JP6840881B1 - 検査装置及び検査方法 - Google Patents
検査装置及び検査方法 Download PDFInfo
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Abstract
Description
発光量L=R+T…(1)
反射光量R=(R1+R2)*W/2…(2)
透過光量T=(T1+T2)*W/2…(3)
波長シフトパラメータS=(T−R)/(T+R)=0…(4)
R1´=R1−aΔλ…(5)
R2´=R2−aΔλ…(6)
T1´=T1+aΔλ…(7)
T2´=T2+aΔλ…(8)
反射光量R´=(R1´+R2´)*W/2=R−aWΔλ…(9)
透過光量T´=(T1´+T2´)*W/2=T+aWΔλ…(10)
波長シフトパラメータS´=(T´−R´)/(T´+R´)=2aWΔλ/L…(11)
L/W=R1+T1=100%=1…(12)
(11)及び(12)式より、
S´=2aΔλ/(100%)=2aΔλ…(13)
(13)式より、
Δλ=S´/2a…(14)
図6は、カメラ81,82における視野内の位置に応じた入射角度の違いを説明する図である。図6には、サンプルSからの蛍光をダイクロイックミラー60方向に導く対物レンズ51と、ダイクロイックミラー60とが示されている。なお、ここでの対物レンズ51及びダイクロイックミラー60は、図1に示される対物レンズ51及びダイクロイックミラー60と同様の構成であり、同様の位置関係にあるとする。ここで、一般に無限遠補正された対物レンズ51を用いると、サンプルSの一点から発した光(蛍光)は、対物レンズ51を通過した後において平行光になる。このことは、カメラ81,82の視野内の各点(各画素)において成り立つ。しかしながら、各点において光束は平行であるものの、異なる点の光束同士は平行ではない。このため、ダイクロイックミラー60に入射する光の角度は、カメラ81,82の視野内のどの点(画素)からの光かによって異なることとなる。そして、ダイクロイックミラー60の光学特性は、蛍光の入射角度によって変化する。すなわち、ダイクロイックミラー60においては、蛍光の入射角度(すなわち視野内における画素の位置)に応じて、透過率が50%になる波長(中心波長)が変化する。
次に、励起光の照明輝度調整について説明する。半導体デバイスであるサンプルSに対して励起光を照射し蛍光観察を行う場合においては、サンプルSにおける不純物又は欠陥箇所から発せられる蛍光(異常な蛍光)の波長を含むブロードな蛍光を取得する。すなわち、蛍光観察においては、本来の蛍光の波長及び異常な蛍光の波長の双方を含むブロードな蛍光を取得する。ここで、異常な蛍光については励起光の照明輝度に対してほぼ比例して強くなるのに対して、本来の蛍光は励起光の照明輝度に対しておよそ2乗程度に強くなる。このため、励起光の照明輝度が比較的低い場合には、本来の蛍光の輝度(本来の蛍光強度:第1蛍光強度)と異常な蛍光の輝度(異常な蛍光強度:第2蛍光強度)との差が小さいのに対して、励起光の照明輝度が比較的高い場合には、第1蛍光強度と第2蛍光強度との差が大きくなる。
次に、波長のばらつきに応じた発光素子の良否判定手法について説明する。本手法は、発明者らが、「サンプルSにおける各発光素子の蛍光波長の重心(中心波長)は、不良品である輝度帯ほど揺らぎやすい(ばらつく」ことに着目し、蛍光波長の重心のばらつきに応じて良否判定を行うものである。このようなばらつきは、不良品では、不純物やリーク電流によって電圧が下がりエネルギー量が減少するために、長波長方向に蛍光がシフトしやすくなることにより生じるものと考えられる。
Claims (18)
- 複数の発光素子を検査する検査装置であって、
前記発光素子に照射される励起光を生成する励起光源と、
前記発光素子からの蛍光を波長に応じて透過及び反射することにより分離し、所定の波長域において、波長に対する透過率及び反射率の比率が単調増加である光学素子と、
前記光学素子において反射された蛍光から反射光量を検出する第1のセンサと、
前記光学素子を透過した蛍光から透過光量を検出する第2のセンサと、
前記透過光量と前記反射光量との差を全光量で割った値である波長シフトパラメータを、前記光学素子における透過光量の変化量の2倍で割った値である中心波長のずれ量を導出し、該ずれ量を、予め導出している前記発光素子からの蛍光の中心波長から差し引くことにより、最終的な中心波長を導出する処理部と、を備える、検査装置。 - 前記処理部は、前記反射光量と前記透過光量との比に基づいて前記光学素子において透過率又は反射率が50%となる前記光学素子の波長からのずれ量を導出し、前記光学素子の波長と前記ずれ量から前記発光素子の中心波長を導出する、請求項1記載の検査装置。
- 前記光学素子は、ダイクロイックミラーである、請求項2記載の検査装置。
- 前記光学素子における、波長の変化に応じて透過率及び反射率が変化する波長帯の幅であるエッジ変移幅は、150nm以下である、請求項1〜3のいずれか一項記載の検査装置。
- 前記処理部は、前記複数の発光素子間における蛍光の中心波長を導出する、請求項1〜4のいずれか一項記載の検査装置。
- 前記処理部は、前記センサの視野内における位置に応じて推定される各画素についての前記光学素子への前記蛍光の入射角度と、前記蛍光の入射角度に応じた波長の変化量に関する前記光学素子の光学特性と、に基づき、各画素について波長ずれを補正する、請求項5記載の検査装置。
- 前記処理部は、前記センサの視野内における各画素の波長の分散が小さくなるように、各画素について波長ずれを補正する、請求項5又は6記載の検査装置。
- 前記蛍光を波長毎に分解しスペクトルを計測する分光器を更に備え、
前記処理部は、前記蛍光の中心波長を導出するよりも前に行う前処理において、前記スペクトルに基づき、本来の蛍光強度である第1蛍光強度と、該第1蛍光強度よりも小さい異常な蛍光強度である第2蛍光強度とを特定し、前記第1蛍光強度が前記第2蛍光強度と比べて所定値以上大きくなるように、前記発光素子に照射される前記励起光の照明輝度を決定し、
前記励起光源は、前記処理部によって決定された前記照明輝度の前記励起光を生成する、請求項1〜7のいずれか一項記載の検査装置。 - 前記処理部は、決定した前記照明輝度の前記励起光が前記励起光源によって生成されて前記第1のセンサ及び前記第2のセンサにおいて蛍光が検出されることにより、前記第1のセンサ及び前記第2のセンサの少なくともいずれか一方への入射光量が飽和する場合、飽和するセンサの前段に光量を制限するフィルタを挿入する、請求項8記載の検査装置。
- 前記励起光源は、パルス光である前記励起光を生成する、請求項8又は9記載の検査装置。
- 前記処理部は、決定した前記照明輝度の前記励起光が前記励起光源によって生成されて前記第1のセンサ及び前記第2のセンサにおいて蛍光が検出されることにより、前記第1のセンサ及び前記第2のセンサの少なくともいずれか一方への入射光量が飽和する場合、前記パルス光のデューティー比を調整することにより前記入射光量を抑制する、請求項10記載の検査装置。
- 前記励起光源は、前記パルス光の周波数を、前記第1のセンサ及び前記第2のセンサの露光時間の逆数の整数倍に同期させる、請求項10又は11記載の検査装置。
- 前記処理部は、
前記反射光量及び前記透過光量に基づき、各発光素子の輝度を導出し、
前記中心波長のばらつきが所定値よりも大きくなる輝度の前記発光素子を不良品と判定し、前記中心波長のばらつきが前記所定値以下となる輝度の前記発光素子を良品と判定する、請求項1〜12のいずれか一項記載の検査装置。 - 前記発光素子を保持する保持部材を更に備え、
前記保持部材は、温調機能を有している、請求項1〜13のいずれか一項記載の検査装置。 - 前記発光素子を保持する保持部材を更に備え、
前記保持部材は、前記発光素子の周辺部のみを吸着する、請求項1〜14のいずれか一項記載の検査装置。 - 前記励起光源は、前記励起光の照明輝度を複数回切り替える、請求項1〜15のいずれか一項記載の検査装置。
- 複数の発光素子を検査する検査方法であって、
前記発光素子に励起光を照射する工程と、
所定の波長域において、波長に対する透過率及び反射率の比率が単調増加である光学素子によって、前記発光素子からの蛍光を波長に応じて透過及び反射することにより分離する工程と、
前記光学素子において反射された蛍光から反射光量を検出する工程と、
前記光学素子を透過した蛍光から透過光量を検出する工程と、
前記透過光量と前記反射光量との差を全光量で割った値である波長シフトパラメータを、前記光学素子における透過光量の変化量の2倍で割った値である中心波長のずれ量を導出し、該ずれ量を、予め導出している前記発光素子からの蛍光の中心波長から差し引くことにより、最終的な中心波長を導出する工程と、を含む検査方法。 - 前記発光素子からの蛍光の中心波長を導出する工程は、前記反射光量と前記透過光量との比に基づいて前記光学素子において透過率又は反射率が50%となる前記光学素子の波長からのずれ量を導出し、前記光学素子の波長と前記ずれ量から前記発光素子の中心波長を導出する、請求項17記載の検査方法。
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---|---|---|---|---|
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JP2003028797A (ja) | 2001-07-11 | 2003-01-29 | Hitachi Software Eng Co Ltd | 蛍光読み取り装置 |
US7411679B2 (en) * | 2002-07-31 | 2008-08-12 | Semrock, Inc. | Optical filter and fluorescence spectroscopy system incorporating the same |
US7031084B2 (en) * | 2003-07-23 | 2006-04-18 | Eastman Kodak Company | Imaging system using combined dichroic/high-pass filters |
JP4025859B2 (ja) * | 2004-09-03 | 2007-12-26 | レーザーテック株式会社 | 検査装置及び検査方法並びにパターン基板の製造方法 |
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US9163987B2 (en) * | 2010-08-24 | 2015-10-20 | Kla-Tencor Corporation | Defect inspection and photoluminescence measurement system |
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JP5958779B2 (ja) | 2012-10-12 | 2016-08-02 | 株式会社ニコン | 顕微鏡及び観察方法 |
JP2015010834A (ja) | 2013-06-26 | 2015-01-19 | 東レエンジニアリング株式会社 | 発光体の発光波長推定方法とその装置 |
JP2017078724A (ja) * | 2014-01-27 | 2017-04-27 | 株式会社日立ハイテクノロジーズ | 多色蛍光画像分析装置 |
JP6416530B2 (ja) | 2014-07-24 | 2018-10-31 | 株式会社日立ハイテクノロジーズ | 蛍光観察装置、および蛍光観察方法 |
JP6635363B2 (ja) | 2014-10-24 | 2020-01-22 | 京都府公立大学法人 | 腫瘍部位の判別のための方法、腫瘍部位の判別装置 |
KR101606828B1 (ko) * | 2015-02-26 | 2016-03-29 | 국립암센터 | 형광 영상 시스템 |
JP6671653B2 (ja) | 2015-12-11 | 2020-03-25 | 大学共同利用機関法人情報・システム研究機構 | 画像処理装置、画像処理方法及びプログラム |
CN109387490B (zh) * | 2017-08-08 | 2021-06-01 | 中国科学院大连化学物理研究所 | 一种用于提高荧光检测器信噪比的二色曲面反光镜结构 |
CN109030438A (zh) * | 2018-07-06 | 2018-12-18 | 广州蓝勃生物科技有限公司 | 一种用于多波长荧光检测的光路模组 |
JP6581707B2 (ja) | 2018-09-27 | 2019-09-25 | 株式会社日立ハイテクノロジーズ | 核酸分析装置、および核酸分析方法 |
US11294162B2 (en) * | 2019-02-07 | 2022-04-05 | Nanotronics Imaging, Inc. | Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel |
WO2020202765A1 (ja) * | 2019-03-29 | 2020-10-08 | パナソニックIpマネジメント株式会社 | 記録状態評価方法、記録補償方法及び情報記録再生装置 |
CN115453807A (zh) * | 2021-06-08 | 2022-12-09 | 台达电子工业股份有限公司 | 光源模块 |
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