O.O.[Cl-].[Cl-].[Co+2] GFHNAMRJFCEERV-UHFFFAOYSA-L 0.000 description 1
- GVPFVAHMJGGAJG-UHFFFAOYSA-L cobalt dichloride Chemical compound [Cl-].[Cl-].[Co+2] GVPFVAHMJGGAJG-UHFFFAOYSA-L 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 150000002222 fluorine compounds Chemical class 0.000 description 1
- 229910021485 fumed silica Inorganic materials 0.000 description 1
- 238000007306 functionalization reaction Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 230000003449 preventive effect Effects 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 238000009987 spinning Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 150000003608 titanium Chemical class 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/04—Esters of silicic acids
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/02—Polysilicates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
Definitions
- the present invention relates to a novel silicon oligomer, more particularly to a novel silicon oligomer and a method for producing the same.
- the above-mentioned condensation product has a small distance between the poles of silicon atoms, and hence poses a problem in that a film obtained by applying the condensation product and heating it is rigid. Especially when this film is formed on a fastening member, it has been difficult to achieve both a corrosion resistance and a function, such as a coefficient of friction, at the same time.
- a coating liquid containing the above condensation product has a problem about the stability, for example, a problem in that a hydrolysis proceeds with the passage of time, so that the coating liquid cannot keep the sol-gel properties.
- NPL 1 Kazutoshi Iwamoto et. al., “Functionalization of inorganic-organic hybrid materials by sol-gel method”, Seisan Kenkyu, Vol. 42, No. 8, p. 466 to 473, 1990
- a task of the present invention is to provide a silicon oligomer which can solve the above-mentioned problems, and which has a novel function that has not been achieved by a conventional condensation product of water and a tetraalkoxysilane.
- the present inventors have conducted extensive and intensive studies with a view toward solving the above-mentioned problems. As a result, it has been found that, by reacting a tetraalkoxysilane having a specific structure and a dihydric alcohol having a specific structure with each other, a novel silicon oligomer having a large distance between the poles of silicon atoms can be obtained. Further, it has been found that when a member is treated with a coating agent using the above silicon oligomer, it is possible to impart a corrosion resistance and a function to the member treated, and the present invention has been completed.
- the invention is the following (1) to (6).
- R 1 to R 10 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms;
- X 1 to X 3 each independently is a group represented by the following formula (II);
- A is an alkylene group having 2 to 4 carbon atoms, which may be branched, and l is an integer of 1 to 3.
- a method for producing the above silicon oligomer which includes reacting a tetraalkoxysilane represented by the following formula (III) and a dihydric alcohol represented by the following formula (IV) with each other in the presence of a metal catalyst, an acid, or an alkali:
- R 11 to R 14 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms, and
- B is an alkylene group having 2 to 4 carbon atoms, which may be branched, and k is an integer of 1 to 3.
- a surface treating method characterized by treating a member to be treated with the above-mentioned coating agent.
- a surface treated product which is obtained by treating a member to be treated with the above coating agent.
- the silicon oligomer of the invention has excellent resistance to hydrolysis in coexistence with water, as compared to a conventional silicon oligomer.
- the method for producing the silicon oligomer of the invention is a method which needs no operation for separation or purification, and which can provide an oligomer with ease and high reproducibility.
- a coating agent containing the silicon oligomer of the invention is advantageous in that the raw material oligomer per se can be dissolved in a solvent including water, and therefore is easily processed into a water-soluble coating and has excellent handling properties.
- the coating agent containing the silicon oligomer of the invention when a member is treated with the coating agent containing the silicon oligomer of the invention, it is possible to impart a corrosion resistance and a function, such as a high coefficient of friction, to the member treated.
- the silicon oligomer of the invention is a silicon oligomer represented by the following formula (I).
- R 1 to R 10 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms, preferably an alkyl group or a hydroxyalkyl group, each having 2 carbon atoms, more preferably a hydroxyalkyl group having 2 carbon atoms.
- X 1 to X 3 each independently is represented by the following formula (II).
- A is an alkylene group having 2 to 4 carbon atoms which may be branched, preferably an ethylene group, a propylene group or a butylene group, more preferably an ethylene group, and l is an integer of 1 to 3, preferably 1.
- n is 0 or 1
- m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1, preferably n is 0 and m is 1.
- R 15 to R 20 each independently is an ethyl group or a hydroxyethyl group, and preferably all of R 15 to R 20 are an ethyl group or a hydroxyethyl group.
- the method for producing the silicon oligomer of the invention (hereinafter, referred to as “the method of the invention”) is not particularly limited, but, for example, the silicon oligomer can be obtained by reacting a tetraalkoxysilane represented by the following formula (III):
- the polymerization reaction is advantageously controlled.
- a solid resin catalyst conventionally used in the polymerization reaction of a tetraalkoxysilane, or the like is used, it is difficult to control the polymerization reaction, and therefore the silicon oligomer represented by the above formula (I) cannot be obtained.
- R 11 to R 14 each independently is an alkyl group or a hydroxyalkyl group, each having 1 to 4 carbon atoms, preferably an alkyl group or a hydroxyalkyl group, each having 2 carbon atoms, more preferably a hydroxyalkyl group having 2 carbon atoms.
- One type of or two or more types of the tetraalkoxysilanes represented by the formula (III) may be used.
- B is an alkylene group having 2 to 4 carbon atoms which may be branched, preferably an alkylene group having 2 carbon atoms
- k is an integer of 1 to 3, preferably 1.
- Specific examples of the dihydric alcohols represented by the formula (IV) include ethylene glycol, propylene glycol, butylene glycol, diethylene glycol, and triethylene glycol, and, of these, preferred are ethylene glycol, propylene glycol, and butylene glycol.
- One type of or two or more types of the dihydric alcohols represented by the formula (IV) may be used.
- the metal catalyst present during the reaction there is no particular limitation as long as it contains a metal having catalytic activity, and examples include ones containing aluminum, cobalt, titanium, zinc, molybdenum, tin, or the like, and preferred examples include ones containing aluminum, cobalt, or titanium.
- Specific examples of metal catalysts include aluminum salts, such as aluminum chloride, cobalt salts, such as cobalt chloride, and titanium salts, such as titanium trichloride, and preferred is aluminum chloride or the like. One type of or two or more types of these metal catalysts may be used.
- the metal catalyst is present in the state of being dissolved in the dihydric alcohol represented by the formula (IV) in the system during the reaction.
- inorganic acids such as hydrochloric acid, sulfuric acid, and nitric acid.
- the acid is present in the state of being dissolved in the dihydric alcohol represented by the formula (IV) in the system during the reaction.
- a metal catalyst, an acid, or an alkali is added to the dihydric alcohol represented by the formula (IV), and then the resultant mixture is heated to a reaction temperature while stirring, and further the tetraalkoxysilane represented by the formula (III) is added to the mixture to effect a reaction.
- the reaction temperature is 25 to 150° C., preferably 30 to 70° C.
- the reaction time is 30 minutes to 8 hours, preferably 2 to 4 hours. It is important that the reaction is conducted so that the molar ratio of the tetraalkoxysilane represented by the formula (III) and the dihydric alcohol represented by the formula (IV) is 4:1 to 1:4, preferably 1:2 to 1:4.
- the dihydric alcohol represented by the formula (IV) is incorporated between the tetraalkoxysilane and another tetraalkoxysilane, so that the distance between the poles of silicon atoms becomes longer.
- the thus obtained silicon oligomer of the invention can be identified by a known method, such as 1 H NMR, 29 Si NMR, IR, or MASS. Specifically, the silicon oligomer can be identified by 1 H NMR and 29 Si NMR.
- the silicon oligomer of the invention is a polymerizable substance which undergoes polymerization due to heating or the like to obtain a polymerizable product. Further, the silicon oligomer of the invention has a property of being dissolved in a solvent, such as water, isopropyl alcohol, or ethyl cellosolve, or a mixed solvent thereof.
- a solvent such as water, isopropyl alcohol, or ethyl cellosolve, or a mixed solvent thereof.
- the silicon oligomer of the invention When the silicon oligomer of the invention is in the form of being diluted with, for example, a glycol solvent, such as polyethylene glycol or ethyl cellosolve, the silicon oligomer can be stably stored even in the presence of water.
- a glycol solvent such as polyethylene glycol or ethyl cellosolve
- the silicon oligomer can be stably stored for a long term even in the presence of water.
- the silicon oligomer of the invention has the above-mentioned property, and further can be used like a conventionally known silicon oligomer in applications of a surface treatment agent and the like.
- the silicon oligomer of the invention is preferably used in a coating agent, particularly a coating agent for a fastening member.
- the coating agent in the invention contains the silicon oligomer of the invention, and, for example, the coating agent may contain one member or two or more members selected from the group consisting of a resin, a colorant, a friction coefficient adjustor, and a film-forming agent which are added to a conventionally known coating agent.
- the coating agent can be prepared by appropriately stirring and mixing together the above-mentioned components.
- the resin used in the coating agent in the invention there is no particular limitation as long as it is soluble or dispersible in the coating agent, and, for example, there can be mentioned acrylic resins, urethane resins, phenolic resins, and epoxy resins. Of these resins, acrylic resins are preferred, an alkyl methacrylate copolymer, a colloidal silica-acryl composite, and an ethylene-acrylic acid copolymer ammonium salt are more preferred, and an alkyl methacrylate copolymer is especially preferred. One type of or two or more types of these resins can be used. The resin is incorporated into the coating agent in an amount of 0.1 to 50%, preferably 1 to 20%.
- the colorant used in the coating agent in the invention there is no particular limitation as long as it is soluble or dispersible in the coating agent, and, for example, there can be mentioned dye colorants and pigment colorants. One type of or two or more types of these colorants can be used.
- the colorant is incorporated into the coating agent in an amount of 0.1 to 50%, preferably 1 to 30%.
- friction coefficient adjustor used in the coating agent in the invention
- polyolefin compounds such as polyethylene and polypropylene
- fluorine compounds such as polytetrafluoroethylene (PTFE) and a tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer (PFA).
- PTFE polytetrafluoroethylene
- PFA tetrafluoroethylene-perfluoroalkyl vinyl ether copolymer
- the friction coefficient adjustor is incorporated into the coating agent in an amount of 0.1 to 10%, preferably 0.5 to 5%.
- the film-forming agent used in the coating agent in the invention there is no particular limitation as long as it is soluble or dispersible in the coating agent, and, for example, there can be mentioned colloidal silica and fumed silica.
- colloidal silica and fumed silica One type of or two or more types of these film-forming agents can be used.
- the film-forming agent is incorporated into the coating agent in an amount of 0.1 to 20%, preferably 1 to 10%.
- a component of an agent for imparting another function or the like can be incorporated into the coating agent in the invention in such an amount that the effects of the invention are not sacrificed.
- a surface treatment for a member to be treated can be made by treating the member with the above-described coating agent in the invention.
- the surface of the member to be treated may be formed from a metal and a resin, and the inside of the member may be formed from any material. Further, with respect to the shape of the member to be treated, there is no particular limitation.
- the treatment of a member to be treated with the coating agent in the invention may be conducted by a similar method to a treatment method using a conventionally known coating agent, for example, in which a member to be treated is immersed in the coating agent in the invention, or the coating agent in the invention is sprayed onto a member to be treated, and, if necessary, the resultant member is subjected to heating or the like.
- a dip-and-spinning method is preferred.
- a spray coating method is preferred.
- the heating may be made by heating the member to a temperature equal to or higher than the temperature at which a film is formed, for example, 80° C. or higher, preferably 100 to 200° C.
- the resultant member may be further treated with the coating agent and heated to form a stacked structure.
- the thus obtained product surface-treated with the coating agent in the invention has imparted thereto a corrosion resistance and a function. Therefore, the product can be advantageously used in applications of a fastening member and the like.
- the corrosion resistance indicates a resistance to corrosion, and the function indicates friction coefficient adjustment.
- the corrosion resistance means that the white rust generation area is 7% or less, preferably 5% or less, more preferably 3% or less, as measured in a salt spray test performed in accordance with JIS Z 2371.
- the friction coefficient adjustment means suppression of the dispersion of the coefficient of friction of a film.
- TEOS tetraethoxysilane
- a structure of the silicon oligomer determined by the above NMR measurements is such that, in the formula (I), R 1 to R 10 are an ethyl group, X 1 to X 3 are a group represented by the formula (II), n is 0 or 1, and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1, wherein, in the formula (II), A is an ethylene group, and l is 1.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the amount of ethylene glycol was changed to 83.9 g (1.35 mol).
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers. Also after the reaction, the unreacted TEOS remained as the upper layer to cause separation into two layers. This means that the degree of reaction of TEOS is low.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the amount of ethylene glycol was changed to 177.8 g (2.7 mol).
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers. Also after the reaction, the unreacted TEOS remained as the upper layer to cause separation into two layers. This means that the degree of reaction of TEOS is low.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the amount of aluminum chloride hexahydrate was changed to 18 g.
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that 1.8 g of aluminum chloride hexahydrate was changed to 0.93 g of cobalt chloride hexahydrate.
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that 1.8 g of aluminum chloride hexahydrate was changed to 0.64 g of titanium trichloride.
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that 1.8 g of aluminum chloride hexahydrate was changed to 0.8 g of hydrochloric acid.
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the ethylene glycol was changed to 336 g of water.
- TEOS and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%.
- the silicon oligomers prepared in Examples 1 and 4 to 7 and Comparative Example 1 were individually diluted with ethyl cellosolve so that each silicon oligomer content became 10% to prepare diluted solutions, or the silicon oligomer prepared in Example 1 was diluted individually with polyethylene glycols of various types so that each silicon oligomer content became 10% to prepare diluted solutions. Further, these diluted solutions were individually diluted with water into a 1/2 concentration to obtain test solutions (having a silicon oligomer content of 5%). Each of the obtained test solutions was placed in a glass container and stored at room temperature. After the start of storage, each test solution was observed day by day until a change occurred. The results of the observation are shown in Table 1.
- the silicon oligomer of the invention has excellent stability for liquid. Further, it has been found that when diluted with a glycol solvent, the silicon oligomer of the invention is further improved in the stability.
- the silicon oligomer of the invention has excellent film forming properties.
- a commercially available bolt was subjected to zinc plating and then subjected to chemical conversion treatment (Trivalent 1200, manufactured by JCU Corporation).
- the resultant bolt was immersed individually in diluted solutions which had been prepared by diluting the silicon oligomers prepared in Examples 1 and 4 to 7 and Comparative Example 1 individually with ethyl cellosolve so that each silicon oligomer content became 10%, or diluted solutions which had been prepared by diluting the silicon oligomer prepared in Example 1 individually with polyethylene glycols of various types so that each silicon oligomer content became 10%, and subjected to centrifuging, and then calcined at 180° C. for 20 minutes.
- a salt spray test was conducted for 240 hours.
- the salt spray test was conducted in accordance with JIS Z 2371.
- With respect to the bolts obtained after the salt spray test a white rust generation area was visually measured. The results are shown in Table 3.
- the silicon oligomer prepared in Example 1 was dissolved in an alkyl methacrylate copolymer (NIKASOL PK8012P, manufactured by Nippon Carbide Industries Co., Inc.) so that the silicon oligomer content became 3% to prepare a coating agent.
- NIKASOL PK8012P alkyl methacrylate copolymer
- the silicon oligomer prepared in Example 1 was dissolved in a colloidal silica-acryl composite (Newcoat PM-3101-01, manufactured by Shin-Nakamura Chemical Co., Ltd.) so that the silicon oligomer content became 3% to prepare a coating agent.
- a colloidal silica-acryl composite (Newcoat PM-3101-01, manufactured by Shin-Nakamura Chemical Co., Ltd.) so that the silicon oligomer content became 3% to prepare a coating agent.
- the silicon oligomer prepared in Example 1 was dissolved in an ethylene-acrylic acid copolymer ammonium salt (ZAIKTHENE N, manufactured by Sumitomo Seika Chemicals Co., Ltd.) so that the silicon oligomer content became 3% to prepare a coating agent.
- ZIKTHENE N ethylene-acrylic acid copolymer ammonium salt
- each of the coating agents prepared in Examples 8 to 10 was placed in a glass container and stored at room temperature. After the start of storage, each coating agent was observed day by day until a change occurred. The results of the observation are shown in Table 4.
- the silicon oligomer prepared in Example 1, an alkyl methacrylate copolymer (NIKASOL PK8012P, manufactured by Nippon Carbide Industries Co., Inc.), polyethylene glycol 200, and isopropyl alcohol were dissolved in water so that the silicon oligomer content became 3%, the copolymer content became 7%, the polyethylene glycol content became 1%, and the isopropyl alcohol content became 20% to prepare a coating agent.
- NIKASOL PK8012P alkyl methacrylate copolymer
- polyethylene glycol 200 polyethylene glycol 200
- isopropyl alcohol 20%
- the silicon oligomer prepared in Example 1, a colloidal silica-acryl composite (Newcoat PM-3101-01, manufactured by Shin-Nakamura Chemical Co., Ltd.), polyethylene glycol 200, and isopropyl alcohol were dissolved in water so that the silicon oligomer content became 3%, the composite content became 7%, the polyethylene glycol content became 1%, and the isopropyl alcohol content became 20% to prepare a coating agent.
- the silicon oligomer prepared in Example 1, an ethylene-acrylic acid copolymer ammonium salt (ZAIKTHENE N, manufactured by Sumitomo Seika Chemicals Co., Ltd.), polyethylene glycol 200, and isopropyl alcohol were dissolved in water so that the silicon oligomer content became 3%, the copolymer ammonium salt content became 7%, the polyethylene glycol content became 1%, and the isopropyl alcohol content became 20% to prepare a coating agent.
- ZAIKTHENE N ethylene-acrylic acid copolymer ammonium salt
- the coating agents prepared in Examples 11 to 13 were individually applied to a SUS 304 test piece (1 dm 2 ), and calcined at 180° C. for 20 minutes. After the calcination, the resultant film was freely evaluated in respect of the appearance (film forming properties). For comparison, a similar test was conducted with respect to a coating agent containing solely an alkyl methacrylate copolymer which is the resin component of the coating agent. The results are shown in Table 5.
- a commercially available bolt with flange was subjected to zinc plating and then subjected to chemical conversion treatment (Trivalent 1200, manufactured by JCU Corporation).
- the resultant bolt was immersed in the coating agent prepared in Example 11, and subjected to centrifuging, and then calcined at 180° C. for 20 minutes.
- a bolt having no coating agent and a bolt coated with solely an alkyl methacrylate copolymer which is the resin component of the coating agent prepared in Example 11 were prepared.
- Test bolt Bolt with flange Test speed: 3 to 10 rpm
- Fastening method Specified axial force method
- the corrosion resistance was markedly poor, whereas, in the coating agent using the resin component and the silicon oligomer of the invention in combination, a remarkable improvement was seen in the corrosion resistance. Further, the coating agent using the resin component and the silicon oligomer of the invention in combination was suppressed in the dispersion of the coefficient of friction.
- a commercially available bolt with flange was subjected to zinc plating and then subjected to chemical conversion treatment (Trivalent 1200, manufactured by JCU Corporation).
- the resultant bolt was immersed in a diluted solution prepared by diluting the silicon oligomer prepared in Example 4 with ethyl cellosolve so that the solids content became 20%, or in the coating agent prepared in Example 11, and subjected to centrifuging, and then calcined at 180° C. for 20 minutes.
- the film was shattered upon fastening. On the other hand, it has been found that, by using the coating agent in Example 4 or Example 11, the film suffers no shattering.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the ethylene glycol was changed to 810.9 g (5.4 mol) of triethylene glycol. With respect to the obtained silicon oligomer, before the reaction, TEOS and triethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%. Further, from the fact that a film was able to be formed from the silicon oligomer by calcining it, it is considered that the obtained silicon oligomer is a polymerizable product like Example 1.
- the obtained silicon oligomer has a structure such that, in the formula (I), R 1 to R 10 are an ethyl group, X 1 to X 3 are a group represented by the formula (II), n is 0 or 1, and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1, wherein, in the formula (II), A is an ethylene group, and l is 3.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the ethylene glycol was changed to 486.6 g (5.4 mol) of 1,3-butylene glycol.
- TEOS and 1,3-butylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of TEOS is 100%.
- the obtained silicon oligomer is a polymerizable product like Example 1.
- the obtained silicon oligomer has a structure such that, in the formula (I), R 1 to R 10 are an ethyl group, X 1 to X 3 are a group represented by the formula (II), n is 0 or 1, and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1, wherein, in the formula (II), A is a methylpropylene group, and l is 1.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the tetraethoxysilane was changed to 411.1 g (2.7 mol) of tetramethoxysilane.
- the obtained silicon oligomer before the reaction, tetramethoxysilane and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of tetramethoxysilane is 100%.
- the obtained silicon oligomer is a polymerizable product like Example 1.
- the obtained silicon oligomer has a structure such that, in the formula (I), R 1 to R 10 are a methyl group, X 1 to X 3 are a group represented by the formula (II), n is 0 or 1, and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1, wherein, in the formula (II), A is an ethylene group, and l is 1.
- a silicon oligomer was prepared in substantially the same manner as in Example 1 except that the tetraethoxysilane was changed to 865.5 g (2.7 mol) of tetrabutoxysilane.
- the obtained silicon oligomer before the reaction, tetrabutoxysilane and ethylene glycol were not mixed with each other and suffered separation into two layers, but, after the reaction, they were changed to a single layer because TEOS was completely reacted. This means that the degree of reaction of tetrabutoxysilane is 100%.
- the obtained silicon oligomer is a polymerizable product like Example 1.
- the obtained silicon oligomer has a structure such that, in the formula (I), R 1 to R 10 are a butyl group, X 1 to X 3 are a group represented by the formula (II), n is 0 or 1, and m is an integer of 1 to 3 when n is 0, and m is 1 when n is 1, wherein, in the formula (II), A is an ethylene group, and l is 1.
- the silicon oligomer of the invention can be used like a conventionally known silicon oligomer in applications of a surface treatment agent and the like.
- the resultant coating agent can form a film having flexibility, and therefore can be advantageously used in coating for a fastening member and the like.
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US7629396B2 (en) | 2005-02-23 | 2009-12-08 | E.I. Du Pont De Nemours And Company | Silicon-containing polytrimethylene homo- for copolyether composition |
US20060189711A1 (en) * | 2005-02-23 | 2006-08-24 | Ng Howard C | Silicon-containing polytrimethylene homo- or copolyether composition |
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