US20040112736A1 - Arc evaporator with a poweful magnetic guide for targets having a large surface area - Google Patents

Arc evaporator with a poweful magnetic guide for targets having a large surface area Download PDF

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Publication number
US20040112736A1
US20040112736A1 US10/472,575 US47257503A US2004112736A1 US 20040112736 A1 US20040112736 A1 US 20040112736A1 US 47257503 A US47257503 A US 47257503A US 2004112736 A1 US2004112736 A1 US 2004112736A1
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US
United States
Prior art keywords
target
magnetic
evaporator
arc
surface area
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
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US10/472,575
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English (en)
Inventor
Josu Larrinaga
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Fundacion Tekniker
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Fundacion Tekniker
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Assigned to FUNDACION TEKNIKER reassignment FUNDACION TEKNIKER ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: LARRINAGA, JOSU GOIKOETXEA
Publication of US20040112736A1 publication Critical patent/US20040112736A1/en
Priority to US11/473,440 priority Critical patent/US7828946B2/en
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32614—Consumable cathodes for arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means

Definitions

  • the present invention relates to an arc evaporator, that is a machine intended to evaporate a material, an electrical conductor, so that said material, in vapour form, can be displaced within a vacuum medium in order to be deposited on the surface of the piece to be clad.
  • the object of the invention is to obtain an arc evaporator which, including a powerful magnetic guide, permits the cathodic point of the arc to be guided in an infinity of different trajectories, capable of being individually selected and which encompass the whole surface area of the target, for the purpose of achieving uniform use thereof.
  • the powerful magnetic guide causes a strangulation or narrowing of the cathodic point, which increases the temperature and ionisation of the emitted material, facilitating the obtaining of good quality coatings.
  • the powerful magnetic guide contributes to increased reliability of the arc evaporator, by making it impossible for the arc to be displaced accidentally to a different point of the evaporation surface area.
  • arc evaporators are machines for evaporating a material, an electrical conductor, and emit it inside a vacuum bell jar in form of a vapour which can be displaced through the interior thereof.
  • the material to be evaporated is in plate form, one of the faces of which is cooled by water and the other is directed toward the interior of the vacuum bell jar, in a position facing the piece on which it is desired to deposit the emitted vapours, the evaporation of the material being caused by provoking a direct current electric arc, of approximately 22 volts and 80 amperes, between a cooled electrode which acts as anode and the conductive plate which it is of interest to evaporate and which acts as cathode, a small quantity of gas necessary for maintaining the arc being habitually introduced additionally in the vacuum chamber.
  • the electric arc acts on the surface of the plate to be evaporated in a concentrated manner on a single point, the cathodic point which is randomly displaced over the external surface area of the plate, which produces a not very homogeneous consumption of the plate, or what is the same thing, good use is not made of the constituent material of said plate, the cost of which is very high.
  • U.S. Pat. No. 4,673,477 describes a magnetic guide which employs a permanent magnet which is displaced, by mechanical means, in the rear part of the plate to be evaporated, in such a way that the variable magnetic field which this permanent magnet generates produces a guidance of the electric arc on the cathode.
  • This machine also incorporates optionally a magnetic winding which surrounds the cathode plate for the purpose of strengthening or weakening the force of the magnetic field in a direction perpendicular to the active surface area of the cathode so improving the guidance of the electrode.
  • the problem which this machine has, is that the magnetic system of moveable permanent magnets is very complex mechanically and therefore susceptible to breakdown.
  • U.S. Pat. No. 4,724,058 relates to a magnetic guide which incorporates some coils placed in the rear part of the cathode plate, which guide the electric arc in a single direction parallel to that which the coil follows.
  • methods are used which endeavour to weaken the guidance effect of the magnetic field so that upon the latter a random component is superimposed.
  • the magnetic field generated by the coil is connected and disconnected so that most of the time the arc is displaced on the cathode in a random manner, and a very small part is guided by the magnetic field.
  • the problem with this machine is that, finally, the guidance takes place during a very short time and the rest is random whereby precise and efficient control of the consumption of the cathode plate cannot be guaranteed.
  • U.S. Pat. No. 5,861,088 describes a magnetic guide which includes a permanent magnet located in the centre of the target and in the rear face thereof, and a coil which surrounds the aforementioned permanent magnet, the assembly constituting a magnetic field concentrator.
  • the system is completed with a second coil placed on the exterior of the evaporator.
  • the problem with this machine is that the magnetic field generated is weak and therefore also the guidance which it effects on the electric arc.
  • U.S. Pat. No. 5,298,136 describes a magnetic guide for thick targets in circular evaporators, which comprises two coils and a magnetic piece of special configuration which adapts to the edges of the target to be evaporated, in such a way that the whole works with a single magnetic element, with two magnetic poles.
  • this configuration allows displacement of the track of the arc to a certain degree, it is not capable of displacing the track thereof up to the external edge of the target or a small distance therefrom for which in order to make efficient use of the material of the cathode, the guide has to be sufficiently weak to allow a random component to be superimposed on the movement forced magnetically.
  • said evaporator centres its characteristics in that its magnetic guide is formed by two independent magnetic systems, that is, by four magnetic poles, which allows juggling with the magnetic intensity values of both systems and managing cancellation of the perpendicular component of the resultant magnetic field at the desired point of the surface area of the target, thereby achieving the guidance of the arc according to whatever track, from the centre of the target to its outer edges.
  • the two magnetic systems which constitute the guide can be a system of very powerful permanent magnets and a system of electromagnets, also very powerful, which guarantee a very high magnetic intensity and therefore good control over the electric arc but, at the same time it is possible to act on the electromagnets varying their intensity, which produces a change in the track of the arc over the target. Therefore, with this system one obtains a strong magnetic guide which also allows variation, and therefore control, of the trajectories of the arc on the target achieving in this way uniform consumption of the whole surface area thereof.
  • FIG. 1 shows a schematic representation in cross-section of a rectangular arc evaporator with powerful magnetic guide embodied in accordance with the object of the present invention.
  • FIG. 2 shows, also according to a schematic representation, a plan view of the evaporator of the previous figure.
  • FIGS. 3, 4 and 5 reproduce the cross-section of FIG. 1, to which in FIG. 3 a graph has been added of the vertical component of the magnetic field created by the externally located permanent magnets, in FIG. 4 a similar graph but corresponding to the magnetic fields created by the electromagnet located in the rear part of the target when different electric currents are applied in the electromagnet and in FIG. 5 the magnetic fields created by the permanent magnets located on the exterior of the evaporator plus the electromagnet located in the rear part of the target, likewise when different electric currents are applied in the electromagnet.
  • FIG. 6 shows a similar cross-section to that of FIG. 1, according to a variant of embodiment in which the form of the electromagnet permeable material has been altered.
  • FIG. 7 shows, finally, another cross-section similar to that of FIG. 1 but corresponding to another variant of embodiment of the invention wherein the permanent magnets on the exterior of the evaporator are each replaced by an electromagnet.
  • a magnetic guide comprising two independent magnetic systems, a first magnetic system formed by a group of permanent magnets ( 3 ) located on the periphery of the evaporator and so that their magnetization is perpendicular to the surface of the target, and a second magnetic system constituted by a single electromagnet ( 4 - 5 ) located in the rear part of the target, at a certain distance from the latter, the magnetic pole nearest to target ( 2 ) being parallel to the surface of the aforementioned target.
  • the electromagnet ( 4 - 5 ) located in the rear part of target ( 2 ) consists of a core ( 4 ) of a material of high magnetic permeability and scant coercive force, such as wrought iron, surrounded by an electric coil ( 5 ) which serves to generate the magnetic flux necessary to magnetize the wrought iron, said core ( 4 ) having a rectangular cross-section, shown in FIG. 1, with the two magnetic poles arranged parallel to the surface of target ( 2 ).
  • electromagnet ( 4 - 5 ) is housed and perfectly fitted within body ( 6 ) of the evaporator, which has the form of a species of trough to the mouth of which is coupled cathode or target ( 2 ) which is secured with the collaboration of screws, not shown, electromagnet ( 4 - 5 ) being located below the target and at a certain distance from the latter to guarantee that the magnetic field is sufficiently homogeneous on the surface area of the target, a chamber ( 11 ) being defined in this way between target ( 2 ) and electromagnet ( 4 - 5 ) which can be used to emplace the systems necessary to assure appropriate cooling of target ( 2 ), as well as the rest of the components of the evaporator.
  • the height of this cold chamber is determined by the need to have a certain distance between the upper face of the ferromagnetic core and the evaporation surface, so that the magnetic field on the latter is sufficiently uniform.
  • the assembly is completed with an external base ( 9 ), some lateral and external hangers ( 8 ) and a barrier of slats ( 13 ) which forms a frame which, as well as protecting the screws that fasten target ( 2 ) to body ( 6 ), confine the arc inside the target, so defining the evaporation surface area.
  • the insulating slats ( 13 ) are secured by appropriately electrically isolated screws ( 7 ′).
  • slats ( 13 ), hangers ( 8 ) and base ( 9 ) are obtained from materials electrically insulating at high temperature, such as alumina, vitroceramics, boron nitride or PTFE, and which form an impediment for the arc to form on undesired surfaces. These pieces require periodic maintenance since in the course of arc operation they are gradually coated with electrically conductive materials, whereby their effectiveness for avoiding the formation of the arc diminishes.
  • magnets ( 3 ) which configure the first magnetic system on the periphery of body ( 6 ) of the evaporator, at the level of target ( 2 ), are implemented in external permanent magnets ( 3 ) which have to be of reduced height and located in such a way that the centre line thereof coincides with the middle plane defined between the initial surface of target ( 2 ) and the surface which it will have at the end of its useful life, also said magnets should be of the greatest possible power, for which reason they will be of maximum width and will be obtained on a basis of materials with high coercive force, like for example SmCo, NdFeB or hard ferrites.
  • FIG. 3 a graph ( 12 ) is shown which corresponds to the vertical component of the magnetic field created by permanent magnets ( 3 ) located on the exterior of body ( 6 ) of the evaporator and at a level with the surface of target ( 2 ).
  • graphs ( 13 ) ( 14 ) and ( 15 ) shown correspond to the vertical components of the magnetic fields created by electromagnet ( 4 - 5 ) located behind the surface of target ( 2 ) inside body ( 6 ) of the evaporator, when different electric currents are applied to said electromagnet ( 4 - 5 ).
  • FIG. 5 graphs ( 16 ) ( 17 ) and ( 18 ) are shown, corresponding to the vertical components of the magnetic fields created on the surface of target ( 2 ) both by the permanent magnets located on the exterior of the evaporator on the surface of target ( 2 ) and by electromagnet ( 4 - 5 ) located in the rear part of target ( 2 ), when applying different electric currents to electromagnet ( 4 - 5 ).
  • this graph is the result of adding the magnetic field created by electromagnet ( 4 - 5 ) to the magnetic field created by permanent magnets ( 3 ) and gives as a result a vertical translation of the graph corresponding to the permanent magnets, so that now a part of this graph is situated in the positive part of the vertical axis.
  • the cathodic point follows a track over the surface of the target which is constituted by the points in which the value of the vertical component of the magnetic field is zero and thus for example if the power applied to the electromagnet be adjusted in such a way that the corresponding graph were that shown with number 16 , the track of the cathodic point over the target would pass through points 19 and 20 , whilst if the current is adjusted so that the corresponding graph was 18 , the cathodic point would pass through points 23 and 24 on the surface of the target in an intermediate track ( 17 ) the cathodic points would be 21 and 22 .
  • the magnetic core ( 4 ) can have a T-shaped section with one of its poles parallel to target ( 2 ) and the other perpendicular to the target, this configuration allowing a greater intensity to be obtained of the magnetic field on the surface of the evaporator, as well as a greater extension of the magnetic field in the horizontal plane, which allows the distance to be reduced between the upper face of ferromagnetic core ( 4 ) and target ( 2 ).
  • permanent magnets ( 3 ) could be replaced by some electromagnets ( 3 ′), of similar structure to that of electromagnets ( 4 - 5 ), as may be observed in the embodiment shown in FIG. 7.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)
US10/472,575 2001-03-27 2001-03-27 Arc evaporator with a poweful magnetic guide for targets having a large surface area Abandoned US20040112736A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US11/473,440 US7828946B2 (en) 2001-03-27 2006-06-23 Arc evaporator with a powerful magnetic guide for targets having a large surface area

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/ES2001/000119 WO2002077318A1 (es) 2001-03-27 2001-03-27 Evaporador de arco con guía magnética intensa para blancos de superficie amplia

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US11/473,440 Continuation US7828946B2 (en) 2001-03-27 2006-06-23 Arc evaporator with a powerful magnetic guide for targets having a large surface area

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US11/473,440 Expired - Fee Related US7828946B2 (en) 2001-03-27 2006-06-23 Arc evaporator with a powerful magnetic guide for targets having a large surface area

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US (2) US20040112736A1 (es)
EP (1) EP1382711B1 (es)
JP (1) JP2004523658A (es)
CN (1) CN100355933C (es)
AT (1) ATE277204T1 (es)
BR (1) BR0116951B1 (es)
DE (1) DE60105856T2 (es)
ES (1) ES2228830T3 (es)
WO (1) WO2002077318A1 (es)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060175190A1 (en) * 2002-12-19 2006-08-10 Unaxis Balzers Ltd. Vacuum arc source comprising a device for generating a magnetic field
US20090050059A1 (en) * 2005-12-16 2009-02-26 Josu Goikoetxea Larrinaga Cathode evaporation machine
US20100051445A1 (en) * 2008-09-02 2010-03-04 Vetter Joerg Coating Apparatus For The Coating Of A Substrate, As Well As A Method For The Coating Of A Substrate
US20110315544A1 (en) * 2008-12-26 2011-12-29 Fundacion Tekniker Arc evaporator and method for operating the evaporator
US20130098881A1 (en) * 2010-06-23 2013-04-25 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Arc evaporation source having fast film-forming speed, coating film manufacturing method and film formation apparatus using the arc evaporation source
US9200360B2 (en) 2009-04-28 2015-12-01 Kobe Steel, Ltd. Arc evaporation source and film forming method using the same
US20170204507A1 (en) * 2014-07-30 2017-07-20 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Arc evaporation source
US9818586B2 (en) 2012-06-20 2017-11-14 Kobe Steel, Ltd. Arc evaporation source
US10982318B2 (en) 2011-02-23 2021-04-20 Kobe Steel, Ltd. Arc evaporation source

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WO2007017528A1 (es) * 2005-08-02 2007-02-15 Fundacion Tekniker Dispositivo evaporador de arco catodico, y metodo para el encendido del arco
WO2008125397A1 (de) * 2007-04-17 2008-10-23 Sulzer Metaplas Gmbh Vakuum lichtbogenverdampfungsquelle, sowie eine lichtbogenverdampfungskammer mit einer vakuum lichtbogenverdampfungsquelle
EP2204469A4 (en) * 2007-10-31 2012-03-28 Canon Anelva Corp MAGNETRON, CATHODE MAGNETRON SPRAY APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
JP5839422B2 (ja) * 2009-04-28 2016-01-06 株式会社神戸製鋼所 成膜速度が速いアーク式蒸発源及びこのアーク式蒸発源を用いた皮膜の製造方法
JP5081315B2 (ja) * 2011-02-23 2012-11-28 株式会社神戸製鋼所 アーク式蒸発源
JP5081320B2 (ja) * 2011-02-23 2012-11-28 株式会社神戸製鋼所 アーク式蒸発源
UA101678C2 (uk) * 2011-04-08 2013-04-25 Национальный Научный Центр "Харьковский Физико-Технический Институт" Вакуумно-дуговий випарник для генерування катодної плазми
JP5081327B1 (ja) * 2011-04-25 2012-11-28 株式会社神戸製鋼所 アーク式蒸発源
US9153422B2 (en) 2011-08-02 2015-10-06 Envaerospace, Inc. Arc PVD plasma source and method of deposition of nanoimplanted coatings
CN102534513B (zh) * 2011-12-19 2014-04-16 东莞市汇成真空科技有限公司 一种组合磁场的矩形平面阴极电弧蒸发源
CN103526166B (zh) * 2013-10-25 2015-12-02 中国航空工业集团公司北京航空制造工程研究所 矩形平面阴极弧源和阴极靶材烧蚀装置
US11342168B2 (en) 2017-02-14 2022-05-24 Oerlikon Surface Solutions Ag, Pfaffikon Cathodic arc evaporation with predetermined cathode material removal
BR112020006715A2 (pt) * 2017-10-03 2020-10-06 Oerlikon Surface Solutions Ag, Pfäffikon fonte de arco com campo magnético confinado
EP3994717B1 (en) * 2019-07-03 2024-11-06 Oerlikon Surface Solutions AG, Pfäffikon Cathodic arc source
CN111139438B (zh) * 2019-12-25 2022-01-21 兰州空间技术物理研究所 一种磁路可控式真空阴极电弧离子源

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US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4839011A (en) * 1986-04-04 1989-06-13 Regents Of The University Of Minnesota Arc coating of refractory metal compounds
US4891560A (en) * 1986-09-18 1990-01-02 Kabushiki Kaisha Toshiba Magnetron plasma apparatus with concentric magnetic means
US5015493A (en) * 1987-01-11 1991-05-14 Reinar Gruen Process and apparatus for coating conducting pieces using a pulsed glow discharge
US5160595A (en) * 1987-04-19 1992-11-03 Hauzer Holding B.V. Arc-magnetron and the method of coating
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
US5421978A (en) * 1993-01-21 1995-06-06 Leybold Aktiengesellschaft Target cooling system with trough
US6413387B1 (en) * 1997-10-24 2002-07-02 Filplas Vacuum Technology Pte Ltd. Cathode arc source for metallic and dielectric coatings
US6440282B1 (en) * 1999-07-06 2002-08-27 Applied Materials, Inc. Sputtering reactor and method of using an unbalanced magnetron

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JPS62207863A (ja) * 1986-03-06 1987-09-12 Matsushita Electric Ind Co Ltd 高速スパツタリング装置
JPH02166278A (ja) * 1988-12-21 1990-06-26 Amorufuasu Denshi Device Kenkyusho:Kk マグネトロンスパッタ装置
JPH0888176A (ja) * 1994-09-16 1996-04-02 Toshiba Corp スパッタリング装置

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US4673477A (en) * 1984-03-02 1987-06-16 Regents Of The University Of Minnesota Controlled vacuum arc material deposition, method and apparatus
US4673477B1 (es) * 1984-03-02 1993-01-12 Univ Minnesota
US4839011A (en) * 1986-04-04 1989-06-13 Regents Of The University Of Minnesota Arc coating of refractory metal compounds
US4891560A (en) * 1986-09-18 1990-01-02 Kabushiki Kaisha Toshiba Magnetron plasma apparatus with concentric magnetic means
US5015493A (en) * 1987-01-11 1991-05-14 Reinar Gruen Process and apparatus for coating conducting pieces using a pulsed glow discharge
US5160595A (en) * 1987-04-19 1992-11-03 Hauzer Holding B.V. Arc-magnetron and the method of coating
US5298136A (en) * 1987-08-18 1994-03-29 Regents Of The University Of Minnesota Steered arc coating with thick targets
US5421978A (en) * 1993-01-21 1995-06-06 Leybold Aktiengesellschaft Target cooling system with trough
US6413387B1 (en) * 1997-10-24 2002-07-02 Filplas Vacuum Technology Pte Ltd. Cathode arc source for metallic and dielectric coatings
US6440282B1 (en) * 1999-07-06 2002-08-27 Applied Materials, Inc. Sputtering reactor and method of using an unbalanced magnetron

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20060175190A1 (en) * 2002-12-19 2006-08-10 Unaxis Balzers Ltd. Vacuum arc source comprising a device for generating a magnetic field
US20090050059A1 (en) * 2005-12-16 2009-02-26 Josu Goikoetxea Larrinaga Cathode evaporation machine
US20100051445A1 (en) * 2008-09-02 2010-03-04 Vetter Joerg Coating Apparatus For The Coating Of A Substrate, As Well As A Method For The Coating Of A Substrate
US20110315544A1 (en) * 2008-12-26 2011-12-29 Fundacion Tekniker Arc evaporator and method for operating the evaporator
US9200360B2 (en) 2009-04-28 2015-12-01 Kobe Steel, Ltd. Arc evaporation source and film forming method using the same
US20130098881A1 (en) * 2010-06-23 2013-04-25 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Arc evaporation source having fast film-forming speed, coating film manufacturing method and film formation apparatus using the arc evaporation source
US9266180B2 (en) * 2010-06-23 2016-02-23 Kobe Steel, Ltd. Arc evaporation source having fast film-forming speed, coating film manufacturing method and film formation apparatus using the arc evaporation source
US10982318B2 (en) 2011-02-23 2021-04-20 Kobe Steel, Ltd. Arc evaporation source
US9818586B2 (en) 2012-06-20 2017-11-14 Kobe Steel, Ltd. Arc evaporation source
US20170204507A1 (en) * 2014-07-30 2017-07-20 Kabushiki Kaisha Kobe Seiko Sho (Kobe Steel, Ltd.) Arc evaporation source
US10913997B2 (en) * 2014-07-30 2021-02-09 Kobe Steel, Ltd. Arc evaporation source

Also Published As

Publication number Publication date
BR0116951A (pt) 2004-03-09
EP1382711A1 (en) 2004-01-21
BR0116951B1 (pt) 2011-06-14
WO2002077318A1 (es) 2002-10-03
ES2228830T3 (es) 2005-04-16
CN1494603A (zh) 2004-05-05
JP2004523658A (ja) 2004-08-05
US20060237309A1 (en) 2006-10-26
CN100355933C (zh) 2007-12-19
ATE277204T1 (de) 2004-10-15
EP1382711B1 (en) 2004-09-22
US7828946B2 (en) 2010-11-09
DE60105856D1 (de) 2004-10-28
DE60105856T2 (de) 2005-10-20

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