TWI866622B - 檢查裝置及檢查方法 - Google Patents

檢查裝置及檢查方法 Download PDF

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Publication number
TWI866622B
TWI866622B TW112144629A TW112144629A TWI866622B TW I866622 B TWI866622 B TW I866622B TW 112144629 A TW112144629 A TW 112144629A TW 112144629 A TW112144629 A TW 112144629A TW I866622 B TWI866622 B TW I866622B
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light
wavelength
fluorescence
amount
optical element
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TW112144629A
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Chinese (zh)
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TW202409552A (zh
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中村共則
池村賢一郎
大高章弘
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日商濱松赫德尼古斯股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N21/645Specially adapted constructive features of fluorimeters
    • G01N21/6456Spatial resolved fluorescence measurements; Imaging
    • G01N21/6458Fluorescence microscopy
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J3/00Spectrometry; Spectrophotometry; Monochromators; Measuring colours
    • G01J3/28Investigating the spectrum
    • G01J3/44Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
    • G01J3/4406Fluorescence spectrometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/31Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
    • G01N21/314Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N21/6428Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
    • GPHYSICS
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    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
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    • G01N21/6456Spatial resolved fluorescence measurements; Imaging
    • GPHYSICS
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    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N21/6489Photoluminescence of semiconductors
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
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    • GPHYSICS
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    • G01N21/84Systems specially adapted for particular applications
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    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • GPHYSICS
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    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
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    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
    • G06T7/0002Inspection of images, e.g. flaw detection
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    • G06T7/66Analysis of geometric attributes of image moments or centre of gravity
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    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00Image analysis
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    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04NPICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/70Circuitry for compensating brightness variation in the scene
    • H04N23/72Combination of two or more compensation controls
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/01Manufacture or treatment
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10HINORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
    • H10H20/00Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
    • H10H20/80Constructional details
    • H10H20/81Bodies
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N2021/6417Spectrofluorimetric devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N2021/6417Spectrofluorimetric devices
    • G01N2021/6421Measuring at two or more wavelengths
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/64Fluorescence; Phosphorescence
    • G01N21/645Specially adapted constructive features of fluorimeters
    • G01N21/6456Spatial resolved fluorescence measurements; Imaging
    • G01N2021/646Detecting fluorescent inhomogeneities at a position, e.g. for detecting defects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8806Specially adapted optical and illumination features
    • G01N2021/8845Multiple wavelengths of illumination or detection
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8887Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00Features of devices classified in G01N21/00
    • G01N2201/12Circuits of general importance; Signal processing
    • G01N2201/127Calibration; base line adjustment; drift compensation
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/10Image acquisition modality
    • G06T2207/10064Fluorescence image
    • GPHYSICS
    • G06COMPUTING OR CALCULATING; COUNTING
    • G06TIMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00Indexing scheme for image analysis or image enhancement
    • G06T2207/30Subject of image; Context of image processing
    • G06T2207/30108Industrial image inspection
    • G06T2207/30148Semiconductor; IC; Wafer

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Signal Processing (AREA)
  • Quality & Reliability (AREA)
  • Geometry (AREA)
  • Multimedia (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Optics & Photonics (AREA)
  • Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Led Devices (AREA)
  • Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Pens And Brushes (AREA)
TW112144629A 2019-03-28 2020-03-17 檢查裝置及檢查方法 TWI866622B (zh)

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JP2019-062968 2019-03-28
JP2019062968 2019-03-28
JP2019199928 2019-11-01
JP2019-199928 2019-11-01

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TW114101521A TW202518004A (zh) 2019-03-28 2020-03-17 檢查裝置

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US (2) US11694324B2 (enExample)
EP (1) EP3951844A4 (enExample)
JP (3) JP6840881B1 (enExample)
KR (2) KR102606269B1 (enExample)
CN (2) CN113646877B (enExample)
TW (3) TWI819202B (enExample)
WO (1) WO2020195138A1 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102898289B1 (ko) * 2019-03-28 2025-12-10 하마마츠 포토닉스 가부시키가이샤 검사 장치 및 검사 방법
KR20230079215A (ko) * 2020-11-09 2023-06-05 코니카 미놀타 가부시키가이샤 파장 측정 장치 및 파장 측정 방법
CN112666180B (zh) * 2020-12-23 2024-07-05 浙江大学 一种点胶自动化检测方法及系统
TWI770809B (zh) * 2021-02-05 2022-07-11 佰驟智能股份有限公司 快速發光效率檢測方法
TWI758088B (zh) * 2021-02-05 2022-03-11 佰驟智能有限公司 陣列式發光效率檢測方法
JP7735103B2 (ja) * 2021-07-14 2025-09-08 キヤノン株式会社 識別装置
JP7686489B2 (ja) 2021-07-29 2025-06-02 日亜化学工業株式会社 半導体層構造の検査方法及び半導体層構造の検査装置
CN114252394B (zh) * 2021-12-06 2023-11-07 深圳铭毅智造科技有限公司 一种二向色镜自动反馈补偿方法
US20240175826A1 (en) 2022-11-29 2024-05-30 PlayNitride Display Co., Ltd. Wafer defect inspection apparatus
CN116660285B (zh) * 2023-07-26 2023-11-17 浙江大学 一种晶圆特征光谱在线检测装置
CN119223992A (zh) * 2023-09-05 2024-12-31 武汉精立电子技术有限公司 一种基于光谱成像的晶圆光致发光检测装置和方法
CN119757399A (zh) * 2024-12-23 2025-04-04 重庆中科摇橹船信息科技有限公司 一种用于mled晶圆缺陷检测的成像系统

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63250835A (ja) * 1987-04-08 1988-10-18 Hitachi Cable Ltd エピタキシヤルウエハの検査方法
JP2009145550A (ja) * 2007-12-13 2009-07-02 Nikon Corp レーザ走査顕微鏡
US20120049085A1 (en) * 2010-08-24 2012-03-01 Kla-Tencor Corporation Defect inspection and photoluminescence measurement system
TW201331568A (zh) * 2012-01-17 2013-08-01 Univ Nat Taiwan Science Tech 螢光反應檢測系統及其檢測方法
US20180052107A1 (en) * 2015-02-26 2018-02-22 National Cancer Center Fluorescent image system

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3413967B2 (ja) * 1994-06-08 2003-06-09 株式会社ニコン 蛍光顕微鏡
JP2003028797A (ja) * 2001-07-11 2003-01-29 Hitachi Software Eng Co Ltd 蛍光読み取り装置
US7411679B2 (en) * 2002-07-31 2008-08-12 Semrock, Inc. Optical filter and fluorescence spectroscopy system incorporating the same
US7697975B2 (en) * 2003-06-03 2010-04-13 British Colombia Cancer Agency Methods and apparatus for fluorescence imaging using multiple excitation-emission pairs and simultaneous multi-channel image detection
US7031084B2 (en) * 2003-07-23 2006-04-18 Eastman Kodak Company Imaging system using combined dichroic/high-pass filters
JP4804727B2 (ja) * 2004-06-24 2011-11-02 オリンパス株式会社 光走査型共焦点顕微鏡
JP4025859B2 (ja) 2004-09-03 2007-12-26 レーザーテック株式会社 検査装置及び検査方法並びにパターン基板の製造方法
US20110042580A1 (en) * 2006-09-06 2011-02-24 University Health Network Fluorescence quantification and image acquisition in highly turbid media
JP5325681B2 (ja) 2009-07-08 2013-10-23 株式会社日立ハイテクノロジーズ 荷電粒子線装置
JP2010118668A (ja) 2009-12-11 2010-05-27 Sumitomo Electric Ind Ltd 化合物半導体部材のダメージ評価方法、化合物半導体部材の製造方法、窒化ガリウム系化合物半導体部材及び窒化ガリウム系化合物半導体膜
JP5854531B2 (ja) 2011-11-08 2016-02-09 株式会社メガトレード プリント基板の検査装置
WO2013175973A1 (ja) * 2012-05-22 2013-11-28 コニカミノルタ株式会社 面発光体の色ムラ評価方法、評価装置および評価プログラム
WO2014057998A1 (ja) 2012-10-12 2014-04-17 株式会社ニコン 照明装置及び顕微鏡、並びに照明方法及び観察方法
JP2015010834A (ja) 2013-06-26 2015-01-19 東レエンジニアリング株式会社 発光体の発光波長推定方法とその装置
JP2017078724A (ja) * 2014-01-27 2017-04-27 株式会社日立ハイテクノロジーズ 多色蛍光画像分析装置
JP6416530B2 (ja) 2014-07-24 2018-10-31 株式会社日立ハイテクノロジーズ 蛍光観察装置、および蛍光観察方法
JP6635363B2 (ja) 2014-10-24 2020-01-22 京都府公立大学法人 腫瘍部位の判別のための方法、腫瘍部位の判別装置
JP6671653B2 (ja) 2015-12-11 2020-03-25 大学共同利用機関法人情報・システム研究機構 画像処理装置、画像処理方法及びプログラム
CN109387490B (zh) * 2017-08-08 2021-06-01 中国科学院大连化学物理研究所 一种用于提高荧光检测器信噪比的二色曲面反光镜结构
CN109030438A (zh) * 2018-07-06 2018-12-18 广州蓝勃生物科技有限公司 一种用于多波长荧光检测的光路模组
JP6581707B2 (ja) 2018-09-27 2019-09-25 株式会社日立ハイテクノロジーズ 核酸分析装置、および核酸分析方法
US11294162B2 (en) * 2019-02-07 2022-04-05 Nanotronics Imaging, Inc. Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel
KR102898289B1 (ko) * 2019-03-28 2025-12-10 하마마츠 포토닉스 가부시키가이샤 검사 장치 및 검사 방법
CN113614830B (zh) * 2019-03-29 2023-08-11 松下知识产权经营株式会社 记录状态评估方法、记录补偿方法和信息记录/回放设备
TWI788135B (zh) * 2021-06-08 2022-12-21 台達電子工業股份有限公司 光源模組

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63250835A (ja) * 1987-04-08 1988-10-18 Hitachi Cable Ltd エピタキシヤルウエハの検査方法
JP2009145550A (ja) * 2007-12-13 2009-07-02 Nikon Corp レーザ走査顕微鏡
US20120049085A1 (en) * 2010-08-24 2012-03-01 Kla-Tencor Corporation Defect inspection and photoluminescence measurement system
TW201331568A (zh) * 2012-01-17 2013-08-01 Univ Nat Taiwan Science Tech 螢光反應檢測系統及其檢測方法
US20180052107A1 (en) * 2015-02-26 2018-02-22 National Cancer Center Fluorescent image system

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