US20080303429A1 - Green luminescent materials - Google Patents

Green luminescent materials Download PDF

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US20080303429A1
US20080303429A1 US12/129,770 US12977008A US2008303429A1 US 20080303429 A1 US20080303429 A1 US 20080303429A1 US 12977008 A US12977008 A US 12977008A US 2008303429 A1 US2008303429 A1 US 2008303429A1
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butyl
adamantyl
group
propyl
methylcyclohexyl
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Norman Herron
Mark A. Guidry
Vsevolod Rostovtsev
Jeffrey A. Merlo
Kalindi Dogra
Victoria J. North
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EIDP Inc
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    • C—CHEMISTRY; METALLURGY
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    • C09K11/00—Luminescent, e.g. electroluminescent, chemiluminescent materials
    • C09K11/06—Luminescent, e.g. electroluminescent, chemiluminescent materials containing organic luminescent materials
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    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
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    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/631—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • H10K85/633—Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine comprising polycyclic condensed aromatic hydrocarbons as substituents on the nitrogen atom
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    • C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10—Non-macromolecular compounds
    • C09K2211/1003—Carbocyclic compounds
    • C09K2211/1007—Non-condensed systems
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    • C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10—Non-macromolecular compounds
    • C09K2211/1003—Carbocyclic compounds
    • C09K2211/1011—Condensed systems
    • C—CHEMISTRY; METALLURGY
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    • C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10—Non-macromolecular compounds
    • C09K2211/1003—Carbocyclic compounds
    • C09K2211/1014—Carbocyclic compounds bridged by heteroatoms, e.g. N, P, Si or B
    • H—ELECTRICITY
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    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/10—Transparent electrodes, e.g. using graphene
    • H10K2102/101—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO]
    • H10K2102/103—Transparent electrodes, e.g. using graphene comprising transparent conductive oxides [TCO] comprising indium oxides, e.g. ITO
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    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
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    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • H10K85/324—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60—Organic compounds having low molecular weight
    • H10K85/615—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene
    • H10K85/626—Polycyclic condensed aromatic hydrocarbons, e.g. anthracene containing more than one polycyclic condensed aromatic rings, e.g. bis-anthracene

Definitions

  • This disclosure relates in general to green luminescent materials and their synthesis.
  • organic electroluminescent compounds As the active component in light-emitting diodes. Simple organic molecules, such as anthracene, thiadiazole derivatives, and coumarin derivatives are known to show electroluminescence. In some cases these small molecule materials are present as a dopant in a host material to improve processing and/or electronic properties.
  • R 1 and R 2 are the same or different and are selected from the group consisting of hydrogen, alkoxy, tertiary alkyl, and cycloalkyl;
  • At least one of R 1 and R 2 is not hydrogen.
  • FIG. 1 includes an illustration of one example of an organic light-emitting diode.
  • alkoxy is intended to mean a group having the formula —OR, which is attached via the oxygen, where R is an alkyl.
  • alkyl is intended to mean a group derived from an aliphatic hydrocarbon and includes a linear, a branched, or a cyclic group. In some embodiments, an alkyl has from 1-20 carbon atoms.
  • cycloalkyl is intended to mean an alkyl group having one or more ring structures. In some embodiments, a cycloalkyl has from 4-20 carbon atoms.
  • second alkyl is intended to mean an alkyl group which includes a secondary carbon. In some embodiments, a secondary alkyl has from 3-20 carbon atoms.
  • secondary carbon is intended to mean a carbon linked to two additional carbons.
  • tertiary alkyl is intended to mean an alkyl group which includes a tertiary carbon. In some embodiments, a tertiary alkyl has from 4-20 carbon atoms.
  • tertiary carbon is intended to mean a carbon linked to three additional carbons.
  • aryl is intended to mean a group derived from an aromatic hydrocarbon.
  • the group may include one or more aromatic rings.
  • luminescent material and “emitter” are intended to mean a material that emits light when activated by an applied voltage (such as in a light-emitting diode or light-emitting electrochemical cell).
  • green luminescent material is intended to mean a material capable of emitting radiation that has an emission maximum at a wavelength in a range of approximately 500-600 nm.
  • layer is used interchangeably with the term “film” and refers to a coating covering a desired area.
  • the term is not limited by size.
  • the area can be as large as an entire device or as small as a specific functional area such as the actual visual display, or as small as a single sub-pixel.
  • Layers and films can be formed by any conventional deposition technique, including vapor deposition, liquid deposition (continuous and discontinuous techniques), and thermal transfer.
  • Continuous deposition techniques include but are not limited to, spin coating, gravure coating, curtain coating, dip coating, slot-die coating, spray coating, and continuous nozzle coating.
  • Discontinuous deposition techniques include, but are not limited to, ink jet printing, gravure printing, and screen printing.
  • organic electronic device or sometimes just “electronic device” is intended to mean a device including one or more organic semiconductor layers or materials.
  • the terms “comprises,” “comprising,” “includes,” “including,” “has,” “having” or any other variation thereof, are intended to cover a non-exclusive inclusion.
  • a process, method, article, or apparatus that comprises a list of elements is not necessarily limited to only those elements but may include other elements not expressly listed or inherent to such process, method, article, or apparatus.
  • “or” refers to an inclusive or and not to an exclusive or. For example, a condition A or B is satisfied by any one of the following: A is true (or present) and B is false (or not present), A is false (or not present) and B is true (or present), and both A and B are true (or present).
  • the new green luminescent materials described herein have Formula I or Formula II
  • R 1 and R 2 are the same or different and are selected from the group consisting of hydrogen, alkoxy, tertiary alkyl, and cycloalkyl.
  • R 3 and R 4 are the same or different and are selected from the group consisting of fluorine, aryl and alkyl.
  • the alkoxy group has from 1-10 carbon atoms; in some embodiments, 1-5 carbons.
  • suitable alkoxy groups include, but are not limited to, methoxy and ethoxy groups.
  • the tertiary alkyl group has from 4-12 carbon atoms; in some embodiments, 4-6 carbons.
  • suitable tertiary alkyl groups include, but are not limited to, tertiary butyl and neopentyl groups.
  • the cycloalkyl group has from 6-20 carbon atoms; in some embodiments, 6-12.
  • suitable cycloalkyl groups include, but are not limited to, cyclohexyl, 1-methylcyclohexyl, and 1-adamantyl groups.
  • R 1 and R 2 are the same.
  • At least one of R 3 and R 4 is a secondary alkyl or a tertiary alkyl. In some embodiments, at least one of R3 and R4 is an aryl group. In some embodiments, the aryl group is selected from phenyl, naphthyl, biphenyl, and terphenyl groups. In some embodiments R 3 and R 4 are the same.
  • green luminescent materials having Formula I or Formula II include, but are not limited to, compounds G1 through G12 in Table 1 below:
  • the green luminescent materials described herein are generally prepared according to the following scheme:
  • the first step involved alkylation of anthracene using Friedel Crafts chemistry with the appropriate alcohol, for example, t-butanol, 1-adamantanol or 1-methylcyclohexanol. This can be carried out in a solvent such as neat trifluoroacetic acid, generally with heating, followed by isolation and chromatographic purification.
  • the substituted anthracene is commercially available, such as 2-t-butylanthracene.
  • the substituted anthracene can then be brominated, such as by using Br 2 in CCl 4 .
  • the dibromide is commercially available.
  • the brominated product is then reacted with the appropriate secondary amine with a Pd catalyst.
  • the secondary amine can also be prepared by Pd catalyzed amination.
  • the substituted anthracene intermediate can be prepared by etherification of dihydroxyanthroquinone, followed by hydride reduction.
  • mixtures of the compounds having Formula I and Formula II are formed.
  • the compounds can be separated or used as a mixture, depending upon the physical properties.
  • Organic electronic devices that may benefit from having one or more layers comprising the green luminescent materials described herein include, but are not limited to, (1) devices that convert electrical energy into radiation (e.g., a light-emitting diode, light emitting diode display, or diode laser), (2) devices that detect signals through electronics processes (e.g., photodetectors, photoconductive cells, photoresistors, photoswitches, phototransistors, phototubes, IR detectors), (3) devices that convert radiation into electrical energy, (e.g., a photovoltaic device or solar cell), and (4) devices that include one or more electronic components that include one or more organic semi-conductor layers (e.g., a transistor or diode).
  • devices that convert electrical energy into radiation e.g., a light-emitting diode, light emitting diode display, or diode laser
  • devices that detect signals through electronics processes e.g., photodetectors, photoconductive cells, photoresistors, photoswitches, photo
  • the device 100 has a first electrical contact layer, an anode layer 110 and a second electrical contact layer, a cathode layer 160 , and a photoactive layer 140 between them.
  • Adjacent to the anode is a buffer layer 120 .
  • Adjacent to the buffer layer is a hole transport layer 130 , comprising hole transport material.
  • Adjacent to the cathode may be an electron transport layer 150 , comprising an electron transport material.
  • devices may use one or more additional hole injection or hole transport layers (not shown) next to the anode 110 and/or one or more additional electron injection or electron transport layers (not shown) next to the cathode 160 .
  • the different layers have the following range of thicknesses: anode 110 , 500-5000 ⁇ , in one embodiment 1000-2000 ⁇ ; buffer layer 120 , 50-2000 ⁇ , in one embodiment 200-1000 ⁇ ; hole transport layer 120 , 50-2000 ⁇ , in one embodiment 200-1000 ⁇ ; photoactive layer 130 , 10-2000 ⁇ , in one embodiment 100-1000 ⁇ ; layer 140 , 50-2000 ⁇ , in one embodiment 100-1000 ⁇ ; cathode 150 , 200-10000 ⁇ , in one embodiment 300-5000 ⁇ .
  • the location of the electron-hole recombination zone in the device, and thus the emission spectrum of the device can be affected by the relative thickness of each layer.
  • the desired ratio of layer thicknesses will depend on the exact nature of the materials used.
  • the green luminescent materials described herein are particularly suited as the photoactive material in the photoactive layer 140 . They can be used alone, in combination with other luminescent materials, or in a host material.
  • the host is a bis-condensed cyclic aromatic compound.
  • the host is an anthracene derivative compound.
  • the compound has the formula:
  • L is a divalent connecting group
  • L is a single bond, —O—, —S—, —N(R)—, or an aromatic group.
  • An is a mono- or diphenylanthryl moiety.
  • the host has the formula:
  • A is an aromatic group.
  • the host is a diarylanthracene.
  • the compound is symmetrical and in some embodiments the compound is non-symmetrical.
  • the host has the formula:
  • a 1 and A 2 are the same or different at each occurrence and are selected from the group consisting of H, an aromatic group, and an alkenyl group, or A may represent one or more fused aromatic rings;
  • p and q are the same or different and are an integer from 1-3.
  • the anthracene derivative is non-symmetrical.
  • at least one of A 1 and A 2 is a naphthyl group.
  • the host is selected from the group consisting of
  • the other layers in the device can be made of any materials which are known to be useful in such layers.
  • the anode 110 is an electrode that is particularly efficient for injecting positive charge carriers. It can be made of, for example materials containing a metal, mixed metal, alloy, metal oxide or mixed-metal oxide, or it can be a conducting polymer, and mixtures thereof. Suitable metals include the Group 11 metals, the metals in Groups 4, 5, and 6, and the Group 8-10 transition metals. If the anode is to be light-transmitting, mixed-metal oxides of Groups 12, 13 and 14 metals, such as indium-tin-oxide, are generally used.
  • the anode may also comprise an organic material such as polyaniline as described in “Flexible light-emitting diodes made from soluble conducting polymer,” Nature vol. 357, pp 477 479 (11 Jun. 1992). At least one of the anode and cathode should be at least partially transparent to allow the generated light to be observed.
  • the buffer layer 120 comprises buffer material and may have one or more functions in an organic electronic device, including but not limited to, planarization of the underlying layer, charge transport and/or charge injection properties, scavenging of impurities such as oxygen or metal ions, and other aspects to facilitate or to improve the performance of the organic electronic device
  • the buffer layer can be formed with polymeric materials, such as polyaniline (PANI) or polyethylenedioxythiophene (PEDOT), which are often doped with protonic acids.
  • the protonic acids can be, for example, poly(styrenesulfonic acid), poly(2-acrylamido-2-methyl-1-propanesulfonic acid), and the like.
  • the buffer layer can comprise charge transfer compounds, and the like, such as copper phthalocyanine and the tetrathiafulvalene-tetracyanoquinodimethane system (TTF-TCNQ).
  • charge transfer compounds such as copper phthalocyanine and the tetrathiafulvalene-tetracyanoquinodimethane system (TTF-TCNQ).
  • the buffer layer comprises at least one electrically conductive polymer and at least one fluorinated acid polymer.
  • the electrically conductive polymer will form a film which has a conductivity of at least 10 ⁇ 7 S/cm.
  • the monomer from which the conductive polymer is formed is referred to as a “precursor monomer”.
  • a copolymer will have more than one precursor monomer.
  • the conductive polymer is made from at least one precursor monomer selected from thiophenes, selenophenes, tellurophenes, pyrroles, anilines, and polycyclic aromatics.
  • polysenes The polymers made from these monomers are referred to herein as polythiophenes, poly(selenophenes), poly(tellurophenes), polypyrroles, polyanilines, and polycyclic aromatic polymers, respectively.
  • polycyclic aromatic refers to compounds having more than one aromatic ring. The rings may be joined by one or more bonds, or they may be fused together.
  • aromatic ring is intended to include heteroaromatic rings.
  • a “polycyclic heteroaromatic” compound has at least one heteroaromatic ring.
  • the polycyclic aromatic polymers are poly(thienothiophenes).
  • the fluorinated acid polymer can be any polymer which is fluorinated and has acidic groups with acidic protons.
  • the term includes partially and fully fluorinated materials.
  • the fluorinated acid polymer is highly fluorinated.
  • the term “highly fluorinated” means that at least 50% of the available hydrogens bonded to a carbon, have been replaced with fluorine.
  • the acidic groups supply an ionizable proton.
  • the acidic proton has a pKa of less than 3.
  • the acidic proton has a pKa of less than 0.
  • the acidic proton has a pKa of less than ⁇ 5.
  • the acidic group can be attached directly to the polymer backbone, or it can be attached to side chains on the polymer backbone.
  • acidic groups include, but are not limited to, carboxylic acid groups, sulfonic acid groups, sulfonimide groups, phosphoric acid groups, phosphonic acid groups, and combinations thereof.
  • the acidic groups can all be the same, or the polymer may have more than one type of acidic group.
  • the fluorinated acid polymer is water-soluble. In some embodiments, the fluorinated acid polymer is dispersible in water. In some embodiments, the fluorinated acid polymer is organic solvent wettable.
  • fluorinated acid polymer has a polymer backbone which is fluorinated.
  • suitable polymeric backbones include, but are not limited to, polyolefins, polyacrylates, polymethacrylates, polyimides, polyamides, polyaramids, polyacrylamides, polystyrenes, and copolymers thereof.
  • the polymer backbone is highly fluorinated. In some embodiments, the polymer backbone is fully fluorinated.
  • the acidic groups are sulfonic acid groups or sulfonimide groups.
  • a sulfonimide group has the formula:
  • R is an alkyl group
  • the acidic groups are on a fluorinated side chain.
  • the fluorinated side chains are selected from alkyl groups, alkoxy groups, amido groups, ether groups, and combinations thereof.
  • the fluorinated acid polymer has a fluorinated olefin backbone, with pendant fluorinated ether sulfonate, fluorinated ester sulfonate, or fluorinated ether sulfonimide groups.
  • the polymer is a copolymer of 1,1-difluoroethylene and 2-(1,1-difluoro-2-(trifluoromethyl)allyloxy)-1,1,2,2-tetrafluoroethanesulfonic acid.
  • the polymer is a copolymer of ethylene and 2-(2-(1,2,2-trifluorovinyloxy)-1,1,2,3,3,3-hexafluoropropoxy)-1,1,2,2-tetrafluoroethanesulfonic acid.
  • These copolymers can be made as the corresponding sulfonyl fluoride polymer and then can be converted to the sulfonic acid form.
  • the fluorinated acid polymer is homopolymer or copolymer of a fluorinated and partially sulfonated poly(arylene ether sulfone).
  • the copolymer can be a block copolymer.
  • comonomers include, but are not limited to butadiene, butylene, isobutylene, styrene, and combinations thereof.
  • the buffer layer is made from an aqueous dispersion of an electrically conducting polymer and a colloid-forming polymeric acid.
  • an electrically conducting polymer and a colloid-forming polymeric acid.
  • the hole transport layer 130 is a layer which facilitates migration of positive charges through the thickness of the layer with relative efficiency and small loss of charge.
  • Examples of hole transport materials for the hole transport layer have been summarized for example, in Kirk-Othmer Encyclopedia of Chemical Technology, Fourth Edition, Vol. 18, p. 837-860, 1996, by Y. Wang. Both hole transporting small molecules and polymers can be used.
  • hole transporting molecules include, but are not limited to: 4,4′,4′′-tris(N,N-diphenyl-amino)-triphenylamine (TDATA); 4,4′,4′′-tris(N-3-methylphenyl-N-phenyl-amino)-triphenylamine (MTDATA); N,N′-diphenyl-N,N′-bis(3-methylphenyl)-[1,1′-biphenyl]-4,4′-diamine (TPD); 4,4′-bis(carbazol-9-yl)biphenyl (CBP); 1,3-bis(carbazol-9-yl)benzene (mCP); 1,1-bis[(di-4-tolylamino)phenyl]cyclohexane (TAPC); N,N′-bis(4-methylphenyl)-N,N′-bis(4-ethylphenyl)-[1,1′-(3,3′-dimethyl)b
  • hole transporting polymers include, but are not limited to, polyvinylcarbazole, (phenylmethyl)polysilane, poly(dioxythiophenes), polyanilines, and polypyrroles. It is also possible to obtain hole transporting polymers by doping hole transporting molecules such as those mentioned above into polymers such as polystyrene and polycarbonate.
  • the hole transport layer comprises a hole transport polymer.
  • the hole transport polymer is a distyrylaryl compound.
  • the aryl group is has two or more fused aromatic rings.
  • the aryl group is an acene.
  • acene refers to a hydrocarbon parent component that contains two or more ortho-fused benzene rings in a straight linear arrangement.
  • the hole transport polymer is an arylamine polymer. In some embodiments, it is a copolymer of fluorene and arylamine monomers.
  • the polymer has crosslinkable groups.
  • crosslinking can be accomplished by a heat treatment and/or exposure to UV or visible radiation.
  • examples of crosslinkable groups include, but are not limited to vinyl, acrylate, perfluorovinylether, 1-benzo-3,4-cyclobutane, siloxane, and methyl esters.
  • Crosslinkable polymers can have advantages in the fabrication of solution-process OLEDs. The application of a soluble polymeric material to form a layer which can be converted into an insoluble film subsequent to deposition, can allow for the fabrication of multilayer solution-processed OLED devices free of layer dissolution problems.
  • crosslinkable polymers can be found in, for example, published US patent application 2005-0184287 and published PCT application WO 2005/052027.
  • the hole transport layer comprises a polymer which is a copolymer of 9,9-dialkylfluorene and triphenylamine.
  • the polymer is a copolymer of 9,9-dialkylfluorene and 4,4′-bis(diphenylamino)biphenyl.
  • the polymer is a copolymer of 9,9-dialkylfluorene and TPB.
  • the polymer is a copolymer of 9,9-dialkylfluorene and NPB.
  • the copolymer is made from a third comonomer selected from (vinylphenyl)diphenylamine and 9,9-distyrylfluorene or 9,9-di(vinylbenzyl)fluorene.
  • the hole transport material can be admixed with an electron acceptor material or an electron donor material.
  • the electron transport layer 150 is a layer which facilitates migration of negative charges through the thickness of the layer with relative efficiency and small loss of charge.
  • electron transport materials which can be used in the optional electron transport layer 140 , include metal chelated oxinoid compounds, such as tris(8-hydroxyquinolato)aluminum (AlQ), bis(2-methyl-8-quinolinolato)(p-phenylphenolato) aluminum (BAlq), tetrakis-(8-hydroxyquinolato)hafnium (HfQ) and tetrakis-(8-hydroxyquinolato)zirconium (ZrQ); and azole compounds such as 2-(4-biphenylyl)-5-(4-t-butylphenyl)-1,3,4-oxadiazole (PBD), 3-(4-biphenylyl)-4-phenyl-5-(4-t-butylphenyl)-1,2,4-triazole (TAZ), and 1,3,5-tri(
  • the cathode 160 is an electrode that is particularly efficient for injecting electrons or negative charge carriers.
  • the cathode can be any metal or nonmetal having a lower work function than the anode.
  • Materials for the cathode can be selected from alkali metals of Group 1 (e.g., Li, Cs), the Group 2 (alkaline earth) metals, the Group 12 metals, including the rare earth elements and lanthanides, and the actinides. Materials such as aluminum, indium, calcium, barium, samarium and magnesium, as well as combinations, can be used.
  • Li- and Cs-containing organometallic compounds, LiF, Li 2 O, and CsF can also be deposited between the organic layer 150 and the cathode layer 160 to lower the operating voltage.
  • This layer may be referred to as an electron injection layer.
  • the device layers can be formed by any deposition technique, or combinations of techniques, including vapor deposition, liquid deposition, and thermal transfer.
  • the device is fabricated by liquid deposition of the buffer layer, the hole transport layer, and the photoactive layer, and by vapor deposition of the anode, the electron transport layer, an electron injection layer and the cathode.
  • the buffer layer can be deposited from any liquid medium in which it is dissolved or dispersed and from which it will form a film.
  • the liquid medium consists essentially of one or more organic solvents.
  • the liquid medium consists essentially of water or water and an organic solvent.
  • the organic solvent is selected from the group consisting of alcohols, ketones, cyclic ethers, and polyols.
  • the organic liquid is selected from dimethylacetamide (“DMAc”), N-methylpyrrolidone (“NMP”), dimethylformamide (“DMF”), ethylene glycol (“EG”), aliphatic alcohols, and mixtures thereof.
  • the buffer material can be present in the liquid medium in an amount from 0.5 to 10 percent by weight.
  • the buffer layer can be applied by any continuous or discontinuous liquid deposition technique. In one embodiment, the buffer layer is applied by spin coating. In one embodiment, the buffer layer is applied by ink jet printing. After liquid deposition, the liquid medium can be removed in air, in an inert atmosphere, or by vacuum, at room temperature or with heating. In one embodiment, the layer is heated to a temperature less than 275° C. In one embodiment, the heating temperature is between 100° C. and 275° C. In one embodiment, the heating temperature is between 100° C. and 120° C. In one embodiment, the heating temperature is between 120° C. and 140° C. In one embodiment, the heating temperature is between 140° C. and 160° C.
  • the heating temperature is between 160° C. and 180° C. In one embodiment, the heating temperature is between 180° C. and 200° C. In one embodiment, the heating temperature is between 200° C. and 220° C. In one embodiment, the heating temperature is between 190° C. and 220° C. In one embodiment, the heating temperature is between 220° C. and 240° C. In one embodiment, the heating temperature is between 240° C. and 260° C. In one embodiment, the heating temperature is between 260° C. and 275° C.
  • the heating time is dependent upon the temperature, and is generally between 5 and 60 minutes. In one embodiment, the final layer thickness is between 5 and 200 nm. In one embodiment, the final layer thickness is between 5 and 40 nm.
  • the final layer thickness is between 40 and 80 nm. In one embodiment, the final layer thickness is between 80 and 120 nm. In one embodiment, the final layer thickness is between 120 and 160 nm. In one embodiment, the final layer thickness is between 160 and 200 nm.
  • the hole transport layer can be deposited from any liquid medium in which it is dissolved or dispersed and from which it will form a film.
  • the liquid medium consists essentially of one or more organic solvents.
  • the liquid medium consists essentially of water or water and an organic solvent.
  • the organic solvent is an aromatic solvent.
  • the organic liquid is selected from chloroform, dichloromethane, toluene, xylene, mesitylene, anisole, and mixtures thereof.
  • the hole transport material can be present in the liquid medium in a concentration of 0.2 to 2 percent by weight. Other weight percentages of hole transport material may be used depending upon the liquid medium.
  • the hole transport layer can be applied by any continuous or discontinuous liquid deposition technique.
  • the hole transport layer is applied by spin coating. In one embodiment, the hole transport layer is applied by ink jet printing. After liquid deposition, the liquid medium can be removed in air, in an inert atmosphere, or by vacuum, at room temperature or with heating. In one embodiment, the layer is heated to a temperature of 300° C. or less. In one embodiment, the heating temperature is between 170° C. and 275° C. In one embodiment, the heating temperature is between 170° C. and 200° C. In one embodiment, the heating temperature is between 190° C. and 220° C. In one embodiment, the heating temperature is between 210° C. and 240° C. In one embodiment, the heating temperature is between 230° C. and 270° C.
  • the heating temperature is between 270° C. and 300° C.
  • the heating time is dependent upon the temperature, and is generally between 5 and 60 minutes.
  • the final layer thickness is between 5 and 50 nm. In one embodiment, the final layer thickness is between 5 and 15 nm. In one embodiment, the final layer thickness is between 15 and 25 nm. In one embodiment, the final layer thickness is between 25 and 35 nm. In one embodiment, the final layer thickness is between 35 and 50 nm.
  • the photoactive layer can be deposited from any liquid medium in which it is dissolved or dispersed and from which it will form a film.
  • the liquid medium consists essentially of one or more organic solvents.
  • the liquid medium consists essentially of water or water and an organic solvent.
  • the organic solvent is an aromatic solvent.
  • the organic solvent is selected from chloroform, dichloromethane, toluene, anisole, 2-butanone, 3-pentanone, butyl acetate, acetone, xylene, mesitylene, chlorobenzene, tetrahydrofuran, diethyl ether, trifluorotoluene, and mixtures thereof.
  • the photoactive material can be present in the liquid medium in a concentration of 0.2 to 2 percent by weight. Other weight percentages of photoactive material may be used depending upon the liquid medium.
  • the photoactive layer can be applied by any continuous or discontinuous liquid deposition technique. In one embodiment, the photoactive layer is applied by spin coating. In one embodiment, the photoactive layer is applied by ink jet printing. After liquid deposition, the liquid medium can be removed in air, in an inert atmosphere, or by vacuum, at room temperature or with heating. Optimal baking conditions depend on the vapor pressure properties of the liquids being removed and their molecular interaction with the liquids. In one embodiment, the deposited layer is heated to a temperature that is greater than the Tg of the material having the highest Tg.
  • the deposited layer is heated between 10 and 20° C. higher than the Tg of the material having the highest Tg. In one embodiment, the deposited layer is heated to a temperature that is less than the Tg of the material having the lowest Tg. In one embodiment, the heating temperature is at least 10° C. less than the lowest Tg. In one embodiment, the heating temperature is at least 20° C. less than the lowest Tg. In one embodiment, the heating temperature is at least 30° C. less than the lowest Tg. In one embodiment, the heating temperature is between 50° C. and 150° C. In one embodiment, the heating temperature is between 50° C. and 75° C. In one embodiment, the heating temperature is between 75° C. and 100° C. In one embodiment, the heating temperature is between 100° C.
  • the heating temperature is between 125° C. and 150° C.
  • the heating time is dependent upon the temperature, and is generally between 5 and 60 minutes.
  • the final layer thickness is between 25 and 100 nm. In one embodiment, the final layer thickness is between 25 and 40 nm. In one embodiment, the final layer thickness is between 40 and 65 nm. In one embodiment, the final layer thickness is between 65 and 80 nm. In one embodiment, the final layer thickness is between 80 and 100 nm.
  • the electron transport layer can be deposited by any vapor deposition method. In one embodiment, it is deposited by thermal evaporation under vacuum. In one embodiment, the final layer thickness is between 1 and 100 nm. In one embodiment, the final layer thickness is between 1 and 15 nm. In one embodiment, the final layer thickness is between 15 and 30 nm. In one embodiment, the final layer thickness is between 30 and 45 nm. In one embodiment, the final layer thickness is between 45 and 60 nm. In one embodiment, the final layer thickness is between 60 and 75 nm. In one embodiment, the final layer thickness is between 75 and 90 nm. In one embodiment, the final layer thickness is between 90 and 100 nm.
  • the electron injection layer can be deposited by any vapor deposition method. In one embodiment, it is deposited by thermal evaporation under vacuum. In one embodiment, the vacuum is less than 10 ⁇ 6 torr. In one embodiment, the vacuum is less than 10 ⁇ 7 torr. In one embodiment, the vacuum is less than 10 ⁇ 8 torr. In one embodiment, the material is heated to a temperature in the range of 100° C. to 400° C.; 150° C. to 350° C. preferably. The vapor deposition rates given herein are in units of Angstroms per second. In one embodiment, the material is deposited at a rate of 0.5 to 10 ⁇ /sec. In one embodiment, the material is deposited at a rate of 0.5 to 1 ⁇ /sec.
  • the material is deposited at a rate of 1 to 2 ⁇ /sec. In one embodiment, the material is deposited at a rate of 2 to 3 ⁇ /sec. In one embodiment, the material is deposited at a rate of 3 to 4 ⁇ /sec. In one embodiment, the material is deposited at a rate of 4 to 5 ⁇ /sec. In one embodiment, the material is deposited at a rate of 5 to 6 ⁇ /sec. In one embodiment, the material is deposited at a rate of 6 to 7 ⁇ /sec. In one embodiment, the material is deposited at a rate of 7 to 8 ⁇ /sec. In one embodiment, the material is deposited at a rate of 8 to 9 ⁇ /sec.
  • the material is deposited at a rate of 9 to 10 ⁇ /sec.
  • the final layer thickness is between 0.1 and 3 nm. In one embodiment, the final layer thickness is between 0.1 and 1 nm. In one embodiment, the final layer thickness is between 1 and 2 nm. In one embodiment, the final layer thickness is between 2 and 3 nm.
  • the cathode can be deposited by any vapor deposition method. In one embodiment, it is deposited by thermal evaporation under vacuum. In one embodiment, the vacuum is less than 10 ⁇ 6 torr. In one embodiment, the vacuum is less than 10 ⁇ 7 torr. In one embodiment, the vacuum is less than 10 ⁇ 8 torr. In one embodiment, the material is heated to a temperature in the range of 100° C. to 400° C.; 150° C. to 350° C. preferably. In one embodiment, the material is deposited at a rate of 0.5 to 10 ⁇ /sec. In one embodiment, the material is deposited at a rate of 0.5 to 1 ⁇ /sec. In one embodiment, the material is deposited at a rate of 1 to 2 ⁇ /sec.
  • the material is deposited at a rate of 2 to 3 ⁇ /sec. In one embodiment, the material is deposited at a rate of 3 to 4 ⁇ /sec. In one embodiment, the material is deposited at a rate of 4 to 5 ⁇ /sec. In one embodiment, the material is deposited at a rate of 5 to 6 ⁇ /sec. In one embodiment, the material is deposited at a rate of 6 to 7 ⁇ /sec. In one embodiment, the material is deposited at a rate of 7 to 8 ⁇ /sec. In one embodiment, the material is deposited at a rate of 8 to 9 ⁇ /sec. In one embodiment, the material is deposited at a rate of 9 to 10 ⁇ /sec.
  • the final layer thickness is between 10 and 10000 nm. In one embodiment, the final layer thickness is between 10 and 1000 nm. In one embodiment, the final layer thickness is between 10 and 50 nm. In one embodiment, the final layer thickness is between 50 and 100 nm. In one embodiment, the final layer thickness is between 100 and 200 nm. In one embodiment, the final layer thickness is between 200 and 300 nm. In one embodiment, the final layer thickness is between 300 and 400 nm. In one embodiment, the final layer thickness is between 400 and 500 nm. In one embodiment, the final layer thickness is between 500 and 600 nm. In one embodiment, the final layer thickness is between 600 and 700 nm. In one embodiment, the final layer thickness is between 700 and 800 nm.
  • the final layer thickness is between 800 and 900 nm. In one embodiment, the final layer thickness is between 900 and 1000 nm. In one embodiment, the final layer thickness is between 1000 and 2000 nm. In one embodiment, the final layer thickness is between 2000 and 3000 nm. In one embodiment, the final layer thickness is between 3000 and 4000 nm. In one embodiment, the final layer thickness is between 4000 and 5000 nm. In one embodiment, the final layer thickness is between 5000 and 6000 nm. In one embodiment, the final layer thickness is between 6000 and 7000 nm. In one embodiment, the final layer thickness is between 7000 and 8000 nm. In one embodiment, the final layer thickness is between 8000 and 9000 nm. In one embodiment, the final layer thickness is between 9000 and 10000 nm.
  • This example demonstrates the preparation of an intermediate secondary amine compounds.
  • the product was collected as an off-white crystalline solid ( ⁇ 21 g) from ethanol/water.
  • the structure was confirmed by 1-H nmr analysis.
  • Compound G2 was made in an analogous manner, starting with 9,10-dibromo-2-t-butylanthracene in place of 9,10-dibromoanthracene.
  • Methylcyclohexylanthracene (14 g, 37.8 mmol) from the previous step and carbontetrachloride (190 ml) were taken in a round bottom flask, equipped with a stir bar and a dropping funnel containing bromine (12 g, 75.6 mmol) under nitrogen. Bromine was added dropwise to the stirred slurry over a period of 3 h until the solution became clear and GC-MS showed no more starting material. The reaction was allowed to stir for another hour and excess Bromine neutralized with a solution of Na 2 S 2 O 3 . The two layers were separated and the aqueous layer extracted with 2 ⁇ 50 ml CCl 4 .
  • reaction flask After ten minutes, its contents were added to the reaction flask. After further ten minutes of stirring, sodium tert-butoxide (7.9 g, 81.8 mmol) was added in portions to the reaction flask under nitrogen and the reaction warmed in an 80° C. sand bath overnight. CL-LCMS showed that the reaction had not gone to completion therefore reaction was cooled and another batch of Pd 2 (dba) 3 (1.25 g, 1.4 mmol) and P( t- Bu) 3 (0.55 g, 2.7 mmol) was added to it and the stirring continued over night. Reaction mixture was filtered through a 2+2′′ plug of silica+celite and washed with toluene and DCM until the flow through became clear.
  • the two isomers of the bis-1-adamantyl anthracene were prepared in an analogous manner to those of G4 and G5 above using 1-adamantanol in place of 1-methylcyclohexanol. Separation of the G7 from the G8 isomer is best achieved by separation of the initial products of alkylation prior to the bromination step.
  • the 2,7-bis-1-adamantyl anthracene (the isomer leading to G8) being the more soluble material and so extraction with toluene at this stage leaves behind the 2,6 isomer and provides a solution of the 2,7 isomer.
  • Subsequent recrystallization from methylene chloride of the isolated solids further purifies each individual isomer.
  • the final G7 and G8 materials are both quite soluble in toluene and were further purified by sublimation prior to device evaluation.
  • 1-H nmr spectroscopy identified the individual materials and confirmed their isomeric assignments:
  • the mixed solution is immediately dark purple but on reaching 80° C. it becomes dark yellow-brown.
  • the solution is cooled, removed from the glove box and filtered through an alumina plug eluting with methylene chloride. TLC of the light yellow filtrate shows a bright green photoluminescent spot.
  • Further purification on FLORISIL eluting with methylene chloride collected a bright yellow solution (with visible green photoluminescence in room light) which crystallized on addition of methanol. Final recrystallization from toluene yielded ⁇ 1.1 g bright yellow crystals.
  • the yellow solid was identified as the desired compound (wet with a little toluene) by 1-H nmr and then further purified by train sublimation prior to device evaluation.
  • the mixed solution is immediately dark purple but on reaching 80° C. it becomes dark yellow-brown.
  • the solution is cooled, removed from the glove box and filtered through an alumina plug eluting with methylene chloride. TLC of the deep orange filtrate shows a bright green photoluminescent spot.
  • Further purification on FLORISIL and then on neutral alumina eluting with methylene chloride collected a bright yellow solution (with visible green photoluminescence in room light) which crystallized on addition of methanol and standing o/n.
  • Final recrystallization from toluene by addition of methanol yielded ⁇ 2.2 g bright yellow crystals.
  • the yellow solid was identified as the desired compound (wet with a little toluene and methanol) by 1-H nmr and then further purified by train sublimation prior to device evaluation.
  • 0.25 g of the 9,10-dibromo-2,6-di-(1-adamantyl)-anthracene (0.42 mM) (see Example 6 above) and 0.3 g (1 mM) amine 5 were mixed in 10 mL toluene in a nitrogen glove box.
  • 0.04 g Pd 2 DBA 3 (0.04 mM), 0.017 g tri-t-butylphosphine (0.08 mM) and 0.1 g t-BuONa (1 mM) were mixed and dissolved into 10 mL toluene. Then two solutions were mixed and heated in the glove box at 80° C. for 1 hr then warmed gently ( ⁇ 50° C.) under nitrogen overnight.
  • the mixed solution is immediately dark purple but on reaching 80° C. it becomes dark yellow-brown.
  • the solution was cooled, removed from the glove box and filtered through an alumina plug eluting with methylene chloride. TLC of the deep yellow filtrate shows a bright green photoluminescent spot. Further purification on FLORISIL and then neutral alumina eluting with methylene chloride collected a bright yellow solution (with visible green photoluminescence in room light) which crystallized on addition of methanol and standing o/n. Final recrystallization from toluene by addition of methanol yielded ⁇ 0.24 g bright yellow crystals. The yellow solid was identified as the desired compound (wet with a little toluene and methanol) by 1-H nmr and then further purified by train sublimation prior to device evaluation.
  • This example demonstrates the preparation of hole transport material HT1.
  • the mixture was diluted with 500 mL THF and filtered through a plug of silica and celite and the volatiles were removed from the filtrate under reduced pressure.
  • the yellow oil was purified by flash column chromatography on silica gel using hexanes as eluent.
  • the product was obtained as a white solid in 80.0% yield (19.8 g).
  • the structure was confirmed by 1-H nmr analysis.
  • the dark brown oil obtained was purified by flash column chromatography on silica gel using a mixture of 1:10 ethyl acetate:hexanes as eluent.
  • the product was obtained as a pale yellow powder in 50.2% yield (6.8 g).
  • the structure was confirmed by 1-H nmr analysis.
  • the resulting reaction mixture was diluted with 1 L toluene and 1 L THF filtered through a plug of silica and celite to remove the insoluble salts.
  • the resulting brown oil was purified by flash column chromatography on silica gel using a mixture of 1:10 dichloromethane:hexanes as eluent. After drying a yellow powder was obtained (4.8 g, 84.8%). The structure was confirmed by 1-H nmr analysis.
  • This example demonstrates the preparation of host material H1.
  • Compound 12-22 was synthesized following the procedure in US application publication 2005/0245752.
  • reaction mixture was purged with nitrogen and degassed water was added by syringe.
  • a condenser was equipped and the reaction was refluxed for 15 hours. TLC was performed indicating the reaction was complete.
  • the reaction mixture was cooled to room temperature.
  • the organic layer was separated and the aqueous layer was extracted with DCM.
  • the organic fractions were combined and the solvent was removed under reduced pressure to give a viscous oil.
  • the crude material was purified by column chromatography using silica gel and 10% DCM/Hexanes. Solvent removal gave 20 grams (85% yield) of a clear, viscous oil. The product was confirmed by 1-H nmr analysis.
  • reaction mixture was purged with nitrogen and degassed water was added by syringe. A condenser was equipped and the reaction was refluxed for 72 hours. LC-MS was performed indicating the reaction was complete.
  • the reaction mixture was cooled to room temperature. The organic layer was separated and the aqueous layer was extracted with DCM. The organic fractions were combined and the solvent was removed under reduced pressure to give a grey solid.
  • the crude material was purified by column chromatography using silica gel and DCM/Hexanes. Solvent removal gave 1 gram (76% yield) as a white solid. Host H1 was purified using both solution and vapor sublimation techniques.
  • This example illustrates the preparation of host H2.
  • Host material H2 was synthesized in an analogous manner to H1 following the Scheme below.
  • the yellow solid was dissolved in THF, passed through FLOROSIL column with THF/hexane (1:1), concentrated under vacuum to yield 10 g light yellow solid which was purified by 3-zone (250 C, 210 C, 170 C) sublimation for 70 hours. 5.6 g pale yellow solid was recovered.
  • the devices were constructed as follows:
  • ITO Indium Tin Oxide
  • buffer layer Buffer 25 nm
  • the material was prepared using a procedure similar to that described in Example 1 of published U.S. patent application no. 2005/0205860.
  • hole transport layer polymer HT1 (20 nm)
  • photoactive layer 13:1 host:dopant (48 nm)
  • cathode LiF/Al (0.5/100 nm)
  • OLED devices were fabricated by a combination of solution processing and thermal evaporation techniques.
  • Patterned indium tin oxide (ITO) coated glass substrates from Thin Film Devices, Inc were used. These ITO substrates are based on Corning 1737 glass coated with ITO having a sheet resistance of 30 ohms/square and 80% light transmission.
  • the patterned ITO substrates were cleaned ultrasonically in aqueous detergent solution and rinsed with distilled water.
  • the patterned ITO was subsequently cleaned ultrasonically in acetone, rinsed with isopropanol, and dried in a stream of nitrogen.
  • ITO substrates were treated with UV ozone for 10 minutes.
  • an aqueous dispersion of Buffer 1 was spin-coated over the ITO surface and heated to remove solvent.
  • the substrates were then spin-coated with a solution of a hole transport material, and then heated to remove solvent.
  • the substrates were spin-coated with the emissive layer solution, and heated to remove solvent.
  • the substrates were masked and placed in a vacuum chamber. An electron transport layer was deposited by thermal evaporation, followed by a layer of LiF. Masks were then changed in vacuo and a layer of Al was deposited by thermal evaporation. The chamber was vented, and the devices were encapsulated using a glass lid, dessicant, and UV curable epoxy.
  • the OLED samples were characterized by measuring their (1) current-voltage (I-V) curves, (2) electroluminescence radiance versus voltage, and (3) electroluminescence spectra versus voltage. All three measurements were performed at the same time and controlled by a computer.
  • the current efficiency of the device at a certain voltage is determined by dividing the electroluminescence radiance of the LED by the current density needed to run the device.
  • the unit is a cd/A.
  • the power efficiency is the current efficiency divided by the operating voltage.
  • the unit is Im/W.
  • the materials used are given in Table 3.
  • the device results are given in Table 4.
  • a control dopant was used.
  • control dopant 2-t-butyl-N,N,N′,N′-tetra-p-tolyl-anthracene-9,10-diamine
  • AlQ tris(8-hydroxyquinolato)aluminum

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