US20070209973A1 - Sluice System For A Vaccum Facility - Google Patents

Sluice System For A Vaccum Facility Download PDF

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Publication number
US20070209973A1
US20070209973A1 US10/574,368 US57436804A US2007209973A1 US 20070209973 A1 US20070209973 A1 US 20070209973A1 US 57436804 A US57436804 A US 57436804A US 2007209973 A1 US2007209973 A1 US 2007209973A1
Authority
US
United States
Prior art keywords
pump
prevacuum
sluice
vacuum
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/574,368
Other languages
English (en)
Inventor
Olaf Gawer
Jens Melcher
Dietmar Schulze
Hans-Christian Hecht
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Von Ardenne Anlagentechnik GmbH
Original Assignee
Von Ardenne Anlagentechnik GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Von Ardenne Anlagentechnik GmbH filed Critical Von Ardenne Anlagentechnik GmbH
Assigned to VON ARDENNE ANLAGENTECHNIK GMBH reassignment VON ARDENNE ANLAGENTECHNIK GMBH ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MELCHER, JENS, GAWER, OLAF, HECHT, HANS-CHRISTIAN, SCHULZE, DIETMAR
Publication of US20070209973A1 publication Critical patent/US20070209973A1/en
Abandoned legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C23C14/566Means for minimising impurities in the coating chamber such as dust, moisture, residual gases using a load-lock chamber
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00Fluid handling
    • Y10T137/8593Systems
    • Y10T137/85978With pump
    • Y10T137/86131Plural

Definitions

  • the invention relates to a sluice system for a vacuum coating facility for coating substrates that can be moved through the vacuum coating in a direction of conveyance.
  • the said sluice comprises a prevacuum sluice chamber and a transfer chamber adjoining a coating chamber, wherein a fine vacuum can be regulated before the transfer chamber on the input side in the direction of conveyance and after the transfer device on the output side in the direction of conveyance.
  • Sluice systems for vacuum coating facilities of this type are primarily used in industrial applications in in-line large-area coating facilities typically for flat glass substrates.
  • the usual structure of the sluice system incorporated on both sides of the coating chamber is shown in a diagram of a through-feed sluice system for coating architectural glass in “Vakummtechnik-Grundlagen und füren”, Pupp/Hartmann, Carl Hanser Verlag, page 426.
  • the sluice system normally consists of a prevacuum sluice chamber, a fine vacuum sluice chamber and a transfer chamber. If necessary, further fine vacuum sluice chambers with process-preparing and pressure-stabilizing functions are arranged in-line between the prevacuum sluice chamber and the transfer chamber.
  • a prevacuum pressure of approx. 10 ⁇ 2 bar is generated in the prevacuum sluice chamber on the input side, in which the substrates are fed to the vacuum coating facility, and analogously in the prevacuum sluice chamber on the output side.
  • the fine vacuum sluice chamber serves as a further pressure stage and pressure buffer for pressure stabilization.
  • An intermediate vacuum with a pressure which is between the prevacuum pressure and the high-vacuum pressure, but close to that of the process vacuum pressure of the coating chambers, of approximately 10 ⁇ 3 bar is generated here.
  • one or more pump systems with a power corresponding to the construction of the prevacuum pump system are connected to the fine vacuum sluice chamber.
  • the substrates are prepared for transfer to the first coating chamber or guided out of the last coating chamber in the transfer chamber which adjoins the first and last coating chamber in the direction of conveyance respectively.
  • a fine pressure vacuum is maintained there, which has attained the actual process vacuum pressure of approx. 10 ⁇ 4 bar to 10 ⁇ 5 bar.
  • turbo-molecular pumps connected in parallel are normally connected to the transfer chamber to which a backing pump or a Roots pump combined with a backing pump are connected upstream. All sluice chambers of the sluice system are separated through vacuum technology among each other as well as on the atmosphere side and process side.
  • the cycle times are determined by evacuation times, coating times and non-productive times, that is times for transport of the substrate through the sluice chamber and the sluice valve opening and closing times.
  • the non-productive times take up a considerable part of this and restrict a reduction of the cycle times as the evacuation times and coating times cannot be reduced further owing to physical constraints.
  • a reduction of the sluice cycle times typically results from the arrangement of a prevacuum sluice chamber and a transfer chamber with several pressure stages, as known from DE 198 08 163 C1.
  • the chamber volume of the transfer chamber is divided into several buffer sections via special flow elements, with the result that a pressure decoupling of the process area from the prevacuum sluice chamber is enabled.
  • a stabilization of the pressure gradients is achieved between the prevacuum sluice chamber and the process chamber such that the further intermediate vacuum chambers with their sluice valves are rendered superfluous.
  • the activation times for the sluice valves no longer apply.
  • the drawback to this solution is that this transfer chamber requires a high level of constructional technology and expense and occupies considerable space.
  • the task of the invention involves designing the sluice system of the vacuum coating facility in such a way that the total cycle time of the sluice system is reduced while, at the same time, the constructional and system technology and expense is reduced.
  • the task was solved in such way that the prevacuum sluice chamber directly adjoins the transfer chamber and the fine vacuum can be regulated in the prevacuum sluice chamber.
  • a separate fine vacuum sluice chamber is no longer necessary in the sense of the present invention.
  • the fine vacuum in a fine vacuum pressure stage which comes very close to the process vacuum pressure is generated directly in the prevacuum sluice chamber.
  • This is realized by a pump system extension to the usual prevacuum pump system in the combination corresponding to the invention with turbo-molecular pumps whose use for evacuation of the prevacuum sluice chamber has so far not been possible technically.
  • a turbo-molecular pump could only be used above an absolute pressure of approx.
  • turbo-molecular pumps these become more pressure compatible, with the result that they can be used at an absolute pressure of 10 ⁇ 2 bar. This now enables a connection of the turbo-molecular pumps above a chamber pressure of the prevacuum sluice chamber of approx. 10 ⁇ 2 bar, which is provided by the prevacuum pump system.
  • the omission of the entire fine vacuum sluice chamber also does away with the need for its sluice valves, which leads to a saving of the valve opening and closing times of the fine vacuum sluice chamber and reduces the idle times of the substrate.
  • the total cycle time of the sluice system is therefore advantageously reduced. At the same time, there is no longer a need for structural space for the fine vacuum sluice chamber on both sides of the vacuum coating chamber.
  • a prevacuum pump system and a fine vacuum pump system can each be connected to the prevacuum sluice chamber.
  • the normal prevacuum pump system for generating the prevacuum and the fine vacuum pump system for generating the fine vacuum are connected in parallel to the prevacuum sluice chamber by means of adjustable regulating valves and realize a pressure cascade in a sequential operating mode until a fine vacuum pressure stage is achieved in the prevacuum sluice chamber which comes very close to the process vacuum pressure.
  • the prevacuum pump system is initially operated whereby the fine vacuum pump system is operated in parallel in a stand-by circuit until its operational use against the regulating valve closed in the prevacuum sluice chamber.
  • the backing pump of the fine vacuum pump system generates a support vacuum with low power in the connection network of this pump system under which the main pump can operate.
  • the backing pump only reaches its full power on connection of the fine vacuum pump system to the prevacuum sluice chamber for creating the requisite high-vacuum pressure.
  • the said pump systems can therefore be reused for the prevacuum sluice chamber and the fine vacuum chamber with little control technology expense.
  • An advantageous embodiment of the invention results from the fact that the prevacuum pump system can be connected to the fine vacuum pump system.
  • a connection on the medium side beside the direct connection line of the two pump systems operated in parallel makes it possible to use components of the prevacuum pump system for operation of the fine vacuum pump system and vice versa. This can be useful, for instance, if a pump of a pump system develops a fault. Pumps of the parallel pump system can be connected immediately as replacements.
  • the pressure side of a main pump of the fine vacuum pump system is connected to the intake side of a support pump and the pressure side of the main pump of the fine vacuum pump system can be connected to the intake side of a main pump of the prevacuum system via a connecting line with regulating valve.
  • the prevacuum pump system is used as a backing pump of the fine vacuum pump system.
  • the prevacuum is regulated via the operation of the prevacuum pump systems 6 .
  • the regulating valves of the fine vacuum system 16 and the regulating valve of the connection line 18 are closed.
  • the turbo-molecular pumps 13 are already operated in a stand-by stage.
  • the turbo-molecular pumps 13 require a long startup time of up to 15 minutes corresponding to their design.
  • turbo-molecular pumps 13 are therefore run in permanent operation, whereby the support pump 15 connected upstream of the turbo-molecular pumps 13 generates a vacuum support pressure of approx. 10 ⁇ 5 bar for the turbo-molecular pumps 13 in standby mode with closed regulating valves 11 , 16 .
  • the intake volume to be pumped approaches zero for this, only a low power is necessary for the support pump 15 to attain the vacuum support pressure. If a volume of approx. 10 ⁇ 2 bar is attained in the prevacuum sluice chamber, the regulating valves of the connecting line 18 are opened.
  • the turbo-molecular pumps 13 now evacuate in their work mode stage from the prevacuum sluice chamber 2 , whereby the prevacuum pump system 6 connected via the connection line 17 is now operated in its function as a prevacuum pump of the fine vacuum pump system 12 and a separate efficient backing pump is saved for the turbo-molecular pumps 13 .
  • the fine vacuum close to the process vacuum pressure of approximately 10 ⁇ 4 bar to 10 ⁇ 5 bar is generated directly after the prevacuum sluice chamber generation in the prevacuum sluice chamber 2 , without the substrate having to pass further sluice chambers. The entire sluice contact until attainment of the fine vacuum is therefore reduced to approximately 60 seconds.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Positive Displacement Air Blowers (AREA)
US10/574,368 2003-10-15 2004-10-12 Sluice System For A Vaccum Facility Abandoned US20070209973A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2003148639 DE10348639B4 (de) 2003-10-15 2003-10-15 Schleusensystem für eine Vakuumanlage
DE10348639.9 2003-10-15
PCT/DE2004/002265 WO2005040452A1 (de) 2003-10-15 2004-10-12 Schleusensystem für eine vakuumanlage

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2004/002265 A-371-Of-International WO2005040452A1 (de) 2003-10-15 2004-10-12 Schleusensystem für eine vakuumanlage

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/753,175 Continuation US8136549B2 (en) 2003-10-15 2010-04-02 Sluice system for a vacuum facility

Publications (1)

Publication Number Publication Date
US20070209973A1 true US20070209973A1 (en) 2007-09-13

Family

ID=34442124

Family Applications (2)

Application Number Title Priority Date Filing Date
US10/574,368 Abandoned US20070209973A1 (en) 2003-10-15 2004-10-12 Sluice System For A Vaccum Facility
US12/753,175 Expired - Fee Related US8136549B2 (en) 2003-10-15 2010-04-02 Sluice system for a vacuum facility

Family Applications After (1)

Application Number Title Priority Date Filing Date
US12/753,175 Expired - Fee Related US8136549B2 (en) 2003-10-15 2010-04-02 Sluice system for a vacuum facility

Country Status (4)

Country Link
US (2) US20070209973A1 (ja)
JP (1) JP4879746B2 (ja)
DE (1) DE10348639B4 (ja)
WO (1) WO2005040452A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100206407A1 (en) * 2003-10-15 2010-08-19 Von Ardenne Anlagentechnik Gmbh Sluice system for a vacuum facility
CN108486543A (zh) * 2018-03-02 2018-09-04 惠科股份有限公司 基板成膜机台及使用方法

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005024180B4 (de) * 2005-05-23 2009-11-19 Von Ardenne Anlagentechnik Gmbh Transferkammer und Vakuumbeschichtungsanlage
DE112008000006A5 (de) * 2007-06-22 2009-05-14 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zum Schleusen eines Substrats in eine und aus einer Vakuumbeschichtungsanlage
DE112008001620B4 (de) * 2007-07-03 2021-08-26 VON ARDENNE Asset GmbH & Co. KG Verfahren und Vorrichtung zum Schleusen überlanger Substrate in einer Vakuumbeschichtungsanlage, Vakuumbeschichtungsanlage und Verfahren zu deren Betrieb
DE102011015464B4 (de) 2010-11-30 2012-09-06 Von Ardenne Anlagentechnik Gmbh Vakuumpumpeinrichtung und -verfahren für staubhaltige Gase
DE102011011279A1 (de) 2011-02-15 2012-08-16 Von Ardenne Anlagentechnik Gmbh Apparatur zur Leitung des Gasstromes beim Belüften innerhalb eines Vakuumgehäuses
DE102012105951A1 (de) * 2012-03-30 2013-10-02 Pfeiffer Vacuum Gmbh Pumpensystem zur Evakuierung von Gas aus einer Mehrzahl von Kammern sowie Verfahren zur Steuerung des Pumpensystems
DE102012009416B4 (de) 2012-05-11 2023-07-20 VON ARDENNE Asset GmbH & Co. KG Vakuumpumpeinrichtung und -verfahren für staubhaltige Gase
DE102013205709B4 (de) * 2013-03-28 2017-03-09 Von Ardenne Gmbh Schleusenverfahren und Vakuumsubstratbehandlungsanlage
DE102014107636B4 (de) * 2014-05-30 2024-01-04 VON ARDENNE Asset GmbH & Co. KG Vakuumprozessieranlage
MX2017010439A (es) * 2015-02-13 2018-01-23 Buehler Alzenau Gmbh Metodo para operar un sistema de recubrimiento en linea y sistema de recubrimiento en linea.
DE102015013799A1 (de) 2015-10-26 2017-04-27 Grenzebach Maschinenbau Gmbh Vorrichtung und Verfahren zum Beschichten überlanger flächenhafter Substrate, insbesondere Glasscheiben, in einer Vakuum-Beschichtungsanlage
GB2579360A (en) * 2018-11-28 2020-06-24 Edwards Ltd Multiple chamber vacuum exhaust system

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2931561A (en) * 1955-11-12 1960-04-05 Heraeus Gmbh W C Vacuum pumps
US4956196A (en) * 1987-09-21 1990-09-11 Leybold Aktiengesellschaft Method for producing a corrosion-resistant coating on the surface of lacquered workpieces
US5228838A (en) * 1992-04-27 1993-07-20 Leybold Aktiengesellschaft Method for the evacuation of a low-vacuum chamber and of a HGH-vacuum chamber, as well as a high-vacuum apparatus for the practice thereof
US5254169A (en) * 1992-03-10 1993-10-19 Leybold Aktiengesellschaft High-vacuum coating apparatus
US5538610A (en) * 1994-08-09 1996-07-23 Leybold Aktiengesellschaft Vacuum coating system
US5703281A (en) * 1996-05-08 1997-12-30 Southeastern Univ. Research Assn. Ultra high vacuum pumping system and high sensitivity helium leak detector
US5782402A (en) * 1994-09-14 1998-07-21 Emitec Gesellschaft Fuer Emissionstechnologie Mbh Method for producing a metal structure and apparatus for metallic joining of sheet-metal layers of a metal structure
US5827409A (en) * 1995-07-03 1998-10-27 Anelva Corporation Method and apparatus for forming thin film for liquid crystal display
US6503379B1 (en) * 2000-05-22 2003-01-07 Basic Research, Inc. Mobile plating system and method

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JPS5961831A (ja) * 1982-10-01 1984-04-09 Hitachi Ltd 浮き彫り構造体を製造する方法
JPH01240644A (ja) * 1988-03-18 1989-09-26 Hitachi Koki Co Ltd アモルファスシリコン膜製造装置
JPH01276554A (ja) * 1988-04-28 1989-11-07 Teru Barian Kk 半導体製造装置
JPH04326943A (ja) 1991-04-25 1992-11-16 Hitachi Ltd 真空排気システム及び排気方法
JPH0783827B2 (ja) * 1991-08-30 1995-09-13 日電アネルバ株式会社 真空装置
JPH0633231A (ja) * 1992-07-20 1994-02-08 Hitachi Sci Syst:Kk イオンスパッタリング装置
DE10348639B4 (de) * 2003-10-15 2009-08-27 Von Ardenne Anlagentechnik Gmbh Schleusensystem für eine Vakuumanlage

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2931561A (en) * 1955-11-12 1960-04-05 Heraeus Gmbh W C Vacuum pumps
US4956196A (en) * 1987-09-21 1990-09-11 Leybold Aktiengesellschaft Method for producing a corrosion-resistant coating on the surface of lacquered workpieces
US5254169A (en) * 1992-03-10 1993-10-19 Leybold Aktiengesellschaft High-vacuum coating apparatus
US5228838A (en) * 1992-04-27 1993-07-20 Leybold Aktiengesellschaft Method for the evacuation of a low-vacuum chamber and of a HGH-vacuum chamber, as well as a high-vacuum apparatus for the practice thereof
US5538610A (en) * 1994-08-09 1996-07-23 Leybold Aktiengesellschaft Vacuum coating system
US5782402A (en) * 1994-09-14 1998-07-21 Emitec Gesellschaft Fuer Emissionstechnologie Mbh Method for producing a metal structure and apparatus for metallic joining of sheet-metal layers of a metal structure
US5827409A (en) * 1995-07-03 1998-10-27 Anelva Corporation Method and apparatus for forming thin film for liquid crystal display
US5703281A (en) * 1996-05-08 1997-12-30 Southeastern Univ. Research Assn. Ultra high vacuum pumping system and high sensitivity helium leak detector
US6503379B1 (en) * 2000-05-22 2003-01-07 Basic Research, Inc. Mobile plating system and method

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20100206407A1 (en) * 2003-10-15 2010-08-19 Von Ardenne Anlagentechnik Gmbh Sluice system for a vacuum facility
US8136549B2 (en) * 2003-10-15 2012-03-20 Von Ardenne Anlagentechnik Gmbh Sluice system for a vacuum facility
CN108486543A (zh) * 2018-03-02 2018-09-04 惠科股份有限公司 基板成膜机台及使用方法
US11466363B2 (en) 2018-03-02 2022-10-11 HKC Corporation Limited Substrate film forming machine table and usage method

Also Published As

Publication number Publication date
WO2005040452A1 (de) 2005-05-06
DE10348639B4 (de) 2009-08-27
DE10348639A1 (de) 2005-05-19
JP2007533844A (ja) 2007-11-22
US8136549B2 (en) 2012-03-20
WO2005040452B1 (de) 2005-07-07
US20100206407A1 (en) 2010-08-19
JP4879746B2 (ja) 2012-02-22

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AS Assignment

Owner name: VON ARDENNE ANLAGENTECHNIK GMBH, GERMANY

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:GAWER, OLAF;MELCHER, JENS;SCHULZE, DIETMAR;AND OTHERS;REEL/FRAME:018496/0639;SIGNING DATES FROM 20060912 TO 20061101

STCB Information on status: application discontinuation

Free format text: EXPRESSLY ABANDONED -- DURING EXAMINATION