JPWO2022070977A1 - - Google Patents
Info
- Publication number
- JPWO2022070977A1 JPWO2022070977A1 JP2022553829A JP2022553829A JPWO2022070977A1 JP WO2022070977 A1 JPWO2022070977 A1 JP WO2022070977A1 JP 2022553829 A JP2022553829 A JP 2022553829A JP 2022553829 A JP2022553829 A JP 2022553829A JP WO2022070977 A1 JPWO2022070977 A1 JP WO2022070977A1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Polymerisation Methods In General (AREA)
- Optical Filters (AREA)
- Materials For Photolithography (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2020163774 | 2020-09-29 | ||
| PCT/JP2021/034241 WO2022070977A1 (ja) | 2020-09-29 | 2021-09-17 | 光硬化性着色樹脂組成物、硬化物、カラーフィルタ、表示装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPWO2022070977A1 true JPWO2022070977A1 (https=) | 2022-04-07 |
Family
ID=80951462
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2022553829A Pending JPWO2022070977A1 (https=) | 2020-09-29 | 2021-09-17 |
Country Status (5)
| Country | Link |
|---|---|
| JP (1) | JPWO2022070977A1 (https=) |
| KR (1) | KR102924059B1 (https=) |
| CN (1) | CN116157738A (https=) |
| TW (1) | TWI908890B (https=) |
| WO (1) | WO2022070977A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7464184B1 (ja) | 2023-02-01 | 2024-04-09 | ａｒｔｉｅｎｃｅ株式会社 | 感光性着色組成物、それを用いた膜、カラーフィルタ、固体撮像素子、及び画像表示装置 |
| JP7478332B1 (ja) | 2023-02-22 | 2024-05-07 | ａｒｔｉｅｎｃｅ株式会社 | 感光性組成物、それを用いた膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010049238A (ja) * | 2008-07-24 | 2010-03-04 | Jsr Corp | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| JP2018205605A (ja) * | 2017-06-07 | 2018-12-27 | 三菱ケミカル株式会社 | 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明 |
| JP2020052280A (ja) * | 2018-09-27 | 2020-04-02 | 東京応化工業株式会社 | 感光性樹脂組成物、パターニングされた硬化膜の製造方法及び硬化膜 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3867179B2 (ja) | 1997-11-18 | 2007-01-10 | Ｊｓｒ株式会社 | カラーフィルタ用感放射線性組成物 |
| JP2010256891A (ja) * | 2009-04-01 | 2010-11-11 | Toyo Ink Mfg Co Ltd | 感光性着色組成物およびカラーフィルタ |
| JP5728103B1 (ja) | 2014-02-18 | 2015-06-03 | 日本発條株式会社 | リンクアーム部材 |
| JP6595983B2 (ja) * | 2014-04-04 | 2019-10-23 | 株式会社Ａｄｅｋａ | オキシムエステル化合物及び該化合物を含有する光重合開始剤 |
| JP6385853B2 (ja) * | 2015-02-20 | 2018-09-05 | 富士フイルム株式会社 | 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機ｅｌ表示装置 |
| KR101814098B1 (ko) * | 2017-01-18 | 2018-01-02 | 동우 화인켐 주식회사 | 광경화성 조성물 및 이로부터 형성된 광경화 막 |
| CN112313579B (zh) * | 2018-07-20 | 2025-05-13 | 三菱化学株式会社 | 感光性着色树脂组合物、固化物、图像显示装置及照明 |
-
2021
- 2021-09-17 JP JP2022553829A patent/JPWO2022070977A1/ja active Pending
- 2021-09-17 WO PCT/JP2021/034241 patent/WO2022070977A1/ja not_active Ceased
- 2021-09-17 CN CN202180054507.3A patent/CN116157738A/zh active Pending
- 2021-09-17 KR KR1020237007955A patent/KR102924059B1/ko active Active
- 2021-09-23 TW TW110135290A patent/TWI908890B/zh active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2010049238A (ja) * | 2008-07-24 | 2010-03-04 | Jsr Corp | 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法 |
| JP2018205605A (ja) * | 2017-06-07 | 2018-12-27 | 三菱ケミカル株式会社 | 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明 |
| JP2020052280A (ja) * | 2018-09-27 | 2020-04-02 | 東京応化工業株式会社 | 感光性樹脂組成物、パターニングされた硬化膜の製造方法及び硬化膜 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW202222991A (zh) | 2022-06-16 |
| KR20230079024A (ko) | 2023-06-05 |
| KR102924059B1 (ko) | 2026-02-05 |
| CN116157738A (zh) | 2023-05-23 |
| WO2022070977A1 (ja) | 2022-04-07 |
| TWI908890B (zh) | 2025-12-21 |
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