TWI908890B - 光硬化性著色樹脂組合物、硬化物、彩色濾光片、顯示裝置 - Google Patents

光硬化性著色樹脂組合物、硬化物、彩色濾光片、顯示裝置

Info

Publication number
TWI908890B
TWI908890B TW110135290A TW110135290A TWI908890B TW I908890 B TWI908890 B TW I908890B TW 110135290 A TW110135290 A TW 110135290A TW 110135290 A TW110135290 A TW 110135290A TW I908890 B TWI908890 B TW I908890B
Authority
TW
Taiwan
Prior art keywords
group
carbon atoms
resin composition
photocurable
general formula
Prior art date
Application number
TW110135290A
Other languages
English (en)
Chinese (zh)
Other versions
TW202222991A (zh
Inventor
石原星児
藤田麻希
Original Assignee
日商Dnp精細化工股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商Dnp精細化工股份有限公司 filed Critical 日商Dnp精細化工股份有限公司
Publication of TW202222991A publication Critical patent/TW202222991A/zh
Application granted granted Critical
Publication of TWI908890B publication Critical patent/TWI908890B/zh

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031Organic compounds not covered by group G03F7/029
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/09Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
TW110135290A 2020-09-29 2021-09-23 光硬化性著色樹脂組合物、硬化物、彩色濾光片、顯示裝置 TWI908890B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-163774 2020-09-29
JP2020163774 2020-09-29

Publications (2)

Publication Number Publication Date
TW202222991A TW202222991A (zh) 2022-06-16
TWI908890B true TWI908890B (zh) 2025-12-21

Family

ID=80951462

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110135290A TWI908890B (zh) 2020-09-29 2021-09-23 光硬化性著色樹脂組合物、硬化物、彩色濾光片、顯示裝置

Country Status (5)

Country Link
JP (1) JPWO2022070977A1 (https=)
KR (1) KR102924059B1 (https=)
CN (1) CN116157738A (https=)
TW (1) TWI908890B (https=)
WO (1) WO2022070977A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7464184B1 (ja) 2023-02-01 2024-04-09 artience株式会社 感光性着色組成物、それを用いた膜、カラーフィルタ、固体撮像素子、及び画像表示装置
JP7478332B1 (ja) 2023-02-22 2024-05-07 artience株式会社 感光性組成物、それを用いた膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201022349A (en) * 2008-07-24 2010-06-16 Jsr Corp Radiation-sensitive resin composition, spacer for liquid crystal display element, forming method of spacer for liquid crystal display element and liquid crystal display element
JP2018205605A (ja) * 2017-06-07 2018-12-27 三菱ケミカル株式会社 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明
TW202008078A (zh) * 2018-07-20 2020-02-16 日商三菱化學股份有限公司 感光性著色樹脂組合物、硬化物、圖像顯示裝置及照明

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3867179B2 (ja) 1997-11-18 2007-01-10 Jsr株式会社 カラーフィルタ用感放射線性組成物
JP2010256891A (ja) * 2009-04-01 2010-11-11 Toyo Ink Mfg Co Ltd 感光性着色組成物およびカラーフィルタ
JP5728103B1 (ja) 2014-02-18 2015-06-03 日本発條株式会社 リンクアーム部材
JP6595983B2 (ja) * 2014-04-04 2019-10-23 株式会社Adeka オキシムエステル化合物及び該化合物を含有する光重合開始剤
JP6385853B2 (ja) * 2015-02-20 2018-09-05 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機el表示装置
KR101814098B1 (ko) * 2017-01-18 2018-01-02 동우 화인켐 주식회사 광경화성 조성물 및 이로부터 형성된 광경화 막
JP7249119B2 (ja) * 2018-09-27 2023-03-30 東京応化工業株式会社 感光性樹脂組成物、パターニングされた硬化膜の製造方法及び硬化膜

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201022349A (en) * 2008-07-24 2010-06-16 Jsr Corp Radiation-sensitive resin composition, spacer for liquid crystal display element, forming method of spacer for liquid crystal display element and liquid crystal display element
JP2018205605A (ja) * 2017-06-07 2018-12-27 三菱ケミカル株式会社 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明
TW202008078A (zh) * 2018-07-20 2020-02-16 日商三菱化學股份有限公司 感光性著色樹脂組合物、硬化物、圖像顯示裝置及照明

Also Published As

Publication number Publication date
TW202222991A (zh) 2022-06-16
KR20230079024A (ko) 2023-06-05
KR102924059B1 (ko) 2026-02-05
CN116157738A (zh) 2023-05-23
WO2022070977A1 (ja) 2022-04-07
JPWO2022070977A1 (https=) 2022-04-07

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