US20020048087A1 - Optical element having antireflection film - Google Patents

Optical element having antireflection film Download PDF

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Publication number
US20020048087A1
US20020048087A1 US09/939,668 US93966801A US2002048087A1 US 20020048087 A1 US20020048087 A1 US 20020048087A1 US 93966801 A US93966801 A US 93966801A US 2002048087 A1 US2002048087 A1 US 2002048087A1
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layer
sio
optical element
group
tio
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Takeshi Mitsuishi
Kenichi Shinde
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Hoya Corp
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Hoya Corp
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Publication of US20020048087A1 publication Critical patent/US20020048087A1/en
Priority to US10/370,091 priority Critical patent/US6693747B2/en
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers

Definitions

  • the present invention relates to an optical element having an antireflection film. It relates to an optical element having an antireflection film that has excellent adhesiveness between a plastic substrate and the antireflection film, abrasion resistance, heat resistance, alkali resistance and impact resistance.
  • optical elements having an antireflection film provided on a plastic substrate are also known.
  • optical elements having a thin metal film layer provided on the surface of a plastic substrate for enhancing the adhesiveness between the plastic substrate and the antireflection film.
  • Japanese Patent Laid-Open No. 186202/1987 discloses an antireflection film for an optical element having a thin metal film layer provided on the surface of a plastic substrate, in which the metal layer is made of a metal selected from the group consisting of copper (Cu), aluminum (Al), nickel (Ni), gold (Au), chromium (Cr), palladium (Pd) and tin (Sn).
  • optical elements having an antireflection film are unsatisfactory with respect to their heat resistance and impact resistance. Therefore, it is desirable to provide optical elements having an antireflection film that have improved physical properties such as heat resistance, abrasion resistance, alkali resistance and impact resistance.
  • a basic layer made of SiO 2 has been provided in a plastic lens for enhancing the strength of coating films.
  • the basic layer made of SiO 2 has a drawback of lowering the heat resistance of the plastic lens.
  • the present invention provides an optical element having an antireflection film having excellent adhesiveness between a plastic substrate and the antireflection film, heat resistance, abrasion resistance, alkali resistance and impact resistance.
  • the present invention addresses the problems noted above.
  • the inventors have determined that when a layer made of niobium (Nb) is provided between a plastic substrate and an antireflection film to form an optical element, the adhesiveness between the plastic substrate and the antireflection film, the heat resistance, abrasive resistance, alkali resistance and the impact resistance of the optical element are improved.
  • Nb niobium
  • the optical element of the invention has a basic layer made of Nb, and therefore, has not only excellent adhesiveness between the plastic substrate and the antireflection film, heat resistance and impact resistance, but also excellent alkali and abrasion resistance and properties such that an absorbance index inherent to metals is low.
  • the basic layer may consist of Nb (that is 100% by weight of Nb), or may comprise a mixture of niobium and up to 50% by weight, preferably 25% by weight of other elements such as aluminum(Al), chromium(Cr), tantalum(Ta) and mixtures of two or more thereof.
  • the antireflection film may also be comprised of multi-layers, and at least one of the layers is obtainable by an ion-assisted process.
  • the basic layer comprising Nb may also be formed by an ion-assisted process.
  • the “ion-assisted process” referred to herein is a well known process also called “ion beam assisted vapor deposition process”.
  • a material is deposited on a substrate, such as a lens substrate, by vapor deposition using an ion plasma in a gas atmosphere, such as argon (Ar) and/or oxygen.
  • a gas atmosphere such as argon (Ar) and/or oxygen.
  • preferred vapor deposition conditions are an accelerating voltage of 100-250V, and an accelerating current of 50-150 mA.
  • a detailed description is given in e.g. U.S. Pat. No. 5,268,781. Further details can be derived from M. Fliedner et al., Society of Vacuum Coaters, Albuquerque, N.M., USA. p237-241, 1995 as well as from the references cited therein.
  • argon Ar
  • oxygen and nitrogen ionizing gases
  • the plastic substrate may be subjected to ion gun pretreatment before the basic layer is formed thereon.
  • the ionizing gas in the ion gun pretreatment may be any of oxygen, nitrogen, Ar, or mixtures thereof.
  • the accelerating voltage is from 50 V to 200 V, and the accelerating current is from 50 mA to 150 mA. If the accelerating voltage is lower than 50 V, or the accelerating current is lower than 50 mA, an effect for improving the adhesiveness between the plastic substrate and the basic layer formed thereon may not be sufficient.
  • the plastic substrate and also the cured film and the hard coat layer thereon may possibly be yellowed, or the abrasion resistance of the optical element may possibly be lowered.
  • an antireflection layer is formed by any suitable process.
  • it may be formed by vapor deposition, such as chemical vapor deposition (CVD) or physical vapor deposition (PVD), or by other methods such as ion plating vapor deposition.
  • CVD chemical vapor deposition
  • PVD physical vapor deposition
  • the antireflection film has at least one SiO 2 layer as a low-refraction layer and at least one TiO 2 layer as a high-refraction layer. If desired, the antireflection film may have a metal layer comprising Nb.
  • the abrasion resistance can be improved.
  • the ion-assisting condition for obtaining the result the ion current density on the dome in the vapor deposition device is from 15 to 35 ⁇ A, and the accelerating voltage is from 400 to 700 V. If the ion current density is lower than 15 ⁇ A or the accelerating voltage is lower than 400 V, both an effect for relieving the stress and an effect for improving the abrasion resistance may be hardly obtained. If, however, the ion current density exceeds 35 ⁇ A or the accelerating voltage exceeds 700 V, the plastic substrate may possibly be yellowed, or the optical performance may possibly be adversely affected.
  • the high-refraction layer such as a TiO 2 layer may also be formed in an ion-assisted process.
  • a mixed gas of O 2 and Ar is used for the ionizing gas in the ion-assisted process for forming the high-refraction layer.
  • the mixing ratio of O 2 to Ar based on the volume of flowing gases preferably ranges from 1:0.5-2. It is possible to improve the refractive index of the high-refraction layer formed and to promote the improvement of the abrasion resistance by using an ion-assisted process.
  • Materials for forming the high-refraction layer are TiO 2 , Nb 2 O 5 , Ta 2 O 5 , ZrO 2 , Y 2 O 3 , and mixtures thereof.
  • Preferred examples include TiO 2 , Nb 2 O 5 , Ta 2 O 5 and mixtures thereof.
  • the ion current density on the dome in the vapor deposition device is from 8 to 15 ⁇ A, and the accelerating voltage is from 300 to 700 V.
  • the volume ratio of O 2 to Ar in the ionizing gas mixture is from 1/0.7 to 1/1.0. If the ion current density, the accelerating voltage and the ionizing gas ratio overstep the defined ranges, the intended refractive index may not be obtained, and, in addition, its absorbance index may likely increase, and its abrasion resistance may possibly be lowered.
  • the ion current density on the dome in the vapor deposition device is from 12 to 20 ⁇ A, and the accelerating voltage is from 400 to 700 V.
  • the volume ratio of O 2 to Ar in the ionizing gas mixture is from 1/0.5 to 1/2.0. If the ion current density, the accelerating voltage and the ionizing gas ratio overstep the defined ranges, the intended refractive index may not be obtained, and, in addition, its absorbance index may likely increase, and its abrasion resistance may possibly be lowered.
  • a suitable thickness of the basic layer of the optical element of the invention is from 1.0 to 5.0 nm. If its thickness oversteps the defined range, the basic layer may possibly present a problem of absorbance within the film.
  • Basic layer Nb layer (film thickness: 1 to 5 nm)
  • 2nd layer TiO 2 layer (film thickness: 1 to 15 nm)
  • 3rd layer SiO 2 layer (film thickness: 20 to 360 nm)
  • 4th layer TiO 2 layer (film thickness: 5 to 55 nm)
  • 5th layer SiO 2 layer (film thickness: 5 to 55 nm)
  • 6th layer TiO 2 layer (film thickness: 5 to 130 nm)
  • Basic layer Nb layer (film thickness: 1 to 5 nm)
  • 2nd layer Nb layer (film thickness: 1 to 5 nm)
  • 3rd layer SiO 2 layer (film thickness: 20 to 100 nm)
  • 4th layer TiO 2 layer (film thickness: 5 to 55 nm)
  • 5th layer SiO 2 layer (film thickness: 5 to 50 nm)
  • 6th layer TiO 2 layer (film thickness: 5 to 130 nm)
  • the ranges of the film thickness mentioned above are the most preferred ones for the adhesiveness between the plastic substrate and the antireflection film and for the heat resistance and impact resistance of the optical element.
  • the material for the plastic substrate for use in the invention is not specifically limited. Suitable materials include, for example, methyl methacrylate homopolymers, copolymers of methyl methacrylate and one or more other monomers such as diethylene glycol bisallyl carbonate or benzyl methacrylate, diethylene glycol bisallyl carbonate homopolymers, copolymers of diethylene glycol bisallyl carbonate and one or more other monomers such as methyl methacrylate and benzyl methacrylate, sulfur-containing copolymers, halogen copolymers, polycarbonates, polystyrenes, polyvinyl chlorides, unsaturated polyesters, polyethylene terephthalates, polyurethanes, and polythiourethanes. Preferred examples include polythiourethane, diethylene glycol bisallyl carbonate homopolymers, and sulfur-containing copolymers.
  • the optical element of the invention may have a cured film between the plastic substrate and the basic layer.
  • a coating composition that comprises metal oxide colloid particles and one or more organosilicon compounds represented by the following general formula (1):
  • R 1 and R 2 each independently represents an organic group selected from an C 1-8 alkyl group, an C 2-8 alkenyl group, an aryl group, a phenyl group, a 5-or 6-membered heteroaryl group having at least one heteroatom selected from sulfur and nitrogen which may optionally be substituted by one or more C 1-3 alkyl group (s), an C 1-8 acyl group, a halogen atom, a glycidoxy group, an epoxy group, an amino group, a phenyl group, a mercapto group, a methacryloxy group, and a cyano group;
  • R 3 represents an organic group selected from an alkyl group having from 1 to 8 carbon atoms, an C 1-8 acyl group, and a phenyl group; and a and b each independently indicates an integer of 0 or 1.
  • the coating composition is cured by drying it in hot air or by exposing it to active energy rays.
  • active energy rays Preferably, it is cured in hot air at 70 to 200° C., and more preferably at 90 to 150° C.
  • active energy rays preferred are far-infrared rays as not damaging the film by heat.
  • the metal oxide colloid particles generally are fine metal oxide particles having a particle size of 1-500 nm.
  • Preferred examples thereof are colloid particles of tungsten oxide (WO 3 ), zinc oxide (ZnO), silicon oxide (SiO 2 ), aluminum oxide (Al 2 O 3 ), titanium oxide (TiO 2 ), zirconium oxide (ZrO 2 ), tin oxide (SnO 2 ), beryllium oxide (BeO) orantimony oxide (Sb 2 O 5 )
  • tungsten oxide WO 3
  • ZnO zinc oxide
  • SiO 2 silicon oxide
  • Al 2 O 3 aluminum oxide
  • TiO 2 zirconium oxide
  • tin oxide SnO 2
  • BeO beryllium oxide
  • Sb 2 O 5 antimony oxide
  • the organosilicon compound of the general formula (1) includes, for example, methyl silicate, ethyl silicate, n-propyl silicate, isopropyl silicate, n-butyl silicate, sec-butyl silicate, tert-butyl silicate, tetraacetoxysilane, methyltrimethoxysilane, methyltriethoxysilane, methyltripropoxysilane, methyltriacetoxysilane, methyltributoxysilane, methyltripropoxysilane, methyltriamyloxysilane, methyltriphenoxysilane, methyltribenzyloxysilane, methyltriphenethyloxysilane, glycidoxymethyltrimethoxysilane, glycidoxymethyltriethoxysilane, ⁇ -glycidoxyethyltriethoxysilane, ⁇ -glycidoxyethyltrimethoxysilane,
  • a plastic lens was put into an oven preheated to a selected temperature, and was left there for 1 hour. This experiment was performed at different temperatures, starting from 60° C. with increments of 5°. The temperature was measured, at which the lens could not withstand the heat treatment and was cracked after 1 hour. This temperature is given as heat resistance in the Tables below.
  • a plastic lens was dipped in an aqueous 10% NaOH solution for 1 hour, and its surface condition was evaluated according to the following criteria:
  • C Many peeled dots found everywhere on the surface, and a few peeled squares found.
  • a plastic lens having a center thickness of 2.0 mm and a power of lens of 0.00 was prepared and subjected to a drop ball test as defined by the Food and Drug Administration. “O” indicates a good sample; and “x” indicates a rejected sample.
  • colloidal silica (Snowtex-40, available from Nissan Chemical Industries, ltd.), 81.6 parts by weight of methyltrimethoxysilane and 176 parts by weight of ⁇ -glycidoxypropyltrimethoxysilane as organosilicon compounds, 2.0 parts by weight of 0.5 N hydrochloric acid, 20 parts by weight of acetic acid, and 90 parts by weight of water were charged into a glass container, and the solution was stirred at room temperature for 8 hours. Then, the resulting solution was left at room temperature for 16 hours to obtain a hydrolyzed solution.
  • colloidal silica Snowtex-40, available from Nissan Chemical Industries, ltd.
  • 81.6 parts by weight of methyltrimethoxysilane and 176 parts by weight of ⁇ -glycidoxypropyltrimethoxysilane as organosilicon compounds 2.0 parts by weight of 0.5 N hydrochloric acid, 20 parts by weight of acetic acid, and 90 parts by weight of water were charged into a glass container,
  • a plastic lens substrate (made from diethylene glycol bisallyl carbonate, and having a refractive index of 1.50, a center thickness of 2.0 mm and a power of lens of 0.00), which had been pretreated with an aqueous alkaline solution, was dipped in the coating solution. After completion of dipping, the plastic lens was taken out at a pulling rate of 20 cm/min. Then, the plastic lens was heated at 120° C. for 2 hours to form a cured film.
  • the resulting plastic lens was subjected to an ion gun treatment according to an ion-assisted process using an Ar gas under the condition of the ion acceleration voltage and exposure time as shown in Tables 1 to 6, thereby making it have a cured hard coat layer (hereinafter referred to as layer A).
  • the plastic lenses were evaluated according to the methods (1) to (7) mentioned above, and the results are shown in Tables 1 to 6.
  • the wavelength of measurement for measuring optical thickness of the film is 500 nm.
  • Plastic lenses were obtained in the same manner as in Examples 1 to 12, except that the basic layer was not formed and that the hard coat layer and the functional film composed of the 1st to 7th layers were formed not in the ion-assisted process but in the vapor deposition.
  • Example 4 Plastic lens substrate Diethylene glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion Acceleration Voltage for Pretreatment 150 V 150 V Current 100 mA 100 mA Exposure time 60 sec 40 sec Gas used Ar Ar Optical Film Setting values Optical Film Setting values Optical Film Setting values Type of film thickness for ion gun Type of film thickness for ion gun Basic layer Nb 3.5 nm 150 V 100 mA Nb 4.0 nm 150 V 100 mA 1st layer SiO 2 94.0 nm 450 V 160 mA SiO 2 108.0 nm 450 V 160 mA 2nd layer Nb 3.5 nm 360 V 105 mA TiO 2 52.5 nm 360 V 105 mA 3rd layer SiO 2 94.0 nm 150 V 100 mA SiO 2 271.8 nm 450 V 160 mA 4th layer TiO 2 225.5 nm 360 V 105 mA TiO 2 38.6
  • Example 6 Plastic lens substrate Diethylene glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion Acceleration Voltage for Pretreatment 150 V 150 V Current 100 mA 100 mA Exposure time 40 sec 40 sec Gas used Ar Ar Optical Film Setting values Optical Film Setting values Optical Film Setting values Type of film thickness for ion gun Type of film thickness for ion gun Basic layer Nb 4.0 nm 150 V 100 mA Nb 3.5 nm 150 V 100 mA 1st layer SiO 2 7.9 nm 450 V 160 mA SiO 2 111.9 nm 450 V 160 mA 2nd layer TiO 2 28.4 nm 360 V 105 mA Nb 3.5 nm 150 V 100 mA 3rd layer SiO 2 49.0 nm 450 V 160 mA SiO 2 111.9 nm 450 V 160 mA 4th layer TiO 2 116.5 nm 360 V 105 mA TiO 2 25.2
  • Example 8 Plastic lens substrate Diethylene glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion Acceleration Voltage for Pretreatment 150 V 150 V Current 100 mA 100 mA Exposure time 60 sec 60 sec Gas used Ar Ar Optical Film Setting values Optical Film Setting values Type of film thickness for ion gun Type of film thickness for ion gun Basic layer Nb 4.0 nm 150 V 100 mA Nb 4.0 nm 150 V 100 mA 1st layer SiO 2 14.6 nm 450 V 160 mA SiO 2 10.5 nm 450 V 160 mA 2nd layer Ta 2 O 5 9.5 nm 420 V 120 mA Ta 2 O 5 26.0 nm 420 V 120 mA 3rd layer SiO 2 292.0 nm 450 V 160 mA SiO 2 54.2 nm 450 V 160 mA 4th layer Ta 2 O 5 66.8 nm 420 V 120 mA
  • Example 10 Plastic lens substrate Diethylene glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion Acceleration Voltage for Pretreatment 150 V 150 V Current 100 mA 100 mA Exposure time 60 sec 60 sec Gas used Ar Ar Optical Film Setting values Optical Film Type of film thickness for ion gun Type of film thickness for ion gun Basic layer Nb 4.0 nm 150 V 100 mA Nb 4.0 nm 150 V 100 mA 1st layer SiO 2 33.5 nm 450 V 160 mA SiO 2 10.5 nm 450 V 160 mA 2nd layer Nb 2 O 5 4.5 nm 360 V 105 mA Nb 2 O 5 26.4 nm 360 V 105 mA 3rd layer SiO 2 292.0 nm 450 V 160 mA SiO 2 54.2 nm 450 V 160 mA 4th layer Nb 2 O 5 23.9 nm 360 V 105 mA N
  • Example 12 Plastic lens substrate Diethylene glycol bisallyl carbonate Diethylene glycol bisallyl carbonate Hard coat layer Layer A Layer A Ion Acceleration Voltage for Pretreatment 150 V 150 V Current 100 mA 100 mA Exposure time 40 sec 40 sec Gas used Ar Ar Optical Film Setting values Optical Film Setting values Optical Film Setting values Type of film thickness for ion gun Type of film thickness for ion gun Basic layer Nb 3.5 nm 150 V 100 mA Nb 4.0 nm 150 V 100 mA 1st layer SiO 2 111.6 nm 450 V 160 mA SiO 2 10.5 nm 450 V 160 mA 2nd layer Nb 3.5 nm 150 V 100 mA Nb 2 O 5 26.4 nm 360 V 105 mA 3rd layer SiO 2 111.6 nm 450 V 160 mA SiO 2 54.2 nm 450 V 160 mA 4th layer Nb 2 O 5 24.9 nm 360 V 105 mA Nb 2
  • the plastic lenses of Examples 1 to 12 had an extremely small luminous reflectance of from 0.68 to 0.82% and had a high luminance transmittance of from 99.0 to 99.3%.
  • their film adhesiveness, abrasion resistance, heat resistance, alkali resistance and impact resistance were good.
  • the plastic lenses of Comparative Examples 1 to 4 had a high luminous reflectance of from 1.1 to 1.2% and had a low luminance transmittance of from 98.6 to 98.7%, as shown in Tables 7 and 8.
  • their film adhesiveness, abrasion resistance, heat resistance, alkali resistance and impact resistance were inferior to those in Examples 1 to 12.
  • the optical element of the invention has an antireflection film, in which the reflectance is small, and the transmittance is high, and, in addition, it has excellent adhesiveness between the plastic substrate and the antireflection film, abrasion resistance, heat resistance, alkali resistance and impact resistance.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
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DE60120059D1 (de) 2006-07-06
AU5784701A (en) 2002-03-07
US6693747B2 (en) 2004-02-17
HUP0103476A2 (en) 2002-08-28
DE60120059T2 (de) 2006-12-21
CN1341866A (zh) 2002-03-27
CN1172198C (zh) 2004-10-20
CA2354961A1 (en) 2002-02-28
KR20020017998A (ko) 2002-03-07
JP3510845B2 (ja) 2004-03-29
AU775324B2 (en) 2004-07-29
KR100483680B1 (ko) 2005-04-18
HUP0103476A3 (en) 2007-11-28
EP1184686A3 (en) 2004-03-31
ATE328296T1 (de) 2006-06-15
JP2002071903A (ja) 2002-03-12
EP1184686B1 (en) 2006-05-31
EP1184686A2 (en) 2002-03-06
TW578004B (en) 2004-03-01
CA2354961C (en) 2005-03-15

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