US20140000456A1 - Nitrous oxide regenerable room temperature purifier and method - Google Patents
Nitrous oxide regenerable room temperature purifier and method Download PDFInfo
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- US20140000456A1 US20140000456A1 US13/866,875 US201313866875A US2014000456A1 US 20140000456 A1 US20140000456 A1 US 20140000456A1 US 201313866875 A US201313866875 A US 201313866875A US 2014000456 A1 US2014000456 A1 US 2014000456A1
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- nickel
- room temperature
- purifier
- equal
- regenerable
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- 238000000034 method Methods 0.000 title claims abstract description 22
- GQPLMRYTRLFLPF-UHFFFAOYSA-N Nitrous Oxide Chemical compound [O-][N+]#N GQPLMRYTRLFLPF-UHFFFAOYSA-N 0.000 title abstract description 78
- 239000001272 nitrous oxide Substances 0.000 title abstract description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 84
- 238000000746 purification Methods 0.000 claims abstract description 48
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 39
- 239000000463 material Substances 0.000 claims abstract description 38
- 229910000480 nickel oxide Inorganic materials 0.000 claims abstract description 25
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 claims abstract description 25
- 230000008929 regeneration Effects 0.000 claims description 10
- 238000011069 regeneration method Methods 0.000 claims description 10
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000000395 magnesium oxide Substances 0.000 claims description 5
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims description 5
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims description 5
- 239000007789 gas Substances 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 10
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 10
- 229910002092 carbon dioxide Inorganic materials 0.000 description 9
- 230000008569 process Effects 0.000 description 9
- 238000001994 activation Methods 0.000 description 8
- 239000012535 impurity Substances 0.000 description 8
- 239000002808 molecular sieve Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910001220 stainless steel Inorganic materials 0.000 description 3
- 239000010935 stainless steel Substances 0.000 description 3
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000004821 distillation Methods 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 230000007420 reactivation Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 1
- 101150035080 RGA5 gene Proteins 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002091 carbon monoxide Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000011144 upstream manufacturing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/20—Nitrogen oxides; Oxyacids of nitrogen; Salts thereof
- C01B21/22—Nitrous oxide (N2O)
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
- B01D53/0462—Temperature swing adsorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/46—Removing components of defined structure
- B01D53/62—Carbon oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/112—Metals or metal compounds not provided for in B01D2253/104 or B01D2253/106
- B01D2253/1122—Metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2253/00—Adsorbents used in seperation treatment of gases and vapours
- B01D2253/10—Inorganic adsorbents
- B01D2253/112—Metals or metal compounds not provided for in B01D2253/104 or B01D2253/106
- B01D2253/1124—Metal oxides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/50—Carbon oxides
- B01D2257/504—Carbon dioxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/80—Water
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/96—Regeneration, reactivation or recycling of reactants
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0001—Separation or purification processing
- C01B2210/0009—Physical processing
- C01B2210/0014—Physical processing by adsorption in solids
- C01B2210/0015—Physical processing by adsorption in solids characterised by the adsorbent
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/005—Carbon monoxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/0051—Carbon dioxide
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B2210/00—Purification or separation of specific gases
- C01B2210/0043—Impurity removed
- C01B2210/0062—Water
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/10—Capture or disposal of greenhouse gases of nitrous oxide (N2O)
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/151—Reduction of greenhouse gas [GHG] emissions, e.g. CO2
Definitions
- the present invention relates to a room temperature purification method and to a room temperature regenerable purification system for Nitrous Oxide.
- Nitrous oxide has many industrial uses requiring an accurate control of impurity levels within this gas, among the most demanding ones there are semiconductor manufacturing processes such as chemical vapour deposition, selective oxidations such as in display manufacturing, and rapid thermal oxynitridation process for the fabrication of metal oxide semiconductor (MOS) capacitors.
- semiconductor manufacturing processes such as chemical vapour deposition, selective oxidations such as in display manufacturing, and rapid thermal oxynitridation process for the fabrication of metal oxide semiconductor (MOS) capacitors.
- impurities such as H 2 O, CO 2 , CO and similar play a detrimental role by degrading and interfering with the characteristics and performance of the device/component wherein N 2 O is used as process gas.
- CO 2 which is not easily and efficiently removed by means of the standard industrial distillation processes, such as the ones described in the European patent application EP 0636576, because of the close value of the condensation temperature of CO 2 and N 2 O. For this reason, separation plants are not suitable to achieve a sufficient level of purity for electronic grade N 2 O, as regards the CO 2 content.
- a suitable target capacity for the purifier material is 0.5 l/l or higher.
- the liter/liter unit indicates the capability of a given volume (expressed in liters) of the purifier media to remove a volume of gas impurities expressed in standard liters (measured at atmospheric pressure and 0° C.).
- Nitrous Oxide purification systems of the prior art generally require cooling apparatus in order to reach levels of efficiency, such as that described in U.S. Pat. No. 7,314,506, comprising cryogenic purification of various gaseous streams, including nitrous oxide, with different materials. Cooling apparatus add cost and complexity to such systems.
- An object of embodiments set forth herein is to provide a room temperature purifier for N 2 O.
- Another object of embodiments set forth herein is to provide an N 2 O purification system which can operate continuously by using multiple purification vessels.
- an improved method for the purification of N 2 O includes feeding a N 2 O gaseous stream to a vessel having an inlet and outlet, the vessel being at least partially filled with a purification material comprising nickel oxide and optional elemental nickel, wherein the weight ratio between the nickel oxide and the optional elemental nickel is equal or higher than 3 and the surface area of the nickel oxide and the optional elemental nickel is equal or higher than 50 m 2 /g.
- An example vessel suitable for use in the above-described method can be a hermetically sealed vessel, normally made of metal.
- the vessel can be made from stainless steel.
- a portion of the vessel containing the purification material is defined as an “active portion” of the vessel and defines an internal volume of the active portion.
- the active portion can be delimited by retaining devices such as, for example, particle filters.
- FIG. 1 is a partially broken elevational view of an example N 2 O purifier
- FIG. 2 is a cross-sectional view taken along line 2 - 2 of FIG. 1 with the purification material removed;
- FIG. 3 is a block diagram of an example N 2 O purifier system.
- the terms “purification media,” “material” and the like shall mean a material with the characteristics in terms of NiO/Ni weight ratio and surface area as describe here.
- the purification material used as described herein has a surface area of at least 100 m 2 /g and the NiO/Ni weight ratio is equal or higher than 5.
- the purification material is essentially completely oxidized such that it consists essentially of NiO (e.g. the Ni weight fraction over NiO is less than 5%).
- the purification material can also include inert materials.
- amorphous silica can be used as a high surface area support for the NiO and Ni.
- magnesium oxide can be used as a support for the NiO and/or Ni.
- the NiO and/or Ni can be coated, adhered or otherwise supported by at least one of amorphous silica and magnesium oxide (i.e. amorphous silica, magnesium oxide or both), as will be appreciated by those of skill in the art.
- the method for purifying N 2 O is carried out at room temperature (e.g. at about 20-25° C.).
- the inventors have surprisingly found that when the target impurity is CO 2 in N 2 O as matrix gas, it is possible to use oxidized nickel (or to be more precise a high surface media based on oxidized nickel where NiO fraction is preponderant with respect to elemental nickel) as an efficient purification media at room temperature, and more specifically tests carried out on this material have shown that the capacity is consistently higher than 0.5 l/l and that this material is also fully regenerable, fulfilling both the requirements in terms of capacity and media lifetime.
- Example methods and apparatuses for N 2 O purification use more than one material to remove additional impurities.
- molecular sieves may be used for moisture removal.
- an example N 2 O purifier 10 includes a vessel 12 having an inlet 14 and an outlet 16 .
- a first particle filter 18 abuts inlet 14 and a second particle filter 20 abuts outlet 16 .
- Example purifier 10 will be discussed in greater detail subsequently.
- a room temperature regenerable N 2 O purifier 10 includes a vessel 12 having an inlet 14 and outlet 16 , an active portion A at least partially filled with a purification material 22 comprising nickel oxide and optional elemental nickel, wherein the weight ratio between the nickel oxide and the optional elemental nickel is equal or higher than 3 and the surface area of the nickel oxide and the optional elemental nickel is equal or higher than 50 m 2 /g.
- the weight ratio between the nickel oxide and the optional elemental nickel is preferably equal or higher than 5 and the surface areas of the nickel oxide and the optional elemental nickel are equal to or higher than 100 m 2 /g.
- room temperature purifier 10 does not include active mechanisms to decrease the temperature of the vessel 12 .
- heaters and temperature control components such as thermocouples, can be provided in certain example embodiments in order to perform and control the regeneration process.
- vessel 12 of the purifier 10 is a hermetically sealed vessel, normally made of metal.
- vessel 12 can comprise stainless steel.
- the portion of the vessel 12 containing the purification material 22 is defined as the active portion A, which delimits an internal volume of the active portion. This portion is usually delimited by retainers such as particle filters 18 and 20 .
- the active portion A of the vessel 12 defines a volume having a length L and a width W.
- the ratio between the length and the width is at least 1 in order to guarantee a sufficient contact time between the gas to be purified and the purification material.
- Preferably such ratio is not higher than 15 in order to avoid an excessive pressure drop caused by the purifier media.
- the ratio L/W between the length and the width is between 1 and 15.
- the example purifier 10 may have different volumes, notwithstanding the above dimensional limits on the length/width ratio of the active portion of the vessel, in order to accommodate different amounts of N 2 O nickel purification media to address the flow rate of the nitrous oxide gas and its desired level of purification.
- the purifier active portion A may be completely filled with the N 2 O nickel purification media. This is typically the case when the purifier system is used upstream or downstream of other purifier systems, such as, as a non-limiting examples, distillation towers and/or water removal systems.
- the purifier hermetic vessel contains also other purification materials.
- N 2 O nickel purification media fills at least 30% of the active portion A of the hermetically sealed vessel 12 of the purifier 10 , and preferably at least 60% of the active volume.
- FIG. 3 is a block diagram of an example N 2 O purifier system 24 including a first purifier 10 A, a second purifier 10 B, a manifold 26 , and a controller 28 .
- the purifier system 24 is advantageous in that it has at least two purifier vessels 10 A/ 10 B containing the N 2 O nickel purification media, and a suitable gas manifold 26 and its automatic valves, to selectively choose one purifier for gas purification and the other purifier for regeneration, so that there is no interruption in flow of purified N 2 O due to the regeneration process.
- the purifiers 10 A and 10 B can be similar to, or the same as, the purifier 10 of FIGS. 1 and 2 .
- the gas manifold includes a series of tubes 30 , which are preferably made from stainless steel, as well as a number of automatic valves 32 which can be opened and closed under the control of controller 28 .
- impure N 2 O can be directed through one of the purifiers 10 A and 10 B while N 2 , for example, can be directed through the other of the purifiers 10 A and 10 B to facilitate the regeneration process.
- the purifier being regenerated is preferably heated by a heater 34 and monitored by a temperature sensor 36 , which are also preferably coupled to controller 28 .
- the regeneration operation is carried out by flowing an inert gas, preferably nitrogen, through a purifier while heating the purifier vessel 12 .
- an inert gas preferably nitrogen
- the nitrogen flow is advantageously comprised between 0.5 and 5 m 3 /hour. More generally, such interval linearly scales with the vessel volume.
- the temperature of the regeneration process is more important.
- the temperature is preferably between 150 and 300° C. for a regeneration time ranging from 1 and 24 hours.
- the duration of the regeneration process is directly related to the temperature of the vessel 12 .
- a 4 cc volume cylindrical purifier vessel with a length of 4.8 cm and a diameter of 1.04 cm has been filled with different purification materials, and subjected to an activation process, according to the scheme of Table 1 that indicates the material and the equilibrium temperature during the activation process.
- Table 1 the parameters that are in common for all the samples have been omitted, i.e. the type of gas flown during the activation (Nitrogen), the flow (0.5 l/min), and the overall length of the activation process (21 hours).
- Sample 1 was essentially made by supported fully oxidized nickel (NiO), since prior to the activation process the material was exposed to air.
- the nickel used for sample S1 had a surface area of 180 m 2 /g.
- comparative sample C1-C3 made with the three most common types of molecular sieves used in gas purifications used for the CO 2 removal, have a negligible capacity toward carbon dioxide when the matrix gas is N 2 O, as further indication of the unforeseeable behaviour of the purifier media when employed in different matrix gasses.
- Sample S1 has been subjected to a re-activation process, i.e. the activation process described in Table 1 has been repeated after the media in the vessel has exhausted its capacity (the analyser reading connected downstream reached 0.5 ppm). After reactivation the capacity of sample S1 has been measured obtaining the same value, as a proof that the material is fully regenerable and compatible with the application.
- a re-activation process i.e. the activation process described in Table 1 has been repeated after the media in the vessel has exhausted its capacity (the analyser reading connected downstream reached 0.5 ppm). After reactivation the capacity of sample S1 has been measured obtaining the same value, as a proof that the material is fully regenerable and compatible with the application.
- Nickel purification media has been subjected to an activation treatment that causes its reduction to nickel, by flowing a nitrogen stream with 10% of hydrogen. After having brought it at room temperature the purifier was exposed to N 2 O in a series of controlled cycles in order to condition the material, even with this precautions, the system temperature went over 250° C., posing serious problems in terms of safety. This tests show that the media disclosed in previously mentioned U.S. Pat. No. 6,436,352 is not suitable to be used in the Nitrous Oxide purification, in an industrial scale process.
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- Oil, Petroleum & Natural Gas (AREA)
- General Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
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Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015507616A JP6027227B2 (ja) | 2012-04-24 | 2013-04-23 | 亜酸化窒素の、再生可能な室温浄化装置及び方法 |
| PCT/IB2013/000753 WO2013160746A1 (en) | 2012-04-24 | 2013-04-23 | Nitrous oxide regenerable room temperature purifier and method |
| EP13726862.9A EP2841377B1 (en) | 2012-04-24 | 2013-04-23 | Nitrous oxide regenerable room temperature purifier and method |
| CN201380021354.8A CN104245574B (zh) | 2012-04-24 | 2013-04-23 | 一氧化二氮可再生室温净化器及方法 |
| KR1020147028597A KR101866918B1 (ko) | 2012-04-24 | 2013-04-23 | 아산화질소 재생가능 실온 정제기 및 방법 |
| US15/295,978 US9643845B2 (en) | 2012-04-24 | 2016-10-17 | Nitrous oxide regenerable room temperature purifier and method |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| IT000676A ITMI20120676A1 (it) | 2012-04-24 | 2012-04-24 | Metodo e dispositivo rigenerabile di purificazione a temperatura ambiente per monossido di diazoto |
| ITMI2012A000676 | 2012-04-24 |
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| US15/295,978 Division US9643845B2 (en) | 2012-04-24 | 2016-10-17 | Nitrous oxide regenerable room temperature purifier and method |
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| Publication Number | Publication Date |
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| US20140000456A1 true US20140000456A1 (en) | 2014-01-02 |
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| Application Number | Title | Priority Date | Filing Date |
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| US13/866,875 Abandoned US20140000456A1 (en) | 2012-04-24 | 2013-04-19 | Nitrous oxide regenerable room temperature purifier and method |
| US15/295,978 Active US9643845B2 (en) | 2012-04-24 | 2016-10-17 | Nitrous oxide regenerable room temperature purifier and method |
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| Application Number | Title | Priority Date | Filing Date |
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| US15/295,978 Active US9643845B2 (en) | 2012-04-24 | 2016-10-17 | Nitrous oxide regenerable room temperature purifier and method |
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|---|---|
| US (2) | US20140000456A1 (cg-RX-API-DMAC7.html) |
| EP (1) | EP2841377B1 (cg-RX-API-DMAC7.html) |
| JP (1) | JP6027227B2 (cg-RX-API-DMAC7.html) |
| KR (1) | KR101866918B1 (cg-RX-API-DMAC7.html) |
| CN (1) | CN104245574B (cg-RX-API-DMAC7.html) |
| IT (1) | ITMI20120676A1 (cg-RX-API-DMAC7.html) |
| WO (1) | WO2013160746A1 (cg-RX-API-DMAC7.html) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3862067A1 (en) * | 2020-02-10 | 2021-08-11 | Clariant Catalysts (Japan) K.K. | Co2 and o2 remover |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
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| GB202103659D0 (en) * | 2021-03-17 | 2021-04-28 | Johnson Matthey Plc | Getter activation and use |
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- 2013-04-23 EP EP13726862.9A patent/EP2841377B1/en not_active Not-in-force
- 2013-04-23 KR KR1020147028597A patent/KR101866918B1/ko active Active
- 2013-04-23 CN CN201380021354.8A patent/CN104245574B/zh active Active
- 2013-04-23 JP JP2015507616A patent/JP6027227B2/ja active Active
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP3862067A1 (en) * | 2020-02-10 | 2021-08-11 | Clariant Catalysts (Japan) K.K. | Co2 and o2 remover |
| WO2021161832A1 (en) * | 2020-02-10 | 2021-08-19 | Clariant Catalysts (Japan) K.K. | Co2 and o2 remover |
| US12246300B2 (en) | 2020-02-10 | 2025-03-11 | Clariant Catalysts (Japan) K.K. | CO2 and O2 remover |
Also Published As
| Publication number | Publication date |
|---|---|
| CN104245574A (zh) | 2014-12-24 |
| JP2015519192A (ja) | 2015-07-09 |
| CN104245574B (zh) | 2016-07-06 |
| EP2841377B1 (en) | 2016-02-24 |
| KR20150013450A (ko) | 2015-02-05 |
| US9643845B2 (en) | 2017-05-09 |
| WO2013160746A1 (en) | 2013-10-31 |
| US20170029273A1 (en) | 2017-02-02 |
| KR101866918B1 (ko) | 2018-06-15 |
| JP6027227B2 (ja) | 2016-11-16 |
| ITMI20120676A1 (it) | 2013-10-25 |
| EP2841377A1 (en) | 2015-03-04 |
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