UA12650A - Спосіб hаhесеhhя плівок hа осhові оксиду кремhію - Google Patents

Спосіб hаhесеhhя плівок hа осhові оксиду кремhію

Info

Publication number
UA12650A
UA12650A UA4356167A UA4356167A UA12650A UA 12650 A UA12650 A UA 12650A UA 4356167 A UA4356167 A UA 4356167A UA 4356167 A UA4356167 A UA 4356167A UA 12650 A UA12650 A UA 12650A
Authority
UA
Ukraine
Prior art keywords
application
silicon oxide
films based
silicon
plasma
Prior art date
Application number
UA4356167A
Other languages
English (en)
Russian (ru)
Inventor
С. Лопата Юджін
С. Лопата Юджин
Т. Фелтс Джон
Original Assignee
Дзе Бок Груп. Інк.
Дзе Бок Групп. Инк.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Дзе Бок Груп. Інк., Дзе Бок Групп. Инк. filed Critical Дзе Бок Груп. Інк.
Publication of UA12650A publication Critical patent/UA12650A/uk

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/12—Bonding of a preformed macromolecular material to the same or other solid material such as metal, glass, leather, e.g. using adhesives
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096—Flat-bed apparatus

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Silicon Compounds (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

Винахід стосується нанесення плівок на основі оксиду кремнію, зокрема, прискореного плазмового нанесення тонких плівок на основі оксиду кремнію з летких кремнійорганічних сполук та може знайти використання у електронній промисловості. Спосіб нанесення плівок на основі оксиду кремнію включає напускання у попередньо вакуумований робочий об’єм регульованого газового потоку, що містить летку кремнійорганічну сполуку та кисень, збудження та утримування плазми тліючого розряду поблизу поверхні конденсації.
UA4356167A 1987-07-15 1988-07-14 Спосіб hаhесеhhя плівок hа осhові оксиду кремhію UA12650A (uk)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US7379287A 1987-07-15 1987-07-15

Publications (1)

Publication Number Publication Date
UA12650A true UA12650A (uk) 1997-02-28

Family

ID=22115831

Family Applications (1)

Application Number Title Priority Date Filing Date
UA4356167A UA12650A (uk) 1987-07-15 1988-07-14 Спосіб hаhесеhhя плівок hа осhові оксиду кремhію

Country Status (14)

Country Link
US (1) US5904952A (uk)
EP (1) EP0299754B1 (uk)
JP (1) JP2634637B2 (uk)
KR (1) KR930011764B1 (uk)
CN (1) CN1030616A (uk)
AT (1) ATE95574T1 (uk)
AU (1) AU606715B2 (uk)
CA (1) CA1340053C (uk)
DE (1) DE3884697T2 (uk)
ES (1) ES2043826T3 (uk)
MX (1) MX170794B (uk)
RU (1) RU2030483C1 (uk)
UA (1) UA12650A (uk)
ZA (1) ZA884511B (uk)

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ES2043826T3 (es) 1994-01-01
RU2030483C1 (ru) 1995-03-10
DE3884697T2 (de) 1994-01-27
EP0299754B1 (en) 1993-10-06
EP0299754A2 (en) 1989-01-18
KR890002286A (ko) 1989-04-10
ATE95574T1 (de) 1993-10-15
AU1899588A (en) 1989-01-19
KR930011764B1 (ko) 1993-12-20
JP2634637B2 (ja) 1997-07-30
MX170794B (es) 1993-09-15
DE3884697D1 (de) 1993-11-11
JPS6487772A (en) 1989-03-31
EP0299754A3 (en) 1991-01-30
CN1030616A (zh) 1989-01-25
AU606715B2 (en) 1991-02-14
CA1340053C (en) 1998-09-22
US5904952A (en) 1999-05-18
ZA884511B (en) 1989-03-29

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