TWI866622B - 檢查裝置及檢查方法 - Google Patents
檢查裝置及檢查方法 Download PDFInfo
- Publication number
- TWI866622B TWI866622B TW112144629A TW112144629A TWI866622B TW I866622 B TWI866622 B TW I866622B TW 112144629 A TW112144629 A TW 112144629A TW 112144629 A TW112144629 A TW 112144629A TW I866622 B TWI866622 B TW I866622B
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
- G01N21/6458—Fluorescence microscopy
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/44—Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
- G01J3/4406—Fluorescence spectrometry
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/314—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry with comparison of measurements at specific and non-specific wavelengths
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6428—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6489—Photoluminescence of semiconductors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
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- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/0002—Inspection of images, e.g. flaw detection
- G06T7/0004—Industrial image inspection
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- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/60—Analysis of geometric attributes
- G06T7/66—Analysis of geometric attributes of image moments or centre of gravity
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- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T7/00—Image analysis
- G06T7/90—Determination of colour characteristics
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/70—Circuitry for compensating brightness variation in the scene
- H04N23/72—Combination of two or more compensation controls
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/81—Bodies
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N2021/6417—Spectrofluorimetric devices
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N2021/6417—Spectrofluorimetric devices
- G01N2021/6421—Measuring at two or more wavelengths
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
- G01N2021/646—Detecting fluorescent inhomogeneities at a position, e.g. for detecting defects
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8806—Specially adapted optical and illumination features
- G01N2021/8845—Multiple wavelengths of illumination or detection
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8887—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges based on image processing techniques
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2201/00—Features of devices classified in G01N21/00
- G01N2201/12—Circuits of general importance; Signal processing
- G01N2201/127—Calibration; base line adjustment; drift compensation
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/10—Image acquisition modality
- G06T2207/10064—Fluorescence image
-
- G—PHYSICS
- G06—COMPUTING OR CALCULATING; COUNTING
- G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
- G06T2207/00—Indexing scheme for image analysis or image enhancement
- G06T2207/30—Subject of image; Context of image processing
- G06T2207/30108—Industrial image inspection
- G06T2207/30148—Semiconductor; IC; Wafer
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Immunology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Theoretical Computer Science (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Signal Processing (AREA)
- Quality & Reliability (AREA)
- Geometry (AREA)
- Multimedia (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Led Devices (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Pens And Brushes (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019-062968 | 2019-03-28 | ||
| JP2019062968 | 2019-03-28 | ||
| JP2019199928 | 2019-11-01 | ||
| JP2019-199928 | 2019-11-01 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202409552A TW202409552A (zh) | 2024-03-01 |
| TWI866622B true TWI866622B (zh) | 2024-12-11 |
Family
ID=72609814
Family Applications (3)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109108724A TWI819202B (zh) | 2019-03-28 | 2020-03-17 | 檢查裝置及檢查方法 |
| TW112144629A TWI866622B (zh) | 2019-03-28 | 2020-03-17 | 檢查裝置及檢查方法 |
| TW114101521A TW202518004A (zh) | 2019-03-28 | 2020-03-17 | 檢查裝置 |
Family Applications Before (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109108724A TWI819202B (zh) | 2019-03-28 | 2020-03-17 | 檢查裝置及檢查方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW114101521A TW202518004A (zh) | 2019-03-28 | 2020-03-17 | 檢查裝置 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US11694324B2 (enExample) |
| EP (1) | EP3951844A4 (enExample) |
| JP (3) | JP6840881B1 (enExample) |
| KR (2) | KR102606269B1 (enExample) |
| CN (2) | CN113646877B (enExample) |
| TW (3) | TWI819202B (enExample) |
| WO (1) | WO2020195138A1 (enExample) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102898289B1 (ko) * | 2019-03-28 | 2025-12-10 | 하마마츠 포토닉스 가부시키가이샤 | 검사 장치 및 검사 방법 |
| KR20230079215A (ko) * | 2020-11-09 | 2023-06-05 | 코니카 미놀타 가부시키가이샤 | 파장 측정 장치 및 파장 측정 방법 |
| CN112666180B (zh) * | 2020-12-23 | 2024-07-05 | 浙江大学 | 一种点胶自动化检测方法及系统 |
| TWI770809B (zh) * | 2021-02-05 | 2022-07-11 | 佰驟智能股份有限公司 | 快速發光效率檢測方法 |
| TWI758088B (zh) * | 2021-02-05 | 2022-03-11 | 佰驟智能有限公司 | 陣列式發光效率檢測方法 |
| JP7735103B2 (ja) * | 2021-07-14 | 2025-09-08 | キヤノン株式会社 | 識別装置 |
| JP7686489B2 (ja) | 2021-07-29 | 2025-06-02 | 日亜化学工業株式会社 | 半導体層構造の検査方法及び半導体層構造の検査装置 |
| CN114252394B (zh) * | 2021-12-06 | 2023-11-07 | 深圳铭毅智造科技有限公司 | 一种二向色镜自动反馈补偿方法 |
| US20240175826A1 (en) | 2022-11-29 | 2024-05-30 | PlayNitride Display Co., Ltd. | Wafer defect inspection apparatus |
| CN116660285B (zh) * | 2023-07-26 | 2023-11-17 | 浙江大学 | 一种晶圆特征光谱在线检测装置 |
| CN119223992A (zh) * | 2023-09-05 | 2024-12-31 | 武汉精立电子技术有限公司 | 一种基于光谱成像的晶圆光致发光检测装置和方法 |
| CN119757399A (zh) * | 2024-12-23 | 2025-04-04 | 重庆中科摇橹船信息科技有限公司 | 一种用于mled晶圆缺陷检测的成像系统 |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63250835A (ja) * | 1987-04-08 | 1988-10-18 | Hitachi Cable Ltd | エピタキシヤルウエハの検査方法 |
| JP2009145550A (ja) * | 2007-12-13 | 2009-07-02 | Nikon Corp | レーザ走査顕微鏡 |
| US20120049085A1 (en) * | 2010-08-24 | 2012-03-01 | Kla-Tencor Corporation | Defect inspection and photoluminescence measurement system |
| TW201331568A (zh) * | 2012-01-17 | 2013-08-01 | Univ Nat Taiwan Science Tech | 螢光反應檢測系統及其檢測方法 |
| US20180052107A1 (en) * | 2015-02-26 | 2018-02-22 | National Cancer Center | Fluorescent image system |
Family Cites Families (25)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3413967B2 (ja) * | 1994-06-08 | 2003-06-09 | 株式会社ニコン | 蛍光顕微鏡 |
| JP2003028797A (ja) * | 2001-07-11 | 2003-01-29 | Hitachi Software Eng Co Ltd | 蛍光読み取り装置 |
| US7411679B2 (en) * | 2002-07-31 | 2008-08-12 | Semrock, Inc. | Optical filter and fluorescence spectroscopy system incorporating the same |
| US7697975B2 (en) * | 2003-06-03 | 2010-04-13 | British Colombia Cancer Agency | Methods and apparatus for fluorescence imaging using multiple excitation-emission pairs and simultaneous multi-channel image detection |
| US7031084B2 (en) * | 2003-07-23 | 2006-04-18 | Eastman Kodak Company | Imaging system using combined dichroic/high-pass filters |
| JP4804727B2 (ja) * | 2004-06-24 | 2011-11-02 | オリンパス株式会社 | 光走査型共焦点顕微鏡 |
| JP4025859B2 (ja) | 2004-09-03 | 2007-12-26 | レーザーテック株式会社 | 検査装置及び検査方法並びにパターン基板の製造方法 |
| US20110042580A1 (en) * | 2006-09-06 | 2011-02-24 | University Health Network | Fluorescence quantification and image acquisition in highly turbid media |
| JP5325681B2 (ja) | 2009-07-08 | 2013-10-23 | 株式会社日立ハイテクノロジーズ | 荷電粒子線装置 |
| JP2010118668A (ja) | 2009-12-11 | 2010-05-27 | Sumitomo Electric Ind Ltd | 化合物半導体部材のダメージ評価方法、化合物半導体部材の製造方法、窒化ガリウム系化合物半導体部材及び窒化ガリウム系化合物半導体膜 |
| JP5854531B2 (ja) | 2011-11-08 | 2016-02-09 | 株式会社メガトレード | プリント基板の検査装置 |
| WO2013175973A1 (ja) * | 2012-05-22 | 2013-11-28 | コニカミノルタ株式会社 | 面発光体の色ムラ評価方法、評価装置および評価プログラム |
| WO2014057998A1 (ja) | 2012-10-12 | 2014-04-17 | 株式会社ニコン | 照明装置及び顕微鏡、並びに照明方法及び観察方法 |
| JP2015010834A (ja) | 2013-06-26 | 2015-01-19 | 東レエンジニアリング株式会社 | 発光体の発光波長推定方法とその装置 |
| JP2017078724A (ja) * | 2014-01-27 | 2017-04-27 | 株式会社日立ハイテクノロジーズ | 多色蛍光画像分析装置 |
| JP6416530B2 (ja) | 2014-07-24 | 2018-10-31 | 株式会社日立ハイテクノロジーズ | 蛍光観察装置、および蛍光観察方法 |
| JP6635363B2 (ja) | 2014-10-24 | 2020-01-22 | 京都府公立大学法人 | 腫瘍部位の判別のための方法、腫瘍部位の判別装置 |
| JP6671653B2 (ja) | 2015-12-11 | 2020-03-25 | 大学共同利用機関法人情報・システム研究機構 | 画像処理装置、画像処理方法及びプログラム |
| CN109387490B (zh) * | 2017-08-08 | 2021-06-01 | 中国科学院大连化学物理研究所 | 一种用于提高荧光检测器信噪比的二色曲面反光镜结构 |
| CN109030438A (zh) * | 2018-07-06 | 2018-12-18 | 广州蓝勃生物科技有限公司 | 一种用于多波长荧光检测的光路模组 |
| JP6581707B2 (ja) | 2018-09-27 | 2019-09-25 | 株式会社日立ハイテクノロジーズ | 核酸分析装置、および核酸分析方法 |
| US11294162B2 (en) * | 2019-02-07 | 2022-04-05 | Nanotronics Imaging, Inc. | Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel |
| KR102898289B1 (ko) * | 2019-03-28 | 2025-12-10 | 하마마츠 포토닉스 가부시키가이샤 | 검사 장치 및 검사 방법 |
| CN113614830B (zh) * | 2019-03-29 | 2023-08-11 | 松下知识产权经营株式会社 | 记录状态评估方法、记录补偿方法和信息记录/回放设备 |
| TWI788135B (zh) * | 2021-06-08 | 2022-12-21 | 台達電子工業股份有限公司 | 光源模組 |
-
2020
- 2020-01-29 EP EP20779525.3A patent/EP3951844A4/en active Pending
- 2020-01-29 CN CN202080024982.1A patent/CN113646877B/zh active Active
- 2020-01-29 KR KR1020217029495A patent/KR102606269B1/ko active Active
- 2020-01-29 US US17/441,711 patent/US11694324B2/en active Active
- 2020-01-29 WO PCT/JP2020/003263 patent/WO2020195138A1/ja not_active Ceased
- 2020-01-29 KR KR1020237040098A patent/KR20230166137A/ko active Pending
- 2020-01-29 CN CN202310946176.5A patent/CN116978806A/zh active Pending
- 2020-03-17 TW TW109108724A patent/TWI819202B/zh active
- 2020-03-17 TW TW112144629A patent/TWI866622B/zh active
- 2020-03-17 TW TW114101521A patent/TW202518004A/zh unknown
- 2020-06-17 JP JP2020104555A patent/JP6840881B1/ja active Active
-
2021
- 2021-02-17 JP JP2021023161A patent/JP7591421B2/ja active Active
-
2023
- 2023-05-18 US US18/198,983 patent/US12387309B2/en active Active
-
2024
- 2024-11-18 JP JP2024200673A patent/JP7791967B2/ja active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63250835A (ja) * | 1987-04-08 | 1988-10-18 | Hitachi Cable Ltd | エピタキシヤルウエハの検査方法 |
| JP2009145550A (ja) * | 2007-12-13 | 2009-07-02 | Nikon Corp | レーザ走査顕微鏡 |
| US20120049085A1 (en) * | 2010-08-24 | 2012-03-01 | Kla-Tencor Corporation | Defect inspection and photoluminescence measurement system |
| TW201331568A (zh) * | 2012-01-17 | 2013-08-01 | Univ Nat Taiwan Science Tech | 螢光反應檢測系統及其檢測方法 |
| US20180052107A1 (en) * | 2015-02-26 | 2018-02-22 | National Cancer Center | Fluorescent image system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR102606269B1 (ko) | 2023-11-29 |
| CN116978806A (zh) | 2023-10-31 |
| TW202409552A (zh) | 2024-03-01 |
| EP3951844A4 (en) | 2023-01-04 |
| TWI819202B (zh) | 2023-10-21 |
| US20220198644A1 (en) | 2022-06-23 |
| JP7791967B2 (ja) | 2025-12-24 |
| JP2021081441A (ja) | 2021-05-27 |
| KR20210144693A (ko) | 2021-11-30 |
| TW202043746A (zh) | 2020-12-01 |
| JP7591421B2 (ja) | 2024-11-28 |
| JP2025028063A (ja) | 2025-02-28 |
| EP3951844A1 (en) | 2022-02-09 |
| TW202518004A (zh) | 2025-05-01 |
| WO2020195138A1 (ja) | 2020-10-01 |
| CN113646877A (zh) | 2021-11-12 |
| US20230289950A1 (en) | 2023-09-14 |
| KR20230166137A (ko) | 2023-12-06 |
| JP2021076577A (ja) | 2021-05-20 |
| JP6840881B1 (ja) | 2021-03-10 |
| CN113646877B (zh) | 2023-08-18 |
| US11694324B2 (en) | 2023-07-04 |
| US12387309B2 (en) | 2025-08-12 |
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