CN116157738A - 光固化性着色树脂组合物、固化物、滤色器、显示设备 - Google Patents

光固化性着色树脂组合物、固化物、滤色器、显示设备 Download PDF

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Publication number
CN116157738A
CN116157738A CN202180054507.3A CN202180054507A CN116157738A CN 116157738 A CN116157738 A CN 116157738A CN 202180054507 A CN202180054507 A CN 202180054507A CN 116157738 A CN116157738 A CN 116157738A
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carbon atoms
mass
represented
resin composition
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CN202180054507.3A
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English (en)
Chinese (zh)
Inventor
石原星儿
藤田麻希
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DNP Fine Chemicals Co Ltd
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DNP Fine Chemicals Co Ltd
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Publication of CN116157738A publication Critical patent/CN116157738A/zh
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Polymerisation Methods In General (AREA)
  • Optical Filters (AREA)
  • Materials For Photolithography (AREA)
CN202180054507.3A 2020-09-29 2021-09-17 光固化性着色树脂组合物、固化物、滤色器、显示设备 Pending CN116157738A (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2020-163774 2020-09-29
JP2020163774 2020-09-29
PCT/JP2021/034241 WO2022070977A1 (ja) 2020-09-29 2021-09-17 光硬化性着色樹脂組成物、硬化物、カラーフィルタ、表示装置

Publications (1)

Publication Number Publication Date
CN116157738A true CN116157738A (zh) 2023-05-23

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CN202180054507.3A Pending CN116157738A (zh) 2020-09-29 2021-09-17 光固化性着色树脂组合物、固化物、滤色器、显示设备

Country Status (5)

Country Link
JP (1) JPWO2022070977A1 (https=)
KR (1) KR102924059B1 (https=)
CN (1) CN116157738A (https=)
TW (1) TWI908890B (https=)
WO (1) WO2022070977A1 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7464184B1 (ja) 2023-02-01 2024-04-09 ａｒｔｉｅｎｃｅ株式会社 感光性着色組成物、それを用いた膜、カラーフィルタ、固体撮像素子、及び画像表示装置
JP7478332B1 (ja) 2023-02-22 2024-05-07 ａｒｔｉｅｎｃｅ株式会社 感光性組成物、それを用いた膜、光学フィルタ、固体撮像素子、画像表示装置、及び赤外線センサ

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010256891A (ja) * 2009-04-01 2010-11-11 Toyo Ink Mfg Co Ltd 感光性着色組成物およびカラーフィルタ
CN106132929A (zh) * 2014-04-04 2016-11-16 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
CN108333874A (zh) * 2017-01-18 2018-07-27 东友精细化工有限公司 光固化性组合物及由该光固化性组合物形成的光固化膜
JP2018205605A (ja) * 2017-06-07 2018-12-27 三菱ケミカル株式会社 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明
CN110955114A (zh) * 2018-09-27 2020-04-03 东京应化工业株式会社 感光性树脂组合物、经图案化的固化膜的制造方法及固化膜

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3867179B2 (ja) 1997-11-18 2007-01-10 Ｊｓｒ株式会社 カラーフィルタ用感放射線性組成物
JP5685803B2 (ja) * 2008-07-24 2015-03-18 Jsr株式会社 感放射線性樹脂組成物および液晶表示素子用スペーサーとその製造法
JP5728103B1 (ja) 2014-02-18 2015-06-03 日本発條株式会社 リンクアーム部材
JP6385853B2 (ja) * 2015-02-20 2018-09-05 富士フイルム株式会社 感光性組成物、硬化膜の製造方法、硬化膜、タッチパネル、タッチパネル表示装置、液晶表示装置、及び、有機ｅｌ表示装置
CN112313579B (zh) * 2018-07-20 2025-05-13 三菱化学株式会社 感光性着色树脂组合物、固化物、图像显示装置及照明

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010256891A (ja) * 2009-04-01 2010-11-11 Toyo Ink Mfg Co Ltd 感光性着色組成物およびカラーフィルタ
CN106132929A (zh) * 2014-04-04 2016-11-16 株式会社艾迪科 肟酯化合物和含有该化合物的光聚合引发剂
CN108333874A (zh) * 2017-01-18 2018-07-27 东友精细化工有限公司 光固化性组合物及由该光固化性组合物形成的光固化膜
JP2018205605A (ja) * 2017-06-07 2018-12-27 三菱ケミカル株式会社 着色感光性樹脂組成物、硬化物、有機電界発光素子、画像表示装置及び照明
CN110955114A (zh) * 2018-09-27 2020-04-03 东京应化工业株式会社 感光性树脂组合物、经图案化的固化膜的制造方法及固化膜

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TW202222991A (zh) 2022-06-16
KR20230079024A (ko) 2023-06-05
KR102924059B1 (ko) 2026-02-05
WO2022070977A1 (ja) 2022-04-07
TWI908890B (zh) 2025-12-21
JPWO2022070977A1 (https=) 2022-04-07

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